Plasma excitation assembly, electromagnetic field generation device and plasma generation device

Abstract

The utility model discloses a plasma excitation assembly, an electromagnetic field generating device and a plasma generating device, and relates to the technical field of plasma processing, the plasma excitation assembly is applied to the plasma generating device, and the plasma generating device comprises a plasma generating main body. The plasma generation main body is provided with a plurality of plasma generation chambers which are arranged at intervals; the plasma generation chambers are used for introducing process gas; the plasma excitation assembly comprises a plurality of inductance coils, each inductance coil is arranged corresponding to one plasma generation chamber, and the plurality of inductance coils are connected in series or in parallel and are electrically connected with an external radio frequency power supply; the inductance coils generate the alternating magnetic field and excite the process gas in the plasma generation cavity to generate the plasma, the energy loss can be reduced by arranging the multiple inductance coils, the conversion efficiency from electric energy to magnetic field energy is improved, and therefore the overall efficiency of the system is improved.

Description

Plasma excitation components, electromagnetic field generating devices, and plasma generating devices Technical Field

[0001] This utility model relates to the field of plasma processing technology, and in particular to a plasma excitation component, an electromagnetic field generating device, and a plasma generating device. Background Technology

[0002] Most existing plasma generation (PRS) devices employ a single plasma generation chamber and generate the required electromagnetic field by winding an inductor coil. This structure is simple, efficient, and suitable for most conventional applications. However, for plasma generation devices with multiple plasma generation chambers, multiple inductors must be installed and connected to separate power supplies when providing an electromagnetic field to each chamber. This increases the complexity of the device and often leads to reduced power transmission efficiency due to power distribution issues among the multiple inductors. Summary of the Invention

[0003] The main purpose of this invention is to propose a plasma excitation component, an electromagnetic field generating device, and a plasma generating device, which aims to solve the problem of low power transmission efficiency of inductor coils in existing PRS systems.

[0004] Firstly, to achieve the above objectives, the plasma excitation component proposed in this utility model is applied to a plasma generating device. The plasma generating device includes a plasma generating body, which has multiple spaced-apart plasma generating chambers. The plasma generating chambers are used to introduce process gas. The plasma excitation component includes multiple inductors, which are connected to form a first connection end and a second connection end. Each inductor is at least partially arranged around one of the plasma generating chambers. The axis of the inductor extends along the length of the plasma generating chamber. The first connection end and the second connection end are used to connect to an external radio frequency power supply. The inductor is used to generate an alternating magnetic field when energized to excite the process gas in the plasma generating chamber to generate plasma.

[0005] In one embodiment, each of the inductors includes a first end, a second end, and a helical portion connected to the first end and the second end. The first end and the second end are used to connect to other inductors or to connect to an external radio frequency power supply. The helical portion is arranged around the plasma generation chamber.

[0006] In one embodiment, the spiral portion spirals upward along the axis and has the same spiral diameter, and the current flow direction of the spiral portion on each of the plasma generation chambers is in the same direction.

[0007] In one embodiment, the number of turns and / or pitch of each of the spiral portions are equal.

[0008] In one embodiment, the plasma generating body includes three spaced-apart plasma generating chambers, and the plasma excitation assembly includes three inductor coils, which are respectively wound around the three plasma generating chambers and connected in series.

[0009] In one embodiment, the first connection end and / or the second connection end are provided with a connection portion, which is used to be fixedly connected to the plasma generating body.

[0010] In one embodiment, each of the inductors is a hollow tubular structure, and the plurality of inductors are connected and have a channel inside, the channel being used to introduce coolant to control the temperature of the plasma generation chamber.

[0011] In one embodiment, the outer surfaces of the plurality of inductor coils are provided with a metal plating layer;

[0012] And / or, multiple inductor coils are connected in series by welding.

[0013] Secondly, this utility model also proposes an electromagnetic field generating device, including a radio frequency power supply and the plasma excitation component described in the first aspect. The radio frequency power supply is electrically connected to a first connection terminal and a second connection terminal of the plasma excitation component to generate an alternating magnetic field in the plasma generating chamber.

