Optical coupling structure

Abstract

The invention relates to a coupling structure that couples a first optical mode to a second, the effective refractive index of the second being strictly greater than that of the first. It comprises a first and a second waveguide configured to guide the first and second optical modes, respectively. The core of the first waveguide extends into a proximal and a distal section. The second waveguide comprises a base and an edge. A hybrid waveguide, interposed between the first and second waveguides, comprises the proximal section and an extension of the base, arranged to cooperate in guiding an intermediate optical mode. The effective refractive index of the intermediate optical mode is strictly greater than the effective refractive index of the second optical mode. A modal transition section, including the distal section, extends from the hybrid waveguide to the second waveguide to couple the intermediate optical mode to the second optical mode.Figure for the abbreviation: figure 2A.

Description

Title of the invention: Optical coupling structure technical field

[0001] The field of the invention is that of optical coupling structures in integrated photonics, such as, for example, an optical coupling structure between a first waveguide and a second waveguide, the second waveguide being able to be optically coupled to one or more active photonic components. PREVIOUS STATE OF THE ART

[0002] In the field of integrated photonics, it is often necessary to couple waveguides made of different materials, particularly for designing devices implementing active photonic components. These devices are now widespread in the fields of telecommunications, inter-chip data exchange, digital computing, and sensors. Examples include LiDAR, gas sensors, and biosensors. Active photonic components can be of all types, such as laser sources, photodiodes, N-to-P waveguide switches, phase-controlled antenna arrays, and phase or intensity modulators.

[0003] In integrated photonics, it is common to fabricate silicon waveguides encapsulated in silica. A strong contrast in refractive indices between silica and silicon allows for the fabrication of compact photonic circuits. These materials also make it possible to take advantage of existing infrastructure for CMOS circuit fabrication, namely large-diameter wafers and high-resolution lithography equipment. It is also possible to exploit the semiconducting properties of silicon, possibly with added germanium, to fabricate active photonic components.

[0004] Silicon, however, has a number of disadvantages. For example, it is not transparent for wavelengths shorter than 1.1 pm, it does not have a direct band gap, and silicon photonic active components are frequency limited.

[0005] A particularly interesting alternative material is silicon nitride (Six Ny), also commonly used for manufacturing CMOS circuits. A silicon nitride waveguide induces less propagation loss than a silicon waveguide, especially when the silicon nitride is close to a stoichiometric composition (Si3N4). Unlike silicon, silicon nitride transmits light for wavelengths shorter than 1.1 pm (and typically ranging from 400 nm to 5 pm).

[0006] It is possible to exploit the non-linear properties of silicon nitride to fabricate certain active photonic components (such as lasers), but it is preferable, and often essential, to use more suitable active materials. Among these, lithium niobate (LiNbO3), barium titanate (BaTiO3), or compounds formed from elements taken from columns III and V of the periodic table of elements possess particularly interesting physical properties for fabricating high-performance photonic components, optically coupled to a photonic circuit comprising passive components, for example, made of silicon or silicon nitride.

[0007] It is therefore necessary to optically couple a first waveguide, for example made of silicon or silicon nitride, with a second waveguide made of an active material different from that of the first waveguide. Standard semiconductor manufacturing processes then require that the first and second waveguides be arranged in separate parallel planes.

[0008] In this configuration, and to limit coupling losses, it is known to optically couple a first optical mode and a second optical mode by means of an adiabatic coupling structure. The first and second optical modes have, respectively, a first and a second effective index, the first effective index being strictly greater than the second effective index. The first optical mode is guided by a first waveguide and the second optical mode is guided by a second waveguide. The respective optical axes of the first and second waveguides are aligned parallel to each other within the adiabatic coupling structure. A width of the first waveguide gradually narrows in a taper section, so as to ensure optical coupling with the second waveguide.Functional coupling requires a finely detailed narrowing section, necessitating the use of high-resolution lithography tools capable of resolving patterns smaller than 450 nm. In industrial applications, these tools are only available on CMOS circuit manufacturing lines. However, some active materials are not permitted on these tools because they contain contaminating elements. Therefore, the choice of geometries, dimensions, and / or materials for the second waveguide is constrained by the value of the first effective refractive index.

[0009] An example of an active photonic component comprising lithium niobate (LiNbO3) is described in the paper by T. Vanackere et al., “Heterogeneous integration of a high-speed lithium niobate modulator on Silicon nitride using micro-transfer printing”, APL Photonics 8, 086102 (2023). This is a modulator comprising two arms of a Mach-Zehnder interferometer. Each arm has two Coupling structures between a first waveguide and a hybrid waveguide. The first waveguide comprises a silicon nitride core extending into a bonding section. The hybrid waveguide comprises the bonding section and a lithium niobate base in contact with the bonding section.

[0010] A tapering section is etched at two opposite ends of lithium niobate portions. A lithium niobate portion is transferred to each bonding section, so as to center each tapering section on its respective bonding section. The base of each hybrid waveguide is a portion of a lithium niobate portion. The hybrid waveguide is therefore end-coupled to the first waveguide by the coupling structure, the tapering sections limiting diffraction losses at the coupling structure.

[0011] Electrodes are formed on the lithium niobate portions so as to apply an electric field in an active region of each lithium niobate portion opposite a silicon nitride bonding section. The electric field is capable of modifying a refractive index of the active region by the Pockels effect.

[0012] During operation, an incoming optical mode is split equally into two intermediate optical modes guided by hybrid waveguides. At one hybrid waveguide, the intermediate optical mode is confined by the silicon nitride bonding section. Therefore, it does not fully interact with the active region, resulting in a loss of modulator efficiency. Consequently, each coupling structure between the first waveguide and the hybrid waveguide needs to be replaced by a coupling structure between the first waveguide and a second waveguide made entirely of lithium niobate.

[0013] Specific dimensions of the narrowing section minimize transmission losses induced by an inaccuracy of 0.5 pm (3°) in the narrowing sections during the transfer operation of the lithium niobate sections, but this is not entirely satisfactory since an offset of 0.1 pm results in a transmission loss of 0.5 dB. These dimensions, around 100 nm, also necessitate the use of high-resolution lithography equipment, which is not available in an industrial production line that accepts lithium niobate. An electron beam tool is used in this document, but such a tool provides a low production rate. Therefore, there is a need to replace each coupling structure with one that is easier to manufacture and more robust to uncertainties in the manufacturing process. Description of the invention

[0014] The invention aims to remedy, at least in part, the drawbacks of the prior art, and more particularly to propose a coupling structure for optically coupling a first optical mode having a first effective index and a second optical mode having a second effective index strictly greater than the first effective index, easy to achieve, and can be manufactured in large volumes.

