A wet tank and a wet process apparatus

Abstract

The utility model discloses a kind of wet method tank and wet method equipment, wherein, wet method tank includes the processing cavity of wet method processing photovoltaic cell piece and liquid inlet pipe, the bottom of wet method tank is provided with uniform flow cavity, liquid inlet pipe is communicated uniform flow cavity, and uniform flow cavity and processing cavity are communicated by multiple uniform flow holes, so that wet method liquid medicine in uniform flow cavity flows into processing cavity by uniform flow hole. Improved wet method liquid medicine enters processing cavity structure, eliminates spray pipe, can reduce the liquid level height of wet method liquid medicine in processing cavity, can reduce the dosage of wet method liquid medicine.

Description

Technical Field

[0001] This utility model relates to the field of photovoltaic equipment technology, specifically to a wet processing tank and wet processing equipment. Background Technology

[0002] Wet process equipment for photovoltaic cells refers to equipment that uses wet chemical solutions to clean or etch photovoltaic cells to achieve specific process requirements. Wet process equipment includes alkaline polishing equipment, PSG removal equipment, BSG removal equipment, and electroplating equipment. To ensure uniform liquid supply to the wet process tank, spray nozzles are typically installed at the bottom or side of the tank to intermittently or continuously spray the wet chemical solution into the tank, maintaining or improving the uniformity of the solution.

[0003] In some wet process equipment, while ensuring the uniformity of the wet process solution, it is also necessary to minimize fluctuations or agitation of the wet process solution when it comes into contact with the photovoltaic cell, in order to achieve a good wet process treatment effect on the photovoltaic cell. Existing technology increases the distance between the nozzle outlet and the photovoltaic cell, allowing the sprayed wet process solution to stabilize before contacting the photovoltaic cell.

[0004] like Figure 1 As shown, when the nozzle 10 is positioned at the bottom of the wet processing tank 11 and the photovoltaic cells are located above the nozzle 10, increasing the liquid level in the wet processing tank 11 increases the distance H2 between the nozzle 10 outlet and the photovoltaic cells. This inevitably increases the amount of wet processing solution used in the wet processing tank 11, increasing the cost of the wet processing solution. Furthermore, the large volume of the wet processing solution in the wet processing tank 11 leads to longer replacement times during regular changes. Moreover, the installation height H1 of the nozzle 10 itself cannot be significantly reduced due to other process requirements, further increasing the amount of wet processing solution used. Utility Model Content

[0005] The purpose of this invention is to provide a wet process tank and wet process equipment to reduce the amount of wet process solution used.

[0006] To achieve the above objectives, the technical solutions provided in the embodiments of this utility model are as follows:

[0007] On one hand, an embodiment of the present invention provides a wet processing tank, including a processing chamber for wet processing of photovoltaic cells and an inlet pipe. The bottom of the wet processing tank is provided with a flow equalization chamber, the inlet pipe is connected to the flow equalization chamber, and the flow equalization chamber and the processing chamber are connected through a plurality of flow equalization holes, so that the wet processing solution in the flow equalization chamber flows into the processing chamber through the flow equalization holes.

[0008] In some embodiments, the wet processing tank includes a flow equalization plate disposed in the cavity of the wet processing tank to divide the wet processing tank into a processing cavity and a flow equalization cavity, and the flow equalization plate is provided with the plurality of flow equalization holes;

[0009] The plurality of flow equalization holes are evenly distributed on the flow equalization plate;

[0010] The flow equalization plate is parallel to the bottom wall of the wet process tank.

[0011] In some embodiments, the processing chamber and the flow equalization chamber are stacked one on top of the other, and the ratio of the capacity of the processing chamber to the capacity of the flow equalization chamber is 2-50.

[0012] In some embodiments, a baffle plate is provided above the flow equalization hole to block and prevent the wet process solution from flowing directly to the photovoltaic cell;

[0013] The orthogonal projection of the baffle plate onto the flow equalization orifice completely covers the flow equalization orifice.

[0014] In some embodiments, a baffle plate is provided above the flow equalization plate, and the baffle plate is provided with a liquid passage hole;

[0015] The baffle plate and the flow equalization plate are parallel;

[0016] The orthographic projection of the liquid passage hole on the flow equalization plate does not overlap with the flow equalization hole.

