Manufacturing device and method for the additive manufacturing of components from a powder material and method for determining a correction function for a manufacturing device of this type or a method of this type
Patent Information
- Application Number
- EP2023757224
- Authority / Receiving Office
- EP · EP
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2022-08-23
- Filing Date
- 2023-08-10
- Publication Date
- 2025-07-02
AI Technical Summary
Additive manufacturing devices using non-rotationally symmetrical energy beams face issues with beam wobbling due to manufacturing tolerances and adjustment errors, leading to defects like rough surfaces and dimensional deviations in components.
A manufacturing device with a beam generating device, a beam rotating device, and a scanner device, controlled by a control device that corrects the scanner's rotation angle-dependent movements to maintain a stable beam profile center, eliminating the need for precise beam adjustments and low-tolerance production.
This solution effectively prevents beam wobbling and associated defects by relocating the beam profile's center of gravity, ensuring consistent irradiation patterns and reducing defects in component production, while being cost-effective and simpler to implement.
Smart Images
Figure 1.1
Abstract
Description
[0001] DESCRIPTION
[0002] Manufacturing device and method for additive manufacturing of components from a powder material and method for determining a correction function for such a manufacturing device or such a method
[0003] The invention relates to a manufacturing device and a method for the additive manufacturing of components from a powder material, as well as to a method for determining a correction function for the rotation angle-dependent control of a scanner device in such a manufacturing device or for the rotation angle-dependent control of beam positions in such a method.
[0004] For the additive manufacturing of components from a powder material, it may be useful to use an energy beam with a beam profile that is not rotationally symmetrical about its beam axis. Depending on the direction of displacement of the beam profile within a work area of a manufacturing device, in particular depending on the orientation of a respective irradiation vector, it may then be useful or necessary to be able to rotate the beam profile and thus align it relative to the irradiation vector. In particular, a longer axis of two orthogonal axes of the beam profile can be aligned in the direction of the irradiation vector.The problem here is that manufacturing tolerances of a beam generation device for generating the energy beam, as well as even small alignment errors of the beam axis in a beam rotation device intended for rotating the beam profile, can lead to undesired wobbling of the beam profile, in particular to an undesired shift of a center of gravity of the beam profile during its rotation. This can result in defects in the component being manufactured, particularly at locations in the work area where the orientation of adjacent irradiation vectors changes. This can lead to rough component surfaces, dimensional deviations, and a locally reduced component density.
[0005] Obvious ways to solve this problem would be extremely precise alignment of the energy beam and / or extremely tight-tolerance manufacturing of the beam generation device. However, both are excessively complex and expensive and therefore hardly feasible in practice. In particular, the energy beam would have to be readjusted with the utmost precision every time the manufacturing device is moved or otherwise subjected to vibrations.
[0006] The invention is therefore based on the object of creating a manufacturing device and a method for the additive manufacturing of components from a powder material as well as a method for determining a correction function for the rotation angle-dependent control of a scanner device in such a manufacturing device or for the rotation angle-dependent control of beam positions in such a method, wherein the aforementioned disadvantages are at least reduced, preferably do not occur.
[0007] The object is achieved by providing the present technical teaching, in particular the teaching of the independent claims as well as the embodiments disclosed in the dependent claims and the description.
[0008] The object is achieved in particular by providing a manufacturing device for the additive manufacturing of components from a powder material, which manufacturing device has a beam generation device, wherein the beam generation device is configured to generate an energy beam with a beam profile that is not rotationally symmetrical about a beam axis of the energy beam. The manufacturing device also has a beam rotation device configured to rotate the beam profile of the energy beam about the beam axis. Furthermore, the manufacturing device has a scanner device configured to displace the energy beam in a work area and to locally selectively irradiate the work area with the energy beam in order to produce a component from the powder material arranged in the work area by means of the energy beam.The manufacturing device also has a control device that is operatively connected to the beam rotation device and the scanner device and configured to control the beam rotation device and the scanner device, and to correct the control of the scanner device as a function of a current angle of rotation of the beam rotation device. By correcting the control of the scanner device, a wobbling movement occurring due to a rotation of the beam profile can advantageously be corrected, in particular by shifting the center of gravity of the beam profile to a predetermined target location in the work area by suitable angle-dependent correction of the control of the scanner device—due to the correction being independent of the angle of rotation.In particular, this results in a defined connection between regions of irradiation vectors with a first orientation and adjacent regions of irradiation vectors with a second, different orientation in the working area. This advantageously prevents defects in the component to be manufactured, particularly rough component surfaces, dimensional deviations, or a locally reduced component density. The correction itself can be carried out easily and cost-effectively, particularly using software, so that neither extremely precise manufacturing of the beam generation device nor extremely precise adjustment of the energy beam is required.
