Skirt (asymmetrical pleated half skirt)
CN309556246SActive Publication Date: 2025-10-24BEIJING VOCATIONAL COLLEGE OF SOCIAL MANAGEMENT
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Patent Information
- Application Number
- CN202530236173.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-28
- Publication Date
- 2025-10-24
- Estimated Expiration
- 2040-04-28
Smart Images
Figure 000001_ABST
Abstract
1. The name of the design product: skirt (asymmetrical pleated half skirt). 2. The use of the design product: for wearing. 3. The design points of the design product: in shape. 4. The picture or photo that best shows the design points: perspective view 1. 5. The top view and bottom view are not common, and the top view and bottom view are omitted. 6. The dress form in the design picture is not part of the claimed design content.
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