Crystalline pulverizing device

Abstract

The crystallization crushing device comprises a water washing tower, a first water pump, a communication hole, a crystallization collecting plate and a high-pressure water curtain system. The water washing tower is arranged above a water tank of a water washing type tail gas treater. The first water pump is communicated with the water washing tower and the water tank through a first connecting pipe to draw the liquid with residual crystallization in the water tank into the water washing tower. The communication hole is located between the top of the water tank and the bottom of the water washing tower to communicate the water tank and the water washing tower. The crystallization collecting plate is obliquely arranged in the water tank, and comprises an inlet end and an outlet end. The inlet end is located directly below the communication hole and is higher than the outlet end. The outlet end is located above the liquid in the water tank. The high-pressure water curtain system comprises a high-pressure water curtain and a water curtain water supply tank. The water curtain water supply tank is communicated with the high-pressure water curtain to supply water to the high-pressure water curtain. The high-pressure water curtain is arranged in the water tank and located at the top of the water tank. The high-pressure water curtain has at least one spray head, and the spray head faces the outlet end of the crystallization collecting plate. The dissolution efficiency of the residual crystallization can be improved.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor equipment technology, and more specifically, to a crystallization crushing device. Background Technology

[0002] In the semiconductor industry, exhaust gases containing harmful substances are generated during the production process of atmospheric pressure epitaxial growth equipment. To treat these exhaust gases, water-washing exhaust gas processors are typically used. These processors contain a tank filled with liquid containing residual TCS (silicon trichloride) crystals. TCS is a chemical commonly used in semiconductor manufacturing, but some residual crystals are produced during production. Some of these crystals dissolve in the liquid in the tank, but a significant portion remains undissolved. To accelerate the dissolution of these crystals, a water-washing tower is pumped from the tank into the tower. Inside the tower, there are small balls designed to increase the contact area between the liquid and the crystals, thereby accelerating the dissolution rate. However, existing technologies have several problems in handling these crystals. First, undissolved crystals float on the surface, resulting in a small contact area between the crystals and water, leading to low reaction efficiency. Second, the existing method of using a jetting device with a single nozzle to break up the crystals is inefficient and cannot effectively break large crystals into smaller particles. This not only affects the dissolution rate of the crystals but also reduces the overall efficiency of the reaction. Utility Model Content

[0003] In view of the problems existing in the prior art described above, this application provides a crystallization crushing device that can improve the dissolution efficiency of residual crystals.

[0004] To achieve the above and other related objectives, this utility model provides a crystallization and pulverization device, comprising:

[0005] A water washing tower is installed above the water tank of the water washing exhaust gas processor;

[0006] The first water pump is connected to the water washing tower and the water tank through the first connecting pipe, so as to pump the liquid with residual crystals in the water tank into the water washing tower.

[0007] A connecting hole is located between the top of the water tank and the bottom of the water washing tower to connect the water tank and the water washing tower.

[0008] A crystallization collection plate is installed at an angle inside the water tank. The crystallization collection plate includes an inlet end and an outlet end. The inlet end is located directly below the connecting hole and higher than the outlet end, while the outlet end is located above the liquid in the water tank.

[0009] A high-pressure water curtain system includes a high-pressure water curtain and a water curtain supply tank. The water curtain supply tank is connected to the high-pressure water curtain to supply water to the high-pressure water curtain. The high-pressure water curtain is located inside the water tank and at the top of the water tank. The high-pressure water curtain has at least one nozzle facing the outlet end of the crystallization collection plate.

[0010] Optionally, the high-pressure water curtain includes multiple evenly distributed jet heads.

[0011] Optionally, the angle of the spray head is adjustable.

[0012] Optionally, the spray angle of the spray head can be adjusted between 15° and 45°.

[0013] Optionally, the crystallization collection plate includes:

[0014] The base plate is inclinedly set on the side wall of the water tank and located below the connecting hole. The projection of the connecting hole on the base plate is completely inside the base plate.

[0015] Multiple side plates are respectively set on the other sides of the bottom plate except for the side where the outlet end is located, and at least one side plate is provided with filter gaps.

[0016] Optionally, the width of the filter slits on the side plate of the crystallization collection plate ranges from 0.5 mm to 5 mm.

[0017] Optionally, the tilt angle of the crystallization collection plate is between 0 and 90°.

[0018] Optionally, the high-pressure water curtain system also includes:

[0019] At least one water inlet is installed on the high-pressure water curtain;

[0020] The second water pump is connected to the water inlet and the water curtain supply tank via the second connecting pipe.

