Apparatus for cleaning blue film on bottom portion of wafer

The apparatus addresses inefficiencies in wafer cleaning by using reciprocating rollers and scrapers to clean the blue film on wafers efficiently without additional movement, enhancing the cleaning process.

JP2025011019AActive Publication Date: 2025-01-23YAYATECH
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Patent Information

Application Number
JP2024068415
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Priority Date
2023-07-10
Filing Date
2024-04-19
Publication Date
2025-01-23
Estimated Expiration
2044-04-19

AI Technical Summary

Technical Problem

Existing wafer cleaning technologies are inefficient due to the need for multiple cleaning cycles and time wastage between movements, as they require the wafer to be moved and returned to a specific position for each cleaning step, reducing overall efficiency.

Method used

An apparatus with reciprocating rollers and elevating scrapers that simultaneously clean the blue film on the wafer by moving the wafer back and forth, utilizing sponge rollers to scrub and scrapers to remove water, with a water collection system to manage drips.

Benefits of technology

Enhances cleaning efficiency by allowing multiple cleaning cycles without additional movement, improving the effectiveness of the cleaning process.

✦ Generated by Eureka AI based on patent content.

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Abstract

To provide an apparatus for cleaning a blue film on a bottom portion of a wafer.SOLUTION: An apparatus for cleaning a blue film on a bottom portion of a wafer includes a base, a water tank, one or more rollers, one or more roller drive devices, two lifting scraper mechanisms, and a water receiving tray. The one or more rollers are mounted inside a water tank with a portion thereof being exposed to the outside beyond the water tank. The two lifting scraper mechanisms are mounted on the base so as to be located on both the left and right sides of the front of the water tank, and each of the lifting scraper mechanism has a scraper, a water collecting tank, and a lifting drive device. The scraper is located above a water collecting tank. The water collecting tank is mounted in the lifting drive device. The lifting drive device is mounted on the base and drives the water collecting tank and scraper to move them upward and downward. The water receiving tray is mounted on the base so as to be located below the water tank, the two scrapers, and the two water collecting tanks.SELECTED DRAWING: Figure 4
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Description

[Technical field]

[0001] The present invention relates to a cleaning technique after wafer inspection, and more particularly to an apparatus for cleaning the blue film on the bottom of a wafer. [Background technology]

[0002] In the wafer inspection process, a liquid medium with a refractive index close to that of the blue film is used on the blue film at the bottom of the wafer to produce a clear image effect. After the inspection is completed, the liquid medium on the blue film is washed. The cleaning device of the wafer inspection equipment disclosed in Patent Document 1 moves the wafer against a roller and at the same time applies water to the roller, then the roller with water is used to rub and clean the blue film at the bottom of the wafer, and the water on the surface of the blue film is wiped off with a scraper.

[0003] In practice, when cleaning the blue film, it is necessary to clean the medium attached to the blue film at the bottom of the wafer by cleaning it not just once but several times. In contrast, the technology disclosed in Patent Document 1 uses a method of moving in a single direction to apply water to a roller, rub the blue film at the bottom of the wafer with the water-soaked roller to clean it, and then wipe off the water with a scraper. Therefore, after the step of moving the wafer relative to the roller is completed, the wafer must be moved up and returned to the position before cleaning before the next step, i.e., the cleaning operation, can proceed. In addition, since the cleaning operation is not performed before moving the wafer to the next position before cleaning, not only is time wasted in the entire process, but it is also inefficient. In other words, the technology disclosed in Patent Document 1 does not satisfy current needs and there is room for improvement. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Taiwan Patent No. I630668 Summary of the Invention [Problem to be solved by the invention]

[0005] The main objective of the present invention is to provide a device for cleaning the blue film on the bottom of a wafer, which improves the cleaning efficiency by moving the wafer back and forth and cleaning the blue film on the bottom of the wafer at the same time, which is superior to the prior art. [Means for solving the problem]

