Polishing device for handrails
By combining a partition plate and a robotic arm, the problem of debris splashing during polishing is solved, thereby improving safety and production efficiency. This technology is specifically applied to automated polishing devices for handrails.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- XIAMEN RUIJING METAL PROD CO LTD
- Filing Date
- 2025-08-07
- Publication Date
- 2026-07-03
AI Technical Summary
During the polishing process, polishing debris may fly out, posing a safety hazard and affecting the safety of workers.
The design combines a barrier plate, a robotic arm, and a polishing mechanism. The barrier plate blocks debris, while the robotic arm performs automated polishing. Combined with an adjustable barrier plate and a telescopic cover structure, a safe and automated polishing process is achieved.
It effectively prevents debris from flying onto workers, improving the safety of the polishing process and increasing production efficiency through continuous production.
Smart Images
Figure CN224445560U_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of polishing apparatus technology, and in particular to a polishing apparatus for handrails. Background Technology
[0002] Polishing is a machining method that uses mechanical, chemical, or electrochemical processes to reduce the surface roughness of a workpiece, thereby obtaining a bright and smooth surface. It involves using polishing tools and abrasive particles or other polishing media to refine the surface of a workpiece. Polishing does not improve the dimensional or geometric accuracy of a workpiece; rather, its purpose is to achieve a smooth surface or a mirror-like finish, and sometimes it is used to eliminate shine.
[0003] Polishing wheels are typically used as polishing tools. Polishing wheels are generally made of multiple layers of canvas, felt, or leather, clamped on both sides by metal discs, and their rims are coated with a polishing compound consisting of a uniform mixture of micro-powdered abrasives and grease.
[0004] like Figure 1 The handrail shown comprises an integrally connected rod portion 100 and a cylindrical portion 200, which are perpendicular to each other. The cylindrical portion has a circular cross-section, while the rod portion has a rectangular cross-section. A groove is formed at the end of the cylindrical portion away from the rod portion. The surface of the rod portion of the handrail requires polishing. Currently, polishing devices mainly include a robotic arm and a polishing wheel. The robotic arm holds the handrail, and then the handrail is extended onto the polishing wheel for polishing.
[0005] Regarding the aforementioned technologies, during the polishing process, workers need to load or unload the handrails. At this time, polishing debris may fly out and hit the workers, posing a certain safety hazard. Therefore, improvements are needed. Utility Model Content
[0006] To improve safety during the handrail polishing process, this application provides a handrail polishing device.
[0007] The polishing device for handrails provided in this application adopts the following technical solution:
[0008] A polishing device for handrails includes a worktable, a first mounting base, a partition plate, a robotic arm, and a polishing mechanism. One end of the worktable is an operating end, and the other end is a polishing end. The first mounting base is movably mounted on the worktable and is used for placing the handrail. The partition plate is located above the worktable surface and is used to separate the operating end and the polishing end. A gap is left between the partition plate and the worktable for the first mounting base to pass through.
[0009] Both the robotic arm and the polishing mechanism are located at the polishing end. The robotic arm has multiple degrees of freedom and is used to grip the handrail. The polishing mechanism is used to polish the handrail.
[0010] By adopting the above technical solution, during production, the operator stands at the operating end and places the handrail to be polished on the first mounting seat. Then, the operator controls the first mounting seat to move towards the polishing end, allowing it to pass through the gap under the partition plate. Next, a robotic arm is used to prepare to grip the cylindrical part of the handrail and extend it to the position of the polishing mechanism to complete the polishing.
[0011] A robotic arm is an automated operating device that can mimic certain movements of a human hand and arm, possessing five or more degrees of freedom, used to grasp, move objects, or operate tools according to a fixed program. A polishing mechanism can be a polishing wheel; the high-speed rotating polishing wheel presses against the workpiece, causing the abrasive to roll and micro-cut the workpiece surface, thereby obtaining a bright machined surface.
[0012] During the polishing process, the debris flying out is blocked by the isolation plate and will not directly hit the workers, thereby improving the safety of the handrail polishing process and reducing safety hazards.
[0013] Preferably, the first mounting base has a positioning groove whose shape is adapted to the handrail. The positioning groove is spaced along the length and width of the first mounting base and is used to position the handrail.
