Cleaning apparatus for cleaning deposits from MOCVD equipment

Abstract

The utility model relates to a kind of cleaning device for cleaning MOCVD equipment deposit, belong to the technology in the field of semiconductor, including reaction cavity and storage cavity, the reaction cavity and storage cavity are communicated, cleanable cleaning device is installed in the reaction cavity;Driving device for driving cleaning device to move and rotate cleaning inner wall of reaction cavity is installed in the storage cavity;The utility model can clean the deposit accumulated in cavity on the basis of not disassembling reaction cavity body, avoid the inside of reaction cavity body and atmospheric contact adsorption water vapor, oxygen and other impurities.The cleanliness of the inside of reaction cavity body is maintained, and the stability of machine performance after cavity maintenance is improved.And it can also move cleaning device to the top of mobile cavity, reduce use and storage space, without affecting the effect of gas phase epitaxy on the substrate surface inside the reaction chamber.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor technology, specifically to a cleaning device for cleaning deposits in MOCVD equipment. Background Technology

[0002] MOCVD is a novel vapor-phase epitaxial growth technology developed based on vapor-phase epitaxy (VPE). It is a chemical vapor deposition (CVD) system for metal-organic compounds. During chemical reactions, reaction deposits accumulate inside the reaction chamber. The current method for cleaning residual reactants in the reaction chamber involves disassembling the chamber and using a vacuum cleaner to remove the deposits.

[0003] Existing technology, such as the cleaning device for cleaning deposits in MOCVD equipment (application number 201420363313.9), includes: a cavity and a tube; the tube is disposed on a side wall of one side of the cavity, and the tube communicates with the cavity for removing waste from the bottom of the reaction chamber of the MOCVD equipment.

[0004] The aforementioned patent enables the complete removal of deposits accumulated within the reaction chamber without disassembling it, preventing the interior of the reaction chamber from contacting the atmosphere and adsorbing impurities such as water vapor and oxygen. Maintaining the cleanliness of the reaction chamber is crucial, as a large cleaning structure within the chamber can negatively impact the effectiveness of vapor phase epitaxy on the substrate surface. Utility Model Content

[0005] The present invention aims to solve the above-mentioned technical problems by providing a cleaning device for cleaning deposits in MOCVD equipment.

[0006] To solve the above-mentioned technical problems, the technical solution provided by this utility model is as follows:

[0007] A cleaning apparatus for removing deposits from MOCVD equipment includes a reaction chamber and a storage chamber.

[0008] The reaction chamber and the storage chamber are connected, and a cleanable cleaning device is installed in the reaction chamber;

[0009] The storage cavity is equipped with a drive device that drives the cleaning device to move and rotate to clean the inner wall of the reaction cavity.

[0010] The cleaning device includes a movable rod, which consists of a rotating rod and an L-shaped cleaning rod on one side of the lower end of the rotating rod. A cleaning roller is movably mounted on the outer side of the L-shaped cleaning rod, and a cleaning brush is mounted on the outer side of the L-shaped cleaning rod.

[0011] Preferably, the driving device includes a movable gear, a drive motor, and a telescopic rod fixedly connected to the outside of the rotating rod. The output shaft of the drive motor is equipped with a drive gear, and the drive gear and the movable gear are meshed together. The telescopic rod is fixedly connected to the inner wall of the storage cavity. A connecting plate is installed at the telescopic end of the telescopic rod, and the rotating rod is connected to the connecting plate through a bearing.

[0012] Preferably, the drive motor is mounted on the inner wall of the storage cavity via a bracket.

[0013] Preferably, a limiting tube for guiding the rotating rod is installed on the inner wall of the storage cavity.

[0014] Preferably, the rotating rod and the L-shaped cleaning rod are hollow, the rotating rod and the L-shaped cleaning rod are connected, and the upper end of the rotating rod is connected to the limiting tube.

[0015] Preferably, the rotating rod and the L-shaped cleaning rod have air vents on their outer sides, and the top of the limiting tube is connected to external high-pressure cleaning gas.

[0016] With the above structure, this utility model has the following advantages:

[0017] This invention allows for the complete removal of deposits accumulated within the reaction chamber without disassembling it, preventing the chamber from absorbing moisture, oxygen, and other impurities through contact with the atmosphere. This maintains the cleanliness of the reaction chamber and improves the stability of machine performance after chamber maintenance. Furthermore, the cleaning device can be moved to the top of the mobile chamber, reducing usage and storage space without affecting the effectiveness of vapor phase epitaxy on the substrate surface inside the reaction chamber.