[0021] Optionally, the crystallization and crushing apparatus further includes:

[0022] The control unit is communicatively connected to the first water pump and the second water pump to adjust the operating parameters of the first water pump and the second water pump. The operating parameters include at least one of flow rate, pressure, and start / stop status.

[0023] Optionally, the flow rate adjustment range of both the first and second water pumps is 10L / min to 100L / min.

[0024] As described above, the crystallization and pulverizing device provided by this utility model has at least the following beneficial technical effects:

[0025] The crystallization and crushing device of this invention includes a water washing tower, a first water pump, a connecting hole, a crystallization collection plate, and a high-pressure water curtain system. The water washing tower is positioned above the water tank of the water-washing exhaust gas processor. The first water pump is connected to both the water washing tower and the water tank via a first connecting pipe to pump liquid containing residual crystals from the water tank into the water washing tower. The connecting hole is located between the top of the water tank and the bottom of the water washing tower to connect the two, ensuring smooth liquid flow between them. The crystallization collection plate is installed at an angle inside the water tank. The crystallization collection plate includes an inlet end and an outlet end. The inlet end is located directly below the connecting hole and higher than the outlet end, while the outlet end is located above the liquid in the water tank. The high-pressure water curtain system includes a high-pressure water curtain and a water curtain supply tank. The water curtain supply tank is connected to the high-pressure water curtain to supply water to it. The high-pressure water curtain is located inside and at the top of the water tank, and it has at least one nozzle facing the outlet end of the crystallization collection plate. Large crystal particles are broken up by the high-pressure water flow, promoting crystal dissolution. The crystallization and pulverizing device of this application can significantly improve the dissolution efficiency of residual crystals. Attached Figure Description

[0026] Figure 1 The diagram shown is a structural schematic of the crystallization and pulverizing device provided by this utility model.

[0027] Figure 2 The diagram shown is a structural schematic of the crystallization collection plate provided by this utility model.

[0028] Figure 3 The diagram shown is a structural schematic of the high-pressure water curtain provided by this utility model.

[0029] Figure Labels

[0030] 1. Water washing tower; 2. Water tank; 21. Crystallization collection plate; 211. Inlet end; 212. Outlet end; 213. Bottom plate; 214. Side plate; 2141. Filter gap; 3. Connecting hole; 4. High-pressure water curtain system; 41. High-pressure water curtain; 411. Jet head; 412. Water inlet; 42. Water curtain supply tank; 5. First connecting pipe; 6. First water pump; 7. Second connecting pipe; 8. Second water pump. Detailed Implementation

[0031] The following specific examples illustrate the implementation of this utility model. Those skilled in the art can easily understand other advantages and effects of this utility model from the content disclosed in this specification. This utility model can also be implemented or applied through other different specific embodiments, and various details in this specification can also be modified or changed based on different viewpoints and applications without departing from the spirit of this utility model.

[0032] It should be noted that the illustrations provided in this embodiment are only schematic representations of the basic concept of this utility model. Although the illustrations only show components related to this utility model and are not drawn according to the actual number, shape and size of the components, the shape, quantity, positional relationship and proportion of each component can be arbitrarily changed under the premise of realizing the technical solution of this utility model, and the layout of the components may also be more complex.

[0033] This embodiment provides a crystallization and pulverization device for a water-washing type exhaust gas processor, referring to... Figures 1 to 3 It includes a water washing tower 1, a first water pump 6, a connecting hole 3, a crystallization collection plate 21, and a high-pressure water curtain system 4.

[0034] Reference Figure 1 The water washing tower 1 is positioned above the water tank 2 of the water-washing exhaust gas processor. A first water pump 6 is connected to both the water washing tower and the water tank 2 via a first connecting pipe 5, drawing liquid containing residual crystals from the water tank 2 into the water washing tower 1. This ensures the liquid circulates within the crystallization and crushing device, maintaining the continuous operation of the treatment process. The main function of the water washing tower 1 is to increase the contact area between the liquid and the residual crystals through internal structures such as packed balls, promoting the dissolution of the residual crystals. The flow rate of the first water pump 6 is adjustable from 10 L / min to 100 L / min, allowing for flexible adjustment based on actual operating conditions.

[0035] Reference Figure 1 The connecting hole 3 is located between the top of the water tank 2 and the bottom of the water washing tower 1, connecting the two. Liquid containing residual crystals entering the water washing tower 1 from the water tank 2 undergoes partial dissolution in the water washing tower 1, and the remaining undissolved crystals re-enter the water tank 2 from the water washing tower 1 through the connecting hole 3. The design of the connecting hole 3 ensures smooth flow of liquid between the water washing tower 1 and the water tank 2, while also helping to maintain pressure balance within the crystallization crushing device.

