Gas inlet pipe of chemical vapor deposition equipment

Abstract

The utility model provides an air inlet pipe of chemical vapor deposition equipment. The gas inlet pipe of the chemical vapor deposition equipment comprises a pipe body and a diffuser, a cavity is formed in the diffuser, a channel with a variable cross section is formed in the pipe body and gradually increases from large to small, a gas inlet is formed in one end of the pipe body, the other end of the pipe body is in threaded connection with the diffuser, a plurality of gas outlet holes are evenly distributed in the diffuser, and the gas outlet holes are communicated with the cavity. A cavity is formed in the diffuser, the air inlet, the channel, the cavity and the air outlet are communicated, and a first external thread is arranged outside the end, provided with the air inlet, of the pipe body. According to the reaction chamber, gas can enter the reaction chamber more uniformly.

Description

Technical Field

[0001] This utility model relates to the field of chemical vapor deposition technology, and in particular to an air inlet pipe for a chemical vapor deposition apparatus. Background Technology

[0002] Chemical vapor deposition (CVD) is a method that uses one or more gaseous compounds or elements containing thin-film elements to chemically react on a substrate surface to form a thin film. During CVD, the stability of the CVD equipment plays a major role in the quality of the product. CVD equipment mainly consists of an inlet device, a reaction chamber, an exhaust device, and a tail gas device. The inlet device typically comprises a mixing chamber and an inlet pipe. The process gas enters the mixing chamber, mixes, and then enters the reaction chamber through the inlet pipe for reaction. Whether the process gas enters the reaction chamber stably and uniformly is a key factor in whether a high-quality thin film can be formed on the substrate surface, and the stable operation of the inlet pipe, as the component transporting the process gas, is particularly important.

[0003] Existing gas inlet pipes, such as the gas inlet structure and vapor deposition equipment for low-pressure chemical vapor deposition disclosed in patent publication number CN218146928U, employ annular gas inlet pipes uniformly arranged inside the furnace tube, with the axial direction of the gas inlet pipe aligned with that of the furnace tube. Gas inlets are evenly arranged circumferentially along the annular gas inlet pipe, facing the inner wall of the furnace tube, allowing reactive gases to be introduced into the furnace tube. This cylindrical gas inlet pipe makes it difficult to ensure uniform and sufficient gas diffusion, leading to defects in film growth. Utility Model Content

[0004] The purpose of this invention is to provide an inlet pipe for a chemical vapor deposition (CVD) device to improve the uniformity of gas input.

[0005] The technical solution of this utility model is: an air inlet pipe for a chemical vapor deposition apparatus, comprising a pipe body and a diffuser. The diffuser has a cavity inside, and the pipe body has a channel with a variable cross-section that decreases in size and then increases in size. One end of the pipe body forms an air inlet, and the other end of the pipe body is threadedly connected to the diffuser. The diffuser has multiple air outlets evenly distributed on it. The diffuser has a cavity inside, and the air inlet, channel, cavity, and air outlets are interconnected. The pipe body has a first external thread on the outside of the end with the air inlet.

[0006] Preferably, the tube body includes a first straight tube, a first tapered tube, a second straight tube, a second tapered tube, and a third straight tube. The diameter of the second straight tube is smaller than the diameter of the first straight tube, and the diameter of the first straight tube is smaller than the diameter of the third straight tube. The small-diameter ends of the first tapered tube and the second tapered tube are connected to the two ends of the second straight tube, respectively. The large-diameter end of the first tapered tube is connected to one end of the first straight tube. The other end of the first straight tube forms an air inlet. The large-diameter end of the second tapered tube is connected to the third straight tube. One end of the diffuser is threadedly connected to the third straight tube. The other end of the diffuser is evenly distributed with a plurality of air outlet holes. The first straight tube has a first external thread on its exterior.

[0007] Preferably, the diffuser includes a fourth straight tube and a hemispherical wall with an opening. The interior of the hemispherical wall is hollow to form the cavity. The inner wall of the fourth straight tube is a screw thread. One end of the hemispherical wall with the opening is connected to the fourth straight tube. The screw thread is connected to a third straight tube. The air outlets are evenly distributed on the hemispherical wall.

