Flat plate type atomic layer deposition apparatus
CN309695286SActive Publication Date: 2025-12-23ATOMIC NANO MATERIALS (NAN JING) CO LTD
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Patent Information
- Application Number
- CN202530256200.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-05-08
- Publication Date
- 2025-12-23
- Estimated Expiration
- 2040-05-08
Smart Images
Figure 000007_ABST
Abstract
1. The name of the design product: flat plate type atomic layer deposition device. 2. The use of the design product: the design product is used for atomic layer thin film deposition reaction on large size flat plate type substrate. 3. The design points of the design product: in shape. 4. The picture or photo that best indicates the design points: perspective view.
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