Plasma de-gluing apparatus
CN309793913SActive Publication Date: 2026-02-13中科光智(重庆)科技有限公司
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Patent Information
- Application Number
- CN202530374674.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-06-27
- Publication Date
- 2026-02-13
- Estimated Expiration
- 2040-06-27
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Figure 000001_ABST
Abstract
1. Name of the design product: Plasma degumming equipment. 2. Use of the design product: For removing residual photoresist film of semiconductor wafer. 3. Design points of the design product: In shape. 4. Picture or photo best indicating the design points: Perspective view.
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