[0008] Preferably, both ends of the fourth straight tube are chamfered along the axial direction.

[0009] Preferably, each connection point of the first straight pipe, the first tapered pipe, the second straight pipe, the second tapered pipe, and the third straight pipe is provided with a chamfer.

[0010] Preferably, both the tube and the diffuser are made of zirconia ceramic.

[0011] Compared with related technologies, the beneficial effects of this utility model are as follows:

[0012] 1. The inlet pipe of the chemical vapor deposition equipment is designed with a variable cross-section channel that gradually decreases in size and then increases again. According to the "narrow tube effect", the flow velocity of gas increases when it flows from an open area to a narrow area. When the reactive gas enters the pipe, the diameter decreases and the flow velocity increases. Then it enters the diffuser and is discharged through multiple outlet holes of the same diameter, so that the gas enters the interior of the reaction chamber more evenly.

[0013] 2. Both the tube body and the diffuser are made of zirconia ceramic material. Zirconia ceramic material has a low thermal conductivity, which can reduce the heat conduction from the reaction chamber to the inlet pipe during the production process, thereby preventing the gas from pre-reacting at the inlet pipe to form a thin film and block the inlet pipe, thus improving the service life of the inlet pipe.

[0014] Third, each connection of the first straight pipe, the first tapered pipe, the second straight pipe, the second tapered pipe and the third straight pipe is provided with a chamfer, and both ends of the fourth straight pipe in the axial direction are provided with a chamfer. The chamfer setting can greatly reduce the occurrence of edge chipping, avoid the intake pipe from cracking due to chipping, and thus improve the service life of the intake pipe.

[0015] Fourth, the air inlet end of the pipe is provided with a first external thread. This external thread section can be connected to the pipe thread in the mixing chamber. It has good self-locking performance and high strength, which can reduce the probability of falling and being damaged, thereby improving the service life of the air inlet pipe. Attached Figure Description

[0016] Figure 1 A schematic diagram of the air inlet pipe of the chemical vapor deposition equipment provided by this utility model;

[0017] Figure 2 This is a schematic diagram of the tube structure;

[0018] Figure 3 This is a schematic diagram of the diffuser structure.

[0019] In the attached diagram: 1. Pipe body; 11. First straight pipe; 111. First external thread; 12. First tapered pipe; 13. Second straight pipe; 14. Second tapered pipe; 15. Third straight pipe; 16. Channel; 17. Air inlet; 18. Second external thread; 2. Diffuser; 21. Fourth straight pipe; 22. Hemispherical wall; 221. Mouth; 23. Air outlet; 24. Cavity. Detailed Implementation

[0020] The present invention will be described in detail below with reference to the accompanying drawings and embodiments. It should be noted that, unless otherwise specified, the embodiments and features described in the embodiments of the present invention can be combined with each other. For ease of description, the terms "upper," "lower," "left," and "right" appearing below only indicate that they correspond to the upper, lower, left, and right directions in the accompanying drawings and do not limit the structure.

[0021] like Figure 1 As shown, the inlet pipe of a chemical vapor deposition apparatus provided in this embodiment includes a pipe body 1 and a diffuser 2 made of zirconia ceramic. As... Figure 2 As shown, the pipe body 1 includes a first straight pipe 11, a first tapered pipe 12, a second straight pipe 13, a second tapered pipe 14, and a third straight pipe 15. The first straight pipe 11 has a first external thread 111 on its exterior for communicating with a pipe (not shown) in the mixing chamber, so that the process gas mixed in the mixing chamber enters the inlet pipe and is then diffused and evenly distributed to the reaction chamber for reaction.

[0022] The diameter of the second straight pipe 13 is smaller than the diameter of the first straight pipe 11, and the diameter of the first straight pipe 11 is smaller than the diameter of the third straight pipe 15. The small-diameter ends of the first tapered pipe 12 and the second tapered pipe 14 are connected to the two ends of the second straight pipe 13, and the large-diameter end of the first tapered pipe 12 is connected to one end of the first straight pipe 11. The other end of the first straight pipe 11 forms an air inlet 17. The large-diameter end of the second tapered pipe 14 is connected to one end of the third straight pipe 15, and the outer surface of the other end of the third straight pipe 15 is provided with a second external thread 18. Thus, the interior of the pipe body 1 forms a channel 16 with a variable cross-section that decreases in size and then increases again.

