Load port

Abstract

To provide a load port capable of keeping a peripheral space clean when a FOUP is connected to a housing.SOLUTION: A load port includes: a base 41 constituting a part of a wall partitioning a transportation space 9 from an external space; an opening 92 provided to the base 41; a door 81 capable of opening and closing of the opening 92 and securing of a lid to, and cancellation of securing of the lid from, a container containing contents; and a first seal member 94 for sealing a space between the base and the container. At least a part of the container-side end surface 81c of the door 81 is located nearer to a side of the transportation space 9 than the container-side end part of the first seal member 94.SELECTED DRAWING: Figure 11

Description

[Technical field]

[0001] The present invention relates to a load port capable of circulating gas within a wafer transfer chamber so as to prevent wafers being exposed to the outside air during transfer. [Background technology]

[0002] Traditionally, semiconductors have been manufactured by subjecting wafers to various processing steps as substrates. In recent years, with the increasing integration of elements and miniaturization of circuits, it is necessary to maintain a high level of cleanliness around the wafer to prevent particles and moisture from adhering to the wafer surface. Furthermore, the area around the wafer is often placed in an inert gas, such as nitrogen, or in a vacuum state to prevent the surface properties of the wafer from changing, such as oxidation.

[0003] In order to properly maintain the atmosphere around the wafers, the wafers are stored in a sealed storage pod called a FOUP (Front-Opening Unified Pod), which is filled with nitrogen. Furthermore, an Equipment Front End Module (EFEM) is used to transfer the wafers between the processing equipment that processes the wafers and the FOUP. The EFEM forms a wafer transfer chamber that is substantially closed inside a housing, and is provided with a load port on one of its opposing walls that functions as an interface with the FOUP, and is connected to a load lock chamber, which is part of the processing equipment, on the other side. A wafer transfer device for transferring the wafers is provided in the wafer transfer chamber, and the wafers are transferred in and out between the FOUP connected to the load port and the load lock chamber using the wafer transfer device.

[0004] As shown in Patent Document 1, for example, a load port has a structure in which the door protrudes toward the FOUP side beyond the housing when the door is closed. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] JP 2014-112631 A Summary of the Invention [Problem to be solved by the invention]

[0006] However, in the load port described in Patent Document 1, when the FOUP is brought close to the housing in order to be connected to it, the FOUP comes into contact with the door protruding from the housing, which causes a problem in that fragments fly off due to this contact, contaminating the space around the EFEM.

[0007] Therefore, the present invention has been made to solve the above-mentioned problems, and has an object to provide a load port that can keep the surrounding space clean when connecting a FOUP to a housing. [Means for solving the problem]

[0008] The load port according to the present invention comprises: A base constituting a part of a wall that separates the transport space from the outside space; An opening provided in the base; a door capable of opening and closing the opening and fastening and unlocking a lid body to a container containing an object; a first seal member for sealing between the base and the container; Equipped with At least a part of the container-side end face of the door is located closer to the transfer space than the container-side end face of the first seal member.

[0009] In this load port, even if the lid of the container expands toward the base, when the container is attached to the opening, the container-side end face of the door is located closer to the transfer space than the container-side end of the first seal member, so the lid and door do not come into contact. This prevents the lid from coming into contact with the door and causing debris to fly off, and keeps the space around the load port clean. It also reduces the possibility of debris already attached to the door flying up due to the impact of contact, or the container shaking due to the impact of contact causing debris to fly off the bottom of the container or the position of the contents to shift.

[0010] The load port according to the present invention comprises: a clamp unit that presses the container toward the base when the container is attached to the opening, At least a portion of the container-side end face of the door is positioned closer to the transfer space than the container-side end of the first seal member pressed toward the base by the container clamped by the clamp unit.

[0011] In this load port, at least a part of the container-side end face of the door is located closer to the transfer space than the container-side end of the first seal member that is clamped and pressed against the base, thereby reliably preventing contact between the lid and the door when the container is attached to the opening.

[0012] The load port according to the present invention comprises: A part of the end surface of the door facing the container has a recess that is recessed toward the transfer space.

[0013] In this load port, even if the lid of the container expands toward the base, contact between the lid and the door can be reliably prevented.

[0014] The load port according to the present invention comprises: The shape of the recess corresponds to the expansion surface of the lid body that expands due to an increase in pressure inside the container.

[0015] In this load port, the shape of the recess corresponds to the expansion surface of the lid body that expands due to increasing the pressure inside the container, so that contact between the lid body and the door can be reliably prevented even if the lid body expands into various shapes.

[0016] The load port according to the present invention comprises: a second seal member for sealing between the base and the door; The entire container-side end face of the door is located closer to the transfer space than the container-side end face of the first seal member.

[0017] In this load port, the entire container-side end face of the door is located closer to the transfer space than the container-side end of the first seal member, thereby preventing contact between the lid and the door and maintaining the seal between the base and the door by the second seal member.

[0018] The load port according to the present invention comprises: a second seal member for sealing between the base and the door; When the container is in contact with the opening via the first seal member, a sealed space formed by at least the first seal member, the second seal member, the lid body, and the door; A first gas injection unit that injects a gas into the sealed space; A first gas exhaust section that exhausts the sealed space; Equipped with:

[0019] This load port includes a first gas injector that injects gas into the sealed space between the container and the door when the container is in contact with the opening via the first seal member, i.e., when the container is attached to the opening, and a first gas exhauster that exhausts the gas from the sealed space. This allows the atmosphere between the container and the door to be removed and filled with nitrogen gas (purged) when the container is attached to the opening. This prevents the atmosphere, which may exist between the container and the door and may cause the wafer to be oxidized or otherwise change its properties, from flowing into the transfer space and inside the container when the door is opened. In other words, the oxygen, moisture, and particles in the sealed space can be removed before the container lid is opened to open the sealed space. This prevents oxygen and the like from leaking into the container or the transfer space when the lid is opened, and the container and the transfer space can be maintained at the desired environmental conditions.

[0020] The load port according to the present invention comprises: a second seal member for sealing between the base and the door; a sealed space defined by the base, the first seal member, the second seal member, the lid, and the door when the container is in contact with the base via the first seal member and the door is in contact with the base via the second seal member; Equipped with When clamping the container to the base, the container is moved toward the door from a state in which the door and the lid are spaced apart.

[0021] In this load port, when the container is clamped to the base, the container is moved toward the door from a state in which the door and the lid are spaced apart, thereby improving the sealing performance between the container and the base via the first seal member. Effect of the Invention

[0022] In the present invention, even if the lid of the container expands toward the base, when the container is attached to the opening, the container-side end face of the door is located closer to the transfer space than the container-side end of the first seal member, so the lid and the door do not come into contact with each other. This prevents the lid from coming into contact with the door and causing debris to fly off, and keeps the space around the load port clean. It also reduces the possibility of debris already attached to the door flying up due to the impact of contact, or the container shaking due to the impact of contact causing debris to fly off the bottom of the container or the position of the contents to shift.

[0023] In the present invention, at least a part of the container-side end face of the door is located closer to the transfer space than the container-side end of the first seal member that is clamped and pressed against the base, thereby reliably preventing contact between the lid and the door when the container is attached to the opening.

[0024] In the present invention, even if the lid of the container expands toward the base, contact between the lid and the door can be reliably prevented.

[0025] In the present invention, the shape of the recess corresponds to the expansion surface of the lid body that expands due to increasing the pressure inside the container, so that contact between the lid body and the door can be reliably prevented even if the lid body expands into various shapes.

[0026] In the present invention, the entire container-side end face of the door is located closer to the transfer space than the container-side end face of the first seal member, thereby preventing contact between the lid body and the door and maintaining the seal between the base and the door by the second seal member.

[0027] In the present invention, when the container is in contact with the opening via the first seal member, that is, when the container is attached to the opening, a first gas injector injects gas into the sealed space between the container and the door, and a first gas exhauster exhausts the gas from the sealed space. This allows the atmosphere between the container and the door to be removed and filled with nitrogen gas (purged) while the container is attached to the opening. This prevents the atmosphere, which may exist between the container and the door and may cause the wafer to be oxidized or otherwise change its properties, from flowing into the transfer space and the container when the door is opened. In other words, the oxygen, moisture, and particles in the sealed space can be removed before the container lid is opened to open the sealed space. This prevents oxygen and the like from leaking into the container or the transfer space when the lid is opened, and the container and the transfer space can be maintained at the desired environmental conditions.