[0017] In some embodiments, the flow equalization plate is formed by splicing together multiple plate-shaped members;

[0018] The flow equalization cavity is composed of multiple sub-cavities;

[0019] The wet process tank includes a partition plate, which is used to divide the flow equalization cavity into multiple sub-cavities.

[0020] In some embodiments, the inlet pipe is connected to the flow equalization chamber via a manifold.

[0021] In some embodiments, the wet processing tank includes a flow equalization plate disposed in the cavity of the wet processing tank to divide the wet processing tank into a processing cavity and a flow equalization cavity, and the flow equalization plate is provided with the plurality of flow equalization holes;

[0022] The flow equalization plate is provided with a manifold box, and a manifold cavity is formed inside the manifold box. The liquid inlet pipe is connected to the manifold box and communicates with the manifold cavity.

[0023] The flow equalization plate is also provided with a liquid inlet hole, and the flow manifold is connected to the flow equalization cavity through the liquid inlet hole.

[0024] In some embodiments, the flow equalization holes are disposed on the flow equalization plate around the manifold;

[0025] The diameter of the flow equalization hole closer to the manifold is smaller than the diameter of the flow equalization hole farther away from the manifold.

[0026] On the other hand, embodiments of this utility model also provide a wet processing device, including the aforementioned wet processing tank.

[0027] Due to the application of the above technical solution, the embodiments of this utility model have the following advantages compared with the prior art: the wet chemical solution flows into the flow equalization chamber from the inlet pipe, and is distributed into the processing chamber through multiple flow equalization holes, thus ensuring the uniformity of the wet chemical solution. Compared with the nozzle in the prior art, the flow equalization holes can be densely distributed on the flow equalization plate, while the nozzle, due to its own wall thickness and cost, finds it difficult to achieve the same density of flow equalization holes; that is, the uniform delivery of the wet chemical solution can be achieved better and more economically through the flow equalization holes. The improved structure of the wet chemical solution entering the processing chamber eliminates the need for a nozzle, which can reduce the liquid level of the wet chemical solution in the processing chamber and reduce the amount of wet chemical solution used. Attached Figure Description

[0028] Appendix Figure 1 This is a schematic diagram of the structure of a wet processing tank in the prior art;

[0029] Appendix Figure 2 This is a schematic diagram of the wet process tank in Example 1;

[0030] Appendix Figure 3 For the appendix Figure 2 A magnified view of a section at point A in the middle;

[0031] Appendix Figure 4 This is a schematic diagram of the flow equalization plate in Example 1, with some baffles omitted;

[0032] Appendix Figure 5 This is a schematic diagram of the baffle plate in Example 1.

[0033] Appendix Figure 6 This is a schematic diagram of the wet tank structure in Example 1, which includes multiple sub-cavities in the flow equalization cavity;

[0034] Appendix Figure 7 This is a schematic diagram of the wet processing tank in Example 2;

[0035] Appendix Figure 8 For the appendix Figure 7 A magnified view of a section at point B in the middle;

[0036] Appendix Figure 9 This is a schematic diagram of the flow equalization plate in Example 2;

[0037] The meanings of the reference numerals in the attached drawings are as follows: processing chamber 1a, nozzle 10, wet tank 11, flow equalization chamber 11a, flow equalization plate 111, flow equalization hole 111a, liquid inlet hole 111b, liquid inlet pipe 12, baffle plate 13, manifold box 14, manifold chamber 14a, large baffle plate 15, and baffle groove 15a. Detailed Implementation

[0038] The preferred embodiments of the present invention will now be described in detail with reference to the accompanying drawings, so that the advantages and features of the present invention can be more easily understood by those skilled in the art. It should be noted that the description of these embodiments is for the purpose of aiding understanding of the present invention, but does not constitute a limitation thereof. Embodiment 1 is not a single embodiment, but a collection of embodiments with similar schemes or features, as are other embodiments.

