Chemical conversion jig

Abstract

This application provides a chemical formation fixture, comprising: a fixture body including a first upright plate and a second upright plate; a guide assembly disposed on the fixture body; a clamping assembly including a first push plate, a second push plate, and multiple layers, wherein the first push plate and the second push plate are movably disposed on the guide assembly, the first push plate being disposed on the side of the first upright plate facing the second upright plate, the second push plate being disposed on the side of the second upright plate facing the first upright plate, and the multiple layers being movably disposed between the first push plate and the second push plate; a driving assembly configured to drive the first push plate to move along the length direction of the chemical formation fixture; and a leveling assembly including a leveling member capable of changing the parallelism between the second push plate and the first push plate. The chemical formation fixture disclosed in this application achieves parallelism control and pressure stability during high-pressure chemical formation and formulation processes, avoiding damage to the chemical formation fixture.

Description

Technical Field

[0001] This application relates to the field of battery production equipment technology, and in particular to a formation fixture. Background Technology

[0002] In the production of lithium-ion batteries, formation and capacity testing are crucial processes. These processes require applying a certain amount of planar pressure to the battery, typically driven by a drive unit that propels the layers through multiple layers to the battery pack. For low-pressure conditions, due to the lower required pressure, the formation fixture has a higher tolerance for parallelism deviations. Passive compensation using rectangular spring deformation or simple shims is usually sufficient to meet basic pressure uniformity requirements.

[0003] However, with the development of battery technology, the demand for high-pressure formation and capacity testing is increasing. The rigid buffer pads used to withstand high pressure have almost no elastic deformation and can no longer passively compensate for parallelism errors. The rectangular springs traditionally used for pressure holding and compensation fail when the pressure exceeds their limits. Utility Model Content

[0004] This application discloses a formation fixture that achieves parallelism control and pressure stability during the high-pressure formation and formulation process, thereby avoiding damage to the formation fixture.

[0005] To achieve the above objectives, this application discloses a formation fixture, which includes: The fixture body includes a first vertical plate and a second vertical plate, which are spaced apart along the length direction of the forming fixture. A guide assembly is disposed on the fixture body; A clamping assembly includes a first push plate, a second push plate, and multiple shelf plates. The first push plate and the second push plate are movably disposed on the guide assembly. The first push plate is disposed on the side of the first upright plate facing the second upright plate, and the second push plate is disposed on the side of the second upright plate facing the first upright plate. The multiple shelf plates are movably disposed on the guide assembly and are disposed between the first push plate and the second push plate. A drive assembly connected to the first push plate, the drive assembly being configured to drive the first push plate to move along the length direction of the forming fixture; A leveling assembly is disposed between the second push plate and the second upright plate. The leveling assembly includes a leveling member configured to move relative to the second push plate. The leveling member is capable of pushing at least a portion of the second push plate to change the parallelism between the second push plate and the first push plate.

[0006] In some embodiments, the number of leveling components is multiple, and the multiple leveling components are spaced apart along the width direction of the formation fixture to adjust the position of different portions of the second pusher plate along the width direction of the formation fixture.

[0007] In some embodiments, the second pusher plate is provided with a connecting hole extending along the length direction of the chemical formation fixture. The leveling assembly includes: a connector slidably disposed in the connecting hole and configured to move within the connecting hole along the length direction of the chemical formation fixture; and a leveling member movably disposed in the connector and configured to move along the length direction of the chemical formation fixture to push the portion of the second pusher plate that abuts against the leveling member to move.

[0008] In some embodiments, the leveling component includes: a leveling nut movably sleeved on the connector, the leveling nut being configured to move along the length direction of the forming fixture; the leveling assembly further includes a buffer member sleeved on the connector, a first end of the buffer member abutting against the leveling nut, the other end of the buffer member being configured to abut against the second push plate, and the buffer member being an elastic member; when the leveling nut moves toward the second push plate, the buffer member is configured to provide a force to the leveling nut opposite to the direction of movement of the leveling nut.

[0009] In some embodiments, the buffer is a disc spring, with a first end connected to the leveling nut and the other end configured to abut against the second push plate. The diameter of the disc spring gradually decreases along the length of the forming fixture, and the disc spring is configured to apply a force along the length of the forming fixture to the second push plate and the leveling nut.

