A photolithography fixture for microscopic examination

Abstract

This utility model relates to a photomask clamp for microscopic inspection, belonging to the field of electronic device manufacturing and processing. It includes: a substrate with a placement groove at its center for accommodating the photomask; several clamping blocks slidably connected to the substrate surface, each clamping block being evenly distributed along the periphery of the placement groove and sliding radially along the groove; an adjustment mechanism including a rotating ring rotatably connected to the substrate and guide lugs evenly distributed on the rotating ring; the rotating ring rotating coaxially with the placement groove; the guide lugs corresponding in number to the clamping blocks, and each guide lug having a guide groove inclined outwards from the rotating ring; and each clamping block having a guide rod extending into and slidably connected to the guide groove; and a locking mechanism for locking or releasing the rotating ring and the substrate. This utility model ensures that the photomask is always clamped at the absolute center position of the placement groove, eliminating offset or twisting caused by asynchrony on both sides, and achieving high-precision automatic centering and clamping of the photomask.

Description

Technical Field

[0001] This utility model belongs to the field of electronic device manufacturing and processing, and relates to a photomask fixture for microscopic inspection. Background Technology

[0002] In microelectronic lithography, the photomask is a crucial tool for controlling light transmission. Its main function is to form the desired micron-scale patterns on a surface through steps such as illumination and development, thereby enabling precision manufacturing in micro- and nano-scale processes. The quality of the photomask pattern directly determines the final chip manufacturing precision and yield. Therefore, before lithography, the photomask must be inspected using an optical microscope to promptly detect and eliminate contaminants, ensuring a clear and defect-free pattern. During this inspection, a specialized fixture must be used to stably and precisely fix the photomask onto the microscope stage to prevent movement during observation, ensuring the accuracy of the inspected area and image stability.

[0003] Currently, there are various fixtures available in the prior art for fixing photomasks. For example, Chinese utility model patent CN221746435U discloses a self-made photomask fixing fixture, which includes a substrate with a hole in the middle. Slides are slidably provided on both sides of the hole on the substrate. A photomask support plate and a fixing component for fixing the photomask are provided at one end of the slide near the hole. An adjustment component for driving the slide to slide radially along the hole is also provided on the substrate. This fixing fixture can push the positioning roller to slide along the guide rail by manually turning the bolts, thereby adapting to and clamping photomasks of different sizes.

[0004] However, the following problems were found during the clamping process of the photomask: Due to the reliance on manual adjustment of the independent bolts on both sides, and the lack of a synchronous drive mechanism, it is difficult to ensure that the two positioning rollers move synchronously and equidistantly from both sides of the photomask during operation. Asynchronous clamping can easily cause the photomask to shift or twist during fixation, failing to stably remain in the center of the placement slot, thus deviating from the microscope's field of view or the optimal observation focal plane. Operators often need to perform repeated secondary fine-tuning after initial clamping, which is not only cumbersome, time-consuming, and inefficient, but also increases the risk of touching or scratching the photomask surface. Furthermore, the inconsistency of manual operation and the potential for uneven stress make it difficult to meet the stringent requirements of high precision, high repeatability, and high reliability in modern semiconductor processes.

[0005] In summary, current photomask fixtures suffer from problems such as poor clamping synchronization, low positioning accuracy, and uneven stress. This invention provides a photomask fixture for microscopic inspection to solve the above-mentioned technical problems. Utility Model Content

[0006] In view of this, the purpose of this utility model is to provide a photomask clamp for microscopic inspection that can achieve automatic synchronous centering and clamping, so as to solve the problem of poor clamping synchronization of traditional photomask clamps, thereby providing convenience for subsequent microscopic inspection of photomasks.

[0007] To achieve the above objectives, this utility model provides the following technical solution:

[0008] A photomask fixture for microscopic examination includes:

[0009] The substrate has a placement groove at its center for accommodating a photomask, and several clamping blocks are slidably connected to the surface of the substrate. Each clamping block is evenly distributed along the periphery of the placement groove and slides radially along the placement groove.

[0010] The adjustment mechanism includes a rotating ring rotatably connected to the base plate and guide ears evenly distributed on the rotating ring. The rotating ring rotates coaxially with the placement groove. The number of guide ears corresponds to the number of clamping blocks. Each guide ear is provided with a guide groove that is inclined outward from the rotating ring. Each clamping block is provided with a guide rod that extends into the guide groove and is slidably connected to the guide groove.