[0014] Thirdly, this utility model also proposes a plasma generating device, including a plasma generating body and the electromagnetic field generating device described in the second aspect above. The plasma generating body includes a plurality of spaced plasma generating chambers. The plasma generating chambers are used to introduce process gas and dissociate it to generate plasma. Each inductor coil of the electromagnetic field generating device is at least partially wound around one of the plasma generating chambers so that an alternating magnetic field is generated in each plasma generating chamber and the process gas in the plasma generating chamber is excited to generate plasma.

[0015] The plasma excitation component in this invention employs a multi-coil connection structure to improve the power transmission efficiency of the coils to the plasma. Specifically, this plasma excitation component is applied to a plasma generation device, which includes a plasma generation body with multiple spaced-apart plasma generation chambers for introducing process gases. The plasma excitation component includes multiple inductor coils connected in series or parallel to form a first connection terminal and a second connection terminal for connecting to an external radio frequency (RF) power supply. Each inductor coil is at least partially arranged around a plasma generation chamber, and the axis of this portion extends along the length of the plasma generation chamber. When the plasma excitation component is energized, the inductor coils generate an alternating magnetic field and excite the process gases in the plasma generation chamber to generate plasma.

[0016] As can be seen from the above, the one-to-one correspondence between multiple inductor coils and multiple plasma generation chambers can generate a more uniform electromagnetic field distribution, ensure that the plasma in the plasma generation chamber is heated evenly, avoid local overheating or uneven energy distribution, reduce energy loss, improve the conversion efficiency of electrical energy to magnetic field energy, and thus improve the overall efficiency of the system. Attached Figure Description

[0017] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on the structures shown in these drawings without creative effort.

[0018] Figure 1 is a schematic diagram of an embodiment of the plasma generating device provided by this utility model;

[0019] Figure 2 is a schematic diagram of a structure of an embodiment of the plasma excitation component provided by this utility model;

[0020] Figure 3 is a schematic diagram of the structure of the inductor coil in one embodiment of the plasma excitation assembly provided by this utility model;

[0021] Figure 4 is a structural schematic diagram of another embodiment of the plasma excitation component provided by this utility model;

[0022] Figure 5 is a structural schematic diagram of another embodiment of the plasma excitation component provided by this utility model;

[0023] Figure 6 is a structural schematic diagram of another embodiment of the plasma excitation component provided by this utility model.

[0024] Explanation of icon numbers:

[0025] 100. Plasma generating device; 110. Plasma generating main body; 110a. Air inlet; 111. Plasma generating chamber; 112. Connecting plate;

[0026] 200, Plasma excitation assembly; 210, Inductor coil; 211, First end; 212, Second end; 213, Helical part; 220, First connecting end; 230, Second connecting end; 240, Connecting part; 250, Channel.

[0027] The realization of the purpose, functional features and advantages of this utility model will be further explained in conjunction with the embodiments and with reference to the accompanying drawings. Detailed Implementation

[0028] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0029] It should be noted that if the embodiments of this utility model involve directional indicators (such as up, down, left, right, front, back, etc.), the directional indicators are only used to explain the relative positional relationship and movement of the components in a specific posture. If the specific posture changes, the directional indicators will also change accordingly.

[0030] Furthermore, if the embodiments of this utility model involve descriptions such as "first" or "second," these descriptions are for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined with "first" or "second" may explicitly or implicitly include at least one of those features. Additionally, the use of "and / or" or "and / or" throughout the text includes three parallel solutions. For example, "A and / or B" includes solution A, solution B, or a solution where both A and B are satisfied simultaneously. Furthermore, the technical solutions of the various embodiments can be combined with each other, but this must be based on the ability of those skilled in the art to implement them. When the combination of technical solutions is contradictory or impossible to implement, it should be considered that such a combination of technical solutions does not exist and is not within the scope of protection claimed by this utility model.

[0031] Firstly, this utility model proposes a plasma excitation component 200.

[0032] Please refer to Figures 1 and 2. In one embodiment of this utility model, the plasma excitation component 200 is applied to a plasma generating device 100. The plasma generating device 100 includes a plasma generating body 110, which has a plurality of spaced plasma generating chambers 111 for introducing process gas.

