Phosphorus trichloride tail gas buffer treatment device

By introducing pretreatment and refrigeration mechanisms into the exhaust gas treatment device, the problem of crystal deposition and blockage in the exhaust gas is solved, achieving efficient flow of exhaust gas and compliance with emission standards.

CN224442507UActive Publication Date: 2026-07-03XUZHOU YONGLI FINE CHEM ENG CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
XUZHOU YONGLI FINE CHEM ENG CO LTD
Filing Date
2025-06-18
Publication Date
2026-07-03

AI Technical Summary

Technical Problem

Existing exhaust gas treatment devices lack pretreatment structures, causing crystalline substances such as phosphorous acid and ferric phosphate contained in the exhaust gas to deposit on the inner wall of the pipes, clogging the pipes and reducing flow efficiency.

Method used

A phosphorus trichloride tail gas buffer treatment device was designed, which includes a spray purification chamber, a buffer tank, a pretreatment mechanism and a refrigeration mechanism. The device separates crystalline particles by using a limiting baffle and an electromagnetic one-way valve, and uses a semiconductor cooling plate and an electric fan to cool the tail gas, thereby promoting the precipitation and sedimentation of crystals.

Benefits of technology

It effectively separates and collects crystalline particles, reduces the risk of blockage, improves exhaust gas flow efficiency, and ensures that exhaust gas meets emission standards through neutralization reaction.

✦ Generated by Eureka AI based on patent content.

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Abstract

This utility model discloses a phosphorus trichloride tail gas buffer treatment device, belonging to the field of tail gas treatment technology. Key technical features include a spray purification chamber with a connecting pipe on its left side. A buffer tank is fixedly connected to the left side of the connecting pipe, and an air inlet pipe is fixedly connected to the bottom left side of the buffer tank. A pretreatment mechanism is fixedly connected to the left side of the air inlet pipe, and a refrigeration mechanism is installed at the front of the pretreatment mechanism. The pretreatment mechanism, through a limiting baffle and an electromagnetic one-way valve, separates and collects crystalline particles such as phosphorous acid and ferric phosphate in the tail gas into a collection box at the bottom, reducing the probability of them entering subsequent pipelines and causing blockages. The flared design of the exhaust hopper expands the diffusion area of ​​the cold air, further improving particle settling efficiency. The temperature sensor and PLC controller of the refrigeration mechanism monitor the temperature inside the buffer tank in real time, and the tail gas is cooled below the melting point of the crystals through a semiconductor cooling plate, promoting the early precipitation of crystals.
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Description

Technical Field

[0001] This utility model relates to the field of exhaust gas treatment technology, and in particular to a phosphorus trichloride exhaust gas buffer treatment device. Background Technology

[0002] Phosphorus trichloride is an important chemical raw material with wide applications in industrial production, such as in the manufacture of pesticides like trichlorfon, dichlorvos, and methamidophos, as well as chemical products like phosphorus oxychloride, phosphorous acid, and triphenyl phosphate. The production of phosphorus trichloride generates a large amount of exhaust gas. If directly emitted, the phosphorus trichloride, chlorine, and chlorine-containing acidic gases in these exhaust gases will cause serious environmental pollution and harm human health. It has an irritating and corrosive effect on the skin and mucous membranes, and inhaling large amounts of vapor in a short period can cause upper respiratory tract irritation symptoms.

[0003] To address the aforementioned issues, existing patents have provided solutions. However, existing exhaust gas buffer treatment devices lack a structure for pre-treating exhaust gas. As a result, crystalline substances such as phosphorous acid and ferric phosphate contained in the exhaust gas are easily deposited on the inner wall of the pipe during subsequent cooling and transportation, thereby clogging the pipe and reducing the flow of exhaust gas and reducing treatment efficiency.

[0004] Therefore, a phosphorus trichloride tail gas buffer treatment device is proposed. Utility Model Content

[0005] The purpose of this invention is to provide a phosphorus trichloride tail gas buffer treatment device, which can solve the problem that existing tail gas treatment lacks a structure for pre-treatment of tail gas, resulting in the easy deposition of crystalline substances such as phosphorous acid and ferric phosphate contained in the tail gas on the inner wall of the pipeline during subsequent cooling and transportation, thereby clogging the pipeline, reducing the flow of tail gas and reducing treatment efficiency.

