System for controlling the processing of microelectronic devices

Abstract

Systems and devices for monitoring and controlling the processing of a substrate are disclosed. An aspect of the device comprises a housing having a protective door on a front side, a sealed module door and a wet parts cabinet formed between the protective door and the sealed module door. The device also comprises a plurality of analytical modules which are installed on the sealed module door, each of the analytical module comprising multiple workstations and devices configured for different types of analysis, wherein the components of the multiple workstations and devices are located in the wet parts cabinet. The device also comprises an electrical cabinet configured behind the sealed module doors which is configured to comprise electrical components for controlling the operation of the workstations and devices. The chemical cabinets of the device are configured for storing and providing the chemicals required the analysis running through the workstations. A user interface is configured for connecting with one or more computing devices, wherein the analysis can be monitored and controlled through the computing devices.

Description

[0001] SYSTEM FOR CONTROLLING THE PROCESSING OF MICROELECTRONIC DEVICES

[0002] FIELD OF THE INVENTION

[0003] The disclosure herein relates to a system for controlling the manufacture of microelectronic substrates. In particular, a system for monitoring and controlling the processing of substrates using electrolytic, electroless and electrochemical techniques is described. Specifically, it is intended for applications in the semiconductor industry for analysis / control of the concentration of the processing bath components.

[0004] BACKGROUND OF THE INVENTION

[0005] Microelectronic devices are manufactured by depositing and removing multiple layers of materials on a substrate such as a silicon wafer to produce a large number of individual devices. For example, layers of photoresist, conductive materials, and dielectric materials are deposited, patterned, etched, planarized, and so forth to form features in and / or on a substrate. The features are arranged to form integrated circuits (ICs), MEMS, and other microelectronic structures.

[0006] Wet chemical processes are commonly used to form features on microelectronic substrates. Wet chemical processes are generally performed in wet chemical processing tools that have multiple processing chambers for combinations of cleaning, etching, electrochemical deposition, and rinsing. Electrochemical deposition processes include electrolytic deposition, in which current is applied to the substrate, and electroless deposition, where no external current is supplied to the substrate.

[0007] It is customary to include the ability to monitor the chemical constituents or chemical activity of an electrolyte that is being used in one of the aforementioned processes. This is done in order to control the concentrations of the chemical constituents of the electrolyte in such a way as to maintain consistent processing of multiple substrates as the electrolyte is used throughout its lifetime. Commonly, analytical techniques must be developed specifically for each component of an electrolyte in the particular combination and concentrations of constituents that are present in that particular electrolyte. The methods for monitoring the constituents of an electrolyte involve electroanalytical methods. A number of methods known for monitoring the constituents of an electrolyte involves electroanalytical methods. Titration (also known as titrimetric and volumetric analysis) is a very common absolute method of quantitative chemical analysis to determine the concentration of an identified / known substance with a very good accuracy. Electrochemical analysis utilizes potential / current to reduce / plate and oxidize / strip a metal component onto / off of a Rotating Disc Electrode (RDE). Absorption spectrophotometry takes advantage of the different photophysical characteristics of different chemical species. By transmitting light through a sample and analyzing the transmitted intensity over a wide wavelength range, the concentration of a specific species can be determined. High- performance liquid chromatography (HPLC) works by separating and detecting single bath components. It analyzes organic additives, complexing agents, breakdown products and leached-in photoresist.

[0008] Classically, a separate electroanalytical method is utilized to represent the concentration of each known constituent within the electrolyte. It can be time-consuming and expensive to design the analysis techniques or methods using electroanalytical, HPLC, titration, NIR Spectroscopy techniques, etc. for each of the constituents of an electrolyte. Furthermore, some commercial additives have two or more components and it may not be possible to separate them without prior knowledge of the chemical species. Monitoring of each of the chemical constituents of these electrolytes can be complex due to the multiple interactions that can occur between the constituents as their respective concentrations change and as the electrolyte ages. Aging of the electrolyte may result in the breakdown of one or more of its constituents due to oxidation, reduction, or catalytic activity, or it may involve interactions with the hardware or substrates that come into contact with the electrolyte over its lifetime, or other contamination.

[0009] Thus, there is a need for a device or a system which can allow the monitoring and controlling of these electrochemical techniques during High Volume Manufacturing (HVM), in clean room environment and within a single structure. Further, the device or the system should be adaptable to different electrochemical techniques. The invention described herein addresses the above-described needs. SUMMARY OF THE EMBODIMENTS

[0010] In one aspect of the invention, a system for monitoring and controiling the processing of a microelectronic substrate is disclosed. The system is modular, flexible, scalable and configured to be connected with similar systems to form a larger system. The system allows full access to the data collected and generated by the measurements and analytical methods. This enables better characterization, troubleshooting, and process improvement.

[0011] In one aspect of the invention, the system comprises a housing having at least one protective door on a front side, a sealed module door and a wet parts cabinet formed between said at least one protective door and said sealed module door. The system also comprises a plurality of analytical modules each comprising multiple workstations and devices and configured for different types of analysis, wherein said analytical modules are installed on the sealed module door and components of said multiple workstations and devices are located in the wet parts cabinet. The system further comprises an electrical cabinet configured behind the sealed module doors, wherein the electrical cabinet is configured to comprise electrical components for controlling the operation of the workstations and devices. The system also comprises one or more chemical cabinets for storing and providing the chemicals required the analysis running through the workstations. A user interface is configured for connecting with one or more computing devices, wherein the analysis can be monitored and controlled through the computing devices.

[0012] As appropriate, a negative pressure is maintained in the wet parts cabinet and an overpressure is maintained in the electrical cabinet.

[0013] As appropriate, the different types of analysis include inorganic bath components analysis and organic components analysis.

[0014] As appropriate, the different types of analysis are characterized by different sampling rates. In another aspect of the invention, the system further comprising one or more chemical buffer cabinets which are configured to control the quantity of chemicals supplied for analysis.

[0015] As appropriate, the wet parts cabinet, the chemical cabinets and chemical buffer cabinets are connectable and have a common negative pressure environment.

[0016] As appropriate, the chemical cabinets and the chemical buffer cabinets have common or separate one or more protective doors.

[0017] As appropriate, one or more of analytical modules have pre-determined configurations and / or are pre-assembled before installing on the module door.