[0023] like Figure 3 As shown, the diffuser 2 includes a fourth straight tube 21 and a hemispherical wall 22 with an opening 221. The interior of the hemispherical wall 22 is hollow, forming the cavity 24. The inner wall of the fourth straight tube 21 is threaded, and one end of the hemispherical wall 22 with the opening 221 is integrally connected to the fourth straight tube 21. The air outlets 23 are evenly distributed on the hemispherical wall 22.

[0024] like Figures 1-3 As shown, the threaded end of the fourth straight pipe 21 is connected to the second external thread 18 on the third straight pipe 15. Gas passes through the variable cross-section channel 16 and is then ejected through the diffuser 2, allowing the gas to uniformly enter the reaction chamber for reaction. The air inlet 17, channel 16, cavity 24, and air outlet 23 are interconnected. Both ends of the fourth straight pipe 21 are chamfered. Chamfers are also provided at each connection point of the first straight pipe 11, the first tapered pipe 12, the second straight pipe 13, the second tapered pipe 14, and the third straight pipe 15.

[0025] Using alumina ceramic material to make the intake pipe has a low thermal conductivity, which can reduce the heat transfer from the reaction chamber to the intake pipe during the production process. This prevents the gas from pre-reacting at the intake pipe to form a thin film that could clog it, thus improving the service life of the intake pipe.

[0026] The above description is merely an embodiment of this utility model and does not limit the patent scope of this utility model. Any equivalent structural or procedural transformations made based on the content of this utility model specification and drawings, or direct or indirect applications in other related technical fields, are similarly included within the patent protection scope of this utility model.

Claims

1. An inlet pipe for a chemical vapor deposition apparatus, characterized in that, The device includes a tube and a diffuser. The diffuser has a cavity inside. The tube has a channel with a variable cross-section that decreases in size and then increases in size. One end of the tube forms an air inlet, and the other end of the tube is threaded to the diffuser. The diffuser has multiple air outlets evenly distributed on it. The diffuser has a cavity inside, and the air inlet, channel, cavity, and air outlets are connected. The tube has a first external thread on the outside of the end with the air inlet.

2. The inlet pipe of the chemical vapor deposition apparatus according to claim 1, characterized in that, The tube body includes a first straight tube, a first tapered tube, a second straight tube, a second tapered tube, and a third straight tube. The diameter of the second straight tube is smaller than the diameter of the first straight tube, and the diameter of the first straight tube is smaller than the diameter of the third straight tube. The small-diameter ends of the first tapered tube and the second tapered tube are connected to the two ends of the second straight tube, respectively. The large-diameter end of the first tapered tube is connected to one end of the first straight tube. The other end of the first straight tube forms an air inlet. The large-diameter end of the second tapered tube is connected to the third straight tube. One end of the diffuser is threaded to the third straight tube, and the other end of the diffuser is evenly distributed with multiple air outlets. The first straight tube has a first external thread on its exterior.

3. The inlet pipe of the chemical vapor deposition apparatus according to claim 2, characterized in that, The diffuser includes a fourth straight tube and a hemispherical wall with an opening. The interior of the hemispherical wall is hollow to form the cavity. The inner wall of the fourth straight tube is a screw thread. One end of the hemispherical wall with the opening is connected to the fourth straight tube. The screw thread is connected to a third straight tube. The air outlets are evenly distributed on the hemispherical wall.

4. The inlet pipe of the chemical vapor deposition apparatus according to claim 3, characterized in that, Both ends of the fourth straight pipe are chamfered along the axial direction.

5. The inlet pipe of the chemical vapor deposition apparatus according to claim 2, characterized in that, Each connection point of the first straight pipe, the first tapered pipe, the second straight pipe, the second tapered pipe, and the third straight pipe is chamfered.

6. The inlet pipe of the chemical vapor deposition apparatus according to claim 1, characterized in that, Both the tube and the diffuser are made of zirconia ceramic.

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