Exhaust gas passage system to detoxification reactor

Abstract

To provide a passage system which can prevent leakage of exhaust gas sent to a detoxification reactor to secure safety.SOLUTION: A passage system includes: an exhaust gas transfer pipe 5 for transferring an exhaust gas to a detoxification reactor 2; a first two-way valve 7 attached to the exhaust gas transfer pipe 5; a bypass pipe 10 which is branched from the exhaust gas transfer pipe 5 in a position at the upstream side of the first two-way valve 7 and bypasses the detoxification reactor 2; and a second two-way valve 12 attached to the bypass pipe 10. The first two-way valve 7 and the second two-way valve 12 are vertically arranged so that exhaust gas passages 15, 16 extend in a vertical direction.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to a flow path system that transports exhaust gas discharged from a processing chamber of a semiconductor manufacturing device such as an etching device or a CVD device to a detoxification reactor, and more particularly to a flow path system having a flow path switching function. [Background technology]

[0002] In the semiconductor manufacturing process for manufacturing semiconductor devices, liquid crystal panels, LEDs, etc., various processes such as etching and CVD are performed by introducing process gas into a vacuum processing chamber. The processing chamber and the exhaust system equipment connected to the processing chamber are periodically cleaned by flowing cleaning gas. These exhaust gases such as process gas and cleaning gas contain silane gas, halogen gas, PFC gas, etc., and can have adverse effects on the human body and the global environment, such as causing global warming, and therefore cannot be released directly into the atmosphere. Therefore, these exhaust gases are detoxified in a detoxification reactor installed downstream of the semiconductor manufacturing equipment before being released into the atmosphere.

[0003] 8 is a schematic diagram showing an example of a flow path system for sending exhaust gas from a processing chamber of a semiconductor manufacturing device to an abatement reactor. Exhaust gas such as a process gas or cleaning gas is discharged from a processing chamber 400 by a vacuum pump (not shown) and sent to an abatement reactor 510 through an exhaust gas transfer pipe 500. A three-way valve 501 consisting of a ball valve is disposed in the exhaust gas transfer pipe 500. An inlet 505 and a first outlet 506 of the three-way valve 501 are connected to the exhaust gas transfer pipe 500, and a second outlet 507 of the three-way valve 501 is connected to a bypass pipe 502 that bypasses the abatement reactor 510. A valve body 508 of the three-way valve 501 operates to communicate the inlet 505 with either the first outlet 506 or the second outlet 507.

[0004] When the abatement reactor 510 is operating normally, the inlet 505 and the first outlet 506 of the three-way valve 501 are in communication with each other, and the exhaust gas is sent to the abatement reactor 510 through the three-way valve 501, as shown in Fig. 8. On the other hand, when a serious failure occurs in the abatement reactor 510 or when the abatement reactor 510 stops, the valve body 508 of the three-way valve 501 is operated to block communication between the inlet 505 and the first outlet 506 of the three-way valve 501, while communicating between the inlet 505 and the second outlet 507, as shown in Fig. 9. As a result, the exhaust gas is sent to the bypass pipe 502 without being sent to the abatement reactor 510. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] JP 2022-170680 A Summary of the Invention [Problem to be solved by the invention]

[0006] The process gas and cleaning gas used in the semiconductor manufacturing process may form powder (e.g., SiO2) which is a sublimation product. If the powder in the exhaust gas accumulates on the valve body 508 of the three-way valve 501, the valve body 508 of the three-way valve 501 may not operate normally or the sealing property of the three-way valve 501 may be impaired. In particular, when the valve body 508 rotates, the flow path formed in the valve body 508 passes through the sealing surface, so that the powder is likely to be caught between the valve body 508 and the sealing surface, and the sealing property may be lost. As a result, there is a risk that a part of the exhaust gas will not be sent to the abatement reactor 510 and will be released into the atmosphere through the bypass pipe 502.

[0007] In order to prevent the accumulation of sublimation products, a jacket heater may be attached to the three-way valve 501 to heat the inside of the three-way valve 501 to a temperature equal to or higher than the sublimation temperature (for example, 200°C). However, the temperature change between a high temperature equal to or higher than the sublimation temperature and room temperature causes the resin or rubber seal members of the three-way valve 501 to shrink due to thermal history, and the necessary sealing surface pressure cannot be secured, which may result in leakage of exhaust gas.

