Plasma generating device and plasma processing equipment

Abstract

The utility model discloses a plasma generating device and plasma processing equipment, and relates to the technical field of plasma processing, the plasma generating device comprises a plasma generating main body and a plurality of gas transmission devices, the plasma generating main body is provided with a plurality of gas inlets and a plasma outlet, the plurality of gas inlets are communicated with the plasma outlet, the plurality of plasma generation chambers are communicated with the plurality of gas inlets and the plasma outlet, and each gas transmission device is communicated with one gas inlet, so that the gas transmission devices transmit process gas to the corresponding plasma generation chambers respectively. The plasma generation chambers are used for dissociating process gas and generating plasmas, and the gas outlet ends of any two plasma generation chambers can be connected in an on-off manner, so that the dissociated plasmas in the two plasma generation chambers can be converged and then discharged from the plasma outlet. The gas flow, pressure and composition in each plasma generation chamber can be independently controlled, so that the system management is more efficient.

Description

Technical Field

[0001] This utility model relates to the field of plasma processing technology, and in particular to a plasma generating device and plasma processing equipment. Background Technology

[0002] Remote plasma source (RPS) technology is widely used in semiconductor manufacturing, thin film deposition, and material surface treatment. However, traditional RPS systems typically rely on a single plasma generation chamber to generate plasma, resulting in inherent drawbacks such as low processing efficiency, uneven gas distribution, and insufficient process flexibility. For example, in existing single-chamber designs, the reaction gas is easily introduced through the top inlet structure, creating a concentration gradient that leads to tilted plasma distribution and severely affects process uniformity. Furthermore, complex processes require frequent switching of gas parameters, further exacerbating inefficiency and the risk of cross-contamination. Although some multi-chamber equipment (such as cleaning and CVD equipment) has improved throughput through parallel processing in recent years, their shared gas source design still struggles to avoid gas mixing contamination, and the system's energy consumption and maintenance costs remain high, making it unable to handle complex situations requiring different gas combinations or flow rates for different processes. Utility Model Content

[0003] The main purpose of this invention is to propose a plasma generation device and plasma processing equipment, which aims to solve the problem that existing RPS systems cannot cope with different gas combinations or different gas flow rates.

[0004] To achieve the above objectives, the plasma generating device proposed in this utility model includes:

[0005] Multiple gas transmission devices; and

[0006] The plasma generating body has multiple air inlets, a plasma outlet, and multiple plasma generating chambers connecting the multiple air inlets and the plasma outlet. Each gas supply device is connected to an air inlet of a plasma generating chamber. The gas supply device is used to input process gas into the plasma generating chamber. The plasma generating chamber is used to dissociate the input process gas and generate plasma. Any two plasma generating chambers can be connected to each other.

[0007] In one embodiment, the plasma generating device further includes a plurality of solenoid valves, and each of the gas supply devices is provided with a solenoid valve in the gas path between the connected plasma generating chamber and the gas supply device. The solenoid valve is used to control the opening and closing of the gas path between the gas supply device and the plasma generating chamber.

[0008] In one embodiment, an electromagnetic valve is provided in the gas path between any two plasma generation chambers, and the electromagnetic valve is used to control the opening and closing of the gas path between the two plasma generation chambers.

[0009] In one embodiment, the plasma generating device further includes a gas delivery assembly disposed on the plasma generating body. The gas delivery assembly is provided with a plurality of air inlet channels, one end of each air inlet channel being connected to a gas delivery device, and the other end of each air inlet channel being connected to the air inlet.

[0010] In one embodiment, the plasma generating body includes a plurality of air inlets spaced apart from each other, and a plurality of plasma generating chambers that are respectively connected to the plurality of air inlets. Each air inlet is connected to a gas delivery device. The outlet of one of the plasma generating chambers is connected to the plasma outlet, and the outlets of the other two plasma generating chambers are configurably connected to the plasma outlet.

[0011] In one embodiment, the plasma generating body further includes a conveying component having multiple conveying channels. One end of each conveying channel is connected to a plasma generating chamber, and the ends of the multiple conveying channels away from the plasma generating body are connected to form the plasma outlet. Any two conveying channels can be switched on or off.