[0039] Example 1

[0040] To reduce the amount of wet-process chemical solution used, this embodiment proposes a wet-process tank. For example... Figures 2-6 As shown, the wet processing tank includes a processing chamber 1a for wet processing of photovoltaic cells and an inlet pipe 12. The wet processing tank 11 also includes a flow equalization plate 111, which is disposed within the chamber of the wet processing tank 11 to divide the wet processing tank 11 into the processing chamber 1a and the flow equalization chamber 11a. The inlet pipe 12 connects to the flow equalization chamber 11a. The flow equalization plate 111 is provided with multiple flow equalization holes 111a, allowing the wet processing solution in the flow equalization chamber 11a to flow into the processing chamber 1a through the flow equalization holes 111a. The wet processing solution flows into the flow equalization chamber 11a from the inlet pipe 12 and is distributed into the processing chamber 1a through the multiple flow equalization holes 111a, ensuring the uniformity of the wet processing solution. Compared to the nozzle 10 in the prior art, the flow equalization holes 111a can be densely distributed on the flow equalization plate 111, while the nozzle 10, due to its own wall thickness and cost, finds it difficult to achieve the same density of flow equalization holes 111a. That is, the flow equalization holes 111a can achieve better and more economical uniform delivery of wet-process pharmaceutical solutions. In the prior art, the liquid level in the processing chamber 1a is H1+H2, where the installation height of the nozzle 10 is H1. In this embodiment, the nozzle 10 is omitted, and the liquid level in the processing chamber 1a is H3, which is less than H1+H2. By reasonably setting the number and position of the flow equalization holes 111a, H3 can be made less than H1. That is, through the implementation of the technical solution in this embodiment, the liquid level in the processing chamber 1a is less than the liquid level in the prior art, which can reduce the amount of wet-process pharmaceutical solution used. In this embodiment, even considering the liquid level H4 in the flow equalization chamber 11a, H3+H4 is still less than H1+H2.

[0041] Specifically, the flow equalization plate 111 divides the wet processing tank 11 into a processing chamber 1a and a flow equalization chamber 11a stacked on top of each other, with the flow equalization chamber 11a located at the bottom of the wet processing tank 11. The flow equalization chamber 11a and the processing chamber 1a are connected by multiple flow equalization holes 111a, so that the wet processing solution in the flow equalization chamber 11a flows into the processing chamber 1a through the flow equalization holes 111a.

[0042] Specifically, multiple flow equalization holes 111a are evenly distributed on the flow equalization plate 111 to improve the uniformity of the wet processing solution flowing into the processing chamber 1a. The flow equalization plate 111 is parallel to the bottom wall of the wet processing tank 11, so that the height difference between the flow equalization holes 111a on different areas of the flow equalization plate 111 and the photovoltaic cells above them remains consistent. When processing multiple cells, the processing effect of each photovoltaic cell can be kept relatively consistent.

[0043] Preferably, the ratio of the capacity of the processing chamber 1a to the capacity of the flow equalization chamber 11a is 2-50; this ensures that the capacity of the wet chemical solution in the processing chamber 1a is appropriate, so that the processing speed of the photovoltaic cells is not affected by too little chemical solution, and the cost is not too high due to too much chemical solution.

[0044] Specifically, a baffle plate 13 is provided above the flow equalization orifice 111a to block and prevent the wet process solution from flowing directly to the photovoltaic cell; the orthogonal projection of the baffle plate 13 onto the flow equalization orifice 111a completely covers the flow equalization orifice 111a. The wet process solution flowing out of the flow equalization orifice 111a does not directly move onto the photovoltaic cell. Instead, the wet process solution first moves onto the baffle plate 13, oscillates between the baffle plate 13 and the flow equalization plate 111a, and then flows to the photovoltaic cell. This can improve the uniformity of the wet process solution and reduce the impact of the wet process solution on the photovoltaic cell.