[0010] In some embodiments, the diameter of the disc spring gradually decreases along the direction from the second push plate to the second upright plate.

[0011] In some embodiments, the outer peripheral surface of the connector is provided with a first external thread, the leveling member is a rotating body with a through hole, and the leveling member is sleeved on the outside of the connector through the through hole. The inner peripheral surface of the through hole is provided with a first internal thread, and the first external thread and the first internal thread are engaged to connect the connector and the leveling member movably.

[0012] In some embodiments, the second upright plate has a first mounting hole, the leveling member passes through the first mounting hole, the outer surface of the leveling member abuts against the inner surface of the first mounting hole, the outer peripheral surface of the leveling member has a second external thread, the inner peripheral surface of the first mounting hole has a second internal thread, and the second external thread and the second internal thread are engaged to allow the leveling member and the second upright plate to be movably connected.

[0013] In some embodiments, the second upright plate further has a second mounting hole that communicates with the first mounting hole, and the inner circumferential surface of the second mounting hole has a third internal thread. The first external thread and the third internal thread are engaged to connect the connector and the second upright plate detachably.

[0014] In some embodiments, the formation fixture further includes a pressure sensor disposed on the second pusher plate, the pressure sensor being configured to detect pressure on the second pusher plate.

[0015] Compared with the prior art, the beneficial effects of this application are: The formation fixture provided in this application embodiment allows the operator to calibrate the posture of the second pusher plate based on pressure feedback when pressure is applied by the driving component. The formation fixture not only compensates for inherent machining and assembly errors through the leveling component, but also adapts to pressure distribution requirements under actual working conditions. This optimizes the uniformity of pressure on the layer plane without damaging the formation fixture, ensuring that each battery bears a consistent unit pressure, providing a crucial guarantee for high-quality battery formation processes. Attached Figure Description

[0016] To more clearly illustrate the technical solutions in the embodiments of this application, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0017] Figure 1 This is one of the structural schematic diagrams of the chemical formation fixture provided in the embodiments of this application; Figure 2 This is a second schematic diagram of the structure of the chemical formation fixture provided in the embodiments of this application; Figure 3 This is a schematic diagram of the structure of the leveling component provided in the embodiments of this application; Figure 4 This is the third schematic diagram of the structure of the chemical formation fixture provided in the embodiments of this application; Figure 5 for Figure 4A schematic diagram of the cross-sectional structure along the AA direction; Figure 6 for Figure 5 A magnified view of a section at point B in the middle.

[0018] Explanation of reference numerals in the attached figures: 100-Chemicalization fixture; 1-Fixture body; 11-First upright plate; 12-Second upright plate; 121-First mounting hole; 122-Second mounting hole; 2-Guide assembly; 21-Guide component; 3-Clamping assembly; 31-Shelf; 311-First push plate; 312-Second push plate; 3121-Connecting hole; 4-Drive assembly; 5-Leveling assembly; 51-Leveling component; 511-Leveling nut; 52-Connector; 53-Buffer component; 6-Pressure sensor. Detailed Implementation

[0019] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0020] In this application, the terms "upper," "lower," "top," "bottom," "inner," "vertical," and "horizontal," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. These terms are primarily for the purpose of better describing this application and its embodiments, and are not intended to limit the indicated device, element, or component to having a specific orientation, or to be constructed and operated in a specific orientation.

[0021] Furthermore, in addition to indicating location or positional relationship, some of the aforementioned terms may also have other meanings. For example, the term "above" may also be used in some cases to indicate a certain dependency or connection relationship. Those skilled in the art can understand the specific meaning of these terms in this application based on the specific circumstances.

[0022] Furthermore, the terms "set up," "equipped with," and "connected" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral structure; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium, or an internal connection between two devices, components, or parts. Those skilled in the art can understand the specific meaning of these terms in this application based on the specific circumstances.

[0023] Furthermore, the terms "first," "second," etc., are primarily used to distinguish different devices, components, or parts (which may be the same or different in specific type and construction), and are not intended to indicate or imply the relative importance or quantity of the indicated devices, components, or parts. Unless otherwise stated, "a plurality of" means two or more.