[0018] As appropriate, the analytical modules comprise a Lego-like structure having standard workstations and devices installed on it.

[0019] As appropriate, each of the analytical modules includes a sealed plate and the multiple workstations and devices are installed thereon.

[0020] As appropriate, the sealed plate is fabricated from a metal coating.

[0021] As appropriate, the sealed module door is formed by a frame and the sealed plates.

[0022] As appropriate, at least one of the analytical modules has one or more handles, wherein at least a part of the handles is configured to be disassembled.

[0023] As appropriate, electric terminals of the multiple workstations and devices are located in the electrical cabinet.

[0024] As appropriate, the sealed module door further comprises an empty plate, wherein the empty plate has substantially the same dimensions as analytical modules plates and the empty plate is configured to be re-placeable by a custom-based analytical module.

[0025] As appropriate, the multiple workstations comprise one or more of a Titration workstation, an Electrochemical Analysis - CVS workstation, a High Pressure Liquid Chromatography (HPLC) workstation and a Spectrophotometry workstation. According to another aspect of the invention, the multiple devices further comprise one or more sample valves configured to provide chemical samples to the workstations for execution of the analysis.

[0026] As appropriate, the sample valves comprise a switching mechanism for switching to a required chemical source, wherein the switching is done either automatically or manually by a trained operator.

[0027] As appropriate, the sample valves comprise multi-way valves configured to provide chemical samples to the workstations by means of a dosing device, a pump or through pressurized liquid, wherein the multi-way valves are 6-way valves.

[0028] According to further aspect of the invention, the system further comprises a memory unit configured to store configurations and parameters of the analysis running through the workstations.

[0029] As appropriate, the chemical buffer cabinet comprises one or more chemical buffer vessels which stores the chemicals, wherein the chemical buffer vessels are automatically refilled by peristaltic pumps from chemical storage containers stored in the chemical cabinets.

[0030] As appropriate, the chemical storage containers are contained in the retractable shelfs.

[0031] In yet another aspect of the invention, the system further comprises a chemical bulk container connected to an external chemical supply line and configured to reduce temperature effects by providing fresh filled Virgin Makeup solution (VMS).

[0032] As appropriate, the electrical cabinet is configured to control the power provided to the workstations ensuring controlled execution of the inorganic bath components analysis and organic components analysis.

[0033] As appropriate, the electrical cabinet is further configured to provide interconnectivity between the workstations for executing the analysis. As appropriate, the workstation further comprises a dosing device configured to dose small to medium volumes of chemicals required for analysis with high precision.

[0034] As appropriate, the dosing device comprises a bubble sensor configured for monitoring the chemicals for air bubbles.

[0035] As appropriate, each of the sealed module doors comprises a seal strip on its frame perimeter for sealing the wet parts cabinet from the electrical cabinet while the sealed door is closed.

[0036] As appropriate, the seal strip is configured to maintain different pressure conditions in the wet parts cabinet and the corresponding electrical cabinet.

[0037] As appropriate, negative pressure is maintained in the wet parts cabinet to prevent leakage of chemicals to the electrical cabinet and from the system.

[0038] As appropriate, overpressure is maintained in the electrical cabinet to avoid intrusion of chemical vapours and dust, wherein the overpressure is maintained in the electrical cabinet through a fan provided on an upper side of the system.

[0039] In a further aspect of the invention, the system also comprises a ventilation exhaust for sucking out the air from the wet parts cabinet and the chemical cabinet.

[0040] As appropriate, at least one protective door is installed with a gap enabling air circulation by suction of ambient air into the wet parts cabinet.

[0041] As appropriate, at least one protective door is transparent, semi-transparent or nontransparent.

[0042] As appropriate, the protective doors are designed as foldable dual section doors to decrease footprint while opening.

[0043] As appropriate, the protective doors are configured for opening by about 90 degrees. As appropriate, the protective doors are provided with stopper to fix thereof in the opened position.

[0044] According to another aspect of the invention, the system further comprises a pressure sensor configured to detect pressure values in the wet parts cabinets and the chemical cabinets. The system also comprises an operation indicator for displaying the pressure sensor values in a color-coded format.

[0045] As appropriate, the wet parts cabinet comprises a leakage sensor configured to detect the leakage of chemicals from the wet parts cabinet.

[0046] As appropriate, the leakage condition is displayed though an optical indicator on the leakage sensor in a color-coded format.

[0047] In yet another aspect of the invention, the system further comprises a safety locking mechanism for locking different parts of the system including the wet parts cabinets, electrical cabinets, chemical buffer and chemical cabinets.

[0048] As appropriate, the computing device comprises a foldable keyboard and a rotatable screen to provide minimum footprint during operation of the system.

[0049] In a further aspect of the invention, the system also comprises a slipstream valve block configured to protect the system from outside by regulating and adjusting the flow in the incoming and outgoing slipstream lines, wherein slipstream valves of the slipstream valve block have a provision of measuring the said flow to ensure specific flow value for optimum system performance is maintained.

[0050] As appropriate, the slipstream valve block comprises a pneumatic control connected to an actuator circuit and configured to close automatically in the event of a shutdown. BRIEF DESCRIPTION OF THE FIGURES

[0051] For a better understanding of the embodiments and to show how it may be carried into effect, reference will now be made, purely by way of example, to the accompanying drawings.

[0052] With specific reference now to the drawings in detail, it is stressed that the particulars shown are by way of example and for purposes of illustrative discussion of selected embodiments only and are presented in the cause of providing what is believed to be the most useful and readily understood description of the principles and conceptual aspects. In this regard, no attempt is made to show structural details in more detail than is necessary for a fundamental understanding; the description taken with the drawings making apparent to those skilled in the art how the various selected embodiments may be put into practice. In the accompanying drawings:

[0053] Fig. 1 illustrates the front view of a system 100 configured to monitor and control the electrochemical techniques according to an aspect of the invention;

[0054] Fig. 2A illustrates the outer dimensions of a "dual-cluster” device 200a according to an exemplary embodiment of the invention;

[0055] Figs. 2B and 2C illustrate schematic views of the dual-cluster devices 200b and 200c according to other aspects of the invention;

[0056] Fig. 2D illustrates schematic views of a single-cluster device 200d according to another aspect of the invention;

[0057] Fig. 3A illustrates an open structure view of a dual cluster process control device showing retractable shelfs;