[0008] Therefore, the present invention provides a flow path system that can prevent leakage of exhaust gas sent to an abatement reactor and ensure safety. [Means for solving the problem]

[0009] In one aspect, a flow path system is provided comprising an exhaust gas transfer pipe for transferring exhaust gas to an abatement reactor, a first two-way valve attached to the exhaust gas transfer pipe, a bypass pipe branching off from the exhaust gas transfer pipe at a position upstream of the first two-way valve and bypassing the abatement reactor, and a second two-way valve attached to the bypass pipe, wherein the first two-way valve and the second two-way valve are vertically positioned such that a flow path for the exhaust gas extends vertically.

[0010] In one embodiment, the exhaust gas transfer pipe has a vertical section extending vertically, the bypass pipe has an upwardly extending ascending section, the first two-way valve is disposed in the vertical section, and the second two-way valve is disposed in the upward section. In one embodiment, the second two-way valve is located higher than the first two-way valve. In one embodiment, the flow path system further includes an inert gas supply line that supplies an inert gas into the bypass pipe, the inert gas supply line being connected to the bypass pipe at a position below the second two-way valve. In one aspect, the flow path system further comprises a heating device for heating the inert gas in the inert supply line. In one embodiment, each of the first two-way valve and the second two-way valve is a ball valve. Effect of the Invention

[0011] According to the present invention, a combination of a first two-way valve and a second two-way valve is used instead of a three-way valve. The first two-way valve and the second two-way valve are vertically placed with the exhaust gas flow path extending vertically, so that powder (e.g., SiO2) in the exhaust gas is unlikely to accumulate in the first two-way valve and the second two-way valve, and normal operation of the first two-way valve and the second two-way valve can be maintained. In particular, the powder in the exhaust gas is unlikely to reach the second two-way valve. As a result, leakage of the exhaust gas from the first two-way valve and the second two-way valve is prevented, and safety can be ensured. [Brief description of the drawings]

[0012] [Figure 1] 1 is a schematic diagram illustrating one embodiment of a flow path system for delivering exhaust gas from a processing chamber of a semiconductor manufacturing device to an abatement reactor. [Diagram 2] FIG. 2 is a cross-sectional view showing one embodiment of a first two-way valve. [Diagram 3] FIG. 4 is a cross-sectional view showing a state in which the first two-way valve is closed. [Figure 4] FIG. 13 is a schematic diagram showing another embodiment of the flow path system. [Diagram 5] FIG. 13 is a schematic diagram showing still another embodiment of the flow path system. [Figure 6] FIG. 13 is a schematic diagram showing still another embodiment of the flow path system. [Figure 7] FIG. 13 is a schematic diagram showing still another embodiment of the flow path system. [Figure 8] FIG. 1 is a schematic diagram showing a conventional example of a flow path system for sending exhaust gas from a processing chamber of a semiconductor manufacturing device to an abatement reactor. [Figure 9] FIG. 13 is a diagram showing a state in which a three-way valve is operated to send exhaust gas to a bypass pipe. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0013] Hereinafter, an embodiment of the present invention will be described with reference to the drawings. 1 is a schematic diagram showing an embodiment of a flow path system for sending exhaust gas from a processing chamber of a semiconductor manufacturing apparatus to an abatement reactor. Examples of the processing chamber include processing chambers provided in semiconductor manufacturing apparatus such as an etching apparatus and a CVD apparatus.

[0014] As shown in Fig. 1, exhaust gases such as process gases and cleaning gases are exhausted from a processing chamber 1 by a vacuum pump (not shown) and sent to an abatement reactor 2 through a flow path system. The abatement reactor 2 is configured to render the exhaust gas harmless. Examples of the abatement reactor 2 include a combustion abatement reactor, a thermal plasma abatement reactor, and a heater abatement reactor.

[0015] The flow path system includes an exhaust gas transfer pipe 5 for transferring the exhaust gas discharged from the treatment chamber 1 to the abatement reactor 2, a first two-way valve 7 attached to the exhaust gas transfer pipe 5, a bypass pipe 10 branching from the exhaust gas transfer pipe 5 at a position upstream of the first two-way valve 7 and bypassing the abatement reactor 2, and a second two-way valve 12 attached to the bypass pipe 10. During the abatement treatment of the exhaust gas, the first two-way valve 7 is opened and the second two-way valve 12 is closed. Therefore, the exhaust gas is sent to the abatement reactor 2 through the first two-way valve 7. When a serious malfunction occurs in the abatement reactor 2 or when the operation of the abatement reactor 2 is stopped due to an unexpected event, the first two-way valve 7 is closed and the second two-way valve 12 is opened. In this case, the exhaust gas flows through the bypass pipe 10 and the second two-way valve 12.

