Adhesive for peelable emulsion layers, peelable emulsion layer, peelable emulsion layer-mounted exposure original plate, method for manufacturing a semiconductor device, method for manufacturing a liquid crystal display board, method for regenerating an exposure original plate and method for reducing peelable residue

DE602020072931T2Active Publication Date: 2026-06-03SHIN ETSU CHEMICAL CO LTD

Patent Information

Authority / Receiving Office
DE · DE
Patent Type
Patents
Current Assignee / Owner
SHIN ETSU CHEMICAL CO LTD
Filing Date
2020-04-15
Publication Date
2026-06-03

AI Technical Summary

Technical Problem

The challenge of reducing peeling residues of the agglutinant layer on exposure original plates, particularly during ArF lithography, which hinders efficient regeneration cleaning and damages delicate phase shift films, is not adequately addressed by existing technologies.

Method used

Employing an acrylic polymer with an SP value of 10.0 to 12.0 as the base material for the agglutinant, incorporating a (meth)acrylic acid ester with an ether bond in the side chain, and using a polyvinyl ether compound to enhance the pellicle's peeling characteristics, thereby reducing residues and maintaining adhesive strength.

Benefits of technology

The pellicle effectively minimizes peeling residues, allowing for smoother regeneration cleaning and reducing damage to the exposure original plate, enhancing production efficiency in semiconductor devices and liquid crystal display boards.

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