Microstructure transfer device
Patent Information
- Application Number
- JP2024202833
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2024-11-21
- Publication Date
- 2025-02-19
- Estimated Expiration
- 2039-08-09
AI Technical Summary
【0025】 本発明によれば、シート状体(フィルム)に連続的に複数のレプリカを固着し得る微細構造転写装置及び微細構造転写方法を提供することが可能となる。
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Figure 2025024174000001_ABST
Abstract
Description
[Technical field]
[0001] The present invention relates to a fine structure transfer device and a fine structure transfer method for inversely transferring a fine structure onto a substrate using a mold having a fine concave-convex pattern on the surface, the pattern being on the order of nanometers or the like. [Background technology]
[0002] Ultraviolet / electron beam lithography, which is a microfabrication technique for exposure devices used in semiconductor manufacturing, has high equipment costs and complicated processes, and there are problems with improving the time and cost required for manufacturing. However, with the advancement of nanoimprint lithography (hereinafter referred to as NIL), which directly transfers a mold (also called a stamper or template) on which a fine concave-convex pattern is formed onto a resin material, etc., fine patterns on the order of 10 nm to several hundreds of nm can be easily realized with simple equipment and processes, and this technology has become more advantageous in terms of equipment costs and mass production costs. For example, Patent Document 1 discloses a microstructure in which a fine concave-convex pattern formed on the surface of a mold is inversely transferred to the mold by electroless plating. In particular, Patent Document 1 describes that a buffer material is placed on the top surface of the obtained microstructure (the surface opposite to the surface on which the fine concave-convex pattern is formed) and a release agent is coated on the surface of the fine concave-convex pattern to form a stamper.
[0003] Furthermore, Patent Document 2 proposes an NIL device in which the cross-sectional area of the portion that holds the substrate pressing surface is smaller than the cross-sectional area of the substrate pressing surface of the stamper in order to improve the time required for the temperature rise and cooling cycle in heat and pressure transfer. Patent Document 3 discloses an NIL device that is provided with a temporary placement surface on which a substrate is temporarily placed and a temporary placement member that gradually moves the substrate to the substrate placement surface, thereby preventing positional deviation due to air voids between the substrate and the substrate placement stage and enabling highly accurate transfer.
[0004] Patent Document 4 proposes a roll-to-roll type NIL device that allows the buffer material to be replaced sequentially during heating and pressure application, with the aim of achieving higher-precision transfer.
[0005] Furthermore, Patent Document 5 discloses a NIL device that uses multiple rollers to heat and press a stamper onto a resin layer to transfer the pattern, enabling accurate and high-precision pattern transfer even when the rotation speed of the transfer roll is increased, with the aim of improving production throughput and reducing mass production costs.
[0006] As an example of a device using a photocurable resin, Patent Document 6 discloses an NIL device that presses a mold against a workpiece using a thin film of ultraviolet-curable resin to perform compression molding, irradiates ultraviolet light, and transfers a pattern, and suppresses temperature rise by using a light source that does not continuously radiate heat rays at the same time as the ultraviolet light. Patent Document 7 discloses an NIL device that uses a roll-to-roll method to send out a photocurable transfer sheet having a photocurable transfer layer to which a transparent film is bonded and fixed, exposes the photocurable transfer layer, presses it with a stamper, irradiates it with light from a UV lamp, and transfers the fine concave-convex pattern of the stamper. [Prior art documents] [Patent documents]
[0007] [Patent Document 1] JP 2005-189128 A [Patent Document 2] JP 2004-288784 A [Patent Document 3] JP 2006-62208 A [Patent Document 4] JP 2004-288804 A [Patent Document 5] JP 2006-326948 A [Patent Document 6] WO2009 / 110596 publication [Patent Document 7] JP 2011-66100 A Summary of the Invention [Problem to be solved by the invention]
[0008] The NIL devices disclosed in the above-mentioned Patent Documents 1 to 6 are configured to imprint substrates one by one using a mold. However, because this is a stamp method that directly contacts the mold, there is a risk that the mold may be damaged due to the adhesion of materials or foreign matter to the mold. Since the cost of producing a mold is very high and the time required for producing the mold is long, it is necessary to minimize the number of times the mold is used. Also, there is a risk of the mold being damaged or chipped due to being dropped or hit during mold changeover.
[0009] For this reason, a method is used in which a replica mold is formed from a soft material using a master mold, and then the replica mold is used for production, without using an expensive master mold for production. However, although the frequency of replacement of the replica mold varies depending on the product and material, it needs to be replaced every several hundred times, and because the replacement and setup work of the replica mold (hereinafter referred to as replica) takes time, there has been a demand for reducing the setup cost.
[0010] Furthermore, the NIL device disclosed in the above-mentioned Patent Document 7 is configured to form an intermediate stamper (replica) using a mold, then pitch-feed the intermediate stamper and imprint the substrates one by one with the intermediate stamper. Therefore, since the expensive mold is configured to be constantly disposed below the photocurable transfer sheet having a photocurable transfer layer to which the transparent film on which the intermediate stamper is formed is adhesively fixed, there is a risk that the mold may be damaged by foreign matter, etc., falling from the photocurable transfer sheet.
[0011] Furthermore, with the recent rapid spread of relatively small displays such as smartphones and tablet terminals, there is a demand for manufacturing equipment for liquid crystal panels, etc. with higher throughput. In addition, the trend for larger screens and higher resolution for display panels for televisions and the like is accelerating, and there is a demand for next-generation displays with even higher resolution.
[0012] Therefore, the present invention provides a microstructure transfer device and a microstructure transfer method capable of fixing a plurality of replicas to a sheet-like body (film).The present invention also provides a microstructure transfer device and a microstructure transfer method capable of continuously forming a pattern on a substrate using a plurality of consecutive replicas on the above-mentioned sheet-like body (film). [Means for solving the problem]
[0013] In order to solve the above problems, the microstructure transfer device of the present invention comprises an unwinder that winds up a flexible sheet-like body and unwinds the sheet-like body, a winder that winds up the sheet-like body transported through a plurality of guide rolls, a stage arranged between the unwinder and the winder on which a mold having a fine uneven pattern formed thereon and coated with a photocurable resin is placed, an imprint roll that moves back and forth between at least both ends of the mold while pressing the sheet-like body against the mold from above, and a curing light irradiator that irradiates curing light onto the sheet-like body pressed against the mold, and is characterized in that a plurality of replicas are continuously fixed to the sheet-like body.