[0045] Specifically, the baffle plate 13 can be a large baffle plate 15 covering multiple flow equalization holes 111a. The large baffle plate 15 includes a flow equalization groove 15a, which is placed on the flow equalization plate 111. The opening of the flow equalization groove 15a facing the flow equalization plate 111 is directly opposite the flow equalization hole 111a, and the opening of the flow equalization groove 15a facing its own side is connected to the processing chamber 1a. The wet chemical solution sprayed from the flow equalization hole 111a flows into the flow equalization groove 15a. After being blocked and guided by the flow equalization groove 15a, the wet chemical solution flows to the opening of the flow equalization groove 15a facing its own side and then enters the processing chamber 1a. The wet chemical solution flowing out of the flow equalization hole 111a does not move directly onto the photovoltaic cell, but instead flows to the opening of the flow equalization groove 15a facing its own side after being blocked and guided by the flow equalization groove 15a. Therefore, the uniformity of the wet chemical solution can be improved, while reducing the impact of the wet chemical solution on the photovoltaic cell.

[0046] Specifically, a baffle plate is provided above the flow equalization plate 111, and the baffle plate has liquid passage holes; the baffle plate blocks and prevents the wet process solution from flowing directly to the photovoltaic cell. The wet process solution flowing out of the flow equalization hole 111a does not move directly to the photovoltaic cell. The wet process solution flowing out of the flow equalization hole 111a first moves to the baffle plate, oscillates between the baffle plate and the flow equalization plate 111, and then flows to the photovoltaic cell through the liquid passage holes. This can improve the uniformity of the wet process solution and reduce the impact of the wet process solution on the photovoltaic cell.

[0047] Preferably, the baffle plate and the flow equalization plate 111 are parallel; the orthographic projection of the liquid passage hole on the flow equalization plate 111 does not overlap with the flow equalization hole 111a, so as to prevent the wet liquid flowing out of the flow equalization hole 111a from being blocked by the baffle plate and flowing directly through the liquid passage hole to the photovoltaic cell.

[0048] Specifically, when the flow equalization plate 111 is a single whole plate, it is difficult to process and is prone to deformation; therefore, the flow equalization plate 111 is formed by splicing multiple plate-shaped parts to reduce the processing difficulty and reduce deformation.

[0049] If the wet processing tank is a multi-station processing tank, it can process multiple photovoltaic cells simultaneously; the flow equalization cavity 11a is composed of multiple sub-cavities to process multiple photovoltaic cells separately. Furthermore, the flow equalization cavity 11a, composed of multiple sub-cavities, can increase the hydraulic pressure within the sub-cavities, facilitating the flow of the wet processing solution from the sub-cavities. Specifically, as... Figure 6 As shown, the wet process tank includes a partition plate 112, which is used to divide the flow equalization chamber 11a into two sub-chambers.

[0050] Furthermore, this embodiment also provides a wet processing device, including the aforementioned wet processing tank. By providing a flow equalization plate 111 in the cavity of the wet processing tank 11, the wet processing tank 11 is divided into a processing chamber 1a and a flow equalization chamber 11a; and the flow equalization plate 111 is provided with a plurality of flow equalization holes 111a, so that the wet processing solution in the flow equalization chamber 11a flows into the processing chamber 1a through the flow equalization holes 111a; this ensures the uniformity of the wet processing solution flowing into the processing chamber 1a, eliminates the need for the spray pipe 10, and effectively reduces the amount of wet processing solution used in the processing chamber 1a.

[0051] Example 2

[0052] To reduce the amount of wet-process chemical solution used, this embodiment proposes a wet-process tank. For example... Figures 7-9As shown, the wet processing tank includes a processing chamber 1a for wet processing of photovoltaic cells and an inlet pipe 12. The wet processing tank 11 also includes a flow equalization plate 111, which is disposed within the chamber of the wet processing tank 11 to divide the wet processing tank 11 into the processing chamber 1a and the flow equalization chamber 11a. The inlet pipe 12 connects to the flow equalization chamber 11a. The flow equalization plate 111 is provided with multiple flow equalization holes 111a, allowing the wet processing solution in the flow equalization chamber 11a to flow into the processing chamber 1a through the flow equalization holes 111a. The wet processing solution flows into the flow equalization chamber 11a from the inlet pipe 12 and is distributed into the processing chamber 1a through the multiple flow equalization holes 111a, ensuring the uniformity of the wet processing solution. Compared to the nozzle 10 in the prior art, the flow equalization holes 111a can be densely distributed on the flow equalization plate 111, while the nozzle 10, due to its own wall thickness and cost, finds it difficult to achieve the same density of flow equalization holes 111a. That is, the flow equalization holes 111a can achieve better and more economical uniform delivery of wet-process pharmaceutical solutions. In the prior art, the liquid level in the processing chamber 1a is H1+H2, where the installation height of the nozzle 10 is H1. In this embodiment, the nozzle 10 is omitted, and the liquid level in the processing chamber 1a is H5, where H5 is less than H1+H2. By reasonably setting the number and position of the flow equalization holes 111a, H5 can be made less than H1. That is, through the implementation of the technical solution in this embodiment, the liquid level in the processing chamber 1a is less than the liquid level in the prior art, which can reduce the amount of wet-process pharmaceutical solution used. In this embodiment, even considering the liquid level H6 in the flow equalization chamber 11a, H5+H6 is still less than H1+H2.