[0009] In particular, a coordinate system in the working area is spanned by two Cartesian coordinates, in particular an x-coordinate and a y-coordinate, wherein the angle-dependent correction comprises a first correction contribution for the x-coordinate and a second correction contribution for the y-coordinate. The control of the scanner device is thus corrected, in particular, in the x-direction and y-direction of the working area depending on the angle of rotation. In particular, a rotation-angle-dependent deviation of an actual profile position from a target profile position of the beam profile is corrected in the x-direction and y-direction.
[0010] In the context of the present technical teaching, a center of gravity of the beam profile is understood in particular to mean a point which is selected from a group consisting of: a center of gravity of an intensity distribution of the beam profile on the working area, in particular a center of the beam profile weighted with the local intensities, a location of a maximum of the intensity distribution, and a geometric center of the beam profile.
[0011] In one embodiment, the control of the scanner device is additionally corrected depending on the current control itself. This means, in particular, that the angle-dependent correction is in turn dependent on the current location of the beam profile in the workspace. In this way, distortions, especially in edge regions distant from a center of the workspace, can be advantageously reduced, preferably avoided.
[0012] Additive or generative manufacturing or production of a component is understood to mean, in particular, a powder bed-based process for producing a component, in particular a manufacturing process selected from a group consisting of selective laser sintering, laser metal fusion (LMF), direct metal laser melting (DMLM), laser net shaping manufacturing (LNSM), selective electron beam melting (SEBM), and laser engineered net shaping (LENS). The manufacturing device is accordingly configured, in particular, to carry out at least one of the aforementioned additive or generative manufacturing processes.
[0013] The energy beam is selected, in particular, from a group consisting of an electromagnetic beam, in particular an optical working beam, in particular a laser beam, and a particle beam, in particular an electron beam. The energy beam can be continuous or pulsed, in particular continuous laser radiation or pulsed laser radiation.
[0014] In one embodiment, the beam-generating device is configured to generate a plurality of energy beams, and / or the manufacturing device comprises a plurality of beam-generating devices for generating a plurality of energy beams. It is possible for a plurality of scanner devices to be provided for the plurality of energy beams. However, it is also possible for the scanner device to be configured to displace a plurality of energy beams—in particular independently of one another—on the work area. In particular, the scanner device can comprise a plurality of separately controllable scanners, in particular scanner mirrors, for this purpose.
[0015] In particular, the control device is configured to correct the control of the scanner device, in particular the control of the respectively assigned scanner, for each energy beam of the plurality of energy beams as a function of the respective angle of rotation. Alternatively or additionally, the control device is configured to coordinate or additionally correct the control of the scanner device for the plurality of energy beams, in particular for each energy beam of the plurality of energy beams, such that identical points on the work area can be controlled with each of the energy beams. In particular, the control device is thus configured to register or calibrate the control of the scanner device for the plurality of energy beams relative to one another.In one embodiment, this occurs after the angle-dependent correction of the control, so that the angle-dependent corrected beam positions are registered or calibrated relative to one another. In another embodiment, however, a different sequence is also possible. The scanner device preferably has at least one scanner, in particular a galvanometer scanner, piezo scanner, polygon scanner, MEMS scanner, and / or a working head or processing head that can be displaced relative to the work area. The scanner devices proposed here are particularly suitable for displacing the energy beam between a plurality of beam positions within the work area.