[0015] To this end, the object of the invention is a coupling structure for optically coupling a first optical mode having a first effective index and a second optical mode having a second effective index strictly greater than the first effective index. The coupling structure comprises a first waveguide including a core configured to guide the first optical mode, the core extending beyond the first waveguide in a section comprising a proximal section, close to the first waveguide, and a distal section in contact with the proximal section. It comprises a second waveguide including a base and an edge, configured to guide the second optical mode.It comprises a hybrid waveguide, interposed between the first and second waveguides, including the proximal section and a base extension beyond the second waveguide, arranged to cooperate in guiding an intermediate optical mode optically coupled to the first optical mode by the extension. It includes a modal transition section extending from the hybrid waveguide to the second waveguide, including the distal section.

[0016] The coupling structure is such that the proximal section has a width at the junction with the distal section such that an effective index of the intermediate optical mode is strictly greater than the second effective index. It is such that the distal section narrows continuously as it moves away from the hybrid waveguide so as to achieve optical coupling between the intermediate optical mode and the second optical mode.

[0017] Some preferred but not limiting aspects of this coupling structure are the following.

[0018] The proximal section can be separated from the base extension by an intercalated dielectric portion. The intercalated portion can be made of silicon oxide or aluminum oxide.

[0019] The extension may further include a buffer section interposed between the first waveguide and the proximal section, the extension of the base may include a bevel opposite the buffer section which may make an angle α less than or equal to 10° with an optical axis of the first waveguide, and may extend on either side of the buffer section.

[0020] The angle α may be less than or equal to 8°. The buffer section may have a width between 1.3 pm and 2 pm. The intercalated portion may have a thickness S between 50 nm and 200 nm.

[0021] The core can be made of silicon nitride. The base can be made of lithium niobate, lithium tantalate, or barium titanate.

[0022] The edge can be made of lithium niobate, lithium tantalate, barium titanate, silicon nitride, titanium oxide, tantalum oxide, silicon carbide, or silicon.

[0023] The edge may have a width W32o greater than or equal to 450 nm. The coupling structure may further comprise a substrate, the second waveguide may extend parallel to a top face of the substrate and the edge may have flanks that may make an angle less than or equal to 80° with respect to the top face of the substrate.

[0024] The extension can have a height H2b such that the effective index of any optical mode of the same wavelength and polarization as the first optical mode, capable of propagating in the extension, can be strictly less than the first effective index.

[0025] The invention also relates to an optical modulator comprising a coupling structure according to any one of the preceding characteristics. The modulator may be a Mach-Zehnder modulator comprising two arms, one arm comprising a phase shifter controllable by the Pockels effect, optically coupled to the second waveguide of the coupling structure by an end-to-end coupling.

[0026] The invention also relates to a method of manufacturing a coupling structure according to any one of the preceding characteristics, comprising the following successive steps: provision of a first assembly comprising a substrate, the core of the first waveguide and an upper confinement layer, such that the core extends over the substrate parallel to an upper face of the substrate, and the upper confinement layer encapsulates the core; transfer of an active layer over the core and the upper confinement layer; formation of the second waveguide in the active layer.

[0027] The upper containment layer may have a bonding face that can cover the core and may be substantially parallel to the upper face. The transfer step may be a molecular bonding of the bonding face with a bonding layer in contact with the active layer. The intercalated portion may consist of a part of the upper containment layer and a part of the bonding layer.

[0028] The upper containment layer and the bonding layer may be made of silicon dioxide. The active layer may be made of lithium niobate, lithium tantalate, or barium titanate. Brief description of the drawings

[0029] Other aspects, objectives, advantages and features of the invention will become clearer upon reading the following detailed description of preferred embodiments of this, given by way of non-limiting example, and made with reference to the attached drawings on which:

[0030] [Fig.1A] is a schematic top view of a first embodiment of a coupling structure according to the invention;

[0031] [Fig.1B] is a schematic view of the first embodiment according to section AA of [Fig.1A];

[0032] [Fig.1C] is a schematic view of the first embodiment according to section BB of [Fig.1A];

[0033] [Fig.1D] is a schematic view of the first embodiment according to section CC of [Fig.1A];

[0034] [Fig.1E] is a schematic view of the first embodiment according to section DD of [Fig.1A];

[0035] [Fig.2A] is a schematic top view of a second embodiment of a coupling structure according to the invention;

[0036] [Fig.2B] is a schematic top view of a variant of the second embodiment;

[0037] [Fig.3] illustrates initial simulation results useful for designing a coupling structure according to the invention;

[0038] [Fig.4] illustrates second simulation results useful for designing a coupling structure according to the invention;

[0039] Figures 5A, 5B and 5C illustrate third simulation results useful for designing a coupling structure according to the invention;

[0040] [Fig.6] is a schematic top view of a Mach-Zehnder modulator implementing coupling structures according to the variant of the second embodiment;

[0041] Figures 7A to 7F illustrate steps in a process for manufacturing a coupling structure according to the invention.

[0042] DETAILED DESCRIPTION OF SPECIFIC EMBODIMENTS

[0043] In the figures and throughout the description, the same reference numerals represent identical or similar elements. Furthermore, the various elements are not drawn to scale in order to enhance the clarity of the figures. Moreover, the different embodiments and variants are not mutually exclusive and may be combined. Unless otherwise indicated, the terms "approximately," "about," and "in the order of" mean within 10%, and preferably within 5%. Furthermore, the terms "between ... and ..." and equivalents mean that the limits are inclusive, unless otherwise stated.

[0044] The invention relates to a coupling structure comprising a first waveguide, a second waveguide and a hybrid waveguide interposed between the first The first waveguide and the second waveguide are used. Constraints dictate that a first optical mode guided by the first waveguide has an effective refractive index strictly lower than the effective refractive index of a second mode guided by the second waveguide. These constraints can be of any kind, for example, a specific material to minimize propagation losses for the first waveguide, specific dimensions for creating an active photonic component optically coupled to the second waveguide, an etching profile induced by an etching process used to fabricate the second waveguide, or a material with a specific physical property for fabricating the second waveguide.

