An easily recognizable exposure gauge for a mask aligner

Abstract

The utility model relates to an exposure machine baffle ruler easy to identify belongs to the field of semiconductor display panel manufacturing, include: the ruler base body is provided with a plurality of identification point groups for identifying position when baffle shielding on the ruler base body, identification point group includes a plurality of extension identification area and the multiple intermediate identification points between every two extension identification areas of adjacent, every extension identification area all is provided with edge identification point, and the length of every edge identification point all is greater than the length of intermediate identification point, every edge identification point and intermediate identification point all are mutually parallel arrangement. The utility model discloses through setting up the unique identification point group structure, will be used for identifying the edge identification point design as greater than the intermediate identification point, formed the clear visual difference of intuition. This structure makes the operator fast, accurately judges the position where baffle is, greatly shortens the adjustment and confirmation time of production first inspection, effectively promotes the production efficiency and monitoring ability of line.

Description

Technical Field

[0001] This utility model belongs to the field of semiconductor display panel manufacturing, and specifically relates to an easily identifiable exposure machine baffle gauge. Background Technology

[0002] Exposure is a crucial step in pattern making, and its accuracy directly affects product yield. Exposure machines are typically equipped with adjustable shutters to control the exposure area, and a dedicated shutter vernier key is required to precisely calibrate and identify the shutter's blocking position to ensure alignment accuracy for each exposure.

[0003] Currently, common baffle gauges rely on markings on a pre-prepared black matrix (BM) gauge for accurate readings. This means the actual occlusion position of the baffle is determined by the relative position of the markings on the upper and lower gauges. This design works correctly when both the upper and lower photomasks are complete.

[0004] However, when only the RGB photomask needs to be modified (such as changing the number of exposures or the exposure center) without simultaneously changing the lower black matrix ruler, the lower layer will lack the corresponding markings. Consequently, the upper baffle ruler will not be able to directly and quickly read the baffle position due to the lack of a reading reference. This makes it difficult for operators to effectively monitor and confirm the setting status of the exposure machine baffle during the first production inspection, severely slowing down the production rhythm and introducing the risk of misjudgment. Utility Model Content

[0005] To address the aforementioned problems in the existing technology, this utility model provides an easily identifiable exposure machine baffle gauge. The technical problem to be solved by this utility model is achieved through the following technical solution: This utility model provides an easily identifiable exposure machine baffle ruler, comprising: a ruler base, wherein the ruler base is provided with a plurality of identification point groups for identifying the position when the baffle is obstructing the view; the identification point groups include a plurality of extended marking areas and a plurality of intermediate identification points located between every two adjacent extended marking areas; each extended marking area is provided with an edge identification point, and the length of each edge identification point is greater than the length of the intermediate identification point; each edge identification point and the intermediate identification point are arranged parallel to each other.

[0006] In one embodiment of this utility model, at least three edge identification points are arranged in parallel at intervals within each of the extended identification areas.

[0007] In one embodiment of this utility model, the lengths of multiple edge identification points within the same extended identification area are all equal.

[0008] In one embodiment of this utility model, the lengths of the plurality of intermediate identification points are all equal.

[0009] In one embodiment of this utility model, the difference between the length of the edge recognition point and the length of the middle recognition point is greater than or equal to 150 μm.

[0010] In one embodiment of this utility model, the identification point group on the ruler base is symmetrically arranged about the center of the ruler base, and the length of the plurality of intermediate identification points decreases sequentially from the extended marking area toward the center of the ruler base.

[0011] In one embodiment of this utility model, all the edge identification points and the middle identification points are formed on the ruler substrate by an exposure process.

[0012] In one embodiment of this utility model, the ruler substrate is a transparent substrate, which is glass or quartz.

[0013] In one embodiment of this utility model, all the edge identification points and the middle identification points are made of metallic chromium or black resin material.

[0014] Compared with the prior art, the beneficial effects of this utility model are as follows: This invention relates to an easily identifiable exposure machine baffle ruler. Through a unique identification point group structure, the edge identification points are designed to be larger than the central identification points, creating a clear and intuitive visual difference. This structure allows operators to quickly and accurately determine the baffle's position simply by visually observing the significantly elongated edge identification points, without relying on the lower black matrix ruler, even when the baffle is obstructed. This fundamentally solves the reading problem, greatly shortens the adjustment and confirmation time for first-time production inspection, and effectively improves production line efficiency and monitoring capabilities.

[0015] This invention presents an easily identifiable exposure machine baffle ruler. By setting multiple parallel-spaced markers at the edge identification points, it enhances the redundancy and reliability of identification, ensuring accurate readings even in the presence of minor contamination or optical interference. The intermediate identification points employ a variable-length design, providing richer positional information for more precise fine-tuning and confirmation. This ruler is directly fabricated on a transparent substrate, featuring a simple structure and full compatibility with existing exposure processes. It eliminates the need for additional complex manufacturing steps, achieving a balance between convenient production and efficient application, resulting in strong overall practicality.

