A photovoltaic silicon wafer cleaning control system

Abstract

The application relates to a photovoltaic silicon wafer cleaning control system. When setting the conveying sequence of a mechanical hand grabbing a pressing basket through a cleaning device and a drying device, the following conditions need to be met: condition one: all the cleaning devices are prior to all the drying devices; and condition two: the cleaning devices and the drying devices at the front position must be prior to the cleaning devices and the drying devices at the rear position. The condition one limits that the cleaning must be prior to the drying, and the condition two limits that the moving sequence of the mechanical hand in the working process can only be from front to rear, so that the mechanical hand is prevented from reciprocating, and the production efficiency is improved.

Description

Technical Field

[0001] This application belongs to the technical field of photovoltaic silicon wafer production equipment, and in particular relates to a photovoltaic silicon wafer cleaning control system. Background Technology

[0002] A texturing and cleaning system typically includes a pre-cleaning unit, which uses acid to remove oil and metal ions from the silicon wafer surface; a texturing and cleaning unit, which first washes the silicon wafer with water and then texturizes it using an alkaline solution; a chemical polishing and cleaning unit, which uses an alkaline solution containing a composite solvent to remove a layer from the silicon wafer surface; an acid cleaning unit, which uses an acid solution containing hydrogen peroxide to clean the silicon wafer surface; and a drying unit, which air-dries the silicon wafer after the above cleaning units. The pre-cleaning unit, texturing and cleaning unit, chemical polishing and cleaning unit, and acid cleaning unit, arranged in the order of the processes, can all be collectively referred to as a cleaning system.

[0003] The photovoltaic silicon wafer cleaning control system is set in the PLC program of the texturing and cleaning device. It is used to control the basket transport device to transport the baskets containing photovoltaic silicon wafers to the cleaning device or drying device in sequence according to the set transport order. Generally speaking, the texturing and cleaning device is customized according to the cleaning process. The baskets need to traverse all cleaning devices and drying devices. When the process is modified, the program in the PLC needs to be modified. However, the existing technology does not restrict the transport order after the modification of the program, which easily leads to the reciprocating motion of the robotic arm, thereby reducing the production efficiency of photovoltaic silicon wafers.

[0004] Reference documents: CN115411149A, CN115207154A. Summary of the Invention

[0005] The technical problem to be solved by the present invention is to provide a photovoltaic silicon wafer cleaning control system that ensures production efficiency when the cleaning sequence is modified, in order to overcome the shortcomings of the prior art.

[0006] The technical solution adopted by this invention to solve its technical problem is:

[0007] A photovoltaic silicon wafer cleaning control system for controlling photovoltaic silicon wafer cleaning equipment, comprising:

[0008] The photovoltaic silicon wafer cleaning equipment includes a basket conveying device and several cleaning devices and several drying devices arranged in rows. The cleaning devices are used to clean the photovoltaic silicon wafers, and the drying devices are used to dry the cleaned photovoltaic silicon wafers. The photovoltaic silicon wafer cleaning control system is used to control the basket conveying device to transport the basket with photovoltaic silicon wafers to the cleaning device or the drying device.

[0009] The photovoltaic silicon wafer cleaning control system includes:

[0010] The working module is used to control the basket transport device to transport the baskets containing photovoltaic silicon wafers to the cleaning device or drying device in sequence according to the set transport order.

[0011] The setting module is used to set the conveying sequence, which must meet the following conditions:

[0012] Condition 1: All cleaning devices must precede all drying devices;

[0013] Condition 2: The cleaning and drying devices located at the front must be installed before the cleaning and drying devices located at the back.

[0014] Preferably, the photovoltaic silicon wafer cleaning control system of the present invention,

[0015] The hanging basket transport device includes a conveyor rail with multiple conveyor sections and a robotic arm installed on each conveyor section. The connecting area between two adjacent conveyor sections is a transition section. The robotic arms of two adjacent conveyor sections can move to the transition section. The transition section corresponds to one or more cleaning devices or one or more drying devices. When setting the conveying sequence, the setting module must also meet condition three: the conveying sequence must include at least one cleaning device or one drying device corresponding to all transition sections.

[0016] Preferably, the photovoltaic silicon wafer cleaning control system of the present invention has at least one transition section corresponding to at least one cleaning device and at least one drying device, so that the cleaning and drying process time can be freely adjusted according to the actual situation.

[0017] Preferably, in the photovoltaic silicon wafer cleaning control system of the present invention, a pre-drying device is also provided between the cleaning device and the drying device, and the pre-drying device is also located in the transition section.

