RF face shield (MK-10)
CN309930854SActive Publication Date: 2026-04-17SHENZHEN GUANGSHU MEDICAL TECHNOLOGY CO LTD
View PDF 0 Cites 0 Cited by
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- SHENZHEN GUANGSHU MEDICAL TECHNOLOGY CO LTD
- Filing Date
- 2025-08-27
- Publication Date
- 2026-04-17
Smart Images

Figure 000003_ABST
Abstract
1. Name of the product in this design: Radio Frequency Mask (MK-10). 2. Purpose of this product design: For use in radio frequency beauty treatments on the human face. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: a 3D model.
Need to check novelty before this filing date? Find Prior Art