[0016] The above description is merely an overview of the technical solution of this utility model. In order to better understand the technical means of this utility model and to implement it in accordance with the contents of the specification, and to make the above and other objects, features and advantages of this utility model more apparent and understandable, preferred embodiments are described below in detail with reference to the accompanying drawings. Attached Figure Description

[0017] Figure 1 This is a schematic diagram of an easily identifiable exposure machine baffle ruler provided by an embodiment of the present invention; Figure 2 This is a schematic diagram of the working process of the easily identifiable exposure machine baffle ruler provided in this embodiment of the utility model.

[0018] Reference numerals: 1-ruler and gauge base; 11-edge identification point; 12-middle identification point; 2-baffle. Detailed Implementation

[0019] To further illustrate the technical means and effects adopted by this utility model to achieve its intended purpose, the following detailed description, in conjunction with the accompanying drawings and specific embodiments, provides a description of an easily identifiable exposure machine baffle gauge proposed according to this utility model.

[0020] The foregoing and other technical contents, features, and effects of this utility model will be clearly presented in the following detailed description of the specific embodiments with reference to the accompanying drawings. Through the description of the specific embodiments, a more in-depth and specific understanding can be gained of the technical means and effects adopted by this utility model to achieve the intended purpose. However, the accompanying drawings are only provided for reference and illustration and are not intended to limit the technical solution of this utility model.

[0021] Example 1 like Figure 1 and Figure 2 As shown, Figure 1 This is a schematic diagram of an easily identifiable exposure machine baffle ruler provided by an embodiment of the present invention; Figure 2 This is a schematic diagram of the working process of the easily identifiable exposure machine baffle ruler provided in this embodiment of the utility model.

[0022] In this embodiment, the easily identifiable exposure machine baffle ruler includes: a ruler base 1, on which multiple identification point groups are provided for identifying the position when the baffle 2 is obstructed; the identification point groups include multiple extended marking areas and multiple intermediate identification points 12 located between every two adjacent extended marking areas; each extended marking area is provided with an edge identification point 11, and the length of each edge identification point 11 is greater than the length of each intermediate identification point 12; each edge identification point 11 and the intermediate identification point 12 are arranged parallel to each other. Thus, the easily identifiable exposure machine baffle ruler of this embodiment can independently identify the position of the baffle 2 when there is no lower black matrix ruler to match.

[0023] It is worth noting that this invention, by setting identification points with length differences on the exposure machine baffle ruler, makes the markings of key positions more prominent, enabling operators to quickly and directly identify the position of baffle 2 without relying on the lower black matrix ruler. This not only successfully solves the technical dilemma of being unable to read values ​​due to the lack of a lower supporting reference when individually changing RGB photomasks, but also significantly shortens the first inspection time in the production process, reduces reliance on operator skills and the risk of misjudgment, thereby improving the overall preparation efficiency of the exposure process and the operational efficiency of the production line.

[0024] In one optional implementation, at least three edge identification points 11 are arranged in parallel at intervals within each extended identification area, and multiple edge identification points 11 within the same extended identification area are arranged at equal intervals to facilitate identification and large-scale production.

[0025] In one optional implementation, the lengths of multiple edge identification points 11 within the same extended identification area are all equal, and the lengths of multiple intermediate identification points 12 are all equal. For example, the length of each edge identification point 11 is greater than the length of each intermediate identification point 12, and the difference between the lengths of the edge identification points 11 and the intermediate identification points 12 is greater than or equal to 150 μm, to ensure that the differences in identification are significant and reliable under different production environments and operator conditions.

[0026] Alternatively, the identification point group on the ruler base 1 can be set to be centrally symmetrical about the ruler base 1, with the lengths of multiple intermediate identification points 12 decreasing sequentially from the extended marking area towards the center of the ruler base 1. This configuration, by using a variable length design for the intermediate identification points 12, provides richer positional information, facilitating finer adjustments and confirmation. Simultaneously, operators can not only identify the approximate location of the edge but also accurately determine which extended marking area the baffle 2 is closer to by observing the gradual change in the length of the intermediate identification points 12, further improving the accuracy and speed of the judgment.

[0027] In an alternative implementation, all edge identification points 11 and center identification points 12 are formed on the ruler substrate 1 by an exposure process, which is compatible with existing exposure process procedures and does not require additional complex manufacturing steps.

[0028] For example, the ruler substrate 1 can be a transparent substrate, such as glass or quartz, to ensure good optical performance and thermal stability, thereby ensuring long-term accuracy and reliability even in harsh semiconductor manufacturing environments.

[0029] For example, all the edge identification points 11 and the middle identification points 12 can be made of metallic chromium or black resin material.