[0016] A working head or processing head that can be displaced relative to the work area is understood here in particular to mean an integrated component of the manufacturing device that has at least one radiation outlet for at least one energy beam. The integrated component, i.e., the working head, can be displaced as a whole relative to the work area along at least one displacement direction, preferably along two mutually perpendicular displacement directions. Such a working head can, in particular, be designed as a gantry or be guided by a robot. In particular, the working head can be designed as a robot hand of a robot.
[0017] The control device is preferably selected from a group consisting of a computer, in particular a personal computer (PC), a plug-in card or control card, and an FPGA board.
[0018] The beam-generating device preferably comprises a laser. The energy beam is thus advantageously generated as an intense beam of coherent electromagnetic radiation, in particular coherent light. Irradiation in this respect preferably means exposure.
[0019] The beam generating device can, in particular, comprise prisms for generating the non-rotationally symmetric beam profile, preferably in particular at least one anamorphic prism, in particular an anamorphic prism pair, and / or a Dove prism, or a prism pair consisting of an anamorphic prism and an anamorphic Dove prism. The beam rotating device can, in particular, be configured to rotate at least one prism of the beam generating device, preferably the anamorphic prism pair, or the Dove prism, or the prism pair consisting of the anamorphic prism and the anamorphic Dove prism, about the beam axis. Alternatively or additionally, the beam generating device can comprise at least one diffractive optical element (DOE), in particular a plurality of diffractive optical elements, for generating the non-rotationally symmetric beam profile.The beam rotation device can in particular be configured to rotate at least one diffractive optical element of the beam generation device about the beam axis.
[0020] The manufacturing device is preferably configured for selective laser sintering. Alternatively or additionally, the manufacturing device is configured for selective laser melting. These configurations of the manufacturing device have proven particularly advantageous.
[0021] An irradiation vector is understood, in particular, to be a continuous, preferably linear displacement of the energy beam over a specific distance with a specific displacement direction. The irradiation vector includes, in particular, the direction or orientation of the displacement, i.e., the vector orientation. The irradiation vector need not be formed as a straight line segment; rather, an irradiation vector can also follow a line or curve that is at least partially curved.
[0022] According to a further development of the invention, the control device is configured to use a correction function dependent on the angle of rotation of the beam rotation device to correct the control of the scanner device. This represents a simple, functional, and precise way of correcting the control.
[0023] In one embodiment, the correction function is a correction curve in the form of support points, in particular including an interpolation between the support points. In another embodiment, the correction function is an analytical function. In another embodiment, the correction function is a table or assignment, in particular a lookup table or conversion table, which includes correction values for the control as a function of the current angle of rotation.
[0024] In one embodiment, the correction function additionally depends on the control of the scanner device itself. In this way, distortions, especially in peripheral areas remote from the center of the working area, can be advantageously reduced, preferably avoided.
[0025] According to a further development of the invention, a function is used as the correction function that additionally depends on the control history of the beam rotation device. This advantageously compensates for hysteresis in the angle-dependent wobble behavior of the beam profile, for example, caused by the mechanics of the beam rotation device, in particular by play in the mechanics.
[0026] Alternatively or additionally, a function that also depends on the direction of rotation of the beam rotation device is used as the correction function. This represents a particularly suitable option for compensating for the hysteresis in the angle-dependent wobble behavior of the beam profile.
[0027] Alternatively, a function averaged over both rotation directions of the beam rotation device is used as the correction function. This represents a particularly simple and low-computational-intensive option for at least approximately compensating for the hysteresis in the angle-dependent wobble behavior of the beam profile.
[0028] According to a further development of the invention, the jet rotation device is configured to rotate the jet profile only in exactly one predetermined direction of rotation. This advantageously avoids hysteresis in the angle-dependent wobble behavior of the jet profile, so that no compensation is required. This design is therefore particularly simple. In particular, however, in this case, the jet rotation device is configured to effect continuous or unlimited rotation of the jet profile—in particular without a stop—in the predetermined direction of rotation, so that, in particular, any desired angle of rotation can be achieved at any time.