[0016] Each of the first two-way valve 7 and the second two-way valve 12 is an on-off valve having one inlet and one outlet. The first two-way valve 7 and the second two-way valve 12 are arranged vertically with the flow passages formed therein extending vertically. That is, the first two-way valve 7 has therein a first flow passage 15 through which the exhaust gas flows, and the first flow passage 15 extends vertically. The second two-way valve 12 has therein a second flow passage 16 through which the exhaust gas flows, and the second flow passage 16 extends vertically. In this specification, the "vertical direction" includes directions within an angle range of 0 to 45 degrees with respect to the vertical direction. The direction at an angle of 0 degrees is the vertical direction.

[0017] In the present embodiment shown in Fig. 1, the first flow path 15 of the first two-way valve 7 extends in the vertical direction. The first two-way valve 7 has an exhaust gas inlet 21 and outlet 22, and the inlet 21 is located above the outlet 22. The exhaust gas transfer pipe 5 has a vertical section 5A extending in the vertical direction, and the first two-way valve 7 is disposed in the vertical section 5A. In the present embodiment, the vertical section 5A extends in the vertical direction.

[0018] The second flow passage 16 of the second two-way valve 12 extends in the vertical direction. The second two-way valve 12 has an inlet 24 and an outlet 25 for exhaust gas, and the inlet 24 is located below the outlet 25. The bypass pipe 10 has an upwardly extending rising section 10A, and the second two-way valve 12 is disposed in the rising section 10A. In this embodiment, the rising section 10A extends in the vertical direction. The bypass pipe 10 further has a connecting section 10B branched off from the exhaust gas transfer pipe 5. One end of the connecting section 10B is connected to the exhaust gas transfer pipe 5, and the other end of the connecting section 10B is connected to the rising section 10A. In the embodiment shown in FIG. 1, the connecting section 10B extends horizontally. In one embodiment, the connecting section 10B may extend obliquely upward or curve upward from the exhaust gas transfer pipe 5 to the rising section 10A.

[0019] Since the first two-way valve 7 and the second two-way valve 12 are arranged vertically with the exhaust gas flow paths 15, 16 extending vertically, powder in the exhaust gas (e.g., SiO2) is unlikely to accumulate in the first two-way valve 7 and the second two-way valve 12, and normal operation of the first two-way valve 7 and the second two-way valve 12 can be maintained. In particular, since the second two-way valve 12 is located higher than the first two-way valve 7 and is disposed in the ascending section 10A of the bypass pipe 10, powder is unlikely to reach the second two-way valve 12.

[0020] The first two-way valve 7 and the second two-way valve 12 are ball valves. The first two-way valve 7 will be described below with reference to Fig. 2. Fig. 2 is a cross-sectional view showing one embodiment of the first two-way valve 7. Although not shown, the second two-way valve 12 has the same basic configuration as the first two-way valve 7, so the following description can also be applied to the second two-way valve 12.

[0021] 2, the first two-way valve 7 includes a valve housing 31 having a first flow passage 15 therein that allows exhaust gas to pass through, a ball-shaped valve element 33 arranged in the valve housing 31, a seal member 35 that seals the gap between the valve housing 31 and the valve element 33, and a rotating shaft 37 that rotates the valve element 33 within the valve housing 31. The rotating shaft 37 is connected to the valve element 33. The seal member 35 has a seal surface 36 that comes into contact with the outer surface of the valve element 33.

[0022] The first two-way valve 7 has an inlet 21 and an outlet 22 for exhaust gas. The inlet 21 is formed from one end of the first flow passage 15, and the outlet 22 is formed from the other end of the first flow passage 15. The valve body 33 has a movable flow passage 39 therein. When the valve body 33 is rotated by the rotating shaft 37, the movable flow passage 39 communicates with the first flow passage 15 as shown in FIG. 2, so that the exhaust gas can pass through the first two-way valve 7 through the first flow passage 15 and the movable flow passage 39. The first flow passage 15 extends in the vertical direction L. Therefore, the powder, which is a by-product contained in the exhaust gas, falls due to gravity and is not easily accumulated in the first two-way valve 7.