[0053] Preferably, a manifold box 14 is provided on the flow equalization plate 111, and a manifold cavity 14a is formed inside the manifold box 14. The liquid inlet pipe 12 is connected to the manifold box 14 and communicates with the manifold cavity 14a. The flow equalization plate 111 is also provided with a liquid inlet hole 111b, and the manifold cavity 14a is connected to the flow equalization cavity 11a through the liquid inlet hole 111b. The liquid inlet pipe 12 is connected to the flow equalization cavity 11a through the manifold cavity 14a. In Example 1, the wet chemical solution flows into the processing chamber 1a after passing through the liquid inlet pipe 12 and the flow equalization cavity 11a. The wet chemical solution still maintains a large kinetic energy in the processing chamber 1a, and its direct flow to the photovoltaic cell will have an adverse effect. Therefore, a baffle plate 13 or a liquid baffle is provided to reduce the kinetic energy of the wet chemical solution and block and prevent the wet chemical solution from flowing directly to the photovoltaic cell. In this technical solution, the wet chemical solution sequentially flows through the inlet pipe 12, the manifold 14, and the flow equalization chamber 11a before entering the processing chamber 1a. The manifold 14 consumes some of the kinetic energy of the wet chemical solution. The wet chemical solution flowing into the flow equalization chamber 11a undergoes a 180-degree reversal before exiting through the flow equalization orifice 111a, further consuming some of its kinetic energy. The wet chemical solution may also oscillate within the flow equalization chamber 11a before exiting through the flow equalization orifice 111a, significantly reducing its kinetic energy. Therefore, in this technical solution, the wet chemical solution exiting through the flow equalization orifice 111a does not require additional baffles 13 or baffles to reduce its kinetic energy. The wet chemical solution is distributed twice, through the inlet orifice 111b and the flow equalization orifice 111a, resulting in better uniformity. Because the kinetic energy of the wet chemical solution flowing out of the equalization orifice 111a is relatively small, the impact range on the wet chemical solution in the processing chamber 1a is relatively small, which allows the liquid level in the processing chamber 1a to be further reduced; under the same process conditions, the amount of wet chemical solution used in this embodiment is less than that used in Example 1.

[0054] Specifically, the flow equalization orifice 111a is disposed on the flow equalization plate 111 around the manifold 14. The hydraulic pressure experienced by the area near the manifold 14 is greater than that experienced by the area away from the manifold 14; in order to keep the kinetic energy of the wet chemical solution flowing out of the flow equalization orifice 111a basically consistent under different hydraulic conditions, the orifice diameter of the flow equalization orifice 111a near the manifold 14 is smaller than that of the flow equalization orifice 111a away from the manifold 14.

[0055] It should be noted that for any parts not described in detail in this embodiment, the technical solutions in Embodiment 1 can be referred to or drawn upon.

[0056] Furthermore, this embodiment also provides a wet processing device, including the aforementioned wet processing tank. By providing a flow equalization plate 111 in the cavity of the wet processing tank 11, the wet processing tank 11 is divided into a processing chamber 1a and a flow equalization chamber 11a; and the flow equalization plate 111 is provided with a plurality of flow equalization holes 111a, so that the wet processing solution in the flow equalization chamber 11a flows into the processing chamber 1a through the flow equalization holes 111a; this ensures the uniformity of the wet processing solution flowing into the processing chamber 1a, eliminates the need for the spray pipe 10, and effectively reduces the amount of wet processing solution used in the processing chamber 1a.