[0029] The object is also achieved by creating a method, also referred to as a manufacturing method, for the additive manufacturing of components from a powder material, wherein a rotation angle of a beam profile that is not rotationally symmetrical about a beam axis of an energy beam is adjusted around the beam axis, wherein the energy beam is displaced to a plurality of beam positions in a work area so that the work area is locally selectively irradiated with the energy beam at the beam positions in order to produce a component from the powder material arranged in the work area by means of the energy beam, and wherein a correction of the control of the beam positions takes place depending on the adjusted rotation angle. In connection with the manufacturing method, in particular those advantages arise that have already been described in connection with the manufacturing device.
[0030] The fact that the angle of rotation of the beam profile is adjusted means in particular that the angle of rotation is changed during the manufacturing process. A laser beam or an electron beam is preferably used as the energy beam.
[0031] Preferably, the component is manufactured by means of selective laser sintering and / or selective laser melting.
[0032] As powder material, a metallic or ceramic powder can preferably be used.
[0033] According to a further development of the invention, it is provided that a correction vector is assigned to the beam positions depending on the set angle of rotation.
[0034] In one embodiment, each beam position is assigned the same angle-dependent correction vector depending on the set angle of rotation. In another embodiment, the correction vector is dependent on the beam position in addition to the angle of rotation. In particular, distortions, especially in the edge regions of the working area, can be reduced, preferably avoided, in this way.
[0035] In particular, the correction vector is assigned to the beam positions depending on the set angle of rotation using a correction function. In one embodiment, the correction function is a correction curve in the form of support points, in particular including an interpolation between the support points. In another embodiment, the correction function is an analytical function. In another embodiment, the correction function is a table or assignment that includes correction values for the control depending on the current angle of rotation.
[0036] The object is finally also achieved by providing a method, also referred to as a determination method, for determining a correction function for the angle-dependent control of a scanner device in a manufacturing device according to the invention or a manufacturing device according to one or more of the previously described embodiments, or for the angle-dependent control of beam positions in a method according to the invention or a manufacturing method according to one or more of the previously described embodiments, wherein a deviation of an actual profile position, in particular of the center of gravity, of the beam profile from a desired profile position, in particular of the center of gravity, of the beam profile on the work area, is determined, which deviation is dependent on a rotation angle of a beam rotation device configured to rotate a beam profile of the energy beam that is not rotationally symmetrical about a beam axis of an energy beam, around the beam axis,and wherein the correction function is determined based on the determined angle-dependent deviation. In connection with the determination method, the advantages that have already been described in connection with the manufacturing device or the manufacturing process arise in particular.
[0037] According to a further development of the invention, it is provided that a fixed beam position for the energy beam is specified for a scanner device of a manufacturing device, which determines the desired profile position of the beam profile on the work area, wherein the beam profile is rotated about the beam axis at the fixed beam position by means of the beam rotation device, and wherein the actual profile position of the beam profile on the work area is determined as a function of the angle of rotation of the beam rotation device.
[0038] In one embodiment, this is performed at exactly one fixed beam position—in particular, centrally or centrally within the work area—where the correction function obtained based on the angle-dependent deviations of the actual profile positions from the target profile position determined at the fixed beam position is used for all beam positions within the work area. In another embodiment, the determination method is performed at a plurality of fixed beam positions within the work area, where the correction function is additionally obtained as a function of the respective beam position, or where different correction functions are obtained for different beam positions.
[0039] According to a further development of the invention, the actual profile position of the beam profile is determined by means of a sensor device arranged in the working area. This represents a particularly precise and at the same time simple embodiment of the determination method, in particular since the respective actual profile position can be determined directly by the sensor device arranged in the working area. In particular, the respective actual profile position is directly identical to the respective position of the beam profile on the sensor device.
[0040] In another embodiment, it is also possible for the actual profile position in the work area to be detected by a sensor device arranged outside the work area and aligned with the work area, for example, a powder bed camera. In one embodiment, the sensor device is designed as a camera. In another embodiment, the sensor device can be designed as a substrate plate that can be arranged in the work area and has a plurality of light-sensitive cells, in particular photodiodes, arranged on or at the substrate plate or integrated into the substrate plate.