[0024] In the production of lithium-ion batteries, formation and capacity testing are crucial processes. During the formation and capacity testing of lithium-ion batteries, a multi-layered, parallel-arranged plate is driven by an electric cylinder to apply uniform planar pressure to the battery sandwiched between the plates. The uniformity of this planar pressure determines the testing accuracy and quality of the battery; the force-applying reference surface and the load-bearing reference surface of the formation fixture must remain parallel when subjected to working pressure.

[0025] For low-pressure applications, the required pressure is relatively low, and the forming fixture has a high tolerance for parallelism deviations. Even if machining and assembly errors exist, they are usually compensated passively by the deformation of rectangular springs or simple shims, which is sufficient to meet basic pressure uniformity requirements.

[0026] However, under high-pressure, volumetric conditions, the rigid buffer pads used to withstand high pressure exhibit almost no elastic deformation and can no longer passively compensate for parallelism errors. Secondly, the traditional rectangular springs used for pressure holding and compensation fail when the pressure exceeds their limits.

[0027] If we follow the traditional approach and attempt to correct the alignment by inserting shims between rigid components, it will reduce the stress-bearing area, resulting in significant localized stress concentration and causing crushing plastic deformation of the core component. This not only fails to achieve the leveling purpose but also causes permanent damage to the formation fixture.

[0028] Based on this, this application discloses a chemical formation fixture, which, by setting an independently adjustable leveling and buffering mechanism, realizes the adjustment and locking of the parallelism between two vertical plates under high pressure conditions, thereby ensuring the uniformity of pressure between the plates and avoiding damage to the chemical formation fixture caused by poor parallelism or rigid impact.

[0029] The technical solution of this application will be further described below with reference to the embodiments and accompanying drawings.

[0030] Please see Figures 1 to 3 , Figure 1 This is one of the structural schematic diagrams of the chemical formation fixture 100 provided in the embodiments of this application; Figure 2 This is the second schematic diagram of the structure of the chemical formation fixture 100 provided in the embodiments of this application; Figure 3This is a schematic diagram of the leveling component 5 provided in an embodiment of this application. This application discloses a formation fixture 100, which includes: a fixture body 1, comprising a first upright plate 11 and a second upright plate 12, the first upright plate 11 and the second upright plate 12 being spaced apart along the length of the formation fixture 100; a guide component 2, disposed on the fixture body 1; and a clamping component 3, comprising a first push plate 311, a second push plate 312, and multiple shelf plates 31, the first push plate 311 and the second push plate 312 being movably disposed on the guide component 2, the first push plate 311 being disposed on the side of the first upright plate 11 facing the second upright plate 12, and the second push plate 312 being disposed on the side of the second upright plate 12 facing the first upright plate 12. On one side of 11, multiple shelves 31 are movably disposed on the guide assembly 2, and the multiple shelves are disposed between the first push plate 311 and the second push plate 312; drive assembly 4 is connected to the first push plate 311 and is configured to drive the first push plate 311 to move along the length direction of the forming fixture 100; leveling assembly 5 is disposed between the second push plate 312 and the second upright plate 12, and the leveling assembly 5 includes a leveling member 51, which is configured to move relative to the second push plate 312 and can push at least part of the second push plate 312 to change the parallelism between the second push plate 312 and the first push plate 311.

[0031] The fixture forms the supporting skeleton of the formation fixture 100. The fixture body 1 includes a first upright plate 11 and a second upright plate 12 spaced apart along the length direction, providing a stable and robust mounting base for the entire fixture and ensuring that all moving and load-bearing components can be reliably installed. The first upright plate 11 serves as a fixed reference on the drive side, while the second upright plate 12 serves as a fixed reference on the leveling side, forming a defined and unchanging overall frame. This establishes a stable spatial reference for subsequent guiding, driving, and leveling functions, ensuring the overall structural rigidity and stability of the formation fixture 100 when subjected to compressive forces.

[0032] In one possible embodiment, the guide assembly 2 includes multiple guide members 21, all disposed between the first upright plate 11 and the second upright plate 12 and extending along the length of the clamp. The guide members 21 provide guidance and positioning for the linear movement of all the shelves 31, the first push plate 311, and the second push plate 312 in the clamping assembly 3, ensuring that all shelves 31, the first push plate 311, and the second push plate 312 maintain a consistent direction of movement during movement, preventing deflection or jamming. Furthermore, the multiple guide members 21 work together to withstand the bending moment and lateral force generated by the pressing pressure, ensuring that the shelves 31 can only translate along a preset direction, improving movement accuracy and reliability.

