Micro-nano machining process polishing machine with adaptive pressure control system

Abstract

The utility model is suitable for photoetching equipment technical field provides a kind of micro-nano processing technology polishing machine with self-adapting pressure control system;Including: base;The negative pressure storehouse mechanism of being installed on base, negative pressure storehouse mechanism includes the installation recess that is arranged at the top of base, rotates and sets in the adsorption disc of installation recess and the rotating component of driving adsorption disc rotation, and the top circumference of adsorption disc is provided with a plurality of storehouse recesses, and the bottom of a plurality of storehouse recesses is provided with a plurality of first communication holes, and negative pressure storehouse mechanism further includes the transition cavity that is arranged in base, and the top of transition cavity is provided with a plurality of second communication holes, and a plurality of second communication holes are communicated with the first communication hole of storehouse recess located above, and then provide negative pressure for adjacent storehouse recess;And the polishing mechanism of being installed on base, and the polishing mechanism includes the main shaft of being installed on base and the polishing motor of being arranged at the output end of main shaft, and the output end of polishing motor is provided with polishing head, and the polishing mechanism further includes self-adapting pressure control system.

Description

Technical Field

[0001] This utility model relates to the field of photolithography equipment technology, specifically a micro-nano processing polishing machine with an adaptive pressure control system. Background Technology

[0002] Glass lithography is a common process for panel-level / wafer-level packaging, TGV (Through Glass Via) and optical glass microstructure processing. Its equipment system includes both traditional semiconductor lithography machines and a large number of specialized equipment for special needs such as glass warpage, high warpage, large size, and deep holes.

[0003] Polishing is required during the photolithography process of glass processing. However, existing equipment usually only has one station for placing the glass to be processed, which requires a pause during the loading and unloading process, resulting in low work efficiency. To solve this technical problem, a micro-nano processing polishing machine with an adaptive pressure control system is proposed. Utility Model Content

[0004] The purpose of this invention is to provide a micro / nano fabrication polishing machine with an adaptive pressure control system to solve the problems mentioned in the background art.

[0005] To achieve the above objectives, this utility model provides the following technical solution:

[0006] A micro / nano fabrication polishing machine with an adaptive pressure control system includes: a base;

[0007] The negative pressure storage mechanism is installed on the base. The negative pressure storage mechanism includes an installation groove on the top of the base, an adsorption disk rotatably installed in the installation groove, and a rotating component that drives the adsorption disk to rotate. The top of the adsorption disk is arranged with a plurality of storage grooves in a circumferential array. The bottom of each of the storage grooves is provided with a plurality of first connecting holes. The negative pressure storage mechanism also includes a transition cavity in the base. The top of the transition cavity is provided with a plurality of second connecting holes. The plurality of second connecting holes communicate with the first connecting holes of the storage grooves above it, thereby providing negative pressure to the adjacent storage grooves.

[0008] The polishing mechanism is mounted on a base. The polishing mechanism includes a spindle mounted on the base and a polishing motor located at the output end of the spindle. A polishing head is located at the output end of the polishing motor. The polishing mechanism also includes an adaptive pressure control system.

[0009] As a further embodiment of this utility model: the polishing head includes a connecting disc and a polishing disc, and a plurality of elastic connectors are installed on the top of the polishing disc, with the end of the elastic connector away from the polishing disc fixedly installed on the connecting disc.

[0010] As a further embodiment of this invention: the adaptive pressure control system includes a pressure sensor and a controller. The two ends of the pressure sensor are respectively connected to the polishing disc and the connecting disc. Both the pressure sensor and the spindle are communicatively connected to the controller. The controller is used to control the spindle to lift and adjust the polishing pressure based on the pressure signal from the pressure sensor.

[0011] As a further embodiment of this utility model: the main shaft includes an X-axis moving mechanism, a Y-axis moving mechanism installed at the output end of the X-axis moving mechanism, and a lifting mechanism installed at the output end of the Y-axis moving mechanism, with the polishing motor installed at the output end of the lifting mechanism.

[0012] As a further embodiment of this utility model: the rotating component includes a rotating motor fixedly mounted on the base, and the output end of the rotating motor is connected to the middle position of the adsorption plate.

[0013] As a further improvement of this utility model, a negative pressure connection channel is also provided at the middle position of the bottom of the transition cavity, and the negative pressure connection channel is connected to the negative pressure pump.

[0014] As a further improvement of this utility model, the negative pressure storage mechanism also includes a negative pressure protection mechanism.

