Device for reprocessing an electrolyte liquid

Abstract

The invention relates to, inter alia, a device (50) for reprocessing an electrolyte liquid (60), having a process chamber (55) which has a process chamber walling (56) that includes a process chamber base (57), a process chamber cover (58), and a process chamber lateral wall (59); a first inlet (51), which is disposed in the process chamber walling (56), preferably in the process chamber lateral wall (59), and designed to feed the liquid (60) to be reprocessed into the process chamber (55); a first outlet (53), which is disposed in the process chamber walling (56), preferably in the process chamber lateral wall (59), and designed to discharge the reprocessed liquid (60) out of the process chamber (55); one or more barrier elements (63, 65, 69, 74, 78) within the process chamber (55), said barrier element(s) being designed to influence the flow characteristics within the process chamber (55); a device (81) for removing a gas (111) from the liquid (60) to be reprocessed, said device (81) having a second outlet (82), which is disposed in the process chamber walling (56) and designed to discharge the gas which is removed from the liquid (60); and a device (85) for supplying water, said device (85) having a second inlet (86), which is disposed in the process chamber wall (56) and designed to feed a second liquid in the form of water into the process chamber (55). In order to make it possible to perform other functions in addition to the function of removing an undesired gas from a liquid containing said undesired gas, a basin (64) which is designed to receive water (67) is arranged or formed within the process chamber (55), said basin having a basin base (65) and a basin edge (66) which protrudes upwards from the basin base (65), wherein at least the upper edge (66a) of the basin edge (66) lies above a defined fill level (61a) for the liquid (60) within the process chamber (55). Thus, aerosols of the electrolytes can additionally be scrubbed and / or a gas stripping process for undesired gases dissolved in the water (67) can be carried out.

Description

[0001] Description

[0002] Device for preparing an electrolyte fluid

[0003] The present invention relates firstly to a device for treating a liquid according to the preamble of patent claim 1. In particular, the invention relates to a device for treating an electrolyte liquid, which is used in connection with electrolysis, preferably water electrolysis, in an electrolysis device. This device is also referred to synonymously as a treatment device in the course of the description. Furthermore, the present invention relates to an electrolysis device according to the preamble of patent claim 12. Furthermore, the invention relates to an energy system, in particular a building energy system, according to the preamble of patent claim 13, which has such a treatment device and / or electrolysis device. Finally, the invention also relates to a method for treating an electrolyte liquid according to the preamble of patent claim 14.

[0004] With the increasing use of renewable energies, the production and supply of hydrogen, among other things, is playing an increasingly important role. Hydrogen is considered one of the promising options for climate-friendly energy production.

[0005] However, hydrogen only occurs in nature in a bound form, for example with oxygen in the form of water, as methane or petroleum in the form of so-called hydrocarbons, or the like.

[0006] To produce gaseous hydrogen as an energy carrier, it must be separated from a hydrogen-rich starting material using energy. A wide variety of processes already exist for this, such as reforming processes, pyrolysis processes, and similar methods.

[0007] Another process that forms the basis of the present invention and has been known for a long time is the electrolysis process. In water electrolysis, for example, water is split into its components, hydrogen and oxygen, using electrical current. The electrolysis process takes place in an electrolysis device, also known as an electrolysis cell. An electrolysis device basically consists of two electrodes at which the partial reactions of a redox reaction take place. In water electrolysis, for example, water is split into hydrogen and oxygen using electrical current. H2 and O2. The electrodes are connected via a voltage source. The electrode connected to the negative pole is called the cathode, and the electrode connected to the positive pole is called the anode. The electrodes are immersed in a conductive liquid called an electrolyte solution. Since water itself is not an electrolyte, meaning it does not conduct electricity, an electrolyte, such as potassium hydroxide (KOH), is added to the water during electrolysis.

[0008] At specified intervals, such as maintenance intervals, the electrolyte fluid in the electrolysis device is replaced. Between these intervals, it is necessary, or at least highly advantageous, to recondition the electrolyte fluid, since optimal electrolysis requires the purest possible electrolyte fluid.

[0009] Numerous and diverse solutions for treating electrolyte fluid, for example, so that it can be reused or further processed, have already become known in the state of the art. Some of these solutions are described below as examples.

[0010] DE 697 36 370 T2, for example, describes a solution for component recovery from a sealed battery, where one component is an electrolyte fluid. The electrolyte fluid is extracted from the battery itself and fed via an extraction line into an external storage container. From there, the electrolyte fluid can be returned and reused.

[0011] DE 11 2005 001 405 T5 describes an example of an electrolysis process which shows that water used during electrolysis is supplied and compensated by an external system.

[0012] WO 2020 / 254211 A1 , from which the present invention is based, describes a

[0013] A solution in which a liquid used in an electrolysis cell, which contains an unwanted gas, can be degassed. This known solution comprises a treatment device which is located outside the actual electrolysis device and which has a process chamber. The liquid to be degassed is located in the process chamber. In addition, one or more barrier elements are arranged in the process chamber. These barrier elements divide the process chamber into different regions and influence the flow characteristics within the process chamber. In addition to the actual main chamber, the process chamber has a pre-chamber. The liquid containing the unwanted gas is introduced into the pre-chamber via an inlet and then degassed in the process chamber. The degassed liquid is discharged from the process chamber via an outlet and fed back into the system.Likewise, the gas extracted from the liquid is discharged from the process chamber via another outlet.

[0014] With the known solution, it is only possible to remove unwanted gas from a liquid that contains unwanted gas at that point. During the treatment of electrolysis liquid, other tasks usually also arise, such as washing out electrolyte material from the gas stream containing the removed unwanted gas. This is not possible with the known solution.

[0015] The present invention is therefore based on the object of developing a device for processing a liquid, in particular electrolyte liquid, of the type mentioned at the outset in such a way that, in addition to the function of freeing a liquid containing an undesirable gas from the undesirable gas, a single processing device can also perform further functions, such as, for example, washing out electrolyte material from the gas stream containing the removed undesirable gas.

[0016] This object is achieved according to the invention by the device for processing a liquid having the features of independent patent claim 1, which represents the first aspect of the invention, by the device for electrolysis having the features of independent patent claim 12, which represents the second aspect of the invention, by the energy system having the features according to independent patent claim 13, which represents the third aspect of the invention, and by the method for processing an electrolyte liquid having the features according to independent patent claim 14, which represents the fourth aspect of the invention. Further features and details of the invention emerge from the subclaims, the description and the drawings.In this case, features and details disclosed in connection with one of the aspects of the invention also apply in full in connection with all other aspects of the invention, and vice versa, so that with regard to the disclosure of the individual aspects of the invention, reference is always made in full to the other aspects of the invention.

[0017] All aspects of the invention are based on the common inventive concept that utilizes a specially designed device for treating a liquid. This device will be referred to synonymously as a treatment device throughout the description. The device according to the invention is not limited to the treatment of specific liquids. In a preferred embodiment, which will frequently be used to illustrate the invention below, the treatment device serves to treat an electrolyte liquid. An electrolyte liquid is used in connection with electrolysis processes, for example, the electrolysis of water. Electrodes are located in a conductive liquid, which is the electrolyte liquid, also referred to as an electrolyte solution.Since water itself is not an electrolyte, meaning it doesn't conduct electricity, an electrolyte, such as potassium hydroxide (KOH), is added to the water during electrolysis. The electrolyte fluid thus consists of the basic component, water, supplemented by another component in the form of an electrolyte.

[0018] The present invention is not limited to specific electrolysis processes. For example, the invention can be used in conjunction with alkaline electrolysis. Alkaline electrolysis is known per se and familiar to those skilled in the art. Likewise, the invention can also be used in conjunction with so-called PEM electrolysis, i.e., proton exchange membrane electrolysis. PEM electrolysis is also known per se and familiar to those skilled in the art.

[0019] In the following, the invention will be described using alkaline electrolysis as an example for clarity, without limiting the invention to this specific field of application. The electrolyte liquid, which contains water and the electrolyte, for example, KOH, also contains oxygen produced during the electrolysis process. This oxygen is considered an undesirable gas at this point, as the electrolyte is full of oxygen. This reduces its performance because the two-phase mixture negatively influences the reaction in the electrolysis cell. If the product oxygen is not removed from the electrolyte and thus from the electrolytically active regions, for example, the membrane electrode functional unit, the gas represents an obstacle to the supply of water-rich electrolyte to the active centers.This results in a local undersupply of the reactant water, significantly reducing the electrolytic reaction locally. This can also lead to hot spots and local drying out. This reduces the overall performance of the electrolysis unit and, in the event of complete local drying out, even poses a safety risk due to transfer leaks in the membrane separating the product gases hydrogen and oxygen. The occurrence of transfer leaks ultimately leads to irreversible failure of the electrolysis system. Therefore, the oxygen must be removed from the electrolyte. At the same time, the electrolyte itself should remain as completely as possible in the electrolyte.

[0020] The following requirements therefore apply:

[0021] • Electrolysis (e.g. alkaline): H2O H2 and O2

[0022] • 2 phase mixture of O2 & electrolyte liquid (e.g. 2% KOH) leave the electrolysis device

[0023] • The electrolysis device requires a pure electrolyte flow again. This means: o Remove O2 from the 2-phase mixture o The electrolyte, for example, KOH, should not be lost or released into the environment

[0024] ■ Electrolyte aerosols should be separated from the escaping O2

[0025] • Additionally, H2O is consumed (taken from the electrolyte fluid) o H2O must therefore be refilled

[0026] ■ High requirements for refill water (ultrapure water)

[0027] • low conductivity

[0028] • low CO2 concentration All of these requirements can be addressed individually or “in cumulo” with the treatment device according to the invention.

[0029] The basic idea of ​​the present invention is to provide a single processing device that meets all these requirements individually or simultaneously, in particular o Multi-stage deposition and separation C>2from the electrolyte

[0030] ■ : O2 outgassing from the electrolyte in a tank

[0031] ■ : Washing out electrolyte aerosols in the C^ gas stream in an ultrapure water bath o fW refill o CO2 stripping (water treatment in the process chamber and / or in refill water)

[0032] With the present invention, in particular, the following multi-stage functional principle of a deposition can be realized.

[0033] In a first, mandatory separation stage, a gas, such as oxygen, is separated from a liquid, such as an electrolyte. This first separation stage has the particular benefit of allowing the liquid to be treated so that it can be reused and fed back into a process, such as an electrolysis process. This first separation stage is implemented in particular by slowing and calming the flow of the two-phase mixture, consisting of the liquid and the gas, in a process chamber, for example, through the use of barrier elements. In particular, the density difference between gas and liquid is used for separation via gravity.

[0034] In a second, preferably optional, separation stage, the gas, for example, oxygen, is released from liquid bubbles. These liquid bubbles can be present in the process chamber, for example, as foam or in foam. This second separation stage has the particular benefit of avoiding or reducing foam, which can negatively impact the deposition process. Furthermore, it can prevent foam "overflow." This second separation stage is implemented in particular by providing a volume for foam expansion, particularly in the process chamber, and / or by maximizing the foam's residence time in this volume so that the gas escapes from the bubbles through bubble coalescence and diminishing surface tension, and / or by crushing or bursting the remaining gas bubbles using barrier elements.

[0035] In a third, preferably optional, separation stage, liquid, for example electrolyte residues, is separated from the separated gas stream, for example from the oxygen. The benefit of the third separation stage lies in particular in the fact that the gas stream is separated from entrained liquid residues, for example electrolyte residues and / or aerosols, before it leaves the separator and enters the environment, interface systems, or the surrounding installation space. In addition, liquid residues entrained in the gas stream, for example electrolyte residues, can be recovered and subsequently returned to the liquid, for example the electrolyte. The electrolyte concentration is thus preferably kept constant. In this third separation stage, gas stripping can also be carried out alternatively or additionally. For example, the CO2 content (CO2 stripping) of a liquid to be refilled can be reduced.This will be illustrated using a concrete example. In alkaline electrolysis, for example, this process can be used to dispense with polishing resin as an ion exchanger for the water treatment of the refill liquid. In the conventional case, the desired conductivity of the refill liquid is first adjusted using reverse osmosis. However, CO2 is not removed during this process. In the conventional case, this task is performed, for example, by polishing resin as an ion exchanger. Of course, other attempts can also be made to remove the CO2, for example, by stirring or the like. These additional steps, which entail additional design effort and thus additional costs, can be dispensed with with the present invention.

[0036] The individual stages, their constructive implementation and their functionality will be explained in more detail below.

[0037] According to the first aspect of the invention, a device for processing a liquid, in particular an electrolyte liquid, i.e., a processing device, is provided, which has the features of independent patent claim 1. This processing device firstly has a process chamber. A process chamber is in particular a largely, preferably completely enclosed container in which a process or operation, in this case a processing of a liquid, takes place. The process chamber has a process chamber wall, which represents an outer boundary of the process chamber, preferably in all directions. The process chamber wall is preferably formed by a process chamber floor, a process chamber ceiling, and a process chamber side wall, wherein the process chamber side wall extends between the process chamber floor and the process chamber ceiling. The process chamber can have different geometric shapes.For example, the process chamber may be designed in the form of a cylinder, in the form of a cube, in the form of a cuboid, or the like, so that the invention is not limited to specific embodiments in this regard.