[0014] By adopting the above technical solution, the positioning groove can position the handrail, keeping it in a certain state so that the robotic arm can easily grasp it. The robotic arm sequentially grasps the handrails on the first mounting base for polishing, and then places the polished handrails back into the positioning groove.
[0015] Preferably, it further includes a first telescopic cover and a first support plate. The first telescopic cover is telescopically mounted on the worktable, and its two ends are respectively connected to the operating end and the polishing end. The first support plate is mounted on the first telescopic cover, and the first mounting base is detachably connected to the first support plate.
[0016] By adopting the above technical solution, the first support plate serves as a carrier for the installation of the first mounting base. After the worker places the handrail on the first mounting base, they can manually apply external force to the first mounting base, causing the first telescopic cover to extend or retract, allowing the first mounting base to move closer to or further away from the polishing mechanism.
[0017] The first type of telescopic cover can be a metal spring telescopic cover, a shape memory alloy telescopic cover, or a telescopic cover with a locking mechanism. For example, a metal spring telescopic cover is generally made of metal spring steel and utilizes the elastic deformation of the spring to achieve telescopic movement. When an external force is applied, the spring is compressed or stretched, thereby causing the telescopic cover to expand or contract. After the external force is removed, due to the spring's certain stiffness and memory, it will retain the deformed state under the external force, allowing the telescopic cover to maintain its corresponding shape.
[0018] Preferably, the bottom of the first mounting base is connected to a plurality of pins, and the first support plate is provided with a plurality of slots, and each of the pins is inserted into the slot.
[0019] By adopting the above technical solution, the insert is inserted into the slot, and the first mounting base is detachable by means of the insertion force. During the polishing process, debris may fall into the positioning groove, and long-term accumulation may affect the positioning of the handrail. By making the first mounting base detachable, it is convenient for staff to clean the first mounting base.
[0020] Preferably, it further includes a second telescopic cover, a second support plate, and a second mounting base. The second telescopic cover is also telescopic on the worktable. The telescopic directions of the second telescopic cover and the first telescopic cover are parallel. The second support plate is disposed on the second telescopic cover, and the second mounting base is disposed on the second support plate. When the first mounting base moves closer to the operating end, the second mounting base moves closer to the polishing end.
[0021] By adopting the above technical solution, the second mounting base serves the same purpose as the first mounting base: positioning the handrail. After the handrail of the first mounting base is completely polished, the worker moves the first mounting base from the polishing end to the operating end, and at the same time, the worker moves the second mounting base from the operating end to the polishing end.
[0022] At this time, the robotic arm can continue to grip and polish the handrails. During this interval, the staff can perform unloading and loading operations on the handrails on the first mounting base to achieve continuous production and improve production efficiency.
[0023] Preferably, the vertical distance between the isolation plate and the workbench is adjustable.
[0024] By adopting the above technical solution, the vertical distance between the isolation plate and the workbench can be adjusted. When it is necessary for handrails of different specifications (the cylindrical part of handrails of different specifications has different lengths) to pass under the isolation plate, the staff can make adjustments according to actual needs to ensure that the first mounting seat can pass smoothly.
[0025] Preferably, it further includes a first fixing strip and a second fixing strip that are parallel to each other. The first fixing strip and the second fixing strip are vertically arranged and each has a slot. The two sides of the isolation plate are engaged in the two slots. The two sides of the isolation plate have through holes that are spaced apart in the vertical direction. The isolation plate is fixed to the two fixing strips by pins.
[0026] By adopting the above technical solution, the two sides of the isolation plate are snapped into two slots. When it is necessary to adjust the height of the isolation plate, external force can be applied to control its up and down movement. After adjusting the position, the pin is passed through the through hole of the fixing strip and the isolation plate simultaneously to complete the fixation of the isolation plate position.
[0027] Preferably, the isolation plate is made of a transparent material.
[0028] By adopting the above technical solution, the transparent material isolation plate can transmit light, making it convenient for staff to observe the processing of the polishing end through the isolation plate.
[0029] In summary, this application includes at least one of the following beneficial technical effects:
[0030] (1) By setting up an isolation plate, a robotic arm and a polishing mechanism, the robotic arm and the polishing mechanism work together to polish the handrail. During the polishing process, the debris flying out will be blocked by the isolation plate and will not directly hit the workers, thereby improving the safety of the handrail polishing process.