[0058] Fig. 3B illustrates various chemical storage containers;

[0059] Fig. 4 illustrates an open structure view of the process control device with opened module door;

[0060] Fig. 5 illustrates a schematic front view of the process control device 500 showing the various structural components; Fig. 6A illustrates workstations in the wet parts cabinet in accordance with an embodiment of the invention;

[0061] Fig. 6B illustrate WS Sampling device positions on module door in wet parts cabinet in accordance with another embodiment of the invention;

[0062] Fig. 6C illustrates an exemplary WS Acid Cu device positions on module door in wet parts cabinet;

[0063] Figs. 7A and 7C illustrate devices in drawer of ChemBuffer cabinet 700 in accordance with another embodiment of the invention;

[0064] Fig. 7B illustrates a schematic front view of a ChemBuffer cabinet in a process control device 710;

[0065] Fig. 8 illustrates electric cabinet 800 behind the module door of the process control device;

[0066] Figs. 9A and 9B illustrate 6-way valves used in the process control device 900 in accordance with an embodiment of the invention;

[0067] Fig. 10 illustrates an operation indicator on the process control device;

[0068] Figs. 11 and 12 illustrate a leakage sensor in the wet parts cabinet;

[0069] Fig. 13A illustrates a ChemBulk container 1300;

[0070] Fig. 13B illustrates a dosing device containing bubble sensor for monitoring the liquid for air bubbles;

[0071] Figs. 14A, 14B and 14C illustrate Titration workstation, Electrochemical Analysis - CVS workstation and High Pressure Liquid Chromatography (HPLC) workstation, respectively;

[0072] Figs. 15 A and 15B illustrate locking for different parts of the process control device 1500;

[0073] Figs. 16A and 16B illustrate foldable keyboard and rotatable human machine (HM) interface, respectively; Figs. 17A and 17B illustrate a front side 1700 and a connection side 1710, respectively, of a slipstream valve block for protecting the process control device from the outside; and

[0074] Fig. 18 illustrates an exemplary system for implementing various aspects of the invention.

[0075] DESCRIPTION OF THE SELECTED EMBODIMENTS

[0076] Aspects of the present disclosure relate to a device or a system which can monitor and control the electrochemical techniques within a single structure. The system is flexible, scalable and tailored to the applications. The system comprises a Lego-like structure allowing different chemical analytical modules installed on it. Various metrology units may be installed as modular workstations for executing different electrochemical methods. Each workstation may perform defined tasks, such as analyzing, sampling, standard creation, etc. These workstations may be equipped as often as possible with identical devices and assemblies for simplified maintenance. The system might be a Wafer Level Packaging (WLP) Platform highly customizable and supporting multiple metals.

[0077] In particular embodiments of the system, the system may allow process control through liquid replenishment, solid replenishment (Direct Metal Replenishment (DMR)), Bleed & Feed to keep break down products and / or impurities below a desired range and might be used to Bleed & Replenish for ECP chemistries.

[0078] In other embodiments of the system, the system may comprise software for storing the configurations and parameters of the workstations. The processes of the workstations may be synchronized as per the applications. The software also enables updating, repair and maintenance of the workstations independently without effecting the operation of other modules.

[0079] As required, the detailed embodiments of the present invention are disclosed herein; however, it is to be understood that the disclosed embodiments are merely examples of the invention that may be embodied in various and alternative forms. The figures are not necessarily to scale; some features may be exaggerated or minimized to show details of particular components. Therefore, specific structural and functional details disclosed herein are not to be interpreted as limiting, but merely as a representative basis for teaching one skilled in the art to variously employ the present invention.

[0080] It is particularly noted that the systems and methods of the disclosure herein may not be limited in its application to the details of construction and the arrangement of the components or methods set forth in the description or illustrated in the drawings and examples. The systems and methods of the disclosure may be capable of other embodiments, or of being practiced and carried out in various ways and technologies.

[0081] Alternative methods and materials similar or equivalent to those described herein may be used in the practice or testing of embodiments of the disclosure. Nevertheless, particular methods and materials described herein for illustrative purposes only. The materials, methods, and examples not intended to be necessarily limiting. Accordingly, various embodiments may omit, substitute, or add various procedures or components as appropriate. For instance, the methods may be performed in an order different from described, and that various steps may be added, omitted or combined. In addition, aspects and components described with respect to certain embodiments may be combined in various other embodiments.

[0082] Reference is now made to Fig. 1 which illustrates the front view of a system 100 configured to monitor and control the electrochemical techniques according to an aspect of the invention. The system 100 comprises a process control device having a housing / frame 101 divided into number of compartments / cabinets and comprising (analytical) clusters (dual cluster configuration in the present example). The housing 101 has two transparent, semi-transparent or non-transparent (made of a metal) external protective doors 102 and 102’ that might be designed as foldable dual section doors (102a, 102b, 102’a and 102’b) to decrease footprint while opening. Protective doors 102 and 102’ preferably are not sealed and enable limited air circulation from the ambient. These protective doors 102 and 102’ are installed with a gap enabling air circulation by suction of ambient air into the cabinets. Each cluster is configured to occupy a number of modular workstations for executing different electrochemical methods as will be described further below. The housing 101 is flexible and scalable and might to occupy lesser or more number of analytical clusters (further clusters). Protective doors (102a, 102b, 102’a and 102’b) could be removable from its hinges for service / maintenance procedure. Protective doors ( 102a, 102b, 102’a and 102’b) could be provided by opening detectors (switches) that shut-down fully or partially the system operation for safety reasons.

[0083] Fig. 2A illustrates the outer dimensions of a housing of dual cluster device 200a according to an exemplary embodiment of the invention. The device 200a is shown to have the structure size of 1.27 X 0.56 meters. Figs. 2B and 2C illustrate schematic views of the dual cluster devices 200b and 200c with opened external protective doors according to other aspects of the invention. Fig. 2D illustrates schematic views of a single cluster device 200d according to another aspect of the invention. The cluster devices 200a-200d comprising buffer compartments are configured for damascene processing process control. It should be clearly understood that the above-mentioned dimensions and structural components are exemplary in nature and should not limit the scope of the invention. The device 101 is flexible to occupy any required number of clusters as per the applications.

