Atomic layer deposition apparatus (monolithic round cell)

CN310171273SActive Publication Date: 2026-08-25SHANGHAI YUANLI XINCHEN TECHNOLOGY CO LTD
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Patent Information

Application Number
CN202630050756.0
Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
Filing Date
2026-01-29
Publication Date
2026-08-25
Estimated Expiration
2041-01-29

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Abstract

1. Name of the designed product: Atomic layer deposition equipment (integral round cavity). 2. Use of the designed product: For atomic layer thin film deposition. 3. Design points of the designed product: In shape. 4. Picture or photo best indicating the design points: Perspective view 1.
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