Electroplating copper wastewater treatment device

Abstract

The utility model belongs to the technical field of electroplating wastewater treatment, and provides an electroplating copper wastewater treatment device which comprises a reaction box body, an isolating ring is arranged in the reaction box body, multiple layers of flow guide plates are arranged on the outer wall of the isolating ring, and the inner walls of the flow guide plates are connected with the outer wall of the isolating ring in a sealed mode. Each layer of flow guide plates are obliquely arranged, and the upper and lower adjacent flow guide plates are alternately and reversely inclined to form a continuous broken-line-shaped water flow channel, and a flow guide hole is formed in the lowest point position of each layer of flow guide plates; the device further comprises a water inlet pipe and a medicament pipe, the water inlet pipe and the medicament pipe are distributed above the highest point of the uppermost guide plate, a combined filtering unit is arranged outside the reaction box body, and the combined filtering unit is connected with the interior of the isolating ring through a water conveying pipe; by designing the copper-containing wastewater treatment device, the reaction degree of a medicament and wastewater can be improved, and the treatment effect on the copper-containing wastewater is improved.

Description

Technical Field

[0001] This utility model belongs to the field of electroplating wastewater treatment technology, specifically an electroplating copper wastewater treatment device. Background Technology

[0002] Acidic copper plating is a common process in the electroplating industry. After copper plating is completed, a large amount of electroplating solution will adhere to the surface of the plated parts. It is necessary to rinse with clean water multiple times to remove the residual electroplating solution. These rinsing waters contain a high concentration of copper ions and are one of the main sources of copper-containing wastewater.

[0003] Plating solution filtration and wastewater discharge: In order to ensure the quality and stability of the electroplating solution, it is necessary to filter the electroplating solution regularly to remove impurities and solid particles. A certain amount of wastewater will be generated during the filtration process, which contains copper ions and other additives. In addition, when the electroplating solution reaches the end of its service life or needs to be replaced, the discharged wastewater is also an important source of copper-containing wastewater.

[0004] Therefore, copper-containing wastewater needs to be treated. Currently, chemicals are often added to the wastewater to treat it through chemical precipitation. However, most of the time, the chemicals are added directly to the copper-containing wastewater, resulting in insufficient utilization of the chemicals and ultimately incomplete reaction, which affects the treatment effect of copper-containing wastewater. Utility Model Content

[0005] To address the aforementioned technical problems, this utility model provides an electroplating copper wastewater treatment device to solve the problems of incomplete reaction caused by the direct addition of reagents to wastewater in the existing chemical precipitation method.

[0006] An electroplating copper wastewater treatment device includes a reaction tank. An isolation ring is provided inside the reaction tank. Multiple layers of guide plates are provided on the outer wall of the isolation ring. The inner wall of the guide plates is sealed to the outer wall of the isolation ring. Each layer of guide plates is inclined and the inclination directions of adjacent guide plates are alternately opposite to form a continuous zigzag water flow channel. A guide hole is provided at the lowest point of each layer of guide plates.

[0007] It also includes a water inlet pipe and a reagent pipe, which are located above the highest point of the uppermost guide plate. A combined filtration unit is provided on the outside of the reaction chamber, and the combined filtration unit is connected to the inside of the isolation ring through a water supply pipe.

[0008] Preferably, the inner wall of the reaction chamber and near the top is provided with a fixedly connected support ring, and the top of the reaction chamber overlaps the support ring.

[0009] Preferably, the bottom of the reaction chamber is provided with a precipitation chamber, which is a conical chamber with a larger opening at the top and a smaller opening at the bottom. A valve is provided at the bottom of the precipitation chamber, and the bottom of the isolation ring is located above the precipitation chamber.

[0010] Preferably, a baffle ring is provided at the top of the guide plate and near the outer edge, and a filter screen is provided inside the isolation ring and at the bottom position.

[0011] Preferably, the isolation ring has symmetrically fixed mounting plates inside and near the bottom, and the top of the mounting plate has a water pump with an external power supply. The water pump is connected to the combined filter unit through the water supply pipe.