[0045] The first waveguide has a core that extends beyond the first waveguide in a continuation comprising a proximal section and a distal section. The second waveguide is an edge waveguide, that is, it has an edge raised above a base. The hybrid waveguide comprises the proximal section and a base extension beyond the second waveguide. The proximal section and the base extension cooperate to guide an intermediate optical mode.

[0046] In operation, the intermediate optical mode is optically coupled to the first optical mode by the extension, and optically coupled to the second optical mode. The proximal section has a width greater than a minimum width beyond which the intermediate optical mode has an effective index strictly greater than the second effective index.

[0047] The coupling structure further comprises a modal transition section extending from the hybrid waveguide to the second waveguide, including the distal section. The modal transition section is such that the distal section narrows continuously as it moves away from the hybrid waveguide so as to progressively decrease the effective index of the intermediate optical mode to values ​​below the second effective index, thereby achieving optical coupling between the intermediate optical mode and the second optical mode.

[0048] It is thus possible to make an element of the first waveguide (the extension) and an element of the second waveguide (a base extension) cooperate to optically couple the first and second waveguides, even though the second effective index is strictly greater than the first effective index. Furthermore, fabricating the second waveguide with its base extension does not require a high-resolution lithography step. A lithography step is considered high-resolution when it allows the resolution of patterns, for example a tip, with a width of less than 450 nm, or even less than 250 nm.

[0049] Throughout this description, two optical components are said to be optically coupled when an optical mode can propagate at least partially in both components. optical, possibly via intermediate optical components. Two guided optical modes are said to be optically coupled when the power of one comes entirely from the power of the other, without intermediate conversion into another form of energy.

[0050] The invention is particularly advantageous for coupling a first silicon nitride waveguide with a second lithium niobate waveguide. Indeed, several factors imply that the effective index of an optical mode guided by the second waveguide is strictly greater than the effective index of an optical mode guided by the first waveguide. In particular, silicon nitride has a lower refractive index than lithium niobate. A sufficient thickness of lithium niobate is necessary to create an active photonic component, for example, between 300 nm and 800 nm. An etching process for forming the second waveguide results in a second waveguide having inclined edges.

[0051] Throughout this description, a waveguide is a single-mode or multimode waveguide capable of confining light, as opposed to optical waveguides in which light propagates by total internal reflection. Without further specification, a waveguide can be of any type. For example, it can be a ribbon, edge, or planar waveguide. A waveguide has a core and, optionally, one or more confinement layers surrounding the core so as to be in physical contact with it. A contrast or variation in refractive indices between the core and the confinement layer(s), a gas, or a vacuum, allows the light to be confined. Waveguides can be identified by their cores in the figures.Similarly, without further specification, a refractive index of a waveguide is a refractive index of the waveguide core; a distance separating two waveguides is the distance separating the cores of the respective waveguides; the material of a waveguide is the material of the waveguide core; when a waveguide extends in a direction, it is understood that the waveguide core extends in that direction; when a waveguide is in contact with a layer, it is understood that the waveguide core is in contact with the layer.

[0052] Throughout this description, "effective index" is given its common technical meaning. For clarity, however, it is specified that the effective index of an optical mode guided by a waveguide is the scalar quantity equal to the refractive index of a fictitious homogeneous medium within which a light wave of the same wavelength as the guided mode would propagate in free space at the same phase velocity as the guided mode in the waveguide. The effective index depends in particular on the geometry of the waveguide and the materials constituting it. It can be obtained by simulation.

[0053] A layer is defined as an area consisting of one or more sublayers of a material whose thickness along a z-axis is less than, for example, ten times or even twenty times, its longitudinal dimensions of width and length in a plane (x, y) perpendicular to the z-axis. A layer may be structured, or a structure of substantially constant thickness extending mainly along a principal plane. When it consists of several sublayers, the sublayers may be made of different materials. The sublayer(s) extend in planes substantially parallel to the (x, y) plane. When a layer possesses a property, it is understood that when it consists of several sublayers, all the sublayers possess the same property, unless explicitly stated otherwise.For example, in the absence of further details, a layer made of metal or a semiconductor or amorphous material may contain several sublayers, all respectively made of metal, a semiconductor, or amorphous materials. A layer can be conformal, which implies that it extends over a surface, for example a non-planar one, and that it conforms to that surface.

[0054] Specific embodiments will be described relating to a coupling structure between a first ribbon-type waveguide and a second edge-type waveguide. However, these embodiments can be adapted to a first waveguide and / or a second waveguide of another type, for example, a first edge-type waveguide and / or a second planar waveguide.

[0055] Initially, a first embodiment of a coupling structure 1 according to the invention will be described with reference to Figures IA to IA. Figure IA is a top view on which only certain elements have been shown. Figures IA to IA are views along the respective sections AA, BB, CC and DD, shown in Figure IA.

[0056] The coupling structure 1 is intended to optically couple a first optical mode having a first effective index and a second optical mode having a second effective index strictly greater than the first effective index. The first and second optical modes have the same wavelength X.

[0057] The coupling structure 1 comprises a substrate 100, a first waveguide 200, a hybrid waveguide 250, a modal transition section 270 and a second waveguide 300. The substrate 100 has a substantially flat upper face. The first waveguide 200, the hybrid waveguide 250, the modal transition section 270 and the second waveguide 300 extend successively on the substrate 100, along an optical axis oriented from the first waveguide 200 to the second waveguide 300, in planes substantially parallel to the upper face, located on the same side of the substrate 100 as the upper face.

[0058] Here and for the remainder of the description, we define a three-dimensional orthogonal direct frame (X, Y, Z), where the X and Y axes form a plane parallel to the upper face of substrate 100, with the X-axis oriented parallel to the optical axis, and the Z-axis oriented substantially orthogonally to the top face of substrate 100, from the top face towards the first waveguide 200. In the following description, the terms "vertical" and "vertically" refer to an orientation substantially parallel to the Z-axis, and the terms "horizontal" and "horizontally" refer to an orientation substantially parallel to the (X, Y) plane. Furthermore, the terms "lower" and "upper" refer to increasing positioning as one moves away from substrate 100 along the +Z direction. The term "lateral" refers to an orientation substantially parallel to the Z-axis.