[0012] In one embodiment, the plasma generating apparatus further includes a plasma excitation component, which includes a plurality of inductor coils, each of which is arranged around a plasma generating chamber. When the inductor coil is energized, it generates an alternating magnetic field to excite the process gas in the plasma generating chamber to generate plasma.

[0013] In one embodiment, a plurality of the inductors are connected to form a first connection terminal and a second connection terminal, the first connection terminal and the second connection terminal being connected to an radio frequency power supply.

[0014] In one embodiment, the current flows in the inductors of each plasma generation chamber in the same direction, so that the magnetic fields generated by each inductor are in the same direction.

[0015] This utility model also proposes a plasma processing device, including a reaction body and a plasma generating device in any of the foregoing embodiments. The reaction body is provided with a reaction chamber, and the reaction body is connected to the plasma generating device so that the reaction chamber is connected to the plasma outlet of the plasma generating device.

[0016] The plasma generating device of this utility model adopts a multi-chamber, multi-gas-source structure to solve the problem of single plasma generation by existing remote plasma sources. Specifically, the plasma generating device includes a plasma generating body and multiple gas delivery devices. The plasma generating body has multiple gas inlets and a plasma outlet, as well as multiple plasma generating chambers connecting the multiple gas inlets and the plasma outlet. That is, one end of each plasma generating chamber is connected to a gas inlet, and the other end is connected to the same plasma outlet. Each gas delivery device is connected to a gas inlet, so that each gas delivery device delivers process gas to the corresponding plasma generating chamber. The plasma generating chambers are used for the dissociation of process gas and the generation of plasma. The outlets of any two plasma generating chambers can be connected on and off, so that the dissociated plasma in the two plasma generating chambers can converge and be discharged from the plasma outlet.

[0017] As can be seen from the above, the gas flow rate, pressure and composition in each plasma generation chamber can be controlled independently. The gas is centrally exhausted through the plasma outlet, making the exhaust system management more efficient and ensuring that the pressure inside and outside the chamber is maintained at a stable level. Attached Figure Description

[0018] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on the structures shown in these drawings without creative effort.

[0019] Figure 1 A schematic diagram of a structure of an embodiment of the plasma generating device provided by this utility model;

[0020] Figure 2 A schematic diagram of another embodiment of the plasma generating device provided by this utility model;

[0021] Figure 3 for Figure 2 Top view of the plasma generation device;

[0022] Figure 4 for Figure 3 A cross-sectional view along the AA direction.

[0023] Explanation of icon numbers:

[0024] 100. Plasma generating device; 110. Plasma generating main body; 111. Plasma generating chamber; 112. Air inlet; 113. Plasma outlet; 114. Connecting plate; 120. Solenoid valve; 130. Conveying component; 131. Conveying channel;

[0025] 200, Plasma excitation assembly; 210, Inductor coil; 220, First connection terminal; 230, Second connection terminal; 240, Radio frequency power supply;

[0026] 300. Gas delivery assembly; 310. Air inlet channel;

[0027] 400. Gas transmission equipment.

[0028] The realization of the purpose, functional features and advantages of this utility model will be further explained in conjunction with the embodiments and with reference to the accompanying drawings. Detailed Implementation

[0029] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of the present utility model.

[0030] It should be noted that if the embodiments of this utility model involve directional indicators (such as up, down, left, right, front, back, etc.), the directional indicators are only used to explain the relative positional relationship and movement of the components in a specific posture. If the specific posture changes, the directional indicators will also change accordingly.

[0031] Furthermore, if the embodiments of this utility model involve descriptions such as "first" or "second," these descriptions are for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined with "first" or "second" may explicitly or implicitly include at least one of those features. Additionally, the use of "and / or" or "and / or" throughout the text includes three parallel solutions. For example, "A and / or B" includes solution A, solution B, or a solution where both A and B are satisfied simultaneously. Furthermore, the technical solutions of the various embodiments can be combined with each other, but this must be based on the ability of those skilled in the art to implement them. When the combination of technical solutions is contradictory or impossible to implement, it should be considered that such a combination of technical solutions does not exist and is not within the scope of protection claimed by this utility model.

[0032] This utility model proposes a plasma generating device 100.

