High-precision metal etching processing device

By adjusting and mixing the high-precision metal etching processing device, the problems of residue adhesion and uneven corrosion liquid in metal etching are solved, and the high efficiency and precision etching effect in the etching zone is achieved.

CN224395027UActive Publication Date: 2026-06-23XINKAI METAL TECHNOLOGY (CHONGQING) CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
XINKAI METAL TECHNOLOGY (CHONGQING) CO LTD
Filing Date
2025-07-29
Publication Date
2026-06-23

AI Technical Summary

Technical Problem

In existing metal etching technologies, residues generated during the corrosion process tend to adhere, resulting in incomplete patterns and fonts, and it is impossible to etch patterns and fonts at different depths.

Method used

A high-precision metal etching processing device is used. An etching zone is formed by adjusting the mechanism, and the etching solution is brushed and stirred by a mixing mechanism to ensure that the metal parts in the etching zone are etched with patterns and text of different depths one by one.

Benefits of technology

It achieves effective removal of residues and uniformity of the etching solution during the etching process, ensuring that the metal parts in the etching area can be etched with patterns and text at different depths, avoiding problems such as insufficient etching and inconsistent depth.

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Abstract

The utility model discloses a high-precision metal etching processing device, including the device box, the both sides inner wall top of device box all has opened the chute, the movable clamping of chute has the slide, the fixed mounting of slideboard between has the placing plate, the movable placing metal piece in placing plate, the both sides installation of placing plate has the adjusting mechanism, the device box of chute below installs the mixing mechanism, and the metal piece is placed on the placing plate, and the metal piece is pressed tightly through the adjusting mechanism, and the area of the same etching degree is exposed, and the rest part is shielded, and the metal piece is put into the device box downwards, and the slide of slide groove is clamped, and the corrosion liquid in the device box carries out the corrosion to the exposed area, and the mixing mechanism stirs the corrosion liquid and makes it always even, and the etching area is brushed, avoids the residue and remains in the metal piece, guarantees the etching to be sufficient, like this, adjusts the exposed area to can etch out the different depth font and pattern.
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Description

Technical Field

[0001] This utility model relates to the field of metal etching technology, and in particular to a high-precision metal etching processing device. Background Technology

[0002] Metal etching is a process in which a portion of the metal surface is wrapped with a protective film and then immersed in an etching solution. The etching solution corrodes the unprotected areas of the metal, thereby creating the designed pattern or font.

[0003] Currently, in etching processes, metal plates are directly wrapped with a protective film according to the design and then immersed in the etching solution. During the etching process, some insoluble residues are generated. Once these residues adhere to the etched area, the final etched patterns and fonts will be incomplete. Furthermore, the depth of the etched fonts and patterns will be the same after immersion in the etching solution, making it impossible to etch patterns and fonts of different depths. Utility Model Content

[0004] The purpose of this invention is to address the shortcomings of existing technologies by proposing a high-precision metal etching processing device.

[0005] To achieve the above objectives, the present invention adopts the following technical solution:

[0006] A high-precision metal etching processing device includes a device box. The top of the inner walls on both sides of the device box is provided with a sliding groove. A sliding plate is movably engaged in the sliding groove. A placement plate is fixedly installed between the sliding plates. A metal part is movably placed in the placement plate. Adjustment mechanisms are installed on both sides of the placement plate. A mixing mechanism is installed in the device box below the sliding groove.

[0007] Preferably, the placement plate has a placement groove, the metal part is placed in the placement groove, the side of the slide away from the placement groove is fixedly installed with a handle, and the bottom of the side wall of the device box is fixedly fitted with a drain pipe with a valve.

[0008] Preferably, the adjusting mechanism includes a sealing plate, with multiple sealing plates at both ends of the placement groove. The sidewalls of the sealing plates are in contact with each other. A through groove is opened at the end of the sealing plate away from the placement groove. Fixed posts are fixedly installed at both ends of the placement plate. The fixed posts movably pass through the through groove. A toothed groove is opened at the top of the through groove. A toothed block is slidably sleeved on the fixed post. The toothed block movably engages with the toothed groove. A limit groove is opened on the fixed post. A limit block is fixedly installed on the inner wall of the toothed block. The limit block movably engages with the limit groove. A locking nut is threaded onto the fixed post.