[0014] In addition, the microstructure transfer device of the present invention is characterized in that the imprint roll moves back and forth between at least both ends of the substrate while pressing one of the multiple replicas fixed to the sheet-like body, via the sheet-like body, against a substrate placed on the stage and having the photocurable resin applied to its surface, and the curing light irradiator irradiates curing light through the sheet-like body and the replica pressed by the imprint roll against the substrate having the photocurable resin applied thereto, and transfers the fine unevenness pattern of the replica by peeling off the sheet-like body by the imprint roll after the photocurable resin has hardened.
[0015] The microstructure transfer device of the present invention comprises, among the multiple guide rolls, a first guide roll adjacent to the imprint roll and located upstream in the transport direction of the sheet-like body, and a second guide roll adjacent to the imprint roll and located downstream in the transport direction of the sheet-like body, and is characterized in that when the imprint roll moves while pressing the sheet-like body, the second guide roll is located above the imprint roll and moves at a constant speed together with the imprint roll.
[0016] In addition, the microstructure transfer device of the present invention is characterized in that when the imprint roll moves while pressing the sheet-like body, it is provided with a film clamp that clamps the sheet-like body to the end of the mold or the substrate that is located upstream in the transport direction of the sheet-like body.
[0017] Furthermore, the microstructure transfer device of the present invention is characterized in that the curing light irradiator is located between the imprint roll and the first guide roll, and when the imprint roll moves while pressing the sheet-like body, it moves downstream to follow the imprint roll and the second guide roll while irradiating curing light.
[0018] In addition, the microstructure transfer device of the present invention is characterized in that the curing light irradiator is located between the imprint roll and the first guide roll, and the imprint roll moves downstream together with the second guide roll at a constant speed while pressing the sheet-like body, and then moves downstream while irradiating curing light.
[0019] The fine pattern transfer device according to the present invention is characterized by having a photocurable resin application mechanism that applies the photocurable resin to the mold and / or the substrate.
[0020] The fine structure transfer device according to the present invention is characterized by including a backup roll mechanism capable of individually adjusting the height and pressing force of the imprint roll.
[0021] The microstructure transfer device according to the present invention is characterized in that the backup roll mechanism includes a plurality of backup roll mechanisms spaced apart at predetermined intervals along the longitudinal direction of the imprint roll.
[0022] Furthermore, in the microstructure transfer device according to the present invention, the backup roll mechanism has a backup roll disposed directly above the imprint roll so as to come into contact with the outer peripheral surface of the imprint roll.
[0023] The microstructure transfer method of the present invention is a microstructure transfer method using a microstructure transfer device that includes an unwinder that winds up a flexible sheet-like body and unwinds the sheet-like body, a winder that winds up the sheet-like body transported through a plurality of guide rolls, and a stage arranged between the unwinder and the winder on which a mold having a fine uneven pattern formed thereon and coated with a photocurable resin is placed, and is characterized in that an imprint roll presses the sheet-like body against the mold from above, and irradiates curing light onto the sheet-like body pressed against the mold while moving back and forth between at least both ends of the mold, thereby continuously fixing a plurality of replicas to the sheet-like body.
[0024] Furthermore, the microstructure transfer method of the present invention is characterized in that the imprint roll presses one of the multiple replicas fixed to the sheet-like body, via the sheet-like body, against a substrate placed on the stage and having a surface on which the photocurable resin is applied, and while moving back and forth between at least both ends of the substrate, irradiates curing light through the sheet-like body pressed by the imprint roll and the replica onto the substrate on which the photocurable resin is applied, thereby transferring the fine unevenness pattern of the replica. Effect of the Invention
[0025] According to the present invention, it is possible to provide a fine structure transfer device and a fine structure transfer method capable of continuously fixing a plurality of replicas to a sheet-like body (film).
[0026] For example, since multiple replicas can be continuously attached to the sheet, the throughput of replica formation can be improved. Even if one of the multiple replicas attached to the sheet reaches its limit of use, the next new replica can be used simply by feeding the sheet, thereby reducing the cost of replica replacement and setup work.
[0027] Problems, configurations and effects other than those described above will become apparent from the following description of the embodiments. [Brief description of the drawings]
[0028] [Figure 1] 1 is a side view showing a schematic configuration of a fine pattern transfer device of Example 1 according to an embodiment of the present invention. [Diagram 2] FIG. 2 is a plan view of the microstructure transfer device shown in FIG. [Figure 3A] 13A to 13C are diagrams showing an alignment step by an imaging unit during replica formation. [Figure 3B] 13A and 13B are diagrams showing a film clamp and imprint roll pressing process during replica formation. [Figure 3C] 1A to 1C are diagrams illustrating nanoimprint operation steps during replica formation. [Figure 3D] FIG. 13 is a diagram showing a curing light irradiation step during replica formation. [Figure 3E] FIG. 13 is a diagram showing a peeling step during replica formation. [Figure 4A] 13 is a diagram showing the operation of the upstream guide roll, the imprint roll, and the downstream guide roll, and showing the state when a marker added to a sheet is detected. FIG. [Figure 4B] 13A to 13C are diagrams showing the operation of the upstream guide roll, the imprint roll, and the downstream guide roll, and are diagrams showing the state during the positioning operation and the positioning confirmation. [Figure 4C]FIG. 13 is a diagram showing the operation of the upstream guide roll, the imprint roll, and the downstream guide roll, and is a diagram showing the state when the film is clamped and the upstream guide roll is clamped. [Figure 4D] FIG. 13 is a diagram showing the operation of the upstream guide roll, the imprint roll, and the downstream guide roll, illustrating the state when the imprint roll is lowered. [Figure 4E] FIG. 13 is a diagram showing the operation of the upstream guide roll, the imprint roll, and the downstream guide roll, illustrating the state at the start of pressing the imprint roll and the downstream guide roll. [Figure 4F] FIG. 13 is a diagram showing the operation of the upstream guide roll, the imprint roll, and the downstream guide roll, illustrating the state when both the imprint roll and the downstream guide roll move downstream and apply pressure. [Figure 4G] FIG. 13 is a diagram showing the operation of the upstream guide roll, the imprint roll, and the downstream guide roll, and is a diagram showing the state when the