Electroplating solution impurity removal system
The electroplating solution impurity removal system utilizes an ion exchanger in the ion concentration detection and impurity removal unit to treat the electroplating solution, solving the problem of excessively high impurity ion concentration in the electroplating mother liquor. This improves the quality of the conductive film, extends the service life of the electroplating solution, and reduces manufacturing costs.
CN224478162UActive Publication Date: 2026-07-10ANHUI JIMAT NEW MATERIAL TECH CO LTD
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- ANHUI JIMAT NEW MATERIAL TECH CO LTD
- Filing Date
- 2025-06-12
- Publication Date
- 2026-07-10
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Figure CN224478162U_ABST
Abstract
This application discloses an electroplating solution impurity removal system. The system includes a coating unit, an ion concentration detector, and an impurity removal unit. The coating unit includes at least two independent and spaced-apart first and second electroplating tanks. The ion concentration detector is located in the first electroplating tank to detect at least the concentration of impurity ions within it. The impurity removal unit is connected to the first electroplating tank via a first pipe assembly, allowing the electroplating solution from the first electroplating tank to flow into the impurity removal unit for impurity ion removal. The impurity removal unit is also connected to the first electroplating tank via a second pipe assembly, allowing the treated electroplating solution to flow back into the first electroplating tank from the second pipe assembly. This application solves the problem in the prior art where excessively high ion concentrations in the surface-modified material within the electroplating mother liquor adversely affect the performance of the conductive film.
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