[0009] Preferably, an anti-corrosion rubber pad is fixedly installed at the bottom of one end of the sealing plate near the placement groove, and the anti-corrosion rubber pad is tightly pressed against the metal part. An etching area is formed between the end faces of the sealing plate. The height of the tooth block and the tooth groove are both half the height of the through groove. The width of the locking nut is greater than the width of the tooth groove.

[0010] Preferably, the mixing mechanism includes a sliding frame, which is slidably disposed within the inner cavity of the device box at the bottom of the chute. Guide rods are fixedly installed at both ends of the sliding frame, and the guide rods slidably pass through the device box. An electric push rod is fixedly installed on the outer wall of one end of the device box, and the output rod of the electric push rod is fixedly connected to a guide rod. Multiple crossbars are fixedly installed on the inner wall of the sliding frame, and soft brush bristles are fixedly installed on the top of the crossbars. Multiple mixing plates are fixedly installed on the bottom of the crossbars.

[0011] The high-precision metal etching processing device proposed in this utility model has the following advantages:

[0012] Unscrew the locking nut. At this point, the sealing plate and toothed block can be removed from the fixing post, making it easier to place the metal part into the placement slot. Then, attach the sealing plate to the fixing post, ensuring the side walls of the sealing plate fit tightly. The end face of the sealing plate for areas that do not need etching should be pressed tightly, while the end face of the sealing plate for areas to be etched should not be pressed, thus forming an etching area. After adjusting the size of the etching area according to the etching needs, attach the toothed block to the fixing post and engage the toothed groove. Finally, tighten the locking nut and press it onto the toothed block and sealing plate, thus locking the sealing plate. The anti-corrosion rubber pad presses the metal part tightly. In this way, when the metal part is immersed in the etching solution, only the metal part in the etching area will be corroded. This allows for etching different positions of the metal part one by one as needed, achieving different depths of pattern and text etching.

[0013] During the etching process, the metal part is immersed in the etching solution. The electric push rod drives the sliding frame to move back and forth, so the soft bristles can brush the metal part in the etching area, brush off the insoluble residue, and avoid residue adhesion that would lead to insufficient etching. In addition, the back and forth movement of the mixing plate can stir the etching solution to ensure that the composition of the etching solution is uniform and to avoid uneven distribution of the etching solution due to the decrease in concentration after the etching reaction. Attached Figure Description

[0014] Figure 1 This is a schematic diagram of the structure of a high-precision metal etching processing device proposed in this utility model;

[0015] Figure 2 This is a schematic diagram of the adjustment mechanism proposed in this utility model after adjustment.

[0016] Figure 3 This is an exploded view of a portion of the structure of the adjustment mechanism proposed in this utility model;

[0017] Figure 4The present utility model proposes Figure 3 Enlarged structural diagram at point A in the middle;

[0018] Figure 5 This is a schematic diagram of the mixing mechanism proposed in this utility model;

[0019] In the diagram: 1. Device box; 2. Slide groove; 3. Slide plate; 4. Placement plate; 41. Placement slot; 5. Adjustment mechanism; 51. Sealing plate; 52. Through slot; 53. Fixing column; 54. Gear groove; 55. Gear block; 56. Limiting slot; 57. Limiting block; 58. Locking nut; 6. Mixing mechanism; 61. Sliding frame; 62. Crossbar; 63. Soft brush bristles; 64. Mixing plate; 65. Guide rod; 66. Electric push rod; 7. Metal parts; 8. Etched area Detailed Implementation

[0020] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present utility model. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments.

[0021] In the description of this utility model, it should be understood that the terms "upper", "lower", "front", "rear", "left", "right", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.

[0022] Reference Figure 1 This application provides a high-precision metal etching processing device, including a device box 1. Slide grooves 2 are formed on the top of the inner walls on both sides of the device box 1. Slide plates 3 are movably engaged within the slide grooves 2. Placement plates 4 are fixedly installed between the slide plates 3. Metal parts 7 are movably placed within the placement plates 4. Adjustment mechanisms 5 are installed on both sides of the placement plates 4. A mixing mechanism 6 is installed inside the device box 1 below the slide grooves 2. The metal parts 7 are placed on the placement plates 4, and the adjustment mechanisms 5 press the metal parts 7 firmly, exposing areas of the same etching degree while covering the remaining areas. The metal parts 7 are then placed face down into the device box 1. The slide plates 3 engage with the slide grooves 2. The etching solution inside the device box 1 etches the exposed areas. The mixing mechanism 6 stirs the etching solution to ensure uniformity and brushes the etched areas to prevent residue from remaining on the metal parts 7, ensuring thorough etching. Thus, by adjusting the exposed areas, different depths of lettering and patterns can be etched.