[0028] In the present invention, when the container is clamped to the base, the container is moved toward the door from a state in which the door and the lid are spaced apart, thereby improving the sealing performance between the container and the base via the first seal member. [Brief description of the drawings]

[0029] [Figure 1] FIG. 2 is a plan view showing a schematic relationship between an EFEM and a processing apparatus according to an embodiment of the present invention. [Diagram 2] FIG. 1 is a side view of the EFEM with the side wall removed. [Diagram 3] FIG. 2 is a perspective view showing a part of the EFEM in a cutaway; [Figure 4] Schematic diagram showing gas flow in the circulation path of the EFEM. [Diagram 5] FIG. 2 is a perspective view of the load port shown in FIG. [Figure 6] FIG. 2 is a front view of the load port shown in FIG. [Figure 7] FIG. 2 is a rear view of the load port shown in FIG. 1 . [Figure 8] FIG. 2 is a side cross-sectional view of the load port shown in FIG. [Figure 9]FIG. 4 is a partially enlarged cross-sectional view showing the relationship between the door portion and a first seal member. [Figure 10] 9 is a side cross-sectional view showing a state in which the FOUP has been moved toward the housing from the state shown in FIG. 8. [Figure 11] FIG. 4 is a partially enlarged cross-sectional view showing a sealed space sealed by a sealing member. [Figure 12] FIG. 2 is an enlarged partial cross-sectional view showing the state in which the FOUP is brought close to the door section by being clamped. [Figure 13] 11 is a side cross-sectional view showing a state in which the door portion together with the lid of the FOUP has been moved away from the opening portion from the state shown in FIG. 10; [Figure 14] 14 is a side cross-sectional view showing a state in which the door portion has been moved downward together with the lid of the FOUP from the state shown in FIG. 13. [Figure 15] FIG. 2 is an enlarged perspective view of a main portion of the window unit and door portion that constitute the EFEM. [Figure 16] 16 is an enlarged cross-sectional view of a main portion taken along line AA of FIG. 15. [Figure 17] FIG. 4 is an enlarged front view of a main portion showing a clamp provided on the window unit. [Figure 18] FIG. 4 is a block diagram showing a connection state between a control unit and each pressure gauge and each valve. [Figure 19] 4 is a flowchart showing a procedure for connecting and communicating a FOUP with an EFEM. [Figure 20] 13A is a cross-sectional view showing a modified example of the clamp unit, and FIG. 13B is a front view showing the clamped state of FIG. [Figure 21] 21A is a cross-sectional view showing the clamp in FIG. 20 in a released state, and FIG. 21B is an enlarged cross-sectional view showing the support piece in FIG. [Figure 22] 1A is an enlarged plan view showing the clamp released state, FIG. 1B is an enlarged plan view showing the clamp in the middle of operation, and FIG. 1C is an enlarged plan view showing the clamped state. [Figure 23] 1A is a cross-sectional view showing a modified door portion having a recessed portion recessed toward the transfer space side, and FIG. 1B is a cross-sectional view showing a modified door portion having a curved surface recessed in an arch shape toward the transfer space side. [Figure 24]13A is a cross-sectional view showing a door portion of a further modified example having a recessed portion recessed toward the transport space side, and FIG. 13B is a cross-sectional view showing a door portion of a further modified example having a curved surface recessed in an arch shape toward the transport space side. [Diagram 25] FIG. 13 is a diagram showing a gas flow path according to a modified example when pressure P1 is higher than pressure P2. [Figure 26] FIG. 13 is a diagram showing a gas flow path according to a modified example when pressure P1 is lower than pressure P2. [Figure 27] FIG. 13 is a block diagram showing a connection state between the control unit and each pressure gauge and each valve in a modified example. [Figure 28] 12 is a partially enlarged cross-sectional view showing a modification in which the door portion is advanced from the state shown in FIG. 11 toward the lid of the FOUP. [Figure 29] FIG. 13 is a cross-sectional view showing a modified example in which two O-rings are integrated. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0030] Hereinafter, an embodiment of the present invention will be described with reference to the accompanying drawings.

[0031] Fig. 1 is a plan view showing a schematic diagram of the relationship between the EFEM 1 according to an embodiment of the present invention and the processing device 6 connected thereto, with the inside of the EFEM 1 being visible by removing the top plate and the like of the processing device 6. Fig. 2 is a side view showing the inside of the EFEM 1 being visible by removing the side walls. As shown in Figs. 1 and 2, the EFEM 1 is composed of a wafer transport device 2 that transports wafers W between predetermined transfer positions, a box-shaped housing 3 provided to surround the wafer transport device 2, a plurality of load ports 4 (three in the figure) connected to the outside of the front wall (front wall 31) of the housing 3, and a control means 5.

[0032] In this application, the direction toward the side to which the load ports 4 are connected as viewed from the housing 3 is defined as the front, the direction toward the rear wall 32 side opposite the front wall 31 is defined as the rear, and further, the direction perpendicular to the front-rear direction and the vertical direction is defined as the side. In other words, the three load ports 4 are arranged side by side.

[0033] As shown in FIG. 1, the EFEM 1 is connected to a load lock chamber 61, which constitutes a part of the processing device 6, adjacent to the outside of the rear wall 32. By opening a door 1a provided between the EFEM 1 and the load lock chamber 61, the inside of the EFEM 1 and the load lock chamber 61 can be communicated with each other. Various types of processing device 6 can be used, but in general, a transfer chamber 62 is provided adjacent to the load lock chamber 61, and a plurality of processing units 63-63 (three in the figure) that process the wafer W are provided adjacent to the transfer chamber 62. Doors 62a, 63a-63a are provided between the transfer chamber 62 and the load lock chamber 61 and between the processing units 63-63, respectively, and can be opened to communicate with each other. In addition, a transfer robot 64 provided in the transfer chamber 62 can be used to move the wafer W between the load lock chamber 61 and the processing units 63-63.

[0034] As shown in Fig. 2, the wafer transport device 2 is composed of an arm section 2a equipped with a pick for placing and transporting a wafer W, and a base section 2b supporting the arm section 2a from below and having a drive mechanism and an elevation mechanism for operating the arm section. The base section 2b is supported on the front wall 31 of the housing 3 via a support section 21 and a guide rail 22. The wafer transport device 2 is capable of moving along the guide rail 22 extending in the width direction within the housing 3. The control means 5 controls the operation of the wafer transport device 2, thereby making it possible to transport the wafer (content) W contained in the FOUP (container) 7 placed on each of the load ports 4 arranged to the side to the load lock chamber 61, and to transport the wafer W again into the FOUP 7 after the processing in each of the processing units 63-63 has been performed.

[0035] The housing 3 includes a front wall 31, a rear wall 32, side walls 33, 34, a ceiling wall 35, a bottom wall 36, and columns 37a-37d that support the housing walls 31-35. The load port 4 is attached to an opening 92 provided in the front wall 31. The load lock chamber 61 is connected to a rectangular opening 32a provided in the rear wall 32. The housing 3 has a transfer space 9 and a gas return path 10, which will be described later, and a substantially closed space CS (see FIG. 4) that includes these is formed. The above-mentioned members are precisely attached so that no gaps are formed between the members through which the internal gas can flow out, but a seal member may be provided between the members to further increase the airtightness inside the housing 3. The opening 32a provided in the rear wall 32 has a drive mechanism 1b and can be closed by a door 1a (see FIG. 3) that is generally called a gate valve and moves up and down. Although not shown in the figures or explained, openings are also provided in the side walls 33, 34, one of which is used to connect an aligner used to adjust the position of the wafer W, and the other is an opening for maintenance that is normally closed.

[0036] The load port 4 is equipped with a door section 81, which is connected to a lid 72 provided on the FOUP 7 and moves together with the lid section 81 to open the FOUP 7 to the substantially closed space CS. A large number of placement sections are provided in the vertical direction within the FOUP 7, which allows a large number of wafers W to be accommodated. The FOUP 7 is usually filled with nitrogen, and the atmosphere within the FOUP 7 can also be replaced with nitrogen via the load port 4 under the control of the control means 5.

[0037] The control means 5 is configured as a controller unit provided in the upper space US located above the ceiling wall 35 of the housing 3 and between the top plate 38. The control means 5 also performs drive control of the wafer transport device 2, nitrogen replacement control of the FOUP 7 by the load port 4, opening and closing control of the door 1a and the door portion 81, and nitrogen circulation control within the housing 3. The control means 5 is configured of a normal microprocessor equipped with a CPU, memory, and interface, and the memory stores programs required for processing in advance. The CPU sequentially retrieves and executes the required programs, and cooperates with peripheral hardware resources to realize the desired functions. The nitrogen circulation control will be described later.