curing light irradiator is lowered. [Figure 4H] FIG. 13 is a diagram showing the operation of the upstream guide roll, the imprint roll, and the downstream guide roll, illustrating a state during irradiation with curing light. [Figure 4I] FIG. 13 is a diagram showing the operation of the upstream guide roll, the imprint roll, and the downstream guide roll, illustrating the state when the film clamp is raised / retracted and both the imprint roll and the downstream guide roll start to move upstream. [Figure 4J] FIG. 13 is a diagram showing the operation of the upstream guide roll, the imprint roll, and the downstream guide roll, illustrating a state during peeling. [Figure 4K] FIG. 13 is a diagram showing the operation of the upstream guide roll, the imprint roll, and the downstream guide roll, illustrating the state when both the imprint roll and the downstream guide roll start to move upstream. [Diagram 5] FIG. 1 shows an overview of the process for replica formation, in which (A) is film alignment, (B) is pressing (imprinting), (C) is curing light irradiation, (D) is peeling, and (E) is the completion of replica formation. [Figure 6] FIG. 2 is a side view showing a schematic configuration of the fine structure transfer device shown in FIG. 1, and is a side view showing the state during transfer of a fine concave-convex pattern to a glass substrate by replica. [Figure 7] FIG. 7 is a plan view of the microstructure transfer device shown in FIG. 6. [Figure 8] FIG. 1 shows an overview of the process for forming a pattern on a glass substrate, in which (A) shows replica alignment, (B) shows pressing (imprinting), (C) shows curing light irradiation, (D) shows peeling, and (E) shows the completion of pattern formation on the glass substrate. [Figure 9] FIG. 11 is a plan view of a micropattern transfer device according to a second embodiment of the present invention. [Figure 10] FIG. 11 is a plan view of a micropattern transfer device according to a third embodiment of the present invention. [Figure 11A] FIG. 13 is a diagram showing a state in which a mold is set on a stage in a replica formation process. [Figure 11B] 1A to 1C are diagrams showing the application of photocurable resin and mold positioning in a replica formation process. [Figure 11C] FIG. 13 is a diagram showing a continuous replica formation state in the replica formation process. [Figure 11D] FIG. 13 shows the mold return state in the replica formation process. [Figure 12A] 1A and 1B are diagrams showing a state in which a glass substrate is set on a stage in a process of forming a pattern on the glass substrate. [Figure 12B] 1A to 1C are diagrams showing the application of a photocurable resin and the positioning of a mold in a process of forming a pattern on a glass substrate. [Figure 12C] 1A to 1C are diagrams showing a state in which patterns are continuously formed in a pattern forming process on a glass substrate. [Figure 12D] 1A and 1B are diagrams showing a state in which the glass substrate is returned in the process of forming a pattern on the glass substrate; [Figure 13] FIG. 11 is a front view of a fine pattern transfer device according to a fourth embodiment of the present invention. [Figure 14]14 is a view taken in the direction of the arrow A in FIG. 13, and is a cross-sectional view of the backup roll mechanism. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0029] In this specification, a fine pattern region having a fine concave-convex pattern formed on one mold or on the surface of one mold is referred to as a "cell."
[0030] In addition, in this specification, a glass substrate is described as an example of a transfer object onto which a fine pattern is transferred by a replica onto which a fine pattern of a mold (metal mold) is transferred, but it goes without saying that the transfer object is not limited to this and also includes substrates made of various panel materials such as resin substrates or film substrates. In other words, the transfer object onto which a fine pattern is transferred by a replica is a substrate.
[0031] Hereinafter, an embodiment of the present invention will be described with reference to the drawings. EXAMPLES
[0032] Fig. 1 is a side view showing a schematic configuration of a fine structure transfer device of Example 1 according to an embodiment of the present invention, and Fig. 2 is a plan view of the fine structure transfer device shown in Fig. 1. The outline arrows shown in Fig. 1 and Fig. 2 indicate the transport direction (supply direction) of a sheet-like body (film) 4.
[0033] (Configuration of the microstructure transfer device)
[0034] 1, the microstructure transfer device 1 includes, from the upstream side, a winder 5 that winds up a winding film (sheet-like body), a guide roll 3 that transports the sheet-like body (film) 4 sent out from the winder 5, a dry cleaner 9 that blows air onto the sheet-like body (film) 4 to remove dust adhering to the film surface, two guide rolls 3 that transport the sheet-like body (film) 4 vertically downward, an upstream guide roll (first guide roll) 3a that is arranged upstream of an imprint roll 2 described in detail below via a curing light irradiator 8, the curing light irradiator 8, the imprint roll 2, and a downstream guide roll (second guide roll) 3b that is adjacent to the imprint roll 2 and arranged downstream of it. Here, the curing light irradiator 8 irradiates, for example, ultraviolet light (ultraviolet light) as the curing light.
[0035] The microstructure transfer device 1 also includes a guide roll 3 that guides the sheet-like body (film) 4 passing through the downstream guide roll (second guide roll) 3b vertically upward, a guide roll 3 that transports the sheet-like body (film) 4 horizontally downstream from the guide roll 3 and guides the sheet-like body (film) 4 vertically downward, a laser marker 10 that irradiates a laser to add markers to positions corresponding to the beginning and end of a fine pattern area formed in the mold when the sheet-like body (film) 4 passes through the guide roll 3, a dry cleaner 9 that blows air onto the sheet-like body (film) 4 to remove dust adhering to the film surface, two guide rolls 3 arranged below the dry cleaner 9, a dancer roll 7, a cleaning roll 12, two guide rolls 3, and a winder 6 that winds up the sheet-like body (film) 4.
[0036] The cleaning roll 12 has a surface (outer circumferential surface) of the paired cleaning rolls coated with glue or the like in advance, and the sheet-like body (film) 4 passes through the paired cleaning rolls 12 while being sandwiched between them and in contact with them, thereby removing dust and the like adhering to the film surface. At this time, the replica, which will be described in detail later, is hardened and firmly fixed to the sheet-like body (film) 4, so that the replica does not detach or peel off from the sheet-like body (film) 4 when passing through the paired cleaning rolls 12. Note that, although the present embodiment shows a configuration in which the microstructure transfer device 1 has the cleaning roll 12, the installation of the cleaning roll 12 may be optional. In other words, a configuration without the cleaning roll 12 may be used.
[0037] The sheet-like body (film) 4 is flexible and has the property of transmitting light. The dancer roll 7 applies a predetermined tension to the conveyed sheet-like body (film) 4 by displacing left and right in FIG. 1, that is, back and forth in a horizontal plane. For example, based on the difference in diameter of each guide roll, even if the sheet-like body (film) 4 is fed from the unwinder 5 at a predetermined feed amount (speed), the film may bend. However, by displacing the dancer roll 7 back and forth to adjust the tension of the sheet-like body (film) 4, the above-mentioned bending can be prevented.
