Edge cleaning mechanism for reducing abnormal waxing of a polishing machine carrier

Abstract

This utility model discloses an edge-washing mechanism for reducing wax coating abnormalities on polishing machine carriers. It includes a first nozzle, a second nozzle, an edge-washing pipeline communicating with the first and second nozzles, and a drive device. The outlet direction of the first nozzle is inclined from the outside of the carrier towards its side, and the outlet direction of the second nozzle is inclined from the inside of the carrier towards its front edge. The outlet direction of the second nozzle is not on the same plane as the outlet direction of the first nozzle. A bubble buffer is provided at the outlet of the second nozzle. A baffle is provided on the side of the second nozzle near the center of the carrier. The edge-washing mechanism provided by this application can effectively prevent the bursting of bubbles in the cleaning fluid during edge washing, prevent the cleaning fluid from splashing onto the inner wax film, effectively reduce the impact on the inner wax film of the carrier, reduce the occurrence rate of dimples, thereby improving product yield and economic benefits, and reducing production costs.

Description

Technical Field

[0001] This utility model belongs to the field of semiconductor manufacturing technology, and specifically relates to an edge washing mechanism that reduces abnormal wax coating on polishing machine carriers. Background Technology

[0002] CMP (chemical mechanical polishing) is an indispensable step in the surface planarization process of silicon substrates, and single-wafer polishing machines are a process to achieve atomic-level flatness of silicon substrates.

[0003] The general operation process of a single-wafer polishing machine is as follows: 1. Wax is applied in the wax application area, that is, the back side of the wafer is applied to the circular block carrier (hereinafter referred to as block) using special wax; 2. The target removal amount and a better flatness parameter are achieved through three processes: coarse polishing, medium polishing and fine polishing.

[0004] In the manufacturing process of single-wafer polishing machines, uneven wax coating can cause uneven contact pressure between the wafer and the polishing pad during polishing. If the wax film becomes thicker in certain areas on the back side, the pressure in those areas will be greater, resulting in over-polishing. In the flatness test map after polishing, this forms a shallow pit called a "Dimple". The presence of Dimple will worsen the roughness of this area in the back-end semiconductor processes, such as epitaxy, and prevent proper focusing in photolithography, thus causing defects. Since each defect in the back-end silicon wafer processes represents a huge loss, it is necessary to reduce the occurrence rate of Dimple on the substrate side.

[0005] The waxing process for the block is as follows: 1. The block is rinsed with SC1 nozzles (SC1 cleaning solution is mainly composed of ammonia, hydrogen peroxide and water); 2. Wax is sprayed from the center of the block with wax nozzles; 3. The block is rotated at high speed to spread the wax film evenly; 4. The edges are washed with SC1 nozzles to remove the wax film from the edges (edge ​​washing is necessary to remove the wax from the edges and sides of the block, otherwise the wax will adhere to the robotic arm and affect the machine's operation); 5. The residual SC1 on the edges is dried.

[0006] However, in the edge cleaning line, SC1 cleaning fluid inevitably releases gas (ammonia). This manifests as bubbles in the line, and when these bubbles burst at the outlet of the edge cleaning line and splash onto the wax surface, they create an abnormal wax coating area resembling a "volcano" during the waxing process. This "volcano"-like shape will lift the wafer during the mounting process, causing uneven pressure between the wafer and the polishing pad, resulting in a dimple after polishing. Utility Model Content

[0007] The purpose of this invention is to provide an edge-washing mechanism that reduces abnormal waxing on polishing machine carriers in order to overcome the shortcomings of the existing technology.

[0008] The objective of this utility model is achieved through the following technical solution:

[0009] An edge-washing mechanism for reducing waxing abnormalities on a polishing machine carrier includes a first nozzle, a second nozzle, an edge-washing pipeline communicating with the first and second nozzles, and a drive device. The edge-washing pipeline is used to provide edge-washing cleaning fluid. The first and second nozzles are used to spray the edge-washing cleaning fluid onto the side and front edge of the carrier, respectively. The drive device is used to drive the edge-washing pipeline, the first nozzle, and the second nozzle to move linearly and reciprocally towards or away from the carrier. The outlet direction of the first nozzle is inclined from the outside of the carrier to the side of the carrier, and the outlet direction of the second nozzle is inclined from the inside of the carrier to the front edge of the carrier. The outlet direction of the second nozzle is not on the same plane as the outlet direction of the first nozzle.