[0033] In this embodiment, the plasma excitation assembly 200 includes multiple inductor coils 210. These inductor coils are connected in series to form a first connection terminal 220 and a second connection terminal 230 for connection to an external radio frequency (RF) power supply. Each inductor coil 210 is at least partially arranged around a plasma generation chamber 111, with its axis extending along the length of the plasma generation chamber 111. When the plasma excitation assembly 200 is energized, the RF power supply generates an alternating magnetic field through the inductor coils 210. This alternating magnetic field generates an alternating current, thereby exciting the process gas within the plasma generation chamber 111 to generate plasma. Of course, in some other embodiments of this invention, the multiple inductor coils 210 can also be connected in parallel. The specific connection method is not specifically limited here; this solution primarily uses a series connection as the implementation method.

[0034] As can be seen from the above, in a plasma-based RPS system, the generated alternating magnetic field can excite and stabilize the plasma, preventing it from contacting the chamber walls, reducing energy loss and material damage. Multiple inductor coils 210 connected in series or parallel and corresponding one-to-one with multiple plasma generation chambers 111 can produce a more uniform electromagnetic field distribution, ensuring uniform heating of the plasma within the plasma generation chambers 111, avoiding localized overheating or uneven energy distribution, reducing energy loss, and improving the conversion efficiency from electrical energy to magnetic field energy, thereby enhancing the overall system efficiency. Connecting multiple coils in series also simplifies circuit design, reduces complex external control circuits, and lowers system complexity and cost.

[0035] In one embodiment, each inductor coil 210 includes a first end 211, a second end 212, and a spiral portion 213 connected to the first end 211 and the second end 212. The first end 211 and the second end 212 are used to connect to other inductor coils 210 or to connect to an external radio frequency power supply. The spiral portion 213 is arranged around the plasma generation chamber 111.

[0036] As shown in Figure 3, in one embodiment of this utility model, the inductor coil 210 can be formed by spirally bending a whole copper tube, forming a first end 211, a second end 212, and a spiral part 213 in the middle that is similar to the structure of a columnar spring. As can be seen from Figure 1, the columnar space enclosed by the spiral part 213 is used to set up the plasma generation chamber 111. The axis of the spiral part 213 is aligned with the axis of the plasma generation chamber 111, so that the inductor coil 210 can generate a uniform radial alternating magnetic field. The first end 211 or the second end 212 of the inductor coil 210 is used to connect with other inductor coils 210, or to form a first connection end 220 or a second connection end 230 for connection with an external radio frequency power supply.

[0037] Therefore, when the plasma generating body 110 is provided with multiple plasma generating chambers 111, the same number of inductor coils 210 can be selected and placed outside the plasma generating chambers 111. Then, the multiple inductor coils 210 can be connected in series or in parallel. Finally, the first connection end 220 and the second connection end 230 can be connected to an external radio frequency power supply, which facilitates the processing and installation of components.

[0038] In one embodiment, the spiral portion 213 spirals upward along the axis and has the same spiral diameter, and the current flow direction of the spiral portion 213 on each plasma generation chamber 111 is in the same direction.

[0039] As shown in Figure 1, in one embodiment of this utility model, the spiral portion 213 of the inductor coil 210 spirals upward around the cylindrical plasma generating chamber 111, and its spiral diameter remains consistent to ensure that the spiral portion 213 is cylindrical as a whole. Maintaining a consistent spiral diameter ensures that the electromagnetic field is evenly distributed in the plasma generating chamber 111, avoiding excessively high or low local magnetic field strength, thereby ensuring the stability of system operation. Moreover, the inductance value is closely related to the geometry of the coil. Maintaining a consistent spiral diameter helps to accurately calculate and control the inductance value, ensuring that the circuit design meets expectations. A uniform spiral diameter can reduce eddy current losses and skin effect, improve energy conversion efficiency, reduce system energy consumption, and at the same time simplify the manufacturing process of the inductor coil 210, reduce production difficulty and cost, and improve product consistency and reliability.