[0012] Preferably, the combined filtration unit includes a filter box, a water leakage plate, a mounting ring, and a filter element. The filter box is installed outside the reaction chamber. One end of the water supply pipe is connected to the water pump, and the other end extends from the top of the isolation ring and is connected to the top of the filter box. The mounting ring is fixed at intervals inside the filter box.

[0013] Preferably, the drain plate is placed on top of the mounting ring, the drain plate has spaced mesh holes, the filter element is placed on top of the drain plate, and the filter element consists of three layers of filter media from top to bottom: activated carbon, zeolite, and quartz sand. The bottom of the filter box is provided with a water outlet pipe.

[0014] Compared with the prior art, the present invention has the following beneficial effects:

[0015] 1. This utility model features a reaction chamber with an internal isolation ring. Multiple layers of inclined guide plates are arranged on the isolation ring, with adjacent guide plates alternating in opposite directions to form a continuous zigzag water flow channel. An inlet pipe and a reagent pipe are distributed above the upper guide plate. Wastewater and reagent enter the uppermost guide plate through the inlet pipe and reagent pipe respectively, mixing and flowing downwards. The mixture then enters the lower guide plate through the bottom guide holes, continuing downwards layer by layer. During this downward flow, the mixture increases the degree of mixing between the reagent and wastewater, thereby improving the wastewater treatment effect. Attached Figure Description

[0016] Figure 1 This is a schematic diagram of the component structure of the overall copper wastewater treatment device of this utility model;

[0017] Figure 2 This is a schematic diagram of the structure of the reaction chamber and other components of this utility model;

[0018] Figure 3 This is a cross-sectional view of the internal components of the reaction chamber of this utility model;

[0019] Figure 4This is a schematic diagram of the structure of the isolation ring and guide plate of this utility model;

[0020] Figure 5 This is a schematic diagram of the combined filter unit and isolation ring of this utility model.

[0021] In the picture:

[0022] 1. Reaction chamber; 2. Isolation ring; 3. Baffle plate; 4. Flow guide hole; 5. Water inlet pipe; 6. Reagent pipe; 7. Bearing ring; 8. Sedimentation chamber; 9. Valve; 10. Baffle ring; 11. Filter screen; 12. Mounting plate; 13. Water pump; 14. Filter box; 15. Leakage plate; 16. Mounting ring; 17. Filter element; 18. Water outlet pipe; 19. Water delivery pipe. Detailed Implementation

[0023] The embodiments of this utility model will be described in further detail below with reference to the accompanying drawings and examples. The following examples are for illustrative purposes only and should not be construed as limiting the scope of this utility model.

[0024] As attached Figure 1 To be continued Figure 5 As shown:

[0025] Example 1: This utility model provides a copper plating wastewater treatment device, including a reaction tank 1. The reaction tank 1 is provided with an isolation ring 2 inside. The outer wall of the isolation ring 2 is provided with multiple layers of flow guide plates 3. The inner wall of the flow guide plate 3 is sealed to the outer wall of the isolation ring 2. Each layer of flow guide plate 3 is inclined and the inclined directions of adjacent flow guide plates 3 are alternately opposite to form a continuous zigzag water flow channel. The lowest point of each layer of flow guide plate 3 is provided with a flow guide hole 4.

[0026] It also includes a water inlet pipe 5 and a reagent pipe 6, which are located above the highest point of the uppermost guide plate 3. The reaction chamber 1 is equipped with a combined filter unit on the outside, which is connected to the interior of the isolation ring 2 through a water supply pipe 19.

[0027] It should be noted that the reaction chamber 1 is equipped with an isolation ring 2 inside. The isolation ring 2 is equipped with multiple layers of inclined guide plates 3. The inclined directions of adjacent guide plates 3 are alternately opposite, forming a continuous zigzag water flow channel. Above the upper guide plate 3, there are water inlet pipes 5 and chemical pipes 6. Wastewater and chemical enter the uppermost guide plate 3 through the water inlet pipes 5 and chemical pipes 6 respectively. They mix together and flow downwards along the guide plate 3. They then enter the lower guide plate 3 through the bottom guide holes 4, and flow downwards layer by layer. During the downward flow, they mix with each other, which improves the mixing degree of chemical and wastewater, thereby improving the treatment effect of wastewater.