[0030] The working principle of the easily identifiable exposure machine baffle ruler of this utility model is as follows: The ruler substrate 1 can be a quartz glass substrate, on which multiple sets of edge recognition points 11 are formed by exposure photolithography. The following only takes three sets of edge recognition points 11 as an example, but the implementation of this utility model is not limited to this.

[0031] The three regions corresponding to -3, 0, and +3 are all extended identification regions. Within each region, three parallel and spaced elongated markers serve as edge identification points 11, and all three edge identification points 11 are of equal length. Between every two extended identification regions, multiple intermediate identification points 12 are provided, all of which are parallel to each other. The length of all intermediate identification points 12 is shorter than that of the edge identification points 11, and the length of the intermediate identification points 12 decreases slightly towards the central 0 region.

[0032] During the initial production inspection, the operator can directly observe the pattern on the exposure machine baffle ruler that is exposed after being blocked by the baffle 2. By identifying the longest and most prominent mark (i.e., edge identification point 11), the operator can quickly determine whether the baffle 2 is located near the expected -3 or +3 position without the need for the lower reference mark. The judgment process is intuitive and fast, which effectively improves production efficiency.

[0033] This invention features an easily identifiable exposure machine baffle ruler. Through a unique identification point group structure, the edge identification point 11 is designed to be larger than the central identification point, creating a clear and intuitive visual difference. This structure allows operators to quickly and accurately determine the position of the baffle 2 when it is obstructed, without relying on the lower black matrix ruler, simply by visually observing the significantly elongated edge identification point 11. This fundamentally solves the reading problem, greatly shortens the adjustment and confirmation time for first-time production inspection, and effectively improves production line efficiency and monitoring capabilities.

[0034] This invention presents an easily identifiable exposure machine baffle ruler. By setting the edge identification points 11 as multiple parallel and spaced markers, it enhances the redundancy and reliability of identification, ensuring accurate readings even in the presence of minor contamination or optical interference. The intermediate identification point 12 employs a variable length design, providing richer positional information and facilitating finer adjustments and confirmation. This ruler is directly fabricated on the transparent substrate, featuring a simple structure, full compatibility with existing exposure processes, and eliminating the need for additional complex manufacturing steps. It achieves a balance between convenient production and efficient application, demonstrating strong overall practicality.

[0035] It should be noted that, in this document, relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations are intended to cover non-exclusive inclusion, such that an article or device comprising a list of elements includes not only those elements but also other elements not expressly listed. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the article or device comprising said element. Terms such as "connected" or "linked" are not limited to physical or mechanical connections but can include electrical connections, whether direct or indirect. The orientations or positional relationships indicated by terms such as "upper," "lower," "left," and "right" are based on the orientations or positional relationships shown in the accompanying drawings and are used only for the convenience of describing the invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the invention.

[0036] The above description, in conjunction with specific preferred embodiments, provides a further detailed explanation of the present invention. It should not be construed that the specific implementation of the present invention is limited to these descriptions. For those skilled in the art, various simple deductions or substitutions can be made without departing from the concept of the present invention, and all such modifications and substitutions should be considered within the protection scope of the present invention.

Claims

1. An easily identifiable exposure machine baffle ruler, characterized in that, include: A ruler base, wherein multiple identification point groups are provided on the ruler base for identifying the position when the baffle is blocked; The identification point group includes multiple extended identification areas and multiple intermediate identification points located between every two adjacent extended identification areas; each extended identification area is provided with an edge identification point, and the length of each edge identification point is greater than the length of the intermediate identification point; each edge identification point and the intermediate identification point are arranged parallel to each other.

2. The easily identifiable exposure machine baffle gauge according to claim 1, characterized in that, At least three edge identification points are arranged in parallel at intervals within each of the extended identification areas.

3. The easily identifiable exposure machine baffle gauge according to claim 2, characterized in that, The lengths of multiple edge identification points within the same extended identification area are all equal.

4. The easily identifiable exposure machine baffle gauge according to claim 3, characterized in that, The lengths of all the intermediate identification points are equal.

5. The easily identifiable exposure machine baffle gauge according to claim 4, characterized in that, The difference between the length of the edge recognition point and the length of the middle recognition point is greater than or equal to 150 μm.

6. The easily identifiable exposure machine baffle gauge according to claim 1, characterized in that, The identification point group on the ruler base is symmetrically arranged about the center of the ruler base, and the length of the multiple intermediate identification points decreases sequentially from the extended marking area towards the center of the ruler base.

7. The easily identifiable exposure machine baffle gauge according to claim 1, characterized in that, All the edge identification points and the intermediate identification points are formed on the ruler substrate by an exposure process.

8. The easily identifiable exposure machine baffle gauge according to claim 1, characterized in that, The ruler substrate is a transparent substrate, which is glass or quartz.

9. The easily identifiable exposure machine baffle gauge according to claim 1, characterized in that, All edge identification points and intermediate identification points are made of metallic chromium or black resin material.

Images