[0038] The process chamber serves to hold the liquid, for example the electrolyte liquid, which is to be treated. This is, by definition, a first liquid. During intended use, the liquid, for example the electrolyte liquid, is located within the process chamber, preferably with a fill level of up to a defined fill level. The term “fill level” refers in particular to the actual height of the liquid in the process chamber. The “defined fill level” is a predetermined height or a level up to which the liquid may be in the process chamber. The fill level is in particular the height at which the maximum upper free surface of the liquid is located. There is preferably still a remaining free space between the fill level or the defined fill level and the process chamber ceiling.

[0039] For feeding the liquid to be treated into the process chamber, a first inlet is provided, in particular arranged or formed, in the process chamber wall. In a preferred embodiment, the first inlet is provided in the process chamber side wall. This can be the case, for example, in the lateral region, in the front region, or in the rear region of the process chamber. For discharging the treated liquid from the process chamber, a first outlet is provided, in particular arranged or formed, in the process chamber wall. In a preferred embodiment, the first outlet is provided in the process chamber side wall. This can also be the case, for example, in the lateral region, in the front region, or in the rear region of the process chamber.The first inlet and the first outlet are preferably spatially separated from one another, for example arranged adjacent to one another, one above the other, or one below the other, in the process chamber wall. Of course, the first inlet and the first outlet can also be provided spatially separated from one another in other regions of the process chamber wall. Preferably, both the first inlet and the first outlet are located below the defined fill level. In another embodiment, the first inlet can also be provided above the defined fill level in the process chamber wall. The first inlet and the first outlet are preferably connected to an electrolysis device, for example an electrolysis cell, an electrolysis unit, as described in more detail below in connection with the second aspect of the invention.

[0040] Within the process chamber, one or more barrier elements are provided, which are provided to influence the flow characteristics within the process chamber. A barrier element is basically any element that influences the flow characteristics of the liquid(s) and / or a gas escaping from the liquid within the process chamber. The barrier elements can be designed in different ways, for example as a continuous plate, as a grid, as a plate with perforations, and the like. The at least one barrier element can, for example, have the function of a separating element and / or an impact element and / or a deflecting element and / or a baffle element. The invention is not limited to a specific number and function of barrier elements. Some preferred, but not exclusive, examples of barrier elements will be explained in more detail later in the description.

[0041] Furthermore, the treatment device comprises a device for removing a gas from the liquid to be treated. This device comprises at least one second outlet in the process chamber wall, which is provided for discharging the gas removed from the liquid. For example, this second outlet can be arranged or formed in the process chamber ceiling or in the process chamber side wall. In the latter case, it must be ensured that the second outlet is always located above the maximum possible fill level of the liquid or above the defined fill level within the process chamber. In a preferred embodiment, the treatment device is designed to remove oxygen from an electrolyte liquid. This means, in particular, that the oxygen is purified of electrolyte residues. The oxygen represents a waste product in the actual electrolysis process.However, the oxygen can still be used for various other processes. It is therefore advantageous to recover the oxygen. Typically, the oxygen dissolves spontaneously from the electrolyte liquid in the process chamber and, due to its density, rises to the top of the electrolyte liquid. This usually happens automatically. The oxygen reaches the upper free surface of the liquid and from there into the space between the liquid and the process chamber wall, for example, the process chamber ceiling.

[0042] Furthermore, the treatment device according to the invention comprises a device for supplying a second liquid in the form of water, wherein this device has at least one second inlet in the process chamber wall, which is provided for supplying water into the process chamber. This allows, in particular, used water in the electrolyte liquid to be refilled. The water to be supplied or supplied is preferably fresh water, in particular ultrapure water.

[0043] According to the invention, the treatment device within the process chamber, i.e. in its interior, now has a basin which is provided for receiving and holding the water described above. The basin is in particular a separate, independent component compared to the process chamber. The basin serves to receive the water, preferably the fresh water. During intended use, the water is located within the basin, preferably up to a defined fill level, which is predetermined, for example, by the height of the basin's edge. The basin is in particular a flat, open-topped container which represents its own self-contained component within the process chamber. For example, the basin can have the shape of a tub. Preferably, the basin is permanently installed or formed in the process chamber.The basin consists of a basin floor and a basin rim that projects upwards from the basin floor. The basin rim is preferably circumferential and, for example, continuous, i.e., self-contained. The basin floor can take on the function of a barrier element, as will be explained in more detail later in the description. To distinguish the individual barrier elements from one another, this barrier element is referred to in the description as the seventh barrier element. The maximum water level within the basin is preferably determined by the height of the basin rim and is, for example, at the upper edge of the basin rim or just below it. It is preferably provided that water in the basin can run over the basin rim and into the liquid below, for example electrolyte liquid, and mix with it.The water is therefore not added directly into the liquid, such as the electrolyte, but rather via the basin. For this reason, at least the upper edge of the basin's rim is above the defined fill level for the liquid within the process chamber, i.e., in a free space between the liquid and the process chamber wall, such as the process chamber ceiling. In a preferred embodiment, the entire basin is located above the defined fill level.

[0044] The invention is not limited to specific shapes or configurations of the basin. For example, the basin can have a base area that corresponds to the base area of ​​the process chamber. The basin can, for example, extend from one side of the process chamber to another, opposite side of the process chamber. Depending on the design, individual regions of the basin edge, for example, individual sides of the basin edge, can also be formed by the process chamber wall, for example, the process chamber side wall.

[0045] Preferably, the base area of ​​the basin, which is defined for example by the area of ​​the basin bottom, is smaller than the base area of ​​the process chamber, which is defined for example by the area of ​​the process chamber bottom.

[0046] Preferably, the second outlet for discharging the gas removed from the liquid and / or the second inlet for supplying water are arranged or formed above the basin, preferably in the process chamber ceiling and / or in the process chamber side wall. Preferably, the second inlet and / or the second outlet are arranged or formed above the basin. This ensures that the water introduced into the process chamber always reaches the basin. Likewise, scrubbed gas, for example oxygen, which rises upwards is discharged from the process chamber above the basin. For this reason, in a preferred embodiment, the second inlet and the second outlet are located within the process chamber ceiling.

[0047] In contrast to the prior art solution, the treatment device according to the invention additionally comprises a basin located in the process chamber, consisting of a basin bottom and a basin rim. The basin serves, in particular, to scrub oxygen from electrolyte aerosols. The oxygen, purified of electrolyte residues, then exits the process chamber via the second outlet.

[0048] The process chamber contains the liquid to be treated, in particular an electrolyte liquid. By definition, this is a first liquid. The liquid to be treated is fed into the process chamber via a first inlet within the process chamber wall. The liquid to be treated is, for example, an oxygen-electrolyte mixture, which is fed in via the first inlet, for example, from a stack.

[0049] The basin is used to hold water, which is in particular fresh water, the permeate from a reverse osmosis process of tap water, ultrapure water or the like. This water serves to supplement the liquid to be treated in the process chamber. The term “water” therefore also includes other types of liquid that are suitable for supplementing a liquid to be treated in the process chamber. By definition, the water is a second liquid that is different from the first liquid. The second liquid is independent and separate from the first liquid. The water, which is therefore in particular top-up water, is therefore not added directly to the liquid to be treated, but indirectly via the basin.When the stream is filled, the water overflows the edge of the basin and flows either directly or via a channel into the area of ​​the process chamber below the basin.

[0050] For this purpose, the treatment device has a supply device for the water, which for this purpose has a second inlet for the water in the process chamber wall. This is an independent, separate inlet from the first inlet. The liquid to be treated and the water are thus supplied via separate inlets. According to the invention, there is initially a first inlet in the process chamber wall, through which the liquid to be treated, i.e. the first liquid, is fed into the process chamber. The first inlet is preferably located below the fill level of liquid to be treated in the process chamber, i.e. below a predetermined or nominal fill level or the defined fill level within the process chamber.In addition, the process chamber wall has a second inlet, independent of the first inlet, which is provided for supplying the water, i.e., the second liquid. Preferably, the second inlet is located above the first inlet, in particular above the defined fill level for the liquid to be treated in the process chamber. The two inlets are spatially and functionally different, as they serve to supply different liquids.

[0051] The processed liquid is discharged, in particular bubble-free, via the first outlet, which is preferably located below the liquid fill level, i.e. below the defined fill level, either directly into the electrolysis device or to a pump and then further via this.

[0052] The basic function of this treatment device is described below using the treatment of an electrolyte liquid as an example. The electrolyte liquid to be treated is fed into the process chamber of the treatment device via the first inlet in the process chamber wall. The electrolyte liquid consists, for example, of water to which a certain percentage of an electrolyte, for example KOH, is added. The electrolyte liquid is discharged, for example, from the electrolysis device, such as an electrolysis cell or an electrolysis unit, and is to be treated in the treatment device. In particular, a gas that is an undesirable gas in the electrolyte liquid at this point, for example oxygen, is to be removed from the electrolyte liquid. The electrolyte liquid is filled into the process chamber up to a defined fill level.Preferably, the electrolysis device and the treatment device are designed as a closed system, allowing continuous treatment of the electrolyte fluid. Of course, in another embodiment, the treatment device can be connected to the electrolysis device only when needed, or at specific intervals or at specific times. This can be achieved via appropriate valve devices, as will be explained further below in connection with the electrolysis device according to the second aspect of the invention.

[0053] The gas, such as oxygen, dissolves spontaneously from the electrolyte liquid in the process chamber and, due to its density, rises upwards within the electrolyte liquid and into the space between the liquid and the process chamber wall. Gas escaping from the electrolyte liquid is channeled through the barrier elements within the process chamber through the basin containing water. The removed gas is removed from the process chamber via the second outlet in the process chamber wall. This results in the degassing of the gas, such as oxygen, from the electrolyte liquid.

[0054] In addition, when the gas escaping from the electrolyte liquid is passed through the water in the tank, aerosols of the electrolyte in the electrolyte liquid are separated from the escaping gas. In this case, an aerosol is specifically a fine dispersion of suspended liquid substances, in this case the electrolyte, in gases, in this case the gas to be removed. When the gas is passed through the water in the tank, the aerosols are dissolved in the water. The aerosol residues dissolved in the water, i.e., the electrolyte components, are then returned to the electrolyte liquid in the process chamber via the water. This allows the electrolyte aerosols to be washed out, and the washed-out electrolyte components are not lost.

[0055] However, washing out aerosols, which contain, for example, dissolved KOH, also has other effects. It is not only important to prevent the electrolyte components, such as KOH, from being lost from the electrolyte circuit. Washing out aerosols also prevents the aerosols from entering the environment over time (e.g., > 10 years), for example, into the interior of the energy system, where they can dry out and form solid deposits, such as solid potassium hydroxide and / or, after absorbing CO2 from the air, solid potassium carbonate K2CO3, on all surfaces and even at the outlet for the product oxygen, even to the point of blocking the outlet. This would clog the outlet, such as the O2 outlet, and cause a system failure.The treated electrolyte fluid is drained from the process chamber via the first outlet in the process chamber wall and, in particular, recirculated to the electrolysis device. Used water is replaced by the water supplied to the tank, which overflows the tank's rim and from there enters the electrolyte fluid.

[0056] The treatment device preferably has a first barrier element which is arranged or formed between the first inlet and the second outlet in the process chamber. This first barrier element is a guide contour which prevents the liquid supplied via the first inlet from immediately leaving the process chamber again via the first outlet. The first barrier element preferably extends from the process chamber wall, or from the direction of the process chamber wall, but at a distance from it, for example from the process chamber side wall into the process chamber, preferably in the direction of the process chamber center. The first barrier element can, for example, have a straight course, i.e. be oriented so as to protrude perpendicularly from the process chamber wall, or protrude from the process chamber wall at a predetermined angle of inclination.

[0057] In order to determine the liquid level in the process chamber, in particular so that the liquid does not exceed a defined level, the processing device preferably has at least one sensor element for determining the liquid level within the process chamber. Such a sensor element can preferably also be provided for the basin, or rather the water in the basin. The present invention is not limited to specific sensor types. In one embodiment, the sensor element is a float sensor element. In another embodiment, the sensor element is an optical sensor element. In a further embodiment, the sensor element is designed as a capacitive sensor element. The sensor element is preferably provided in such a way that it is capable of measuring the fill level from outside the process chamber.In any case, it is preferable to ensure that the sensor element does not constitute an ignition source. According to another embodiment, an alternative or supplementary preferred fill level measurement can be implemented or is implemented using a pressure sensor element, which is preferably provided outside the process chamber, for example, analogous to the fill level measurement in modern washing machines, which also have the problem of foam formation. In the latter case, it is particularly important not to distort the pressure measurement via gas bubbles in the connecting line, filled with the electrolyte, between the process chamber and the sensor element. The position of the pressure sensor element is preferably at a similar location to that of the capacitive sensor described by way of example, particularly advantageously at the bottom of the process chamber, in particular approximately vertically below the position of a capacitive sensor.The sensor element is used primarily to indicate the liquid level, i.e., to indicate the actual fill level of the liquid within the process chamber or the water in the basin. The fill level is determined primarily by the upper free surface of the liquid within the process chamber or the water in the basin.

