A photoresist storage device with a filter circulation structure

Abstract

This utility model discloses a photoresist storage device with a filtration and circulation structure, including a storage tank, a filtration and circulation assembly, a temperature control assembly, and a sealing and protection assembly. The storage tank has a cylindrical sandwich structure, with an inlet at the top and an outlet pipe at the bottom. A sealing cap is provided on the inlet, and a first solenoid valve is provided at the end of the outlet pipe. The filtration and circulation assembly includes a circulation pump, a filter, a circulation pipeline, and a stirring assembly. The circulation pump is a corrosion-resistant diaphragm pump. The filter is connected in series with the circulation pump through the circulation pipeline. One end of the circulation pipeline is connected to the outlet pipe through a second solenoid valve, and the other end extends to the top of the storage tank and is equipped with a spray head. The advantages are: it effectively solves the problems of high risk of impurity contamination, easy component stratification, insufficient temperature control accuracy, and poor sealing and cleaning performance of existing photoresist storage devices.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor storage device technology, and in particular to a photoresist storage device with a filter circulation structure. Background Technology

[0002] Photoresist is a key functional material used for pattern transfer in photolithography. Its chemical stability and physical uniformity directly affect photolithography accuracy and product yield. However, existing photoresist storage devices have many shortcomings in practical applications:

[0003] Firstly, during storage and retrieval, photoresist is prone to impurity particles due to environmental dust intrusion and micro-precipitation of its own components. Existing storage devices have multiple filtration functions, and impurities will cause pattern distortion on wafers or display panels after entering the coating process with the photoresist.

[0004] Secondly, photoresist is a multi-component colloidal mixture. When left to stand for a long time, the concentration difference between the upper and lower layers is likely to occur. Traditional devices rely on manual stirring or a single stirring structure, which makes it difficult to achieve uniform mixing. The thickness deviation of the photoresist coating after layering seriously affects the photolithography resolution.

[0005] Third, photoresist needs to be stored at a low temperature of 2-8℃ to slow down the reaction of components. The temperature control system of existing devices is mostly a single component (only cooling or heating), and the temperature fluctuation range is large. Too high a temperature will accelerate the evaporation of solvent and cause the viscosity of the photoresist to increase, while too low a temperature may cause the photoresist to solidify, both of which will damage the performance of the photoresist.

[0006] Fourth, the existing equipment's inlet, pipeline interfaces, and other parts are not properly sealed, which can easily introduce oxygen and moisture from the air, causing the photoresist to oxidize or absorb moisture and hydrolyze. At the same time, the photoresist remaining in the circulation pipeline is easy to solidify and form a secondary source of pollution. Moreover, the pipeline is cumbersome to disassemble and clean, affecting storage efficiency and the cleanliness of the photoresist.

[0007] In summary, existing photoresist storage devices are insufficient to meet the stringent requirements of semiconductor manufacturing for low impurities, uniformity, constant temperature, and high cleanliness. There is an urgent need for a storage device that integrates filtration and circulation, precise temperature control, reliable sealing, and convenient cleaning functions. Utility Model Content

[0008] The purpose of this invention is to solve the problems of high risk of impurity contamination, easy component stratification, insufficient temperature control accuracy, and poor sealing protection and cleanliness of existing photoresist storage devices, and to provide a photoresist storage device with a filter circulation structure.

[0009] This utility model achieves the above objectives through the following technical solutions:

[0010] A photoresist storage device with a filtration and circulation structure includes a storage tank, a filtration and circulation assembly, a temperature control assembly, and a sealing and protection assembly. The storage tank has a cylindrical sandwich structure, with an inlet at the top and an outlet pipe at the bottom. A sealing cap is provided on the inlet, and a first solenoid valve is provided at the end of the outlet pipe. The filtration and circulation assembly includes a circulation pump, a filter, a circulation pipeline, and a stirring assembly. The circulation pump is a corrosion-resistant diaphragm pump. The filter is connected in series with the circulation pump through the circulation pipeline. One end of the circulation pipeline is connected to the outlet pipe through a second solenoid valve, and the other end extends to the top of the storage tank and is provided with a spray head.

[0011] Furthermore, the stirring assembly includes a reducer disposed at the bottom of the storage tank, the reducer being connected to a motor, a stirring shaft being rotatably connected to the bottom of the storage tank, the output end of the reducer being connected to the stirring shaft via a coupling, and a double-layered stirring paddle being disposed on the stirring shaft.

[0012] Furthermore, the bottom of the storage tank is provided with an inclined guide plate, the lowest point of which is connected to the discharge pipe to ensure that there is no residual photoresist discharged into the tank and to prevent the bottom liquid from accumulating and deteriorating.