[0038] 1 and 2, the microstructure transfer device 1 includes a stage 11 on which a mold (metal mold) 14 is placed, which is movable in the XY directions in a horizontal plane and displaceable in a rotational direction (θ). A photocurable resin is applied in advance to a fine uneven pattern formed on the surface of the mold (metal mold) 14, and the mold (metal mold) 14 is loaded onto (loaded) and unloaded from (unloaded) the stage 11 by a transport mechanism such as a robot arm (not shown) (arrows in FIG. 2). The stage 11 is provided with, for example, a vacuum chuck, and the mold (metal mold) 14 placed thereon is fixed onto the stage 11 by the vacuum chuck.
[0039] 2, the microstructure transfer device 1 includes two imaging unit support parts 18, both ends of which are supported movably by the gantry 13, between the upstream guide roll (first guide roll) 3a and the curing light irradiator 8, and two upstream imaging units 17a that are spaced apart from each other along the width direction of the sheet-like body (film) 4. Also, between the imprint roll 2 and the downstream guide roll (second guide roll) 3b, two imaging unit support parts 18, both ends of which are supported movably by the gantry 13, and two downstream imaging units 17b that are spaced apart from each other along the width direction of the sheet-like body (film) 4 are included. For example, a CCD or the like is used as the upstream imaging unit 17a and the downstream imaging unit 17b. The upstream imaging unit 17a and the downstream imaging unit 17b are used to detect markers at four locations on the sheet-like body (film) 4 that are added by the laser marker 10 when the sheet-like body (film) 4 is positioned as described below. Between the downstream guide roll (second guide roll) 3 b and the stage 11, a film clamp 16 is provided.
[0040] (Operation of the microstructure transfer device during replica formation)
[0041] 3A to 3E show each process during replica formation. In the alignment process by the imaging unit shown in FIG. 3A, the downstream guide roll (second guide roll) 3b moves downstream while maintaining a predetermined distance from the surface of the mold (metal mold) 14 placed on the stage 11 to a position beyond the end of the stage 11. In addition, the upstream imaging unit 17a and the downstream imaging unit 17b move vertically above the sheet-like body (film) 4 to positions corresponding to the start end (the upstream end in the conveying direction of the sheet-like body (film) 4) of the fine pattern area on the surface of the mold (metal mold) 14 and the end (the downstream end in the conveying direction of the sheet-like body (film) 4). Then, when the upstream imaging unit 17a and the downstream imaging unit 17b detect the markers added to the conveyed sheet-like body (film) 4, the winder 6 stops the winding operation of the sheet-like body (film) 4.
[0042] 3B, first, the film clamp 16 descends and clamps the sheet-like body (film) 4. This fixes the sheet-like body (film) 4. The imprint roll 2 also descends and presses the sheet-like body (film) 4. In this state, the downstream guide roll (second guide roll) 3b moves upstream together with the guide roll 3 disposed vertically above, and stops at a position where it is a predetermined distance from the imprint roll 2.
[0043] In the nanoimprint operation process shown in Fig. 3C, the imprint roll 2 moves downstream while pressing the sheet-like body (film) 4 at the same speed as the downstream guide roll (second guide roll) 3b. At this time, in the example shown in Fig. 4C, the curing light irradiator 8 moves so as to follow the imprint roll 2, the downstream guide roll (second guide roll) 3b, and the guide roll 3 arranged vertically above it. Since the imprint roll 2 moves downstream at the same speed as the downstream guide roll (second guide roll) 3b, the positional relationship between them, i.e., the distance, is kept constant, so that the path length of the sheet-like body (film) 4 does not change, and even if the imprint roll 2 moves while pressing the sheet-like body (film) 4, the tension applied to the sheet-like body (film) 4 does not fluctuate.
[0044] 3D, as described above, the curing light irradiator 8 moves downstream to follow the imprint roll 2, and therefore moves downstream while irradiating ultraviolet light (curing light), and the photocurable resin previously applied to the surface of the mold (metal mold) 14 having a fine pattern region cooperates with the pressing force of the imprint roll 2 to be fixed to the sheet-like body (film) 4. As a result, the fine concave-convex pattern formed on the surface of the mold (metal mold) 14 is inverted and transferred to the sheet-like body (film) 4. Therefore, in this embodiment, the nanoimprint operation step and the curing light irradiation step are performed simultaneously.
[0045] 3E, the imprint roll 2 moves upstream at the same speed as the downstream guide roll (second guide roll) 3b and the guide roll 3 disposed vertically above it, thereby uniformly peeling the replica adhered to the sheet-like body (film) 4 from the surface of the mold (metal mold) 14. In other words, the replica adhered to the sheet-like body (film) 4 and the mold (metal mold) 14 can be peeled off without causing any damage.
[0046] As described above, according to the microstructure transfer device 1 of this embodiment, the imprint roll 2 moves back and forth downstream and upstream at the same speed as the downstream guide roll (second guide roll) 3b and the guide roll 3 arranged vertically above it, making it possible to easily form a replica.
[0047] Next, the operation of the upstream guide roll (first guide roll) 3a, the imprint roll 2, and the downstream guide roll (second guide roll) 3b will be described in detail with reference to Fig. 4A to Fig. 4K. As shown in Fig. 4A, the downstream guide roll (second guide roll) 3b moves downstream and stops at a position beyond the downstream end of the mold (metal mold) 14. At this time, the distance L1 between the axial centers of the upstream guide roll (first guide roll) 3a and the downstream guide roll (second guide roll) 3b is, for example, 4000 mm. In addition, the length L2 of the fine pattern region, which is the region where the fine concave-convex pattern formed on the surface of the mold (metal mold) 14 exists, is, for example, 65 inches. Two upstream imaging units 17a and two downstream imaging units 17b are positioned vertically above the sheet-like material (film) 4 transported between the upstream guide roll (first guide roll) 3a, the imprint roll 2, and the downstream guide roll (second guide roll) 3b, and detect markers at positions corresponding to the start and end of the fine pattern area that have been added in advance to the sheet-like material (film) 4 by a laser marker 10. The sheet-like material (film) 4 is transported at a pitch by the drive of the winder 6 over a length equivalent to one cell.
[0048] 4B, when the four markers are detected by the upstream imaging unit 17a and the downstream imaging unit 17b, the stage 11 on which the mold (metal mold) 14 is placed is rotated, for example, in a rotation direction (θ) based on the detected four markers, and positioned so that the four markers overlap with the start and end of the fine pattern region. The positioning is also confirmed based on the images captured by the upstream imaging unit 17a and the downstream imaging unit 17b.
[0049] 4C, film clamp 16, which has a generally L-shaped cross section, presses and clamps sheet-like material (film) 4 against the surface of mold (metal mold) 14. It also clamps upstream guide roll (first guide roll) 3a.