[0058] In a preferred embodiment, the basin edge has a first basin edge section, which is preferably higher than the rest of the basin edge. This first basin edge section forms a second barrier element. The process chamber wall and the first basin edge section form a first channel, wherein, in particular, a free end of the first basin edge section, i.e., the first channel, is spaced from the process chamber wall.

[0059] This first basin edge section, which forms a first part of the basin edge, is preferably arranged or designed such that it lies in the process chamber above the first inlet for the liquid to be treated. The liquid flowing into the process chamber is prevented, in particular by means of the first barrier element, from immediately exiting again via the first outlet. The first basin edge section, which functions as a second barrier element, is spaced from the process chamber wall, for example from the process chamber side wall. The first basin edge section can either run parallel to the process chamber wall or be inclined at an angle to it. The first basin edge section and the process chamber wall delimit the first channel.This first channel is preferably located in an area or on a side of the process chamber in / on which the first inlet and the first outlet are also located. The end of the channel is preferably located in the free space between the liquid and the process chamber wall, for example the process chamber ceiling. Gas, for example oxygen, which escapes from the liquid to be treated in the process chamber, flows through this channel, preferably upwards towards the process chamber ceiling. The fact that the first basin edge section is higher than the rest of the basin edge has the particular advantage that any liquid foam that may occur cannot enter the basin, which only contains water, in particular ultrapure water, and which may only contain water. The gas flows away from the surface of the liquid and through the first channel, preferably towards the process chamber ceiling.A deflection element is preferably arranged or formed at the end of the first basin edge section facing the process chamber wall, for example, the process chamber ceiling. Depending on the configuration, the deflection element forms the end region of the first basin edge section, or it adjoins a free end facing the process chamber wall, for example, the process chamber ceiling. A deflection element is, in particular, an element through which passing liquids and / or gases are distributed, for example, to increase the contact area with the surrounding medium. The deflection element can be designed, for example, as a porous material, as a nozzle, as a membrane vent, as a passage gap, or the like. The invention is not limited to specific embodiments.

[0060] In a preferred embodiment, which illustrates the principle of the outflow element, the latter is designed as a passage gap. The free end of the first basin edge section is spaced from the process chamber wall, preferably from the process chamber ceiling. This means that a passage gap is formed between the free end and the process chamber wall. The basin, the first channel, and in particular the first basin edge section, which forms the second barrier element, is preferably located in a region above the defined fill level, i.e. in a free space between the free surface of the liquid in the process chamber and the process chamber ceiling. The gas flowing through the first channel impacts the process chamber wall, in particular the process chamber ceiling, is reflected from there, and enters through the passage gap and from there into the basin containing the water.The passage gap can be open or provided with an additional element of various types, for example a porous barrier, membrane, nozzle, and the like. In all cases, the gas is to be guided through the liquid and the contact area between gas and liquid is to be increased. To maximize the contact area and contact time, the basin can also be provided with further fittings such as additional barrier elements and vents. For this purpose, the process chamber preferably has at least one further, in particular fourth, barrier element, which protrudes from the process chamber wall, for example the process chamber ceiling, and projects into the basin. At its end facing the basin floor, an vent can be arranged or formed, which is formed, for example, by a passage gap.

[0061] In principle, a single, fourth barrier element is sufficient. However, several such fourth barrier elements, for example two or three, can also be implemented, which protrude into the basin, or rather the water in the basin, at a distance from one another. This further increases the contact area. This fourth barrier element can, for example, protrude perpendicularly from the process chamber wall, or be aligned at an angle to it. If two such fourth barrier elements are used, a further barrier element can be arranged or formed in front of at least one of these barrier elements, which for differentiation purposes is referred to as the sixth barrier element. This sixth barrier element preferably protrudes from the basin floor and extends in height to the basin edge or just below it.The gas, which, as described above, comes from the first channel and bounces off the process chamber wall, for example, the process chamber ceiling, passes through the deflection element, for example, through the passage gap, then flows against the fourth barrier element, and from there is redirected into the tank containing the water. Since the fourth barrier element has an outlet at its end—for example, the fourth barrier element is spaced from the tank floor with its free end, creating a passage gap through which the gas passes—the gas rises behind the fourth barrier element in the tank to the water surface.

[0062] In a preferred embodiment, it is realized that the defined fill level up to which liquid can be filled into the process chamber is below the free end of the fourth barrier element, that is to say below the outflow.

[0063] The gas, for example, oxygen, dissolves spontaneously from the electrolyte liquid in the process chamber and, due to its density, rises to the top of the electrolyte liquid. Gas escaping from the electrolyte liquid is channeled through the first channel, the second barrier element, and the fourth barrier element(s) through the basin within the process chamber, which contains water. The removed gas is then discharged from the process chamber via the second outlet in the process chamber wall, which is preferably formed above the basin in the process chamber ceiling. This removes the gas, for example, oxygen, that has evaporated from the liquid being treated.

[0064] Aerosols contained in the gas, for example aerosols from the electrolyte, are washed out in the water. This means that the aerosols are dissolved in the water. The released aerosol residues, for example electrolyte residues, are now found in the water in the basin. This water is then fed back into the liquid in the process chamber below, for example the electrolyte liquid, which is then treated. The washed-out electrolyte is therefore not lost. This means that aerosols entrained from the electrolyte liquid are redissolved in the water in the gas stream that passes through the water in the upper basin and thus kept within the process chamber. A gas scrubbing of the process exhaust gas, for example oxygen, takes place.In other words: With the present invention, a process exhaust gas evaporating from the electrolyte liquid is simultaneously scrubbed clean of aerosol contaminants and the water held in the upper basin is cleaned of unwanted dissolved gases using the process exhaust gas stream before it leaves the process chamber.

[0065] However, passing the gas through the water in the tank results in another beneficial effect. Thanks to the outlet elements described above and the maximized contact area, the gas removed from the process chamber is used as it passes through the water in the upper tank to remove gases dissolved in this liquid, such as CO2. The general process of removing a gas dissolved in a liquid by bringing the liquid into contact with another gas stream is known to those skilled in the art as gas stripping. The present invention applies the general method to the utilization of a process exhaust gas, such as oxygen, within the electrolyte tank. In this way, the desired gas purification effect is achieved very efficiently and without additional consumers or process steps.The water stored in the basin is therefore considered to be particularly pure before it is fed into the process chamber during the refilling process.

[0066] According to a further preferred embodiment, the basin edge has a second basin edge section, which preferably extends beyond the basin floor downwards beneath the basin. This second basin edge section, which is in particular a second section of the basin edge, forms a third barrier element. The process chamber wall, in particular the process chamber side wall, and the second basin edge section form a second channel, which is preferably oriented towards the process chamber floor. At one end of the second basin edge section, which faces the process chamber wall, for example the process chamber floor, a deflection element as described above can be arranged or formed, so that at this point reference is made in full to the corresponding explanations above.

[0067] In a preferred embodiment, a free end of the second basin edge section is spaced from the process chamber wall, in particular from the process chamber floor. A passage gap is formed between the process chamber wall and the free end. The second channel is preferably located in a region of the process chamber wall that is opposite the region of the process chamber wall that forms the first channel described above. The first channel and the second channel are thus located opposite one another, or on opposite regions or sides of the process chamber wall. If the first channel is located, for example, on a process chamber side wall, the second channel is preferably located on the opposite process chamber side wall. This second channel is intended in particular to allow water from the basin to be refilled into the liquid in the process chamber without interrupting the gas flow.In addition, this prevents the gas stream escaping from the liquid, for example the gas stream contaminated with electrolyte, from escaping from the process chamber via the second channel.

[0068] This second basin edge section is preferably arranged or designed such that it begins in the process chamber in the free space between the process chamber ceiling and the free surface of the liquid in the process chamber. The second channel extends into the liquid, preferably close to the process chamber floor and in particular to the level of the first outlet or below. The second basin edge section, which functions as the third barrier element, is spaced from the process chamber wall, for example from the process chamber side wall. The second basin edge section can either run parallel to the process chamber wall or be aligned at an angle to it. The second basin edge section and the process chamber wall delimit the second channel.Water and electrolyte residues removed from the water overflow the container's edge and flow back into the liquid in the process chamber through the second channel. The water and electrolyte aerosols flow back into the liquid via the passage gap and are then discharged from the process chamber via the first outlet.

[0069] As the gas escaping from the electrolyte liquid is passed through the water in the tank, aerosols from the electrolyte in the liquid are also separated from the escaping gas. At the same time, unwanted gases dissolved in the water in the upper tank, such as CO2, are removed from the liquid by passing the escaping gas through the tank and discharged from the process chamber with the process exhaust gas via the second outlet.

[0070] In a preferred embodiment, the second barrier element and / or the third barrier element and / or the first barrier element and / or the at least one fourth barrier element and / or the basin edge and / or the basin floor, which in one embodiment functions as a seventh barrier element, extend from one region of the process chamber wall to another region of the process chamber wall, for example from one side of the process chamber wall to another, in particular opposite, side of the process chamber wall, preferably from one region of the process chamber side wall to an opposite region of the process chamber side wall. This means that these components extend continuously across the entire extent of the process chamber.

[0071] In a further preferred embodiment, the basin floor has an inclined profile. The basin floor can thus also represent a seventh barrier element, by means of which the gas outgassing from the liquid is guided in the direction of the first channel. The incline preferably runs from the first basin edge section, which forms the second barrier element, to the second basin edge section, which forms the third barrier element. This also supports the entry of water and optionally also aerosol residues of the electrolyte dissolved therein into the second channel. In another embodiment, the basin floor can also run straight, for example in an orientation parallel to the process chamber floor. According to the alternative described above, the process chamber has at least one seventh barrier element, which is formed by the basin floor of the basin.

[0072] According to another alternative, the seventh barrier element is designed as a separate component from the tank floor. In this case, the seventh barrier element extends in the same direction of extension as the tank floor, spaced from the tank floor below the tank floor, but above the defined fill level in the process chamber, for example, parallel to the tank floor or at an angle oblique to the tank floor. In this alternative, the tank floor and the seventh barrier element define a guide channel. Gas escaping from the liquid to be treated, for example, the electrolyte liquid to be treated, such as oxygen, can be guided toward the tank via the guide channel.

[0073] In a further embodiment, a further barrier element can be arranged or formed in the process chamber, which is referred to as an eighth barrier element for differentiation purposes. The process chamber preferably has at least one eighth barrier element, which is arranged at least partially above the defined fill level in the process chamber and which extends from the basin bottom towards the process chamber bottom. For example, the eighth barrier element can extend in a straight, vertical direction, or else in an inclined direction. The eighth barrier element extends, for example, vertically or at an angle, between the process chamber bottom and the basin bottom. When the liquid to be treated enters the process chamber, unwanted foam may form. This foam is retained and / or dissolved by the eighth barrier element.In such a case, the eighth barrier element, for example, borders either directly on the tank floor or on the seventh barrier element. The seventh and eighth barrier elements thus delimit a collection chamber in which the resulting foam gets caught and remains. In addition, the eighth barrier element can be used to calm the liquid in the process chamber. The liquid usually enters the process chamber dynamically via the first inlet. The seventh barrier element can calm the liquid so that the gas to be released escapes from the calmed area of ​​the liquid and enters the first channel described above. In such a case, for example, it is provided that the seventh and eighth barrier elements do not border one another directly, but that there is a small gap between the two barrier elements.

[0074] The process chamber may have a service connection, preferably below the defined fill level, in order to refill and / or remove liquid from the process chamber.

[0075] According to a further preferred embodiment, the device for removing a gas from the liquid to be treated has a discharge line connected to the second outlet. The gas, which is, for example, oxygen, can be discharged from the process chamber via this discharge line and fed to other areas and thus to sub-processes. For example, a demister can be arranged in the discharge line. A demister, also called a droplet separator or aerosol separator, is a device for separating liquid droplets from flowing gaseous media such as air or process gases. The demister can serve, for example, to separate electrolyte aerosols, for example KOH aerosols, discharged via the second outlet together with the removed gas, for example oxygen. The discharge line can be blocked, for example, via a valve device.This allows the removal of gas from the process chamber or the treatment device to be prevented if necessary. This is advantageous in connection with some preferred embodiments, which are described in more detail below.

[0076] Preferably, the device for supplying water can have a supply line connected to the second inlet. In this way, the water, which is preferably ultrapure or high-purity water, can be brought in from another area. For example, it can be provided that the water is first treated in an upstream process, for example using activated carbon and / or reverse osmosis. From the location of this process, the water can then be conducted via the supply line to the second inlet and from there introduced into the basin within the process chamber. It is therefore advantageous if the second inlet is located above the basin, preferably in the process chamber ceiling.