[0031] (2) By setting the first telescopic cover and the first support plate, when the staff puts the handrail on the first mounting seat, they can manually apply external force to the first mounting seat to make the first telescopic cover extend or retract, so that the first mounting seat can move closer to or further away from the polishing mechanism.
[0032] (3) By setting the height of the isolation plate to be adjustable, it is convenient for staff to adjust the vertical distance between the isolation plate and the workbench according to the different specifications of the handrails, so as to ensure that the first mounting seat can pass smoothly from under the isolation plate. Attached Figure Description
[0033] Figure 1 This is a schematic diagram of the handrail structure in the background art of this application;
[0034] Figure 2 This is a schematic diagram of the polishing device in the embodiments of this application;
[0035] Figure 3 This is a schematic diagram of the polishing device from another perspective in an embodiment of this application;
[0036] Figure 4 This is a partial structural schematic diagram of the polishing device in the embodiments of this application;
[0037] Figure 5 This is a schematic diagram of the structure of the isolation plate in the embodiment of this application.
[0038] Reference numerals: 1. Workbench; 2. First mounting base; 3. Isolation plate; 4. Robot arm; 5. Polishing mechanism; 6. Operating end; 7. Polishing end; 8. Positioning groove; 9. First telescopic cover; 10. First support plate; 11. Second telescopic cover; 12. Second support plate; 13. Second mounting base; 14. First fixing strip; 15. Second fixing strip; 16. Slot; 17. Pin. Detailed Implementation
[0039] The technical solutions of this application will now be described with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of them. This application can be embodied in many different forms and is not limited to the embodiments described herein.
[0040] In the representation of this application, the reference to terms such as "one embodiment," "some embodiments," "example," "specific example," or "some examples," etc., means that a specific feature, structure, material, or characteristic represented in connection with that embodiment or example is included in at least one embodiment or example of this application. Moreover, the specific features, structures, materials, or characteristics represented may be combined in any suitable manner in one or more embodiments or examples.
[0041] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application pertains; the terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the application; the terms “comprising” and “having”, and any variations thereof, in the specification, claims, and foregoing description of the drawings are intended to cover non-exclusive inclusion.
[0042] In the description of the embodiments of this application, unless otherwise expressly specified and limited, the technical terms "installation," "connection," "joining," "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection; a detachable connection; an integral part; or a mechanical connection. Those skilled in the art can understand the specific meaning of the above terms in the embodiments of this application according to the specific circumstances.
[0043] The following detailed description of some embodiments of this application is provided in conjunction with the accompanying drawings. Without conflict, those skilled in the art can combine and integrate the different embodiments or examples shown in this application, as well as the features of those embodiments or examples.
[0044] This application discloses a polishing device for handrails. (Refer to...) Figure 2 and Figure 3The polishing device includes a worktable 1, a first mounting base 2, a partition plate 3, a robotic arm 4, and a polishing mechanism 5. The worktable 1, serving as a carrier, is fixedly installed on the ground; one end of the worktable 1 is the operating end 6, and the other end is the polishing end 7. The first mounting base 2 is movably mounted on the worktable 1 and is used for placing handrails. The first mounting base 2 has positioning grooves 8 whose shape is adapted to the handrails, and the rod portion of the positioning groove 8 is engaged within the positioning groove 8. The positioning grooves 8 are spaced apart along the length and width directions of the first mounting base 2, allowing the first mounting base 2 to simultaneously position multiple handrails.
[0045] A partition plate 3 is installed above the workbench 1 and separates the operating end 6 from the polishing end 7. The operating end 6 is for the worker to stand on. The plane of the partition plate 3 is perpendicular to the workbench 1, and a gap is left between the partition plate 3 and the workbench 1 for the first mounting base 2 to pass through. In this embodiment, the partition plate 3 is made of a transparent material, including but not limited to acrylic sheets and glass. The transparent partition plate 3 allows light to pass through, making it convenient for the worker to observe the processing of the polishing end 7 through the partition plate 3.
