A stirring device for wafer sand blasting
By designing a stirring device for wafer blasting, the problem of uneven mixing of abrasive and liquid was solved, achieving uniform mixing and liquid level control, thus improving the stability and effectiveness of the wafer blasting process.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- SUZHOU ANYEDA ULTRASONIC EQUIP CO LTD
- Filing Date
- 2025-08-11
- Publication Date
- 2026-07-07
AI Technical Summary
In the wafer blasting process, uneven mixing of abrasive and liquid can easily lead to sedimentation, affecting process stability and processing effect.
A stirring device for wafer sandblasting was designed, including a stirring tank, a stirring module, a feeding chute, a liquid level detection box, and a float liquid level controller. The impeller is driven to rotate by a stirring motor to prevent sedimentation, and the liquid level is kept stable by the liquid level controller.
This method achieves uniform mixing of abrasive and liquid, prevents sedimentation, ensures process stability and processing effect, and improves wafer quality and performance.
Smart Images
Figure CN224464467U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of wafer manufacturing technology, and in particular to a stirring device for wafer sandblasting. Background Technology
[0002] In wafer manufacturing, sandblasting is primarily used to remove defects and contaminants from the wafer surface, increase surface roughness, and enhance the adhesion of coatings to the wafer, thereby improving wafer quality and performance. Sandblasting is mainly achieved using sandblasting equipment. During the sandblasting process, the sandblasting liquid needs to be stirred to ensure uniform mixing of the abrasive and liquid, preventing sedimentation and maintaining process stability and processing effectiveness. Utility Model Content
[0003] The purpose of this invention is to provide a stirring device for wafer blasting that can achieve uniform mixing of abrasive and liquid.
[0004] To achieve the above objectives, the technical solution of this utility model is as follows:
[0005] A stirring device for wafer sandblasting includes a stirring tank, a stirring support cover plate is provided on the top of the stirring tank, and a plurality of stirring modules are fixedly arranged vertically downward on the stirring support cover plate.
[0006] The stirring module includes a first fixed flange, which is fixed to the stirring support cover plate. A stirring motor is vertically downwardly mounted on the first fixed flange. A drive shaft is fixed to the rotor of the stirring motor. An impeller is mounted at the bottom of the drive shaft. The impeller is rotatably mounted inside the cylinder. A second fixed flange is mounted at the top of the cylinder. The second fixed flange is fixed below the first fixed flange by several connecting plates.
[0007] A first water inlet pipe is provided on the side wall of the cylinder.
[0008] As an improvement, a guide chute is fixed on the rear side of the mixing tank, and the input end of the guide chute is fixed below the external wafer blasting machine.
[0009] As an improvement: a liquid level detection box is provided on the right side of the mixing tank, and a float liquid level controller is provided inside the liquid level detection box, with a liquid level tube fixed on its side.
[0010] As an improvement, a first water outlet pipe is provided at the bottom of the mixing tank, and a control ball valve is provided on the first water outlet pipe.
[0011] As an improvement, a second water inlet pipe and a second water outlet pipe are vertically provided on the stirring support cover.
[0012] In summary, this utility model has the following beneficial effects:
[0013] 1. The liquid and abrasive are guided into the mixing tank through the guide chute. The stirring motor is started and the impeller is driven to rotate through the drive shaft. The material at the bottom of the mixing tank enters the tank under the action of the first water inlet pipe and is conveyed upward in the tank, thereby effectively preventing sedimentation.
[0014] 2. A float level controller can be used to detect and control the liquid level in the mixing tank, preventing the liquid level from being too high or too low. Attached Figure Description
[0015] To more clearly illustrate the technical solutions in this utility model, the accompanying drawings used in the description of the embodiments or prior art will be briefly introduced below.
[0016] Figure 1 This is a schematic diagram of the overall structure of a stirring device for wafer blasting.
[0017] Figure 2 A schematic cross-sectional view of a stirring device for wafer blasting.
[0018] The components include: 1. Mixing tank; 2. Mixing support cover plate; 3. First fixed flange; 4. Mixing motor; 5. Drive shaft; 6. Cylinder body; 7. Second fixed flange; 8. First water inlet pipe; 9. Material guide chute; 10. Liquid level detection box; 11. Float level controller; 12. Liquid level pipe; 13. First water outlet pipe; 14. Control ball valve; 15. Second water inlet pipe; 16. Second water outlet pipe; 17. Drain port. Detailed Implementation
[0019] The present invention will now be described in further detail with reference to the accompanying drawings.