[0033] Please see Figure 1 In one embodiment of this utility model, the plasma generating device 100 includes a plasma generating body 110 and a plurality of gas supply devices 400. The plasma generating body 110 has a plurality of air inlets 112 and a plasma outlet 113, and a plurality of plasma generating chambers 111 connecting the plurality of air inlets 112 and the plasma outlet 113. That is, one end of each plasma generating chamber 111 is connected to an air inlet 112, and the other end is connected to the same plasma outlet 113. Each gas supply device 400 is connected to an air inlet 112, so that each gas supply device 400 respectively supplies process gas to the corresponding plasma generating chamber 111. The plasma generating chambers 111 are used for the dissociation of process gas and the generation of plasma. The outlets of any two plasma generating chambers 111 can be connected on and off, so that the dissociated plasma in the two plasma generating chambers 111 can converge and be discharged from the plasma outlet 113.

[0034] As described above, multiple plasma generation chambers 111 are connected to multiple gas delivery devices 400 one-to-one. The gas flow rate, pressure, and composition in each plasma generation chamber 111 can be independently controlled. Exhaust is centrally controlled through a unified plasma outlet 113, making the exhaust system more efficient and ensuring that the pressure inside and outside the chamber remains at a stable level. This allows each plasma generation chamber 111 to operate independently according to different needs without losing the overall system's synergistic effect, solving the problem of single plasma generation from existing remote plasma sources. Different processes can be carried out simultaneously or flexibly switched as needed.

[0035] It should be noted that the plasma generation chamber 111 and the gas delivery device 400 can be connected on and off. Valves, such as manual valves, automatic valves (solenoid valve 120, electric valves), shut-off valves, ball valves, etc., can be installed in the gas path between the plasma generation chamber 111 and the gas delivery device 400 to achieve gas path control of process gas flow. No specific limitations are made here.

[0036] In one embodiment, the plasma generating device 100 further includes a plurality of solenoid valves 120, and each of the gas supply devices 400 and the connected plasma generating chamber 111 is provided with a solenoid valve 120 in the gas path. The solenoid valve 120 is used to control the opening and closing of the gas path between the gas supply device 400 and the plasma generating chamber 111.

[0037] In one embodiment of this utility model, the plasma generating device 100 has a plurality of solenoid valves 120, specifically, as shown in the figure below. Figure 1As shown, a solenoid valve 120 is installed in the gas path between the air inlet 112 of each plasma generation chamber 111 and the corresponding gas delivery device 400. The solenoid valve 120 controls the flow and cut-off of the process gas. Furthermore, a flow meter can also be installed in this gas path to measure the flow rate of the process gas. The flow meter, in conjunction with the solenoid valve 120, can precisely control the flow rate of the process gas flowing into the plasma generation chamber 111, ensuring that the system operates under specified conditions and avoiding human error. Of course, in some other embodiments of this invention, other valve structures can also be installed in the gas path between the gas delivery device 400 and the plasma generation chamber 111; specific limitations are not made here.

[0038] In one embodiment, an electromagnetic valve 120 is provided in the gas path between any two plasma generation chambers 111. The electromagnetic valve 120 is used to control the opening and closing of the gas path between the two plasma generation chambers 111.

[0039] like Figure 1 As shown, in one embodiment of this utility model, multiple plasma generating chambers 111 are interconnected at their ends furthest from the air inlet 112, forming a unified plasma outlet 113. To control the individual plasma output of each plasma generating chamber 111, a solenoid valve 120 is provided in the gas path between any two plasma generating chambers 111. The plasma output is controlled by controlling the opening and closing of this solenoid valve 120. For example, when the solenoid valve 120 between the air outlets of two plasma generating chambers 111 is open, the plasma output from the two plasma generating chambers 111 merges and is discharged from the plasma outlet 113; when the solenoid valve 120 between the air outlets of two plasma generating chambers 111 is closed, only one of the plasma generating chambers 111 can output plasma to the plasma outlet 113.

[0040] Furthermore, if two solenoid valves 120 are installed in the gas path between any two plasma generation chambers 111, and the two solenoid valves 120 control the opening and closing of the two plasma generation chambers 111 and the plasma outlet 113 respectively, the corresponding plasma generation chamber 111 can be controlled to output plasma to the plasma outlet 113 by controlling the opening and closing of the two solenoid valves 120 respectively.