[0011] A locking mechanism is used to lock or release the rotating ring from the substrate.

[0012] Furthermore, the top surface of the substrate is provided with a plurality of limiting grooves located at the periphery of the placement groove. The limiting grooves are all oriented toward the center of the placement groove, and one end of each limiting groove is connected to the placement groove. Each clamping block is slidably connected to each limiting groove.

[0013] Furthermore, the bottom of the rotating ring is in contact with the upper surface of the clamping block.

[0014] Furthermore, a base is provided below the substrate, and several supports are provided between the base plate and the base. A cavity coaxial with the placement groove is formed between the base plate and the base, and a fixing platform is provided at the center of the cavity.

[0015] The locking mechanism includes a locking ring rotatably connected in the cavity and a locking bolt threadedly connected to the side wall of the locking ring. The locking ring and the rotating ring are coaxial, the locking bolt is perpendicular to the side wall of the locking ring, and one end of the locking bolt passes through the locking ring and is perpendicular to the side wall of the fixed platform.

[0016] The substrate is provided with several arc-shaped connecting grooves, and the center of the connecting grooves is the same as the center of the rotating ring. The locking ring is provided with several connecting rods, which pass through each connecting groove and are connected to the rotating ring.

[0017] Furthermore, the height of the locking ring is adapted to the depth of the cavity.

[0018] Furthermore, a shifting gap is formed between adjacent brackets to accommodate the shifting of locking bolts.

[0019] Furthermore, the end of the locking bolt extends out of the actuation gap and is provided with a knob.

[0020] Furthermore, a threaded sleeve is vertically connected to the outer wall of the locking ring, and the locking bolt engages with the threaded sleeve.

[0021] Furthermore, the outer wall of the rotating ring is provided with several connecting lugs, and the top of the connecting rod is connected to each of the connecting lugs.

[0022] Furthermore, the inner wall of the guide groove is a smoothly transitioned curved surface.

[0023] The beneficial effects of this utility model are as follows:

[0024] 1. By cooperating with the rotating ring and the guide groove, the single rotational motion is transformed into the precise and synchronous radial linear motion of multiple clamping blocks, which fundamentally ensures the synchronicity and centering of the clamping, and guarantees that the photomask is clamped in the absolute center position of the placement groove from beginning to end. This eliminates the offset or torsion caused by the asynchrony of the two sides, realizes the high-precision automatic centering and clamping of the photomask, and greatly reduces the operation steps and time, improving the efficiency of pre-inspection preparation.

[0025] 2. The single-point drive rotating ring can clamp the photomask in multiple directions. The single-point operation mode simplifies the process, avoids tedious secondary fine-tuning, greatly shortens the clamping time, and has excellent repeatability. It does not rely on the operator's experience and significantly improves the efficiency and consistency of operation.

[0026] 3. The locking bolt in the locking mechanism can not only cooperate with the fixed platform to lock the locking ring, rotating ring and clamping block as a whole, but also, after being separated from the fixed platform, can act as a power transmission component to drive the locking ring and rotating ring to rotate as a whole, thereby driving the clamping block to move, thus enhancing the versatility of the locking bolt's functions.

[0027] Other advantages, objectives, and features of this invention will be set forth in part in the description which follows, and in part will be apparent to those skilled in the art from the following examination and study, or may be learned from practice of this invention. The objectives and other advantages of this invention can be realized and obtained through the following description. Attached Figure Description

[0028] To make the objectives, technical solutions, and advantages of this utility model clearer, the preferred embodiments of this utility model will be described in detail below with reference to the accompanying drawings, wherein:

[0029] Figure 1 This is a schematic diagram of a photomask fixture used for microscopic examination.

[0030] Figure 2 This is a schematic diagram of a photomask fixture for microscopic examination.

[0031] Figure 3 A schematic diagram of the structure of a photomask clamp used for microscopic examination during locking;

[0032] Figure 4 This is an exploded view of the structure of a photomask fixture used for microscopic examination.