[0010] The outlet of the second nozzle is provided with a bubble buffer to prevent splashing when the bubble bursts;

[0011] The second nozzle is provided with a baffle on the side near the center of the vehicle to prevent the edge cleaning liquid sprayed by the first nozzle and the second nozzle from splashing onto the inside of the vehicle.

[0012] Preferably, the bubble buffer is made of PVA material.

[0013] Preferably, an extended spray pipe is provided between the edge washing pipeline and the first nozzle and the second nozzle.

[0014] Preferably, the first nozzle is generally straight; the second nozzle is generally C-shaped, and the second nozzle is twisted to one side relative to the first nozzle, so that the plane where the second nozzle is located has a certain angle with the plane where the first nozzle is located, thereby making the outlet direction of the second nozzle and the outlet direction of the first nozzle not on the same plane.

[0015] Preferably, the torsion angle is 30 to 60°.

[0016] Preferably, the output end of the drive device is connected to an extension shaft;

[0017] The extended nozzle and the extension shaft are arranged in parallel, and the ends of both the extended nozzle and the extension shaft are fixed to the connecting plate.

[0018] Preferably, the driving device is a cylinder.

[0019] Preferably, the edge-washing mechanism further includes a fixed support assembly;

[0020] The fixed support assembly includes a first fixed plate, a second fixed plate, and a connecting rod;

[0021] The driving device is fixed to the first fixing plate;

[0022] The second fixing plate is provided with a through hole for the extended nozzle and the extension shaft to pass through. The extended nozzle and the extension shaft pass through the through hole and can move linearly back and forth along the through hole under the action of the driving device.

[0023] The connecting rod connects and fixes the first fixing plate and the first fixing plate.

[0024] Preferably, the connecting rod is fixed to the polishing machine base.

[0025] The edge-washing mechanism provided in this application can effectively prevent the bursting of air bubbles in the cleaning fluid during edge washing, prevent the cleaning fluid from splashing onto the inner wax film, effectively reduce the impact on the inner wax film of the carrier, reduce the occurrence rate of dimples, thereby improving product yield and economic benefits, and reducing production costs. Attached Figure Description

[0026] Figure 1 This is a three-dimensional structural diagram of the edge-washing mechanism provided in this application;

[0027] Figure 2 This is a schematic diagram of the structure of the first nozzle and the second nozzle;

[0028] Figure 3 This is a schematic diagram of the front view structure of the edge washing mechanism provided in this application;

[0029] Figure 4 This is a schematic diagram showing that the second nozzle and the first nozzle are not set on the same plane;

[0030] Figure 5 This is a schematic diagram showing the second nozzle and the first nozzle arranged on the same plane.

[0031] Figure 6 The photo shows a product where the second nozzle and the first nozzle are not set on the same plane.

[0032] Figure 7 This is a product photo showing the second nozzle and the first nozzle positioned on the same plane.

[0033] Explanation of reference numerals in the attached figures:

[0034] 1-First nozzle; 2-Second nozzle; 3-Edge washing pipe; 4-Drive device; 5-Bubble buffer; 6-Baffle; 7-Extended nozzle; 8-Extended shaft; 9-First fixing plate; 10-Second fixing plate; 11-Connecting rod; 12-Wax film; 13-Carrier; 14-Connecting plate; 15-Bubble. Detailed Implementation

[0035] This application provides an edge-washing mechanism to reduce wax coating abnormalities on polishing machine carriers, such as... Figures 1-3 As shown, the device includes a first nozzle 1, a second nozzle 2, a washing pipe 3 connected to the first nozzle 1 and the second nozzle 2, and a drive device 4. The other end of the washing pipe 3 is connected to a cleaning fluid source to provide washing cleaning fluid to the first nozzle 1 and the second nozzle 2. The first nozzle 1 and the second nozzle 2 are used to spray washing cleaning fluid onto the side and front edges of the carrier 13, respectively, so as to wash away residual wax on the edges of the carrier 13.

[0036] The drive unit 4 provides a linear power source for the edge-washing mechanism, driving the edge-washing pipe 3, the first nozzle 1, and the second nozzle 2 to move linearly back and forth towards or away from the carrier 13. When cleaning is required, the drive unit 4 moves the first nozzle 1 and the second nozzle 2 closer to the carrier 13 for cleaning. The carrier 13 rotates during edge washing, allowing the cleaning fluid sprayed by the first nozzle 1 and the second nozzle 2 to cover the entire edge of the carrier 13, removing residual wax from the entire edge of the carrier. After cleaning is completed, the drive unit 4 moves the first nozzle 1 and the second nozzle 2 away from the carrier 13 so as not to affect the subsequent application of wax to the wax film. The drive unit 4 can be a cylinder, a hydraulic cylinder, or a motor.