[0006] In order to solve the above-mentioned problems, the apparatus for cleaning the blue film on the bottom of the wafer includes a base, a water tank, one or more rollers, one or more roller drive devices, two lifting scraper mechanisms, and a water receiving tray. The water tank is disposed on the base and has an upward opening and an interior for accommodating water. The one or more rollers are mounted on the water tank by both front and rear ends of their long axes, with a portion located within the water tank and a portion exposed above the opening and above the water tank. The one or more roller drive devices are mounted on the base and connected to the one or more rollers to drive and rotate the one or more rollers. The two lifting scraper mechanisms are mounted on the base so as to be located on both the left and right sides of the front of the water tank, and each has a scraper, a water tank, and a lifting drive device. The scraper is disposed above the water tank. The water tank is disposed on the lifting drive device. The lifting drive device is mounted on the base and raises and lowers the water tank and the scraper. The water receiving tray is disposed on the base so as to be located below the water tank, the two scrapers, and the two water tanks.

[0007] Due to the above-mentioned structural features, the present invention can clean the blue film on the bottom of the wafer while moving the wafer back and forth, improving the cleaning efficiency, which surpasses the prior art. [Brief description of the drawings]

[0008] [Figure 1] FIG. 2 is a perspective view of an apparatus for cleaning the blue film on the bottom of a wafer according to one embodiment of the present invention. [Diagram 2] 1 is a front plan view of an apparatus for cleaning the blue film on the bottom of a wafer in accordance with one embodiment of the present invention; FIG. [Diagram 3] FIG. 2 is a top plan view of an apparatus for cleaning the blue film on the bottom of a wafer in accordance with one embodiment of the present invention. [Figure 4] 2 is a schematic diagram showing the operation of an apparatus for cleaning the blue film on the bottom of a wafer according to an embodiment of the present invention; FIG. [Diagram 5] FIG. 2 is a schematic diagram showing another operating state of the apparatus for cleaning the blue film on the bottom of a wafer according to an embodiment of the present invention; [Figure 6] 2 is a front plan view of one or more rollers of an apparatus for cleaning the blue film on the bottom of a wafer in accordance with one embodiment of the present invention. FIG. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0009] The technical features of the present invention will be described below with reference to the drawings.

[0010] (One embodiment) As shown in Figures 1 to 5, in one embodiment of the present invention, an apparatus 10 for cleaning the blue film on the bottom of a wafer comprises a base 11, a water tank 21, two rollers 31, two roller drive devices 41, two elevating scraper mechanisms 51 and a water receiving tray 61.

[0011] The water tank 21 is disposed on the base 11 and has an upward opening 22. Washing water (not shown in the figure) is contained inside the water tank 21.

[0012] The two rollers 31 are attached to the water tank 21 by both front and rear ends of their long axes, with a portion located within the water tank 21 and a portion exposed above the opening 22 and extending beyond the water tank 21. In this embodiment, the two rollers 31 are made of a sponge capable of absorbing water, and each uses its top portion to scrub and clean the blue film 92 on the bottom of the wafer 91.

[0013] The two roller driving devices 41 are mounted on the base 11 and connected to the two rollers 31 to drive and rotate the two rollers 31. When driving the two rollers 31, the rotation direction of the rollers 31 is determined according to actual needs. Generally speaking, the rotation directions of the two rollers 31 are opposite to each other. When viewed from the top, the two rollers 31 rotate facing each other. Even if the wafer 91 is moved left and right relative to the two rollers 31 under the above-mentioned condition, the top of the roller 31 rotates and the tangential direction for releasing the last wafer 91 is opposite to the moving direction of the wafer 91. Also, when the rollers 31 rotate, as long as the tangential direction of the top is opposite to the moving direction of the wafer 91, the two rollers 31 may be controlled to rotate in the same direction. In this embodiment, the roller driving device 41 is a motor.

[0014] The two elevating scraper mechanisms 51 are attached to the base 11 so as to be located on both the left and right sides of the front of the water tank 21, and each has a scraper 52, a water collection tank 54, and a lifting drive device 56. The scraper 52 is disposed above the water collection tank 54. Water wiped off by the scraper 52 falls into the water collection tank 54. The water collection tank 54 is disposed on the lifting drive device 56. The lifting drive device 56 is attached to the base 11 and raises and lowers the water collection tank 54 and the scraper 52. In this embodiment, the lifting drive device 56 is an air cylinder.