[0023] Reference Figure 1The placement plate 4 has a placement groove 41, and the metal part 7 is placed in the placement groove 41. The side of the slide plate 3 away from the placement groove 41 is fixedly installed with a handle. The bottom of the side wall of the device box 1 is fixedly fitted with a drain pipe with a valve. The handle makes it easy to take out and put into the placement plate 4, and the drain pipe makes it easy to discharge the waste liquid after processing.

[0024] Reference Figures 1 to 4 The adjusting mechanism 5 includes a sealing plate 51. Multiple sealing plates 51 are provided at both ends of the placement groove 41, with their sidewalls abutting against each other. A through groove 52 is opened at the end of the sealing plate 51 furthest from the placement groove 41. Fixing posts 53 are fixedly installed at both ends of the placement plate 41, movably penetrating the through groove 52. A toothed groove 54 is opened at the top of the through groove 52. A toothed block 55 is slidably sleeved on the fixing post 53, engaging the toothed groove 54. A limiting groove 56 is opened on the fixing post 53, and a limiting block 57 is fixedly installed on the inner wall of the toothed block 55, engaging the limiting groove 56. A locking nut 58 is threaded onto the fixing post 53. An anti-corrosion rubber pad is fixedly installed at the bottom end of the sealing plate 51 near the placement groove 41, and the anti-corrosion rubber pad is tightly pressed against the metal part 7. An etching area 8 is formed between the end faces of the sealing plate 51. The height of the toothed block 55 and the toothed groove 54 are both half the height of the through groove 52. The locking nut... The width of the female part 58 is greater than the width of the tooth groove 54. When the locking nut 58 is unscrewed, the sealing plate 51 and the tooth block 55 can be removed from the fixing post 53, making it easier to put the metal part 7 into the placement groove 41. Then, the sealing plate 51 is fitted onto the fixing post 53, and the side wall of the sealing plate 51 is tightly fitted. The end face of the sealing plate 51 in the area that does not need to be etched is fitted tightly, while the end face of the sealing plate 51 in the etched area is not fitted, thus forming the etching area 8. After adjusting the size of the etching area 8 according to the etching needs, the tooth block 55 is fitted onto the fixing post 53 and snapped into the tooth groove 54. Finally, the locking nut 58 is tightened and pressed onto the tooth block 55 and the sealing plate 51, thereby locking the sealing plate 51. The anti-corrosion rubber pad presses the metal part 7 tightly. In this way, after the metal part 7 is immersed in the etching liquid, only the metal part 7 in the etching area 8 will be etched, so that different positions of the metal part 7 can be etched one by one as needed to achieve different depths of pattern and text etching.

[0025] Reference Figure 1 and Figure 5The mixing mechanism 6 includes a sliding frame 61. The sliding frame 61 is slidably installed in the inner cavity of the device box 1 at the bottom of the trough 2. Guide rods 65 are fixedly installed at both ends of the sliding frame 61. The guide rods 65 slide through the device box 1. An electric push rod 66 is fixedly installed on the outer wall of one end of the device box 1. The output rod of the electric push rod 66 is fixedly connected to a guide rod 65. Multiple crossbars 62 are fixedly installed in the inner wall of the sliding frame 61. Soft brush bristles 63 are fixedly installed on the top of the crossbars 62. Multiple mixing plates 64 are fixedly installed on the bottom of the crossbars 62. During the etching process, the metal part 7 is immersed downward into the etching solution. The electric push rod 66 drives the sliding frame 61 to move back and forth. The soft brush bristles 63 can brush the metal part 7 in the etching area 8, brushing off the insoluble residue and avoiding residue adhesion that leads to insufficient etching. In addition, the back and forth movement of the mixing plates 64 can stir the etching solution, ensuring that the composition of the etching solution is uniform and avoiding uneven distribution of the etching solution caused by the decrease in concentration after the reaction in the etching area 8.