[0059] The substrate 100 can be made from a silicon wafer, after optional cutting and / or thinning steps. A containment layer 130 extends over the substrate 100 so as to be in contact with the upper surface of the substrate 100. The upper surface of the containment layer 130 is on one side of the containment layer 130 opposite the substrate 100. The upper surface of the containment layer 130 is substantially flat and parallel to the upper surface of the substrate 100.

[0060] The confinement layer 130 is made of one or more materials transparent to the X wavelength, for example, a semiconductor material or a dielectric material. It may, for example, consist of a lower sublayer in contact with the substrate 100 and one or more bonding sublayers in contact with the lower sublayer. The lower sublayer may, for example, be made of silicon dioxide. The confinement layer 130 may include one or two bonding sublayers, for example, made of silicon nitride or aluminum oxide, optionally including a bonding interface. The confinement layer 130 is here made of silicon dioxide.

[0061] The first waveguide 200 comprises a core 210 ([Fig. 1B]). The core 210 extends into the confinement layer 130, parallel to the optical axis and the upper face of the substrate 100. It may be flush with the upper face of the confinement layer 130, or, as shown here, be completely surrounded by the confinement layer 130. In this example, the core 210 has a rectangular cross-section in any plane parallel to the (Y, Z) plane. It has a width W2io measured parallel to the Y axis, and a height Hi measured parallel to the Z axis. The cross-section of the core 210 can have any shape that allows an optical mode to propagate in the first waveguide 200.

[0062] The core 210 has a refractive index strictly greater than the refractive index of the confinement layer 130. It is here made of silicon nitride. Alternatively, It may be made of silicon, silicon carbide, aluminum nitride, titanium oxide, tantalum oxide, diamond, or a gallium nitride-based compound.

[0063] The core 210 extends beyond the first waveguide 200, in the +X direction, as an extension. The extension comprises a proximal section 211, followed by a distal section 212. The proximal section 211 is in contact with the first waveguide 200, and the distal section 212 is in contact with the proximal section 211. The core 210, the proximal section 211, and the distal section 212 are made of the same material. The proximal section 211, and the distal section 212 respectively, have a width W2n, and W212 respectively, measured parallel to the Y-axis. The proximal and distal sections 211 and 212 have a constant height equal to Hb, measured parallel to the Z-axis. The widths W2n and W2i2 can vary along the X-axis.

[0064] The second waveguide 300 comprises a base 310 and an edge 320. The base 310 extends over the confinement layer 130 so as to be in contact with the upper face of the confinement layer 130. It has a width W3i0 measured parallel to the Y-axis, and a height H2b measured parallel to the Z-axis. The height H2b is substantially constant. The base 310 has a rectangular cross-section in any plane of section parallel to the (Y, Z) plane.

[0065] Edge 320 is a portion raised relative to base 310. It extends along base 310 parallel to the optical axis and the X-axis, on one side of base 310 opposite the containment layer 130. Its flanks form an angle θ with the (X, Y) plane. Angle θ is, for example, between 40° and 90°, or between 40° and 80°, or between 40° and 70°, or approximately 50° or 60°. It extends vertically from base 310 to a height H2a measured parallel to the Z-axis. It has a width W320 measured parallel to the Y-axis, at the level of a top face of edge 320.

[0066] The edge 320 and the base 310 are, for example, made of the same material transparent at wavelength X. The material may, for example, be a material having a physical property that allows for the realization of an active photonic component, such as a semiconductor material and / or a piezoelectric material and / or a second-order or third-order nonlinear optical material. The edge 320 and the base 310 are here made of lithium niobate (LiNbO3). They may, for example, also be made of barium titanate (BaTiO3), lithium tantalate (LaTiO3), or perovskite.

[0067] Alternatively, the edge 320 and the base 310 may be made of different materials. The edge 320 may, for example, be made of silicon nitride, titanium oxide, tantalum oxide, silicon carbide, silicon, a chalcogenide, or any semiconductor or dielectric material transparent to the wavelengths of the first and second optical modes. The base 310 may be made of lithium niobate, barium titanate, lithium tantalate, or another perovskite-type material.

[0068] The hybrid waveguide 250 comprises the proximal section 211 and a distal portion of an extension 311 of the base 310 opposite the proximal section 211. The extension 311 of the base 310 extends over the containment layer 130, so as to be in contact with the upper surface of the containment layer 130, in the direction of the first waveguide 200, from the second waveguide 300 to a distal edge 311.1 of the extension 311. The distal edge 311.1 is a flank of the extension 311, straight in this example. It defines an angle α with the optical axis and the X-axis, in the (X, Y) plane. The angle α is here equal to 90°.

[0069] The distal portion of the extension 311 has a width W3n measured parallel to the Y-axis. The width W3n is strictly greater than W2n. Preferably, W3n is greater than or equal to 10*X / n2n, where n2n is the refractive index of the proximal section 211. The width W3n is constant along the X-axis, equal to the width W310.

[0070] When the core 210 is flush with the upper face of the containment layer 130, the extension 311 of the base 310 is in contact with the proximal section 211. Advantageously, as shown in [Fig. 1C], the proximal section 211 is separated from the extension 311 by an intercalated portion 132. The intercalated portion 132 is a part of the containment layer 130 in contact with the proximal section 211 and the extension 311. It has a thickness S measured parallel to the Z-axis.

[0071] The modal transition section 270 ([Fig.1D]) extends along the X-axis, from the hybrid waveguide 250 to the second waveguide 300. It includes the distal section 212 and a proximal portion of the extension 311 of the base 310, opposite the distal section 212. The width W2i2 decreases gradually, for example linearly, along the +X-oriented axis. The proximal and distal sections 211, 212 have, for example, the same width at their junction, as shown in [Fig.1A]. Advantageously, as shown in [Fig.1A], the modal transition section 270 can include an extension 321 of the edge 320 extending over the extension 311 of the base 310 towards the first waveguide 200. Preferably, the extension 321 of the edge 320 extends over the entire proximal portion of the extension 311, and possibly over part of the distal portion of the extension 311. Thus, diffraction losses can be avoided.