[0040] Furthermore, as can be seen from Figures 1 and 2, by setting the winding direction of each inductor coil 210 of the plasma excitation assembly 200 from the first connection end 220 to the second connection end 230 on the plasma generation chamber 111, so that the direction of the current flowing through each spiral part 213 is consistent, a uniform radial alternating magnetic field will be generated in each plasma generation chamber 111. This can generate and confine the plasma, prevent it from contacting the chamber wall, reduce energy loss and chamber contamination, and ensure that the magnetic field generated by the same current is in the same direction, which helps to couple radio frequency energy into the plasma more efficiently.

[0041] In one embodiment, the number of turns and / or pitch of each helical portion 213 are equal.

[0042] In the plasma generating device 100, multiple plasma generating chambers 111 can be ionized using the same or different process gases. Since different process gases have different ionization energies, densities, and reaction characteristics, different electromagnetic field strengths are required to maintain the plasma. Therefore, it is necessary to adjust the number of turns and pitch of the helical portion 213 of the inductor coil 210. As shown in Figure 4, in another embodiment of this invention, the number of turns and pitch of the helical portion 213 of the multiple inductor coils 210 of the plasma excitation assembly 200 are all the same, i.e., D1 equals D2, and L1 equals L2. Therefore, the electromagnetic field strength and distribution generated in the corresponding plasma generating chambers 111 are the same. This structure is suitable for a single process gas to enter multiple plasma generating chambers 111.

[0043] As shown in Figure 5, in another embodiment of this invention, the helical portion 213 of the inductor coil 210 has the same number of turns but different pitches, i.e., L1 is greater than L2 and D1 is greater than D2. This structure is suitable for different process gases to enter multiple plasma generation chambers 111. Further, as shown in Figure 6, in yet another embodiment of this invention, the helical portion 213 of the inductor coil 210 has different numbers of turns but the same pitch, i.e., D1 is greater than D2 and L1 is equal to L2. This structure is also suitable for different process gases to enter multiple plasma generation chambers 111.

[0044] As can be seen from the above, power can be distributed by setting different numbers of turns and pitches in the helical section 213 to adapt to the ionization characteristics of different types of process gases and optimize energy coupling efficiency. Inductor coils 210 with corresponding numbers of turns and pitches can be manufactured for each plasma generation chamber 111, and multiple inductor coils 210 can then be connected in series or parallel. This provides strong controllability, effectively reduces the assembly difficulty of the equipment, and improves the operating efficiency of the equipment.

[0045] In one embodiment, the plasma generating body 110 includes three spaced-apart plasma generating chambers 111, and the plasma excitation assembly 200 includes three inductor coils 210, which are respectively wound around the three plasma generating chambers 111 and connected in series.

[0046] As shown in Figures 1 and 2, in one embodiment of this utility model, the plasma generating body 110 includes three spaced-apart plasma generating chambers 111. The connection between the three plasma generating chambers 111 forms an equilateral triangle structure and is spaced apart from each other to avoid mutual interference of electromagnetic fields within each plasma generating chamber 111. The plasma excitation component 200 of this embodiment includes three inductor coils 210. The three inductor coils 210 are connected in series through a first end 211 and a second end 212 to form a first connection terminal 220 and a second connection terminal 230 for electrical connection with an external radio frequency power supply. The three plasma generating chambers 111 can be vented with the same or different process gases. Each inductor coil 210 can be configured with a corresponding number of turns and pitch to achieve optimal energy coupling efficiency.

[0047] In some other embodiments of this utility model, the plasma generation chamber 111 may be two, four, five or other numbers, which can be set according to actual needs. The number of turns and pitch of the inductor coil 210 are not specifically limited here.

[0048] In addition, an air inlet 110a is provided above the three plasma generation chambers 111, through which process gas can be input into the three plasma generation chambers 111. If each chamber needs to be supplied with a specific process gas, three air inlets 110a can be provided on the plasma generation body 110, which are spaced apart and connected to the three plasma generation chambers 111 respectively, so that the specific process gas can be input into the corresponding plasma generation chamber 111. The structure of the air inlet 110a can be set according to actual needs.

[0049] In one embodiment, the first connection end 220 and / or the second connection end 230 are provided with a connection portion 240, which is used to be fixedly connected to the plasma generating body 110.