[0037] The outlet direction of the first nozzle 1 is tilted from the outside of the vehicle and aligned with the side of the vehicle 13. The outlet direction of the second nozzle 2 is tilted from the inside of the vehicle and aligned with the front edge of the vehicle 13. Moreover, the outlet direction of the second nozzle is not on the same plane as the outlet direction of the first nozzle, so that when the second nozzle 2 and the first nozzle 1 spray SC1 cleaning fluid, there will be no liquid splashing caused by the opposing spray of SC1 cleaning fluid.

[0038] The outlet of the second nozzle 2 is equipped with a bubble buffer section 5 to prevent splashing when the bubble 15 bursts. The bubble buffer section 5 can be made of foam material such as PVA, which allows the bubble to be buffered by the foam when it bursts, thus preventing splashing and reducing the impact on the wax surface.

[0039] Even with the bubble buffer 5, it is impossible to avoid the occasional back splashing of SC1 cleaning fluid. Therefore, a baffle 6 is provided on the side of the second nozzle near the center of the vehicle to prevent the edge cleaning fluid sprayed by the first nozzle 1 and the second nozzle 2 from splashing onto the inside of the vehicle 13, thereby reducing the impact on the wax film 12.

[0040] Preferably, for ease of application, an extended spray pipe 7 is provided between the edge washing pipe 3 and the first nozzle 1 and the second nozzle 2.

[0041] Preferably, the first nozzle 1 is generally straight; the second nozzle 2 is generally C-shaped, that is, the second nozzle has a bend, so that the direction of the cleaning fluid outlet is changed from the outside to the inside of the first nozzle to the inside to the outside of the second nozzle, so as to avoid the cleaning fluid being sprayed into the inside of the carrier to remove the wax film on the inside of the carrier.

[0042] like Figure 4 and 6 As shown, the second nozzle is twisted to one side relative to the first nozzle, so that the plane where the second nozzle is located has a certain angle with the plane where the first nozzle is located, and thus the outlet direction of the second nozzle is not on the same plane as the outlet direction of the first nozzle.

[0043] If the second nozzle and the first nozzle are arranged on the same plane, such as Figure 5 and Figure 7 The outlets of the second nozzle and the first nozzle are positioned opposite each other, causing the cleaning fluid sprayed from the outlet to spray against each other, which makes it easy for the cleaning fluid to splash onto the inside of the vehicle.

[0044] More preferably, the torsion angle, i.e. the angle between the plane where the second nozzle is located and the plane where the first nozzle is located, is 30 to 60°.

[0045] Preferably, the output end of the drive device 4 is connected to an extension shaft 8; the extended nozzle 7 and the extension shaft 8 are arranged in parallel, and the ends of both the extended nozzle 7 and the extension shaft 8 are fixed to the connecting plate 14, which can be secured with nuts. The drive device 4 can drive the extension shaft to move back and forth, thereby driving the connecting plate, the first nozzle 1 and the second nozzle 2 fixed on the connecting plate 14, as well as the extended nozzle 7 and the edge washing pipe 3 to move back and forth. By setting the extension shaft 8 and the connecting plate 14, the drive device can be kept away from the wax film on the carrier, so that the wax will not be thrown onto the drive device during edge washing, affecting the normal operation of the drive device. If the drive device uses a cylinder, if it is close to the wax film, the wax is easily thrown onto the piston of the cylinder, which will cause the cylinder to jam after the wax dries, making it unable to be used normally.

[0046] To improve the operational stability of the edge washing mechanism, preferably, the edge washing mechanism provided in this application further includes a fixed support assembly; the fixed support assembly includes a first fixed plate 9, a second fixed plate 10 and a connecting rod 11; the driving device 4 is fixed on the first fixed plate 9, and the second fixed plate 10 is provided with a through hole for the extended nozzle 7 and the extension shaft 8 to pass through, the extended nozzle 7 and the extension shaft 8 pass through the through hole, and can move linearly back and forth along the through hole under the action of the driving device, and the connecting rod 11 connects and fixes the first fixed plate 9 and the second fixed plate 10.