[0028] The reaction chamber 1 is a cylindrical chamber. There are more than two guide plates 3 on the isolation ring 2. Copper-containing wastewater is transported to the top of the guide plates 3 through the inlet pipe 5. The reagent is transported to the top of the guide plates 3 through the reagent pipe 6. The reagent is a sodium hydroxide solution, and the dosage is 5%-10% of the wastewater volume. The core principle of adding the reagent is to use chemical precipitation, coagulation and flocculation to convert copper ions in the wastewater into insoluble precipitates, and then remove copper through solid-liquid separation.

[0029] In this embodiment, a support ring 7 is fixedly connected to the inner wall of the reaction chamber 1 near the top, and the top of the isolation ring 2 overlaps on the support ring 7.

[0030] It should be noted that, through the set support ring 7, the top of the isolation ring 2 overlaps on the support ring 7. On the one hand, the isolation ring 2 can be installed inside the reaction chamber 1, and on the other hand, after the treatment is completed, the isolation ring 2 can be removed from the reaction chamber 1 to achieve cleaning.

[0031] In this embodiment, a precipitation chamber 8 is provided at the bottom of the reaction chamber 1. The precipitation chamber 8 is a conical chamber with a larger opening at the top and a smaller opening at the bottom. A valve 9 is provided at the bottom of the precipitation chamber 8, and the bottom of the isolation ring 2 is located above the precipitation chamber 8.

[0032] It should be noted that by setting a sedimentation chamber 8 at the bottom of the reaction chamber, after the wastewater and the reagent have reacted, the wastewater flows down through the bottom guide plate 3 and enters the sedimentation chamber 8. The reacted substances and sludge will be deposited inside the sedimentation chamber 8, thereby achieving the separation of substances. The valve 9 at the bottom can be opened to discharge the precipitated substances.

[0033] In this embodiment, a baffle ring 10 is provided at the top of the guide plate 3 and near the outer edge, and a filter screen 11 is provided inside the isolation ring 2 and at the bottom position.

[0034] It should be noted that a baffle ring 10 is installed on the guide plate 3. When the wastewater and the reagent are mixed and flow on the guide plate 3, the baffle can effectively prevent the mixed liquid from rushing out of the guide plate 3 during the flow process, thus restricting the liquid. By setting a filter screen 11 at the bottom of the isolation ring 2, which is above the sedimentation chamber 8, the supernatant after the reaction is completed will gradually rise into the interior of the isolation ring 2. The filter screen 11 can further prevent impurities from entering the interior of the isolation ring 2.

[0035] In this embodiment, a mounting plate 12 is symmetrically and fixedly connected inside the isolation ring 2 and near the bottom. A water pump 13 with an external power supply is provided on the top of the mounting plate 12. The water pump 13 is connected to the combined filter unit through a water supply pipe 19.

[0036] It should be noted that by designing an installation plate 12 inside the isolation ring 2, and placing the water pump 13 on top of the installation plate 12, the supernatant liquid entering the isolation ring 2 can be pumped into the combined filter unit.

[0037] In this embodiment, the combined filtration unit includes a filter box 14, a water leakage plate 15, a mounting ring 16, and a filter element 17. The filter box 14 is installed outside the reaction chamber 1. One end of the water supply pipe 19 is connected to the water pump 13, and the other end extends from the top of the isolation ring 2 and is connected to the top of the filter box 14. The mounting ring 16 is fixed at intervals inside the filter box 14.

[0038] It should be noted that, through the set combination filter unit, the mounting ring 16 is fixedly connected inside the filter box 14, and the water leakage plate 15 is placed on the mounting ring 16. When the supernatant is pumped into the filter box 14 by the water pump 13, it will gradually pass down through the filter element 17, thereby deeply removing the residual suspended solids, colloidal particles and trace dissolved copper ions in the wastewater through multi-stage physical filtration, ensuring that the effluent meets the discharge or reuse standards.