[0041] According to a further development of the invention, prior to a first determination of the actual profile position, a relative position is determined between a machine coordinate system of the manufacturing device specified by the scanner device and a sensor coordinate system of the sensor device—in particular arranged in the work area. Advantageously, in this way, the actual profile position can be detected directly in the machine coordinate system by the sensor device, or the actual profile position in the machine coordinate system can be easily calculated from the actual profile position detected in the sensor coordinate system. In any case, this enables a highly precise correction of the angle-dependent deviation of the actual profile position from the target profile position.
[0042] In particular, in one embodiment, a transformation between the sensor coordinate system and the machine coordinate system is determined, and the transformation is taken into account or applied when determining the actual profile position, so that the actual profile position is determined directly in the machine coordinate system or can be calculated back to its position in the machine coordinate system.
[0043] Alternatively or additionally, it is possible to correct the relative position between the machine coordinate system and the sensor coordinate system, in particular by suitably aligning the sensor device relative to the manufacturing device. In this way, in the optimal case, the sensor coordinate system can be aligned with the machine coordinate system, or at least a deviation between the sensor coordinate system and the machine coordinate system can be minimized.
[0044] In one embodiment of the determination method, the actual profile position is first recorded by the sensor device over a predetermined measurement time at the fixed beam position without rotating the beam profile. In particular, measurement noise of the sensor device is determined in this way. Preferably, a filter is generated based on the determined measurement noise, which is used to filter the subsequently acquired signals of the sensor device. This advantageously allows a very low-noise signal to be obtained.
[0045] Subsequently, the relative position between the machine coordinate system and the sensor coordinate system is preferably determined, in particular by deflecting the energy beam in the positive and negative x-direction and also in the positive and negative y-direction over the work area, in particular in such a way that an axis cross is imaged in the sensor device. From this, a translation and rotation between the machine coordinate system and the sensor coordinate system can then be calculated and, in particular, compensated.
[0046] The beam profile is then preferably rotated continuously by means of the beam rotation device, in particular at a constant rotational speed, with the actual profile position of the beam profile being recorded at a predetermined, constant measurement frequency. The lower the rotational speed or the higher the measurement frequency, the higher the number of recorded measurement points. Alternatively, it is possible to approach individual rotation angles in a targeted manner, with the respective actual profile position being recorded in a stationary manner.
[0047] According to a further development of the invention, the correction function is obtained by interpolating the angle-dependent deviation. In particular, the correction function is obtained in this way as a correction curve in the form of support points, including the interpolation between the support points. This represents a particularly simple and, preferably, accurate embodiment of the method, especially when a sufficient number of support points are used. In particular, this embodiment of the method enables simple calculation of the correction function, depending on the interpolation used.
[0048] Alternatively, it is provided that the correction function is obtained by adapting an analytical function to the angle-dependent deviation, wherein the correction function is obtained as the adapted analytical function. Advantageously, in this way, an analytical correction can be calculated for any desired angle of rotation, which in particular is all the more accurate the more complex the analytical function is. Another advantage of this embodiment of the method is that the memory requirement is low, since only a formula is stored instead of support points. Alternatively, it is provided that the angle-dependent deviation itself is obtained as the correction function. In particular, in this way the correction function is obtained as a table or assignment that includes correction values for the control as a function of the current angle of rotation. This represents a particularly simple and low-computational-intensive embodiment of the method.
[0049] According to a further development of the invention, a separate angle-dependent deviation is determined for each direction of rotation of the jet rotation device. In particular, this allows for compensating for hysteresis in the tumbling behavior of the jet profile.
[0050] Alternatively, the beam rotation device is rotated exclusively in a specific direction to determine the angle-dependent deviation. In particular, this avoids hysteresis in the wobble behavior of the beam profile, eliminating the need for hysteresis compensation.
[0051] According to a further development of the invention, a first angle-dependent deviation is determined for a first direction of rotation of the beam rotation device, and a second angle-dependent deviation is determined for a second direction of rotation of the beam rotation device that differs from the first direction of rotation. The correction function is obtained by averaging the first angle-dependent deviation and the second angle-dependent deviation. This represents a comparatively simple method for hysteresis compensation.
[0052] Alternatively, the correction function can be a first correction function assigned to the first direction of rotation based on the first angle-dependent deviation, and a second correction function assigned to the second direction of rotation based on the second angle-dependent deviation. This represents a particularly precise method for hysteresis compensation.