[0077] At least one pump and / or at least one valve device is / are preferably arranged in the supply line. The pump is particularly advantageous when the water has to be pumped into the process chamber, for example when the water pressure in the supply line is not high enough. This can be the case, for example, if a water tank arranged next to the process chamber, which is described in detail below, is used and the adjacent tank is located next to the process chamber, i.e. at the same height as, or below, the process chamber. The valve device is, for example, a check valve. In principle, it is advantageous if the number of components used is as small as possible, for example to save costs. Therefore, in a preferred embodiment, at least regions of the supply line and at least regions of the discharge line are designed as one and the same line.This means that these special pipe sections must be capable of being passed through, or at least be passed through, by both the gas to be removed and the water to be supplied. This can be achieved, for example, by using a multi-way valve. Such a configuration is explained in detail below in the description of the figures, so reference is made here to these explanations in full.

[0078] In a preferred embodiment, a container is arranged in the supply line adjacent to the process chamber and is provided for holding water, in particular up to a defined fill level. In its intended use, this adjacent container contains water, in particular ultrapure water, which is filled into the basin within the process chamber as needed, for example to compensate for and replace any water loss in the liquid to be treated in the process chamber, for example the electrolyte liquid. The adjacent container also serves in particular as a type of intermediate storage or interim storage facility for water, in which the water remains for a certain period of time, for example to serve as a reserve and / or to be purified and / or treated.For example, it is possible to expel CO2 from the water using the gas removed from the liquid, such as oxygen, when this gas is passed into or through the adjacent container, before the water later enters the liquid, for example the electrolyte liquid. CO2 reacts with the electrolyte, for example with KOH, which reduces its performance. The removed gas, such as oxygen, mixes with the CO2, and both gases are removed from the adjacent container. The water in the adjacent container is therefore particularly pure. In addition to the gas stripping that takes place in the process chamber, further gas stripping takes place in the adjacent container. The processes in the adjacent container thus represent an expanded, even more intensive version of the gas stripping already provided in the process chamber, as described above.Should it occur that residues of aerosols, for example of the electrolyte liquid, still leave the process chamber, any aerosol still present in the gas stream can be washed out of the gas stream again in the adjacent container, as described above for the gas scrubbing in the upper basin of the process chamber.

[0079] The secondary container, like the process chamber, can have different configurations. For example, the secondary container can be cylindrical, cube-shaped, cuboid-shaped, or the like. The invention is not limited to specific configurations. The secondary container preferably consists of a container wall that defines a receiving space for the water. The container wall preferably consists of a container bottom, a container top, and a container side wall extending between the container bottom and the container top.

[0080] The secondary tank can, for example, be located next to the process chamber, i.e., at the same height as it, or below the process chamber. In this case, a pump as described above is advantageous for transporting the water from the secondary tank into the process chamber. In another embodiment, the secondary tank is arranged or positioned above the defined fill level within the process chamber, preferably above the process chamber. In this case, the geodetic height is used to transport the water from the secondary tank into the process chamber, and in particular into the basin within the process chamber.

[0081] According to one embodiment, the secondary container is connected to the discharge line of the device for removing a gas from the liquid to be treated. In this case, the discharge line can end in the secondary container. In another embodiment, the secondary container is arranged in the discharge line of the device for removing a gas from the liquid to be treated. This means that the removed gas is passed through the secondary container. The gas to be removed enters the secondary container via a container inlet and exits the secondary container at another location via a container outlet.

[0082] According to one embodiment, the secondary container has a container inlet that is connected to the discharge line of the device for removing a gas from the liquid to be treated. The container inlet is formed below a defined fill level of the water in the secondary container. This means that the container inlet is located below the upper free surface of the water in the secondary container. Preferably, the container inlet is located in the container bottom or in the lower region of the container side wall facing the container bottom. The gas that flows into the secondary container via the container inlet flows through the water and, due to its density, rises to the surface, and from there in particular into a free space between the water surface and the container wall, for example the container ceiling.Furthermore, the secondary container has a container outlet, to which a further component of the discharge line of the device for removing a gas from the liquid to be prepared is connected, wherein the container outlet is formed above the defined fill level.

[0083] The further component of the discharge line preferably contains a valve device, for example in the form of a shut-off valve. If the valve device is closed, the gas cannot escape from the adjacent container. The building pressure of the gas, particularly in the free space, can be used, for example, to force water contained in the adjacent container out of the adjacent container via a corresponding container outlet and into the process chamber. The building pressure forces the water through the supply line to the process chamber.

[0084] The water is located in the adjacent container preferably up to a defined fill level, similar to the process chamber. To determine the fill level of the water in the adjacent container, the adjacent container can, for example, have at least one sensor element for determining the fill level, which can be designed in the same way as in the process chamber. There is preferably a free space between the upper free surface of the water in the adjacent container and the container ceiling. In addition to the container inlet for the gas, the adjacent container can also have a container inlet for water, via which water is filled into the adjacent container, for example to be temporarily stored and / or processed there.This tank inlet can be located, for example, above or below the upper free surface of the water or the defined fill level, for example in the tank ceiling or in the tank side wall near the tank ceiling, or in the tank bottom or in the tank side wall near the tank bottom.

[0085] According to another embodiment, the secondary container has a container inlet that is connected to the discharge line of the device for removing a gas from the liquid to be treated. In this exemplary embodiment, the container inlet is formed above the defined fill level. In addition, the secondary container has a container outlet, to which another component of the discharge line of the device for removing a gas from the liquid to be treated is connected. This container outlet is also formed above the defined fill level. In this exemplary embodiment, a fifth barrier element is arranged or formed in the secondary container, which is aligned into the container, which separates the container inlet and the container outlet, and which extends below the defined fill level.The fifth barrier element is required to ensure that the gas entering the adjacent container always finds its way through the water. For this reason, the fifth barrier element preferably projects from the container wall into the container interior between the container inlet for the gas and the container outlet for the gas, for example from the container ceiling towards the container bottom. The fifth barrier element can run parallel to the container wall, for example the container side wall, or can be aligned at a different angle to it. The fifth barrier element has a free end that is spaced apart from the container wall, for example the container bottom. In this way, a passage gap is created between the free end and the container wall, for example the container bottom.The container wall, for example, the container side wall, and the fifth barrier element form a channel extending from the container inlet for the gas, i.e., from the free space, into the water in the adjacent container. The gas entering through the container inlet flows through the channel, is forced into and through the water, reaches the passage gap, and, due to its density, then rises to the surface of the water and from there into the free space. From there, the gas is discharged from the adjacent container via the container outlet for the gas. Alternatively, the channel can be replaced by a pipe that is open at the bottom and through which the gas flows.

[0086] When treating an electrolyte fluid with the treatment device according to the invention, so little electrolyte is lost that this can be taken into account in the regular maintenance periods in which the electrolyte is completely replaced anyway.

[0087] According to the second aspect of the invention, a device for electrolysis, in particular for water electrolysis, comprising an electrolysis device is provided, which has the features of independent patent claim 12. The electrolysis device is preferably an electrolysis cell. According to the invention, the electrolysis device has a treatment device for electrolysis liquid according to the first aspect of the invention, so that with regard to the design of the electrolysis device, in particular also with regard to its mode of operation, reference is made here in full to the statements on the first aspect of the invention and to the general description of the invention, in order to avoid repetition.The first inlet in the process chamber wall of the treatment device, which is provided for supplying the electrolyte liquid to be treated into the process chamber, is at least temporarily connected to an outlet for electrolyte liquid from the electrolysis device. The first outlet in the process chamber wall of the treatment device, which is provided for discharging the treated electrolyte liquid from the process chamber, is at least temporarily connected to an inlet for electrolyte liquid into the electrolysis device. In this way, continuous treatment of the electrolyte liquid can be realized. For example, the electrolysis device and treatment device can be designed as a closed system.It is also conceivable for a valve device, for example in the form of a shut-off valve, to be arranged in the connections between the respective inlets and the corresponding outlets. This allows the connection between the electrolysis device and the treatment device to be established as needed, for example, at specified intervals, at specified times, or when a need to treat the electrolyte fluid is detected. When the valves are closed, the connection between the electrolysis device and the treatment device is interrupted.

[0088] According to the third aspect of the invention, an energy system, in particular a building energy system, is provided which has the features of independent claim 13.

[0089] The energy system comprises a first energy source device in the form of an electrolysis device, a first energy sink device in the form of a fuel cell device, a second energy source device in the form of a high-pressure storage device, and a connecting line device via which the first energy source device is connected to the second energy source device and the second energy source device is connected to the first energy sink device. According to the invention, the first energy source device is designed in the form of an electrolysis device according to the second aspect of the invention. Or the energy system comprises a device for processing an electrolyte fluid according to the first aspect of the invention, which device is at least temporarily connected to an electrolysis device of the electrolysis device.

[0090] With regard to the design of the energy system, in particular with regard to its mode of operation, reference is made here in full to the statements on the first aspect of the invention, the second aspect of the invention and the general description of the invention in order to avoid repetition.

[0091] The energy system is, in particular, a whole consisting of several components, wherein the components are connected to one another to form a dedicated unit. In the present case, the energy system is a system for generating or providing energy, preferably electrical energy. In principle, the invention is not limited to specific types of energy systems. Various preferred embodiments are described below.

[0092] In a preferred embodiment, the energy system is a home energy system. Home energy systems are generally known from the prior art and serve to supply houses, for example, low-energy houses, passive houses, or zero-energy houses, with energy in the form of heat and, in particular, in the form of electricity, for example, electricity from renewable energy sources such as photovoltaic (PV) generators or small wind turbines. Such a home energy system creates the basis for the energy requirements of a house, in particular a low-energy house, a passive house, or a zero-energy house, to be fully covered from renewable energy sources, both in terms of electricity and heat requirements, thus ensuring complete CO2-free operation.At least, however, the electricity needs of a house can be covered almost entirely from renewable energy sources, in particular by means of a PV generator and / or a small wind turbine, in order to achieve an increase in self-consumption.

[0093] Such a home energy system is disclosed and described, for example, in the applicant's patent applications WO 2017 / 089468 A1 and WO 2017 / 089469 A1, the disclosure content of which is incorporated into the description of the present patent application.

[0094] According to a preferred embodiment, a domestic energy system of the type mentioned has the following basic features: a DC feed-in point, preferably designed for a nominal voltage of 48 volts, and / or an AC feed-in point, preferably designed for a voltage of 230 volts or 110 volts, wherein the DC feed-in point and / or the AC feed-in point is at least temporarily connected during operation to an electrical consumer having a consumption power; a PV generator, electrically connected at least temporarily to the DC feed-in point, for generating electrical PV power; a fuel cell unit, electrically connected at least temporarily to the DC feed-in point or to the AC feed-in point, for generating electrical fuel cell power; an electrolysis unit, electrically connected to the DC feed-in point, for generating hydrogen to be consumed by the fuel cell unit;wherein the electrolysis unit is supplied with an electrical electrolysis input power during operation, a hydrogen tank, in particular as a long-term energy storage device, which is at least temporarily fluidly connected to the fuel cell unit and the electrolysis unit and is designed to store hydrogen to be generated by the electrolysis unit and consumed by the fuel cell unit, a storage battery unit, in particular as a short-term energy storage device, which is electrically connected or to be connected to the DC feed-in point, so that an electrical PV power and an electrical fuel cell power can be stored in the storage battery unit and an electrical electrolysis input power and a consumption power can be drawn from the storage battery unit; and a control module for controlling the domestic energy system.

[0095] According to the fourth aspect of the invention, a method for treating an electrolyte fluid is provided, in particular using a treatment device according to the first aspect of the invention, which has the features of independent patent claim 14. With regard to the design of the method, which preferably takes place in an energy system, in particular also with regard to its mode of operation, in order to avoid repetition, reference is made here in full to the statements on the first aspect of the invention, the second aspect of the invention, the third aspect of the invention and the general description of the invention.

[0096] According to the invention, the method is characterized by the following steps: a) Electrolyte liquid to be treated is fed into the process chamber of the treatment device via a first inlet in the process chamber wall of the process chamber; b) Gas escaping from the electrolyte liquid is passed through barrier elements within the process chamber through a basin within the process chamber, in which a second liquid in the form of water is located; c) The removed gas is discharged from the process chamber via a second outlet in the process chamber wall; d) The treated electrolyte liquid is discharged from the process chamber via a first outlet in the process chamber wall and in particular fed to an electrolysis device, preferably an electrolysis device of an electrolysis device according to the second aspect of the invention.Preferably, the method according to the invention separates the gas to be removed from the electrolyte liquid in the process chamber. The method is thus designed to carry out the first deposition stage described above.

[0097] Alternatively or additionally, the process can also be used to release gas from liquid bubbles in the electrolyte. The process is thus designed to carry out the second deposition stage described above.

[0098] Preferably, as described above in connection with the device, aerosols of the electrolyte are washed out when the gas is passed through the water in the tank, and / or unwanted gases dissolved in the water are gas-stripped. The method is thus alternatively or additionally designed to carry out the third deposition stage described above.