[0018] Preferably, the photovoltaic silicon wafer cleaning control system of the present invention further includes an adjustment module for adjusting the cleaning process parameters and drying process parameters in the cleaning device and the drying device.

[0019] Preferably, the photovoltaic silicon wafer cleaning control system of the present invention further includes an adjustment module for adjusting the cleaning process parameters and drying process parameters in the cleaning device and the drying device.

[0020] Preferably, the photovoltaic silicon wafer cleaning control system of the present invention further includes an adjustment module, wherein the processing time of the cleaning device corresponding to the transition section and the drying time corresponding to the transition section are not less than the time required for the robotic arm to pass through the transition section.

[0021] Preferably, the photovoltaic silicon wafer cleaning control system of the present invention further includes a correction module, which is used to automatically adjust settings that do not meet the conditions to settings that meet the conditions when the conveying sequence is manually set, and to simultaneously adjust the cleaning process parameters and drying process parameters in the cleaning device and drying device while adjusting the sequence of the cleaning device and drying device.

[0022] This application also includes a photovoltaic silicon wafer cleaning control system, wherein the photovoltaic silicon wafer cleaning equipment is a texturing cleaning equipment.

[0023] The beneficial effects of this invention are:

[0024] The photovoltaic silicon wafer cleaning control system of this invention requires the following conditions to be met when setting the conveying sequence of the robotic arm gripping the basket through the cleaning and drying devices: Condition 1: All cleaning devices precede all drying devices; Condition 2: Cleaning and drying devices located earlier must precede cleaning and drying devices located later. Condition 1 restricts cleaning to drying, and Condition 2 restricts the robotic arm's movement sequence to front to back, avoiding back-and-forth movement and improving production efficiency. Attached Figure Description

[0025] The technical solution of this application will be further described below with reference to the accompanying drawings and embodiments.

[0026] Figure 1 This is a framework diagram of the photovoltaic silicon wafer cleaning control system according to an embodiment of this application. Detailed Implementation

[0027] It should be noted that, unless otherwise specified, the embodiments and features described in this application can be combined with each other.

[0028] The technical solution of this application will now be described in detail with reference to the accompanying drawings and embodiments.

[0029] Example 1

[0030] This embodiment provides a photovoltaic silicon wafer cleaning control system for controlling photovoltaic silicon wafer cleaning equipment, such as... Figure 1 As shown, it includes:

[0031] The photovoltaic silicon wafer cleaning equipment includes a basket conveying device and several cleaning devices and several drying devices arranged in rows. The cleaning devices are used to clean the photovoltaic silicon wafers, and the drying devices are used to dry the cleaned photovoltaic silicon wafers. The photovoltaic silicon wafer cleaning control system is used to control the basket conveying device to transport the basket with photovoltaic silicon wafers to the cleaning device or the drying device.

[0032] The photovoltaic silicon wafer cleaning control system includes:

[0033] The working module is used to control the basket transport device to transport the baskets containing photovoltaic silicon wafers to the cleaning device or drying device in sequence according to the set transport order.

[0034] The setting module is used to set the conveying sequence, which must meet the following conditions:

[0035] Condition 1: All cleaning devices must precede all drying devices;

[0036] Condition 2: The cleaning and drying devices located at the front must be installed before the cleaning and drying devices located at the back.

[0037] For example, the photovoltaic silicon wafer cleaning equipment includes a first cleaning tank, a second cleaning tank, a third cleaning tank, a fourth cleaning tank, a fifth cleaning tank, a first drying tank, and a second drying tank arranged in sequence. When setting the module, the conveying sequence can be directly set as first cleaning tank, second cleaning tank, third cleaning tank, fourth cleaning tank, fifth cleaning tank - first drying tank - second drying tank. Alternatively, one or more cleaning tanks or drying tanks can be omitted as needed, for example: first cleaning tank - third cleaning tank - first drying tank - second drying tank. However, the following cleaning method cannot be set: third cleaning tank - first cleaning tank - first drying tank - second drying tank, as this violates condition two. Of course, the setting of the cleaning and drying devices in this example must meet condition one. It should be noted that after completing the cleaning, the robotic arm must return to its original position. Without gripping the basket, it can move from back to front.

[0038] The photovoltaic silicon wafer cleaning control system in this embodiment restricts the process by requiring cleaning before drying under condition one and restricting the movement of the robotic arm to be from front to back under condition two, thus avoiding back-and-forth movement of the robotic arm and improving production efficiency.