[0038] As shown in FIG. 4, the substantially closed space CS is divided by a partition member 8 into a transport space 9, which is a space in which the wafer transport device 2 is driven, and a gas return path 10. The transport space 9 and the gas return path 10 communicate only through a gas outlet 11 provided in the upper part of the transport space 9 and extending in the width direction, and a gas suction port 12 provided in the lower part of the transport space 9 and extending in the width direction. The gas outlet 11 and the gas suction port 12 generate a downward air current in the transport space 9 and generate an upward air current in the gas return path 10, thereby forming a circulation path Ci shown by the arrows in FIG. 4 in the substantially closed space CS, and the gas circulates. In this embodiment, nitrogen, which is an inert gas, is circulated in the substantially closed space CS, but the circulated gas is not limited to this, and other gases can be used.

[0039] Next, the configuration of the gas return path 10 will be described in detail. As shown in Fig. 4, the gas return path 10 is a space closed by a bottom wall 36, a back wall 32, a ceiling wall 35, and a partition member 8. The gas return path 10 is provided to return the gas sucked through a gas suction port 12 at the lower part of the transfer space 9 to a gas delivery port 11 at the upper part of the transfer space 9.

[0040] A gas supplying means (third gas injecting section) 16 for introducing nitrogen into the substantially closed space CS is connected to the upper part of the back side of the return path 10. The gas supplying means 16 is capable of controlling the supply and stop of the supply of nitrogen based on a command from the control means 5. Therefore, when a part of the nitrogen flows out of the substantially closed space CS, the gas supplying means 16 supplies the outflowing nitrogen, thereby making it possible to keep the nitrogen atmosphere in the substantially closed space CS constant. In addition, a gas exhausting means (third gas exhausting section) 17 for exhausting the gas in the substantially closed space CS is connected to the lower part of the back side. The gas exhausting means 17 operates based on a command from the control means 5, and is capable of communicating the inside of the substantially closed space CS with a gas exhausting destination provided outside by opening a shutter not shown. By using the gas supplying means 16 in combination with the supply of nitrogen by the above-mentioned gas supplying means 16, it is possible to replace the substantially closed space CS with a nitrogen atmosphere. In this embodiment, the gas circulated through the circulation path Ci is nitrogen, so the gas supply means 16 supplies nitrogen. However, when another gas is circulated, the gas supply means 16 supplies the gas to be circulated.

[0041] Further, a fan filter unit 13 (FFU13) composed of a fan 13a and a filter 13b as a first blowing means is provided at the gas outlet 11. The fan filter unit 13 removes particles contained in the gas circulating in the substantially closed space CS, and generates a downward air current in the transfer space 9 by blowing air downward into the transfer space 9. The FFU13 is supported by a support member 18 connected to the partition member 8 and extending in the horizontal direction.

[0042] On the other hand, a chemical filter 14 is connected to the gas suction port 12, and the gas in the transfer space 9 flows into the gas return path 10 through the chemical filter 14. As described above, the wafer transfer device 2 (see FIG. 2) is supported on the front wall 31 of the housing 3 via the support 21 and the guide rail 22. Therefore, the gas suction port 12 can be opened widely upward without interfering with the wafer transfer device 2. As described above, the gas suction port 12 is provided extending in the width direction, so that even if particles are generated during the operation of the wafer transfer device 2, the guide rail 22, which is also provided extending in the width direction, can effectively suck the particles. By providing the chemical filter 14 to the gas suction port 12, it is possible to remove molecular contaminants that are generated during processing in the processing device 6 (see FIG. 1) and flow into the transfer space 9. Furthermore, a fan 15 as a second blowing means is provided across the width of the gas return path 10 on the rear side of the chemical filter 14 (see FIG. 4). The fan 15 blows air toward the downstream side of the gas return path 10, i.e., toward the upper side in FIG. 4, thereby generating a suction force of the gas at the gas suction port 12 and sending the gas that has passed through the chemical filter 14 upward, thereby generating an ascending air current in the gas return path 10.

[0043] The gas in the substantially closed space CS is circulated by descending in the transfer space 9 and ascending in the gas return path 10 by the fan 13a and fan 15 of the FFU 13 described above. Since the gas delivery port 11 opens downward, the gas is delivered downward by the FFU 13. Since the gas suction port 12 opens upward, the gas can be sucked downward without disturbing the downward air current generated by the FFU 13, thereby creating a smooth gas flow. The downward air current generated in the transfer space 9 removes particles adhering to the upper part of the wafer W and prevents particles from floating in the transfer space 9.

[0044] Next, the operation of nitrogen circulation control for circulating nitrogen in the EFEM 1 configured as above will be described with reference to FIG.

[0045] First, in the initial stage, the control means 5 causes the gas exhaust means 17 to exhaust gas while causing the gas supply means 16 to supply nitrogen into the substantially closed space CS, thereby purging the substantially closed space CS of the EFEM 1, which is in the air atmosphere, into a nitrogen atmosphere. After this stage, if nitrogen leaks to the outside in the circulation path Ci, the control means 5 causes the gas supply means 16 to supply nitrogen according to the amount of leakage.

[0046] In the substantially closed space CS that has thus become a nitrogen atmosphere, the control means 5 drives the fan 13a and fan 15 of the FFU 13 to cause gas to circulate in the circulation path Ci. At this time, the filter 13b and chemical filter 14 of the FFU 13 remove particles and molecular contaminants in the circulating gas, so that a downward current of clean nitrogen is constantly generated in the transfer space 9.

[0047] In the EFEM 1 in this state, the FOUP 7 placed on the load port 4 and purged with a nitrogen atmosphere is communicated with the transfer space 9 to load and unload the wafers W. At this time, both the transfer space 9 and the FOUP 7 are in the same nitrogen atmosphere, and the nitrogen in the transfer space 9 is also kept clean. Therefore, there is no need to make the inside of the FOUP 7 positive pressure relative to the inside of the transfer space 9 to prevent particles and molecular contaminants from entering the FOUP 7, and the consumption of nitrogen purged into the FOUP 7 can be reduced.

[0048] 5, 6, and 7 respectively show a perspective view, a front view as seen from the front, and a rear view as seen from the rear of the load port 4. The configuration of the load port 4 will be explained below using these drawings. Note that these drawings show a state in which the external cover 42 (see FIG. 3) located below the mounting table 44 has been removed to expose part of the internal structure.

[0049] The load port 4 has a base 41 that stands vertically behind legs 45 to which casters and installation legs are attached, and a horizontal base 43 is provided facing forward at a height position that is about 60% of the height of the base 41. Furthermore, a mounting table 44 for placing a FOUP 7 (see FIG. 2) is provided on the upper part of the horizontal base 43.

[0050] As shown typically in Fig. 8, the FOUP 7 is made up of a main body 71 having an internal space Sf for accommodating a wafer W (see Fig. 2), and a lid 72 for opening and closing an opening 71a provided on one side of the main body 71 to serve as an entrance for loading and unloading the wafer W. When the FOUP 7 is properly placed on the mounting table 44, the lid 72 faces the base 41. A space Sc is formed inside the lid 72 (see Fig. 11) for accommodating a connecting means 82 (see Fig. 7) (described later) for opening and closing the lid 72, and the like.

[0051] 5 to 7, positioning pins 44a for positioning the FOUP 7 are provided on the mounting table 44, and locking claws 44b for fixing the FOUP 7 to the mounting table 44 are also provided. By performing a locking operation, the locking claws 44b can cooperate with the positioning pins 44a to guide and fix the FOUP 7 to an appropriate position, and by performing an unlocking operation, the FOUP 7 can be made removable from the mounting table 44. Note that the mounting table 44 can be moved in the front-rear direction by a mounting table drive unit (not shown) with the FOUP 7 placed on it.

[0052] Further, the mounting table 44 is provided with two second gas injection nozzles (second gas injection section) 44c for supplying gas into the FOUP 7, and two second gas exhaust nozzles (second gas exhaust section) 44d for exhausting gas from the inside of the FOUP 7. The second gas injection nozzles 44c and the second gas exhaust nozzles 44d are usually located below the upper surface of the mounting table 44, and when in use, they move upward to connect to a gas supply valve 73 and a gas exhaust valve 74 (see FIG. 8) provided on the FOUP 7, respectively.