[0050] Next, as shown in Fig. 4D, the imprint roll 2 descends, and as shown in Fig. 4E, the downstream guide roll (second guide roll) 3b, which had been stopped at a position beyond the downstream end of the mold (metal mold) 14, moves upstream to be in a predetermined positional relationship with the imprint roll 2. At this time, the downstream guide roll (second guide roll) 3b is positioned vertically above the imprint roll 2 and upstream of the upstream guide roll (first guide roll) 3a. Therefore, the sheet-like body (film) 4 that is applied from the position pressed by the imprint roll 2 to the downstream guide roll (second guide roll) 3b forms a predetermined angle with the surface of the mold (metal mold) 14.
[0051] 4F, the imprint roll 2 moves, while pressing the sheet-like body (film) 4, at a constant speed with the downstream guide roll (second guide roll) 3b to a position beyond the downstream end of the mold (metal mold) 14. Since the imprint roll 2 and the downstream guide roll (second guide roll) 3b move at a constant speed, their positional relationship remains constant as they move downstream, and no fluctuation occurs in the tension applied to the sheet-like body (film) 4. Here, for example, the movement speed of the imprint roll 2 and the downstream guide roll (second guide roll) 3b is 150 mm / s.
[0052] 4G, the curing light irradiator 8 descends to directly above the film clamp 16. The curing light irradiator 8 then irradiates ultraviolet light (curing light) from above the sheet-like body (film) 4 to the photocurable resin that has been applied in advance to the fine pattern region on the surface of the mold (metal mold) 14 and that has been pressed onto the sheet-like body (film) 4 by the pressing force of the imprint roll 2, while moving to the vicinity of the imprint roll 2 located beyond the downstream end of the mold (metal mold) 14. This causes the photocurable resin to harden, and the fine concave-convex pattern formed on the surface of the mold (metal mold) 14 is inversely transferred onto the sheet-like body (film) 4.
[0053] As shown in FIG. 4I, the film clamp 16 then rises and retreats from the mold (metal mold) 14. Then, the imprint roll 2 starts to move upstream at a constant speed together with the downstream guide roll (second guide roll) 3b. As shown in FIG. 4J, the imprint roll 2 moves upstream at a constant speed together with the downstream guide roll (second guide roll) 3b, so that the replica fixed to the sheet-like body (film) 4 is peeled off in a uniform state from the fine concave-convex pattern formed on the surface of the mold (metal mold) 14. The upstream guide roll (first guide roll) 3a continues to be clamped until the imprint roll 2 reaches the vicinity of the upstream end of the mold (metal mold) 14. Finally, as shown in Figure 4K, when the imprint roll 2 reaches near the upstream end of the mold (metal mold) 14, the upstream guide roll (first guide roll) 3a is released from the clamp, and the imprint roll 2 and the downstream guide roll (second guide roll) 3b rise, resulting in a replica of one cell fixed to the sheet-like body (film) 4.
[0054] Although not shown, thereafter, the winder 6 winds up the sheet-like material (film) 4 by at least one cell length (pitch), and the unwinder 5 pitch-feeds the sheet-like material (film) 4. Thereafter, the operations shown in Figures 4A to 4K are repeated (step-and-repeat) to fix multiple replicas transferred from the same mold 14 to the sheet-like material (film) 4.
[0055] 3A to 3E, the nanoimprint operation step and the curing light irradiation step are performed simultaneously, but in FIGS. 4A to 4K, the curing light irradiation step is performed after the nanoimprint operation step is completed. In this way, the nanoimprint operation step and the curing light irradiation step may be performed simultaneously, or the curing light irradiation step may be performed after the nanoimprint operation step is completed. The tact time related to the curing light irradiation step depends on the irradiation process characteristics (irradiation speed, irradiation energy, etc.) due to the photocuring characteristics of the photocurable resin, the amount of resin applied, and the adhesion characteristics of the film and the substrate material, and the irradiation start timing, the curing light irradiator movement speed, and the irradiation time can be arbitrarily controlled by a curing light irradiator control mechanism (not shown).
[0056] FIG. 5 is a diagram showing an overview of the process during replica formation, in which (A) is film alignment, (B) is pressing (imprinting), (C) is curing light irradiation, (D) is peeling, and (E) is a diagram showing the completion of replica formation. In FIG. 5(A), a sheet-like body (film) 4 is aligned in a state in which a resin 19, which is a photocurable resin, is applied in advance to a mold (metal mold) 14 having a fine uneven pattern formed on its surface. Thereafter, in FIG. 5(B), the imprint roll 2 moves the sheet-like body (film) 4 downstream while pressing it against the resin 19. In FIG. 5(C), the curing light irradiator 8 irradiates ultraviolet light (curing light) onto the sheet-like body (film) 4 pressed against the resin 19, while the curing light irradiator 8 moves downstream. In FIG. 5(D), the imprint roll 2 moves upstream, and the sheet-like body (film) 4 to which the cured resin is fixed is peeled off from the mold (metal mold) 14. In FIG. 5(E), the mold (metal mold) 14 is completely peeled off, and a replica 20 fixed to the sheet-like body (film) 4 is formed.
[0057] (Operation of the microstructure transfer device when forming a pattern on a glass substrate)
[0058] The operation of forming (transferring) a fine concave-convex pattern by replica to a glass substrate using the fine structure transfer device 1 will be described below. Fig. 6 is a side view showing a schematic configuration of the fine structure transfer device shown in Fig. 1, showing a side view when transferring a fine concave-convex pattern to a glass substrate by replica, and Fig. 7 is a plan view of the fine structure transfer device shown in Fig. 6. The difference from Figs. 1 and 2 above is that instead of a configuration in which a mold (metal mold) 14 is placed on the stage 11, a glass substrate 15 is placed on it. Therefore, the description of Figs. 6 and 7 will be omitted here.
[0059] 3A to 3E, a glass substrate 15 to which a photocurable resin has been applied in advance is placed on a stage 11, and a replica having a fine concave-convex pattern on its surface, which is fixed to a sheet-like body (film) 4, is pressed against the photocurable resin of the glass substrate 15 by an imprint roll 2, which moves downstream at the same speed as a downstream guide roll (second guide roll) 3b. The photocurable resin of the glass substrate 15 is cured by a curing light irradiator 8 which moves downstream while irradiating ultraviolet light (curing light) so as to follow the imprint roll 2, and the replica is peeled off from the glass substrate 15 having the cured photocurable resin, as shown in FIG. 3E, to form a fine concave-convex pattern on the surface of the glass substrate 15.