[0006] To achieve the above objectives, the present invention provides the following technical solution: a phosphorus trichloride tail gas buffer treatment device, comprising a spray purification chamber, a connecting pipe connected to the left side of the spray purification chamber, a buffer tank fixedly connected to the left side of the connecting pipe, an air inlet pipe fixedly connected to the bottom of the left side of the buffer tank, a pretreatment mechanism fixedly connected to the left side of the air inlet pipe, and a refrigeration mechanism installed on the front side of the pretreatment mechanism.

[0007] The pretreatment mechanism includes a buffer box, an exhaust gas connection pipe, a limiting partition, a solenoid one-way valve, a guide pipe, an exhaust hopper, and a collection box. The buffer box is fixedly connected to the left side of the intake pipe, the exhaust gas connection pipe is fixedly connected to the bottom of the left side of the buffer box, the limiting partition is welded to the inside of the buffer box, the solenoid one-way valve is installed at the bottom of the limiting partition, the guide pipe is installed at the bottom of the solenoid one-way valve, the exhaust hopper is welded to the bottom of the guide pipe, and the collection box is slidably connected to the bottom of the inside of the buffer box.

[0008] Preferably, the refrigeration mechanism includes a temperature sensor, a fixed plate, several vents, several semiconductor refrigeration plates, a mounting plate, several mounting holes, an electric fan, and a PLC controller, with the temperature sensor installed on the left side of the buffer box.

[0009] Preferably, the detection end on the right side of the temperature sensor extends through and into the inner side of the buffer box, the fixing plate is welded to the inner side of the buffer box, the vent is opened on the inner side of the fixing plate, the semiconductor cooling plate is installed on the top of the fixing plate, and the mounting plate is welded to the top of the inner side of the buffer box.

[0010] Preferably, the mounting hole is located on the inside of the mounting plate, the electric fan is mounted on the inside of the mounting hole, and the PLC controller is mounted on the front of the buffer box.

[0011] Preferably, a handle is welded to the front side of the collection box, and the surface of the handle is engraved with anti-slip texture.

[0012] Preferably, a connecting ring is fixedly connected to the left side surface of the exhaust gas connecting pipe, and a connecting screw hole is provided on the inner side of the connecting ring.

[0013] Preferably, a sealing ring is fixedly connected to the bottom of the guide tube, and the side of the sealing ring away from the guide tube is fixedly connected to the top of the exhaust hopper.

[0014] Preferably, a protective pad is fitted on the bottom of the inner side of the collection box, and the surface of the protective pad is coated with an anti-stick coating.

[0015] Compared with the prior art, the beneficial effects of this utility model are:

[0016] 1. The pretreatment mechanism of this application separates and collects crystalline particles such as phosphorous acid and iron phosphate in the exhaust gas into the collection box at the bottom through the limiting baffle and electromagnetic single-way valve, reducing the probability of them entering the subsequent pipeline and causing blockage. The funnel design of the exhaust hopper expands the diffusion area of ​​cold air and further improves the particle settling efficiency.

[0017] 2. The temperature sensor and PLC controller of the refrigeration mechanism in this application monitor the temperature inside the buffer box in real time. The exhaust gas is cooled to below the melting point of the crystals by the semiconductor refrigeration plate, which promotes the early precipitation of crystals and reduces the risk of pipe blockage from the source. The electric fan and vent accelerate the circulation of cold air, which causes the water vapor in the exhaust gas to condense into liquid water. After combining with particulate matter, the liquid water settles into the collection box, further purifying the exhaust gas. Attached Figure Description

[0018] Figure 1 This is an overall structural diagram of the phosphorus trichloride tail gas buffer treatment device of this utility model.

[0019] Figure 2This is a schematic diagram of the exhaust gas connection pipe of this utility model;

[0020] Figure 3 This is a schematic diagram of the structure of the collection box of this utility model;

[0021] Figure 4 This is a schematic diagram of the refrigeration mechanism of this utility model;

[0022] Figure 5 This is a schematic diagram of the exhaust gas connection pipe of this utility model;

[0023] Figure 6 This is a schematic diagram of the structure of the exhaust hopper of this utility model.