[0033] The clamping assembly 3 includes a first push plate 311, a second push plate 312, and a shelf plate 31, which are movably sleeved on the guide member 21. The first push plate 311, the second push plate 312, and the shelf plate 31 serve to directly support the battery and form multiple parallel battery clamping stations through the stacking of the shelf plates 31.

[0034] The first pusher plate 311 acts as the active pusher plate, directly receiving the driving force. The second pusher plate 312 acts as the reference pusher plate, and its posture determines the parallelism reference of the entire layer plate group 31. Through multiple independent and parallel moving layer plates 31, the function of simultaneously and uniformly pressing multiple groups of batteries is realized, improving the space utilization and production efficiency of the formation fixture 100. The first pusher plate 311 and the second pusher plate 312 clearly define the driving end and the leveling end, establishing the adjustment object for subsequent leveling operations.

[0035] The drive assembly 4 is connected to the first push plate 311 and is used to drive the first push plate 311 to move along the length of the formation fixture 100. The drive assembly 4 provides the initial power for the entire clamping process and is the power source for the formation fixture 100 to generate the required high pressure. By precisely controlling the drive assembly 4, the clamping pressure can be controlled. The drive assembly 4 provides a concentrated and controllable force output, which can stably push the entire clamping assembly to overcome the reaction force of the battery and buffer element until the preset process pressure value is reached, and can maintain the pressure stability during the formation process to meet the pressure requirements of the battery chemical reaction.

[0036] In a preferred embodiment, the drive assembly 4 is a servo electric cylinder, the cylinder body of which is fixed on the first upright plate 11, and the push rod of the servo electric cylinder is directly connected to the first push plate 311.

[0037] A leveling assembly 5 is disposed between the second push plate 312 and the second upright plate 12. The leveling assembly 5 includes a leveling member 51, which is configured to move relative to the second push plate 312 and to push the corresponding portion of the second push plate 312 to move. The function of the leveling member 51 is to actively and locally change the spatial orientation of the second push plate 312 relative to the second upright plate 12. By adjusting the leveling member 51, any tilt or twisting of the second push plate 312 can be corrected, thereby ensuring that the second push plate 312 is parallel to the motion plane of the first push plate 311 determined by the drive assembly 4 and the guide assembly 2.

[0038] The leveling component 5 enables adjustable and locked posture of the second pusher plate 312 within the high-pressure fixture, resolving parallelism issues caused by machining and assembly cumulative errors. Leveling with the component 5 avoids excessive local contact stress caused by shims between rigid components, preventing crushing or plastic deformation, thus protecting the formation fixture 100 and extending its service life. Simultaneously, precise parallelism ensures even pressure distribution across each cell, improving the consistency and quality of cell formation.

[0039] Initially, the drive assembly 4 is in the retracted position, and all shelves 31 are separated from each other under the guidance of the guide assembly 2, providing ample space for loading and unloading. The operator places the batteries to be formed one by one between adjacent shelves 31. Subsequently, the drive assembly 4 is activated, pushing the first pusher plate 311 towards the second pusher plate 312. The first pusher plate 311 pushes each of the intermediate shelves 31 and the batteries in sequence until all shelves 31 are in close contact with the batteries, and the pressure begins to build up and eventually reaches the set value.

[0040] During this process, if uneven pressure is detected or found (i.e., the first push plate 311 and the second push plate 312 are not parallel), the leveling component 5 located between the second vertical plate 12 and the second push plate 312 can be operated. By moving the leveling component 51 relative to the second push plate 312 by different amounts, the corresponding parts of the second push plate 312 can be locally pushed or pulled back, thereby dynamically changing the spatial posture of the second push plate 312 until the motion plane of the second push plate 312 and the first push plate 311 reach the optimal parallel state.