[0053] In use, one end of the second gas injection nozzle 44c communicates with the inside of the FOUP7, and the other end is provided with a second gas injection valve 44e. Similarly, one end of the second gas exhaust nozzle 44d communicates with the inside of the FOUP7, and the other end is provided with a second gas exhaust valve 44f. Then, gas such as dry nitrogen gas is supplied from the second gas injection nozzle 44c to the internal space Sf of the FOUP7 via the gas supply valve 73, and the gas in the internal space Sf is exhausted from the second gas exhaust nozzle 44d via the gas exhaust valve 74, thereby making it possible to perform gas purging. In addition, by making the gas supply amount greater than the gas exhaust amount, it is possible to set a positive pressure in which the pressure of the internal space Sf is increased relative to the pressure of the outside and the internal space Se of the housing 3 (see FIG. 2). By increasing the pressure inside the FOUP7 (internal space Sf), the surface of the lid body 72 bulges toward the door part 81 more than the abutting surface 71b, as shown in FIG. 11.

[0054] The base 41 constituting the load port 4 constitutes a part of the front wall 31 that separates the transfer space 9 from the outside space. As shown in FIG. 5, the base 41 is composed of support columns 41a, 41a standing on both sides, a base body 41b supported by the support columns 41a, and a window unit 90 attached to a window portion 41c opened in a substantially rectangular shape on the base body 41b. Here, the term "substantially rectangular" as used herein refers to a shape in which the basic shape is a rectangle having four sides and the four corners are smoothly connected by arcs. A gasket 47 (see FIG. 7) formed as an elastic material in the shape of a rectangular frame is provided near the outer periphery of the rear surface of the base body 41b. The gasket 47 is made of a rubber material that is less permeable to gas.

[0055] The window unit 90 is provided at a position facing the lid 72 (see FIG. 8) of the above-mentioned FOUP 7. As described in detail later, the window unit 90 is provided with a substantially rectangular opening 92 (see FIG. 15), and is therefore able to open the internal space Se of the housing 3 through this opening 92. The load port 4 is provided with an opening / closing mechanism 80 for opening and closing the window unit 90 configured to allow the attachment of a FOUP 7.

[0056] As shown in Figure 6, the opening / closing mechanism 80 includes a door portion 81 for opening and closing the opening 92, a support frame 83 for supporting the door portion 81, a movable block 85 for supporting the support frame 83 so as to be movable in the front-rear direction via a slide support means 84, and a slide rail 86 for supporting the movable block 85 so as to be movable in the up-down direction relative to the base body 41b.

[0057] 8, the support frame 83 supports the rear lower part of the door part 81, and has a generally clamp-like shape that extends downward and then passes through a slit-like insertion hole 41d provided in the base body 41b and protrudes toward the front of the base body 41b. A slide support means 84, a movable block 85, and a slide rail 86 for supporting the support frame 83 are provided in front of the base body 41b. That is, the driving points for moving the door part 81 are located outside the housing 3, and even if particles are generated in these parts, the insertion hole 41d is made small in a slit shape, making it possible to suppress the particles from entering the housing 3.

[0058] The door section 81 of the opening / closing mechanism 80 will be described in detail below. As shown in Fig. 8, the door section 81 is provided with a first gas injection nozzle (first gas injection section) 87 for injecting gas between the FOUP 7 and the door section 81 when the FOUP 7 is attached to the window unit 90, and a first gas exhaust nozzle (first gas exhaust section) 88 for exhausting gas between the FOUP 7 and the door section 81. One end of the first gas injection nozzle 87 extends to the outer surface of the door section 81, and a first gas injection valve 87a is provided at the other end. Similarly, one end of the first gas exhaust nozzle 88 extends to the outer surface of the door section 81, and a first gas exhaust valve 88a is provided at the other end. As a result, with the door portion 81 and the lid body 72 integrated by clamping as described below, the first gas injection nozzle 87 communicates with the sealed space Sd (see FIG. 11) to supply a gas such as dry nitrogen gas, and the first gas exhaust nozzle 88 communicates with the sealed space Sd to exhaust the gas, thereby enabling gas purging. The first gas exhaust nozzle 88 is branched midway and is provided with a pressure equalizing valve 89, and is also used as a pressure equalizing nozzle for equalizing the pressure between the sealed space Sd and the transfer space 9.

[0059] FIG. 9 is a partially enlarged cross-sectional view of FIG. 8 showing the relationship between the door part 81 and the O-ring (first seal member) 94. As shown in FIG. 9, the end face 81c of the door part 81 on the FOUP7 side is located toward the transfer space 9 from the FOUP7 side end of the O-ring 94 by a desired dimension L2. In this manner, the entire end face 81c of the door part 81 on the FOUP7 side is located toward the transfer space 9 from the FOUP7 side end of the O-ring 94. Therefore, contact between the lid 72 and the door part 81 can be reliably prevented, and the seal between the base 41 and the door part 81 by the O-ring 96 can be maintained. In the drawing, the position of the FOUP7 side end of the O-ring 94 is indicated by an imaginary line L1. The dimension L2 is, for example, 0.1 mm or more and 3 mm or less.

[0060] Furthermore, actuators (not shown) for moving the door portion 81 in the forward / backward and upward / downward directions are provided for each direction, and by giving these actuators drive commands from the control unit Cp, the door portion 81 can be moved in the forward / backward and upward / downward directions.

[0061] Further, a cover 46 (see FIG. 8) is provided in front of the base body 41b, extending downward from directly below the horizontal base 43, and the inside of this cover 46 covers the support frame 83, the slide support means 84, the movable block 85 and the slide rail 86 to be in a sealed state. Therefore, although an insertion hole 41d is formed in the base body 41b, gas in the housing 3 (see FIG. 3) is prevented from flowing out through this portion. A lower end of a first gas injection nozzle 87, a first gas injection valve 87a, a first gas exhaust nozzle 88 and a first gas exhaust valve 88a are provided inside the cover 46.

[0062] The door section 81 includes a suction section 79 (see FIG. 6) that suctions the lid body 72 of the FOUP 7, and a connecting means 82 (see FIG. 7) that performs a latch operation for opening and closing the lid body 72 of the FOUP 7 and holds the lid body 72. The door section 81 can fix and release the lid body 72 to remove and attach the lid body 72 to the FOUP 7. The connecting means 82 can perform an unlatching operation of the lid body 72 to make the lid body 72 openable, and can connect the lid body 72 to the door section 81 to make it integrated. Conversely, the connection between the lid body 72 and the door section 81 can be released, and the lid body 72 can be attached to the main body 71 to make it closed.

[0063] Here, a detailed configuration of the aforementioned window unit 90 will be described with reference to Fig. 15. The window unit 90 is composed of a window frame portion 91, O-rings 94 and 96 as elastic members attached thereto, and a clamp unit 50 as a pulling means for tightly contacting the FOUP 7 with the window frame portion 91 via the O-ring 94.

[0064] The window frame portion 91 has a frame shape with a substantially rectangular opening 92 formed on the inside. The window frame portion 91 constitutes part of the base 41 (see FIG. 5) described above as a component of the window unit 90, and therefore the opening 92 can be said to open the front wall 31, which is a wall surface of the housing 3. An O-ring 94 is disposed on the front surface of the window frame portion 91 so as to go around the vicinity of the periphery of the opening 92. An O-ring 96 is disposed on the rear surface of the window frame portion 91 so as to go around the vicinity of the periphery of the opening 92.

[0065] The opening 92 is slightly larger than the outer periphery of the lid 72 (see FIG. 8) of the FOUP 7, and the lid 72 can move through this opening 92. Furthermore, when the FOUP 7 is placed on the placement table 44, the front surface of the main body 71 that surrounds the lid 72 serves as abutment surface 71b and abuts against the front surface of the window frame 91 via the O-ring 94. As a result, when the FOUP 7 is attached to the window unit 90, the O-ring 94 provides a seal between the periphery of the opening 92 (base 41) and the FOUP 7 (see FIG. 16).

[0066] The door portion 81 described above abuts against the rear surface of the window frame portion 91 via an O-ring (second seal member) 96. This allows the O-ring 96 to seal between the periphery of the opening 92 and the door portion 81. Specifically, a thin portion 81a provided in a brim shape on the outer periphery of the door portion 81 abuts against the window frame portion 91. At this time, a thick portion 81b formed inside the thin portion 81a is formed smaller than the opening 92, and thus protrudes forward through the opening 92.

[0067] 15, the clamp units 50 are provided at a total of four locations spaced apart in the vertical direction on both sides of the window frame portion 91. Each clamp unit 50 is generally composed of an engagement piece 51 and a cylinder 52 that operates the engagement piece, and presses the FOUP 7 toward the base 41 with the FOUP 7 attached to the window unit 90.