[0033] Reference numerals: base 100, base plate 101, bracket 102, base 103, placement groove 110, limiting groove 111, clamping block 112, guide rod 120, rotating ring 121, guide groove 122, connecting rod 130, connecting groove 131, fixing platform 140, locking ring 141, locking bolt 142, knob 143. Detailed Implementation

[0034] The following specific examples illustrate the implementation of this utility model. Those skilled in the art can easily understand other advantages and effects of this utility model from the content disclosed in this specification. This utility model can also be implemented or applied through other different specific embodiments, and various details in this specification can also be modified or changed based on different viewpoints and applications without departing from the spirit of this utility model. It should be noted that the illustrations provided in the following embodiments are only schematic representations of the basic concept of this utility model. Unless otherwise specified, the following embodiments and features can be combined with each other.

[0035] The accompanying drawings are for illustrative purposes only and are schematic diagrams, not actual pictures. They should not be construed as limiting the present invention. To better illustrate the embodiments of the present invention, some parts in the drawings may be omitted, enlarged, or reduced, and do not represent the actual product dimensions. It is understandable to those skilled in the art that some well-known structures and their descriptions may be omitted in the drawings.

[0036] In the accompanying drawings of this utility model, the same or similar reference numerals correspond to the same or similar components. In the description of this utility model, it should be understood that if terms such as "upper," "lower," "left," "right," "front," and "rear" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, they are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, the terms used to describe positional relationships in the drawings are only for illustrative purposes and should not be construed as limiting this utility model. For those skilled in the art, the specific meaning of the above terms can be understood according to the specific circumstances.

[0037] Please see Figures 1-4 This is a photomask fixture for microscopic examination, including a base 100 for supporting the photomask. The base 100 has a placement groove 110 at its center for placing the photomask. The surface of the base 100 also has a plurality of limiting grooves 111 that are radially distributed along the placement groove 110 and communicate with the placement groove 110. Each limiting groove 111 is slidably connected with a clamping block 112 that can extend into the placement groove 110. The thickness of the clamping block 112 is adapted to the depth of the limiting groove 111. The limiting grooves 111 and the clamping blocks 112 are distributed along the central circumference of the placement groove 110 or symmetrically distributed along the central surface of the placement groove 110.

[0038] An adjustment mechanism is provided on the base 100 for driving each clamping block 112 to slide synchronously along each limiting groove 111. The adjustment mechanism includes a rotating ring 121 rotatably connected to the surface of the base 100, a number of guide lugs provided on the outer wall of the rotating ring 121, and guide grooves 122 respectively opened on each guide lug. When the rotating ring 121 rotates, the bottom of the rotating ring 121 is in contact with the upper surface of the clamping block 112 so that the clamping block 112 can be normally inserted into the placement groove 110 to clamp the photomask. The guide groove 122 is inclined to the outside of the rotating ring 121, and the inner wall of the guide groove 122 is a smoothly transitioned curved surface, thereby adjusting the position of the clamping block 112. The number of guide lugs, guide grooves 122, limiting grooves 111, and clamping blocks 112 are matched with each other, and the top surface of the end of each clamping block 112 is provided with a guide rod 120 that extends into the guide groove 122 and is slidably connected to the guide groove 122. During the rotation of the rotating ring 121, the guide ear and guide groove 122 will rotate, so that different positions of the guide groove 122 rotate until they coincide with the limiting groove 111. Then, the guide rod 120 can drive the clamping block 112 in the limiting groove 111 to slide along the limiting groove 111.

[0039] By cooperating with the rotating ring 121 and the guide groove 122, the single rotational motion is transformed into the precise and synchronous radial linear motion of multiple clamping blocks 112, which fundamentally ensures the synchronicity and centering of the clamping, and guarantees that the photomask is clamped in the absolute center position of the placement groove 110 from beginning to end. This eliminates the offset or torsion caused by the asynchrony of the two sides, and greatly reduces the operation steps and time, thus improving the efficiency of pre-inspection preparation.

[0040] The base 100 is also provided with a locking mechanism that can lock the rotation of the rotating ring 121. The locking mechanism includes a locking ring 141 that is connected to the rotating ring 121 and rotates synchronously, and a locking bolt 142 that cooperates with the locking ring 141 and can mechanically lock it.