[0036] Reference Figure 1 and Figure 2The crystallization collection plate 21 is installed at an angle inside the water tank 2. This angled installation allows the crystallization collection plate 21 to effectively guide the flow of liquid and undissolved crystals, thereby optimizing the overall treatment effect of the device. The crystallization collection plate 21 includes an inlet end 211 and an outlet end 212. The inclination angle of the crystallization collection plate 21 is between 0° and 90°. This range of inclination angles is carefully designed to ensure that the crystallization collection plate 21 can work effectively under different operating conditions. The inlet end 211 is located directly below the connecting hole 3 and above the outlet end 212. This position design allows the liquid flowing in from the water washing tower 1 through the connecting hole 3 to directly enter the crystallization collection plate 21, thus beginning its guidance and treatment process. The outlet end 212 is located above the liquid in the water tank 2. This design allows the treated liquid and crystals to flow smoothly out of the crystallization collection plate 21 and into the water tank 2 for further treatment. Specifically, the crystallization collection plate 21 includes a bottom plate 213 and multiple side plates 214. The base plate 213 is inclinedly disposed on the side wall of the water tank 2 and located below the connecting hole 3. The projection of the connecting hole 3 onto the base plate 213 is entirely within the base plate 213. This design ensures that the liquid flowing in from the connecting hole 3 can completely fall onto the base plate 213, thus initiating its flow process on the crystallization collection plate 21. Multiple side plates 214 are respectively disposed on the sides of the base plate 213 other than the side where the outlet end 212 is located. This layout not only increases the structural stability of the crystallization collection plate 21 but also effectively prevents large crystal particles from overflowing from the sides, ensuring that large crystal particles can flow along a predetermined path. At least one side plate 214 is provided with a filter slit 2141. The width of the filter slit 2141 on the side plate 214 of the crystallization collection plate 21 ranges from 0.5 mm to 5 mm. This width range is designed to allow small crystal particles and liquid to pass smoothly while blocking large crystal particles. This design ensures that large crystal particles must pass through the outlet end 212 of the crystallization collection plate 21 before flowing into the water tank 2, thus guaranteeing that large crystal particles are fully crushed. In this way, the crystallization collection plate 21 can not only effectively guide the flow of liquid and undissolved crystals, but also perform preliminary screening and processing of crystals, improving the working efficiency and processing effect of the entire crystallization crushing device.

[0037] Reference Figure 1 and Figure 3The high-pressure water curtain system 4 includes a high-pressure water curtain 41 and a water supply tank 42. The water supply tank 42 is connected to the high-pressure water curtain 41 to supply water to the high-pressure water curtain 41. The high-pressure water curtain 41 is located inside the water tank 2 and at the top of the water tank 2. The high-pressure water curtain 41 has at least one spray head 411, which faces the outlet end 212 of the crystallization collection plate 21. To further improve the crushing efficiency, preferably, the high-pressure water curtain 41 is equipped with multiple evenly distributed spray heads 411. The design of the spray head 411 is crucial. The spray head 411 can not only generate high-pressure water flow, but its angle can also be adjusted according to the actual working conditions. The adjustment range of the spray angle of the spray head 411 is between 15° and 45°. This adjustability allows the operator to flexibly adjust the spray angle of the spray head 411 according to the size of the crystals, the flow rate of the liquid, and the specific conditions inside the water washing tower 1 to achieve the best crushing effect. For example, when processing larger crystal particles, the spray angle can be appropriately increased to enhance the impact force of the water flow; while when processing smaller crystal particles, the spray angle can be decreased to avoid excessive crushing and resource waste. Furthermore, the high-pressure water curtain system 4 is equipped with at least one water inlet 412. The second water pump 8 is connected to the water inlet 412 and the water curtain supply tank 42 via a second connecting pipe 7 to ensure the stable operation of the high-pressure water curtain system 4. The flow rate adjustment range of the second water pump 8 is 10L / min to 100L / min, allowing for flexible adjustment of the flow rate according to actual needs, ensuring the efficient operation of the high-pressure water curtain system. The working principle of the high-pressure water curtain system 4 is to spray water from the spray head 411 to the outlet end 212 of the crystallization collection plate 21. When the liquid carrying residual crystals flows through the crystallization collection plate 21 and reaches the outlet end 212, the high-pressure water flow generated by the high-pressure water curtain 41 impacts these large crystal particles. The impact force of the water flow is sufficient to break the large crystal particles into smaller crystal particles, which then flow out with the liquid into the water tank 2. This process not only improves the efficiency of crystallization but also increases the contact area between the crystal and the liquid, thereby accelerating the dissolution rate of the crystal and further enhancing the performance of the entire water-washing exhaust gas processor.