[0015] The water receiving tray 61 is disposed below the base 11, the water tank 21, the two scrapers 52, and the two water collection tanks 54 in order to catch water dripping from the two lifting scraper mechanisms 51 and the water tank 21. When the actual cleaning operation is performed, the water receiving tray 61 can reliably catch the water dripping down evenly, so that water droplets do not fall outside the water receiving tray 61.

[0016] In this embodiment, the water tank 21 has two water guide awnings 24. The two water guide awnings 24 are formed extending downward from both sides of the water tank 21, and the ends of each are located above the water collection tank 54 of the lifting scraper mechanism 51. Each water collection tank 54 has a water receiving awning 541. The water receiving awning 541 is formed extending upward and obliquely from the water collection tank 54 toward the water tank 21, and the ends are located below the water guide awning 24. The longitudinal length of each water guide awning 24 is greater than the length of the two rollers 31. The longitudinal length of each water collection tank 54 is greater than the longitudinal length of the water guide awning 24. Due to the above-mentioned structural features, when water droplets drip from the blue film 92 at the bottom of the wafer 91 outside the water tank 21, each water guide awning 24 catches the dripping water droplets and guides them to the water collection tank 54. Subsequently, each water receiving eaves 541 catches the water droplets dripping down from the water guide eaves 24. If the water guide eaves 24 and the water receiving eaves 541 are not arranged, the dripping water droplets are caught by the water receiving tray 61.

[0017] In this embodiment, the scraper 52 of the lifting scraper mechanism 51 is lifted between the highest position H and the lowest position L by the driving force of the lifting drive device 56. When the scraper 52 of the lifting scraper mechanism 51 is placed at the highest position H, the top of the scraper 52 is higher than the water tank 21. When the scraper 52 of the lifting scraper mechanism 51 is placed at the lowest position L, the top of the scraper 52 is placed at the highest position H and lower than the top of the roller 31. Due to the above-mentioned structural features, when cleaning the blue film 92 of the wafer 91, if the scraper 52 is placed at the highest position H, the water on the blue film 92 can be wiped off. If the scraper 52 is placed at the lowest position L, it does not come into contact with the blue film 92 and does not wipe off the water.

[0018] The above is a description of the structure of this embodiment. Next, the operation of this embodiment will be described.

[0019] As shown in FIG. 4, in the wafer inspection process, first, the wafer 91 is moved from left to right to the device 10 for cleaning the blue film on the bottom of the wafer. The method of moving the wafer 91 is a conventional technology, so the description is omitted. Next, the blue film 92 on the bottom of the wafer 91 is brought into contact with the two rollers 31, or the wafer 91 is lowered and pressed against the two rollers 31 to clean the blue film 92. At this time, the two rollers 31 rub and clean the blue film 92, and improve the friction and cleaning effect by rotating relatively in the opposite direction. The scraper 52 of the right-side lifting scraper mechanism 51 rises to the highest position H and wipes off the water on the blue film 92 cleaned by the two rollers 31. The scraper 52 of the left-side lifting scraper mechanism 51 does not wipe off the water on the blue film 92 and remains at the lowest position L. The wiped water flows along the scraper 52 into the water collection tank 54. Most of the water droplets dripping from the blue film 92 flow through the water guide eaves 24 into the water collection tank 54, and a small portion falls into the water receiving tray 61. The cleaning operation of the wafer 91 moving from left to right continues until the wafer 91 has completely passed the scraper 52 on the right side.

[0020] As shown in Fig. 5, the wafer 91 is then moved from right to left to the device 10 for cleaning the blue film on the bottom of the wafer. Prior to this, the scraper 52 on the right side is lowered to the lowest position L, and the scraper 52 on the left side is raised to the highest position H. The blue film 92 is then scraped and cleaned by the two rollers 31. At this time, the scraper 52 on the right side does not wipe off the water on the blue film 92, but remains at the lowest position L. The scraper 52 on the left side wipes off the water on the blue film 92.

[0021] As shown in Figures 4 and 5, multiple cleaning operations can be performed by moving the wafer 91 back and forth. In other words, the present invention is superior to the prior art in that the blue film 92 is cleaned every time the wafer 91 is moved back and forth, thereby improving cleaning efficiency.