[0041] The implementation process of this embodiment is as follows:

[0042] The first step is to drive the rotating ring 121 to rotate by an external force. The rotating ring 121 will drive the guide ear and guide groove 122 to rotate, so that the end of the guide groove 122 away from the rotating ring 121 gradually rotates until it overlaps with the limiting groove 111. The guide rod 120 drives the clamping block 112 in the limiting groove 111 to slide along the outside of the limiting groove 111, providing clearance space for the placement of the photomask. After the clamping block 112 rotates to the end, the locking bolt 142 is used to lock the locking ring 141 and the rotating ring 121.

[0043] The second step is to place the photomask that needs to be inspected with a microscope in the placement slot 110;

[0044] The third step is to fix the placed photomask. This is achieved by applying an external force to rotate the rotating ring 121 in the opposite direction. The rotating ring 121 then rotates the guide lugs and guide groove 122, causing the end of the guide groove 122 closest to the rotating ring 121 to gradually rotate until it overlaps with the limiting groove 111. The guide rod 120 then drives the clamping block 112 within the limiting groove 111 to slide along the inner side of the limiting groove 111. The clamping block 112 gradually extends into the placement groove 110 and clamps and fixes the photomask. Because the strokes of each clamping block 112 are synchronized and identical, each clamping block 112 can extend synchronously from all directions of the photomask, ensuring that the photomask is clamped in the center of the placement groove 110 without deviating from its position. Simultaneously, the limiting effect of the rotating ring 121 and the guide lugs prevents the clamping block 112 from detaching from the limiting groove 111 from above.

[0045] During the process of adjusting the position of each clamping block 112 and clamping and fixing the photomask using the adjustment mechanism, each clamping block 112 can extend and clamp synchronously from multiple directions. This ensures that the photomask is stably clamped and can be kept in the center of the placement groove 110 without deviation, which facilitates subsequent photomask inspection.

[0046] In one possible embodiment, the base 100 includes a base 103, supports 102 located at the four corners of the base 103, and a substrate 101 supported and fixed by the four supports 102. A placement groove 110 is formed at the center of the surface of the substrate 101, and a limiting groove 111 is formed around the surface of the substrate 101. A rotating ring 121 is rotatably connected to the surface of the substrate 101. The base 103 and the supports 102 are fixed together by bolts, while the supports 102 and the substrate 101 are integrally formed to facilitate the overall assembly of the base 100 and to facilitate the combination and assembly of the base 100 with structures such as the rotating ring 121.

[0047] In one possible embodiment, the base 103 and the substrate 101 form a cavity coaxial with the placement groove 110. The locking ring 141 is rotatably connected in the cavity. The locking ring 141 and the rotating ring 121 rotate synchronously coaxially, and the height of the locking ring 141 is adapted to the depth of the cavity. A fixed platform 140 is provided at the center of the cavity. The top and bottom of the fixed platform 140 are respectively connected to the substrate 101 and the base 103. The locking bolt 142 is threadedly connected to the locking ring 141. One end of the locking bolt 142 passes through the locking ring 141 and is perpendicular to the side wall of the fixed platform 140, while the other end of the locking bolt 142 extends out of the base 100 and is provided with a knob 143. The locking ring 141 is provided with a threaded sleeve that mates with the locking bolt 142. The threaded sleeve is perpendicular to the side wall of the locking ring 141. A turning gap is formed between adjacent brackets 102 to allow the locking bolt 142 to be turned.

[0048] By moving the locking bolt 142 along the actuation gap, the locking ring 141 can be rotated, which in turn causes the rotating ring 121 to rotate, thereby causing each clamping block 112 to move synchronously. When it is necessary to lock the rotating ring 121 to fix the position of each clamping block 112, by rotating the locking bolt 142, the threaded engagement between the locking bolt 142 and the threaded sleeve allows the locking bolt 142 to move towards the fixed platform 140 and gradually clamp until a mechanical locking connection is formed between the locking bolt 142 and the fixed platform 140, thus achieving the effect of fixing the position of the locking ring 141, the rotating ring 121, and the clamping blocks. Reverse rotation of the locking bolt 142 will release the fixing effect of the locking ring 141, the rotating ring 121, and the clamping blocks.