[0060] 4A to 4K, the mold (metal mold) 14 to which a photocurable resin has been applied in advance is replaced with a glass substrate 15 to which a photocurable resin has been applied in advance, and the fine concave-convex pattern of the replica fixed to the sheet-like body (film) 4 is formed (transferred) onto the glass substrate 15 by the operations of the upstream guide roll (first guide roll) 3a, the imprint roll 2, and the downstream guide roll (second guide roll) 3b. When the replica reaches a usage limit number, for example, several hundred times, the winder 6 winds up at least one cell length (pitch) of the sheet-like body (film) 4, and the unwinder 5 pitch-feeds the sheet-like body (film) 4. As a result, the operations of Figs. 4A to 4K are repeated again using a new replica, and the fine concave-convex patterns of the replica are transferred onto a plurality of glass substrates 15 to form patterns.
[0061] In this way, replacement with a new replica is possible simply by pitch-feeding the sheet-like body (film) 4, so that the costs of replica replacement and setup work can be reduced.
[0062] In addition, the replicas can be continuously attached to a plurality of sheet-like bodies (films) using the same micropattern transfer device 1, and then the replicas can be used to form a pattern on a glass substrate, which makes it possible to improve throughput.
[0063] FIG. 8 is a diagram showing an overview of the process when forming a pattern on a glass substrate, in which (A) shows replica alignment, (B) shows pressing (imprinting), (C) shows curing light irradiation, (D) shows peeling, and (E) shows the completion of pattern formation on the glass substrate. In FIG. 8(A), the replica 20 fixed to the sheet-like body (film) 4 is aligned with the glass substrate 15 on whose surface the resin 19, which is a photocurable resin, has been applied in advance. After that, in FIG. 8(B), the replica 20 fixed to the sheet-like body (film) 4 is moved downstream while being pressed by the imprint roll 2 against the glass substrate 15 on which the resin 19 has been applied. In FIG. 8(C), the curing light irradiator 8 irradiates ultraviolet light (ultraviolet light) to the resin 19 on the glass substrate 15 through the replica 20 fixed to the sheet-like body (film) 4, while the curing light irradiator 8 moves downstream. In Fig. 8(D), the replica 20 fixed to the sheet-like body (film) 4 is peeled off from the glass substrate 15 having the cured resin 19 by the imprint roll 2 moving upstream. In Fig. 8(E), the replica 20 fixed to the sheet-like body (film) 4 is completely peeled off from the glass substrate 15, thereby forming a fine concave-convex pattern of the replica on the glass substrate 15.
[0064] In this embodiment, the microstructure transfer device 1 is configured to continuously attach a plurality of replicas 20 to the sheet-like body (film) 4, and then transfer (form) a fine concave-convex pattern by the replicas 20 to the glass substrate 15 on which a photocurable resin has been applied in advance, but this is not necessarily limited to this. For example, the microstructure transfer device 1 of this embodiment may be configured to continuously attach a plurality of replicas 20 to the sheet-like body (film) 4, and then use the replicas to transfer the fine concave-convex pattern of the replicas to a glass substrate by another device.
[0065] According to this embodiment, it is possible to provide a fine structure transfer device and a fine structure transfer method capable of continuously fixing a plurality of replicas to a sheet-like body (film).
[0066] Furthermore, according to this embodiment, since a plurality of replicas can be continuously fixed to the sheet-like body, the throughput of replica formation can be improved.
[0067] Furthermore, if replica formation and pattern formation by transferring the fine concave-convex pattern of the replica onto a glass substrate are performed using the microstructure transfer device of this embodiment, even if one of the multiple replicas fixed to the sheet-like body reaches its limit of use, it is possible to use a new replica simply by feeding the sheet-like body by a certain pitch, thereby reducing the costs of replica replacement and setup work. EXAMPLES
[0068] FIG. 9 is a plan view of a fine structure transfer device of Example 2 according to another embodiment of the present invention. As shown in FIG. 9, this embodiment is different from Example 1 in that it is composed of a replica continuous forming device 21, a photocurable resin application mechanism 22, a replica shape inspection device 31, and a pattern forming device 41. In particular, this embodiment is different from Example 1 in that the replica continuous forming device 21 is provided for replica formation, and the replica continuous forming device 21 is provided with a photocurable resin application mechanism 22 for applying a photocurable resin to a mold (metal mold), and further, this embodiment is different from Example 1 in that a replica shape inspection device 31 for inspecting the shape of the replica before forming a fine uneven pattern on a glass substrate using the replica is provided. The same components as those in Example 1 are given the same reference numerals, and the following description that overlaps with Example 1 will be omitted.
[0069] As shown in Fig. 9, the configuration of the replica continuous forming device 21 is almost the same as that of the microstructure transfer device 1 shown in the above-mentioned embodiment 1. Before the mold (metal mold) 14 is carried into the stage, a photocurable resin is applied to the fine uneven pattern formed on the surface of the mold (metal mold) 14 by a photocurable resin application mechanism 22. An inkjet printer, for example, is used as the photocurable resin application mechanism 22. The mold (metal mold) 14 to which the photocurable resin has been applied is placed on the stage, and a plurality of replicas 20 are continuously fixed to the sheet-like body (film) 4 by the operation of the imprint roll 2, the guide roll 3, the unwinder 5, the winder 6, etc., in the same manner as in the above-mentioned embodiment 1.
[0070] The replica 20 formed by the replica continuous forming apparatus 21 is sent to a replica shape inspection apparatus 31, which inspects whether the fine uneven pattern formed (transferred) on the replica 20 has any defects or failures. As a shape inspection apparatus used in the replica shape inspection apparatus 31, for example, an atomic force microscope (AFM), a scanning electron microscope (SEM), or a scatterometry optical inspection apparatus can be used. Among them, it is preferable to use an AFM.
[0071] When the replica shape inspection device 31 judges a replica to be defective, it recognizes information about the cell where the defect is identified (such as placement and defect details) and stores the information in a storage unit (not shown). The replica shape inspection device 31 and the pattern forming device 41 share defect information about the defective cell via a network or the like.
[0072] The pattern forming device 41 includes a transport mechanism 42 that transports the glass substrate 15 coated with a photocurable resin carried in from an upstream device to the pattern forming device 41, or transports the glass substrate 15 on which a fine concave-convex pattern has been formed by the pattern forming device 41 to a downstream device. The pattern forming device 41 also accommodates the glass substrate 15 coated with a photocurable resin carried in by the transport mechanism 42 in the gantry 13, and from there, includes an unwinder 5 and a winder 6 similar to those of the microstructure transfer device 1 shown in the above-mentioned first embodiment, as well as various rolls (not shown), to form (transfer) the fine concave-convex pattern of the replica 20 onto the glass substrate 15.