[0084] Referring back to Fig. 1, the device 101 is connected to a human machine (HM) interface 103 via a connecting medium 104. The HM interface 103 may be a communication device such as a personal computer, a laptop, a mobile phone, a tablet, a paging device and the like. The communication device 103 may be connected to the process control device 101 via a wired or a wireless connecting medium 104. The wired medium may comprise Ethernet cables, fiber-optic cables, etc. The wireless medium may comprise one or more of Internet, Bluetooth network, Wired LAN, Wireless LAN, WiFi Network, Zigbee Network, Z-Wave Network or Ethernet Network. The HM interface 103 may be placed near to the process control device 101 and physically attached via a pivot handle 105 as shown in Fig. 1. Alternatively, the HM interface 103 may be placed at a location remote from the process control device 101. An HM interface may be connected to more than one process control device enabling a user to control different process control device through the same communication device. In a further embodiment, two or more HM interfaces may be connected to a single process control device enabling multiple operators to monitor and control the operations of the process control device.

[0085] The data of various electrochemical and analytical processes executed in the workstations, their chemical compositions and concentrations, desired and actual ranges, running conditions including errors and failures, replenishment needs, processes time (elapsed and remaining times), analysis results, etc. are transferred from the process control device 101 to the communication device 103. The communication device 103 may be configured to comprise a display screen enabling the operators to have full access to the data collected and generated by the measurements and analytical methods running in various workstations of the process control device 101. For example, the screen may provide information of the liquids used in an electrochemical process including their current levels, lower and upper threshold limits, deviation from the desired ranges, contamination levels, etc. The communication device 103 also enables processes to be controlled either directly through commands from the communication device 103 or by accessing the workstations of the process control device 101. The communication device 103 may also enable characterization, troubleshooting, and process improvement.

[0086] According to one aspect of the invention, the system 100 provides the advantage of occupying less footprint as it can be installed close to the wall and fully accessed from the front side during operation. All the internal compartments / modules of the device 101 can be accessed from the front side. The back side of the device 101 could be closed after assembling or repair of the workstations. The device can also be serviced or checked from the front side providing easy access to the operators.

[0087] Referring to Fig. 4 which illustrates an open structure view 400 of the process control device 401 with opened module door 402. Behind the module door 402 of Wet parts cabinet - compartment comprising chemical modules is located an electrical cabinet 407, including mainly low voltage electronic / electric modules (controllers, etc.) - illustrated are partially assembled low voltage modules.

[0088] Module door 402 has (rubber / silicon) seal strip 409 on its frame 409’ perimeter providing sealing the wet parts cabinet from the electrical cabinet while the module door 402 is closed.

[0089] The sealing 409 prevents contaminating electronic / electric modules by chemicals by creating different pressure conditions in these two compartments ~ under-pressure (relative to ambient) in wet parts cabinet and over-pressure in electrical cabinet.

[0090] The electrical cabinet 407 comprises low voltage electronic / electric modules (controllers, etc.), electric connectors in form of copper or optical cables, voltage / current stabilizers, regulators, protection circuits, switches, temperature and pressure controllers, etc. The electric cabinet 407 is configured to interconnect various clusters of the workstations. The electrical cabinet 407 also provides interconnectivity between different workstations for executing the applications. The electrical cabinet 407 controls the power provided to the various workstations ensuring controlled execution of the applications. The electric terminals of the multiple workstations and devices are located in the electrical cabinet 407.

[0091] The Wet parts cabinet preferably may contain negative pressure relative to ambient to avoid leakage of chemical to the electrical cabinet and from the system to the ambient. During operation, the operator is protected from chemical leakage by monitored protective doors. In case of leakage, the liquids are collected in a monitored secondary containment of the chemical cabinet 503 for further evacuation as illustrated in Fig. 5.

[0092] The air in the wet parts cabinet is continuously sucked out and replaced by outside air through an exhaust available on the device. Referring to Fig. 5, an exhaust 506 could be provided at the top of the device 500 (arrows in Fig. 10 show side and bottom locations of exhaust). The exhaust of the system is connectable to the exhaust system of FAB. The exhaust ventilation 506 is connected with the wet parts cabinet 501 and the chemical cabinet 503. In a preferred embodiment, the air in these cabinets is exchanged at least three times per minute. The pressure in the exhaust pipe of the ventilation 506 is detected by a pressure sensor. In particular embodiment, normally a pressure of 75-120 m3 / h (60-150 Pascal) is maintained at the sensor. If the pressure difference between the ambient pressure and the pressure in the exhaust pipe of the ventilation 506 is out of range, a pressure sensor detects it and displays on an operation indicator 505.

[0093] The workstations may be formed on the various sub-clusters for performing different electrochemical and analytical processes as shown in Figs. 14A, 14B and 14C. Each workstation performs defined tasks, such as analyzing, sampling, standard creation, etc. depending upon the application. For example, a Titration workstation 1400A may be formed from the clusters on the module door. Titration is a very common absolute method of quantitative chemical analysis to determine the concentration of an identified / known substance with a very good accuracy. The various Titration workstations may include an Acid-Base Titration Workstation, Photometric Titration (PHT) Workstation, Stability Index Workstation, Reduction / Oxidation Workstation, etc.

[0094] In an alternative embodiment, an Electrochemical Analysis - CVS workstation 1400B may be formed from the clusters on the module door. The Electrochemical Analysis technique utilizes potential / current to reduce / plate and oxidize / strip a metal component onto / off of a Rotating Disc Electrode (RDE). The current-voltage curves are measured and evaluated to get the analysis results. The various Electrochemical Analysis workstations may include an Accelerator / Leveller workstation, a Suppressor workstation, Inorganic Stability (Pb), workstation, etc.

[0095] In a further embodiment, a High Pressure Liquid Chromatography workstation 1400C may be formed from the clusters on the module door. HPLC works by separating and detecting single bath components. It analyzes organic additives, complexing agents, breakdown products and leached-in photoresist.

[0096] During operation, depending upon the respective workstation, liquids (chemicals, water, etc.) are moved into / within / out the wet parts cabinet. The liquids may be temporarily stored in containers, mixed, heated or cooled as per the requirements. All the liquids might be monitored and analyzed via various sensors located in the process control device. The different workstations could be equipped as often as possible with standard identical devices and assemblies for simplified maintenance. The process control device may also comprise a software for executing, controlling and modifying the processes on the process control device. The device configurations / parameters are stored in a memory of the process control device. The software also synchronizes the sequences within the clusters of each workstation and within different workstations. The software also allows the operator to add, remove, and modify the sequences executing in workstations. The software may also allow the operator to add, remove, and modify the applications executing in workstations.