[0039] The hanging basket handling device includes a conveyor rail with multiple conveying sections and a robotic arm installed on each conveying section. The connecting area between two adjacent conveying sections is a transition section. The robotic arms of two adjacent conveying sections can move to the transition section. Each transition section corresponds to one or more cleaning devices or one or more drying devices. When setting the conveying sequence, the setting module must also meet condition three: the conveying sequence must include at least one cleaning device or one drying device corresponding to all transition sections. Multiple conveying sections correspond to multiple robotic arms, so that the robotic arms can simultaneously grab one basket in each different conveying section, improving work efficiency.

[0040] In other words, all cleaning or drying devices in the transition section must have baskets to enter, so that the entire basket handling device can smoothly complete the handover of the robotic arms of different conveying sections in the transition section.

[0041] Taking the photovoltaic silicon wafer cleaning equipment example above as an illustration, the first robotic arm corresponds to the first cleaning tank, the second cleaning tank, and the third cleaning tank; the second robotic arm corresponds to the third cleaning tank, the fourth cleaning tank, and the fifth cleaning tank; and the third robotic arm corresponds to the fifth cleaning tank, the first drying tank, and the second drying tank. The transition section corresponds to the third cleaning tank and the fifth cleaning tank. The robotic arm must grab the basket from the third cleaning tank and the fifth cleaning tank to complete the switching between different robotic arms. Therefore, when setting the conveying sequence, it is necessary to pass through the third cleaning tank and the fifth cleaning tank to optimize the time of the entire cleaning process.

[0042] Preferably, at least one transition section corresponds to at least one cleaning device and at least one drying device. That is, a transition section must be set at the connection between the cleaning device and the drying device, and the transition section includes at least two devices. This allows the cleaning and drying process times to be freely adjusted according to the actual situation.

[0043] Preferably, a pre-drying device is also provided between the washing device and the drying device, and the pre-drying device is also located in the transition section. Pre-drying is usually for draining water.

[0044] It also includes an adjustment module for adjusting the cleaning and drying process parameters in the cleaning and drying units. Cleaning process parameters typically include cleaning time, type of cleaning fluid, cleaning fluid temperature, and cleaning fluid volume. Drying process parameters include the type of blowing gas and drying time.

[0045] It also includes a correction module, which automatically adjusts settings that do not meet the conditions to meet them when the conveying sequence is manually set. This correction module simultaneously adjusts the cleaning and drying process parameters in the cleaning and drying devices while adjusting their sequence. Of course, the final decision on the conveying sequence still rests with the operator.

[0046] The correction method for the correction module is as follows:

[0047] S1: Read the conveying sequence of the robotic arm carrying the flower basket to the cleaning and drying devices;

[0048] S2: Determine if all cleaning devices precede all drying devices. If so, proceed to step S3. Otherwise, adjust the drying devices to be placed after all cleaning devices according to the principle of proximity before proceeding to step S3.

[0049] S3: Determine whether the cleaning and drying devices that are positioned earlier are earlier than the cleaning and drying devices that are positioned later. If yes, end the process. Otherwise, adjust the order of the drying devices to ensure that the cleaning and drying devices are earlier than the cleaning and drying devices that are positioned later, and then end the process.

[0050] If the hanging basket handling device includes a conveyor rail with multiple conveyor sections and a robot arm installed on each conveyor section, the connection area between two adjacent conveyor sections is a transition section, and the robot arms of two adjacent conveyor sections can move to the transition section, and the transition section corresponds to one or more cleaning devices or one or more drying devices, then before the end, it is added to determine that at least one of the cleaning devices and drying devices corresponding to all transition sections is in the conveying sequence. If so, the process ends; otherwise, the cleaning device or drying device closest to the cleaning device and drying device corresponding to the transition section is adjusted to the cleaning device and drying device corresponding to the transition section.

[0051] The photovoltaic silicon wafer cleaning equipment is a texturing cleaning equipment, meaning the photovoltaic silicon wafer cleaning control system is the control system of the texturing cleaning equipment.

[0052] Based on the above-described preferred embodiments according to this application, and through the foregoing description, those skilled in the art can make various changes and modifications without departing from the technical concept of this application. The technical scope of this application is not limited to the contents of the specification, but must be determined according to the scope of the claims.

[0053] Those skilled in the art will understand that embodiments of this application can be provided as methods, systems, or computer program products. Therefore, this application can take the form of a completely hardware embodiment, a completely software embodiment, or an embodiment combining software and hardware aspects. Furthermore, this application can take the form of a computer program product implemented on one or more computer-usable storage media containing computer-usable program code.