[0041] In one embodiment, the plasma generating device 100 further includes a gas delivery component 300 disposed on the plasma generating body 110. The gas delivery component 300 is provided with a plurality of air inlet channels 310. One end of each air inlet channel 310 is connected to a gas delivery device 400, and the other end of each air inlet channel 310 is connected to an air inlet 112.

[0042] like Figures 2 to 4As shown, in another embodiment of this utility model, the plasma generating device 100 further includes a gas delivery assembly 300. Specifically, the gas delivery assembly 300 is disposed on the plasma generating body 110 and has multiple air inlet channels 310. One end of each air inlet channel 310 is connected to the air inlet 112 of a plasma generating chamber 111, and the other end is connected to a gas delivery device 400. The plasma generating body 110 has multiple plasma generating chambers 111 with hollow ceramic tube structures, and the upper end of each plasma generating chamber 111 is provided with an air inlet 112. The upper ends of the multiple hollow ceramic tubes are connected to the gas delivery assembly 300, and the side of the gas delivery assembly 300 away from the plasma generating chamber 111 is used to connect to the gas delivery device 400. In some other embodiments of this utility model, the sidewall of the plasma generating chamber 111 may also be made of insulating materials such as quartz, which can be selected according to actual needs, and no specific limitation is made here.

[0043] Understandably, multiple gas delivery devices 400 can provide various types of process gases, such as silane (SiH4), ammonia (NH3), and argon (Ar). The system can select the appropriate gas according to requirements. By setting up gas delivery components 300 to connect the gas delivery devices 400, it is convenient to connect and replace the gas delivery devices 400, making the gas delivery system easier to expand and providing flexibility for the equipment's versatility, which can meet the needs of different processes or operating conditions.

[0044] In one embodiment, the plasma generating body 110 includes a plurality of air inlets 112 spaced apart from each other, and a plurality of plasma generating chambers 111 respectively connected to the plurality of air inlets 112. Each air inlet 112 is connected to a gas delivery device 400. The gas outlet of one plasma generating chamber 111 is connected to the plasma outlet 113, and the gas outlets of the other two plasma generating chambers 111 are connected to the plasma outlet 113 in a switchable manner.

[0045] like Figures 1 to 4 As shown, in one embodiment of the present invention, the plasma generating body 110 includes three spaced-apart hollow ceramic tubes, each hollow ceramic tube forming a plasma generating chamber 111. Each plasma generating chamber 111 has an air inlet 112 at one end near the gas delivery assembly 300. The plasma generating device 100 includes three gas delivery devices 400, which are respectively connected to the air inlets 112 of the three plasma generating chambers 111. Each gas delivery device 400 is provided with a solenoid valve 120 in the gas path between it and the air inlet 112 to control the input of process gas into the gas delivery device 400.

[0046] Furthermore, the ends of the three plasma generation chambers 111 furthest from the air inlet 112 are all connected to the plasma outlet 113. Two of the plasma generation chambers 111 are each equipped with a solenoid valve 120 in the gas path between them and the plasma outlet 113, while the third plasma generation chamber 111 is directly connected to the plasma outlet 113. This allows one plasma generation chamber 111 to directly output plasma, while the other two chambers are controlled by the solenoid valves 120, enabling the selection of individual or mixed plasma output. This provides more flexible system control and allows the system to handle more complex operating conditions and application scenarios.

[0047] In addition to the above embodiments, in some other embodiments of this utility model, the plasma generating chamber 111 may be two, four, five or other numbers, without specific limitation. Each plasma generating chamber 111 may be connected to a gas supply device 400, which can be set according to actual needs.

[0048] In one embodiment, the plasma generating body 110 further includes a conveying member 130, which has a plurality of conveying channels 131. One end of each conveying channel 131 is connected to a plasma generating chamber 111. The ends of the plurality of conveying channels 131 away from the plasma generating body 110 are connected to form a plasma outlet 113. Any two conveying channels 131 can be switched on or off.