[0050] As shown in Figure 2, in one embodiment of the present invention, the first connection end 220 and the second connection end 230 of the plasma excitation component 200 are respectively provided with a connection part 240. The connection part 240 is used to connect with the plasma generating body 110 to fix multiple inductor coils 210, so as to facilitate the connection of the first connection end 220 and the second connection end 230 with other devices and enhance the structural strength.

[0051] Furthermore, the plasma excitation assembly 200 also includes multiple support members (not shown). These support members are disposed on the plasma generating body 110 and support the structure of the inductor coil 210 away from the helical part 213, preventing bending and deformation of part of the inductor coil 210 and ensuring the operational stability of the equipment. The aforementioned connectors and support members can be fixed by means of threaded connection, welding, etc., and no specific limitations are made here.

[0052] In one embodiment, each inductor coil 210 is a hollow tubular junction, and multiple inductor coils 210 are connected and a channel 250 is formed inside, the channel 250 being used to introduce coolant to control the temperature of the plasma generation chamber 111.

[0053] As shown in Figures 2 and 3, in one embodiment of this invention, each inductor coil 210 can be made of a hollow copper tube. Multiple inductor coils 210 are connected in series or parallel to form a connected channel 250, with an inlet and an outlet at the first connection end 220 and the second connection end 230. When the inductor coil 210 is energized, it generates a large amount of heat. Excessive coil temperature reduces its conductivity, increases resistance, and further exacerbates heating, creating a vicious cycle. In this embodiment, coolant is introduced into the channel 250 from the inlet and flows out from the outlet, carrying away the heat and preventing the inductor coil 210 temperature from exceeding the safe limit. This keeps the inductor coil 210 within its optimal operating temperature range, ensuring stable performance.

[0054] In one embodiment, the outer surfaces of the plurality of inductor coils 210 are provided with a metal plating layer;

[0055] And / or, multiple inductor coils 210 are connected in series by welding.

[0056] In one embodiment of this invention, the outer surface of the inductor coil 210 is plated with gold. Gold plating reduces the resistance of the inductor coil 210, decreases energy loss, and improves the generation efficiency of the electromagnetic field. This is suitable for RPS systems requiring high power and high efficiency, ensuring maximum energy conversion efficiency. It also reduces the skin effect of high-frequency current, improving the coil's performance under high-frequency conditions. Furthermore, gold plating protects the inductor coil 210 from corrosion, extending its service life. In other embodiments of this invention, the outer surface of the inductor coil 210 may also be plated with other metals such as silver or nickel; no specific limitations are made here.

[0057] Furthermore, multiple inductor coils 210 are connected in series by welding. Welding can ensure a stable connection between each inductor coil 210 and prevent coolant leakage at the connection point.

[0058] Secondly, this utility model also proposes an electromagnetic field generating device, which includes a radio frequency power supply and the plasma excitation component 200 described in the first aspect. The specific structure of the plasma excitation component 200 is as described in the above embodiments. Since this electromagnetic field generating device adopts all the technical solutions of all the above embodiments, it has at least all the beneficial effects brought about by the technical solutions of the above embodiments, which will not be elaborated here. The plasma excitation component 200 is connected to the radio frequency power supply to generate an alternating magnetic field in the plasma generation chamber 111. Furthermore, in order to control the power distribution, a matching device can be provided between the plasma excitation component 200 and the radio frequency power supply to precisely adjust the power transmission ratio and help control the plasma generation process of different frequencies or different parts.

[0059] Thirdly, this utility model also proposes a plasma generating device 100, which includes a plasma generating body 110 and an electromagnetic field generating device as described in the second aspect above. The specific structure of the electromagnetic field generating device is as described in the above embodiments. Since this plasma generating device 100 adopts all the technical solutions of all the above embodiments, it has at least all the beneficial effects brought about by the technical solutions of the above embodiments, which will not be elaborated here.

[0060] The plasma generating body 110 includes a plurality of spaced plasma generating chambers 111, which are used to introduce process gas. Each inductor coil 210 of the electromagnetic field generating device is at least partially wound around a plasma generating chamber 111, so that an alternating magnetic field is generated in each plasma generating chamber 111 and the process gas in the plasma generating chamber 111 is excited to generate plasma.