[0099] In a preferred embodiment of the method, when the gas escaped from the electrolyte liquid is passed through the water in the basin, aerosols of the electrolyte in the electrolyte liquid, for example KOH, are separated from the escaped gas, and the aerosols of the electrolyte are dissolved in the water in the basin and the dissolved aerosol residues are returned to the liquid in the process chamber.

[0100] Preferably, after leaving the process chamber via the second outlet, the removed gas is passed through a discharge line through a water container adjacent to the process chamber. Preferably, as the removed gas is passed through the adjacent container, unwanted gases, such as CO2, are removed from the water in the adjacent container. This occurs in addition to the gas stripping already taking place in the process chamber, as described above. The water in the adjacent container can, for example, be introduced into the process chamber, in particular into the basin within the process chamber, via the second inlet in the process chamber wall.

[0101] The invention will now be explained in more detail using various exemplary embodiments with reference to the accompanying drawings. Figure 1 shows a schematic view of an energy system according to the invention in which the processing device according to the invention is implemented;

[0102] Figure 2 shows a first embodiment of a processing device according to the invention;

[0103] Figure 3 shows a second embodiment of a processing device according to the invention;

[0104] Figure 4 shows a third embodiment of a processing device according to the invention;

[0105] Figure 5 shows a fourth embodiment of a processing device according to the invention;

[0106] Figure 6 shows a fifth embodiment of a processing device according to the invention;

[0107] Figure 7 shows a sixth embodiment of a processing device according to the invention; and

[0108] Figure 8 shows a seventh embodiment of a processing device according to the invention.

[0109] A device for treating a liquid, in particular an electrolyte liquid according to the present invention can be used in different ways and in a wide variety of systems.

[0110] One possible system is, for example, an energy system. The invention will be explained below using such an energy system as an example. Figure 1 first describes the basic structure of the energy system 10, which is used as a home energy system.

[0111] The energy system 10 initially has a first subsystem 20, which is designed as an indoor system. This means that the first subsystem 20 is located inside the house. In addition, the energy system 10 has a second subsystem 30 in the form of an outdoor system. This means that the second subsystem 30 is located outside the house.

[0112] The first subsystem 20 comprises an electrolysis device 21 for producing hydrogen. The electrolysis device comprises an electrolysis apparatus 21a, which is, for example, an electrolysis cell for alkaline electrolysis. The electrolysis apparatus 21a is connected to a device 50 according to the invention for preparing an electrolyte fluid, which is described in detail below in various embodiments with reference to Figures 2 to 6. Furthermore, the first subsystem 20 comprises a fuel cell device 22.

[0113] The second subsystem 30 has a high-pressure storage device 31. The generated hydrogen is stored in the high-pressure storage device at up to 700 bar. Additionally, the second subsystem 30 has a medium-pressure storage device 32, in which the generated hydrogen is temporarily stored at pressures between 20 and 30 bar before being finally stored in the high-pressure storage device.

[0114] The individual components of the energy system 10 are connected to one another via a connecting line device 40, which consists of a number of different line sections 40a to 40k. At least one line section 40a is designed as a so-called bidirectional line section. This means that flow flows through the line section 40a in both directions during operation of the energy system 10.

[0115] For flushing the electrolysis device 21a and / or the fuel cell device 22, a flushing device 23 with a flushing chamber is provided, which is connected to the two aforementioned components via a line section 40g.

[0116] The hydrogen produced by electrolysis in the electrolysis device 21a leaves the first electrolysis device 21a via a line section 40f, which merges into the line section 40e. In the two line sections 40f and 40e, in the flow direction of the produced hydrogen, there is a check valve device 24, followed by a filter device 25 and a dryer device 26, in which the produced hydrogen is filtered and dried. Alternatively, the filter device 25 and the dryer device 26 can also be located in the second subsystem 30.

[0117] From the dryer device 26, the generated hydrogen flows via line sections 40a and 40c to a further check valve device 35, which marks one end of line section 40c. From there, the generated hydrogen flows via a line section 40h and 40i into the medium-pressure accumulator 32, which is connected to a further line section 40j via a valve device 33, which is designed in particular as a shut-off valve, for example in the form of a solenoid valve. In the line section 40j, which ends in the high-pressure accumulator device 31, a compressor device 34, in particular in the form of a piston compressor, is located upstream of the high-pressure accumulator device 31. The generated hydrogen is stored in the high-pressure accumulator device 31 via the compressor device 34.The hydrogen temporarily stored in the medium-pressure storage device 32 is stored in the high-pressure storage device 31 by actuating the compressor device 34.

[0118] This hydrogen production process up to its storage in the high-pressure storage device 31 represents a first operating mode of the energy system 10. In this first operating mode of the energy system 10, a pressure of 20 to 60 bar prevails in the line sections 40a to 40e of the connecting line device 40. A similar pressure also prevails in the medium-pressure storage device 32. The compressor device 34 compresses the hydrogen extracted from the medium-pressure storage device 32, which is an intermediate storage device, to such an extent that it can be stored in the high-pressure storage device 31 at pressures of up to 700 bar.

[0119] The hydrogen stored in the high-pressure storage device 31 is used to operate the fuel cell device 22. The fuel cell device 22 operates in the second operating mode of the energy system 10. However, the fuel cell device 22 can only operate at pressures below 20 bar. In the second operating mode of the energy system 10, the hydrogen is withdrawn from the high-pressure storage device 31 via a line section 40k, expanded to the required pressure via an expansion device 36 in the form of a pressure reducer, and transported via a line section 40d into the bidirectional line section 40a, from where it enters the fuel cell device 22 via the line section 40b. At least one pressure measuring device 41, for example in the form of a pressure sensor, is provided to measure the pressure.

[0120] The energy system 10 shown in Figure 1 represents a sub-area of ​​an overall home energy system, which is an electrically self-sufficient and completely renewable energy-based multi-hybrid home energy storage system.

[0121] The multi-hybrid home energy storage system makes it possible to distribute the electrical energy generated by a photovoltaic (PV) system, a small wind turbine, or similar system as needed throughout the year. The system operates as an off-grid system, independent of the electrical grid. Rather, the system is designed to ensure the home's electrical self-sufficiency, eliminating the need to draw electrical energy from the grid throughout the year.

[0122] The primary task of a home energy system is to make the electrical energy generated from photovoltaic (PV) modules or similar devices available to the consumer in the home. Secondarily, surplus electrical energy can be temporarily stored in a short-term battery storage system during periods of low load or high irradiation. Tertiary, the electrical energy can be stored as gaseous hydrogen in a long-term hydrogen storage system for the medium to long term during periods of low irradiation, such as night, winter, or similar, and then made available again as needed using a fuel cell.

[0123] In addition to energy-related tasks, the system also functions as controlled living space ventilation through a built-in ventilation unit.

[0124] The hydrogen produced in the electrolysis plant flows via the hydrogen pipeline into the external pressure storage system.

[0125] If PV energy is missing or insufficient, energy is drawn from the battery to cover the consumer load. If the energy stored in the short-term storage system is insufficient, the fuel cell system can cover the additional electrical energy demand. In fuel cell operation, hydrogen flows from the pressure storage system to the fuel cell system via the hydrogen line.

[0126] Simultaneous operation of the fuel cell system and the electrolysis system is impossible. The entire system is operated centrally via an energy manager with predictive energy management.

[0127] The second subsystem is principally intended for outdoor operation, but under certain conditions can also be installed and operated within a specific area of ​​the house. At predetermined intervals, such as maintenance intervals, the electrolyte fluid in the electrolysis device 21a is replaced. Between these intervals, it is necessary, or at least highly advantageous, for the electrolyte fluid to be treated intermittently, since optimal electrolysis requires the purest possible electrolyte fluid. The electrolyte fluid is treated in a treatment device 50 according to the invention, the structure and function of which are explained in detail below using various exemplary embodiments and with reference to Figures 2 to 6.

[0128] In the embodiment shown in Figure 2, the processing device 50 is at least temporarily connected to the electrolysis device 21a. The processing device 50 has a process chamber 55, which is delimited by a process chamber wall 56. The process chamber wall 56 is formed by a process chamber floor 57, a process chamber ceiling 58, and a process chamber side wall 59. Via a first inlet 51 in the process chamber side wall 59, which is connected to the electrolysis device 21a via a supply line 52, electrolyte liquid 60 to be processed is fed into the process chamber 55 and stored therein. Via a first outlet 53 in the process chamber side wall 59, electrolyte liquid 60 processed in the process chamber is discharged back into the electrolysis device 21a.The process chamber 55 may be filled up to a defined fill level 61a, so that the process chamber 55 always contains electrolyte liquid 60 with a fill level 61 that is at or below the defined fill level 61a. The fill level 61 corresponds to the free upper surface of the electrolyte liquid 60 in the process chamber 55. The fill level 61 is determined using a sensor element 62 for determining the fill level, which can be, for example, a float sensor element, an optical sensor element, or the like. A first barrier element 63, which is a guide contour and protrudes from the process chamber side wall 59 into the process chamber, is located between the first inlet 51 and the first outlet 53. This prevents the electrolyte liquid 60 introduced via the first inlet 51 from immediately leaving the process chamber 55 via the first outlet 53.

[0129] A basin 64 is arranged or formed in a free space 112, which is located between the free upper surface of the electrolyte liquid 60, which is represented by the fill level 61, in any case between the defined fill level 61a, and the process chamber wall 56, in particular the process chamber ceiling 58. The basin 64 consists of a basin bottom 65 and a basin rim 66, the free end of which represents an upper edge 66a of the basin rim. The basin 64 serves to hold water 67, in particular ultrapure water. This means that, during intended use, water 67 is located in the basin 64. The basin 64 may be filled up to a defined fill level 67b, which is predetermined by the upper edge 66a of the basin rim 66. Thus, the basin 64 contains water 67 with a filling level 67a that is at or below the defined filling level 67b.The fill level 67a corresponds to the free upper surface of the water 67 in the basin 64. The fill level 67a can optionally be determined with the aid of a sensor element 67c for determining the fill level, which can be, for example, a float sensor element, an optical sensor element or the like.

[0130] A first basin edge section 68 has a greater height than the remaining basin edge 66. This first basin edge section 68 represents a second barrier element 69, which, together with a region of the process chamber side wall 59, forms a first channel 70. The first channel 70 is oriented toward the process chamber ceiling 58. This first channel 70 is located in that portion of the process chamber side wall 59 in which the first inlet 51 and the first outlet 53 are also formed, specifically above them. A free end 71 of the first basin edge section 68 is spaced apart from the process chamber ceiling 58, such that a passage gap 72 is formed by the free end 71 and the process chamber ceiling 58. The passage gap 72 represents a deflection element, which is explained in the context of the general description.

[0131] A second basin edge section 73 extends beyond the basin floor 65 downwards beneath the basin 64. This second basin edge section 73 forms a third barrier element 73. The process chamber side wall 59 and the second basin edge section 73 form a second channel 75, which is oriented toward the process chamber floor 57. A free end 76 of the second basin edge section 73 is spaced from the process chamber floor 57. A passage gap 77, which also represents a deflection element, is formed between the process chamber floor 57 and the free end 76. The second channel 75 is located in a region of the process chamber wall 56 that lies opposite the region of the process chamber wall 56 that forms the first channel 70. The first channel 70 and the second channel 75 are thus opposite one another.The second channel 75 is arranged or configured such that it begins in the process chamber 55 in the free space 112 between the process chamber ceiling 58 and the free surface of the electrolyte fluid located in the process chamber 55. The second channel extends into the electrolyte fluid 60, preferably close to the process chamber floor 57.

[0132] In addition, the process chamber 55 has a further, fourth barrier element 78, which protrudes from the process chamber ceiling 58 and into the basin 64, with a free end 79 of the fourth barrier element 78 being spaced from the basin floor 65. A passage gap 80 is formed there. This is an vent.

[0133] Gas 111 released in the process chamber 55, which is removed from the electrolyte liquid 60, is removed from the process chamber 55 via a gas removal device 81. For this purpose, the device 81 has a second outlet 82 formed in the process chamber ceiling 58. The second outlet 82 is connected to a discharge line 83, which may contain, for example, a demister 84. The discharge line 83 may consist of several line sections, with a first section 83a being arranged upstream of the demister 84 and a second section 83b being arranged downstream of the demister.

[0134] Also provided in the process chamber ceiling 58, above the basin 64, is a device 85 for supplying water. This device has a second inlet 86 and a connected supply line 87. The water is supplied to the process chamber 55, and in particular to the basin 64, via the device 85.