[0053] The invention is explained in more detail below with reference to the drawings, which show:
[0054] Figure 1 is a schematic representation of an embodiment of a
[0055] Manufacturing device, and Figure 2 is a schematic representation of an embodiment of a method for determining a correction function for the angle-dependent control of a scanner device of the manufacturing device.
[0056] Fig. 1 shows a schematic representation of an embodiment of a manufacturing device 1 for the additive manufacturing of components 3 from a powder material.
[0057] The manufacturing device 1 has a beam generation device 5 that is configured to generate an energy beam 7 having a beam profile 8 that is not rotationally symmetrical about a beam axis A of the energy beam 7, in particular having a first, larger width B1 along a y-direction on a work area 11 of the manufacturing device 1 and having a second, smaller width B2 along an x-direction on the work area 11. The manufacturing device 1 also has a beam rotation device 15 that is configured to rotate the beam profile 8 of the energy beam 7 about the beam axis A. For this purpose, the beam rotation device 15 preferably has an optic 17 that is rotatably mounted in a pivot bearing 21 and can, for example, comprise a Dove prism or an anamorphic Dove prism.Furthermore, the manufacturing device 1 has a scanner device 9, which is configured to displace the energy beam 7—in particular by means of a scanner 13—in the work area 11 and to irradiate the work area 11 locally and selectively with the energy beam 7 in order to produce the component 3 from the powder material arranged in the work area 11 by means of the energy beam 7. In particular, an arrow P indicates an irradiation vector in the direction of which the beam profile 8 is displaced by means of the scanner device 9. During the production of the component 3, the work area 11 is exposed to a plurality of such irradiation vectors, wherein the irradiation vectors in particular have different orientations. The beam rotation device 15 serves in particular to align the beam profile 8 relative to a respective orientation of the respective irradiation vector.The manufacturing device 1 also has a control device 19 which is operatively connected to the beam rotation device 15 and to the scanner device 9 and is configured to control the beam rotation device 15 and the scanner device 9, wherein the control device 19 is configured to correct a control of the scanner device 9 depending on a current angle of rotation of the beam rotation device 15.
[0058] In particular, if the beam axis A is not aligned completely precisely relative to a rotation axis of the beam rotation device 15, a rotation of the beam profile 8 results in a displacement of the beam profile on the scanner 13 and thus, as a result, an undesirable wobbling movement of a center of gravity of the beam profile 8 on the work area 11. This wobbling movement can advantageously be at least largely, preferably completely, compensated for by the angle-dependent correction of the control of the scanner device 9. For this purpose, the control of the scanner device 9 is preferably corrected both in the x-direction and in the y-direction in such a way that the center of gravity of the beam profile 8 - with the uncorrected control of the scanner device 9 maintained - always lies on the same point on the work area 11, determined by the uncorrected control of the scanner device 9, due to the correction, regardless of the angle of rotation.
[0059] The control device 19 is preferably configured to use a correction function dependent on the angle of rotation of the beam rotating device 15 for correcting the control of the scanner device 9.
[0060] In particular, a function is used as the correction function that additionally depends on a history of the control of the beam rotation device 15 and / or on a direction of rotation of the beam rotation device 15. Alternatively, a function averaged over both directions of rotation of the beam rotation device 15 is used as the correction function.
[0061] Alternatively, the beam rotation device 15 is configured to rotate the beam profile 8 only in a predetermined direction of rotation, wherein in particular an endless rotation in the predetermined direction of rotation is possible.
[0062] Within the scope of a method, also referred to as a manufacturing method, for the additive manufacturing of a component 3 from the powder material, in particular a rotation angle of the beam profile 8 about the beam axis A is set, in particular changed, wherein the energy beam 7 is displaced to a plurality of beam positions in the work area 11, so that the work area 11 is locally selectively irradiated with the energy beam 7 at the beam positions in order to produce the component 3 from the powder material arranged in the work area 11 by means of the energy beam 7. In this case, a correction of the control of the beam positions is carried out depending on the set rotation angle.