[0041] Thus, the formation fixture 100 provided in this embodiment of the application allows the leveling component 5 to allow the operator to calibrate the posture of the second push plate 312 based on pressure feedback when pressure is applied by the drive component 4. The formation fixture 100 can not only compensate for inherent processing and assembly errors through the leveling component 5, but also adapt to pressure distribution requirements under actual working conditions. This optimizes the uniformity of planar pressure on the layer plate 31 without damaging the formation fixture 100, ensuring that each battery bears a consistent unit pressure, providing a key guarantee for high-quality battery formation processes.

[0042] Please see Figure 4 , Figure 4 This is the third schematic diagram of the structure of the chemical formation fixture 100 provided in the embodiments of this application. In some embodiments, there are multiple leveling components 5, which are spaced apart along the width direction of the chemical formation fixture 100 to adjust the position of different parts of the second push plate 312 along the width direction of the chemical formation fixture 100.

[0043] It can be understood that each leveling component 5 acts as an independent adjustment point, capable of applying independent adjustment to the corresponding local area on the second push plate 312. When the second push plate 312 twists or tilts along its width due to machining errors, assembly accumulation, or uneven load, the operator can adjust the leveling components 5 at different positions to specifically correct the posture of the second push plate 312. For example, when it is detected that the gap between one side of the second push plate 312 and the first push plate 311 is too large, the leveling component 5 at that side can be adjusted accordingly, thereby locally changing the tilt angle of the second push plate 312.

[0044] This multi-point distributed adjustment method can more effectively compensate for the flatness error of the second push plate 312 throughout its width. Multiple leveling components 5 together form an adjustable support surface. By coordinating the adjustment amounts of each leveling component 5, the second push plate 312 can be precisely adjusted to an ideal state parallel to the moving plane of the first push plate 311.

[0045] Please see Figure 5 and Figure 6 , Figure 5 for Figure 4 A schematic diagram of the cross-sectional structure along the AA direction; Figure 6 for Figure 5 A partial enlarged view at point B. In some embodiments, the second push plate 312 is provided with a connecting hole 3121, which extends along the length direction of the formation fixture 100. The leveling assembly 5 includes: a connector 52, which is slidably disposed in the connecting hole 3121 and configured to move within the connecting hole 3121 along the length direction of the formation fixture 100; and a leveling member 51, which is movably disposed on the connector 52 and configured to move along the length direction of the formation fixture 100 to push the portion of the second push plate 312 that abuts against the leveling member 51 to move.

[0046] The connecting hole 3121 of the second push plate 312 provides a path for the leveling assembly 5 to be installed and moved along its length. The structure in which the connector 52 is slidably disposed within the connecting hole 3121 allows the second push plate 312 to produce the expected attitude adjustment in the pushed local area when the leveling member 51 acts on it, without introducing additional internal stress or causing motion interference due to the constraint of the connection point in other directions.

[0047] The leveling component 51 is movably mounted on the connecting component 52 and can move along the length of the forming clamp 100 to push the second push plate 312, thus realizing the application and transmission of the pushing force and optimizing the way the leveling force acts on the second push plate 312. When the leveling component 51 is moved along the length direction, the end of the leveling component 51 can push the corresponding part on the second push plate 312. Multiple such leveling components 5 work together to adjust the position of different parts of the second push plate 312 along the width direction in the length direction, ultimately achieving the correction of the spatial attitude of the second push plate 312.

[0048] Please see Figure 3 and Figure 6 In some embodiments, the leveling component 51 includes: a leveling nut 511, which is movably sleeved on the connector 52 and configured to move along the length direction of the forming fixture 100; the leveling assembly 5 also includes a buffer 53, which is sleeved on the connector 52, with a first end abutting against the leveling nut 511 and the other end configured to abut against the second push plate 312, and the buffer 53 is an elastic member. When the leveling nut 511 moves toward the second push plate 312, the buffer 53 is configured to provide a force to the leveling nut 511 opposite to the direction of movement of the leveling nut 511.

[0049] It can be understood that by rotating or driving the leveling nut 511, the axial position of the leveling nut 511 on the connecting member 52 can be controlled, thereby converting rotational motion or linear drive into displacement along the length direction. This transmission method has good mechanical efficiency and position holding capability, facilitating precise adjustment operations.