[0015] As a further embodiment of this utility model: the negative pressure protection mechanism includes a control flow channel disposed in the base, one end of which is connected to the negative pressure connection channel, a control piston slidably disposed inside the control flow channel, a second elastic element connected to the end of the control piston away from the negative pressure connection channel, and the end of the second elastic element away from the control piston connected to the inner wall of the control flow channel; a pressure replenishing flow channel is also disposed inside the base, one end of which is connected to the inner wall of the negative pressure connection channel, and the other end of which is disposed on the inner wall of the control flow channel, with the control piston covering the other end of the pressure replenishing flow channel; an air input flow channel is also disposed on the base, one end of which is connected to the control flow channel, and the other side of which is connected to external air, and the air input flow channel and the control flow channel are located on both sides of the control piston in the negative pressure connection channel.

[0016] As a further improvement of this utility model, the inner wall of the control channel is also provided with an annular step, and the side of the control piston away from the control channel abuts against the annular step.

[0017] As a further improvement of this utility model, it also includes a threaded adjusting rod, which passes through a threaded hole on the base, and one end of the air input channel is fixedly installed on the second elastic element.

[0018] Compared with the prior art, the beneficial effects of this utility model are as follows: the adsorption plate, mounting groove and transition cavity are set up to facilitate the transfer of the glass to be processed to the bottom of the polishing mechanism for polishing. During the polishing process, the next glass to be processed is added to the outer storage groove. After the glass at the processing position is polished, another glass to be processed is transferred to the bottom of the polishing mechanism. At the same time, the polished glass is also transferred to the outside for unloading and loading operations, thereby improving the efficiency of work. At the same time, the polishing mechanism is equipped with an adaptive pressure control system to ensure the polishing pressure and avoid polishing quality deviation caused by pressure deviation. Attached Figure Description

[0019] Figure 1 This is a three-dimensional structural diagram of a micro-nano fabrication polishing machine with an adaptive pressure control system, according to an embodiment of the present invention.

[0020] Figure 2 This is a schematic diagram of the internal structure of a micro-nano processing polishing machine with an adaptive pressure control system, according to an embodiment of the present invention.

[0021] Figure 3 for Figure 1 Enlarged view of point A in the middle.

[0022] Figure 4 for Figure 1 Enlarged view of section B in the middle.

[0023] In the picture:

[0024] 10-Base, 20-Polishing mechanism, 30-Negative pressure storage mechanism, 201-Main shaft, 202-Polishing head, 203-Polishing motor, 204-Connecting plate, 205-Elastic connector, 206-Polishing disc, 207-Pressure sensor, 301-Mounting groove, 302-Adsorption plate, 303-Rotation motor, 304-Transition cavity, 305-First connecting hole, 306-Second connecting hole, 307-Negative pressure connection channel, 308-Control piston, 309-Second elastic element, 310-Threaded adjusting rod, 311-Air input channel, 312-Pressure replenishing channel, 313-Control channel, 314-Storage groove. Detailed Implementation

[0025] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0026] Example 1

[0027] Please see Figures 1-4 This utility model embodiment 1 provides a structural diagram of a micro-nano fabrication polishing machine with an adaptive pressure control system. The micro-nano fabrication polishing machine with an adaptive pressure control system includes: a base 10, a negative pressure storage mechanism 30 mounted on the base 10, and a polishing mechanism 20 mounted on the base 10. The negative pressure storage mechanism 30 includes a mounting groove 301 disposed on the top of the base 10, an adsorption disk 302 rotatably disposed in the mounting groove 301, and a rotating component for driving the adsorption disk 302 to rotate. The top of the adsorption disk 302 is circumferentially arrayed with a plurality of storage grooves 314, and the bottom of each of the storage grooves 314 is provided with a plurality of first connecting holes 305. The negative pressure storage mechanism 30 also includes a transition cavity 304 disposed in the base 10. The top of the transition cavity 304 is provided with a plurality of second connecting holes 306, and the plurality of second connecting holes 306 communicate with the first connecting holes 305 of the storage grooves 314 located above them, thereby providing negative pressure to the adjacent storage grooves 314.

[0028] The polishing mechanism 20 includes a spindle 201 mounted on the base 10 and a polishing motor 203 disposed at the output end of the spindle 201. The output end of the polishing motor 203 is provided with a polishing head 202. The polishing mechanism 20 also includes an adaptive pressure control system for controlling the polishing pressure.

[0029] Specifically, during polishing, the glass to be processed is placed in the outer storage groove 314. The rotating mechanism drives the adsorption disk 302 to rotate, transferring the adsorption disk 302 containing the storage groove 314 to directly below the polishing mechanism 20. Simultaneously, the transition cavity 304 provides negative pressure to the storage groove 314 above it. Then, the polishing mechanism 20 polishes the glass. This invention features an adsorption disk 302, a mounting groove 301, and a transition cavity 304, which facilitates the transfer of the glass to be processed to the bottom of the polishing mechanism 20 for polishing. During the polishing process, the next piece of glass to be processed is added to the outer storage groove 314. After the glass at the processing position is polished, another piece of glass to be processed is transferred to directly below the polishing mechanism 20. At the same time, the polished glass is also transferred to the outside for unloading and loading operations, thus improving work efficiency. Furthermore, the polishing mechanism 20 is equipped with an adaptive pressure control system to ensure polishing pressure and avoid polishing quality deviations caused by pressure variations.