[0047] By setting a fixed support assembly, the movement position of the drive device, the first nozzle, and the second nozzle can be defined, and their movement can be effectively supported.

[0048] Furthermore, the connecting rod 11 is fixed to the polishing machine base, thereby fixing the entire edge washing mechanism to the polishing machine to facilitate the edge washing operation of the carrier wax film.

[0049] In summary, the edge washing mechanism provided in this application can effectively prevent the bursting of air bubbles in the cleaning fluid during edge washing, prevent the cleaning fluid from splashing onto the inner wax film, effectively reduce the impact on the inner wax film of the carrier, reduce the occurrence rate of dimples, thereby improving product yield and economic benefits, and reducing production costs.

[0050] Although preferred embodiments of the present invention have been described, those skilled in the art, upon learning the basic inventive concept, can make other changes and modifications to these embodiments. Therefore, the appended claims are intended to be interpreted as including the preferred embodiments as well as all changes and modifications falling within the scope of the present invention. Clearly, those skilled in the art can make various alterations and modifications to the present invention without departing from its spirit and scope. Thus, if these modifications and modifications of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention also intends to include these modifications and modifications.

Claims

1. A washing mechanism for reducing waxing abnormalities on a polishing machine carrier, comprising a first nozzle, a second nozzle, a washing pipeline communicating with the first nozzle and the second nozzle, and a driving device; the washing pipeline is used to provide washing cleaning fluid, the first nozzle and the second nozzle are respectively used to spray the washing cleaning fluid onto the side and front edges of the carrier, and the driving device is used to drive the washing pipeline, the first nozzle, and the second nozzle to move linearly reciprocatingly towards or away from the carrier, characterized in that, The outlet direction of the first nozzle is inclined from the outside of the vehicle to the side of the vehicle, and the outlet direction of the second nozzle is inclined from the inside of the vehicle to the front edge of the vehicle; the outlet direction of the second nozzle and the outlet direction of the first nozzle are not on the same plane. The outlet of the second nozzle is provided with a bubble buffer to prevent splashing when the bubble bursts; The second nozzle is provided with a baffle on the side near the center of the vehicle to prevent the edge cleaning liquid sprayed by the first nozzle and the second nozzle from splashing onto the inside of the vehicle.

2. The edge-washing mechanism for reducing wax coating abnormalities on polishing machine carriers as described in claim 1, characterized in that, The bubble buffer is made of PVA material.

3. The edge-washing mechanism for reducing wax coating abnormalities on polishing machine carriers as described in claim 1, characterized in that, An extended spray pipe is provided between the edge washing pipeline and the first nozzle and the second nozzle.

4. The edge-washing mechanism for reducing wax coating abnormalities on polishing machine carriers as described in claim 1, characterized in that, The first nozzle is generally straight; the second nozzle is generally C-shaped, and the second nozzle is twisted to one side relative to the first nozzle, so that the plane where the second nozzle is located has a certain angle with the plane where the first nozzle is located, thereby making the outlet direction of the second nozzle and the outlet direction of the first nozzle not on the same plane.

5. The edge-washing mechanism for reducing wax coating abnormalities on polishing machine carriers as described in claim 4, characterized in that, The torsion angle is 30 to 60°.

6. The edge-washing mechanism for reducing wax coating abnormalities on polishing machine carriers as described in claim 3, characterized in that, The output end of the drive device is connected to an extension shaft; The extended nozzle and the extension shaft are arranged in parallel, and the ends of both the extended nozzle and the extension shaft are fixed to the connecting plate.

7. The edge-washing mechanism for reducing waxing abnormalities on polishing machine carriers as described in claim 6, characterized in that, The driving device is a cylinder.

8. The edge-washing mechanism for reducing waxing abnormalities on polishing machine carriers as described in claim 6, characterized in that, It also includes fixed support components; The fixed support assembly includes a first fixed plate, a second fixed plate, and a connecting rod; The driving device is fixed to the first fixing plate; The second fixing plate is provided with a through hole for the extended nozzle and the extension shaft to pass through. The extended nozzle and the extension shaft pass through the through hole and can move linearly back and forth along the through hole under the action of the driving device. The connecting rod connects and fixes the first fixing plate and the first fixing plate.

9. The edge-washing mechanism for reducing waxing abnormalities on polishing machine carriers as described in claim 7, characterized in that, The connecting rod is fixed to the polishing machine base.

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