Optical element with a coating, semiconductor technology system and method for manufacturing an optical element

DE102024208564A1Pending Publication Date: 2026-03-12CARL ZEISS SMT GMBH
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Patent Information

Authority / Receiving Office
DE · DE
Patent Type
Applications
Current Assignee / Owner
Filing Date
2024-09-09
Publication Date
2026-03-12

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Abstract

The invention relates to an optical element (1) comprising: a substrate (2), and a coating (3) that is partially reflective or antireflective for radiation (4), preferably for radiation in the UV or VIS wavelength range, wherein the coating (3) comprises a plurality of first layers (6) and second layers (7), wherein the first layers (6) comprise a first, preferably fluoride or oxide, material, and the second layers (7) comprise a second, preferably fluoride or oxide, material whose refractive index (n2) for the radiation (4) differs from the refractive index (n1) of the first material for the radiation (4). The coating (3) comprises at least one layer group (8) for reflectivity adjustment, which includes a third layer (9) made of a third material that is not identical to the first and second materials.The invention also relates to an optical arrangement, preferably a laser or a semiconductor technology system, comprising: at least one optical element (1) designed as described above, and a method for manufacturing an optical element (1).
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Citation Information

Patent Citations

  • Micro-mirror arrangement used for micro lithography, comprises micro-mirror having reflective surface applied on mirror substrate and anti-reflective coating applied on mirror substrate outside of reflective surface

    DE102009038000A1

  • Spectacle lens with a coating, method for producing a spectacle lens and computer-implemented or experimental method for designing a spectacle lens

    DE102016120122B3