[0013] Furthermore, the temperature control component includes a cooling element, a heating element, a temperature sensor, and a temperature controller. The cooling element and the heating element are installed alternately in the interlayer of the storage tank. The temperature sensor is installed at the top inside the storage tank. The temperature controller is installed on the outside of the storage tank and is electrically connected to the cooling element, the heating element, and the temperature sensor, respectively, and a temperature threshold can be set.

[0014] Furthermore, the sealing and protection assembly includes an electric air valve, a pressure sensor, a vent pipe, and a nitrogen tank. The electric air valve is connected in series with the nitrogen tank through the vent pipe, and the other end of the vent pipe is connected to the top of the inside of the storage tank. The pressure sensor is installed at the top of the inside of the storage tank. The sealing and protection assembly also includes a controller, which is electrically connected to the electric air valve and the pressure sensor respectively. The three components work together to control the pressure inside the tank.

[0015] Furthermore, a self-cleaning branch pipe is provided on the circulation pipeline. One end of the self-cleaning branch pipe is connected to the cleaning liquid storage tank, and the other end is connected to the circulation pipeline and located between the filter and the second solenoid valve. A third solenoid valve is provided on the self-cleaning branch pipe to control the flow of the cleaning liquid.

[0016] Furthermore, a first support is provided at the bottom of the storage tank, and a second support is provided at the bottom of the filtration and circulation assembly and the sealing and protection assembly.

[0017] Beneficial effects: This utility model has the following beneficial effects:

[0018] 1. The filter circulation assembly forms a closed-loop filter through the circulation pump, filter and circulation pipeline. The corrosion-resistant diaphragm pump drives the photoresist to flow through the filter, which can intercept environmental dust, glue sediment and other impurity particles. With the help of the spray head, the filtered glue is evenly returned to the tank to avoid impurity residue.

[0019] 2. The double-layer stirring paddle of the stirring component is linked with the filter circulation. The stirring shaft drives the paddle to rotate, and with the bottom out and top return flow of the circulation pipeline, it completely breaks the tendency of photoresist to separate after long-term static placement. No manual intervention is required, which reduces labor costs while ensuring uniform photoresist coating thickness.

[0020] 3. The cooling and heating elements of the temperature control component are installed alternately in the tank jacket. Together with the temperature sensor and temperature controller, the temperature inside the tank can be stabilized in the target range of 2-8℃. When the temperature is too high, the cooling element is activated to prevent solvent evaporation and viscosity increase. When the temperature is too low, the heating element is activated to prevent the colloid from solidifying.

[0021] 4. The sealing and protection components maintain the pressure inside the tank through the linkage of nitrogen tank, electric air valve and pressure sensor, isolate external oxygen and moisture, and prevent the adhesive from oxidizing and hydrolyzing. The self-cleaning branch pipe can be controlled by the third solenoid valve to inject cleaning fluid to dissolve the residual adhesive in the circulation pipeline, and cleaning can be completed without disassembly. Attached Figure Description

[0022] Figure 1 This is a schematic diagram of the structure of this utility model;

[0023] Figure 2 This is a schematic diagram of the storage tank structure of this utility model;

[0024] Figure 3 This is a schematic diagram of the structure of the filter circulation component and the sealing protection component of this utility model;

[0025] Figure 4 This is a schematic diagram of the temperature control component structure of this utility model;

[0026] Figure 5 This is a schematic diagram of the top structure of the storage tank of this utility model.

[0027] In the diagram: 1-Storage tank, 2-Filter circulation assembly, 3-Temperature control assembly, 4-Sealing and protection assembly, 5-First support, 6-Second support;

[0028] 101-Inlet, 102-Outlet pipe, 103-Sealing cap, 104-First solenoid valve, 105-Inclined guide plate, 201-Circulation pump, 202-Filter, 203-Circulation pipeline, 204-Agitator assembly, 205-Second solenoid valve, 206-Spray head, 207-Self-cleaning branch pipe, 208-Cleaning liquid storage tank, 209-Third solenoid valve, 301-Refrigeration element, 302-Heating element, 303-Temperature sensor, 304-Thermostat, 401-Electric air valve, 402-Pressure sensor, 403-Vent pipe, 404-Nitrogen tank, 2041-Reducer, 2042-Motor, 2043-Agitator shaft, 2044-Agitator paddle. Detailed Implementation

[0029] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present utility model. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments.