[0023] The rotating shaft 37 is connected to an actuator (not shown). By rotating the rotating shaft 37, the actuator can change the direction of the movable flow passage 39 in the valve body 33, that is, can open and close the first two-way valve 7. Figure 2 shows the first two-way valve 7 in an open state.

[0024] FIG. 3 is a diagram showing a state in which the first two-way valve 7 is closed. As shown in FIG. 3, an actuator (not shown) rotates the rotating shaft 37, thereby blocking communication between the movable flow passage 39 in the valve body 33 and the first flow passage 15, and the first two-way valve 7 is thereby closed. As can be seen from FIG. 2 and FIG. 3, when the valve body 33 rotates in the valve housing 31, the movable flow passage 39 does not cross the seal surface 36 of the seal member 35. Therefore, powder in the exhaust gas is unlikely to be caught between the outer surface of the valve body 33 and the seal surface 36. As a result, the smooth operation of the valve body 33 can be ensured, the sealing performance can be maintained, and the leakage of exhaust gas can be prevented.

[0025] 2 and 3 also apply to the second two-way valve 12. Therefore, smooth operation of the valve body of the second two-way valve 12 can be ensured, sealing performance can be maintained, and leakage of exhaust gas can be prevented.

[0026] Figures 4 and 5 are schematic diagrams showing another embodiment of the flow path system. The configuration and operation of this embodiment not specifically described are the same as those of the above embodiment described with reference to Figures 1 to 3, and therefore the duplicated description will be omitted. As shown in Figures 4 and 5, the exhaust gas transfer pipe 5 and the bypass pipe 10 may be configured as a Y-shaped pipe.

[0027] In the embodiment shown in FIG. 4, the upstream section 5B of the exhaust gas transfer pipe 5 extends obliquely, and the first two-way valve 7 is attached to the vertical section 5A extending in the vertical direction. The upstream section 5B is a part of the exhaust gas transfer pipe 5 and is located upstream of the vertical section 5A. The bypass pipe 10 includes a connecting section 10B extending obliquely upward from the exhaust gas transfer pipe 5 and an ascending section 10A extending vertically from the connecting section 10B. The second two-way valve 12 is attached to the ascending section 10A. In the embodiment shown in FIG. 4, both the first two-way valve 7 and the second two-way valve 12 are arranged in a vertical position. That is, the first flow path 15 of the first two-way valve 7 and the second flow path 16 of the second two-way valve 12 extend in the vertical direction.

[0028] In the embodiment shown in FIG. 5, the configuration and arrangement of the exhaust gas transfer pipe 5 and the first two-way valve 7 are the same as those of the embodiment shown in FIG. 4, but the configuration of the bypass pipe 10 and the arrangement of the second two-way valve 12 are different from those of the embodiment shown in FIG. 4. That is, the bypass pipe 10 has an ascending section 10A extending obliquely upward from the exhaust gas transfer pipe 5, and the second two-way valve 12 is attached to the ascending section 10A. The lower end of the ascending section 10A is connected to the exhaust gas transfer pipe 5, and the upper end of the ascending section 10A is connected to the second two-way valve 12. The second two-way valve 12 is disposed obliquely. More specifically, the second flow path 16 of the second two-way valve 12 is inclined with respect to the vertical direction at an angle greater than 0 and equal to or less than 45 degrees. In this embodiment, the ascending section 10A also extends vertically, so that the powder in the exhaust gas is unlikely to reach the second two-way valve 12.

[0029] FIG. 6 is a schematic diagram showing yet another embodiment of the flow path system. The configuration and operation of this embodiment not specifically described are the same as those of the above embodiment described with reference to FIG. 1 to FIG. 5, so that the overlapping description will be omitted. As shown in FIG. 6, the flow path system further includes an inert gas supply line 40 that supplies an inert gas into the bypass pipe 10. The inert gas supply line is connected to the bypass pipe 10 at a position below the second two-way valve 12. The inert gas supply line 40 is connected to an inert gas supply source (not shown). An example of the inert gas is nitrogen gas.