[0024] In the diagram, 1. Spray purification chamber; 2. Connecting pipe; 3. Buffer tank; 4. Inlet pipe; 5. Pretreatment mechanism; 51. Buffer box; 52. Exhaust gas connection pipe; 53. Limiting partition; 54. Electromagnetic one-way valve; 55. Guide pipe; 56. Exhaust hopper; 57. Collection box; 6. Refrigeration mechanism; 61. Temperature sensor; 62. Fixing plate; 63. Vent hole; 64. Semiconductor refrigeration plate; 65. Mounting plate; 66. Mounting hole; 67. Electric fan; 68. PLC controller; 7. Handle; 8. Connecting ring; 9. Connecting screw hole; 10. Sealing ring; 11. Protective pad. Detailed Implementation

[0025] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0026] Please see Figure 1-6 The present invention provides the following technical solution:

[0027] A phosphorus trichloride tail gas buffer treatment device includes a spray purification chamber 1, a connecting pipe 2 connected to the left side of the spray purification chamber 1, a buffer tank 3 fixedly connected to the left side of the connecting pipe 2, an air inlet pipe 4 fixedly connected to the bottom of the left side of the buffer tank 3, a pretreatment mechanism 5 fixedly connected to the left side of the air inlet pipe 4, and a refrigeration mechanism 6 installed in front of the pretreatment mechanism 5.

[0028] The pretreatment mechanism 5 includes a buffer box 51, an exhaust gas connection pipe 52, a limiting partition 53, a solenoid one-way valve 54, a guide pipe 55, an exhaust hopper 56, and a collection box 57. The buffer box 51 is fixedly connected to the left side of the intake pipe 4, the exhaust gas connection pipe 52 is fixedly connected to the bottom of the left side of the buffer box 51, the limiting partition 53 is welded to the inside of the buffer box 51, the solenoid one-way valve 54 is installed at the bottom of the limiting partition 53, the guide pipe 55 is installed at the bottom of the solenoid one-way valve 54, the exhaust hopper 56 is welded to the bottom of the guide pipe 55, and the collection box 57 is slidably connected to the bottom of the inside of the buffer box 51.

[0029] In this embodiment: A spray purification chamber 1, through its internal spray structure, utilizes an alkaline solution to neutralize acidic gases in the exhaust gas, effectively removing harmful substances and ensuring that the exhaust gas meets emission standards, thus reducing environmental pollution. A connecting pipe 2 establishes a stable connection between the spray purification chamber 1 and the buffer tank 3, providing a flow channel for the exhaust gas. The buffer tank 3 buffers the incoming exhaust gas, stabilizing its flow rate and pressure, preventing excessive instantaneous flow or pressure fluctuations from impacting the subsequent spray purification chamber 1. An inlet pipe 4 connects the buffer tank 3 to the pretreatment mechanism 5, allowing the exhaust gas to enter the treatment process. The device includes a channel, a buffer box 51 providing space for exhaust gas pretreatment, allowing sufficient time for impurity separation and preliminary treatment, an exhaust gas connection pipe 52 for connecting to the exhaust gas source pipe, a limiting baffle 53 for isolating the exhaust gas at the bottom of the buffer box 51, an electromagnetic one-way valve 54 for controlling the flow of cold air electrically, and a guide pipe 55 for guiding the cold air to the bottom of the buffer box 51, an exhaust hopper 56 for expanding the exhaust area of ​​the cold air, and a collection box 57 for collecting particulate impurities and condensate that settle in the exhaust gas.

[0030] Specifically, such as Figure 4 As shown, the refrigeration mechanism 6 includes a temperature sensor 61, a fixing plate 62, several vent holes 63, several semiconductor refrigeration plates 64, a mounting plate 65, several mounting holes 66, an electric fan 67, and a PLC controller 68. The temperature sensor 61 is installed on the left side of the buffer box 51.

[0031] Specifically, such as Figure 4 As shown, the detection end of the temperature sensor 61 on the right side extends through and into the inner side of the buffer box 51. The fixing plate 62 is welded to the inner side of the buffer box 51. The vent 63 is opened on the inner side of the fixing plate 62. The semiconductor cooling plate 64 is installed on the top of the fixing plate 62. The mounting plate 65 is welded to the top of the inner side of the buffer box 51.