[0050] The buffer 53 is fitted onto the connector 52 and positioned in the force transmission path between the leveling nut 511 and the second push plate 312. When the leveling nut 511 moves toward the second push plate 312, it compresses the buffer 53, causing the buffer 53 to elastically deform and transmit the pressure to the second push plate 312. During this process, based on its elastic properties, the buffer 53 applies a reaction force to the leveling nut 511 in the opposite direction to the movement of the leveling nut 511.

[0051] The presence of the buffer 53 ensures that the force applied by the leveling component 5 to the second push plate 312 is elastically buffered rather than a direct rigid impact, thus avoiding potential damage to the second push plate 312 and related connecting structures caused by instantaneous peak pressure that may occur during the leveling process or due to fluctuations in operating conditions.

[0052] In addition, the elastic buffer 53 always maintains elastic potential energy to try to restore its original shape after being compressed. This continuous force ensures that the leveling nut 511 and the buffer 53, and the buffer 53 and the second push plate 312 always maintain close contact, eliminating the backlash or loosening that may occur due to gaps, thereby ensuring the long-term stability and reliability of the leveling position.

[0053] Please see Figure 6 In some embodiments, the buffer 53 is a disc spring, with one end of the disc spring connected to the leveling nut 511 and the other end of the disc spring configured to abut against the second push plate 312. Along the length of the forming fixture 100, the diameter of the disc spring gradually decreases, and the disc spring is configured to apply a force along the length of the forming fixture 100 to the second push plate 312 and the leveling nut 511.

[0054] Disc springs absorb energy through the elastic bending deformation of the material itself. Compared to ordinary cylindrical helical springs, disc springs can provide greater load-bearing capacity within the same installation space. The installation method, where one end of the disc spring is connected to the leveling nut 511 and the other end abuts against the second push plate 312, ensures a clear and direct force transmission path. When the leveling nut 511 moves along the connector 52 towards the second push plate 312, it compresses the disc spring. Because the diameter of the disc spring gradually decreases along its length, this non-uniform cross-section geometry affects its stress distribution and deformation mode during compression, thus affecting its stiffness characteristics.

[0055] The high load capacity and compact structure of the disc spring meet the operational requirements of the high-pressure forming fixture 100. The tapered design with a gradually changing diameter helps optimize the stability of the disc spring during compression, providing more ideal cushioning within a specific compression stroke. The axial force continuously applied by the disc spring to the second push plate 312 and the leveling nut 511 ensures tight contact at the internal connection interfaces of the leveling assembly 5, effectively suppressing loosening that may be caused by vibration or load fluctuations, and improving the long-term retention of leveling accuracy.

[0056] Please see Figure 6 In some embodiments, the diameter of the disc spring gradually decreases along the direction from the second push plate 312 to the second upright plate 12. When the disc spring is installed in this direction, the larger end of the disc spring is closer to the second push plate 312, which is a moving part, while the smaller end faces the second upright plate 12, which is a fixed reference. This arrangement optimizes the stability of the conical structure of the disc spring when subjected to compressive force from the leveling nut 511. The change in diameter from large to small coordinates with the path of pressure transmission from the leveling nut 511 through the disc spring to the second push plate 312, helping to guide a more regular deformation pattern of the disc spring.

[0057] As the leveling nut 511 moves toward the second push plate 312 and compresses the disc spring, the gradually changing diameter geometry of the disc spring allows its material to participate more effectively in elastic deformation. This structure is beneficial for achieving more ideal elastic cushioning characteristics within a limited installation space. When compressed, the disc spring's stiffness characteristics may exhibit non-linearity, providing differentiated cushioning force depending on the amount of compression. This characteristic helps to provide a relatively soft contact in the initial stage of leveling, while providing a more solid sense of support as the target pressure approaches.

[0058] Please see Figure 6 In some embodiments, the outer peripheral surface of the connector 52 is provided with a first external thread, the leveling member 51 is a rotating body with a through hole, and the leveling member 51 is sleeved on the outside of the connector 52 through the through hole. The inner peripheral surface of the through hole is provided with a first internal thread, and the first external thread and the first internal thread are engaged to connect the connector 52 and the leveling member 51 so that they can be movably connected.