[0030] Combination Figures 1 to 5 The photoresist storage device with a filtration and circulation structure shown includes a storage tank 1, a filtration and circulation assembly 2, a temperature control assembly 3, and a sealing and protection assembly 4. The storage tank 1 has a cylindrical sandwich structure, with an inlet 101 at the top and an outlet pipe 102 at the bottom. A sealing cap 103 is provided on the inlet 101 to initially block external dust intrusion. A first solenoid valve 104 is provided at the end of the outlet pipe 102, enabling contactless dispensing of the photoresist and reducing the risk of introducing impurities during manual operation. The filtration and circulation assembly 2 includes a circulation pump 201, a filter 202, a circulation pipeline 203, and a stirring assembly 204. 1 is a corrosion-resistant diaphragm pump that can provide sufficient power to drive the photoresist circulation. The filter 202 is connected in series with the circulation pump 201 through the circulation pipeline 203, which can intercept environmental dust, photoresist sediment and other impurity particles. One end of the circulation pipeline 203 is connected to the discharge pipe 102 through the second solenoid valve 205, and the other end extends to the top of the storage tank 1 and is equipped with a spray head 206. The opening and closing of the second solenoid valve 205 can flexibly switch the circulation filtration and normal discharge modes. During circulation, the first solenoid valve 104 is closed and the second solenoid valve 205 is opened. The photoresist enters the circulation pipeline 203 through the discharge pipe 102, and after filtration, it flows back into the tank through the spray head 206.

[0031] The stirring assembly 204 includes a reducer 2041 located at the bottom of the storage tank 1. The reducer 2041 is connected to a motor 2042. A stirring shaft 2043 is rotatably connected to the bottom of the storage tank 1. The output end of the reducer 2041 is connected to the stirring shaft 2043 via a coupling. A double-layered stirring paddle 2044 is provided on the stirring shaft 2043. The motor 2042 works in conjunction with the reducer 2041 to control the rotation speed of the stirring shaft 2043, preventing air bubbles from forming in the photoresist solution due to high-speed stirring. The rotation of the stirring paddle 2044, in conjunction with the upward and downward circulation of the filter, can completely break the layering trend of photoresist after long-term static storage, eliminating the need for manual intervention, reducing labor costs, and ensuring uniform photoresist coating thickness.

[0032] The bottom of the storage tank 1 is equipped with an inclined guide plate 105, the lowest point of which is connected to the discharge pipe 102 to ensure that there is no residual discharge of photoresist in the tank and to prevent the bottom liquid from accumulating and deteriorating.

[0033] The temperature control component 3 includes a cooling element 301, a heating element 302, a temperature sensor 303, and a temperature controller 304. The cooling element 301 and the heating element 302 are installed alternately in the interlayer of the storage tank 1. The temperature sensor 303 is installed at the top inside the storage tank 1. The temperature controller 304 is installed on the outside of the storage tank 1 and is electrically connected to the cooling element 301, the heating element 302, and the temperature sensor 303 respectively. A temperature threshold can be set. When the temperature sensor 303 detects that the temperature inside the tank is higher than the set threshold, the temperature controller 304 activates the cooling element 301 to quickly reduce the temperature inside the tank. When the temperature is lower than the set threshold, the heating element 302 is activated to prevent the adhesive from solidifying.

[0034] The sealing and protection assembly 4 includes an electric air valve 401, a pressure sensor 402, a vent pipe 403, and a nitrogen tank 404. The electric air valve 401 is connected in series with the nitrogen tank 404 through the vent pipe 403. The other end of the vent pipe 403 is connected to the top of the inside of the storage tank 1. The pressure sensor 402 is installed at the top of the inside of the storage tank 1. The sealing and protection assembly 4 also includes a controller, which is electrically connected to the electric air valve 401 and the pressure sensor 402 respectively. The three are linked to control the pressure inside the tank. The controller controls the opening and closing of the electric air valve 401 according to the detection signal of the pressure sensor 402 to maintain a slightly positive pressure environment inside the tank. The positive pressure can effectively prevent external humid air and oxygen from entering the tank through the sealing gaps, interfaces, etc. The inert properties of nitrogen can prevent chemical reaction with the photoresist and inhibit the oxidation of the photoresist, thus extending the storage life of the photoresist.

[0035] A self-cleaning branch pipe 207 is installed on the circulation pipeline 203. One end of the self-cleaning branch pipe 207 is connected to the cleaning fluid storage tank 208, and the other end is connected to the circulation pipeline 203 and located between the filter 202 and the second solenoid valve 205. A third solenoid valve 209 is installed on the self-cleaning branch pipe 207 to control the flow of the cleaning fluid. The cleaning fluid storage tank 208 stores isopropyl alcohol cleaning fluid (which can dissolve photoresist residue). When it is necessary to clean the circulation pipeline 203, the first solenoid valve 104 is closed and the second solenoid valve 205 is opened. 05 and the third solenoid valve 209 are connected to the circulation pump 201. The cleaning fluid enters the circulation pipeline 203 from the self-cleaning branch pipe 207. The cleaning fluid flows in the circulation pipeline 203, dissolving the photoresist remaining on the inner wall of the pipeline. When the cleaning fluid flows through the filter 202, it can simultaneously clean the impurities on the surface of the filter membrane, extending the service life of the filter membrane. After cleaning is completed, the second solenoid valve 205 is closed and the first solenoid valve 104 is opened to allow the cleaning fluid to be discharged. This cleaning device greatly improves maintenance efficiency and avoids the introduction of impurities during disassembly.