[0020] Please refer to Figures 1-2 A stirring device for wafer blasting includes a stirring tank 1, a stirring support cover 2 on the top of the stirring tank 1, and several stirring modules fixed vertically downward on the stirring support cover 2.
[0021] The stirring module includes a first fixed flange 3, which is fixed on the stirring support cover plate 2. A stirring motor 4 is vertically downward mounted on the first fixed flange 3. A drive shaft 5 is fixed to the rotor of the stirring motor 4. An impeller is mounted at the bottom of the drive shaft 5. The impeller rotates inside the cylinder 6. A drain port 17 is provided at the top of the cylinder 6. A second fixed flange 7 is provided at the top of the cylinder 6. The second fixed flange 7 is fixed below the first fixed flange 3 by several connecting plates.
[0022] A first water inlet pipe 8 is provided on the side wall of the cylinder 6.
[0023] In this embodiment, there are four stirring modules, and the inlet of the first water inlet pipe 8 corresponding to each stirring module is oriented differently, thereby achieving a better anti-sedimentation effect.
[0024] A guide chute 9 is fixed on the rear side of the mixing tank 1. The input end of the guide chute 9 is fixed below the external wafer blasting machine. The guide chute 9 can be used to receive liquids, abrasives, etc. after the external wafer blasting machine, so as to achieve reuse.
[0025] A liquid level detection box 10 is provided on the right side of the mixing tank 1. Inside the liquid level detection box 10, there is a float liquid level controller 11, and a liquid level pipe 12 is fixed on its side.
[0026] A first water outlet pipe 13 is provided at the bottom of the mixing tank 1, and a control ball valve 14 is provided on the first water outlet pipe 13. A second water inlet pipe 15 and a second water outlet pipe 16 are vertically provided on the mixing support cover.
[0027] Working principle: External liquid and abrasive are guided into the mixing tank 1 through the guide chute 9. The stirring motor 4 is started and drives the impeller to rotate through the drive shaft 5. The material at the bottom of the mixing tank 1 enters the cylinder 6 under the action of the first water inlet pipe 8 and is conveyed upward in the cylinder 6, thereby effectively preventing sedimentation. The liquid level height in the mixing tank 1 can be detected and controlled by the float level controller 11 to prevent the liquid level from being too high or too low.
[0028] Finally, it should be noted that the above embodiments are only used to illustrate the technical solution of this utility model and not to limit it; although the utility model has been described in detail with reference to preferred embodiments, those skilled in the art should understand that modifications can still be made to the specific implementation of this utility model or equivalent substitutions can be made to some technical features without departing from the spirit of the technical solution of this utility model, and all such modifications and substitutions should be covered within the scope of the technical solution claimed by this utility model.
Claims
1. A stirring device for wafer blasting, characterized in that, It includes a mixing tank (1), a mixing support cover plate (2) is provided on the top of the mixing tank (1), and several mixing modules are fixed vertically downward on the mixing support cover plate (2). The stirring module includes a first fixed flange (3), which is fixed on the stirring support cover plate (2). A stirring motor (4) is vertically downward on the first fixed flange (3). A drive shaft (5) is fixed on the rotor of the stirring motor (4). An impeller is installed at the bottom of the drive shaft (5). The impeller is rotatably disposed inside the cylinder (6). A second fixed flange (7) is provided at the top of the cylinder (6). The second fixed flange (7) is fixed below the first fixed flange (3) by several connecting plates. A first water inlet pipe (8) is provided on the side wall of the cylinder (6).
2. The stirring device for wafer sandblasting according to claim 1, wherein A guide chute (9) is fixed on the rear side of the mixing tank (1), and the input end of the guide chute (9) is fixed below the external wafer sandblasting machine.
3. The stirring device for wafer sandblasting according to claim 1, wherein A liquid level detection box (10) is provided on the right side of the mixing tank (1), and a float liquid level controller (11) is provided inside the liquid level detection box (10), with a liquid level pipe (12) fixed on its side.
4. The stirring device for wafer sandblasting according to claim 1, wherein A first water outlet pipe (13) is provided at the bottom of the mixing tank (1), and a control ball valve (14) is provided on the first water outlet pipe (13).
5. The stirring device for wafer sandblasting according to claim 1, wherein A second water inlet pipe (15) and a second water outlet pipe (16) are vertically provided on the stirring support cover.