METHOD FOR MANUFACTURING OPTOELECTRONIC DEVICES
Patent Information
- Application Number
- DE602024002503
- Authority / Receiving Office
- DE · DE
- Patent Type
- Patents
- Current Assignee / Owner
- Priority Date
- 2023-08-10
- Filing Date
- 2024-08-02
- Publication Date
- 2026-02-11
- Estimated Expiration
- 2044-08-02
AI Technical Summary
Manufacturing monochromatic MIR light sources across a broad spectral range requires complex and costly processes due to the need for dedicated production lines for each wavelength, as the thickness of optically active layers varies significantly based on the desired emission wavelength.
A manufacturing process is developed where optoelectronic devices operating at different wavelengths share common technological steps by dimensioning the thicknesses of layers according to a scaling factor based on the wavelengths, allowing the first and second stacks to have the same height and be processed identically, thus reducing manufacturing costs.
This approach enables the fabrication of optoelectronic devices with reduced manufacturing costs and improved industrial compatibility by allowing shared technological processes for devices emitting at different wavelengths, maintaining optimal optical properties and device height consistency.