[0030] The inert gas flows through the inert gas supply line 40 into the bypass pipe 10 at a position below the second two-way valve 12. Furthermore, the inert gas flows through the bypass pipe 10 and into the exhaust gas transfer pipe 5. The downward flow of the inert gas in the bypass pipe 10 can prevent powder in the exhaust gas from reaching the second two-way valve 12. Furthermore, the inert gas can reduce the concentration of the exhaust gas in the exhaust gas transfer pipe 5 and the bypass pipe 10 and reduce the sublimation temperature. As a result, powder consisting of sublimable by-products is less likely to accumulate in the first two-way valve 7 and the second two-way valve 12.

[0031] In another embodiment shown in FIG. 7, the flow path system further includes a heating device 41 that heats the inert gas in the inert gas supply line 40. The heating device 41 is attached to the inert gas supply line 40 and configured to heat the inert gas flowing through the inert gas supply line 40. For example, the heating device 41 is configured to heat the inert gas to a temperature equal to or higher than the sublimation temperature of the by-products of the exhaust gas (for example, 200° C.). The specific configuration of the heating device 41 is not particularly limited, but for example, an electric heater can be used as the heating device 41.

[0032] The heated inert gas can increase the temperature of the exhaust gas in the exhaust gas transfer pipe 5 and the bypass pipe 10. Therefore, powder made of sublimable by-products is less likely to be formed. As a result, smooth operation of the valve bodies 33 of the first two-way valve 7 and the second two-way valve 12 can be ensured, sealing performance can be maintained, and exhaust gas leakage can be prevented.

[0033] The embodiments of the inert gas supply line 40 and the heating device 41 described with reference to FIGS. 6 and 7 are also applicable to the embodiments described with reference to FIGS.

[0034] In each of the above-described embodiments, the first two-way valve 7 and the second two-way valve 12, which are on-off valves, are ball valves having a ball-type valve body 33. In one embodiment, the first two-way valve 7 and the second two-way valve 12 may be on-off valves other than ball valves, such as ball valves, needle valves, diaphragm valves, and gate valves. However, ball valves are preferably used because the valve body is less likely to become clogged with powder.

[0035] The above-described embodiments have been described for the purpose of enabling a person having ordinary skill in the art to practice the present invention. Various modifications of the above-described embodiments are naturally possible for a person skilled in the art, and the technical idea of ​​the present invention can be applied to other embodiments. Therefore, the present invention is not limited to the described embodiments, but is to be interpreted in the broadest scope according to the technical idea defined by the claims. [Explanation of symbols]

[0036] 1 Processing chamber 2 Abatement reactor 5. Exhaust gas transfer pipe 5A Vertical Section 5B Upstream section 7 First two-way valve 10 Bypass pipe 10A Ascending Section 10B Connecting section 12 Second two-way valve 15 First flow path 16 Second flow path 21 Entrance 22 Exit 24 Entrance 25 Exit 31 Valve housing 33 Valve body 35 Sealing material 36 Sealing surface 37 Rotating Shaft 39 Movable Channel 40 Inert gas supply line 41 Heating device

Claims

1. an exhaust gas transfer pipe for transferring the exhaust gas to the abatement reactor; A first two-way valve attached to the exhaust gas transfer pipe; a bypass pipe that branches off from the exhaust gas transfer pipe at a position upstream of the first two-way valve and bypasses the abatement reactor; a second two-way valve attached to the bypass pipe; A flow path system, wherein the first two-way valve and the second two-way valve are arranged vertically such that a flow path for the exhaust gas extends vertically.

2. The exhaust gas transfer pipe has a vertical section extending in a vertical direction, The bypass pipe has an upwardly extending rising section, the first two-way valve is disposed in the vertical section; The flow path system according to claim 1 , wherein the second two-way valve is disposed in the ascending section.

3. The flow path system according to claim 1 , wherein the second two-way valve is located at a higher position than the first two-way valve.

4. An inert gas supply line that supplies an inert gas into the bypass pipe is further provided. The flow path system of claim 1 , wherein the inert supply line is connected to the bypass pipe at a location below the second two-way valve.

5. The flow path system of claim 4 , further comprising a heating device for heating the inert gas in the inert supply line.

6. The flow path system according to claim 1 , wherein each of the first two-way valve and the second two-way valve is a ball valve.

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