[0030] like Figure 3As shown in the preferred embodiment of this utility model, the polishing head 202 includes a connecting plate 204 and a polishing plate 206. A plurality of elastic connectors 205 are mounted on the top of the polishing plate 206, and the end of each elastic connector 205 away from the polishing plate 206 is fixedly mounted on the connecting plate 204. The elastic connector 205 can be an elastic telescopic rod.

[0031] In one embodiment of this utility model, the adaptive pressure control system includes a pressure sensor 207 and a controller. The two ends of the pressure sensor 207 are respectively connected to the polishing disk 206 and the connecting disk 204. The pressure sensor 207 and the spindle 201 are both communicatively connected to the controller. The controller is used to control the spindle 201 to raise and lower to adjust the polishing pressure based on the pressure signal of the pressure sensor 207.

[0032] In one embodiment of this utility model, the controller can be a microcontroller, specifically the AT899C51.

[0033] In one embodiment of this utility model, the spindle 201 includes an X-axis moving mechanism, a Y-axis moving mechanism mounted at the output end of the X-axis moving mechanism, and a lifting mechanism mounted at the output end of the Y-axis moving mechanism. The polishing motor 203 is mounted at the output end of the lifting mechanism. The X-axis moving mechanism, Y-axis moving mechanism, and lifting mechanism are all prior art and will not be described in detail here. The lifting mechanism is the Z-axis moving mechanism.

[0034] In one embodiment of this utility model, the rotating component includes a rotating motor 303 fixedly mounted on the base 10. The output end of the rotating motor 303 is connected to the middle position of the adsorption disk 302, thus providing power for the rotation of the adsorption disk 302.

[0035] like Figure 2 and Figure 4 As shown, in one embodiment of this utility model, in order to provide negative pressure to the transition cavity 304, a negative pressure connection channel 307 is also provided at the middle position of the bottom of the transition cavity 304. The negative pressure connection channel 307 is connected to the negative pressure pump, so that the negative pressure pump provides negative pressure to the negative pressure connection channel 307.

[0036] In one embodiment of this utility model, in order to protect the glass and prevent excessive adsorption pressure from causing damage, the negative pressure storage mechanism 30 also includes a negative pressure protection mechanism.

[0037] like Figure 2 and Figure 4As shown, in one embodiment of this utility model, the negative pressure protection mechanism includes a control flow channel 313 disposed in the base 10. One end of the control flow channel 313 is connected to the negative pressure connection channel 307. A control piston 308 is slidably disposed inside the control flow channel 313. A second elastic element 309 is connected to the end of the control piston 308 away from the negative pressure connection channel 307. The end of the second elastic element 309 away from the control piston 308 is connected to the inner wall of the control flow channel 313. A pressure-compensating flow channel 312 is also disposed inside the base 10. One end of the pressure-replenishing channel 312 is located on the inner wall of the negative pressure connection channel 307, and the other end of the pressure-replenishing channel 312 is located on the inner wall of the control channel 313, with the control piston 308 covering the other end of the pressure-replenishing channel 312. The base 10 also has an air input channel 311, one end of which is connected to the control channel 313, and the other side of which is connected to external air. The air input channel 311 and the control channel 313 are located within the negative pressure connection channel 307 and distributed on both sides of the control piston 308. Thus, when the internal pressure of the negative pressure connection channel 307 exceeds a set value, the control piston 308 moves towards the negative pressure connection channel 307 under pressure, connecting the other end of the pressure-replenishing channel 312 to the air input channel 311. This draws outside air into the negative pressure connection channel 307, reducing the negative pressure and effectively protecting the glass.

[0038] In one embodiment of this utility model, the inner wall of the control channel 313 is further provided with an annular step, and the side of the control piston 308 away from the control channel 313 abuts against the annular step, thereby limiting the control piston 308.

[0039] In one embodiment of this utility model, in order to adjust the negative pressure, a threaded adjusting rod 310 may be included. The threaded adjusting rod 310 passes through a threaded hole on the base 10. One end of the air inlet channel 311 is fixedly installed on the second elastic element 309. Under the action of the annular step, the pressure of the second elastic element 309 is adjusted to meet the requirements of different negative pressures. The second elastic element 309 is an elastic telescopic rod, which is prior art and will not be described in detail here.