[0068] The cylinder 52 constituting the clamp unit 50 is attached to the rear of the window frame 91, and is provided with a shaft 53 that can advance and retreat forward through a hole provided in the window frame 91. A base end 51a of the engagement piece 51 is attached to the tip of the shaft 53, and a tip 51b extends from the base end 51a toward the outer periphery of the shaft 53. A guide groove 53a twisted by 90° along the axial direction is formed on the outer periphery of the shaft 53, and a guide pin 54 fixed to the window frame 91 side is inserted radially into the guide groove 53a. Therefore, as the cylinder 52 advances and retreats, the guide groove 53a is guided by the guide pin 54, and the shaft 53 rotates 90° around the axial center.

[0069] As shown in FIG. 17, when the engaging piece 51 protrudes forward together with the shaft 53, the tip 51b faces upward, and when the engaging piece 51 is retracted backward, the tip 51b faces the FOUP 7 on the inside. By clamping, the engaging piece 51 can engage with the flange 71c protruding laterally from the FOUP 7 by the tip 51b facing inward. While maintaining this engaged state, the shaft 53 is further retracted by the cylinder 52. This makes it possible to achieve a clamped state in which the abutment surface 71b of the FOUP 7 is more firmly attached to the O-ring 94. Such clamp unit 50 works at four points, making the amount of deformation of the O-ring 94 uniform and improving the sealing performance. Even in the clamped state, the end surface 81c on the FOUP 7 side of the door portion 81 is located closer to the transfer space 9 than the FOUP 7 side end of the O-ring 94 pressed toward the base 41 by the abutment surface 71b of the FOUP 7.

[0070] Furthermore, when the engaging piece 51 is moved forward, the tip 51b faces upward and is positioned so as not to interfere with the flange 71c when viewed from the front. This allows the FOUP 7 to be moved together with the placement table 44. Note that when the tip 51b is moved forward, it is only necessary to avoid interference with the flange 71c, and the tip 51b may be set to face downward or outward, instead of upward.

[0071] The load port 4 configured as described above is operated by the control unit Cp shown in Fig. 5, which gives drive commands to each unit. As shown in Fig. 18, the input side of the control unit Ct is connected to a pressure gauge that measures the pressure of the sealed space Sd, a pressure gauge that measures the pressure of the internal space Sf of the FOUP7, and a pressure gauge that measures the pressure of the internal space Se of the housing 3. Similarly, the input side of the control unit Ct is connected to a hygrometer that measures the humidity of the sealed space Sd, a hygrometer that measures the humidity of the internal space Sf of the FOUP7, and a hygrometer that measures the humidity of the internal space Se of the housing 3. In order to measure the oxygen concentration, the input side of the control unit Ct is connected to an oxygen (concentration) meter that measures the oxygen concentration of the sealed space Sd, an oxygen (concentration) meter that measures the oxygen concentration of the internal space Sf of the FOUP7, and an oxygen (concentration) meter that measures the oxygen concentration of the internal space Se of the housing 3. Regarding flow rate, the input side of the control unit Ct is connected to a flow meter that measures the flow rate of the first gas injection nozzle 87, a flow meter that measures the flow rate of the second gas injection nozzle 44c, and a flow meter that measures the flow rate of the third gas injection unit 16.

[0072] The output side of the control unit Ct is connected to the first gas injection valve 87a, the first gas exhaust valve 88a, the second gas injection valve 44e, the second gas exhaust valve 44f, the third gas injection valve, the third gas exhaust valve, the gas supply means 16, the gas exhaust means 17, and the pressure equalizing valve 89 via the flow rate control unit Cf, and is connected to the clamp unit 50, the connection means 82, and the adsorption unit 79 via the drive control unit Cd. The control unit Ct is installed in the EFEM1, and has various memories and a controller that accepts operational inputs by the user built in. The flow rate control unit Cf and the drive control unit Cd are provided in the controller of the EFEM1.

[0073] An example of operation when the load port 4 of this embodiment is used will be described below with reference to Figures 8 to 12. In the initial state, each valve is closed.

[0074] 8 shows a state in which the FOUP 7 is placed on the placement table 44 and separated from the base 41. In this state, the door portion 81 abuts against the rear surface of the window frame portion 91 (see FIG. 15) constituting the window unit 90 via the O-ring 96, so that no gap is generated between the window frame portion 91 and the door portion 81, and high sealing performance can be obtained. Therefore, even if the internal space Se of the housing 3 is filled with nitrogen gas or the like, it is possible to suppress the outflow of gas to the outside and the inflow of gas from the outside into the internal space Se.

[0075] As shown in FIG. 19, in step S1, the FOUP 7 is fixed at an appropriate position on the placement table 44 by a locking action of the locking claws 44b (see FIG. 5) and a positioning action of the positioning pins 44a.

[0076] Then, the second gas injection nozzle 44c and the second gas exhaust nozzle 44d of the mounting table 44 protrude upward and are connected to the gas supply valve 73 and the gas exhaust valve 74 of the FOUP 7, respectively. After that, in step S2, the second gas injection valve 44e is opened to supply fresh dry nitrogen gas from the second gas injection nozzle 44c through the gas supply valve 73. At the same time, the second gas exhaust valve 44f is opened to exhaust the gas that had remained in the internal space Sf from the second gas exhaust nozzle 44d through the gas exhaust valve 74. By performing gas purging in this manner, the internal space Sf is filled with nitrogen gas and the pressure is made higher than that of the internal space Se of the housing 3. The filling of the FOUP 7 with nitrogen gas continues until this flow ends.

[0077] Next, in step S3, as shown in FIG. 10, the mounting table 44 is moved backward to bring the abutment surface 71b of the FOUP 7 into contact with the window frame portion 91. At this time, the end surface 81c of the door portion 81 is located toward the transfer space 9 by a predetermined dimension L2 from the FOUP 7 side end portion of the O-ring 94. Therefore, even if the lid body 72 of the FOUP 7 bulges toward the door portion 81, when the FOUP 7 is brought close to the window unit 90, the abutment surface 71b of the FOUP 7 comes into contact with the O-ring 94, and the lid body 72 does not come into contact with the end surface 81c of the door portion 81 (see FIG. 11). Therefore, the seal between the O-ring 96 and the door portion 81 is reliably maintained. In this manner, the abutment surface 71b comes into contact with the window frame portion 91 via the O-ring 94, and the door portion 81 comes into contact with the window frame portion 91 via the O-ring 96, so that a sealed space Sd is formed. The door opening and closing system is constituted by the base 41, O-rings 94, 96, lid 72, and door portion 81 which form the sealed space Sd, together with the opening 92, first gas injection nozzle 87, and first gas exhaust nozzle 88.

[0078] When moving the mounting table 44, the engagement piece 51 (see FIG. 15) is first protruded forward by the cylinder 52 that constitutes the clamp unit 50 so that the tip 51b faces upward and does not interfere with the FOUP 7.

[0079] Thereafter, in step S4, the FOUP 7 is clamped and fixed to the window unit 90. As a result, by moving the FOUP 7 toward the door portion 81 from a state in which the door portion 81 and the lid body 72 are spaced apart, the O-ring 94 is pressed and elastically deformed, improving the sealing performance between the FOUP 7 and the base 41 (see FIG. 12). Furthermore, it is preferable that the distance between the door portion 81 and the lid body 72 after the FOUP 7 has been moved toward the door portion 81 by the clamp unit 50 be set to a distance that allows the above-mentioned latching and unlatching operations to be performed.

[0080] Specifically, the engagement piece 51 is pulled backward by the cylinder 52 constituting the clamp unit 50, and the tip 51b is engaged with the flange 71c of the FOUP 7 with the tip 51b facing inward. The tip 51b is further pulled in to bring the abutment surface 71b of the FOUP 7 into closer contact with the O-ring 94, improving the sealing performance. This series of operations is called a clamping operation. At this time, as shown in FIG. 11, a space Sg is formed between the cover 72 and the door part 81, and communicates with the internal space Sc of the cover through the mounting hole 75 for mounting the connecting means 82. The space Sg and the space Sc form a sealed space Sd between the FOUP 7 and the door part 81.

[0081] In step S5, the connecting means 82 (see FIG. 7) provided on the door portion 81 is operated to bring the lid body 72 into an unlatched state so that it can be removed from the main body 71, and the door portion 81 holds the lid body 72 integrally via the suction portion 79.