[0054] This application is described with reference to flowchart illustrations and / or block diagrams of methods, apparatus, and computer program products according to embodiments of this application. It will be understood that each block of the flowchart illustrations and / or block diagrams, and combinations of blocks in the flowchart illustrations and / or block diagrams, can be implemented by computer program instructions. These computer program instructions can be provided to a processor of a general-purpose computer, special-purpose computer, embedded processor, or other programmable data processing apparatus to produce a machine, such that the instructions, which execute via the processor of the computer or other programmable data processing apparatus, generate instructions for implementing the flowchart... Figure 1 One or more processes and / or boxes Figure 1 A device that provides the functions specified in one or more boxes.

[0055] These computer program instructions may also be stored in a computer-readable storage medium that can direct a computer or other programmable data processing device to function in a particular manner, such that the instructions stored in the computer-readable storage medium produce an article of manufacture including instruction means, which are implemented in a process Figure 1One or more processes and / or boxes Figure 1 The function specified in one or more boxes.

[0056] These computer program instructions may also be loaded onto a computer or other programmable data processing equipment to cause a series of operational steps to be performed on the computer or other programmable equipment to produce a computer-implemented process, thereby providing instructions that execute on the computer or other programmable equipment for implementing the process. Figure 1 One or more processes and / or boxes Figure 1 The steps of the function specified in one or more boxes.

Claims

1. A photovoltaic silicon wafer cleaning control system for controlling photovoltaic silicon wafer cleaning equipment, characterized in that, include: The photovoltaic silicon wafer cleaning equipment includes a basket conveying device and several cleaning devices and several drying devices arranged in rows. The cleaning devices are used to clean the photovoltaic silicon wafers, and the drying devices are used to dry the cleaned photovoltaic silicon wafers. The photovoltaic silicon wafer cleaning control system is used to control the basket conveying device to transport the basket with photovoltaic silicon wafers to the cleaning device or the drying device. The photovoltaic silicon wafer cleaning control system includes: The working module is used to control the basket transport device to transport the baskets containing photovoltaic silicon wafers to the cleaning device or drying device in sequence according to the set transport order. The setting module is used to set the conveying sequence, which must meet the following conditions: Condition 1: All cleaning devices must precede all drying devices; Condition 2: The washing and drying devices located at the front must be installed before the washing and drying devices located at the back. The hanging basket transport device includes a conveyor rail with multiple conveyor sections and a robotic arm installed on each conveyor section. The connecting area between two adjacent conveyor sections is a transition section. The robotic arms of two adjacent conveyor sections can move to the transition section. The transition section corresponds to one or more cleaning devices or one or more drying devices. When setting the conveying sequence, the setting module must also meet condition three: the conveying sequence must include at least one cleaning device or one drying device corresponding to all transition sections. It also includes a correction module, which is used to automatically adjust settings that do not meet the conditions to settings that meet the conditions when the conveying sequence is manually set, and to adjust the cleaning process parameters and drying process parameters in the cleaning device and drying device simultaneously while adjusting the sequence of the cleaning device and drying device. The correction method for the correction module is as follows: S1: Read the conveying sequence of the robotic arm carrying the basket to the cleaning and drying devices; S2: Determine if all cleaning devices precede all drying devices. If so, proceed to step S3. Otherwise, adjust the drying devices to be placed after all cleaning devices according to the principle of proximity before proceeding to step S3. S3: Determine whether the cleaning and drying devices that are positioned earlier are earlier than the cleaning and drying devices that are positioned later. If so, end the process. Otherwise, adjust the order of the drying devices to ensure that the cleaning and drying devices are earlier than the cleaning and drying devices that are positioned later, and then end the process.

2. The photovoltaic silicon wafer cleaning control system according to claim 1, characterized in that, At least one transition section corresponds to at least one cleaning device and at least one drying device.

3. The photovoltaic silicon wafer cleaning control system according to claim 1, characterized in that, A pre-drying device is also installed between the cleaning device and the drying device, and the pre-drying device is also located in the transition section.

4. The photovoltaic silicon wafer cleaning control system according to claim 1, characterized in that, It also includes an adjustment module for adjusting the cleaning process parameters and drying process parameters in the cleaning and drying devices.

5. The photovoltaic silicon wafer cleaning control system according to claim 4, characterized in that, It also includes an adjustment module, ensuring that the processing time of the cleaning device corresponding to the transition section and the drying time corresponding to the transition section are not less than the time required for the robotic arm to pass through the transition section.

6. A photovoltaic silicon wafer cleaning control system, characterized in that, The photovoltaic silicon wafer cleaning equipment according to any one of claims 1-5 is a texturing and cleaning equipment.

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