[0049] like Figures 2 to 4 As shown, in another embodiment of this utility model, the plasma generating body 110 further includes a conveying component 130 and a connecting plate 114. Specifically, the plasma generating body 110 also includes a connecting plate 114, which is located on the side of the plasma generating chamber 111 away from the gas conveying assembly 300. The conveying component 130 is located on the side of the connecting plate 114 away from the plasma generating chamber 111, and the conveying component 130 has a plurality of conveying channels 131, the same number as the number of plasma generating chambers 111. One end of each conveying channel 131 is connected to a plasma generating chamber 111, and the ends of the plurality of conveying channels 131 away from the plasma generating chambers 111 are connected to form a unified plasma outlet 113. Figure 4 The multiple arrows indicate the flow direction of the process gas after entering the plasma generation device 100, and the plasma generated by the multiple plasma generation chambers 111 is discharged uniformly from the plasma outlet 113.

[0050] It should be noted that, in order to facilitate the individual and mixed output of plasma, any two conveying channels 131 of the conveying component 130 can be connected on and off. That is, solenoid valves or other opening and closing devices (not shown in the figure) can be installed in the conveying channel 131 to open or close the gas path between the plasma generation chamber 111 and the plasma outlet 113, so as to achieve precise control of plasma output.

[0051] In one embodiment, the plasma generating apparatus 100 further includes a plasma excitation component 200, which includes a plurality of inductor coils 210. Each inductor coil 210 is arranged around a plasma generating chamber 111. When the inductor coil 210 is energized, it generates an alternating magnetic field, which generates an alternating current to excite the process gas in the plasma generating chamber 111 to generate plasma.

[0052] like Figure 1 and Figure 2 As shown, in one embodiment of this utility model, the plasma generating device 100 further includes a plasma excitation component 200. Specifically, the plasma excitation component 200 includes a plurality of inductor coils 210 connected to an external power source. Each inductor coil 210 is at least partially wound around a plasma generating chamber 111, and its axis extends along the length of the plasma generating chamber 111. When the inductor coil 210 is energized, it generates an alternating magnetic field, thereby exciting the process gas in the plasma generating chamber 111 to generate plasma. The alternating magnetic field generated by the inductor coil 210 can excite and stabilize the plasma, prevent it from contacting the chamber wall, and reduce energy loss and material damage.

[0053] In one embodiment, a plurality of inductor coils 210 are connected to form a first connection terminal 220 and a second connection terminal 230, and the first connection terminal 220 and the second connection terminal 230 are connected to an RF power supply 240.

[0054] In one embodiment of this invention, multiple inductors 210 are connected in series to form a first connection terminal 220 and a second connection terminal 230. These first and second connection terminals 220 are connected to an external radio frequency power supply 240, enabling the multiple inductors 210 to conduct and form a stable circuit that generates an alternating magnetic field. Connecting multiple inductors 210 in series also simplifies circuit design, reduces complex external control circuitry, and lowers system complexity and cost. Furthermore, to control power distribution, a matching device can be provided between the plasma excitation assembly 200 and the radio frequency power supply 240 to precisely adjust the power transmission ratio, helping to control the plasma generation process at different frequencies or in different parts.

[0055] Of course, in some other embodiments of this utility model, multiple inductor coils 210 can also be connected in parallel, and the specific connection method is not specifically limited here. In order to prevent the temperature of the inductor coils 210 from exceeding the safety limit and to keep the inductor coils 210 within the optimal operating temperature range, each inductor coil 210 adopts a hollow tube structure. Multiple inductor coils 210 are connected in series or in parallel to form a connected pipe. The first connection end 220 and the second connection end 230 are also used to connect to a cooling device. The cooling device inputs coolant into the pipe to control the temperature of the inductor coils 210.

[0056] In one embodiment, the current flowing in the inductor coil 210 of each plasma generation chamber 111 is in the same direction, so that the magnetic field generated by each inductor coil 210 is in the same direction.

[0057] like Figure 1 and Figure 2 As shown, in one embodiment of this utility model, the winding direction of each inductor coil 210 from the first connection end 220 to the second connection end 230 on the plasma generation chamber 111 is set so that the direction of the current flowing through each plasma generation chamber 111 is consistent. Multiple inductor coils 210 generate a uniform magnetic field with the same direction in each plasma generation chamber 111. The uniform magnetic field can confine the plasma, prevent it from contacting the chamber wall, reduce energy loss and chamber contamination. The magnetic field generated by the same current has the same direction, which helps to couple radio frequency energy into the plasma more efficiently.