[0082] In step S6, the first gas injection valve 87a is opened to supply nitrogen gas from the first gas injection nozzle 87 to the sealed space Sd. At the same time, the first gas exhaust valve 88a is opened to exhaust the gas (air) that has remained in the sealed space Sd from the first gas exhaust nozzle 88. After a predetermined time has elapsed, the first gas injection valve 87a and the first gas exhaust valve 88a are closed to finish filling the sealed space Sd with gas. Note that the gas injection operation of injecting gas into the sealed space Sd by the first gas injection nozzle 87 and the exhaust operation of exhausting gas into the sealed space Sd by the first gas exhaust nozzle 88 may be repeated. Here, the air includes oxygen, moisture, particles, and the like that may change the properties of the wafer W, such as oxidizing the wafer W. In addition, exhausting the gas (air) that has remained in the sealed space Sd means that not only the air present between the FOUP 7 and the door part 81 but also the air present inside the lid body 72 can be exhausted to fill the sealed space Sd with gas.

[0083] In step S7, the internal space Sf and the sealed space Sd of the FOUP 7 are equalized in pressure. Specifically, when the pressure in the internal space Sf after the clamping operation is P1 and the pressure in the sealed space Sd is P2, control is performed so that P1 and P2 approach each other.

[0084] This pressure adjustment is performed by adjusting the flow rates of the first gas injection nozzle 87 and the first gas exhaust nozzle 88 based on the pressure detected by the pressure gauges of the sealed space Sd and the FOUP 7. However, the pressure adjustment may be performed without using a pressure gauge. Specifically, the pressure may be estimated from the flow rates of the first gas injection nozzle 87 and the first gas exhaust nozzle 88 and the flow rates of the second gas injection nozzle 44c and the second gas exhaust nozzle 44d, and the pressure adjustment may be performed based on this estimated pressure. In this case, the pressure can be adjusted without using a pressure gauge, which reduces costs. When estimating the pressure, the estimated oxygen concentration measured by an oxygen concentration meter or the reached humidity measured by a hygrometer may also be taken into consideration.

[0085] Pressure can be adjusted in various ways. If the FOUP to be used is determined in advance, the internal space Sf of the FOUP 7 to be used and the volume of the lid of the FOUP 7 are determined, and the volume of the sealed space Sd can be roughly estimated. Therefore, it is also possible to adjust the pressure P2 of the sealed space Sd to a predetermined pressure by filling the sealed space Sd with gas at a predetermined flow rate for a predetermined time. In this case, it is not necessary to use a pressure gauge, an oxygen concentration meter, or a hygrometer for pressure adjustment.

[0086] Here, we have described the method of adjusting pressure P2, but these can also be used to adjust pressures P1 and P3. Pressure adjustment can also be performed by adjusting the flow rate, using a pressure equalizing valve, or by combining the flow rate and a pressure equalizing valve. These mechanisms used for pressure adjustment are collectively called pressure adjustment means.

[0087] 13, the door portion 81 and the lid 72 are moved rearward together with the support frame 83. In this way, the lid 72 of the FOUP 7 is separated from the main body 71 to open the internal space Sf, and the door portion 81 is separated from the opening 92 to open the housing 3 (internal space Se). At this time, the contact surface 71b of the FOUP 7 is in close contact with the window unit 90 via the O-ring 94, making it possible to suppress the outflow and inflow of gas between the housing 3 and the FOUP 7 and the outside.

[0088] Furthermore, since the pressure in the FOUP 7 is increased, a gas flow occurs from the internal space Sf of the FOUP 7 toward the inside of the housing 3. This makes it possible to prevent particles and the like from entering the FOUP 7 from the housing 3, and to keep the inside of the FOUP 7 clean. It is also suitable to continuously supply a low flow rate of gas via the second gas injection nozzle 44c to prevent particles from entering. After this, the pressure adjustment is completed.

[0089] 14, in step S9, the door portion 81 and the lid 72 are moved downward together with the support frame 83. This allows the rear of the opening 71a serving as the loading / unloading entrance of the FOUP 7 to be widely opened, making it possible to move the wafers W between the FOUP 7 and the EFEM 1. Since the mechanism for moving the door portion 81 is entirely covered by the cover 46 in this manner, it is possible to prevent gas from leaking from within the housing 3 to the outside.

[0090] As described above, the operations performed when opening the opening 71a of the FOUP 7 have been described, but the operations described above can be reversed when closing the opening 71a of the FOUP 7. However, in terms of the operation of the door opening / closing system, if the pressure, oxygen concentration, humidity concentration, and the like in the internal space Sf are at problem-free levels when closing the opening 71a of the FOUP 7, steps S6 and S7 can be omitted.

[0091] By repeating this operation, the O-rings 94, 96 are repeatedly elastically contacted with the lid 72 or the door part 81, which may result in the generation of new particles. Such particles are moved downward by the downflow formed inside the housing 3 when the lid 72 or the door part 81 is opened. Therefore, the particles do not adhere to the surface of the wafer W, and the surface of the wafer W can be maintained in a clean state.

[0092] [Features of the load port of this embodiment] The load port 4 of this embodiment has the following features.

[0093] In the load port 4 of this embodiment, even if the lid 72 of the FOUP 7 expands toward the base 41, when the FOUP 7 is attached to the opening 92, the lid 72 and the door section 81 do not come into contact with each other because the end face of the door section 81 on the FOUP 7 side is located closer to the transfer space 9 than the end of the first seal member 94 on the FOUP 7 side. This prevents the lid 72 from coming into contact with the door section 81 and causing debris to fly off, and keeps the space around the load port 4 clean. It also reduces the possibility of debris already attached to the door section 81 flying up due to the impact of contact, or the possibility of the FOUP 7 shaking due to the impact of contact causing debris to fly off at the bottom of the FOUP 7 or dislocation of contents.

[0094] In the load port 4 of this embodiment, at least a part of the end face of the door part 81 on the FOUP 7 side is located closer to the transfer space 9 than the FOUP 7 side end of the first seal member 94 that is clamped and pressed against the base 41. Therefore, contact between the lid body 72 and the door part 81 can be reliably prevented with the FOUP 7 attached to the opening.

[0095] In the load port 4 of this embodiment, even if the lid 72 of the FOUP 7 expands toward the base 41, contact between the lid 72 and the door portion 81 can be reliably prevented.

[0096] [Features of the door opening and closing system of this embodiment] The door opening and closing system of this embodiment has the following features.

[0097] The door opening / closing system or the load port 4 of this embodiment includes a first gas injection nozzle 87 for injecting gas into the sealed space Sd between the FOUP 7 and the door part 81 when the FOUP 7 is in contact with the opening 92 via the first seal member 94, i.e., when the FOUP 7 is attached to the opening 92, and a first gas exhaust nozzle 88 for exhausting the gas in the sealed space Sd. With this, when the FOUP 7 is attached to the opening 92, the air between the FOUP 7 and the door part 81 can be removed and filled with nitrogen gas (purged). Therefore, air containing oxygen, moisture, particles, etc. that may be present between the FOUP 7 and the door part 81 and may cause the wafer W to be oxidized or otherwise change the properties of the wafer can be prevented from flowing into the transfer space 9 and the inside of the FOUP 7 when the door part 81 is opened. In other words, oxygen, moisture, and particles in the sealed space Sd can be eliminated before the lid 72 of the FOUP 7 is opened to open the sealed space Sd. This prevents oxygen and the like from leaking into the FOUP 7 or the transfer space 9 when the lid 72 is opened, and makes it possible to maintain the cleanliness of the inside of the FOUP 7 and the transfer space Sd.

[0098] In the door opening and closing system of this embodiment, the gas injection operation by the first gas injection nozzle 87 and the gas exhaust operation by the first gas exhaust nozzle 88 are repeated, so that the air present between the FOUP 7 and the door portion 81 can be reliably removed and gas can be filled.

[0099] In the door opening and closing system of this embodiment, when the FOUP 7 is clamped to the base 41, the FOUP 7 is moved toward the door portion 81 from a state in which the door portion 81 and the lid body 72 are spaced apart from each other. This improves the sealing performance between the FOUP 7 and the base 41 via the O-ring 94.

[0100] In the door opening and closing system of this embodiment, when the lid 72 is released from the FOUP 7, the internal space Sf of the FOUP 7 may communicate with the sealed space Sd. At this time, if the pressure difference between P1 and P2 is large, the flow rate of gas moving between the FOUP 7 and the sealed space Sd increases, which may stir up particles accumulated on the bottom of the FOUP 7 and contaminate the wafers W. Therefore, by controlling P1 and P2 to approach each other, the amount of gas moving between the FOUP 7 and the sealed space Sd is reduced, and the scattering of particles is suppressed, thereby preventing contamination of the wafers W.