[0046] Both the robotic arm 4 and the polishing mechanism 5 are mounted on the polishing end 7. The robotic arm 4 has multiple degrees of freedom and is used to grip the handrail, while the polishing mechanism 5 is used to polish the handrail. The robotic arm 4 has at least five degrees of freedom and can flexibly grasp the handrail according to the program. In this embodiment, the polishing mechanism 5 is a polishing wheel. The high-speed rotating polishing wheel presses against the workpiece, causing the abrasive to roll and perform micro-cutting on the workpiece surface, thereby obtaining a bright processed surface.
[0047] Specifically, the workbench 1 is equipped with a first telescopic cover 9, with its two ends connected to the operating end 6 and the polishing end 7, respectively. The first telescopic cover 9 can be a metal spring telescopic cover, a shape memory alloy telescopic cover, or a telescopic cover with a locking mechanism. For example, a metal spring telescopic cover is generally made of metal spring steel and utilizes the elastic deformation of the spring to achieve telescopic movement. When an external force is applied, the spring is compressed or stretched, causing the telescopic cover to telescopically extend or retract. After the external force is removed, due to the spring's certain stiffness and memory, it will remain in the deformed state under the external force, allowing the telescopic cover to maintain its corresponding shape.
[0048] A first support plate 10 is installed on the first telescopic cover 9, and a first mounting base 2 is detachably connected to the first support plate 10. Several pins are fixedly connected to the bottom of the first mounting base 2, and several slots are correspondingly provided on the first support plate 10. Each pin is inserted into the slot, and the first mounting base 2 and the first support plate 10 are fixed by the insertion force, which makes it convenient for the staff to remove the first mounting base 2 for cleaning.
[0049] During production, the operator stands at the operating end 6 and places the handrail to be polished onto the positioning groove 8 of the first mounting base 2. Then, force is applied to control the first mounting base 2 to move towards the polishing end 7, allowing it to pass through the gap under the partition plate 3. Next, the robotic arm 4 prepares to grip the cylindrical part of the handrail and extends it to the polishing mechanism 5 for polishing. The robotic arm 4 sequentially picks up the handrails from the first mounting base 2 for polishing, and the polished handrails are then returned to the positioning groove 8. During polishing, flying debris is blocked by the partition plate 3 and will not directly hit the operator, thus improving safety and reducing potential hazards during the handrail polishing process.
[0050] In this embodiment, the workbench 1 is also equipped with a second telescopic cover 11, a second support plate 12, and a second mounting base 13. The second telescopic cover 11 is also telescopically mounted on the workbench 1 and is located on one side of the first telescopic cover 9. The telescopic directions of the second telescopic cover 11 and the first telescopic cover 9 are parallel. The second support plate 12 is fixed to the second telescopic cover 11, and the second mounting base 13 is detachably connected to the second support plate 12. The structure of the second mounting base 13 is the same as that of the first mounting base 2, and it also has several positioning slots 8 for the armrest to engage.
[0051] After the handrail of the first mounting base 2 has been polished, the staff moves the first mounting base 2 from the polishing end 7 to the operating end 6. At the same time, the staff moves the second mounting base 13 from the operating end 6 to the polishing end 7.
[0052] At this time, the robotic arm 4 can continue to grip and polish the handrail. During this interval, the staff can perform unloading and loading operations on the handrail on the first mounting base 2 to achieve continuous production and improve production efficiency.
[0053] In addition, combined Figure 4 and Figure 5 The vertical distance between the partition plate 3 and the workbench 1 is adjustable, allowing handrails of different specifications (with varying cylindrical section lengths) to pass under the partition plate 3. The workbench 1 is fixedly equipped with a first fixing strip 14 and a second fixing strip 15 that are parallel to each other. The first fixing strip 14 and the second fixing strip 15 are vertically arranged and each has a rectangular slot 16. The two sides of the partition plate 3 are engaged within the two slots 16. Through holes are provided on both sides of the partition plate 3, spaced vertically. The partition plate 3 is fixed to the first fixing strip 14 and the second fixing strip 15 by pins 17, which are perpendicular to the plane of the partition plate 3.