[0058] This utility model also proposes a plasma processing device, which includes a reaction body and a plasma generating device 100. The specific structure of the plasma generating device 100 is as described in the above embodiments. Since this plasma processing device adopts all the technical solutions of all the above embodiments, it has at least all the beneficial effects brought about by the technical solutions of the above embodiments, which will not be described in detail here.

[0059] The reaction body is equipped with a reaction chamber. The reaction body is connected to the transport component 130 so that the reaction chamber is connected to the plasma outlet 113. The plasma discharged from the plasma outlet 113 enters the reaction chamber for processes such as coating, etching, and cleaning.

[0060] The above description is merely an exemplary embodiment of the present utility model and does not limit the patent scope of the present utility model. Any equivalent structural transformations made based on the technical concept of the present utility model and the contents of the present utility model specification and drawings, or direct / indirect applications in other related technical fields, are included within the patent protection scope of the present utility model.

Claims

1. A plasma generating device, characterized in that, include: Multiple gas delivery devices; as well as The plasma generating body has multiple air inlets, a plasma outlet, and multiple plasma generating chambers connecting the multiple air inlets and the plasma outlet. Each gas supply device is connected to an air inlet of a plasma generating chamber. The gas supply device is used to input process gas into the plasma generating chamber. The plasma generating chamber is used to dissociate the input process gas and generate plasma. Any two plasma generating chambers can be connected to each other.

2. The plasma generating apparatus as described in claim 1, characterized in that, The plasma generating device further includes multiple solenoid valves. Each of the gas supply devices is provided with a solenoid valve in the gas path between the connected plasma generating chamber and the gas supply device. The solenoid valve is used to control the opening and closing of the gas path between the gas supply device and the plasma generating chamber.

3. The plasma generating apparatus as described in claim 2, characterized in that, An electromagnetic valve is provided in the gas path between any two plasma generation chambers, and the electromagnetic valve is used to control the opening and closing of the gas path between the two plasma generation chambers.

4. The plasma generating apparatus as described in claim 1, characterized in that, The plasma generating device further includes a gas delivery assembly disposed on the plasma generating body. The gas delivery assembly is provided with multiple air inlet channels. One end of each air inlet channel is connected to a gas delivery device, and the other end of the air inlet channel is connected to the air inlet.

5. The plasma generating apparatus according to any one of claims 1 to 4, characterized in that, The plasma generating body includes a plurality of air inlets spaced apart from each other, and a plurality of plasma generating chambers that are connected to each of the plurality of air inlets in a one-to-one correspondence. Each air inlet is connected to a gas delivery device. The gas outlet of one of the plasma generating chambers is connected to the plasma outlet, and the gas outlets of the other two plasma generating chambers are configurably connected to the plasma outlet.

6. The plasma generating apparatus as described in claim 5, characterized in that, The plasma generating body also includes a conveying component, which has multiple conveying channels. One end of each conveying channel is connected to a plasma generating chamber, and the ends of the multiple conveying channels away from the plasma generating body are connected to form the plasma outlet. Any two conveying channels can be connected to each other.

7. The plasma generating apparatus as claimed in claim 1, characterized in that, The plasma generating device further includes a plasma excitation component, which includes multiple inductor coils. Each inductor coil is arranged around a plasma generating chamber. When the inductor coil is energized, it generates an alternating magnetic field to excite the process gas in the plasma generating chamber to generate plasma.

8. The plasma generating apparatus as described in claim 7, characterized in that, Multiple inductors are connected to form a first connection terminal and a second connection terminal, and the first connection terminal and the second connection terminal are connected to an radio frequency power supply.

9. The plasma generating apparatus as described in claim 8, characterized in that, The current flows in the inductors of each plasma generation chamber in the same direction, so that the magnetic field generated by each inductor is in the same direction.

10. A plasma processing apparatus, characterized in that, The device includes a reaction body and a plasma generating apparatus as described in any one of claims 1 to 9, wherein the reaction body is provided with a reaction chamber and the reaction body is connected to the plasma generating apparatus such that the reaction chamber is in communication with the plasma outlet of the plasma generating apparatus.

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