[0135] The basic function of this treatment device 50 is described below by way of example. Electrolyte liquid 60 to be treated is fed into the process chamber 55 via the first inlet 51. The electrolyte liquid 60 consists, for example, of water to which a certain percentage of an electrolyte, for example, KOH, is added. The electrolyte is full of oxygen, so the oxygen must be removed from the electrolyte. The oxygen is thus a gas 111, which represents an undesirable gas in the electrolyte liquid 60 at this point. The electrolyte liquid 60 is filled into the process chamber 55 up to a defined fill level 61a. The gas 111, for example, oxygen, dissolves spontaneously from the electrolyte liquid 60 in the process chamber 55 and, due to its density, rises upwards in the electrolyte liquid 60.Gas 111 escaping from the electrolyte liquid 60 is guided through the first channel 70 via the barrier elements 63, 69, 74 and the basin floor 65 within the process chamber 55, collides with the process chamber ceiling 58, passes through the passage gap 72, encounters the fourth barrier element 78, and is guided by it into the basin 64, which contains water 67. The gas 111 passes through the passage gap 80, reaches the surface of the water 67, and is discharged from the process chamber 55 via the second outlet 82. This results in the gas 111, for example oxygen, being released from the electrolyte liquid 60.

[0136] In addition, when the gas 111 that has escaped from the electrolyte liquid 60 is passed through the water 67 in the basin 64, aerosols of the electrolyte are separated from the escaped gas 111. These aerosols are dissolved in the water 67 and then returned to the electrolyte liquid 60 in the process chamber 55 via the water 67. At the same time, unwanted gases dissolved in the water 67 of the upper basin 64, such as CO2, are removed from the water 67 by passing the escaped gas 111 through the water 67 and are discharged from the process chamber 55 with the process exhaust gas via the second outlet 82.

[0137] To compensate for or replenish used water in the electrolyte liquid 60, the device 85 is used to supply water, in particular the water 67 located in the basin 64. Water and aerosols of the electrolyte located in the water overflow over the container edge 66, in particular over the container edge 66a, and flow through the second channel 75 back into the electrolyte liquid 60 located in the process chamber 55. The water and the aerosols of the electrolyte pass back into the electrolyte liquid 60 via the passage gap 77 and are then discharged from the process chamber 55 via the first outlet 53.

[0138] Figure 3 shows a second embodiment of the processing device 50 according to the invention. The process chamber 55 corresponds in terms of its structure and mode of operation to the example shown in Figure 2, so that its structure will not be repeated again here and reference is made in full to the corresponding explanations for Figure 2. The processing device 50 now additionally has a secondary container 90. This is arranged in the supply line 87 for the water in the process chamber 55. The secondary container 90 consists of a container wall formed from a container base 91, a container ceiling 92 and a container side wall 93. Water 94 is filled into the secondary container 90, up to a maximum defined fill level 95a.The actual water level 85 is determined by a sensor element 96 for determining the water level. A free space 97 is located between the free upper surface of the water 94, which corresponds to the water level 95, and the container ceiling 92.

[0139] The water supply line 87 has two line sections. A first section 87a of the supply line 87 leads from the outside to the adjacent container 90 and terminates in a container inlet 100 in the container ceiling 92. A second section 87b of the supply line 87 connects a container outlet 101 for the water, which is formed in the container side wall 93 in the region of the container bottom 91, with the second inlet 86 for the water in the process chamber 55. A pump 88 and a valve device 89 are located in the second line section 87b. The valve device 89 can be used to block the supply line 87 if necessary. The pump 88 serves to assist in the transport of water from the secondary container 90 to the process chamber 55, for example, as shown in Figure 3, when the secondary container 90 is at the same height as the process chamber 55.

[0140] In addition, the second outlet 82 of the process chamber 55, through which the removed gas 111 is discharged from the process chamber 55, is connected via a first section 83a of the discharge line 83 to a container inlet 89 for gas in the adjacent container 90. This container inlet 98 is located below the defined liquid level 95a and below the fill level 95 of the water 94 in the adjacent container 90, so that the gas 111, here oxygen, enters the bottom of the adjacent container 90 and rises through the water 94 up to the free space 97. A further container outlet 99 for gas is formed in the container ceiling 92, to which a further section 83b of the discharge line 83 is connected, and via which the gas located in the free space 97, here oxygen, is discharged from the adjacent container 90. The function of the previously described embodiment according to Figure 3 is explained below.In its intended use, the adjacent container 90 contains water 94, in particular ultrapure water, which is filled into the basin 64 within the process chamber 55 as needed, for example to compensate for and replace any water loss in the electrolyte liquid located in the process chamber 55. The adjacent container 90 also serves, in particular, as a type of intermediate storage or buffer for water 94, in which the water remains for a certain period of time, for example to serve as a reserve and / or to be purified and / or processed. For example, it is possible to expel CO2 from the water 94 via the gas 111, such as oxygen, removed from the electrolyte liquid 60 when this gas is passed into or through the adjacent container 90, before the water 94 later enters the electrolyte liquid 60. CO2 reacts with the electrolyte, for example with KOH, which reduces its performance.The removed gas 111, here oxygen, mixes with the CO2, and both gases are discharged from the adjacent container 90 via the container outlet 99 for gas. The water 94 in the adjacent container 90 is thus particularly pure. The embodiment according to Figure 3 thus represents an extended gas stripping function of the gas stripping principle already described in connection with Figure 2, which takes place in the upper basin 64 of the process chamber 55, and enables particularly thorough cleaning of the water 94 held in the adjacent container 90. Should there still be residues of electrolyte in the form of aerosols in the gas stream leaving the process chamber 55, these could also be washed out of the gas stream in the adjacent container 90 and dissolved in the water of the adjacent container 90.

[0141] Figure 4 shows a third exemplary embodiment of the processing device 50 according to the invention. The process chamber 55 corresponds in terms of its structure and function to the example shown in Figure 2, so that its structure will not be repeated here again and reference is made in full to the corresponding explanations for Figure 2. Likewise, the basic structure and basic function of the secondary container 90 correspond to the secondary container from Figure 3, so that in this regard, reference is also made in full to the above explanations regarding the secondary container 90 according to Figure 3. In contrast to the exemplary embodiment shown in Figure 3, the individual components in the secondary container 90 according to Figure 4 are arranged somewhat differently. In addition, the secondary container 90 is now arranged above the process chamber 55.In this case, the geodetic height is used to transport the water 94 from the adjacent container 90 into the process chamber 55 and, in particular, into the basin within the process chamber 55. A pump can be dispensed with in this case.

[0142] According to the embodiment shown in Figure 4, the secondary container 90 has a container inlet 98 for gas, which is connected to the discharge line 83, 83a of the second outlet 82 for removing a gas 111 from the electrolyte liquid 60 to be treated. In this embodiment, the container inlet 98 is formed above the defined fill level 95a and ends in the free space 97. In addition, the secondary container 90 has a container outlet 99 for gas, to which a further component 83b of the discharge line 83 of the device for removing a gas from the electrolyte liquid 60 to be treated is connected. This container outlet 99 is also formed above the defined fill level 95a.In this embodiment, a fifth barrier element 102 is arranged or formed in the adjacent container 90. This fifth barrier element 102 is directed into the container 90, separates the container inlet 98 and the container outlet 99, and extends below the defined fill level 95a. The fifth barrier element 102 is required to ensure that the gas 111 entering the adjacent container 90 always makes its way through the water 94. For this reason, the fifth barrier element 102 protrudes between the container inlet 98 for the gas and the container outlet 99 for the gas from the container ceiling toward the container floor into the container interior. The fifth barrier element 102 has a free end 103 that is spaced apart from the container floor. This creates a passage gap 104 between the free end 103 and the container floor.The container wall, for example the container side wall, and the fifth barrier element 102 thus form a channel 110 that extends from the container inlet 98 for the gas 111, i.e., from the free space 97, into the water 94 located in the adjacent container 90. The gas 111 entering via the container inlet 98 flows through the channel 110, is forced into and through the water 94, reaches the passage gap 104, and, due to its density, then rises to the surface of the water and from there into the free space 97. From there, the gas is discharged from the adjacent container 90 via the container outlet 99 for the gas. Alternatively, the channel 110 can be replaced by a pipe that is open at the bottom and through which the gas flows.

[0143] Figure 5 shows a fourth exemplary embodiment of the processing device 50 according to the invention. The process chamber 55 corresponds in its structure and function to the example shown in Figure 2, so that its structure will not be repeated here again and reference is made in full to the corresponding explanations for Figure 2. Likewise, the basic structure and basic function of the adjacent container 90 correspond to the adjacent container from Figures 3 and 4, so that in this regard, reference is also made in full to the above explanations for the adjacent container 90 according to Figures 3 and 4. Therefore, only the differences from the previously described exemplary embodiments will be discussed below.

[0144] In principle, it is advantageous if the number of components used is as small as possible, for example in order to save costs. Therefore, in the embodiment shown in Figure 5, at least regions of the supply line 87 for the water and at least regions of the discharge line 83 for the gas 111 are designed as a common line 106. This means that the common line 106 must be able to be flowed through by both the gas 111 to be removed and the water 94 to be supplied. This can be achieved, for example, using a valve device 105 designed in the form of a multi-way valve. In this embodiment, a first section 83a of the discharge line 83 is connected on one side to the second outlet 82 for the gas from the process chamber 55 and on the other side to the multi-way valve 105.Likewise, a second section 87b of the water supply line 87 is connected on one side to the second water inlet 86 in the process chamber 55, and on the other side to the multi-way valve 105. The multi-way valve 105 is connected on the other side to the common line 106. This ends in a single component in the adjacent container, which is preferably formed in the container bottom, but in any case in the region of the water 94 located in the adjacent container 90, and which is designed as a combination element consisting of a container inlet 98 for the gas 111 and a container outlet 101 for the water. The multi-way valve 105 is designed, for example, as a 4 / 3-way valve. In the illustration shown in Figure 5, this multi-way valve can, from left to right, regulate the following operating states, for example:

[0145] Position 1 : Electrolysis device in operation

[0146] Position 2: Electrolysis device switched off Position 3: Refill water for the electrolyte fluid.

[0147] Figure 6 shows a fifth exemplary embodiment of the processing device 50 according to the invention. The process chamber 55 corresponds in terms of its structure and function to the example shown in Figure 2, so that its structure will not be repeated here again and reference is made in full to the corresponding explanations for Figure 2. Likewise, the basic structure and basic function of the secondary container 90 correspond to the secondary container from Figures 3, 4 and 5, so that in this regard, reference is also made in full to the above explanations for the secondary container 90 according to Figures 3, 4 and 5. Therefore, only the differences from the previously described exemplary embodiments will be discussed below.

[0148] The adjacent tank is again arranged next to the process chamber 55, as in Figure 3, at the same height as the latter. However, the height is generally variable. However, to avoid the need for a water pump, some components in the adjacent tank 90 in Figure 6 are arranged differently.

[0149] According to the embodiment shown in Figure 6, the secondary container 90 has a container inlet 98 for gas 111, which is connected via a first section 83a of the discharge line 83 to the second outlet 82 for the gas in the process chamber. A valve device 109 can be located in this line section 83a to block the line section 83a if necessary. Likewise, a container outlet 101 for the water 94 is connected via a line section 87b of the supply line 87 to the second inlet 86 for the water in the process chamber 55. A valve device 108 can also be located in this line section 87b, via which the supply line 87 can be blocked if necessary. The container inlet 98 and the container outlet 101 are formed below a defined fill level 95a of the water 94 in the secondary container 90.This means that the tank inlet 98 and the tank outlet 101 are located below the upper free surface of the water 94 located in the adjacent tank 90. ​​The gas 111, which flows into the adjacent tank 90 via the tank inlet 98, flows through the water 94 and, due to its density, rises to the surface, and from there into the free space 97 between the water surface and the tank ceiling. In the tank ceiling, the adjacent tank 90 has a tank outlet 99 for gas, to which a further section 83b of the discharge line 83 is connected. Likewise, in the tank ceiling there is a tank inlet 100 for water, to which a further section 87a of the supply line 87 is connected.

[0150] In section 83b of the discharge line 83, there is a valve device 107, for example in the form of a shut-off valve. If the valve device 107 is closed, the gas 111 cannot escape from the adjacent container 90. The pressure building up from the gas 111 rising through and out of the water, particularly in the free space 97, can be used to push water 94 located in the adjacent container 90 out of the adjacent container 90 via the corresponding container outlet 101 into the line section 87b of the supply line 87 and through this into the process chamber 55 via the second inlet 86. The pressure building up pushes the water through the supply line 87, 87b to the process chamber 55.

[0151] Figure 7 shows a sixth embodiment of the processing device 50 according to the invention. Its basic structure is based on the processing device 50 shown in Figure 2, so that at this point, for a description of the structure and function, reference is also made to the explanations relating to Figure 2 in full. Identical components are provided with identical reference numerals.

[0152] The processing device 50 has a process chamber 55, which is delimited by a process chamber wall 56 consisting of a process chamber floor 57, a process chamber ceiling 58, and a process chamber side wall 59. Electrolyte liquid 60 to be processed is fed into the process chamber 55 via a first inlet 51 and stored therein. Electrolyte liquid 60 processed in the process chamber is discharged via a first outlet 53. The process chamber 55 may be filled up to a defined fill level 61a, so that the process chamber 55 always contains electrolyte liquid 60 at a fill level 61 that is at or below the defined fill level 61a. The fill level 61 is determined using a sensor element 62 for determining the fill level.