[0059] When the leveling component 51 rotates around its axis as a rotating body, the rotational motion is converted into linear movement of the leveling component 51 along the axis of the connecting component 52 because the first internal thread meshes with the first external thread on the connecting component 52. This allows the position of the leveling component 51 relative to the connecting component 52 to be adjusted slightly and controllably. Furthermore, the threaded connection can effectively maintain the adjusted position without external driving torque, preventing accidental displacement under vibration or load changes and ensuring the stability of the leveling state.

[0060] Please see Figure 6 In some embodiments, the second upright plate 12 has a first mounting hole 121, and the leveling member 51 passes through the first mounting hole 121. The outer surface of the leveling member 51 abuts against the inner surface of the first mounting hole 121. The outer peripheral surface of the leveling member 51 has a second external thread, and the inner peripheral surface of the first mounting hole 121 has a second internal thread. The second external thread and the second internal thread are engaged to allow the leveling member 51 and the second upright plate 12 to be movably connected.

[0061] When the leveling component 51 rotates around its axis, due to the meshing action of the second external thread and the second internal thread, the leveling component 51 can generate linear displacement relative to the second vertical plate 12 along its axial direction while being subjected to radial constraint. This motion conversion mechanism transforms the easily implemented rotational operation into axial feed, providing a reliable displacement control means for the leveling process.

[0062] The outer surface of the leveling component 51 is in contact with the inner surface of the first mounting hole 121, which improves the stability and service life of the connection. Moreover, this tight fit plays a good guiding role, ensuring that the leveling component 51 always maintains the correct movement trajectory during movement, preventing deviation or jamming, thereby ensuring that the direction of the leveling thrust is always transmitted along the predetermined axis.

[0063] Please see Figure 6 In some embodiments, the second upright plate 12 also has a second mounting hole 122, which communicates with the first mounting hole 121. The second mounting hole 122 has a third internal thread, and the first external thread and the third internal thread are engaged to allow the connector 52 and the second upright plate 12 to be detachably connected.

[0064] The connector 52 can be directly fixed to the second vertical plate 12 via a threaded connection, providing a stable and reliable installation base for the entire leveling and buffering mechanism. The interconnected layout of the second mounting hole 122 and the first mounting hole 121 forms an installation channel penetrating the second vertical plate 12, providing a clear operational path for the assembly and disassembly of the connector 52. When the connector 52 is screwed into the second mounting hole 122 through the engagement of the first external thread and the third internal thread, a rigid connection is formed between the connector 52 and the second vertical plate 12, thereby being able to withstand the axial force and possible lateral force generated during the leveling process, ensuring the stability of force transmission.

[0065] During long-term use, if a connector 52 in a leveling component 5 becomes worn or damaged, maintenance personnel can simply unscrew the connector 52 from the second mounting hole 122 of the second upright plate 12 for replacement, without disassembling the entire second upright plate 12 or other surrounding structures. This ability to replace parts locally reduces maintenance costs and time.

[0066] Please see Figure 1 In some embodiments, the formation fixture 100 further includes a pressure sensor 6 disposed on the second push plate 312 and configured to detect the pressure acting on the second push plate 312. The pressure sensor 6 converts the sensed mechanical signal into an electrical signal that can be read by the control system, thereby enabling quantitative monitoring of the force state of the second push plate 312 and allowing the operator or automatic control system to obtain objective data on the internal pressure state of the formation fixture 100.

[0067] This pressure detection function enables data-driven and precise leveling of the process. During leveling, the operator can understand the stress on different areas of the second push plate 312 under the action of the leveling component 51 based on the values ​​fed back by the pressure sensor 6. By observing the pressure changes in the corresponding areas of each leveling point, the adjustment amounts of multiple leveling components 5 can be coordinated more precisely, thereby adjusting the second push plate 312 to the ideal posture, ensuring that the second push plate 312 is strictly parallel to the first push plate 311, and making the pressure evenly distributed on all batteries.

[0068] During the pressing and holding pressure processes performed in the formation fixture 100, the real-time data provided by the pressure sensor 6 can be used as parameters for process control. The output of the drive assembly 4 can be controlled based on the feedback from the pressure sensor 6 to ensure that the actual pressure applied to the battery matches the process setting value, avoiding insufficient pressure or overload. The pressure sensor 6 can also monitor the stability of the pressure during the holding pressure process. If abnormal pressure decay or fluctuation is detected, it can provide timely warnings or trigger compensation actions, thereby ensuring the consistency and reliability of the formation process.