[0018] The above overview is for illustrative purposes only and is not intended to be limiting in any way. In addition to the illustrative aspects, embodiments, and features described above, further aspects, embodiments, and features of the present invention will become readily apparent from the accompanying drawings and the following detailed description. Attached Figure Description

[0019] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0020] Figure 1 This is a schematic diagram of the structure of this utility model;

[0021] Figure 2 This is an internal schematic diagram of the present invention.

[0022] As shown in the figure: 1. Reaction chamber; 2. Storage chamber; 3. Cleaning device; 301. Movable rod; 302. Rotating rod; 303. L-shaped cleaning rod; 304. Cleaning roller; 305. Cleaning brush; 4. Drive device; 401. Moving gear; 402. Drive motor; 403. Drive gear; 404. Telescopic rod; 405. Connecting plate; 5. Limiting tube. Detailed Implementation

[0023] The embodiments of this application are described in detail below. Examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this application, and should not be construed as limiting this application.

[0024] In the description of this application, it should be noted that, unless otherwise expressly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.

[0025] The present invention will now be described in further detail in conjunction with the full text.

[0026] Combined with appendix Figure 1 and Figure 2 A cleaning device for cleaning deposits in MOCVD equipment includes a reaction chamber 1 and a storage chamber 2, which are connected. A cleaning device 3 is installed in the reaction chamber 1. A driving device 4 is installed in the storage chamber 2 to drive the cleaning device 3 to move and rotate to clean the inner wall of the reaction chamber 1.

[0027] In specific implementation of this utility model, such as Figure 1 and Figure 2 As shown, the cleaning device 3 includes a movable rod 301, which consists of a rotating rod 302 and an L-shaped cleaning rod 303 on one side of the lower end of the rotating rod 302. A cleaning roller 304 is movably mounted on the outer side of the L-shaped cleaning rod 303, and a cleaning brush 305 is mounted on the outer side of the L-shaped cleaning rod 303. When the movable rod 301 rotates, the cleaning brush 305 on the outer side of the L-shaped cleaning rod 303 brushes off the reaction deposits on the airflow cover inside the reaction chamber 1 of the MOCVD equipment.

[0028] In specific implementation of this utility model, such as Figure 1 and Figure 2As shown, the drive device 4 includes a movable gear 401 fixedly connected to the outside of the rotating rod 302, a drive motor 402, and a telescopic rod 404. A drive gear 403 is mounted on the output shaft of the drive motor 402, and the drive gear 403 meshes with the movable gear 401. The movable gear 401 and drive gear 403 mesh with each other, and there is a gap between them. When the drive gear 403 is not working, the movable gear 401 can move under the guidance of the drive gear 403. The telescopic rod 404 is fixedly connected to the inner wall of the storage cavity 2. A connecting plate 405 is mounted on the telescopic end of the telescopic rod 404, and the rotating rod 302 is connected to the connecting plate 405 via a bearing. The telescopic rod 404 driving the cleaning device 4 drives the movable rod 301 to move downward through the connecting plate 405. When the cleaning roller 304 contacts the inner wall and side wall of the reaction chamber 1, the drive motor 402 works and drives the moving gear to rotate through the drive gear 403, so that the rotating rod 302 rotates on the connecting plate 405 through the bearing, brushing off the reaction deposits on the airflow cover of the MOCVD equipment.

[0029] The drive motor 402 is mounted on the inner wall of the storage chamber 2 via a bracket. The reaction chamber 1 is provided with a protruding structure for storing the L-shaped cleaning rod 303.

[0030] In a specific implementation of this invention, a limiting tube 5 for guiding the rotating rod 302 is installed on the inner wall of the storage cavity 2. The rotating rod 302 and the L-shaped cleaning rod 303 are hollow and connected, with the upper end of the rotating rod 302 connected to the limiting tube 5. The rotating rod 302 can move inside the limiting tube 5, which serves to limit and connect the rod. Air holes are opened on the outer sides of the rotating rod 302 and the L-shaped cleaning rod 303, and an external vacuum cleaner is connected to the top of the limiting tube 5. The vacuum cleaner is connected to the top of the limiting tube 5 through a pipe, which is existing technology and will not be described in detail here. A switch valve is installed on the pipe, and the vacuum cleaner can absorb the deposits in the reaction chamber 1 through the air holes. After cleaning is complete, the drive motor 402 stops working, the telescopic rod 404 drives the movable rod 301 to reset, the moving gear 401 moves outside the drive gear 403, driving the cleaning device 3 to move upward and store at the top, reducing the space required for use and storage, and not affecting the effect of vapor phase epitaxy on the substrate surface inside the reaction chamber.