[0097] Referring back to Fig. 5 which illustrates a schematic view of the process control device 500 showing the various structural components. The wet parts cabinet 501 is located behind the front doors comprising chemical modules (workstations), pipes, etc. assembled on the frame divided into standard sub-clusters. The device 500 comprises chemical cabinet 503 storing the various chemicals required for different processes running through workstations and / or replenishment. The chemical cabinet 503 supply chemicals to the workstations as per the required applications and timelines. The chemical cabinet 503 stores the required chemicals in holding apparatuses (e.g., containers, bottles). These holding apparatuses may be of any suitable material comprising, but not limited to, plastic, glass, steel, or any other metal which does not react and contaminate with the stored chemical. The device 500 also comprises a buffer cabinet 507 which is configured to control the quantity of chemicals supplied for inorganic (bath) components analysis, and organic components analysis. Fig. 3B illustrates exemplary chemical storage containers 303a, 303b and 303c. Preferably, in order to facilitate the convenient loading / unloading the chemical cabinet is provided by retractable shelf(s) 301 and 302 that allows convenient access and organization as illustrated in Fig. 3A. The chemical storage containers 303a, 303b and 303c are contained in the retractable shelf(s) 301 and 302. The chemical cabinet 503 and the buffer cabinet 507 have common or separate one or more protective doors to prevent the leakage and mixing of chemicals. In a particular embodiment of the invention, the wet parts cabinet, the chemical cabinets and chemical buffer cabinets are connectable and have a common negative pressure environment.

[0098] Referring now to Fig. 6A which illustrates workstations and devices on a module door 600 in the wet parts cabinet 602 in accordance with an embodiment of the invention. In a preferred embodiment, the wet parts cabinet 602 comprises two pre-assembled workstations 604 and 606 for inorganic and organic analysis, respectively. Empty sections or plates 608 and 608’ may also be provided on the module door 600 for customized options which enables a user to install additional modules from a list of provided modules. These empty plates 608 and 608’ have substantially the same dimensions as analytical modules plates. These additional modules may provide support for the ongoing inorganic or organic analysis. Furthermore, these additional modules may execute an application different from the ongoing inorganic and organic analysis in the workstations 604 and 606.

[0099] The workstations 604 and 606 may have pre-determined configuration and are preassembled and installed on the module door 600. Each workstation 604 and 606 may have one or more modules 610 for chemical analysis. The division between the modules is generally virtual. The module door 600 may have handles 612 on both sides of the door 600 for installing the workstation modules into the door frame. After installing the workstation modules 610, the handles are disassembled from the door 600 and only a single handle 612 is left for opening and closing the door 600. The workstations and devices may be installed on sealed metallic plates 604’ and 606’, which have lower cost than special clean room plastic. The sealed plates 604’ and 606’ may be fabricated from a metal coating. The external doors can also be made of a metal, smaller in size and could be opened by 90 degrees with stoppers to provide access to the system.

[0100] Each workstation 604 and 606 may contain one or more sample valves 614a and 614b configured to provide chemical samples to the workstations 604 and 606, respectively. For sampling, the sample valve switches to a requested sample source. The switching of sample valve may be done manually by a user trained to operate the process control device. The switching may be done via switches or levers provided in the workstations. Alternatively, the switching may be done through the communication device 103 (shown in Fig. 1). Further, the switching of the sample valves may be an automatic process depending upon the requirement of chemical samples for the executing application. Fig. 6B illustrates sample valve positions WS Sampling 1 616a and WS_Sampling_2 616b for analysis or inorganic additives and organic additives, respectively.

[0101] Figs. 9A and 9B illustrate 6-way valves used in the process control device to transfer liquids by means of a dosing device, pump or pressurized liquid. They can be used as sample valves for sample taking of different sources, distribution of water to different targets, etc. In an exemplary embodiment, a valve A 902 is of valve type with ’A" connector, mounted upright and valve B 904 is of valve type with Vs" connector, mounted sidewise. Depending on the application these valves are used in combination or as individual devices. Further, depending on the expected flow through, different tube and connector sizes are used on the inlet. The outlets are connected via tubes, e.g., 2 / 3mm tubes. The 6-way valves are controlled by their own control board, which is integrated in a Controller Area Network (CAN) bus.

[0102] Referring back to Fig. 6A, the chemical samples may be provided from chemical storage containers stored in the chemical cabinet. These samples could be provided to the workstations 604 and 606 with different sampling rates for inorganic and organic analysis. In such a scenario, two separate pipes from chemical sources may be provided for controlling the sample supply to the inorganic and organic workstations. In an exemplary embodiment, the inorganic analysis is faster than organic analysis and get sampling from source every 5 mins. Alternatively, the organic analysis may be faster than the inorganic analysis. Further, the inorganic and organic analysis may require sample sampling rates. In such a case, a single pipe from the chemical sources may supply chemical to the workstations 604 and 606.

[0103] Referring to Fig. 6C which illustrates an exemplary WS Acid Cu device positions 618 on module door in wet parts cabinet. The concentration of Copper (II) in galvanic copper baths is determined by Spectrometry. The concentration of Sulfuric acid in galvanic copper baths is determined by conductivity measurement. Table 1 below shows exemplary devices in workstation WS Acid Cu:

[0104] Table 1: Workstation WS Acid Cu devices In an alternative embodiment, the workstations devices may be a Chloride workstation WS Chloride devices, Accelerator and Leveler WS_CVS__Acc_Lvl devices, Suppressor WS CVS Sup devices, or any other devices required for the inorganic or organic analysis.

[0105] Fig. 7 A illustrates a chemical buffer ChemBuffer cabinet 700 which controls the quantity of chemicals to be supplied. A ChemBuffer vessel 702 of the ChemBuffer cabinet 700 is an intermediate buffer vessel for chemicals used for inorganic and organic analysis. These ChemBuffer vessels 702 are automatically refilled by peristaltic pumps from chemical storage containers stored in the chemical cabinet 503 (shown in Fig. 5). The ChemBuffer vessel 722 and pump 724 per vessel are shown in Fig. 7C.