[0057] It should be noted that the wet processing equipment in the above embodiments includes at least alkaline polishing equipment, PSG removal equipment, BSG removal equipment, and electroplating equipment. The alkaline polishing equipment, PSG removal equipment, BSG removal equipment, and electroplating equipment can respectively perform alkaline polishing, PSG removal, BSG removal, and electroplating treatments on photovoltaic cells, and the corresponding wet processing solutions are alkaline polishing solution, PSG removal solution, BSG removal solution, and electroplating solution. The above embodiments can be applied to horizontal or vertical wet processing equipment; in horizontal wet processing equipment, photovoltaic cells are wet-processed while maintaining a horizontal or substantially horizontal state; in vertical wet processing equipment, photovoltaic cells are wet-processed while maintaining a vertical or substantially vertical state.

[0058] The above embodiments are only for illustrating the technical concept and features of this utility model. Their purpose is to enable those skilled in the art to understand the content of this utility model and implement it. They should not be used to limit the protection scope of this utility model. All equivalent changes or modifications made in accordance with the spirit and essence of this utility model should be covered within the protection scope of this utility model.

Claims

1. A wet processing tank, comprising a processing chamber for wet processing of photovoltaic cells and a liquid inlet pipe, characterized in that, The bottom of the wet processing tank is provided with a flow equalization chamber, the liquid inlet pipe is connected to the flow equalization chamber, and the flow equalization chamber and the processing chamber are connected through multiple flow equalization holes so that the wet processing solution in the flow equalization chamber flows into the processing chamber through the flow equalization holes.

2. The wet processing tank according to claim 1, characterized in that: The wet processing tank includes a flow equalization plate, which is disposed in the cavity of the wet processing tank to divide the wet processing tank into a processing cavity and a flow equalization cavity. The flow equalization plate is provided with the plurality of flow equalization holes. The plurality of flow equalization holes are evenly distributed on the flow equalization plate; The flow equalization plate is parallel to the bottom wall of the wet process tank.

3. The wet processing tank according to claim 1, characterized in that: The processing chamber and the flow equalization chamber are stacked one on top of the other, and the ratio of the capacity of the processing chamber to the capacity of the flow equalization chamber is 2-50.

4. The wet processing tank according to claim 1, characterized in that: A baffle plate is provided above the flow equalization hole to block and prevent the wet process solution from flowing directly to the photovoltaic cell; The orthogonal projection of the baffle plate onto the flow equalization orifice completely covers the flow equalization orifice.

5. The wet processing tank according to claim 2, characterized in that: A baffle plate is provided above the flow equalization plate, and the baffle plate is provided with a liquid passage hole; The baffle plate and the flow equalization plate are parallel; The orthographic projection of the liquid passage hole on the flow equalization plate does not overlap with the flow equalization hole.

6. The wet processing tank according to claim 2, characterized in that: The flow equalization plate is formed by splicing together multiple plate-shaped components; The flow equalization cavity is composed of multiple sub-cavities; The wet process tank includes a partition plate, which is used to divide the flow equalization cavity into multiple sub-cavities.

7. The wet processing tank according to claim 1, characterized in that: The inlet pipe is connected to the flow equalization chamber through the manifold.

8. The wet processing tank according to claim 7, characterized in that: The wet processing tank includes a flow equalization plate, which is disposed in the cavity of the wet processing tank to divide the wet processing tank into a processing cavity and a flow equalization cavity. The flow equalization plate is provided with the plurality of flow equalization holes. The flow equalization plate is provided with a manifold box, and a manifold cavity is formed inside the manifold box. The liquid inlet pipe is connected to the manifold box and communicates with the manifold cavity. The flow equalization plate is also provided with a liquid inlet hole, and the flow manifold is connected to the flow equalization cavity through the liquid inlet hole.

9. The wet processing tank according to claim 8, characterized in that: The flow equalization holes are arranged around the flow equalization box on the flow equalization plate; The diameter of the flow equalization hole closer to the manifold is smaller than the diameter of the flow equalization hole farther away from the manifold.

10. A wet process equipment, characterized in that: Includes the wet process tank as described in any one of claims 1-9.

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