Semiconductor epitaxial apparatus (MOCVD apparatus)
CN309909871SActive Publication Date: 2026-04-10WUXI LEADPRO TECH CO LTD
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- WUXI LEADPRO TECH CO LTD
- Filing Date
- 2025-08-20
- Publication Date
- 2026-04-10
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Figure 000002_ABST
Abstract
1. The name of the design product: semiconductor epitaxial equipment (MOCVD equipment). 2. The use of the design product: for semiconductor thin film deposition equipment. 3. The design points of the design product: in shape. 4. The picture or photo that best shows the design points: perspective view. 5. The top surface of the design product is not easily visible or not visible during use, and the top view is omitted; the bottom surface of the design product is not easily visible or not visible during use, and the bottom view is omitted.
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