[0073] According to this embodiment, since a plurality of replicas can be continuously fixed to a sheet-like body by the replica continuous forming device 21, it is possible to reduce the setup time for replica replacement, similarly to the first embodiment.
[0074] Furthermore, according to this embodiment, cells that are determined to be defective by the replica shape inspection device 31 can be automatically skipped by the pattern forming device 41, making it possible to form a fine concave-convex pattern using only good replicas, thereby improving the yield of glass substrates having fine concave-convex patterns formed on their surfaces. EXAMPLES
[0075] 10 is a plan view of a microstructure transfer device of Example 3 according to another embodiment of the present invention. This example differs from Examples 1 and 2 in that the microstructure transfer device includes a mechanism for applying a photocurable resin for a replica and a mechanism for applying a photocurable resin for a glass substrate. The same components as those in Examples 1 and 2 are given the same reference numerals, and duplicated explanations will be omitted below.
[0076] As shown in FIG. 10, the microstructure transfer device 1a includes a replica photocurable resin application mechanism 22a and a glass substrate photocurable resin application mechanism 22b on both sides of the gantry 13. Here, in FIG. 10, the length direction of the microstructure transfer device 1a is defined as the X direction, and the width direction of the microstructure transfer device 1a is defined as the Y direction. The replica photocurable resin application mechanism 22a arranged on the side where the mold (metal mold) 14 placed on the stage 11 and carried into the gantry 13 is located can move back and forth in the Y direction, and is configured to apply a photocurable resin to the mold (metal mold) 14 placed on the stage 11 and carried into the gantry 13. The glass substrate photocurable resin application mechanism 22b arranged on the side where the glass substrate 15 placed on the stage 11 and carried into the gantry 13 is located can move back and forth in the Y direction, and is configured to apply a photocurable resin to the glass substrate 15 placed on the stage 11 and carried into the gantry 13. As the replica photocurable resin application mechanism 22a and the glass substrate photocurable resin application mechanism 22b, for example, an inkjet printer or the like is used.
[0077] Next, the operation of the micropattern transfer device 1a in the replica formation process will be described. FIG. 11A is a diagram showing a state where a mold is set on a stage in a replica formation process. As shown in FIG. 11A, a mold (metal mold) 14 is set (placed) on the stage 11. At this time, a replica photocurable resin application mechanism 22a waits at an initial position. FIG. 11B is a diagram showing a photocurable resin application and mold positioning state in a replica formation process. The replica photocurable resin application mechanism 22a moves in the Y direction to a position where the mold (metal mold) 14 placed on the stage 11 is carried into the gantry 13. The replica photocurable resin application mechanism 22a applies a photocurable resin to the surface of the mold (metal mold) 14 when the mold (metal mold) 14 placed on the stage 11 is carried into the gantry 13. FIG. 11C is a diagram showing a replica continuous formation state in a replica formation process. In FIG. 11C, as shown in the above-mentioned Example 1, a replica in which a fine concave-convex pattern formed on the surface of the mold (metal mold) 14 is inverted and transferred to a sheet-like body (film) (not shown) is formed. 11D is a diagram showing the mold returning state in the replica formation process. After the replica is formed, the mold (metal mold) 14 placed on the stage 11 is carried out to the outside of the gantry.
[0078] Next, the operation of the microstructure transfer device 1a in the pattern formation process on the glass substrate will be described. FIG. 12A is a diagram showing a state in which the glass substrate is set on the stage in the pattern formation process on the glass substrate. As shown in FIG. 12A, the glass substrate 15 is set (placed) on the stage 11. At this time, the mechanism 22b for applying photocurable resin for glass substrates is waiting at the initial position. FIG. 12B is a diagram showing a state in which the photocurable resin is applied and the glass substrate is positioned in the pattern formation process on the glass substrate. As shown in FIG. 12B, the mechanism 22b for applying photocurable resin for glass substrates moves in the Y direction to a region in which the pattern is formed on the glass substrate 15 placed on the stage 11 and is moved to a position where the glass substrate 15 is carried into the gantry 13. When the glass substrate 15 placed on the stage 11 is carried into the gantry 13, the mechanism 22b for applying photocurable resin for glass substrates applies photocurable resin to the region in which the pattern is formed on the glass substrate 15. FIG. 12C is a diagram showing a state in which patterns are continuously formed in the pattern formation process on the glass substrate. In the gantry 13, the fine concave-convex pattern of the replica 20 is formed (transferred) on the region of the glass substrate 15 placed on the stage 11 where the photocurable resin is applied by the glass substrate photocurable resin application mechanism 22b. Fig. 12D is a diagram showing the glass substrate returning state in the pattern formation process on the glass substrate. After the pattern is formed on the glass substrate 15, the glass substrate 15 is carried out of the gantry while still placed on the stage 11.
[0079] According to this embodiment, by providing a photocurable resin application mechanism for replicas 22a and a photocurable resin application mechanism for glass substrates 22b that can operate independently during the replica formation process and the pattern formation process on the glass substrate, it is possible to use the same microstructure transfer device 1a to perform processes ranging from application of photocurable resin to continuous replica formation and even pattern formation on the glass substrate 15, thereby improving workability. EXAMPLES
[0080] Fig. 13 is a front view (view taken in the direction of the arrow A in Figs. 1 and 6) of a fine structure transfer device of Example 4 according to another embodiment of the present invention, and Fig. 14 is a view taken in the direction of the arrow A in Fig. 13. This Example differs from Examples 1 to 3 in that the outer peripheral surface of the imprint roll has a urethane rubber lining, and a backup roll mechanism is provided directly above the imprint roll.
[0081] As shown in FIG. 13, the microstructure transfer device of this embodiment includes a pair of Z-axis drive units 51 disposed above both ends of the imprint roll 2 in the longitudinal direction, and a load cell 52 disposed below each of the Z-axis drive units 51 for monitoring the load. As shown in FIG. 14, the imprint roll 2 has a urethane rubber lining 56 on its outer circumferential surface, and includes a backup roll mechanism 55 directly above the imprint roll 2. As shown in FIG. 13, a plurality of backup roll mechanisms 55 are provided at predetermined intervals along the longitudinal direction of the imprint roll 2. The height and pressing force can be adjusted individually by these plurality of backup roll mechanisms. In the example shown in FIG. 13, a mold (metal mold) 14 is placed on the stage 11, that is, a plurality of replicas are continuously fixed to the sheet-like body (film) 4, but when a fine concave-convex pattern is transferred to a glass substrate 15 using replicas, the glass substrate 15 is placed on the stage 11.