[0106] The ChemBuffer vessel 702 comprises one or more of the following features:

[0107] • dedicated waste and fill connections

[0108] • volume 250 ml

[0109] • fill level monitored via an ultrasonic sensor for exact volume control

[0110] • without stirrer

[0111] If a chemical is not available in the ChemBuffer vessel 702, the dependent workstations are blocked and the operator is informed with an alarm. Getting minimum level / quantity of chemicals (e.g., 1000 ml or 250 ml) in ChemBuffer vessel 702 leaves enough time to change container(s) with chemicals.

[0112] The ChemMakeup vessel 704 with magnetic stirrer may comprise one or more of the following features:

[0113] • volume 1000ml

[0114] • filling and emptying through lines from above

[0115] • stirrer for a homogenous mixture, max. 400 rpm

[0116] The chemical buffer cabinet 712 is also shown on the schematic view of the process control device 710.

[0117] Fig. 8 illustrates electric cabinet 800 behind the module door of the process control device. The electric cabinet 800 comprises low voltage electronic / electric modules (controllers, etc.), electric connectors in form of copper or optical cables, voltage / current stabilizers, regulators, protection circuits, switches, temperature and pressure controllers, etc. The electric cabinet 800 is configured to interconnect various clusters of the workstations. The electric cabinet 800 also provides interconnectivity between different workstations for executing the applications. The electric cabinet 800 controls the power provided to the various workstations ensuring controlled execution of the applications.

[0118] Referring to Fig. 10, the exhaust value information is displayed on the operation indicator 1001 which might display the information in a color-coded format. For example, the exhaust value within the range is displayed through ‘Green’ color 1002, while the exhaust value out of range is displayed through ‘Red’ color 1003. The negative pressure monitoring is done by the pressure sensor situated in the exhaust pipe.

[0119] Referring now to Fig. 11 which illustrates a leakage sensor 1101 in wet parts cabinet. The leakage sensor 1101 detects the leakage of liquids (chemicals, water, etc.) from the wet parts cabinet. As long as no liquid is detected by the leakage sensor 1101, a ‘Green’ optical signal is displayed. If the leakage sensor 1101 responds, the optical signal is ‘Red’ as shown in Fig. 12. On the display of ‘Red’ signal, one or more of the following action points might be executed automatically:

[0120] • The actuator circuit is switched off immediately.

[0121] • No chemicals are pumped in the workstations of the wet parts cabinet.

[0122] • The external supply lines for filling bulk containers are closed.

[0123] • All current analysis and replenishment jobs are aborted.

[0124] • The signal lights up red and the hom sounds.

[0125] • A signal output informs an external receiver that the process control device is no longer ready for use. The signal output may be displayed on the connected communication device.

[0126] Referring now to Fig. 13A which illustrates a ChemBulk container 1300. The ChemBulk container 1300 is a buffer container that is connected to an external chemical supply line 1306. Its main function is to reduce temperature effects by fresh filled Virgin Makeup solution (VMS). It does not need to be filled or changed manually but is filled through a chemical supply line 1306 provided by the operating company. ChemBulks containers 1300 are directly connected to the external facility supply via drycontact signals:

[0127] - Request VMS Refill

[0128] ~ External VMS Supply available

[0129] ChemBulk containers 1300 filled by a pressurized line are secured with a valve block similar to slipstream bypasses. ChemBulk containers 1300 are permanently secured inside the process control device and cannot be removed without tools. The ChemBulk container 1300 is monitored by an ultrasonic sensor 1304 for exact volume control. Fig. 13B illustrates a dosing device 1310 which is used in the process control device to dose small to medium volumes with high precision. The dosing device 1310 contains a bubble sensor 1312 for monitoring the liquid for air bubbles.

[0130] Referring to Figs. 15A and 15B which illustrate a safe locking of different parts of the process control device 1500. Fig. 15A illustrates access to the chemical cabinet 1502 for change of chemicals through the cabinet key 1508. The cabinet key 1508 is inserted at the keying part 1510 and / or 1512 of the chemical cabinet 1502 for access. An operating mode S2 key 1506 may also be provided for accessing and controlling the operating mode of the working stations in the wet parts cabinet 1504. The key 1506 is inserted at the keying part 1514 of the wet parts cabinet 1504 for access. Fig. 15B illustrates access to the wet parts cabinet 1520 and electrical cabinets through the cabinet key 1522. The cabinet key 1522 is inserted at the keying part 1524 and / or 1526 of the wet parts cabinet 1520 for access. The cabinet key 1522 also provides access to the electrical cabinets as these cabinets are behind the module door of the wet parts cabinet 1520.

[0131] Fig. 16A illustrates a keyboard 1602 connected to human machine (HM) interface (HM1) device. The keyboard 1602 is configured to be folded to occupy minimum footprint during operation of the system. The folded keyboard 1604 provides more working area to an operator. Fig. 16B illustrates rotatable human machine (HM) interface device, e.g., a desktop, a laptop, etc. The HMI is shown in operating position A 1606 with keyboardtrackpad unit unfolded. The HMI operating position is the standard position used with different operating modes. At position B 1608, the HMI is shown in idle position with keyboard-trackpad unit folded. If not in use, the HMI has to be brought into it‘s idle position in order to keep a minimum workspace free in front of control cabinets with live parts. For this, the keyboard-trackpad unit is folded and the monitor arm is adjusted in such a way that the HMI is placed in parallel to the front of the process control device. This ensures unrestricted access to the line voltage control panels of the process control device. At position C 1610, HMI is shown in service position.

[0132] Referring to Figs. 17A and 17B which illustrate a front side 1700 and a connection side 1710, respectively, of a slipstream valve block for protecting the process control device from the outside by regulating and adjusting the flow in the incoming and outgoing slipstream lines, wherein slipstream valves of the slipstream valve block have a provision of measuring the said flow to ensure specific flow value for optimum system performance is maintained. The slipstream valve block comprises a pneumatic control which is connected to the actuator circuit and closes automatically in the event of a shutdown (e.g. if a leakage occurs). The front side 1700 illustrates a manual shut-off valve 1702 in open position. The valve 1702 enables a system operator to close the valve in case a part of the system fails. A needle valve 1704 allows for adjusting the external flow if required.