[0072] A second embodiment of a coupling structure 2 according to the invention will now be described with reference to [Fig. 2A]. Only the differences with the first embodiment are explicitly stated. Figures IB, IC, ID, IE are also views along sections AA, BB, CC and DD of [Fig. 2A].

[0073] For this embodiment, the coupling structure 2 further comprises a modal matching section 225. The core 210 extends beyond the first waveguide Waveguide 200, in the +X direction, extends into a section comprising a buffer section 215, a proximal section 211, followed by a distal section 212. The proximal section 211 is interposed between, and in contact with, the buffer section 215 and the distal section 212. The buffer section 215 is in contact with the first waveguide 200. The core 210, the buffer section 215, the proximal section 211, and the distal section 212 are made of the same material. The buffer section 215 has a width W2is measured parallel to the Y-axis, which is substantially constant here. The width W215 can be equal to the width W2n at the junction of the proximal section 211 with the buffer section 215, as shown here. It has a constant height equal to Hb measured parallel to the Z axis. In all embodiments, the widths W2i0, W2n, W212 and W2i5 are measured in the same plane parallel to the (X, Y) plane, for example at the level of a lower face of the corresponding sections..

[0074] The modal adaptation section 225 comprises the buffer section 215 and one end of the extension 311 of the base 310, opposite the buffer section 215. The end of the extension 311 is a continuation of the distal portion of the extension 311 which includes the distal border 311.1. In this example, the distal border 311.1 has a substantially straight segment opposite the buffer section 215. Preferably, the segment extends sufficiently in length on either side of the buffer section 215 in a plane parallel to the (X, Y) plane to compensate for a resolution limit of the extension 311 and / or an alignment uncertainty of the extension 311 with respect to the buffer section 215, during the formation of the extension 311 of the base 310.For an alignment uncertainty of 300 nm, typical of lithography equipment available on a microelectromechanical system (MEMS) production line, the distal edge segment 311.1 can be centered on the buffer section 215 and have a length between 30 pm and 500 pm, for example, 300 pm. The angle α can be between 4° and 8°. The segment can have other shapes to limit diffraction losses when passing through the distal edge 311.1.

[0075] The end of the extension 311a, for example, has a width equal to W3n, measured parallel to the Y-axis. The angle α is an acute angle, for example, between 2° and 10°, preferably between 4° and 8°. The distal edge 311.1 is thus a beveled edge, or a chamfer, of the extension 311 of the base 310, allowing for the minimization of transmission losses. In order to minimize these transmission losses, it is possible to jointly optimize W2i5, α, and S, for example, using a simulation tool.

[0076] A variant of the second embodiment will now be described with reference to [Fig. 2B]. Only the differences with the second embodiment are explicitly shown. Figures IB, IC, 1D, 1E are also views along sections AA, BB, CC and DD of [Fig.2A].

[0077] Here, the width W2n is a monotonically increasing function of X, moving away from the buffer section 215. The width W215 is substantially constant and equal to the minimum value of W2n. The width W2i0 of the core 210 is equal to the width W2i5 at the junction between the core 210 and the buffer section 215. Here, W2i0 is a monotonically increasing function of X, approaching the buffer section 215. The width W2i2 of the distal section 212 is equal to the maximum value of W2n at the junction between the distal section 212 and the proximal section 211.

[0078] An example of the operation of the coupling structure 1, 2, 3 will now be described for optically coupling a first optical mode propagating in the first waveguide 200 to a second optical mode propagating in the second waveguide 300, it being understood that the coupling structure 2 operates in the same way to couple the second optical mode to the first optical mode by applying the principle of reversibility of light. The first optical mode has a first effective index. The second optical mode has a second effective index strictly greater than the first effective index. Here, the first and second optical modes have an electrical transverse (TE) polarization.

[0079] In this example, dimensions are given in relation to specific conditions. More precisely, the wavelength X is equal to 1550 nm, the core 210 is made of silicon nitride, and the second waveguide 300 is made of lithium niobate. The height Hi cannot exceed a maximum height Hi>max imposed by mechanical constraints induced by the silicon nitride. This height is equal to 800 nm.

[0080] The heights H2b and H2a are sufficiently large here to incorporate at least part of an active photonic component and the second waveguide 300 in a single lithium niobate layer. The sum of the heights H2a and H2b is, for example, between 300 nm and 1 pm. The height H2b can, for example, be between 150 nm and 500 nm. In this example, the heights H2a and H2b are equal to 300 nm. The second effective index increases as H2a and / or H2b increase.

[0081] In this example, 0 has a value strictly less than 90° imposed by an etching step used for the formation of the second waveguide 300. The second effective index increases as 0 decreases. In this example, 0 is equal to 50°.

[0082] The first optical mode is confined by the core 210 and propagates towards the proximal section 211. It reaches a first transition zone when it reaches the distal edge 311.1. Diffraction losses induced by the distal edge 311.1 are minimized by optimizing the confinement of the first optical mode within the core 210 and by moving the first optical mode away from the distal border 311.1. Thus, the greater the thickness S, the less the diffraction losses are.

[0083] Figures 5A to 5C show simulation results giving the transmission loss (ordinate axis, in dB) between the first optical mode and an intermediate optical mode guided by the hybrid waveguide 250, as a function of the width W2i5 (abscissa axes, in pm). In [Fig. 5A], the transmission losses are given for an angle α equal to 4° and for a thickness S equal to 50 nm (curve C20), 100 nm (curve C21), 150 nm (curve C22), and 200 nm (curve C23). In [Fig. 5B], the transmission losses are given for an angle α of 8° and for a thickness S of 50 nm (curve C30), 100 nm (curve C31), 150 nm (curve C32), and 200 nm (curve C33). In [Fig. 5C], the transmission losses are given for an angle α of 30° and for a thickness S of 50 nm (curve C40), 100 nm (curve C41), 150 nm (curve C42), and 200 nm (curve C43).

[0084] Surprisingly, the transmission loss between the first optical mode and the intermediate optical mode is not a monotonic function of W215 when the angle α is less than or equal to 10°. For an angle α between 4° and 8°, the transmission losses between the first optical mode and the intermediate optical mode are minimal for a width W2i5 between 1.3 pm and 2 pm, with the transmission losses being even lower as S increases, here from 50 nm to 200 nm. As an example, for an angle α of 4° and a thickness S of 100 nm, the transmission losses reach a minimum for a width W2i5 of 1.75 pm.

