Multilayer structure for passive radiative cooling

FR3168635A1Pending Publication Date: 2026-05-22VIESSMANN CLIMATE SOLUTIONS SE +3
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Patent Information

Application Number
FR2024012500
Authority / Receiving Office
FR · FR
Patent Type
Applications
Current Assignee / Owner
Filing Date
2024-11-15
Publication Date
2026-05-22

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Abstract

Multilayer structure for passive radiative cooling. The invention relates to a multilayer structure (1) for passive radiative cooling, comprising: - a basic reflective layer (2) made of silver or aluminum, - a stack (3) deposited on the reflective layer and comprising at least two and at most five superimposed emissive layers (4, 5, 6), each emissive layer being continuous and of uniform thickness, at least one of the emissive layers (4) being made of hafnium dioxide, at least one other of the emissive layers (5, 6) being made of an oxide, other than hafnium dioxide, a nitride, or an oxynitride, the multilayer structure having a thickness of between 0.5 and 2 µm. Figure for the abstract: Fig. 1
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Claims

10. Multilayer structure according to any one of the preceding claims, the stacking consisting solely of the emissive layers.

11. Multilayer structure according to any one of the preceding claims, the reflective layer having a thickness between 0.150 and 1 pm.

12. Multilayer structure according to any one of the preceding claims, the structure extending over an area greater than 1 m2 when viewed along the stacking direction of the radiative layers.

13. Radiatively cooled solar panel comprising at least one multilayer structure (1) according to any one of claims 1 to 12, said solar panel being intended to be integrated into an object selected from a building roof, a vehicle body, a cargo transport container, a fluid tank.

14. A method for manufacturing a multilayer structure (1) according to any one of claims 1 to 12, the method comprising the formation of the stack of superimposed emissive layers by a succession of physical vapor-phase depositions, preferably at least one of the physical vapor-phase depositions is a sputtering.

15. Method according to the preceding claim, the reflective layer being formed, prior to the stacking of emissive layers, by physical vapor phase deposition, preferably by cathodic sputtering. [Fig. 1] 1 FIG. 1 [Fig. 2] Epmseur tatate Biïs h hïdfetif (Wra*) FIG. 7 [Fig. 8] Epssaaur (pm) Sife r&dkW

Citation Information

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