[0133] The back side 1710 comprises one or more of the following components:

[0134] • ancolyzer internal connection 1712;

[0135] • ancolyzer internal connection 1714;

[0136] • Pneumatic valves for incoming side 1716;

[0137] • Incoming line from production tool 1718;

[0138] • Outgoing line to production tool 1720; and

[0139] • Pneumatic valve for outgoing side 1722.

[0140] Fig. 18 illustrates an exemplary system 1800 for implementing various aspects of the invention. The system 1800 includes a data processor 1802, a system memory 1804, and a system bus 1816. The system bus 1816 couple system components including, but not limited to, the system memory 1804 to the data processor 1802. The data processor 1802 can be any of various available processors. The data processor 1802 refers to any integrated circuit or other electronic device (or collection of devices) capable of performing an operation on at least one instruction, including, without limitation, Reduced Instruction Set Core (RISC) processors, CISC microprocessors, Microcontroller Units (MCUs), CISCbased Central Processing Units (CPUs), and Digital Signal Processors (DSPs). Furthermore, various functional aspects of the data processor 1802 may be implemented solely as software or firmware associated with the processor. Dual microprocessors and other multiprocessor architectures also can be employed as the data processor 1802.

[0141] The system bus 1816 can be any of several types of bus structure(s) including the memory bus or memory controller, a peripheral bus or external bus, and / or a local bus using any variety of available bus architectures known to those of ordinary skill in the art. The system memory 1804 may include computer-readable storage media comprising volatile memory and nonvolatile memory. The non-volatile memory stores the basic input / output system (BIOS), containing the basic routines to transfer information between elements within the system 1800. The non-volatile memory can include, but not limited to, read only memory (ROM), programmable ROM (PROM), electrically programmable ROM (EPROM), electrically erasable programmable ROM (EEPROM), or flash memory. The volatile memory includes random access memory (RAM), which acts as external cache memory. RAM is available in many forms such as static RAM (SRAM), dynamic RAM (DRAM), synchronous DRAM (SDRAM), double data rate SDRAM (DDR SDRAM), enhanced SDRAM (ESDRAM), SynchLink™ DRAM (SLDRAM), Rambus® direct RAM (RDRAM), direct Rambus® dynamic RAM (DRDRAM), and Rambus® dynamic RAM (RDRAM).

[0142] The system memory 1804 includes an operating system 1806 which performs the functionality of managing the system 1800 resources, establishing user interfaces, and executing and providing services for applications software. The system applications 1808, modules 1810 and data 1812 provide various functionalities to the system 1800.

[0143] The system 1800 also includes a disk storage 1814. Disk storage 1814 includes, but is not limited to, devices like a magnetic disk drive, floppy disk drive, tape drive, Jaz drive, Zip drive, LS-100 drive, flash memory card, or memory stick. In addition, disk storage 1814 can include storage media separately or in combination with other storage media including, but not limited to, an optical disk drive such as a compact disk ROM device (CD-ROM), CD recordable drive (CD-R Drive), CD rewritable drive (CD-RW Drive) or a digital versatile disk ROM drive (DVD-ROM).

[0144] A user enters commands or information into the system 1800 through input device(s) 1824. Input devices 1824 include, but are not limited to, a pointing device (such as a mouse, trackball, stylus, or the like), a keyboard, a microphone, a joystick, a satellite dish, a scanner, a TV tuner card, a digital camera, a digital video camera, a web camera, and / or the like. The input devices 1824 connect to the data processor 1802 through the system bus 1816 via interface port(s) 1822. Interface port(s) 1822 include, for example, a serial port, a parallel port, a game port, and a universal serial bus (USB). The output devices 1820 like monitors, speakers, and printers are used to provide output of the data processor 1802 to the user. Another example, a USB port may be used as an input device 1824 to provide input to the system 1800 and to output information from system 1800 to the output device 1820. The output devices 1820 connect to the data processor 1802 through the system bus 1816 via output adaptors 1818. The output adapters 1832 may include, for example, video and sound cards that provide a means of connection between the output device 1820 and the system bus 1816.

[0145] The system 1800 can communicate with remote communication devices 1828 for exchanging information. The remote communication device 1828 can be a personal computer, a server, a router, a network PC, a workstation, a microprocessor-based appliance, a mobile phone, a laptop, a tablet, a paging device, a peer device or other common network node and the like.

[0146] Network interface 1826 encompasses wire and / or wireless communication networks such as local-area networks (LAN) and wide-area networks (WAN). LAN technologies include Fiber Distributed Data Interface (FDDI), Copper Distributed Data Interface (CDDI), Ethernet, Token Ring and the like. WAN technologies include, but are not limited to, point-to-point links, circuit switching networks like Integrated Services Digital Networks (ISDN) and variations thereon, packet switching networks, and Digital Subscriber Lines (DSL).

[0147] While the preferred embodiment of the present invention and its advantages has been disclosed in the above detailed description, the invention is not limited there to but only by the scope of the appended claim.

[0148] As will be readily apparent to those skilled in the art, the present invention may easily be produced in other specific forms without departing from its essential characteristics. The present embodiments are, therefore, to be considered as merely illustrative and not restrictive, the scope of the invention being indicated by the claims rather than the foregoing description, and all changes which come within therefore intended to be embraced therein.

Claims

I / WE CLAIM:

1. A system (100, 500) for monitoring and controlling the chemical processing of a substrate, the system comprising: a housing (101) having at least one protective door (102, 102’) on a front side; a sealed module door (402); a wet parts cabinet (501) formed between said at least one protective door and said sealed module door; a plurality of analytical modules (604, 606) each comprising multiple workstations and devices and configured for different types of analysis, wherein said analytical modules are installed on the sealed module door and components of said multiple workstations and devices are located in the wet parts cabinet; an electrical cabinet (407, 800) configured behind the sealed module doors, wherein the electrical cabinet is configured to comprise electrical components for controlling the operation of the workstations and devices; one or more chemical cabinets (503) for storing and providing the chemicals required the analysis running through the workstations; a user interface (104) for connecting with one or more computing devices (103), wherein the analysis can be monitored and controlled through the computing devices.

2. The system of claim 1 , wherein a negative pressure is maintained in the wet parts cabinet and an overpressure is maintained in the electrical cabinet.

