Wafer cleaning basket
Patent Information
- Application Number
- CN202522198292.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-10-17
- Publication Date
- 2026-11-03
- Estimated Expiration
- 2035-10-17
AI Technical Summary
Existing silicon wafer cleaning baskets cannot effectively clean certain areas on the bottom edge of the silicon wafer during the cleaning process, resulting in inadequate cleaning and affecting the bending strength of the silicon wafer and photovoltaic cell.
A basket for cleaning silicon wafers is designed, with an inclined support bar at the bottom of the inner cavity to support the bottom edge of the silicon wafer. The silicon wafer is also limited by an insertion limiting structure, so that the contact area between the silicon wafer and the support bar changes continuously during the cleaning process, avoiding cleaning blind spots.
It achieves full-coverage cleaning of the bottom edge of the silicon wafer, improving the cleaning effect and enhancing the bending strength of the silicon wafer and photovoltaic cell.
Smart Images

Figure CN224936041U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the technical field of silicon wafer cleaning equipment, and in particular to a flower basket for silicon wafer cleaning. Background Technology
[0002] The existing silicon wafer cleaning basket uses support rods to support the bottom edges of each silicon wafer. The angle between the support rods and the silicon wafers is 90 degrees.
[0003] When silicon wafers are loaded into the cleaning tank in a basket, they gain the force to move left and right under the action of the cleaning liquid and nitrogen bubbling. This causes the silicon wafers to move left and right within the slots of the basket. Since the angle between the support rod and the silicon wafer is 90 degrees, the contact area between the silicon wafer and the support rod does not change on the bottom edge of the silicon wafer. As a result, the local area on the bottom edge of all silicon wafers, i.e. the contact area, is never effectively cleaned, leading to incomplete cleaning of the silicon wafers.
[0004] When the cleaning process is a texturing and smoothing process, the contact area between the bottom edge of the silicon wafer and the support strip is not properly texturized and smoothed. When the silicon wafer is bent, stress concentration is easily formed in the untreated areas, which makes the silicon wafer easy to break. This is not conducive to improving the bending strength of the silicon wafer and the photovoltaic cells made from it. Utility Model Content
[0005] The technical problem this invention aims to solve is that the bottom edge of silicon wafers treated with existing basket cleaning methods is often not effectively cleaned, resulting in inadequate cleaning.
[0006] The technical solution adopted by this utility model to solve its technical problem is: a basket for cleaning silicon wafers, having an inner cavity for carrying silicon wafers, with multiple insertion limiting structures arranged from left to right on the side of the inner cavity for limiting the vertical insertion of each silicon wafer arranged from left to right in the inner cavity, and multiple support bars arranged from left to right and inclined at the bottom of the inner cavity for supporting the bottom edge of each silicon wafer. The support bars are inclined relative to the supported silicon wafers so that when the silicon wafer moves left and right within the insertion limiting structure, the contact part between the silicon wafer and the support bar continuously changes on the bottom edge of the silicon wafer.
[0007] In some embodiments, the silicon wafer cleaning basket may include a basket around the inner cavity and a support rod at the bottom of the inner cavity. The support rod is mounted on the basket and extends along the arrangement direction of the silicon wafers. The support rod is a support rod provided with a plurality of inclined support bars.
[0008] In some embodiments, the number of support rods may be one or more.
[0009] In some embodiments, the angle C between the support strip and the silicon wafer is optionally 40 to 50 degrees.
[0010] In some embodiments, the basket may include left and right side panels and front and rear side rods, with the side rods located between the left and right side panels and their ends connected to the side panels respectively, and an insert limiting structure located on the side rods.
[0011] In some embodiments, optionally, there are two or more side bars on both the front and rear sides of the basket, and they are arranged vertically. The side bars have multiple slots arranged from left to right, and the slots on all the side bars constitute an insertion limiting structure.
[0012] In some embodiments, the side bar may optionally have a plurality of protrusions arranged from left to right, and the grooves between the protrusions form a slot.
[0013] The beneficial effects of this utility model are: because the flower basket supports the bottom edge of the silicon wafer through the inclined support bars, the contact area between the silicon wafer and the support bars changes continuously on the bottom edge of the silicon wafer during the left and right translation process, so that the bottom edge of the silicon wafer can be cleaned during the cleaning process, effectively avoiding cleaning blind spots.
[0014] When the cleaning process is a texturing and rounding process, the bottom edge of the silicon wafer can be texturized and rounded in place. This process greatly improves the bending strength of the silicon wafer and the photovoltaic cells made from it. Attached Figure Description
[0015] The present invention will be further described below with reference to the accompanying drawings and embodiments;
[0016] Figure 1 This is a three-dimensional structural diagram of the flower basket for cleaning silicon wafers according to this utility model.