[0082] According to this embodiment, the height and pressing force of the imprint roll 2 can be adjusted individually by the backup roll mechanism 55, so that it is possible to suppress bending of the imprint roll 2 itself.
[0083] Furthermore, since the height and pressing force of the imprint roll 2 can be individually adjusted using the backup roll mechanism 55, the imprint roll 2 can flexibly follow the sheet-like body (film) against the mold (metal mold) and imprint with uniform pressure.
[0084] Furthermore, because the height and pressing force of the imprint roll 2 can be adjusted individually by the backup roll mechanism 55, when multiple molds are used, it is possible to absorb the difference in level between the molds, flexibly follow them, and imprint with uniform pressure. Furthermore, for highly viscous resin materials, the backup roll mechanism 55 transmits pressure uniformly, making it possible to perform highly accurate imprinting. Furthermore, after imprinting is completed and the photocurable resin is cured, the backup roll mechanism 55 prevents roller escape during peeling for films with poor peelability or photocurable resins with strong adhesive strength, and enables the film to be peeled reliably with a uniform peeling force (tension).
[0085] 13, a configuration is shown in which multiple backup roll mechanisms 55 are provided at predetermined intervals along the longitudinal direction of the imprint roll 2, but this is not necessarily limited to this, and a configuration in which the backup roll mechanisms 55 are provided at any one location in the longitudinal direction of the imprint roll 2 is also possible. Also, the number of backup roll mechanisms 55 to be installed may be set appropriately according to the needs.
[0086] Furthermore, the arrangement of the backup roll mechanisms 55 when installed is not limited to the single row shown in the figure. For example, the backup roll mechanisms 55 may be arranged in multiple rows, such as two rows or three rows, on the outer periphery of the imprint roll 2.
[0087] The present invention is not limited to the above-described embodiment, but includes various modifications. For example, the above-mentioned embodiments have been described in detail to clearly explain the present invention, and are not necessarily limited to those including all of the configurations described. Also, it is possible to replace a part of the configuration of one embodiment with the configuration of another embodiment, and it is also possible to add the configuration of another embodiment to the configuration of one embodiment. Also, it is possible to add, delete, or replace a part of the configuration of each embodiment with the configuration of another embodiment. [Explanation of symbols]
[0088] 1,1a Microstructure transfer device 2. Imprint roll 3 Guide roll 3a: Upstream guide roll (first guide roll) 3b Downstream guide roll (second guide roll) 4. Sheet-like body (film) 5...Unwinder 6... Winder 7. Dancer Roll 8...Curing light irradiator 9. Dry cleaner 10. Laser marker 11 Stage 12 Cleaning roll 13. Gantry 14. Mold 15. Glass substrate 16. Film clamp 17a Upstream imaging section 17b Downstream imaging section 18 Imaging unit support 19. Resin 20...Replica 21. Continuous replica forming device 22...Photo-curable resin application mechanism 22a...Mechanism for applying photocurable resin for replicas 22b...Photocurable resin coating mechanism for glass substrates 31 Replica shape inspection device 41 Pattern forming device 42...Transport mechanism 51 Z-axis drive unit 52 Load cell 55 Backup roll mechanism 56···Urethane rubber lining
Claims
1. an unwinder that winds a flexible sheet-like material and unwinds the sheet-like material; a winding machine that winds up the sheet material transported via a plurality of guide rolls; a stage disposed between the unwinder and the winder, on which a mold having a fine concave-convex pattern formed thereon and a photocurable resin applied thereto is placed; an imprint roll that reciprocates between at least both ends of the mold while pressing the sheet-like body against the mold from above; a curing light irradiator that irradiates curing light to the sheet-like body pressed against the mold, A micropattern transfer device, characterized in that a plurality of replicas are continuously fixed to the sheet-like body.
2. 2. The micropattern transfer apparatus according to claim 1, the imprint roll reciprocates between at least both ends of the substrate while pressing one of the replicas fixed to the sheet-like body, via the sheet-like body, against a substrate placed on the stage and having a surface coated with the photocurable resin; The curing light irradiator irradiates curing light through the sheet-like body and the replica pressed by the imprint roll onto the substrate on which the photocurable resin has been applied, and after the photocurable resin has hardened, the sheet-like body is peeled off by the imprint roll, thereby transferring the fine concave-convex pattern of the replica.
3. 3. The micropattern transfer apparatus according to claim 1, Among the plurality of guide rolls, a first guide roll is adjacent to the imprint roll and located on the upstream side in the transport direction of the sheet-like body, and a second guide roll is adjacent to the imprint roll and located on the downstream side in the transport direction of the sheet-like body, A microstructure transfer device, characterized in that when the imprint roll moves while pressing the sheet-like body, the second guide roll is positioned above the imprint roll and moves at a constant speed together with the imprint roll.
4. 4. The micropattern transfer apparatus according to claim 3, A microstructure transfer device characterized in that, when the imprint roll moves while pressing the sheet-like body, it is provided with a film clamp that clamps the sheet-like body to the end of the mold or the substrate that is located upstream in the transport direction of the sheet-like body.
5. 5. The micropattern transfer apparatus according to claim 4, The curing light irradiator is located between the imprint roll and the first guide roll, and when the imprint roll moves while pressing the sheet-like body, the curing light irradiator moves downstream to follow the imprint roll and the second guide roll while irradiating curing light.
6. 5. The micropattern transfer apparatus according to claim 4, The curing light irradiator is located between the imprint roll and the first guide roll, and the imprint roll moves downstream together with the second guide roll at a constant speed while pressing the sheet-like body, and then moves downstream while irradiating curing light.
7. 6. The micropattern transfer apparatus according to claim 5, A fine pattern transfer device comprising a photocurable resin application mechanism for applying the photocurable resin to the mold and / or the substrate.
8. 7. The micropattern transfer apparatus according to claim 6, A fine pattern transfer device comprising a photocurable resin application mechanism for applying the photocurable resin to the mold and / or the substrate.
9. 5. The micropattern transfer apparatus according to claim 4, A fine structure transfer device comprising: a backup roll mechanism capable of individually adjusting the height and pressing force of the imprint roll.
10. 10. The micropattern transfer apparatus according to claim 9, The microstructure transfer device comprises a plurality of backup roll mechanisms spaced at predetermined intervals along the longitudinal direction of the imprint roll.
11. 11. The micropattern transfer apparatus according to claim 9, The microstructure transfer device, wherein the backup roll mechanism has a backup roll disposed directly above the imprint roll so as to be in contact with the outer peripheral surface of the imprint roll.
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