Intelligent polishing pad defect detector
CN309611086SActive Publication Date: 2025-11-18INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
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Patent Information
- Application Number
- CN202530103423.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-06
- Publication Date
- 2025-11-18
- Estimated Expiration
- 2040-03-06
Smart Images
Figure 000001_ABST
Abstract
1. The name of the design product: intelligent polishing pad defect detector. 2. The use of the design product: for detecting the defect type, defect color, etc. of the mechanical polishing pad. 3. The design points of the design product: in shape. 4. The picture or photo that best indicates the design points: perspective view.
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