[0153] A first barrier element 63 is located between the first inlet 51 and the first outlet 53. The first barrier element 63 is spaced apart from both the process chamber floor 57 and the process chamber side wall 59. This creates a channel 116, which is preferably located below the first outlet 53. This prevents the electrolyte liquid 60 introduced via the first inlet 51 from immediately leaving the process chamber 55 via the first outlet 53. The reason for this is also a liquid column 116, as will be explained further below.

[0154] In a free space 112 located between the free upper surface of the electrolyte liquid 60, represented by the fill level 61, in any case between the defined fill level 61a, and the process chamber wall 56, in particular the process chamber ceiling 58, a basin 64 is arranged or formed, consisting of a basin bottom 65 and a basin rim 66, the free end of which represents an upper edge 66a of the basin rim. The basin 64 serves to hold water 67, in particular ultrapure water. This means that, during intended use, water 67 is present in the basin 64. The basin 64 may be filled up to a fill level 67a, which preferably corresponds to the upper edge 66a of the basin rim 66.

[0155] A first basin edge section 68 has a greater height than the remaining basin edge 66. This first basin edge section 68 represents a second barrier element 69, which, together with a region of the process chamber side wall 59, forms a first channel 70. The first channel 70 is oriented toward the process chamber ceiling 58. A free end 71 of the first basin edge section 68 is spaced apart from the process chamber ceiling 58, such that a passage gap 72 is formed by the free end 71 and the process chamber ceiling 58. The passage gap 72 represents a deflection element.

[0156] A second basin edge section 73 extends beyond the basin floor 65 downwards beneath the basin 64. This second basin edge section 73 forms a third barrier element 74. The process chamber side wall 59 and the second basin edge section 73 form a second channel 75, which is oriented toward the process chamber floor 57. A free end 76 of the second basin edge section 73 is spaced from the process chamber floor 57. A passage gap 77, which also represents a deflection element, is formed between the process chamber floor 57 and the free end 76. The second channel 75 is located in a region of the process chamber wall 56 that lies opposite the region of the process chamber wall 56 that forms the first channel 70. The first channel 70 and the second channel 75 are thus opposite one another.The second channel 75 is arranged or configured such that it begins in the process chamber 55 in the free space 112 between the process chamber ceiling 58 and the free surface of the electrolyte fluid located in the process chamber 55. The second channel 75 is connected to the channel 116.

[0157] In addition, the process chamber 55 has two further, fourth barrier elements 78, which protrude from the process chamber ceiling 58 and into the basin 64, wherein a free end 79 of each fourth barrier element 78 is spaced from the basin bottom 65. There, a passage gap 80 is formed in each case. This is an outflow vent. The two fourth barrier elements 78 are spaced from one another. In front of the second barrier element 78, on the right in the figure, is an additional, sixth barrier element 113. This projects upwards from the basin bottom 65 into the basin 64 and has a height that corresponds at least to the height of the basin edge 66 and is less than the height of the free end 71 of the first basin edge section 68.

[0158] Furthermore, in the process chamber, between the process chamber floor 56, here even between the first barrier element 63, and the basin floor 65, which functions as the seventh barrier element 114, there is a further, eighth barrier element 115. This has an oblique profile, as shown by way of example, but can also be designed vertically, with a passage gap 118 being formed between a lower end 117 of the barrier element 115 and the first barrier element 63. Likewise, a passage gap 120 is formed between the upper end 119 of the barrier element 115 and the basin floor 65, which functions as the seventh barrier element 114. This eighth barrier element 115 is arranged in the region in front of the first basin edge section 68 and thus in front of the first channel 70 in the process chamber 55.Gas released from the electrolyte liquid 60 in the process chamber 55 is removed from the process chamber 55 via a gas removal device 81. For this purpose, the device 81 has a second outlet 82 formed in the process chamber ceiling 58. Also provided in the process chamber ceiling 58, above the basin 64, is a water supply device 85. This device has a second inlet 86. The water is supplied to the process chamber 55, and in particular to the basin 64, via the device 85.

[0159] The function of this treatment device 50 according to Figure 7 is described below. Electrolyte liquid 60 to be treated is fed into the process chamber 55 via the first inlet 51. The electrolyte liquid 60 consists, for example, of water to which a certain percentage of an electrolyte, such as KOH, is added. The electrolyte is full of oxygen, so the oxygen must be removed from the electrolyte. The oxygen is thus a gas, which is an undesirable gas in the electrolyte liquid 60 at this point. The electrolyte liquid 60 is filled up to a defined fill level 61a in the process chamber 55.

[0160] When the electrolyte liquid 60 to be treated enters the process chamber 55, unwanted foam may form. This foam is retained and / or dissolved by the eighth barrier element 115. Furthermore, the eighth barrier element 115 can be used to calm the electrolyte liquid 60 located in the process chamber 55. The liquid generally enters the process chamber 55 dynamically via the first inlet 51. The seventh barrier element 115 can calm the electrolyte liquid 60 by allowing the escaping gas to enter the first channel 70 via the passage gap 120, while the electrolyte liquid is calmed by the barrier element 115 and enters the part of the process chamber 55 located to the left of the barrier element 115, and in particular, channels 116 and 75, via the passage gap 118.

[0161] The gas, for example oxygen, dissolves spontaneously from the electrolyte liquid 60 in the process chamber 55 and, due to its density, rises upwards in the electrolyte liquid 60. Via the barrier elements 63, 114, 69, 74 and the basin floor 65 as the seventh barrier element 114 within the process chamber 55, gas escaping from the electrolyte liquid 60 is guided through the first channel 70, impacts the process chamber ceiling 58, passes through the passage gap 72, encounters the first fourth barrier element 78, and is guided by it into the basin 64, which contains water 67. Furthermore, the gas is also guided through the second fourth barrier element 78 in a corresponding manner. This increases the contact area between gas and water in the basin 64.

[0162] The gas passes through the passage gap 80 of the second, fourth barrier element 78, which is on the right in Figure 7, reaches the surface of the water 67, and is discharged from the process chamber 55 via the second outlet 82. This removes the separated gas, for example, oxygen, from the electrolyte liquid 60.

[0163] In addition, as in Figure 2, when the gas escaping from the electrolyte liquid 60 is passed through the water 67 located in the basin 64, aerosols of the electrolyte are separated from the escaped gas. These aerosols are dissolved in the water 67 and then returned to the electrolyte liquid 60 in the process chamber 55. This occurs via the second channel 75, in which the water 67 overflowing from the basin 64 stands up to a fill level 116. At the same time, unwanted gases dissolved in the water 67 of the upper basin 64, for example CO2, are removed from the water 67 by passing the escaped gas through the water 67 and are discharged from the process chamber 55 with the process exhaust gas via the second outlet 82.

[0164] To compensate for or replenish used water in the electrolyte liquid 60, the device 85 is used to supply water, in particular the water 67 located in the basin 64. Water and aerosol residues of the electrolyte dissolved in the water overflow over the container edge 66, in particular over the container edge 66a, flow through the second channel 75 back into the electrolyte liquid 60 located in the process chamber 55 and are then discharged from the process chamber 50 via the first outlet 53.

[0165] Figure 8 shows a seventh embodiment of the processing device 50 according to the invention. Its basic structure is based on the processing device 50 shown in Figure 7, so that at this point, for a description of the structure and function, reference is also made to the explanations relating to Figure 7 in full. Identical components are provided with identical reference numerals.

[0166] The processing device 50, in turn, has a process chamber 55, which is bounded by a process chamber wall 56 consisting of a process chamber floor 57, a process chamber ceiling 58, and a process chamber side wall 59. In this embodiment, the process chamber ceiling 58 has a stepped profile.

[0167] Electrolyte liquid 60 to be treated is fed into the process chamber 55 via a first inlet 51 and stored therein. Treated electrolyte liquid 60 is discharged from the process chamber via a first outlet 53. The process chamber 55 may be filled up to a defined fill level 61a, so that the process chamber 55 always contains electrolyte liquid 60 at a fill level 61 that is at or below the defined fill level 61a. The fill level 61 is determined using a sensor element 62 for determining the fill level. The sensor element 62 is a capacitive sensor and measures from the outside, so that no ignition sources are present within the treatment device 50.

[0168] A first barrier element 63 is located between the first inlet 51 and the first outlet 53. The first barrier element 63 is spaced apart from both the process chamber floor 57 and the process chamber side wall 59. This creates a channel 116 through which the treated electrolyte fluid is discharged from the process chamber 55. For example, the first outlet 53 can lead to an external pump or be connected to one.

[0169] In order to refill or remove electrolyte liquid 60 from the process chamber 55, a service connection 123 is provided.

[0170] In a free space 112 located between the free upper surface of the electrolyte liquid 60, represented by the fill level 61, in any case between the defined fill level 61a, and the process chamber wall 56, in particular the process chamber ceiling 58, a basin 64 is arranged or formed, consisting of a basin bottom 65 and a basin rim 66, the free end of which represents an upper edge 66a of the basin rim. The basin 64 serves to hold water 67, in particular ultrapure water or permeate from the reverse osmosis of tap water. This means that, during intended use, water 67 is present in the basin 64. The basin 64 may be filled up to a fill level 67a, which preferably corresponds to the upper edge 66a of the basin rim 66.

[0171] Compared to Figure 7, a first basin edge section 68 this time has a height equal to the remaining basin edge 66. This first basin edge section 68 represents a second barrier element 69, which, together with a region of the process chamber side wall 59, forms a first channel 70. The first channel 70 is oriented toward the process chamber ceiling 58. A free end 71 of the first basin edge section 68 is spaced apart from the process chamber ceiling 58, so that a passage gap 72 is formed by the free end 71 and the process chamber ceiling 58. The passage gap 72 represents a deflection element.

[0172] A second basin edge section 73 extends from the basin edge 66a to the basin floor 65. This second basin edge section 73 forms a third barrier element 74. The process chamber side wall 59 and the second basin edge section 73 form a second channel 75 which is aligned in the direction of the process chamber floor 57. For this purpose, the second channel 75 merges into a further guide channel 127 which extends in the direction of the first outlet 53. A free end 76 of the further guide channel 127 is spaced from the process chamber floor 57. A passage gap 77 which also represents a deflection element is formed between the process chamber floor 57 and the free end 76. The second channel 75 and the guide channel 127 are located in a region of the process chamber wall 56 which lies opposite the region of the process chamber wall 56 which forms the first channel 70.The first channel 70 and the second channel 75, or guide channel 127, are thus located opposite each other. The second channel 75 is connected to the channel 116 via the guide channel 127.

[0173] The process chamber 55 has two further, fourth barrier elements 78, which protrude from the process chamber ceiling 58 and into the basin 64, with a free end 79 of each fourth barrier element 78 being spaced from the basin bottom 65. A passage gap 80 is formed there. This gap constitutes an outlet. The two fourth barrier elements 78 are spaced from one another. An additional, sixth barrier element 113 is located in front of the second barrier element 78, which is on the right in the figure. This barrier element protrudes upwards from the basin bottom 65 into the basin 64 and has a height that corresponds to the height of the basin edge 66, as well as the height of the free end 71 of the first basin edge section 68.

[0174] Located below the basin bottom 65, but also above the defined fill level 61a, is a seventh barrier element 114, which extends parallel to the direction of extension of the basin bottom 65. The basin bottom 65 and a portion of the guide channel 127, on the one hand, and the seventh barrier element 144, on the other, delimit a guide channel 122 for gas.

[0175] Furthermore, in the process chamber 55, between the process chamber floor 56, here even between the first barrier element 63, and the seventh barrier element 114, there is a further, eighth barrier element 115. This extends from one end of the seventh barrier element 114 in an oblique orientation towards the process chamber floor 57. The eighth barrier element 115 borders with its upper end 119 directly on the seventh barrier element 114, so that the two barrier elements 114, 115 define a collection chamber 121 within the process chamber 55 above the defined fill level 61a. Between a lower end

[0176] 117 of the barrier element 115 and the first barrier element 63 is a passage gap

[0177] 118 trained.

[0178] Gas released from the electrolyte liquid 60 in the process chamber 55 is removed from the process chamber 55 via a gas removal device 81. For this purpose, the device 81 has a second outlet 82 formed in the process chamber wall 56 near the process chamber ceiling 58. A device 85 for supplying water is also provided in the process chamber wall 56 above the basin 64. This device has a second inlet 86. The water is supplied to the process chamber 55, and in particular to the basin 64, via the device 85.

[0179] The function of this treatment device 50 according to Figure 8 is described below. Electrolyte liquid 60 to be treated is fed into the process chamber 55 via the first inlet 51. The electrolyte liquid 60 consists, for example, of water to which a certain percentage of an electrolyte, such as KOH, is added. The electrolyte is full of oxygen, so the oxygen must be removed from the electrolyte. The oxygen is thus a gas, which is an undesirable gas in the electrolyte liquid 60 at this point. The electrolyte liquid 60 is filled up to a defined fill level 61a in the process chamber 55.