[0061] Furthermore, the plasma generating body 110 also includes a gas delivery assembly 300 and a connecting plate 112. The gas delivery assembly 300 is disposed above the multiple plasma generating chambers 111 and has an air inlet 110a. The connecting plate 112 is disposed on the side of the plasma generating chamber 111 away from the gas delivery assembly 300. The connecting plate 112 is used to connect the reaction body, which has a reaction chamber. The outlet ends of the multiple plasma generating chambers 111 are connected to the reaction chamber to discharge plasma. The plasma entering the reaction chamber can be used for processes such as thin film deposition, etching, and cleaning.

[0062] Furthermore, a conveying component (not shown) may be provided between the connecting plate 112 and the reaction body. This conveying component has multiple conveying channels that connect multiple plasma generation chambers 111. The multiple conveying channels converge into an outlet, which is used to communicate with the reaction chamber so that the plasma generated by the multiple plasma generation chambers 111 is collected and uniformly conveyed to the reaction chamber. The specific structure will not be described in detail here.

[0063] The above description is merely an exemplary embodiment of the present utility model and does not limit the patent scope of the present utility model. Any equivalent structural transformations made based on the technical concept of the present utility model and the contents of the present utility model specification and drawings, or direct / indirect applications in other related technical fields, are included within the patent protection scope of the present utility model.

Claims

1. A plasma excitation assembly, used in a plasma generation device, characterized in that, The plasma generating device includes a plasma generating body having multiple spaced-apart plasma generating chambers for introducing process gas. The plasma excitation assembly includes multiple inductors connected to form a first connection terminal and a second connection terminal. Each inductor is at least partially arranged around one of the plasma generating chambers, and the axis of the inductor extends along the length of the plasma generating chamber. The first connection terminal and the second connection terminal are used to connect to an external radio frequency power supply. The inductors are used to generate an alternating magnetic field when energized to excite the process gas in the plasma generating chamber to generate plasma.

2. The plasma excitation assembly as described in claim 1, characterized in that, Each of the inductors includes a first end, a second end, and a helical portion connected to the first end and the second end. The first end and the second end are used to connect to other inductors or to connect to an external radio frequency power supply. The helical portion is arranged around the plasma generation chamber.

3. The plasma excitation assembly as described in claim 2, characterized in that, The spiral section spirals upward along the axis and has the same spiral diameter. The current flow direction of the spiral section on each plasma generation chamber is the same.

4. The plasma excitation assembly as described in claim 3, characterized in that, The number of turns and / or pitch of each of the aforementioned helical sections are equal.

5. The plasma excitation assembly as described in any one of claims 1 to 4, characterized in that, The plasma generating body includes three spaced-apart plasma generating chambers, and the plasma excitation assembly includes three inductor coils, which are respectively wound around the three plasma generating chambers and connected in series.

6. The plasma excitation assembly as claimed in claim 1, characterized in that, The first connection end and / or the second connection end are provided with a connection part, which is used to be fixedly connected to the plasma generating body.

7. The plasma excitation assembly as claimed in claim 1, characterized in that, Each of the inductors is a hollow tubular structure, and multiple inductors are connected to form a channel inside, which is used to introduce coolant to control the temperature of the plasma generation chamber.

8. The plasma excitation assembly as claimed in claim 1, characterized in that, The outer surfaces of the plurality of inductor coils are provided with a metal plating layer; and / or, the plurality of inductor coils are connected in series by welding.

9. An electromagnetic field generating device, characterized in that, The device includes a radio frequency power supply and a plasma excitation assembly as described in any one of claims 1 to 8, wherein the radio frequency power supply is electrically connected to the first connection terminal and the second connection terminal to generate an alternating magnetic field in the plasma generation chamber.

10. A plasma generating device, characterized in that, The device includes a plasma generating body and an electromagnetic field generating apparatus as described in claim 9. The plasma generating body includes a plurality of spaced plasma generating chambers. The plasma generating chambers are used to introduce process gas and dissociate it to generate plasma. Each inductor coil of the electromagnetic field generating apparatus is at least partially wound around one of the plasma generating chambers so that an alternating magnetic field is generated in each plasma generating chamber and the process gas in the plasma generating chamber is excited to generate plasma.

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