[0038] Reference Figures 1 to 3To achieve precise control of the entire crystallization and pulverization device, a control unit (not shown in the attached diagram) is also included. The control unit is communicatively connected to the first water pump 6 and the second water pump 8 to adjust their operating parameters, including at least one of flow rate, pressure, and start / stop status. Specifically, the control unit can precisely adjust the flow rates of the first water pump 6 and the second water pump 8 based on the liquid level in the water tank 2, the liquid flow rate in the water washing tower 1, and the requirements of the high-pressure water curtain system 4. Furthermore, by monitoring the operating pressures of the first water pump 6 and the second water pump 8 in real time, the control unit can ensure that the first water pump 6 and the second water pump 8 operate within a safe and efficient range. If an abnormal pressure is detected, the control unit can automatically adjust the operating parameters of the first water pump 6 and the second water pump 8, and even shut them down if necessary to prevent equipment damage. In addition, the control unit can automatically control the start and stop of the first water pump 6 and the second water pump 8 according to preset operating times and working conditions. For example, they can be automatically shut down at night or during equipment maintenance to reduce unnecessary energy consumption.

[0039] The above embodiments are merely illustrative of the principles and effects of this utility model and are not intended to limit the scope of this utility model. Any person skilled in the art can modify or alter the above embodiments without departing from the spirit and scope of this utility model. Therefore, all equivalent modifications or alterations made by those skilled in the art without departing from the spirit and technical concept disclosed in this utility model should still be covered by the claims of this utility model.

Claims

1. A crystallization and pulverizing device, characterized in that, include: A water washing tower is installed above the water tank of the water washing exhaust gas processor; The first water pump is connected to the water washing tower and the water tank through the first connecting pipe, so as to pump the liquid with residual crystals in the water tank into the water washing tower. A connecting hole is located between the top of the water tank and the bottom of the water washing tower to connect the water tank and the water washing tower; A crystallization collection plate is installed at an angle inside the water tank. The crystallization collection plate includes an inlet end and an outlet end. The inlet end is located directly below the connecting hole and higher than the outlet end, and the outlet end is located above the liquid in the water tank. A high-pressure water curtain system includes a high-pressure water curtain and a water curtain supply tank. The water curtain supply tank is connected to the high-pressure water curtain to supply water to the high-pressure water curtain. The high-pressure water curtain is disposed inside the water tank and located at the top of the water tank. The high-pressure water curtain has at least one spray head, which faces the outlet end of the crystallization collection plate.

2. The crystallization and pulverizing apparatus according to claim 1, characterized in that, The high-pressure water curtain includes multiple evenly distributed jet heads.

3. The crystallization and pulverizing apparatus according to claim 1, characterized in that, The angle of the spray head is adjustable.

4. The crystallization and pulverizing apparatus according to claim 3, characterized in that, The spray angle adjustment range of the spray head is between 15° and 45°.

5. The crystallization and pulverizing apparatus according to claim 1, characterized in that, The crystallization collection plate includes: The base plate is inclinedly disposed on the side wall of the water tank and located below the connecting hole, and the projection of the connecting hole on the base plate is completely located within the base plate; Multiple side plates are respectively disposed on the other side of the base plate except for the side where the outlet end is located, and at least one of the side plates is provided with a filter gap.

6. The crystallization and pulverizing apparatus according to claim 5, characterized in that, The width of the filter slits on the side plate of the crystallization collection plate ranges from 0.5 mm to 5 mm.

7. The crystallization and pulverizing apparatus according to claim 1, characterized in that, The tilt angle of the crystallization collection plate is between 0 and 90°.

8. The crystallization and pulverizing apparatus according to claim 1, characterized in that, The high-pressure water curtain system also includes: At least one water inlet is provided on the high-pressure water curtain; The second water pump is connected to the water inlet and the water curtain supply tank via a second connecting pipe.

9. The crystallization and pulverizing apparatus according to claim 8, characterized in that, Also includes: The control unit is communicatively connected to the first water pump and the second water pump to adjust the operating parameters of the first water pump and the second water pump, the operating parameters including at least one of flow rate, pressure, and start / stop status.

10. The crystallization and pulverizing apparatus according to claim 8, characterized in that, The flow rate adjustment range of both the first and second water pumps is 10L / min to 100L / min.

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