[0049] In one possible embodiment, a plurality of arc-shaped connecting grooves 131 are provided on the substrate 101, the center of the connecting grooves 131 being the same as the center of the rotating ring 121. The outer wall of the rotating ring 121 is also provided with connecting lugs corresponding to the number of connecting grooves 131. Each connecting lug is provided with a connecting rod 130 passing through each connecting groove 131 and connecting to the locking ring 141. Figure 1As shown, taking the engagement of the foremost connecting rod 130 with the connecting groove 131 as an example, when the connecting rod 130 is located at the rightmost end of the connecting groove 131, the distal end of the guide groove 122 coincides with the distal end of the limiting groove 111, and the clamping block 112 is located within the limiting groove 111. When the rotating ring 121 rotates clockwise, the connecting rod 130 rotates clockwise along the connecting groove 131 until the connecting rod 130 is located at the leftmost end of the connecting groove 131. At this time, the proximal end of the guide groove 122 coincides with the proximal end of the limiting groove 111, and the clamping block 112 reaches its maximum clamping distance. The connecting groove 131 not only provides space for the connection between the rotating ring 121 and the locking ring 141, but also guides and limits the rotation of the rotating ring 121, making the overall structure more compact.

[0050] Finally, it should be noted that the above embodiments are only used to illustrate the technical solution of this utility model and are not intended to limit it. Although this utility model has been described in detail with reference to preferred embodiments, those skilled in the art should understand that modifications or equivalent substitutions can be made to the technical solution of this utility model without departing from the spirit and scope of this technical solution, and all such modifications or substitutions should be covered within the scope of the claims of this utility model.

Claims

1. A photomask fixture for microscopic examination, characterized in that, include: The substrate has a placement groove at its center for accommodating a photomask, and several clamping blocks are slidably connected to the surface of the substrate. Each clamping block is evenly distributed along the periphery of the placement groove and slides radially along the placement groove. The adjustment mechanism includes a rotating ring rotatably connected to the base plate and guide ears evenly distributed on the rotating ring. The rotating ring rotates coaxially with the placement groove. The number of guide ears corresponds to the number of clamping blocks. Each guide ear is provided with a guide groove that is inclined outward from the rotating ring. Each clamping block is provided with a guide rod that extends into the guide groove and is slidably connected to the guide groove. A locking mechanism is used to lock or release the rotating ring from the substrate.

2. The photomask fixture for microscopic examination according to claim 1, characterized in that: The top surface of the substrate is provided with several limiting grooves located at the periphery of the placement groove. The limiting grooves are all oriented toward the center of the placement groove, and one end of each limiting groove is connected to the placement groove. Each clamping block is slidably connected to each limiting groove.

3. A photomask fixture for microscopic examination according to claim 2, characterized in that: The bottom of the rotating ring is in contact with the upper surface of the clamping block.

4. A photomask fixture for microscopic examination according to any one of claims 1-3, characterized in that: The substrate is provided below the base plate, and several supports are provided between the base plate and the base plate. A cavity coaxial with the placement groove is formed between the base plate and the base plate, and a fixed platform is provided at the center of the cavity. The locking mechanism includes a locking ring rotatably connected in the cavity and a locking bolt threadedly connected to the side wall of the locking ring. The locking ring and the rotating ring are coaxial, the locking bolt is perpendicular to the side wall of the locking ring, and one end of the locking bolt passes through the locking ring and is perpendicular to the side wall of the fixed platform. The substrate is provided with several arc-shaped connecting grooves, and the center of the connecting grooves is the same as the center of the rotating ring. The locking ring is provided with several connecting rods, which pass through each connecting groove and are connected to the rotating ring.

5. A photomask fixture for microscopic examination according to claim 4, characterized in that: The height of the locking ring is adapted to the depth of the cavity.

6. A photomask fixture for microscopic examination according to claim 5, characterized in that: A shifting gap is formed between adjacent brackets to accommodate the shifting of locking bolts.

7. A photomask fixture for microscopic examination according to claim 6, characterized in that: The end of the locking bolt extends out of the actuation gap and is equipped with a knob.

8. A photomask fixture for microscopic examination according to claim 6, characterized in that: The outer wall of the locking ring is vertically connected to a threaded sleeve, and the locking bolt engages with the threaded sleeve.

9. A photomask fixture for microscopic examination according to claim 4, characterized in that: The outer wall of the rotating ring is also provided with several connecting lugs, and the top of the connecting rod is connected to each of the connecting lugs.

10. A photomask fixture for microscopic examination according to claim 1, characterized in that: The inner wall of the guide groove is a smoothly transitioned curved surface.

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