[0063] In particular, a correction vector, in particular based on a correction function, is assigned to the beam positions depending on the set angle of rotation. Fig. 2 shows a schematic representation of an embodiment of a method, also referred to as a determination method, for determining a correction function f for the angle-dependent control of the scanner device 9 of the production device 1.
[0064] Identical and functionally identical elements are provided with the same reference symbols in all figures, so that reference is made to the preceding description in each case.
[0065] Within the scope of the determination method, a deviation of an actual profile position 23, in particular a center of gravity of the beam profile 8, from a target profile position 25 of the center of gravity of the beam profile 8 on the working area 11 is determined, which deviation is dependent on the angle of rotation of the beam profile 8 about the beam axis A, wherein the correction function f is determined based on the determined angle-dependent deviation. For the sake of better clarity, only one actual profile position 23 is identified with the corresponding reference symbol in Figure 2. In particular, the deviation is determined as a deviation vector with a first deviation component Ax along the x-coordinate and a second deviation component Ay along the y-coordinate on the working area 11.
[0066] In particular, a fixed beam position for the energy beam 7 is specified for the scanner device 9, which determines the target profile position 25 of the beam profile 8 on the work area 11—here at the origin of the illustrated machine coordinate system at x = 0 and y = 0. The beam profile 8 is rotated around the beam axis A at the fixed beam position by means of the beam rotation device 15, whereby the actual profile position 23 of the beam profile 8 on the work area 11 is determined as a function of the angle of rotation of the beam rotation device 9.
[0067] In particular, the actual profile position 23 of the beam profile 8 is determined by means of a sensor device 21 arranged in the working area 11 and indicated schematically in Figure 1.
[0068] Preferably, before a first determination of the actual profile position 23, a relative position between a machine coordinate system of the manufacturing device 1 specified by the scanner device 9 and a sensor coordinate system of the sensor device 21 is determined, so that the actual profile position 23 can then be determined directly in the machine coordinate system. A first embodiment of the determination method is shown in a), in which the correction function f is obtained by interpolating the angle-dependent deviations.
[0069] At the same time, in the embodiment shown in a), it is provided that - in particular for the purpose of hysteresis compensation - a separate angle-dependent deviation is determined for each direction of rotation of the beam rotation device 15, wherein in particular for a first direction of rotation of the beam rotation device 15 - in particular starting from the point marked S by a full 360° counterclockwise to the point marked E - a first angle-dependent deviation is determined, wherein for a second direction of rotation of the beam rotation device 15, which is different from the first direction of rotation - in particular back, starting from the point marked E by a full 360° counterclockwise to the point marked S - a second angle-dependent deviation is determined, and wherein as the correction function f, a first correction function fl assigned to the first direction of rotation is determined on the basis of the first angle-dependent deviation,and a second correction function f2 associated with the second direction of rotation is obtained from the second angle-dependent deviation.
[0070] Alternatively, it is possible for the beam rotation device 15 to be rotated exclusively in a specific direction of rotation to determine the angle-dependent deviation, so that only one correction function f is obtained and no hysteresis compensation is required.
[0071] In b), a second embodiment of the determination method is shown, in which the correction function f is obtained by adapting an analytical function, here an ellipse, to the angle-dependent deviation, wherein the correction function f is obtained in particular as the adapted analytical function.
[0072] At the same time, the embodiment shown in b) provides that an average of the first angle-dependent deviation and the second angle-dependent deviation is used to determine the correction function f. In particular, b) shows an average curve of the first and second angle-dependent deviations shown in a).
Claims
CLAIMS 1. A manufacturing device (1) for the additive manufacturing of components (3) from a powder material, comprising a beam generation device (5) configured to generate an energy beam (7) having a beam profile (8) that is not rotationally symmetrical about a beam axis (A) of the energy beam (7), a beam rotation device (15) configured to rotate the beam profile (8) of the energy beam (7) about the beam axis (A), a scanner device (9) configured to displace the energy beam (7) in a work area (11) and to irradiate the work area (11) locally and selectively with the energy beam (7) in order to produce a component (3) from the powder material arranged in the work area (11) by means of the energy beam (7), and a control device (19) operatively connected to the beam rotation device (15) and to the scanner device (9) and configured to control the beam rotation device (15). and to control the scanner device (9),wherein the control device (19) is configured to correct a control of the scanner device (9) depending on a current angle of rotation of the beam rotation device (15).