[0039] In this embodiment, the water leakage plate 15 is placed on top of the mounting ring 16, and the water leakage plate 15 has mesh holes distributed at intervals. The filter element 17 is placed on top of the water leakage plate 15, and the filter element 17 consists of three layers of filter media from top to bottom: activated carbon, zeolite, and quartz sand. The bottom of the filter box 14 is provided with a water outlet pipe 18.

[0040] It should be noted that the upper layer uses activated carbon to adsorb dissolved organic matter (COD), residual chlorine, and trace copper ions, while the middle layer of zeolite is used for ion exchange adsorption of Cu. 2+ The lower layer of quartz sand can mechanically trap suspended solids, distribute water evenly, and extend the life of the upper filter media. Thus, through a multi-stage synergistic filtration mechanism, deep purification of electroplating copper wastewater is achieved. The effluent pipe 18 can discharge and collect the treated wastewater.

[0041] The embodiments of this utility model are given for the purpose of illustration and description. Although embodiments of this utility model have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the utility model. Those skilled in the art can make changes, modifications, substitutions and variations to the above embodiments within the scope of this utility model.

Claims

1. A copper plating wastewater treatment device, characterized in that, include: The reaction chamber (1) has an isolation ring (2) inside. The outer wall of the isolation ring (2) is provided with multiple layers of guide plates (3). The inner wall of the guide plate (3) is sealed to the outer wall of the isolation ring (2). Each layer of the guide plate (3) is inclined and the inclined directions of adjacent guide plates (3) are alternately opposite to form a continuous zigzag water flow channel. Each layer of the guide plate (3) has a guide hole (4) at the lowest point. It also includes a water inlet pipe (5) and a reagent pipe (6), which are located above the highest point of the uppermost guide plate (3). The reaction chamber (1) is equipped with a combined filter unit on the outside, which is connected to the interior of the isolation ring (2) through a water supply pipe.

2. The electroplating copper wastewater treatment device as described in claim 1, characterized in that: The inner wall of the reaction chamber (1) and near the top is provided with a fixedly connected support ring (7), and the top of the reaction chamber (1) overlaps the support ring (7).

3. The electroplating copper wastewater treatment device as described in claim 2, characterized in that: The bottom of the reaction chamber (1) is provided with a precipitation chamber (8), which is a conical chamber with a larger opening at the top and a smaller opening at the bottom. A valve (9) is provided at the bottom of the precipitation chamber (8), and the bottom of the isolation ring (2) is located above the precipitation chamber (8).

4. The electroplating copper wastewater treatment device as described in claim 1, characterized in that: A baffle ring (10) is provided at the top of the guide plate (3) and near the outer edge, and a filter screen (11) is provided inside the isolation ring (2) and at the bottom position.

5. The electroplating copper wastewater treatment device as described in claim 1, characterized in that: The isolation ring (2) has symmetrically fixed mounting plates (12) inside and near the bottom. The top of the mounting plate (12) is equipped with a water pump (13) with an external power supply. The water pump (13) is connected to the combined filter unit through the water supply pipe.

6. The electroplating copper wastewater treatment device as described in claim 5, characterized in that: The combined filtration unit includes a filter box (14), a water leakage plate (15), a mounting ring (16), and a filter element (17). The filter box (14) is installed outside the reaction chamber (1). One end of the water supply pipe is connected to the water pump (13), and the other end extends from the top of the isolation ring (2) and is connected to the top of the filter box (14). The mounting ring (16) is fixed at intervals inside the filter box (14).

7. The electroplating copper wastewater treatment device as described in claim 6, characterized in that: The drain plate (15) is placed on top of the mounting ring (16). The drain plate (15) has mesh holes spaced apart. The filter element (17) is placed on top of the drain plate (15). The filter element (17) consists of three layers of filter media from top to bottom: activated carbon, zeolite, and quartz sand. The bottom of the filter box (14) is provided with a water outlet pipe (18).

Images