[0031] The specific operation process is as follows:

[0032] In actual operation, the MOCVD equipment deposit cleaning device 3 operates in the MOCVD equipment reaction chamber under vacuum conditions.

[0033] The drive device 4 of the MOCVD equipment deposit cleaning device 3 is turned on. The telescopic rod 404 of the cleaning device 4 drives the movable rod 301 to move downward through the connecting plate 405. When the cleaning roller 304 contacts the inner wall and side wall of the reaction chamber 1, the drive motor 402 works and drives the moving gear to rotate through the drive gear 403, so that the rotating rod 302 rotates on the connecting plate 405 through the bearing, brushing off the reaction deposits on the airflow cover of the MOCVD equipment.

[0034] Simultaneously, activate the external vacuum cleaner to remove deposits from the bottom of the MOCVD equipment's reaction chamber through the air vents and the hollow movable rod 301. To ensure complete removal of deposits from the MOCVD equipment's reaction chamber, repeat the above steps until all deposits inside the reaction chamber are removed.

[0035] This device can remove deposits from the bottom of the reaction chamber of the MOCVD equipment. At the same time, the cleaning roller 304 and cleaning brush 305 of the device can brush off the reaction deposits on the airflow cover of the MOCVD equipment during the rotation of the device.

[0036] After cleaning is complete, the drive motor 402 stops working, the telescopic rod 404 drives the movable rod 301 to reset, the moving gear 401 moves outside the drive gear 403, driving the cleaning device 3 to move upward and store at the top, reducing the space required for use and storage, and not affecting the effect of vapor phase epitaxy on the substrate surface inside the reaction chamber.

[0037] The present invention and its embodiments have been described above. This description is not restrictive, and the embodiments shown throughout the text are only one of the embodiments of the present invention. The actual structure is not limited to this. In conclusion, if a person skilled in the art is inspired by this description and designs a similar structure and embodiment without departing from the inventive spirit of the present invention, such design should fall within the protection scope of the present invention.

Claims

1. A cleaning device for cleaning deposits in MOCVD equipment, characterized in that, It includes a reaction chamber (1) and a storage chamber (2). The reaction chamber (1) and the storage chamber (2) are connected, and a cleanable cleaning device (3) is installed in the reaction chamber (1); The storage cavity (2) is equipped with a drive device (4) for moving and rotating the inner wall of the reaction chamber (1) to clean the cleaning device (3); The cleaning device (3) includes a movable rod (301), which is composed of a rotating rod (302) and an L-shaped cleaning rod (303) on one side of the lower end of the rotating rod (302). A cleaning roller (304) is movably installed on the outside of the L-shaped cleaning rod (303), and a cleaning brush (305) is installed on the outside of the L-shaped cleaning rod (303).

2. The cleaning device for cleaning deposits in MOCVD equipment according to claim 1, characterized in that: The driving device (4) includes a movable gear (401), a drive motor (402), and a telescopic rod (404) fixedly connected to the outside of the rotating rod (302). The output shaft of the drive motor (402) is equipped with a drive gear (403), and the drive gear (403) and the movable gear (401) are meshed together. The telescopic rod (404) is fixedly connected to the inner wall of the storage cavity (2). A connecting plate (405) is installed at the telescopic end of the telescopic rod (404). The rotating rod (302) is connected to the connecting plate (405) through a bearing.

3. The cleaning device for cleaning deposits in MOCVD equipment according to claim 2, characterized in that: The drive motor (402) is mounted on the inner wall of the storage cavity (2) via a bracket.

4. The cleaning device for cleaning deposits in MOCVD equipment according to claim 1, characterized in that: The inner wall of the storage cavity (2) is equipped with a limiting tube (5) for guiding the rotating rod (302).

5. The cleaning device for cleaning deposits in MOCVD equipment according to claim 4, characterized in that: The rotating rod (302) and the L-shaped cleaning rod (303) are hollow. The rotating rod (302) and the L-shaped cleaning rod (303) are connected, and the upper end of the rotating rod (302) is connected to the limiting tube (5).

6. The cleaning apparatus for cleaning deposits in MOCVD equipment according to claim 5, characterized in that: Air holes are provided on the outer sides of the rotating rod (302) and the L-shaped cleaning rod (303), and the top of the limiting tube (5) is connected to an external vacuum cleaner.

7. The cleaning device for cleaning deposits in MOCVD equipment according to claim 2, characterized in that: The reaction chamber (1) is provided with a protruding structure for storing the L-shaped cleaning rod (303).

Images