[0032] Specifically, such as Figure 4 As shown, mounting hole 66 is opened on the inside of mounting plate 65, electric fan 67 is installed on the inside of mounting hole 66, and PLC controller 68 is installed on the front of buffer box 51.

[0033] In this embodiment: a temperature sensor 61 monitors the exhaust gas temperature inside the buffer box 51 in real time and feeds the data back to the PLC controller 68. A fixing plate 62 is used to fix the semiconductor cooling plate 64 and can support and limit the vent 63. The vent 63 allows cold air to pass smoothly through the fixing plate 62. The semiconductor cooling plate 64 achieves cooling through the Peltier effect, cooling the air at the top inside the buffer box 51, inhibiting the crystallization of easily crystallizing substances in the exhaust gas, and reducing the risk of pipe blockage. The mounting plate 65 provides a mounting position for the electric fan 67, ensuring that the electric fan 67 operates stably inside the buffer box 51 and assisting in the circulation of cold air. The mounting hole 66 is used to install the electric fan 67. The electric fan 67 accelerates the air flow inside the buffer box 51, promotes the circulation of cold air, makes the cooling effect more uniform, and quickly reduces the exhaust gas temperature. At the same time, it helps to condense and settle the water vapor in the exhaust gas. The PLC controller 68 receives the data from the temperature sensor 61 and controls the operation of the electromagnetic one-way valve 54, the semiconductor cooling plate 64, and the electric fan 67 according to a preset program.

[0034] Specifically, such as Figure 5 As shown, a handle 7 is welded to the front of the collection box 57, and the surface of the handle 7 is engraved with anti-slip texture.

[0035] Specifically, such as Figure 5 As shown, a connecting ring 8 is fixedly connected to the left side surface of the exhaust gas connecting pipe 52, and a connecting screw hole 9 is provided on the inner side of the connecting ring 8.

[0036] In this embodiment: by setting a handle 7, it is convenient for the operator to pull out the collection box 57 for cleaning. By setting an anti-slip texture, the friction is increased, making the operator's grip more stable and easy to operate. By setting a connecting ring 8, the connecting screw hole 9 can be supported and limited. By setting a connecting screw hole 9, the exhaust gas connecting pipe 52 can be quickly fixed to the exhaust gas source pipe by bolt connection.

[0037] Specifically, such as Figure 6 As shown, a sealing ring 10 is fixedly connected to the bottom of the guide tube 55, and the side of the sealing ring 10 away from the guide tube 55 is fixedly connected to the top of the exhaust hopper 56.

[0038] Specifically, such as Figure 5 As shown, a protective pad 11 is fitted on the bottom of the inner side of the collection box 57, and the surface of the protective pad 11 is coated with an anti-stick coating.

[0039] In this embodiment: by setting a sealing ring 10, the sealing of the connection is ensured to prevent exhaust gas leakage; by setting a protective pad 11, a buffering effect is provided to protect the bottom of the collection box 57 from wear by impurities and extend the service life of the collection box 57; by setting an anti-stick coating, the collected particulate impurities can be prevented from adhering to the bottom of the collection box 57, making it easy to clean.

[0040] Working principle: First, the operator guides the phosphorus trichloride tail gas through the tail gas connection pipe 52 to the bottom of the buffer tank 51. The limiting baffle 53 temporarily isolates the tail gas at the bottom of the buffer tank 51, providing time and space for impurities to settle. Next, the temperature sensor 61 monitors the tail gas temperature inside the buffer tank 51 in real time and feeds the data back to the PLC controller 68. When the temperature exceeds the preset threshold, the PLC controller 68 activates the semiconductor cooling plate 64. The semiconductor cooling plate 64 cools the air at the top of the inner side of the buffer tank 51. At the same time, the electric fan 67 starts, accelerating the airflow and causing the cold air to enter the solenoid one-way valve 54 through the vent 63 on the fixed plate 62. At this time, the PLC... The controller 68 controls the opening of the electromagnetic single-way valve 54, allowing cold air to descend through the guide pipe 55 and exhaust hopper 56 to the bottom of the buffer tank 51, cooling the exhaust gas and promoting the settling of impurities. After initial cooling and impurity settling, the exhaust gas then enters the buffer tank 3 through the intake pipe 4. The buffer tank 3 buffers the flow and pressure of the exhaust gas to avoid impacting subsequent treatment stages. Afterward, the buffered exhaust gas enters the spray purification chamber 1 through the connecting pipe 2. The spray structure inside the spray purification chamber 1 sprays alkaline solution, which neutralizes the acidic gases in the exhaust gas, effectively removing harmful substances from the exhaust gas and ensuring that the exhaust gas meets emission standards. Finally, the operator can pull out the collection box 57 through the handle 7 for cleaning.

