Depth micrometer indication error testing fixture
By designing a depth micrometer indication error gauge, and adopting a vertically set measuring plate and gauge block structure, parallax error is eliminated, and the locking unit fixes the depth micrometer. This solves the mechanical wear and parallax problems of existing gauges during testing, and achieves efficient and accurate measurement.
Patent Information
- Application Number
- CN202521705389.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-08-12
- Publication Date
- 2026-06-09
- Estimated Expiration
- 2035-08-12
AI Technical Summary
Existing depth micrometer indication error gauges are susceptible to mechanical wear during testing, leading to poor coaxiality. Furthermore, they rely on manual alignment of the scale lines, resulting in parallax errors and making accurate measurements impossible.
A depth micrometer indication error gauge was designed, comprising a gauge base, support legs, a testing mechanism, and a locking unit. The gauge eliminates parallax error by using a vertically set depth micrometer measuring plate, baffle, and standard gauge block, and the locking unit fixes the depth micrometer to prevent shaking.
It improves the reliability and efficiency of testing, eliminates parallax errors caused by manually aligning scale lines, ensures that the measuring end is parallel to the standard gauge block, reduces operating steps, and improves testing accuracy and stability.