[0069] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this application, and are not intended to limit them. Although this application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this application.

Claims

1. A chemical conversion fixture, characterized in that, The chemical formation fixture includes: The fixture body includes a first vertical plate and a second vertical plate, which are spaced apart along the length direction of the forming fixture. A guide assembly is disposed on the fixture body; A clamping assembly includes a first push plate, a second push plate, and multiple shelf plates. The first push plate and the second push plate are movably disposed on the guide assembly. The first push plate is disposed on the side of the first upright plate facing the second upright plate, and the second push plate is disposed on the side of the second upright plate facing the first upright plate. The multiple shelf plates are movably disposed on the guide assembly and are disposed between the first push plate and the second push plate. A drive assembly connected to the first push plate, the drive assembly being configured to drive the first push plate to move along the length direction of the forming fixture; A leveling assembly is disposed between the second push plate and the second upright plate. The leveling assembly includes a leveling member configured to move relative to the second push plate. The leveling member is capable of pushing at least a portion of the second push plate to change the parallelism between the second push plate and the first push plate.

2. The chemical formation fixture according to claim 1, characterized in that, The number of leveling components is multiple, and the multiple leveling components are spaced apart along the width direction of the formation fixture to adjust the position of different parts of the second push plate along the width direction of the formation fixture.

3. The chemical formation fixture according to claim 1, characterized in that, The second pusher plate is provided with a connecting hole, which extends along the length direction of the chemical forming fixture. The leveling assembly includes: A connector is slidably disposed in the connecting hole and configured to move within the connecting hole along the length direction of the chemical forming fixture. A leveling member is movably disposed in the connector and configured to move along the length direction of the chemical forming fixture to push the portion of the second push plate that abuts against the leveling member to move.

4. The chemical formation fixture according to claim 3, characterized in that, The leveling component includes a leveling nut, which is movably sleeved on the connecting component and is configured to move along the length direction of the chemical forming fixture. The leveling assembly further includes a buffer member, which is sleeved on the connector. A first end of the buffer member abuts against the leveling nut, and the other end of the buffer member is configured to abut against the second push plate. The buffer member is an elastic member. When the leveling nut moves toward the second push plate, the buffer member is configured to provide a force to the leveling nut that is opposite to the direction of movement of the leveling nut.

5. The chemical formation fixture according to claim 4, characterized in that, The buffer is a disc spring. The first end of the disc spring is connected to the leveling nut, and the other end of the disc spring is configured to abut against the second push plate. The diameter of the disc spring gradually decreases along the length direction of the forming fixture. The disc spring is configured to apply a force along the length direction of the forming fixture to the second push plate and the leveling nut.

6. The chemical formation fixture according to claim 5, characterized in that, Along the direction from the second push plate to the second upright plate, the diameter of the disc spring gradually decreases.

7. The chemical formation fixture according to claim 3, characterized in that, The outer peripheral surface of the connector is provided with a first external thread, the leveling component is a rotating body with a through hole, and the leveling component is sleeved on the outside of the connector through the through hole. The inner peripheral surface of the through hole is provided with a first internal thread, and the first external thread and the first internal thread are engaged to connect the connector and the leveling component so that the connector and the leveling component are movably connected.

8. The chemical formation fixture according to claim 7, characterized in that, The second upright plate has a first mounting hole, the leveling component passes through the first mounting hole, the outer surface of the leveling component abuts against the inner surface of the first mounting hole, the outer peripheral surface of the leveling component has a second external thread, the inner peripheral surface of the first mounting hole has a second internal thread, the second external thread and the second internal thread are engaged to allow the leveling component and the second upright plate to be movably connected.

9. The chemical formation fixture according to claim 8, characterized in that, The second upright plate also has a second mounting hole, which communicates with the first mounting hole. The inner circumferential surface of the second mounting hole has a third internal thread, and the first external thread and the third internal thread are engaged to allow the connector and the second upright plate to be detachably connected.

10. The chemical formation fixture according to any one of claims 1-9, characterized in that, The chemical formation fixture also includes: A pressure sensor is disposed on the second push plate and is configured to detect the pressure applied to the second push plate.

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