[0085] In all embodiments, the height H2b is also preferably sufficiently small so that the first optical mode does not excite a competing optical mode to the intermediate optical mode, guided by the extension 311 of the base 310. This result is achieved in particular for an extension 311 of any height H2b, less than or equal to a value H2b>max, provided that the effective index of any optical mode of the same wavelength and polarization as the first optical mode, capable of propagating in the extension 311, is strictly less than the first effective index. The value H2b>max can, for example, be determined by simulation.

[0086] Upon passing through the first transition zone, the first optical mode transfers energy to the intermediate optical mode guided by the hybrid waveguide 250. The width W2n at the junction between the proximal section 211 and the distal section 212 is greater than a minimum width W2n min, beyond which the effective index of the intermediate optical mode is greater than or equal to the second effective index. Thus, it is possible to transfer energy from the intermediate optical mode to the second optical mode through the modal transition section 270.

[0087] Figure 3 shows simulation results giving the effective index of the second optical mode as a function of the width W32o (x-axis in nm) of edge 320 (CO curve) and the effective index of the intermediate optical mode as a function of the width W2n (x-axis in nm) of the proximal section 211, for a thickness S of 100 nm. Stars indicate dimensions of this example. For this example, the width W32o of edge 320 is chosen to be greater than or equal to 450 nm, at the resolution limit of lithography equipment available on a production line primarily adapted for MEMS production. Such a production line is adapted to receive lithium niobate, barium titanate, or lithium tantalate. The width W320 is here equal to 500 nm.

[0088] From [Fig.3], it can be seen that W2n min is equal to 1900 nm. W2n is therefore chosen to be strictly greater than 1.9 pm, for example in a range between 2 pm and 3 pm.

[0089] It has been observed that the minimum width W2n min increases when the thickness S increases and / or when 0 decreases. [Fig. 4] shows simulation results giving the maximum value Smax of the thickness S (ordinate axis, in nm) below which the effective index of the intermediate optical mode is strictly greater than the second effective index, as a function of 0 (abscissa axis, in degrees), for a width W2n at the junction between the proximal section 211 and the distal section 212, equal to 2.5 pm (C10 curve), 2.0 pm (C10 curve) and 1.5 pm (C10 curve).

[0090] The thickness S is chosen to be as large as possible to minimize transmission losses during the first transition, while remaining below an upper bound Ssup less than or equal to Smax, making it possible, for example, to guarantee that the thicknesses S of a plurality of coupling structures 1 are less than or equal to Smax despite uncertainties in a manufacturing process. In this example, the width W2n is chosen to be 2.5 pm and S to be 100 nm.

[0091] The intermediate optical mode then reaches the modal transition section 270. At the junction between the proximal section 211 and the distal section 212, the width W2i2 is equal to the width W2n. The width W2[2 decreases progressively monotonically, for example linearly, towards the second waveguide 300, to decrease the effective index of the intermediate optical mode until it reaches and exceeds the second effective index. Thus, part of the power of the intermediate optical mode is transferred to the second optical mode. The extension 321 of the edge 320 extends from the second waveguide 300 at least to the point where the effective index of the intermediate optical mode is equal to the second effective index. In this example, the width W2i2 decreases until it reaches a value of 200 nm, over a length between 10 pm and 50 pm measured along the +X axis. The section distal 212 can be formed using equipment from a CMOS production line, since silicon nitride is a common material on this type of production line.

[0092] The modal transition section 270 allows the power from the intermediate optical mode to the second optical mode to be transferred with a loss of less than 1 dB for the thickness S of 100 nm in this example. Reducing the thickness S reduces the transmission losses across the modal transition section 270 to values ​​less than or equal to 0.5 dB with the parameters and materials of this example.

[0093] In connection with [Fig. 6], a Mach-Zehnder modulator 5 is now described, implementing coupling structures 3 according to the variant of the second embodiment. It is capable of operating at frequencies greater than or equal to 50 GHz. The coupling structures 3 are identified by dashed rectangles in this figure. One or more of these coupling structures may, however, be replaced by a coupling structure 1, 2 according to the first or second embodiment.

[0094] The Mach-Zehnder modulator 5 comprises two arms 15. At least one arm includes a controllable phase shifter, capable of applying a phase shift to an optical mode guided by the phase shifter relative to an optical mode guided by the other arm 15, as a function of an input signal. The phase shift can be applied by any known means, for example by charge carrier injection, or by using a Pockels effect induced by an electric field or mechanical stress to obtain a non-centrosymmetric lattice. The input signal acts on the phase shifter by means of electrodes. In the case of operation by the Pockels effect, the electrodes apply the electric field to the phase shifter so as to modify its refractive index.

[0095] In this example, each arm comprises two coupling structures 3 arranged at two ends of the arm 15 and a phase shifter optically coupled to each coupling structure 3 of the arm. The Mach-Zehnder modulator 5 further comprises an input 10 and an output 11. The input 10 and the output 11 are each optically coupled to each of the arms 15 by a Y-junction 16 separate from the Mach-Zehnder modulator 5. Here, for each coupling structure 3, the first waveguide is made of silicon nitride. Each Y-junction is made of silicon nitride. For each coupling structure 3, the first waveguide is optically coupled to one end of a corresponding Y-junction, here by butt-to-end coupling.

[0096] The bases 310 and the extensions 311 of the four coupling structures 3 are parts of a common layer. Each phase shifter is an edge waveguide. It has an edge that is a raised part of the common layer. The edge of each phase shifter extends the edge 320 of the second waveguide of each structure of coupling structure 3 to which the phase shifter is optically coupled. Thus, each phase shifter is optically coupled to two coupling structures 3 by an end-to-end coupling. In this example, the phase shifters all have equal geometric dimensions. The edges 320 of the coupling structures 3 and the phase shifters are parts of the common layer. Here, all the coupling structures 3 have equal geometric dimensions. They are made of the same material.

[0097] The common layer is here made of a second-order nonlinear optical material, for example lithium niobate. The Mach-Zehnder modulator 5 further comprises electrodes 20 resting on the common layer. Two electrodes 20 are arranged on either side of each arm 15, so as to apply an electric field that modifies a refractive index of each phase shifter by the Pockels effect when an electrical potential difference is applied across their terminals. In this example, the Mach-Zehnder modulator 5 can be biased in "push-pull" mode, according to English terminology commonly used in the technical field, so that the electric field is in opposite directions in the two arms of the modulator.