[0101] In a load port 4 equipped with the door opening / closing system of this embodiment, the lid body 72 of the FOUP 7 is reliably removed when the opening 92 is opened, and the lid body 72 is attached when the opening 92 is closed, so that each operation can be performed quickly.

[0102] Although the embodiments of the present invention have been described above based on the drawings, the specific configuration should not be considered to be limited to these embodiments. The scope of the present invention is indicated not only by the description of the above embodiments but also by the claims, and further includes all modifications within the meaning and scope of the claims.

[0103] In the above embodiment, in step S6 of Fig. 19, the first gas injection nozzle 87 supplies nitrogen gas to the sealed space Sd, and the first gas exhaust nozzle 88 exhausts gas from the sealed space Sd, thereby performing gas purging. However, the present invention is not limited to this, and the first gas exhaust nozzle 88 may perform negative pressure exhaust. Specifically, the first gas exhaust nozzle 88 sucks in the air present in the sealed space Sd to create a negative pressure, and then the first gas injection nozzle 87 supplies nitrogen gas. This allows the gas to be efficiently filled into the sealed space Sd.

[0104] In the above embodiment, the control unit Ct, the flow rate control unit Cf, and the drive control unit Cd are installed in the EFEM 1. However, this is not limited to this, and some or all of the control unit Ct, the flow rate control unit Cf, and the drive control unit Cd may be installed in the load port 4. In this case, the load port 4 is provided with a receiving unit that receives signals from a higher-level computer such as a controller of the EFEM 1. When each control unit is installed in the load port 4, as shown in FIG. 27, the input side of the control unit Ct is connected to a pressure gauge, a hygrometer, and an oxygen meter of the sealed space Sd and the internal space Sf of the FOUP 7, and is also connected to the flow meters of the first gas injection nozzle and the second gas injection nozzle.

[0105] In the above embodiment, in step 7 of FIG. 19, the pressure P1 of the internal space Sf and the pressure P2 of the sealed space Sd are made to approach each other. However, this is not limited to this, and the pressure in the transfer space 9 may be set as P3, and the pressures P1, P2, and P3 may be controlled to approach each other. Specifically, the pressures of the remaining two may be adjusted to match one of P1, P2, and P3. In this case, if the pressures P2 and P3 are adjusted to approach the pressure P1 of the housing internal space Se, which has the largest volume among the sealed space Sd, the FOUP internal space Sf, and the housing internal space Se, the pressure adjustment time can be shortened. In addition, P1, P2, and P3 may be controlled to approach a predetermined pressure value. When the door part 81 opens the opening 92, the space Sf in the FOUP 7, the sealed space Sd, and the transfer space 9 are communicated with each other. At this time, if the pressure difference between each space is large, the flow rate of the gas moving between each space increases, which may cause particles present in each space to be stirred up. Therefore, by controlling P1, P2, and P3 to approach each other, the amount of gas moving between the FOUP 7, the sealed space Sd, and the transfer space 9 is reduced, and the scattering of particles is suppressed, thereby preventing contamination of each space.

[0106] Alternatively, in step S7, P1 and P2 may not be brought close to each other, and instead P1, P2, and P3 may be controlled to increase in that order. By controlling the pressures P1, P2, and P3 to increase in that order, the pressure difference between adjacent spaces among the space Sf in the FOUP 7, the sealed space Sd, and the transfer space 9 is reduced. This reduces the flow rate of gas moving between the spaces when the door section 81 opens the opening 92 and the spaces communicate with each other, compared to when the pressure difference between the adjacent spaces is large. This reduces the amount of gas moving between the FOUP 7, the sealed space Sd, and the transfer space 9, and suppresses the scattering of particles, thereby preventing contamination of each space.

[0107] In the above embodiment, a FOUP7 used for wafer transport is used as the container. However, the wafer storage container is not limited to this, and a MAC (MultiApplication Carrier), H-MAC (Horizontal-MAC), FOSB (Front Open Shipping Box), etc. may be used. In addition, the container is not limited to a wafer storage container, and may be an airtight container that stores items such as electronic components that are transported while filled with inert gas.

[0108] In the above embodiment, the load port is attached to the EFEM, but the present invention can also be applied to a sorter equipped with a transfer chamber for rearranging contents of a container placed on the load port and exchanging the contents of a container placed on another load port, or to an apparatus in which a load port is attached to the process equipment itself, with the process equipment itself serving as the transfer chamber.

[0109] In the above embodiment, the clamp unit 50 having the cylinder 52 is adopted, but the present invention is not limited thereto. As shown in FIG. 20(a), the clamp unit 100 installed in the window frame portion 91 has a support piece 101, a rod-shaped rotating body 103 rotatably supported by the support piece 101, and a motor 106 for driving the rotating body 103. The support piece 101 extends forward from the window frame portion 91, and rotatably supports the rotating body 103 at its hollow portion 102 (see FIG. 21(b)). The rotating body 103 has a pressing piece 107 protruding from the upper end portion and the center portion in the axial direction (see FIG. 20(b)). A pressing protrusion 108 (see FIG. 22) is formed at the tip of the pressing piece 107, and the flange portion 71c of the FOUP 7 is clamped via the pressing protrusion 108. A motor 106 embedded in the horizontal base 43 is connected to the lower end of the rotating body 103 to rotate the rotating body 103 around its axis.

[0110] As shown in FIG. 21(a), in the released clamping state, the pressing piece 107 extends horizontally forward perpendicular to the window frame portion 91 (see also FIG. 22(a)). From this state, the motor 106 drives the rotor 103 to rotate, so that the pressing piece 107 rotates around the axis of the rotor 103, as shown in FIG. 22(b). By further rotating the rotor 103, the pressing piece 107 presses the flange portion 71c via the pressing protrusion 108, thereby clamping the FOUP 7 (see also FIG. 20(b)). Note that instead of the motor 106, an air-driven cam or the like may be used as the drive unit for rotating the rotor 103.

[0111] By adopting the clamp unit 100 having the above-described configuration, the thickness of the clamp unit 100 in the front-to-rear direction can be reduced, and the clamp unit 100 can be positioned on the external space side, thereby preventing interference with the wafer transport device 2 operating within the transport space 9.

[0112] In the embodiment, the entire end face 81c of the door part 81 on the FOUP 7 side is located closer to the transfer space 9 than the FOUP 7 side end of the O-ring 94. However, it is sufficient that at least a part of the end face 81c of the door part 81 on the FOUP 7 side is located closer to the transfer space 9 than the FOUP 7 side end of the O-ring 94.

[0113] As shown in FIG. 23(a), a recess 111 recessed toward the transfer space 9 is formed on an end face 110 of the door part 81 on the FOUP 7 side (front side). A bottom face 112 of the recess 111 is located closer to the transfer space 9 than the imaginary line L1 indicating the position of the FOUP 7 side end of the O-ring 94. In other words, at least a part (bottom face 112) of the end face 110 of the door part 81 on the FOUP 7 side is located closer to the transfer space 9 than the end of the first seal member 94 on the FOUP 7 side. This makes it possible to obtain the same effect as the above embodiment. At least a part of the end face 110 mainly refers to the vicinity of the center of the door part 81 or the area around the center. In addition, the concept of the end face 110 does not include a latch mechanism that fixes and releases the lid body 72 to the FOUP 7, a suction part 79 that fixes the lid body 72 to the door part 81, or a registration pin (not shown) that positions the lid body 72 to the door part 81. On the other hand, the outer peripheral surface 113 formed on the outer periphery of the end face 110 is located closer to the FOUP 7 than the imaginary line L1 due to the types of the FOUP 7 and the lid 72 and manufacturing precision errors. Since the contact surface 71b of the FOUP 7 is located closer to the transfer space 9 than the lid 72, the contact surface 71b can come into contact with the O-ring 94 to form the sealed space Sd.

[0114] As shown in FIG. 23(b), a curved surface 117 recessed toward the transfer space 9 is formed on the end surface 116 of the door part 81 on the FOUP7 side (front side). This curved surface 117 is located closer to the transfer space 9 than the imaginary line L1 indicating the position of the FOUP7 side end of the O-ring 94. In other words, most of the end surface 116 on the FOUP7 side of the door part 81 is located closer to the transfer space 9 than the end of the first seal member 94 on the FOUP7 side. This can provide the same effect as the above embodiment. On the other hand, the outer peripheral surface 113 formed on the outer periphery of the end surface 116 is located closer to the FOUP7 than the imaginary line L1 due to precision errors during manufacturing. A part of the FOUP7 (the lid body 72) is curved toward the transfer space 9. In addition, since the contact surface 71b of the FOUP7 is located closer to the transfer space 9 than the outer periphery of the lid body 72, the contact surface 71b can contact the O-ring 94 to form a sealed space Sd. In this way, the shape of curved surface 117 corresponds to expansion surface 118 that expands due to increasing the pressure inside FOUP 7, so that contact between FOUP 7 and door portion 81 can be reliably prevented even if FOUP 7 expands into various shapes.