[0036] The storage tank 1 is provided with a first support 5 at the bottom, and the filter circulation assembly 2 and the sealing protection assembly 4 are provided with a second support 6 at the bottom.

[0037] It will be apparent to those skilled in the art that this invention is not limited to the details of the exemplary embodiments described above, and that it can be implemented in other specific forms without departing from the spirit or essential characteristics of this invention. Therefore, the embodiments should be considered illustrative and non-limiting in all respects, and the scope of this invention is defined by the appended claims rather than the foregoing description. Thus, it is intended that all variations falling within the meaning and scope of equivalents of the claims be included within this invention. No reference numerals in the claims should be construed as limiting the scope of the claims.

[0038] Furthermore, it should be understood that although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

Claims

1. A photoresist storage device with a filter circulation structure, characterized in that: The system includes a storage tank (1), a filter circulation assembly (2), a temperature control assembly (3), and a sealing and protection assembly (4). The storage tank (1) is a cylindrical sandwich structure with an inlet (101) at the top and an outlet pipe (102) at the bottom. A sealing cap (103) is provided on the inlet (101), and a first solenoid valve (104) is provided at the end of the outlet pipe (102). The filter circulation assembly (2) includes a circulation pump (201), a filter (202), a circulation pipeline (203), and a stirring assembly (204). The circulation pump (201) is a corrosion-resistant diaphragm pump. The filter (202) is connected in series with the circulation pump (201) through the circulation pipeline (203). One end of the circulation pipeline (203) is connected to the outlet pipe (102) through a second solenoid valve (205), and the other end extends to the top of the storage tank (1) and is equipped with a spray head (206).

2. The photoresist storage device with a filter circulation structure according to claim 1, characterized in that: The stirring assembly (204) includes a reducer (2041) disposed at the bottom of the storage tank (1), the reducer (2041) being connected to a motor (2042), a stirring shaft (2043) being rotatably connected to the bottom of the storage tank (1), the output end of the reducer (2041) being connected to the stirring shaft (2043) via a coupling, and a double-layered stirring paddle (2044) being disposed on the stirring shaft (2043).

3. The photoresist storage device with a filter circulation structure according to claim 2, characterized in that: The storage tank (1) is provided with an inclined guide plate (105) at the bottom, the lowest point of which is connected to the discharge pipe (102) to ensure that there is no residual discharge of photoresist in the tank and to avoid the accumulation of liquid at the bottom and deterioration.

4. The photoresist storage device with a filter circulation structure according to claim 3, characterized in that: The temperature control component (3) includes a cooling element (301), a heating element (302), a temperature sensor (303), and a temperature controller (304). The cooling element (301) and the heating element (302) are installed alternately in the interlayer of the storage tank (1). The temperature sensor (303) is installed at the top inside the storage tank (1). The temperature controller (304) is installed on the outside of the storage tank (1) and is electrically connected to the cooling element (301), the heating element (302), and the temperature sensor (303) respectively. The temperature threshold can be set.

5. A photoresist storage device with a filter circulation structure according to claim 4, characterized in that: The sealing and protection assembly (4) includes an electric air valve (401), a pressure sensor (402), a vent pipe (403), and a nitrogen tank (404). The electric air valve (401) is connected in series with the nitrogen tank (404) through the vent pipe (403). The other end of the vent pipe (403) is connected to the top of the inside of the storage tank (1). The pressure sensor (402) is installed at the top of the inside of the storage tank (1). The sealing and protection assembly (4) also includes a controller, which is electrically connected to the electric air valve (401) and the pressure sensor (402) respectively. The three controllers work together to control the pressure inside the tank.

6. A photoresist storage device with a filter circulation structure according to claim 5, characterized in that: A self-cleaning branch pipe (207) is provided on the circulation pipeline (203). One end of the self-cleaning branch pipe (207) is connected to the cleaning liquid storage tank (208), and the other end is connected to the circulation pipeline (203) and located between the filter (202) and the second solenoid valve (205). A third solenoid valve (209) is provided on the self-cleaning branch pipe (207) to control the flow of the cleaning liquid.

7. A photoresist storage device with a filter circulation structure according to claim 5, characterized in that: The storage tank (1) is provided with a first support (5) at the bottom, and the filter circulation assembly (2) and the sealing protection assembly (4) are provided with a second support (6) at the bottom.

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