2. Manufacturing device (1) according to claim 1, wherein the control device (19) is configured to use a correction function (f) dependent on the angle of rotation of the beam rotating device (15) for correcting the control of the scanner device (9).
3. Manufacturing device (1) according to claim 2, wherein a function is used as the correction function (f) which additionally depends on a history of the control of the beam rotation device (15) and / or on a direction of rotation of the beam rotation device (15), or wherein a function averaged over both directions of rotation of the beam rotation device (15) is used as the correction function (f).
4. Manufacturing device (1) according to one of the preceding claims, wherein the beam rotation device (15) is arranged to rotate the beam profile (8) only in a predetermined direction of rotation.
5. A method for the additive manufacturing of components (3) from a powder material, wherein an angle of rotation of a beam profile (8) that is not rotationally symmetrical about a beam axis (A) of an energy beam (7) is set about the beam axis (A), wherein the energy beam (7) is displaced to a plurality of beam positions in a work area (11) so that the work area (11) is irradiated locally selectively at the beam positions with the energy beam (7) in order to produce a component (3) from the powder material arranged in the work area (11) by means of the energy beam (7), wherein a correction of the control of the beam positions takes place as a function of the set angle of rotation.
6. The method according to claim 5, wherein a correction vector, in particular based on a correction function, is assigned to the beam positions as a function of the set angle of rotation.
7. A method for determining a correction function (f) for the angle-dependent control of a scanner device (9) in a manufacturing device (1) according to one of claims 1 to 4, or for the angle-dependent control of beam positions in a method according to one of claims 5 or 6, wherein a deviation of an actual profile position (23) of the beam profile (8) from a desired profile position (25) of the beam profile (8) on the work area (11) is determined, said deviation being dependent on a rotation angle of a beam rotation device (15) set up to rotate a beam profile (8) of the energy beam (7) that is not rotationally symmetrical about a beam axis (A) of an energy beam (7) about the beam axis (A), and wherein the correction function (f) is determined on the basis of the determined angle-dependent deviation.
8. The method according to claim 7, wherein - a fixed beam position for the energy beam (7) is specified for a scanner device (9) of a manufacturing device (1), which determines the target profile position (25) of the beam profile (8) on the work area (11), wherein the beam profile (8) is rotated about the beam axis (A) at the fixed beam position by means of the beam rotation device (15), wherein the actual profile position (23) of the beam profile (8) on the work area (11) is determined as a function of the angle of rotation of the beam rotation device (15).
9. Method according to one of claims 7 or 8, wherein the actual profile position (23) of the beam profile (8) is determined by means of a sensor device (21) arranged in the working area (11).
10. The method according to claim 9, wherein before a first determination of the actual profile position (23) a relative position between a machine coordinate system of the manufacturing device (1) predetermined by the scanner device (9) and a sensor coordinate system of the sensor device (21) is determined.
11. Method according to one of claims 7 to 10, wherein the correction function (f) is - Interpolation of the angle-dependent deviation, or - Fitting an analytical function to the angle-dependent deviation, whereby the correction function (f) is obtained as the fitted analytical function.
12. The method according to any one of claims 7 to 11, wherein - a separate angle-dependent deviation is determined for each direction of rotation of the beam rotating device (15), or wherein the beam rotating device (15) is rotated exclusively in a specific direction of rotation to determine the angle-dependent deviation.
13. The method according to claim 12, wherein a first angle-dependent deviation is determined for a first direction of rotation of the beam rotating device (15), wherein a second angle-dependent deviation is determined for a second direction of rotation of the beam rotating device (15) which is different from the first direction of rotation, and wherein the correction function (f) is obtained by averaging the first angle-dependent deviation and the second angle-dependent deviation, or wherein a first correction function (f1) assigned to the first direction of rotation is obtained on the basis of the first angle-dependent deviation, and a second correction function (f2) assigned to the second direction of rotation is obtained on the basis of the second angle-dependent deviation.