Remote plasma source power supply (45L)
CN309567050SActive Publication Date: 2025-10-28DONGGUAN SHENGDING PRECISION INSTR CO LTD
View PDF 0 Cites 0 Cited by
Patent Information
- Application Number
- CN202530042073.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-01-22
- Publication Date
- 2025-10-28
- Estimated Expiration
- 2040-01-22
Smart Images

Figure 000007_ABST
Abstract
1. Name of the product in this design: Remote Plasma Source Power Supply (45L). 2. Application of this design: It is used to provide power to a 45L remote plasma source chamber to dissociate nitrogen trifluoride gas into fluoride ions for chamber cleaning, surface treatment, material modification, thin film deposition and other processes in a vacuum environment. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: a 3D model.
Need to check novelty before this filing date? Find Prior Art