[0115] 24(a), a configuration may be adopted in which a recess 111 is formed in an end face 110 of the door part 81, while the outer circumferential surface 113 is located closer to the transfer space 9 than the imaginary line L2. That is, in this modification, the entire end face 110 of the door part 81 is located closer to the transfer space 9 than the end of the first seal member 94 on the FOUP 7 side. This prevents interference between the cover body 72 and the door part 81, and allows the contact surface 71b to contact the seal member 94, even if the cover body 72 protrudes into the transfer space 9.

[0116] 24(b), a configuration may be adopted in which the door portion 81 has a curved surface 117 while the outer circumferential surface 113 is located closer to the transfer space 9 than the imaginary line L2. That is, in this modification, the entire end surface 110 of the door portion 81 is located closer to the transfer space 9 than the end of the first seal member 94 on the FOUP 7 side. This prevents interference between the cover body 72 and the door portion 81 even if the cover body 72 having the expansion surface 118 protrudes toward the transfer space 9, and allows the contact surface 71b to contact the seal member 94.

[0117] After the expanded lid 72 is removed from the FOUP 7 by the door section 81, the expansion of the lid 72 may return to its original state. At this time, if the entire end surface 110 of the door section 81 is located in the transfer space 9 above the first seal member 94 as shown in FIG. 24(a) and FIG. 24(b), the lid 72 may not be properly fixed to the FOUP 7 and attached to the FOUP 7 depending on the type of latch mechanism and suction section. For this reason, the position where the above operation is performed may be a position on the FOUP 7 side by a predetermined distance from the position where the lid 72 is released from the FOUP 7 and the lid 72 is removed from the FOUP 7. This predetermined distance is set appropriately depending on the expansion rate of the lid 72 and the type of the latch mechanism and suction section.

[0118] In the above embodiment, the pressure adjustment is performed using the independent first gas injection nozzle 87, second gas exhaust nozzle 88, second gas injection nozzle 44c, and second gas exhaust nozzle 44d, but the present invention is not limited to this.

[0119] 25 and 26, first supply nozzle 120 that supplies gas merges with second gas injection nozzle 44c. Second gas exhaust nozzle 44d and first gas injection nozzle 87 are connected via intermediate nozzle 121. Second gas injection nozzle 44c and second gas exhaust nozzle 88 are connected via connection nozzle 122. Intermediate nozzle 121 merges with second supply nozzle 123 midway.

[0120] As shown in FIG. 25, when pressure P1 is higher than pressure P2, the first valve 125 and the second valve 126 are opened, and the third valve 127 to the sixth valve 130 are closed. Therefore, the gas supplied from the first supply nozzle 120 flows into the FOUP 7 through the second gas injection nozzle 44c. The gas discharged from the FOUP 7 flows through the second gas exhaust nozzle 44d and the second valve 126 in the intermediate nozzle 121. Then, the gas supplied to the sealed space Sd through the first gas injection nozzle 87 is discharged from the second gas exhaust nozzle 88 and flows through the connection nozzle 122 and the second gas injection nozzle 44c in this order. In the second gas injection nozzle 44c, the gas merges with the gas newly supplied from the first supply nozzle 120. As the gas flows through the above-mentioned flow path, the pressure P1 in the FOUP 7 and the pressure P2 in the sealed space Sd become closer to each other.

[0121] As shown in FIG. 26, when the pressure P1 is lower than P2, the fourth valve 128 and the fifth valve 129 are opened, and the first valve 125 to the third valve 127 and the sixth valve 130 are closed. Therefore, the gas supplied from the second supply nozzle 123 through the fourth valve 128 flows into the sealed space Sd through the intermediate nozzle 121 and the first gas injection nozzle 87. The gas discharged from the sealed space Sd flows through the second gas exhaust nozzle 88 and the connection nozzle 122 in order, and flows into the FOUP7 through the second gas injection nozzle 44c. The gas discharged from the FOUP7 is discharged to the outside through the second gas exhaust nozzle 44d and the fifth valve 129. By the gas flowing through the above-mentioned flow path, the pressure P1 in the FOUP7 and the pressure P2 in the sealed space Sd become closer to each other. When adjusting the pressures P1 and P3, only the third valve 127 disposed in the transfer space 9 is opened. This allows the FOUP 7 and the transfer space 9 to communicate with each other via the second gas injection nozzle 44c and the connection nozzle 122, making it possible to equalize the pressure.

[0122] In the above embodiment, nitrogen is used as an example of the inert gas, but the inert gas is not limited to this, and any desired gas such as dry gas or argon gas can be used.

[0123] In the above embodiment, O-rings are used as the first seal member 94 and the second seal member 96, but the present invention is not limited to these and any member that ensures sealing performance (hermetic sealability) may be used.

[0124] Also, instead of an O-ring as the sealing member, a hollow sealing member that expands or contracts by introducing or discharging a fluid may be disposed. When this hollow sealing member is used as the first sealing member 94, the FOUP 7 is brought into contact with the base 41, and then the hollow sealing member is expanded, thereby obtaining close contact between the FOUP 7 and the base 41. Furthermore, in order to further improve close contact, it is preferable to expand the hollow sealing member after clamping by the clamp unit 50. At this time, the hollow sealing member is crushed by the force acting by the clamp and the force acting by the expansion of the hollow sealing member, thereby improving the sealing performance.

[0125] In step S4 of the above embodiment, when the FOUP 7 is clamped to the base 41, the FOUP 7 is moved toward the door portion 81. However, instead of this, after the sealed space Sd is formed, the door portion 81 may be advanced toward the lid body 72 from a state in which the door portion 81 and the lid body 72 are separated from each other (see FIG. 28). This advancement is performed to bring the door portion 81 and the lid body 72 closer to each other and to put the lid body 72 in an unlatched state. Therefore, the door portion 81 may be advanced to an extent that a gap is generated between the door portion 81 and the lid body 72, or the door portion 81 may be advanced until it comes into contact with the lid body 72. When the door portion 81 is advanced toward the lid body 72, the O-ring 96 is pressed and elastically deformed, while maintaining the sealed state of the sealed space Sd.

[0126] In the embodiment described above, the sealed space Sd is formed by the base 41, the O-rings 94, 95, the lid body 72, and the door portion 81. However, by employing an O-ring 97 (see FIG. 29 ) in which the two O-rings 94, 95 are integrated, the sealed space Sd may be formed by the O-ring 97, the lid body 72, and the door portion 81. [Explanation of symbols]

[0127] 3. Chassis 7 FOUP (container) 9. Transport Space 41 Base 50 Clamp unit (clamp) 72 Lid 81 Door section (door) 87 First gas injection nozzle (first gas injection part) 88 First gas exhaust nozzle (first gas exhaust part) 92 Opening 94 O-ring (first seal member) 96 O-ring (second seal member) Sd closed space

Claims

1. A base constituting a part of a wall that separates the transport space from the outside space; An opening provided in the base; a door capable of opening and closing the opening and fastening and unlocking a lid body to a container containing an object; a first seal member for sealing between the base and the container; a second seal member for sealing between the base and the door; a clamp unit that presses the container toward the base while the container is attached to the opening; Equipped with at least a part of an end surface of the door on the container side is located closer to the transfer space than an end surface of the first seal member on the container side that is pressed toward the base by the container clamped by the clamp unit, The door is a thin-walled portion disposed so as to abut against the second seal member; a thick portion that is thicker than the thin portion, protrudes toward the container side than the thin portion, and is disposed so as to face the lid; A load port characterized in that the first seal member is elastically deformed when the container is pressed toward the base by the clamp unit, and the lid body is not in contact with the thick-walled portion when the container is in a proximity state closer to the base than in a state before the container is pressed toward the base.

2. 2. The load port according to claim 1, wherein in the proximity state, at least a portion of an end surface of the lid body fixed to the container on the transfer space side is positioned closer to the transfer space than an end portion of the first seal member on the container side.

3. 3. The load port according to claim 1, wherein the thin portion and the base are separated from each other via the second seal member.

4. a mounting table configured to mount the container and movable toward and away from the base; 4. The load port according to claim 1, wherein the mounting table is not in contact with the base in the proximity state.

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