[0180] The electrolyte liquid 60 flows along the path 125, through the gap 118, is deflected at the process chamber side wall 59, and moved toward the first outlet 53, through which it ultimately exits the process chamber 55. When the electrolyte liquid 60 to be treated enters the process chamber 55, unwanted foam 126 may form. This foam 126 is retained and / or dissolved by the collection chamber 121 delimited by the seventh and eighth barrier elements 114, 115. Additionally, the collection chamber 121 keeps the foam 126 away from the sensor element 62 and the first channel 70.

[0181] The gas, for example oxygen, dissolves spontaneously from the electrolyte liquid 60 in the process chamber 55 and, due to its density, rises upwards in the electrolyte liquid 60. Via the channel 122, the gas is guided along the path 124 toward the first channel 70 and thus into the basin 64. The gas flows along the path 124 through the first channel 70, impacts the process chamber ceiling 58, passes through the passage gap 72, encounters the first fourth barrier element 78, and is guided by it into the basin 64, in which water 67 is located. Furthermore, the gas 111 is also guided through the second fourth barrier element 78 in a corresponding manner. This increases the contact area between the gas and water in the basin 64.

[0182] The gas 111 passes through the passage gap 80 of the second, fourth barrier element 78, which is on the right in Figure 8, reaches the surface of the water 67, and is discharged from the process chamber 55 via the second outlet 82. This removes the separated gas, for example, oxygen, from the electrolyte liquid 60.

[0183] In addition, as in Figure 7, when the gas escaped from the electrolyte liquid 60 is passed through the water 67 located in the basin 64, aerosols of the electrolyte are separated from the escaped gas. These aerosols are dissolved in the water 67 and then fed back to the electrolyte liquid 60 in the process chamber 55. This occurs via the second channel 75, in which the water 67 overflowing from the basin 64 stands up to a fill level 67a, and then via the guide channel 127. At the same time, unwanted gases dissolved in the water 67 of the upper basin 64, for example CO2, are removed from the water 67 by passing the escaped gas through the water 67 and are discharged from the process chamber 55 with the process exhaust gas via the second outlet 82.

[0184] To compensate for or replenish used water in the electrolyte liquid 60, the device 85 is used to supply water, in particular the water 67 located in the basin 64. Water and aerosol residues of the electrolyte dissolved in the water overflow over the container edge 66, in particular over the container edge 66a, flow through the second channel 75 and the adjoining guide channel 127 back into the electrolyte liquid 60 located in the process chamber 55 and are then discharged from the process chamber 50 via the first outlet 53.

[0185] List of reference symbols

[0186] 10 Energy system (house energy system)

[0187] 20 First subsystem (internal system)

[0188] 21 Electrolysis device

[0189] 21a Electrolysis device (electrolysis cell)

[0190] 22 Fuel cell device

[0191] 23 Flushing device (rinsing chamber)

[0192] 24 Check valve device

[0193] 25 Filter device

[0194] 26 Drying device

[0195] 30 Second subsystem (external system)

[0196] 31 High-pressure storage facility

[0197] 32 medium-pressure storage device

[0198] 33 Valve device

[0199] 34 Compressor setup

[0200] 35 Check valve device

[0201] 36 Pressure relief device (pressure reducer)

[0202] 40 Connecting line device

[0203] 40a to 40k line section

[0204] 41 Pressure measuring device 50 Device for treating a liquid (treatment device)

[0205] 51 First entry

[0206] 52 supply line

[0207] 53 First outlet

[0208] 54 Discharge line

[0209] 55 Process Chamber

[0210] 56 Process chamber wall

[0211] 57 Process chamber floor

[0212] 58 Process chamber ceiling

[0213] 59 Process chamber side wall

[0214] 60 liquid (electrolyte liquid)

[0215] 61 Fill level

[0216] 61a Defined fill level

[0217] 62 Sensor element for determining the fill level

[0218] 63 First barrier element

[0219] 64 pools

[0220] 65 Pelvic floor

[0221] 66 pool edge

[0222] 66a Upper edge of the pelvic rim

[0223] 67 Water

[0224] 67a Filling level

[0225] 67b Defined fill level

[0226] 67c Sensor element for determining the fill level

[0227] 68 First pool edge section

[0228] 69 Second barrier element

[0229] 70 First Channel

[0230] 71 Free End

[0231] 72 Deflection element (passage gap)

[0232] 73 Second basin edge section

[0233] 74 Third barrier element

[0234] 75 Second Channel

[0235] 76 Free End

[0236] 77 Deflection element (passage gap)

[0237] 78 Fourth barrier element

[0238] 79 Free end (bubble edge) 80 Outlet (passage gap)

[0239] 81 Device for removing a gas

[0240] 82 Second outlet

[0241] 83 Discharge line

[0242] 83a Section of the discharge line

[0243] 83b Section of the discharge line

[0244] 84 Demister

[0245] 85 Device for supplying water

[0246] 86 Second entrance

[0247] 87 supply line

[0248] 87a Section of the supply line

[0249] 87b Section of the supply line

[0250] 88 Pump

[0251] 89 Valve device

[0252] 90 Secondary container

[0253] 91 Container bottom

[0254] 92 Container ceiling

[0255] 93 Container side wall

[0256] 94 Water

[0257] 95 Fill level

[0258] 95a Defined fill level

[0259] 96 Sensor element for determining the fill level

[0260] 97 open space

[0261] 98 Tank inlet for gas

[0262] 99 Container outlet for gas

[0263] 100 Tank inlet for water

[0264] 101 Tank outlet for water

[0265] 102 Fifth barrier element

[0266] 103 Free End

[0267] 104 passage gap

[0268] 105 Valve device (multi-way valve)

[0269] 106 Joint Management

[0270] 107 Valve device

[0271] 108 Valve device

[0272] 109 Valve device 110 Channel

[0273] 111 Gas

[0274] 112 open space

[0275] 113 Sixth barrier element

[0276] 114 Seventh barrier element

[0277] 115 Eighth barrier element

[0278] 116 Channel

[0279] 117 lower end of the eighth barrier element

[0280] 118 passage gap

[0281] 119 upper end of the eighth barrier element

[0282] 120 passage gap

[0283] 121 Collection Chamber

[0284] 122 Gas duct

[0285] 123 Collective connection

[0286] 124 Path of the gas

[0287] 125 Path of the liquid to be treated

[0288] 126 foam

[0289] 127 guide channel

Claims

Patent claims 1. Device (50) for the treatment of a liquid (60), in particular a Electrolyte fluid, comprising a process chamber (55), comprising a process chamber wall (56) with a process chamber bottom (57), a process chamber ceiling (58) and a process chamber side wall (59), a first inlet (51) in the process chamber wall (56), preferably in the process chamber side wall (59), which is provided for supplying the fluid (60) to be treated into the process chamber (55), a first outlet (53) in the process chamber wall (56), preferably in the process chamber side wall (59), which is provided for discharging the treated fluid (60) from the process chamber (55), one or more barrier elements (63, 65, 69, 74, 78, 113, 114, 115) within the process chamber (55), which is provided for influencing the flow characteristics within the process chamber (55). is / are, a device (81 ) for removing a gas (111) from the liquid (60) to be treated,wherein the device (81) has a second outlet (82) in the process chamber wall (56) which is provided for the discharge of the gas (111) removed from the liquid (60), characterized in that the device (50) has a device (85) for supplying a second liquid in the form of water (67), wherein the device (85) has a second inlet (86) in the process chamber wall (56) which is provided for supplying water (67) into the process chamber (55), that a basin (64) which is provided for receiving water (67) is arranged or formed within the process chamber (55), having a basin bottom (65) and a basin rim (66) projecting upwards from the basin bottom (65), and that at least the upper edge (66a) of the basin rim (66) is above a defined fill level (61a) for the liquid (60) within the process chamber (55) lies.

2. Processing device according to claim 1, characterized in that the second outlet (82) is for the discharge of the gas (111) removed from the liquid (60) and the second inlet (86) for supplying water is located above the basin (64), preferably in the process chamber ceiling (58) and / or in the process chamber side wall (59).

3. Processing device according to claim 1 or 2, characterized in that at least one first barrier element (63) is arranged or formed between the first inlet (51) and the first outlet (53) in the process chamber (55), which projects into the process chamber (55), preferably at a predetermined angle of inclination.

4. Processing device according to one of claims 1 to 3, characterized in that it has at least one sensor element (62) for determining the fill level (61) of the liquid (60) within the process chamber (55), and that the sensor element (62) is in particular selected from the group consisting of float sensor elements, optical sensor elements, capacitive sensor elements, pressure sensor elements.

5. Processing device according to one of claims 1 to 4, characterized in that the basin rim (66) has a first basin rim section (68) which preferably has a greater height compared to the rest of the basin rim (66), that the first basin rim section (68) forms a second barrier element (69), that the process chamber wall (56) and the first basin rim section (68) form a first channel (70), and / or that the basin rim (66) has a second basin rim section (73) which preferably extends downwards below the basin (64) beyond the basin bottom (65), that the second basin rim section (73) forms a third barrier element (74), and that the process chamber wall (56) and the second basin rim section (73) form a second channel (75).

6. Processing device according to one of claims 1 to 5, characterized in that the process chamber (55) has at least a fourth barrier element (78) which projects from the process chamber wall (56), in particular from the process chamber ceiling (58), into the basin (64), and / or that the process chamber (55) has at least a sixth barrier element (113) which projects from the basin bottom (65) into the basin (64).

7. Processing device according to one of claims 1 to 6, characterized in that the device (85) for supplying water has a supply line (87) connected to the second inlet (86).

8. Processing device according to claim 7, characterized in that a container (90) adjacent to the process chamber (55), which is provided for receiving water (94), in particular up to a defined fill level (95a), is arranged in the supply line (87).

9. Processing device according to one of claims 7 or 8, characterized in that the secondary container (99) is arranged above the defined fill level (61a) within the process chamber (55), preferably above the process chamber (55).

10. Processing device according to one of claims 1 to 9, characterized in that the process chamber (55) has at least one seventh barrier element (114) which is formed by the basin bottom (65) of the basin (64), or which extends in the same direction of extension as the basin bottom (65) spaced apart from the basin bottom (65) below the basin bottom (65) but above the defined fill level (61a) in the process chamber (55) and the basin bottom (65) and the seventh barrier element (114) define a guide channel.

11. Processing device according to one of claims 1 to 10, characterized in that the process chamber (55) has at least one eighth barrier element (115) which is arranged at least partially above the defined fill level (61a) in the process chamber (55) and which extends from the basin bottom (65) in the direction of the process chamber bottom (57).

12. Device (21) for electrolysis, in particular for water electrolysis, comprising an electrolysis device (21a), characterized by a device (50) for preparing an electrolyte liquid (60) according to one of claims 1 to 11, wherein the first inlet (51) in the process chamber wall (56) of the preparation device (50), which is provided for supplying the electrolyte liquid (60) to be prepared into the process chamber (55), is at least temporarily connected to an outlet for electrolyte liquid from the electrolysis device (21a), and wherein the first outlet (53) in the process chamber wall (56) of the processing device (50), which is provided for the discharge of the processed electrolyte fluid (60) from the process chamber (55), is at least temporarily connected to an inlet for electrolyte fluid into the electrolysis device (21a).

13. Energy system (10), in particular a building energy system, comprising an electrolysis device (21), a fuel cell device (22), a high-pressure storage device (31) and a connecting line device (40) via which the electrolysis device (21) is connected to the fuel cell device (22) and the high-pressure storage device (31) is connected to the fuel cell device (22), characterized in that the electrolysis device (21) is designed in the form of an electrolysis device (21) according to claim 12, or that the energy system (10) comprises a device (50) for preparing an electrolyte liquid (60) according to one of claims 1 to 11, which is at least temporarily connected to an electrolysis device (21a) of the electrolysis device (21).

14. Method for the treatment of an electrolyte fluid (60), in particular using a treatment device (50) according to any one of claims 1 to 11, characterized by the following steps: a) Electrolyte fluid (60) to be treated is supplied to the process chamber (55) of the treatment device (50) via a first inlet (51) in the process chamber wall (56) of a process chamber (55); b) Gas (111) escaping from the electrolyte fluid (60) is passed through barrier elements (63, 65, 69, 74, 78, 113, 114, 115) within the process chamber (55) via a basin (64) within the process chamber (55) in which a second liquid in the form of water (67) is located; c) The removed gas (111 ) is discharged from the process chamber (55) via a second outlet (82) in the process chamber wall (56);d) The processed electrolyte liquid (60) is discharged from the process chamber (55) via a first outlet (53) in the process chamber wall (56) and is supplied in particular to an electrolysis device (21a), preferably an electrolysis device (21a) of an electrolysis unit (21) according to claim 12.

15. Method according to claim 14, characterized in that gas stripping of unwanted gases, in particular CO2, dissolved in the water (67, 94) is carried out.

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