[0054] When the height of the isolation plate 3 needs to be adjusted, external force can be applied to the isolation plate 3 to control its up and down movement. After the position is adjusted, the pins 17 are passed through the through holes of the fixing strip and the isolation plate 3 simultaneously to fix the position of the isolation plate 3. The two pins 17 are respectively inserted into the isolation plate 3 and snapped into the slots 16 on both sides. Under the action of static friction, the pins 17 will not fall off the isolation plate 3.
[0055] The implementation principle of a handrail polishing device in this application embodiment is as follows: During the production process, the operator places the handrail to be polished into the positioning groove 8 of the first mounting seat 2 at the operating end 6, and then applies force to control the first mounting seat 2 to move towards the polishing end 7. The first mounting seat 2 can pass through the gap under the isolation plate 3.
[0056] Next, the robotic arm 4 grips the cylindrical portion of the handrail and extends it to the polishing mechanism 5 for polishing. The robotic arm 4 sequentially picks up the handrails from the first mounting base 2, completing the polishing process one by one. The polished handrails are then returned to the positioning groove 8. Throughout the polishing process, flying debris is blocked by the isolation plate 3, preventing it from directly hitting the workers, thus effectively improving the safety of the handrail polishing operation and reducing potential safety risks.
[0057] The above are all preferred embodiments of this application, and are not intended to limit the scope of protection of this application. Therefore, all equivalent changes made in accordance with the structure, shape and principle of this application should be covered within the scope of protection of this application.
Claims
1. A polishing device for handrails, characterized by The device includes a workbench (1), a first mounting base (2), a partition plate (3), a robotic arm (4), and a polishing mechanism (5). One end of the workbench (1) is the operating end (6), and the other end is the polishing end (7). The first mounting base (2) is movably mounted on the workbench (1) and is used for placing a handrail. The partition plate (3) is located above the table surface of the workbench (1) and is used to separate the operating end (6) and the polishing end (7). The partition plate (3) and the workbench (1) have a gap for the first mounting base (2) to pass through. The robotic arm (4) and the polishing mechanism (5) are both located at the polishing end (7). The robotic arm (4) has multiple degrees of freedom and is used to hold the handrail. The polishing mechanism (5) is used to polish the handrail.
2. A polishing apparatus for handrails as claimed in claim 1, wherein The first mounting base (2) has a positioning groove (8) with a shape that matches the handrail. The positioning groove (8) is spaced along the length and width of the first mounting base (2). The positioning groove (8) is used to position the handrail.
3. A polishing apparatus for handrails as claimed in claim 2, wherein It also includes a first telescopic cover (9) and a first support plate (10). The first telescopic cover (9) is telescopically mounted on the workbench (1). The two ends of the first telescopic cover (9) are respectively connected to the operating end (6) and the polishing end (7). The first support plate (10) is mounted on the first telescopic cover (9). The first mounting base (2) is detachably connected to the first support plate (10).
4. A polishing apparatus for handrails as claimed in claim 3, wherein The bottom of the first mounting base (2) is connected to several pins, and the first support plate (10) has several slots, with each pin inserted into the slot.
5. The polishing apparatus for handrails according to claim 3, wherein It also includes a second telescopic cover (11), a second support plate (12), and a second mounting base (13). The second telescopic cover (11) is also telescopic on the worktable (1). The telescopic directions of the second telescopic cover (11) and the first telescopic cover (9) are parallel. The second support plate (12) is located on the second telescopic cover (11), and the second mounting base (13) is located on the second support plate (12). When the first mounting base (2) moves closer to the operating end (6), the second mounting base (13) moves closer to the polishing end (7).
6. The polishing apparatus for handrails according to claim 1, wherein The vertical distance between the isolation plate (3) and the workbench (1) can be adjusted.
7. A polishing apparatus for handrails as claimed in claim 6, wherein It also includes a first fixing strip (14) and a second fixing strip (15) that are parallel to each other. The first fixing strip (14) and the second fixing strip (15) are vertically arranged and each has a slot (16). The two sides of the isolation plate (3) are engaged in the two slots (16). The two sides of the isolation plate (3) have through holes, which are distributed at intervals along the vertical direction. The isolation plate (3) is fixed to the two fixing strips by a pin (17).
8. The polishing apparatus for handrails according to claim 1, wherein The isolation plate (3) is made of transparent material.