[0098] The electrodes 20 consist of a central electrode and two external electrodes. The central electrode extends over the common layer between the two phase shifters of the Mach-Zehnder modulator 5, parallel to them. Each external electrode extends over the common layer parallel to a phase shifter, on one side of the corresponding arm 15, opposite the central electrode.

[0099] The outer electrodes each have, for example, a width of at least 100 pm. The central electrode has a width of 10 pm. The distance between the central electrode and an outer electrode is, for example, 5 pm. The electrodes can be made of metal, for example, aluminum and / or chromium.

[0100] The edge of each phase shifter has a width Wm that reduces propagation losses. For example, the width Wm is strictly greater than the width W320 of the edges 320 of all the coupling structures 3. It can be strictly greater than a width W320,max of the edge 320 beyond which it is not possible to obtain an effective index of the intermediate optical mode strictly greater than the second effective index for all values ​​of the width W2n. Propagation losses are lower the larger the width Wm. The effectiveness of a phase shift per unit length applied to an optical mode guided by the phase shifter depends on several parameters, including the width Wm and the heights H2a and H2b. Depending on the application, a compromise on the value of Wm may be sought to obtain the desired propagation losses and phase shift effectiveness.For example, for heights H2a and H2b both equal to 300 nm, the width Wm can be chosen to be greater than or equal to 750 nm, preferably approximately equal to 1.15 pm. Each . phase shifter extends between two coupling structures 3 over a length between 2 mm and 1 cm, for example equal to 5 mm.

[0101] An example of a method for realizing a coupling structure 1, 2, 3 as illustrated in Figures 7A to 7F is now described. Figures 7A to 7F are cross-sectional views CC of Figures 1A, 2A and 2B.

[0102] In [Fig. 7A], a first assembly is provided comprising the substrate 100, a lower containment layer 110, the core 210, the core extension 210 which includes the proximal section 211, the distal section 212, and optionally the buffer section 215. The core 210 and the core extension 210 may be part of a structured layer comprising passive photonic components. The structured layer may be obtained by a deposition step, for example low-pressure chemical vapor deposition (LPCVD), physical vapor deposition (PVD), or plasma-enhanced chemical vapor deposition (PECVD), followed by one or more lithography substeps, for example, using equipment available on a CMOS circuit production line.The structured layer here is made of silicon nitride.

[0103] The lower confinement layer 110 rests on the upper face of the substrate 100, in contact with it. An encapsulation layer 120 is deposited on the lower confinement layer 110 and on the structured layer, so as to encapsulate the core 210 and the extension of the core 210. The lower confinement layer 110 and the encapsulation layer 120 are, for example, made of silicon oxide resulting from a PVD or PECVD deposition.

[0104] Alternatively, the structured layer may have been formed by a Damascus-type process after the deposition of at least part of the encapsulation layer 120.

[0105] In [Fig. 7B], the encapsulation layer 120 is thinned, for example by a chemical mechanical polishing (CMP) substep. The remaining portion of the encapsulation layer 120 constitutes an upper confinement layer 131. The upper confinement layer 131 has a bonding face on one side of the upper confinement layer 131 opposite the substrate 100. Preferably, the bonding face of the upper confinement layer 131 covers the core 210 and the extension of the core 210, as shown in [Fig. 7B]. The bonding face has flatness, roughness, and chemical compatibility properties that allow bonding, in particular molecular bonding.

[0106] The upper containment layer 131 may include an optional bonding sublayer deposited after thinning of the encapsulation layer 120. This can be an aluminum oxide underlayer or a Benzo Cyclo Butene (BCB) polymer layer. It can be deposited by an atomic layer deposition (ALD) technique, an ion beam assisted deposition (IBAD) technique, or by spin coating.

[0107] In [Fig. 7C], a second assembly is provided comprising a temporary substrate 400, a buried layer 410, and an active layer 420. The buried layer 410 is intercalated between the temporary substrate 400 and the active layer 420. It is in contact with both the temporary substrate 400 and the active layer 420. The active layer 420 can be made of lithium niobate or barium titanate. The buried layer 410 is made of a material suitable for selective etching with respect to the active layer 420. Here, the buried layer 410 is made of silicon dioxide. The temporary substrate 400 can be made of silicon, quartz, silica glass, or lithium niobate. Here, the active layer 420 is made of lithium niobate, the buried layer 410 of silicon dioxide, and the temporary substrate 400 of silicon.

[0108] A bonding layer 430 is deposited on the active layer 420. During a bonding substep, the bonding face of the upper containment layer 131 is then brought into contact with the bonding layer 430, after any necessary surface treatments, so as to bond the first assembly to the second assembly. The bonding layer 430 is, for example, a silicon oxide or aluminum oxide layer. The bonding substep may be an oxide-oxide or alumina-alumina bond. It may be a hydrophilic molecular bond.

[0109] In [Fig. 7D], a possible heat treatment is carried out to strengthen a bonding interface between the bonding layer 430 and the upper confinement layer 131. The confinement layer 130 consists of the lower confinement layer 110, the upper confinement layer 131, and the bonding layer 430. The intercalated portion 132 consists of a part of the upper confinement layer 131 and a part of the bonding layer 430. It may include a residual bonding interface between the upper confinement layer 131 and the bonding layer 430, the upper confinement layer 131 possibly including a bonding sublayer in contact with the bonding layer 430. In the case of molecular bonding, the bonding interface may be closed, i.e., it comprises only covalent bonds between the upper confinement layer 131 and the bonding layer 430.

[0110] In [Fig. 7E], the temporary substrate 400 is removed by one or more substeps of honing and / or polishing and / or etching, for example chemical etching; where appropriate, etching may involve a tetramethylammonium hydroxide (TMAH) solution. The buried layer 410 is then removed by selective etching with respect to to the active layer 420. In this example of a process, selective etching uses a hydrofluoric acid (HF) solution.

