Ion source filament for a focused ion beam
CN309813056SActive Publication Date: 2026-02-24SHENZHEN FENGTIAN IND CO LTD
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Patent Information
- Application Number
- CN202530460321.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-08-05
- Publication Date
- 2026-02-24
- Estimated Expiration
- 2040-08-05
Smart Images
Figure 000007_ABST
Abstract
1. The name of the design product: Ion source filament of focused ion beam. 2. The use of the design product: The design product is used for ion source of focused ion beam loaded with gallium. 3. The design points of the design product: in shape. 4. The picture or photo that best indicates the design points: perspective view.
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