[0041] The above are merely preferred embodiments of the present utility model and are not intended to limit the present utility model. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.

Claims

1. A phosphorus trichloride tail gas buffer treatment device comprising a spray cleaning chamber (1), characterized in that: A connecting pipe (2) is connected to the left side of the spray purification chamber (1), a buffer tank (3) is fixedly connected to the left side of the connecting pipe (2), an air inlet pipe (4) is fixedly connected to the bottom of the left side of the buffer tank (3), a pretreatment mechanism (5) is fixedly connected to the left side of the air inlet pipe (4), and a refrigeration mechanism (6) is installed on the front side of the pretreatment mechanism (5). The pretreatment mechanism (5) includes a buffer box (51), an exhaust gas connection pipe (52), a limiting partition (53), an electromagnetic one-way valve (54), a guide pipe (55), an exhaust hopper (56), and a collection box (57). The buffer box (51) is fixedly connected to the left side of the intake pipe (4). The exhaust gas connection pipe (52) is fixedly connected to the bottom of the left side of the buffer box (51). The limiting partition (53) is welded to the inside of the buffer box (51). The electromagnetic one-way valve (54) is installed at the bottom of the limiting partition (53). The guide pipe (55) is installed at the bottom of the electromagnetic one-way valve (54). The exhaust hopper (56) is welded to the bottom of the guide pipe (55). The collection box (57) is slidably connected to the bottom of the inside of the buffer box (51).

2. A phosphorus trichloride tail gas buffer treatment apparatus according to claim 1, characterized in that: The refrigeration mechanism (6) includes a temperature sensor (61), a fixing plate (62), several vent holes (63), several semiconductor refrigeration plates (64), a mounting plate (65), several mounting holes (66), an electric fan (67), and a PLC controller (68). The temperature sensor (61) is installed on the left side of the buffer box (51).

3. A phosphorus trichloride tail gas buffer treatment apparatus according to claim 2, characterized in that: The detection end of the temperature sensor (61) extends through and into the inner side of the buffer box (51). The fixing plate (62) is welded to the inner side of the buffer box (51). The vent (63) is opened on the inner side of the fixing plate (62). The semiconductor cooling plate (64) is installed on the top of the fixing plate (62). The mounting plate (65) is welded to the top of the inner side of the buffer box (51).

4. The phosphorus trichloride tail gas buffer treatment apparatus according to claim 2, characterized by: The mounting hole (66) is located inside the mounting plate (65), the electric fan (67) is mounted inside the mounting hole (66), and the PLC controller (68) is mounted on the front side of the buffer box (51).

5. The phosphorus trichloride tail gas buffer treatment apparatus according to claim 1, characterized by: A handle (7) is welded to the front side of the collection box (57), and the surface of the handle (7) is engraved with anti-slip texture.

6. The phosphorus trichloride tail gas buffer treatment device according to claim 1, characterized in that: A connecting ring (8) is fixedly connected to the left side surface of the exhaust gas connecting pipe (52), and a connecting screw hole (9) is provided on the inner side of the connecting ring (8).

7. The phosphorus trichloride tail gas buffer treatment apparatus according to claim 1, characterized by: A sealing ring (10) is fixedly connected to the bottom of the guide tube (55), and the side of the sealing ring (10) away from the guide tube (55) is fixedly connected to the top of the exhaust hopper (56).

8. The phosphorus trichloride tail gas buffer treatment apparatus according to claim 1, characterized by: The bottom of the inner side of the collection box (57) is fitted with a protective pad (11), and the surface of the protective pad (11) is coated with an anti-stick coating.