[0026] Working principle: Unscrew the locking nut 58. At this time, the sealing plate 51 and the toothed block 55 can be removed from the fixing post 53, making it easier to place the metal part 7 into the placement groove 41. Then, the sealing plate 51 is fitted onto the fixing post 53, with the side walls of the sealing plate 51 fitting tightly. The end face of the sealing plate 51 in the areas that do not need etching is fitted tightly, while the end face of the sealing plate 51 in the etching areas is not fitted, thus forming the etching area 8. After adjusting the size of the etching area 8 according to the etching requirements, the toothed block 55 is fitted onto the fixing post 53 and engaged with the toothed groove 54. Finally, the locking nut 58 is tightened, pressing it onto the toothed block 55 and the sealing plate 51, thereby locking the sealing plate 51 and pressing the anti-corrosion rubber gasket tightly against the metal part 7. Thus, after the metal part 7 is immersed in the etching solution, only the metal part 7 in the etching area 8 will be etched. This allows for etching of different positions of the metal part 7 as needed, achieving different depths of pattern and text etching. During the etching process, as the metal part 7 is immersed in the etching solution, the electric push rod 66 drives the sliding frame 61 to move back and forth. The soft brush bristles 63 can then brush the metal part 7 in the etching area 8, removing insoluble residues and preventing residue adhesion that could lead to insufficient etching. Furthermore, the back-and-forth movement of the mixing plate 64 can stir the etching solution, ensuring uniform composition and preventing uneven distribution of the etching solution caused by a decrease in concentration after the reaction in the etching area 8.

[0027] The above description is only a preferred embodiment of the present utility model, but the protection scope of the present utility model is not limited thereto. Any equivalent substitutions or changes made by those skilled in the art within the technical scope disclosed in the present utility model, based on the technical solution and the inventive concept of the present utility model, should be included within the protection scope of the present utility model.

Claims

1. A high-precision metal etching processing apparatus, comprising an apparatus housing (1), characterized in that, The top of the inner walls on both sides of the device box (1) is provided with a sliding groove (2), a sliding plate (3) is movably engaged in the sliding groove (2), a placement plate (4) is fixedly installed between the sliding plates (3), a metal part (7) is movably placed in the placement plate (4), an adjustment mechanism (5) is installed on both sides of the placement plate (4), and a mixing mechanism (6) is installed in the device box (1) below the sliding groove (2).

2. The high-precision metal etching processing apparatus according to claim 1, characterized in that, The placement plate (4) has a placement groove (41), the metal part (7) is placed in the placement groove (41), the sliding plate (3) is fixedly installed with a handle on the side away from the placement groove (41), and the bottom of the side wall of the device box (1) is fixedly fitted with a drain pipe with a valve.

3. The high-precision metal etching processing apparatus according to claim 2, characterized in that, The adjustment mechanism (5) includes a sealing plate (51). Multiple sealing plates (51) are provided at both ends of the placement groove (41). The side walls of the sealing plates (51) are in contact with each other. A through groove (52) is opened at the end of the sealing plate (51) away from the placement groove (41). Fixed posts (53) are fixedly installed at both ends of the placement plate (4). The fixed posts (53) are movably inserted through the through groove (52). A toothed groove (54) is opened at the top of the through groove (52). A toothed block (55) is slidably sleeved on the fixed post (53). The toothed block (55) is movably engaged with the toothed groove (54). A limit groove (56) is opened on the fixed post (53). A limit block (57) is fixedly installed on the inner wall of the toothed block (55). The limit block (57) is movably engaged with the limit groove (56). A locking nut (58) is threaded on the fixed post (53).

4. The high-precision metal etching processing apparatus according to claim 3, characterized in that, The sealing plate (51) has a corrosion-resistant rubber pad fixedly installed at the bottom of one end near the placement groove (41), and the corrosion-resistant rubber pad is tightly pressed on the metal part (7). An etching area (8) is formed between the end faces of the sealing plate (51).

5. The high-precision metal etching processing apparatus according to claim 3, characterized in that, The height of the tooth block (55) and the tooth groove (54) are both half the height of the through groove (52), and the width of the locking nut (58) is greater than the width of the tooth groove (54).

6. The high-precision metal etching processing apparatus according to claim 1, characterized in that, The mixing mechanism (6) includes a sliding frame (61). The sliding frame (61) is slidably disposed in the inner cavity of the device box (1) at the bottom of the chute (2). Guide rods (65) are fixedly installed at both ends of the sliding frame (61). The guide rods (65) slide through the device box (1). An electric push rod (66) is fixedly installed on the outer wall of one end of the device box (1). The output rod of the electric push rod (66) is fixedly connected to a guide rod (65). Multiple crossbars (62) are fixedly installed in the inner wall of the sliding frame (61). Soft brush bristles (63) are fixedly installed on the top of the crossbars (62). Multiple mixing plates (64) are fixedly installed on the bottom of the crossbars (62).