[0040] In the description of this utility model, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this utility model and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model.

[0041] In this utility model, unless otherwise explicitly specified and limited, the terms "installation," "connection," "joining," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.

[0042] In this utility model, unless otherwise explicitly specified and limited, "above" or "below" the second feature can mean that the first feature is in direct contact with the second feature, or that the first feature is in indirect contact with the second feature through an intermediate medium. Furthermore, "above," "on top of," and "over" the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0043] Although embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention. Those skilled in the art can make changes, modifications, substitutions and variations to the above embodiments within the scope of the present invention.

Claims

1. A micro / nano fabrication polishing machine with an adaptive pressure control system, characterized in that, include: Base; A negative pressure storage mechanism installed on a base includes a mounting groove on the top of the base, an adsorption disk rotatably disposed in the mounting groove, and a rotating component for driving the adsorption disk to rotate. The top of the adsorption disk is arranged with a plurality of storage grooves in a circumferential array, and the bottom of each of the storage grooves is provided with a plurality of first connecting holes. The negative pressure storage mechanism also includes a transition cavity disposed in the base. The top of the transition cavity is provided with a plurality of second connecting holes, which communicate with the first connecting holes of the storage grooves located above it, thereby providing negative pressure to the adjacent storage grooves. The polishing mechanism is mounted on a base, and includes a spindle mounted on the base and a polishing motor disposed at the output end of the spindle. The output end of the polishing motor is provided with a polishing head. The polishing mechanism also includes an adaptive pressure control system.

2. The micro / nano fabrication polishing machine with an adaptive pressure control system according to claim 1, characterized in that, The polishing head includes a connecting disc and a polishing disc. Several elastic connectors are installed on the top of the polishing disc, and the ends of the elastic connectors away from the polishing disc are fixedly installed on the connecting disc.

3. A micro / nano fabrication polishing machine with an adaptive pressure control system according to claim 2, characterized in that, The adaptive pressure control system includes a pressure sensor and a controller. The two ends of the pressure sensor are connected to the polishing disc and the connecting disc, respectively. Both the pressure sensor and the spindle are communicatively connected to the controller. The controller is used to control the spindle to raise and lower based on the pressure signal from the pressure sensor to adjust the polishing pressure.

4. A micro / nano fabrication polishing machine with an adaptive pressure control system according to claim 3, characterized in that, The spindle includes an X-axis moving mechanism, a Y-axis moving mechanism installed at the output end of the X-axis moving mechanism, and a lifting mechanism installed at the output end of the Y-axis moving mechanism. The polishing motor is installed at the output end of the lifting mechanism.

5. A micro / nano fabrication polishing machine with an adaptive pressure control system according to claim 1, characterized in that, The rotating component includes a rotating motor fixedly mounted on the base, and the output end of the rotating motor is connected to the middle position of the adsorption plate.

6. A micro / nano fabrication polishing machine with an adaptive pressure control system according to claim 5, characterized in that, A negative pressure connection channel is also provided at the middle position of the bottom of the transition cavity, and the negative pressure connection channel is connected to the negative pressure pump.

7. A micro / nano fabrication polishing machine with an adaptive pressure control system according to claim 6, characterized in that, The negative pressure storage mechanism also includes a negative pressure protection mechanism.

8. A micro / nano fabrication polishing machine with an adaptive pressure control system according to claim 7, characterized in that, The negative pressure protection mechanism includes a control flow channel disposed in the base. One end of the control flow channel is connected to the negative pressure connection channel. A control piston is slidably disposed inside the control flow channel. A second elastic element is connected to the end of the control piston away from the negative pressure connection channel. The end of the second elastic element away from the control piston is connected to the inner wall of the control flow channel. A pressure-replenishing flow channel is also disposed inside the base. One end of the pressure-replenishing flow channel is on the inner wall of the negative pressure connection channel, and the other end of the pressure-replenishing flow channel is disposed on the inner wall of the control flow channel. The control piston covers the other end of the pressure-replenishing flow channel. An air input flow channel is also disposed on the base. One end of the air input flow channel is connected to the control flow channel, and the other side of the air input flow channel is connected to external air. The air input flow channel and the control flow channel are located on both sides of the control piston in the negative pressure connection channel.

9. A micro / nano fabrication polishing machine with an adaptive pressure control system according to claim 8, characterized in that, The inner wall of the control channel is also provided with an annular step, and the side of the control piston away from the control channel abuts against the annular step.

10. A micro / nano fabrication polishing machine with an adaptive pressure control system according to claim 9, characterized in that, It also includes a threaded adjusting rod that passes through a threaded hole on the base, and one end of the air input channel is fixedly mounted on the second elastic element.

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