[0022] 6, the present invention is not limited to two rollers 31 and two corresponding roller drivers 41, but may use only one roller 31' and one corresponding roller driver (not shown in the figure). As long as the tangential direction of the top of the roller 31' is opposite to the moving direction of the wafer 91 when the roller 31' rotates, the roller 31' can ensure the operation of rubbing and cleaning the blue film 92.

[0023] As described above, the present invention is not limited to the above-described embodiment, and can be embodied in various forms without departing from the spirit of the invention. [Explanation of symbols]

[0024] 10: Equipment for cleaning the blue film on the bottom of the wafer 11: Bass 21: Aquarium 22: Opening 24: Water guide eaves 31, 31': Roller 41: Roller drive unit 51: Elevating scraper mechanism 52: Scraper 54: Water collection tank 541: Water catchment eaves 56: Lifting drive device 61: Water tray 91: Wafer 92: Blue Film H: Highest position L:Lowest position

Claims

1. The apparatus includes a base, a water tank, one or more rollers, one or more roller drives, two elevating scraper mechanisms, and a water receiving tray; the water tank is disposed on the base and has an upward opening and an interior for containing water; One or more of the rollers are attached to the water tank by both front and rear ends of a long axis, a portion of the rollers being located within the water tank, a portion of the rollers being exposed above the opening and extending beyond the water tank, one or more of the roller drives are mounted on the base and coupled to one or more of the rollers to drive and rotate the one or more rollers; The two lifting scraper mechanisms are mounted on the base so as to be located on both the left and right sides of the front of the water tank, each having a scraper, a water collection tank, and a lifting drive device, the scraper is disposed above the water collection tank, the water collection tank is disposed on the lifting drive device, and the lifting drive device is mounted on the base and raises and lowers the water collection tank and the scraper, said water receiving tray is disposed on said base so as to be located below said water tank, said two scrapers and said two water collecting tanks.

2. 2. The apparatus for cleaning the blue film on the bottom of a wafer as claimed in claim 1, wherein, for each of said elevating scraper mechanisms, said water collection trough is adapted to catch water dripping down along said scraper.

3. 2. The apparatus for cleaning the blue film on the bottom of a wafer as claimed in claim 1, wherein said water receiving tray is adapted to catch the water dripping from said two lifting scraper mechanisms and said water tank.

4. The water tank has two water guide awnings, the two water guide awnings are formed extending downward from both sides of the water tank, and the end portions of the two water guide awnings are located above the water collection tank of the lifting scraper mechanism; 2. An apparatus for cleaning the blue film on the bottom of a wafer as described in claim 1, wherein each of the water collection tanks has a water receiving canopy that extends upward and diagonally from the water collection tank toward the water tank, and a tip of the water receiving canopy is located below the water conducting canopy.

5. A longitudinal length of each of the water guide awnings is greater than a length of one or more of the rollers; 5. The apparatus for cleaning the blue film on the bottom of a wafer as claimed in claim 4, wherein the longitudinal length of each of said water collecting tanks is greater than the longitudinal length of said water guide awning.

6. The number of the rollers is two, and the two rollers are parallel; 2. The apparatus for cleaning the blue film on the bottom of a wafer as described in claim 1, wherein the number of roller drive devices is two, and the two roller drive devices are connected to the two rollers and rotate the two rollers in opposite directions to each other, whereas the two rollers rotate facing each other when viewed from the top.

7. 2. The apparatus for cleaning the blue film on the bottom of a wafer as claimed in claim 1, wherein one or more of said rollers are made of sponge.

8. 2. The apparatus for cleaning the blue film on the bottom of a wafer as claimed in claim 1, wherein in each of the elevating scraper mechanisms, the scraper moves up and down between a highest position and a lowest position, and when placed at the highest position, the top of the scraper is higher than the water tank, and when placed at the lowest position, the top of the scraper is lower than both the highest position and the top of the roller.

Citation Information

Patent Citations

  • Belt cleaning device of wafer check -out set

    CN208033112U

  • Cleaning device of wafer inspection equipment for reducing residue solution left on back of wafer

    TW201814803A

  • Cleaning device for wafer inspection equipment

    TWI630668B