3. The system of claim 1, wherein different types of analysis include inorganic bath components analysis and organic components analysis.

4. The system of claim 1 , wherein the different types of analysis is characterized by different sampling rates.

5. The system of claim 1 further comprising one or more chemical buffer cabinets (712) which are configured to control the quantity of chemicals supplied for analysis.

6. The system of claim 5, wherein the wet parts cabinet, the chemical cabinets and chemical buffer cabinets are connectable and have a common negative pressure environment.

7. The system of claim 5, wherein the chemical cabinets and the chemical buffer cabinets have common or separate one or more protective doors.

8. The system of claim 1 , wherein the one or more of analytical modules have predetermined configurations and / or are pre-assembled before installing on the module door.

9. The system of claim 1 , wherein the analytical modules comprise a Lego-like structure having standard workstations and devices installed on it.

10. The system of claim 1, wherein each of the analytical modules includes a sealed plate (604’, 606’) and the multiple workstations and devices are installed thereon.

11. The system of claim 10, wherein the sealed plate is fabricated from a metal.

12. The system of claim 10, wherein the sealed module door is formed by a frame and the sealed plates.

13. The systems of claim 1, wherein at least one of the analytical modules has one or more handles (612).

14. The system of claim 11 , wherein at least a part of the handles is configured to be disassembled.

15. The system of claim 1, wherein electric terminals of the multiple workstations and devices are located in the electrical cabinet.

16. The system of claim 1, wherein the sealed module door further comprises an empty plate (608’).

17. The system of claim 16, wherein the empty plate has substantially the same dimensions as analytical modules plates.

18. The system of claim 16, wherein the empty plate is configured to be re-placeable by a custom-based analytical module.

19. The system of claim 1, wherein the multiple workstations comprise one or more of a Titration workstation, an Electrochemical Analysis - CVS workstation, a High Pressure Liquid Chromatography (HPLC) workstation and a Spectrophotometry workstation.

20. The system of claim 1 , wherein the multiple devices further comprise one or more sample valves (614a, 614b) configured to provide chemical samples to the workstations for execution of the analysis.

21. The system of claim 20, wherein the sample valves comprise a switching mechanism for switching to a required chemical source, wherein the switching is done either automatically or manually by a trained operator.

22. The system of cl|im 20, wherein the sample valves comprise multi-way valves (904) configured to provide chemical samples to the workstations by means of a dosing device, a pump or through pressurized liquid.

23. The system of claim 22, wherein the multi-way valves are 6-way valves.

24. The system of claim 1 further comprises a memory unit configured to store configurations and parameters of the analysis running through the workstations.

25. The system of claim 1, wherein the chemical buffer cabinet comprises one or more chemical buffer vessels (702) which stores the chemicals, wherein the chemical buffer vessels are automatically refilled by peristaltic pumps from chemical storage containers (308a, 308b, 308c) stored in the chemical cabinets.

26. The system of claim 25, wherein the chemical storage containers are contained in the retractable shelfs (301, 302).

27. The system of claim 1 further comprises a chemical bulk container connected to an external chemical supply line and configured to reduce temperature effects by providing fresh filled Virgin Makeup solution (VMS).

28. The system of claim 1, wherein the electrical cabinet is configured to control the power provided to the workstations ensuring controlled execution of the inorganic bath components analysis and organic components analysis.

29. The system of claim 1 , wherein the electrical cabinet is further configured to provide interconnectivity between the workstations for executing the analysis.

30. The system of claim 1, wherein the workstation further comprises a dosing device (1310) configured to dose small to medium volumes of chemicals required for analysis with high precision.

31. The system of claim 30, wherein the dosing device comprises a bubble sensor (1312) configured for monitoring the chemicals for air bubbles.

32. The system of claim 1, wherein each of the sealed module door comprises a seal strip (409) on its frame (409’) perimeter for sealing the wet parts cabinet from the electrical cabinet while the sealed door is closed.

33. The system of claim 32, wherein the seal strip is configured to maintain different pressure conditions in the wet parts cabinet and the corresponding electrical cabinet.

34. The system of claim 33, wherein negative pressure is maintained in the wet parts cabinet to prevent leakage of chemicals to the electrical cabinet and from the system.

35. The system of claim 33, wherein overpressure is maintained in the electrical cabinet to avoid intrusion of chemical vapours and dust.

36. The system of claim 35, wherein the overpressure is maintained in the electrical cabinet through a fan provided on an upper side of the system.

37. The system of claim 1 further comprises a ventilation exhaust (506) for sucking out the air from the wet parts cabinet and the chemical cabinet.

38. The system of claim 1, wherein the at least one protective door (102, 102’) is installed with a gap enabling air circulation by suction of ambient air into the wet parts cabinet.

39. The system of claim 1, wherein the at least one protective door (102, 102’) is transparent, semi-transparent or non-transparent.

40. The system of claim 1 , wherein the protective doors are designed as foldable dual section doors to decrease footprint while opening.

41. The system of claim 40, wherein the protective doors are configured for opening by about 90 degrees.

42. The system of claim 40, wherein the protective doors are provided with stopper to fix thereof in the opened position.

43. The system of claim 1 further comprises a pressure sensor configured to detect pressure values in the wet parts cabinets and the chemical cabinets.

44. The system of claim 43 further comprises an operation indicator (505) for displaying the pressure sensor values in a color-coded format.

45. The system of claim 1, wherein the wet parts cabinet comprises a leakage sensor (1101) configured to detect the leakage of chemicals from the wet parts cabinet.

46. The system of claim 45, wherein the leakage condition is displayed though an optical indicator on the leakage sensor in a color-coded format.

47. The system of claim 1 further comprises a safety locking mechanism for locking different parts of the system including the wet parts cabinets, electrical cabinets, chemical buffer and chemical cabinets.

48. The system of claim 1, wherein the computing device comprises a foldable keyboard and a rotatable screen to provide minimum footprint during operation of the system.

49. The system of claim 1 further comprises a slipstream valve block configured to protect the system from outside by regulating and adjusting the flow in the incoming and outgoing slipstream lines, wherein slipstream valves of the slipstream valve block have a provision of measuring the said flow to ensure specific flow value for optimum system performance is maintained.

50. The system of claim 49, wherein the slipstream valve block comprises a pneumatic control connected to an actuator circuit and configured to close automatically in the event of a shutdown.

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