Liquid phase epitaxial growth apparatus (vertical type)
CN309885257SActive Publication Date: 2026-03-3148TH RES INST OF CHINA ELECTRONICS TECH GROUP CORP
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-08-29
- Publication Date
- 2026-03-31
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Figure 000007_ABST
Abstract
1. The name of the design product: Liquid phase epitaxy growth equipment (vertical type). 2. The use of the design product: Liquid phase epitaxy growth equipment for focal plane assembly manufacturing. 3. The design features of the design product: In shape. 4. The picture or photo that best indicates the design features: Perspective view 1.
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