[0017] Figure 2 This is a three-dimensional structural diagram of the support rod of this utility model;
[0018] Figure 3 This is a top view structural diagram of the support rod of this utility model;
[0019] Figure 4 yes Figure 3 AA section view;
[0020] Figure 5 yes Figure 4 Enlarged view of point B;
[0021] Figure 6 This is a top view structural diagram of the silicon wafer loading basket for silicon wafer cleaning according to this utility model;
[0022] Figure 7 This is a three-dimensional structural diagram of the silicon wafer cleaning basket of this utility model.
[0023] In the diagram, 1. silicon wafer, 2. support rod, 2-1. support bar, 3. side plate, 4. side rod, 4-1. slot, 4-2. protruding tooth. Detailed Implementation
[0024] like Figures 1-7 As shown, a silicon wafer cleaning basket has an inner cavity for carrying silicon wafers 1. The side of the inner cavity has multiple insertion limiting structures arranged from left to right for limiting the vertical insertion of each silicon wafer 1 arranged from left to right in the inner cavity. The bottom of the inner cavity has multiple support bars 2-1 arranged from left to right and inclined for supporting the bottom edge of each silicon wafer 1. The support bars 2-1 are inclined relative to the supported silicon wafers 1 so that the contact part between the silicon wafer 1 and the support bar 2-1 continuously changes on the bottom edge of the silicon wafer 1 when the silicon wafer 1 moves left and right within the insertion limiting structure.
[0025] The silicon wafer cleaning basket includes a basket around the inner cavity and a support rod 2 at the bottom of the inner cavity. The support rod 2 is mounted on the basket and extends along the arrangement direction of the silicon wafers 1. The support rod 2 is a support rod 2 with multiple inclined support bars 2-1. Each support bar on the support rod 2 corresponds to one silicon wafer 1.
[0026] There are two support rods 2, arranged front and back at the bottom of the inner cavity. Of course, there can be more than two support rods 2, or there can be only one. When there is only one support rod 2, it is preferable that the support rod 2 is located in the middle position at the bottom of the inner cavity.
[0027] The angle C between the support strip 2-1 and the silicon wafer 1 is 40-50 degrees, preferably 45 degrees.
[0028] The basketball hoop includes left and right side panels 3 and front and rear side rods 4. The side rods 4 are located between the left and right side panels 3, and the two ends of the side rods 4 are connected to the side panels 3 on both sides respectively. The insert limiting structure is located on the side rods 4.
[0029] There are two or more side bars 4 on both the front and rear sides of the basketball hoop, and they are arranged vertically. The side bars 4 have multiple slots 4-1 arranged from left to right. All the slots 4-1 on the side bars 4 constitute an insertion limiting structure.
[0030] The side rod 4 has multiple protruding teeth 4-2 arranged from left to right, and the grooves between the protruding teeth 4-2 form a slot 4-1.
[0031] compared to Figure 7 ,exist Figure 6 In the diagram, silicon wafer 1 is drawn using an abbreviated method, represented by a straight line.
Claims
1. A basket for cleaning silicon wafers, having an inner cavity for carrying silicon wafers (1), the side of the inner cavity having a plurality of insertion limiting structures arranged from left to right for limiting the vertical insertion of each silicon wafer (1) arranged from left to right in the inner cavity, characterized in that: The bottom of the inner cavity has multiple support bars (2-1) arranged from left to right and inclined, which are used to support the bottom edge of each silicon wafer (1). The support bars (2-1) are inclined relative to the supported silicon wafer (1) so that the contact part between the silicon wafer (1) and the support bar (2-1) changes continuously on the bottom edge of the silicon wafer (1) when the silicon wafer (1) moves left and right in the insertion limiting structure.
2. The basket for cleaning silicon wafers according to claim 1, characterized in that: Includes a basket around the inner cavity and a support rod (2) at the bottom of the inner cavity. The support rod (2) is installed on the basket and extends along the arrangement direction of the silicon wafer (1). The support rod (2) is a support rod (2) with multiple inclined support bars (2-1).
3. The basket for cleaning silicon wafers according to claim 2, characterized in that: The number of the support rods (2) is more than one.
4. The silicon wafer cleaning basket according to claim 1, 2 or 3, characterized in that: The angle C between the support bar (2-1) and the silicon wafer (1) is 40~50 degrees.
5. The basket for cleaning silicon wafers according to claim 2, characterized in that: The basket includes side plates (3) on the left and right sides and side rods (4) on the front and rear sides. The side rods (4) are located between the side plates (3) on the left and right sides. The two ends of the side rods (4) are connected to the side plates (3) on both sides respectively. The insertion limiting structure is located on the side rods (4).
6. The basket for cleaning silicon wafers according to claim 5, characterized in that: The number of side bars (4) on the front and rear sides of the basket is more than two and arranged vertically. The side bars (4) have multiple slots (4-1) arranged from left to right. The slots (4-1) on all the side bars (4) constitute an insertion limiting structure.
7. The basket for cleaning silicon wafers according to claim 6, characterized in that: The side rod (4) has multiple protruding teeth (4-2) arranged from left to right, and the grooves between the protruding teeth (4-2) form a slot (4-1).