[0111] Optionally, particularly when the temporary substrate 400 has a smaller dimension than one dimension of the substrate 100, a protective thin layer is conformally deposited on the containment layer 130 and the temporary substrate 400, between the step in [Fig. 7D] and the step in [Fig. 7E]. The portion of the thin layer in contact with the temporary substrate 400 is removed with the temporary substrate 400 during the substep of removing the temporary substrate 400. The protective thin layer is made of a material resistant to the selective etching used to remove the buried layer 410. The protective thin layer may be made of silicon nitride.

[0112] In [Fig. 7F], the second waveguide 300 is formed in the active layer 420, for example using one or more lithography devices having a resolution limit greater than or equal to 450 nm, available in a MEMS production line. The base 310, the extension 311 of the base 310 and the edge 320 are formed, for example, by ion beam etching (IBE) or reactive ion etching (RIE), based on argon ions. The base 310, the extension 311 of the base 310 and the edge 320 can then have flanks making an angle with the upper face of the substrate 100 between 40° and 90°, or between 40° and 80°, or between 40° and 80°, or substantially equal to 50°.

[0113] Specific embodiments have just been described. Various variants and modifications will be apparent to those skilled in the art. For example, it is possible to encapsulate the modal matching section 225 and / or the hybrid waveguide 250 and / or the modal transition section 270 and / or the second waveguide 300 by an additional encapsulation layer based on the confinement layer 130, on the base 310 and / or the extension 311 of the base 310 and / or the edge 320. The additional encapsulation layer is then transparent to wavelength X and has a refractive index enabling a light confinement function.

Claims

Demands

1. Coupling structure (1, 2, 3) for optically coupling a first optical mode having a first effective index and a second optical mode having a second effective index strictly greater than the first effective index, the coupling structure (1) comprising: • a first waveguide (200) including a core (210) configured to guide the first optical mode, the core (210) extending beyond the first waveguide (200) in an extension comprising a proximal section (211), close to the first waveguide (200), and a distal section (212) in contact with the proximal section (211), • a second waveguide (300) including a base (310) and an edge (320), configured to guide the second optical mode, • a hybrid waveguide (250), interposed between the first and second waveguides (200, 300), including the proximal section (211) and an extension (311) of the base (310) beyond the second waveguide (300),arranged to cooperate in guiding an intermediate optical mode optically coupled to the first optical mode by the extension, • a modal transition section (270) extending from the hybrid waveguide (250) to the second waveguide (300), comprising the distal section (212); the coupling structure being such that: • the proximal section (211) has a width at a junction with the distal section (212) such that an effective index of the intermediate optical mode is strictly greater than the second effective index, • the distal section (212) narrows continuously as it moves away from the hybrid waveguide (250) so as to achieve optical coupling between the intermediate optical mode and the second optical mode.

2. Coupling structure (1, 2, 3) according to claim 1, wherein the proximal section (211) is separated from the extension (311) of the base (310) by an intercalated dielectric portion (132).

3. Coupling structure (1, 2, 3) according to claim 2, wherein the intercalated portion (132) is made of silicon oxide or aluminum oxide.

4. Coupling structure (2, 3) according to any one of claims 1 to 3, wherein the extension further comprises a buffer section (215) interposed between the first waveguide (200) and the proximal section (211), the extension (311) of the base (310) has a bevel (311.1) opposite the buffer section (215) making an angle α less than or equal to 10° with an optical axis of the first waveguide, and extending on either side of the buffer section (215).

5. Coupling structure (2, 3) according to claims 2 and 4, wherein the angle a is less than or equal to 8°, and the buffer section (215) has a width between 1.3 pm and 2 pm.

6. Coupling structure (2, 3) according to claim 5, wherein the intercalated portion (132) has a thickness S between 50 nm and 200 nm.

7. Coupling structure (1, 2, 3) according to any one of the preceding claims, wherein the core (210) is made of silicon nitride and the base (310) of lithium niobate, lithium tantalate, or barium titanate.

8. Coupling structure (1, 2, 3) according to claim 7, wherein the edge (320) is made of lithium niobate, lithium tantalate, barium titanate, silicon nitride, titanium oxide, tantalum oxide, silicon carbide, or silicon.

9. Coupling structure (1, 2, 3) according to any one of the preceding claims, wherein the edge (320) has a width W320 greater than or equal to 450 nm.

10. Coupling structure (1, 2, 3) according to claim 9, wherein the coupling structure (1, 2, 3) further comprises a substrate (100), the second waveguide (300) extends parallel to an upper face of the substrate (100) and the edge (320) has flanks making an angle less than or equal to 80° with respect to the upper face of the substrate (100).

11. Coupling structure (1, 2, 3) according to any one of the preceding claims, wherein the extension (311) has a height H2b such that the effective index of any optical mode of the same wavelength and polarization as the first mode optical, capable of propagating in the extension (311), is strictly less than the first effective index.

12. Optical modulator (5) comprising a coupling structure (1,2, 3) according to any one of claims 1 to 11.

13. Optical modulator (5) according to claim 12, wherein the modulator is a Mach-Zehnder modulator (5) comprising two arms (15), one arm (15) comprising a Pockels-controllable phase shifter, optically coupled to the second waveguide (300) of the coupling structure (1, 2, 3) by an end-to-end coupling.

14. A method for manufacturing a coupling structure (1, 2, 3) according to any one of claims 1 to 11, comprising the following successive steps: • providing a first assembly comprising a substrate (100), the core (210) of the first waveguide (200) and an upper confinement layer (131), such that the core (210) extends over the substrate (100) parallel to an upper face of the substrate (100), and the upper confinement layer (131) encapsulates the core (210), • transferring an active layer (420) onto the core (210) and the upper confinement layer (131), • forming the second waveguide (300) in the active layer (420).

15. A manufacturing method according to claim 14, wherein the coupling structure (1, 2, 3) is a coupling structure (1,2, 3) according to claim 2; the upper containment layer (131) has a bonding face covering the core (210), substantially parallel to the upper face; the transfer step is a molecular bonding of the bonding face with a bonding layer (430) in contact with the active layer (420); and the intercalated portion (132) consists of a part of the upper containment layer (131) and a part of the bonding layer (430).

16. A manufacturing method according to claim 15, wherein the upper containment layer (131) and the bonding layer (430) are made of silicon oxide.

17. A manufacturing method according to any one of claims 14 to 16, wherein the active layer (420) is lithium niobate, lithium tantalate, or barium titanate. 25