Observation device, observation system, manufacturing apparatus, observation method, and manufacturing method

Abstract

To easily observe a surface shape of an observation target having a rugged part.SOLUTION: An observation device 20 observes an observation target 7. The observation device 20 comprises: an optical system 30 that has an objective lens 31 facing the observation target 7; a first illumination device 60 that irradiates the observation target 7 with light from an optical axis direction LA of the objective lens 31; and a second illumination device 70 that irradiates the observation target 7 with light from a plurality of directions inclined relative to the optical axis direction LA of the objective lens 31.SELECTED DRAWING: Figure 2

Description

[Technical field]

[0001] The present disclosure relates to an observation device for observing an observation target, an observation system having the observation device, a manufacturing device having the observation device, an observation method for observing an observation target, and a manufacturing method including the observation method. [Background technology]

[0002] There is known an observation device for magnifying and observing the surface of an observation target, as described in Patent Document 1. Such an observation device has a coaxial illumination device that irradiates light from the optical axis direction of a lens. By irradiating light from the optical axis direction of the lens, the observation target enlarged by the lens can be brightly observed. The surface shape of the observation target, such as scratches formed on the observation target and foreign matter attached to the observation target, can be easily observed. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Publication No. 6-138394 Summary of the Invention [Problem to be solved by the invention]

[0004] An observation object may have uneven parts due to a pattern or the like. Even if an observation object having uneven parts is observed using an observation device such as that described in Patent Document 1, the surface shape due to scratches or foreign matter will be mixed up with the uneven parts. As a result, it is difficult to observe the surface shape of the observation object. The present disclosure aims to easily observe the surface shape of an observation object even if the observation object has uneven parts. [Means for solving the problem]

[0005] One embodiment of the present disclosure relates to the following [1] to

[18] . [1] An observation device for observing an observation target, comprising: an optical system having an objective lens facing the object to be observed; a first illumination device that irradiates the observation object with light from an optical axis direction of the objective lens; and a second illumination device that irradiates the object to be observed with light from a plurality of directions inclined with respect to the optical axis direction of the objective lens. [2] The observation device according to [1], wherein the magnification of the optical system is 2.5 times or more. [3] The observation device according to [1] or [2], wherein the ratio between the intensity of the light irradiated by the first lighting device and the intensity of the light irradiated by the second lighting device is adjustable. [4] The observation device according to any one of [1] to [3], wherein the second illumination device is disposed between the objective lens and the observation target. [5] The observation device described in [4], wherein the length between the second illumination device and the object to be observed is 20 mm or less. [6] The observation device described in [4] or [5], wherein the length between the second lighting device and the object to be observed is adjustable. [7] The observation device according to any one of [1] to [6], wherein an angle of light that the second illumination device irradiates onto the object to be observed is adjustable. [8] The observation device according to any one of [1] to [7], wherein the visible light reflectance of the object to be observed is 20% or more. [9] The observation device according to any one of [1] to [8], wherein the surface roughness of the object to be observed is 0.2 or more and 2.0 or less.

[10] The observation device according to any one of [1] to [9], wherein the observation target includes a metal.

[11] An observation device according to any one of [1] to

[10] , an imaging device that captures an image observed by the observation device.

[12] The observation system described in

[11] , further comprising a control device that controls the ratio between the intensity of light emitted by the first lighting device and the intensity of light emitted by the second lighting device so as to reduce unevenness in brightness acquired for each pixel of the imaging device.

[13] A manufacturing apparatus comprising the observation device according to any one of [1] to

[10] , or the observation system according to

[11] or

[12] .

[14] An observation method comprising an observation step of irradiating an observation object with light from an optical axis direction of an objective lens and observing the observation object through an optical system having the objective lens while irradiating the observation object with light from a plurality of directions tilted with respect to the optical axis direction of the objective lens.

[15] an adjustment step of adjusting a ratio between an intensity of light irradiated onto the observation target from an optical axis direction of the objective lens and an intensity of light irradiated onto the observation target from a plurality of directions inclined with respect to the optical axis direction of the objective lens so as to reduce unevenness in observed brightness; The observation method according to

[14] , further comprising a second observation step of observing the object again through the optical system.

[16] The observation method described in

[15] , wherein the adjustment process is automatically controlled.

[17] The observation method according to any one of

[14] to

[16] , further comprising an imaging step of capturing an image observed by the observation step.

[18] A manufacturing process for producing an article; and an observation step of observing the article as an observation object using an observation method according to any one of

[14] to

[17] . Effect of the Invention

[0006] According to the present disclosure, the surface shape of an object having unevenness can be easily observed. [Brief description of the drawings]

[0007] [Figure 1]FIG. 1 is a diagram showing a manufacturing apparatus equipped with an observation system. [Diagram 2] FIG. 2 is a diagram showing an observation system having an observation device. [Diagram 3] FIG. 3 is a cross-sectional view showing the first lighting device. [Figure 4] FIG. 4 is a cross-sectional view showing the second illumination device. [Diagram 5] FIG. 5 is a diagram for explaining the effect of light irradiated onto an object to be observed. [Figure 6] FIG. 6 is a diagram for explaining the effect of light irradiated onto an object to be observed. [Figure 7] FIG. 7 is a diagram showing an example of an observation target observed by the observation system. [Figure 8] FIG. 8 is a diagram showing an example of an observation target observed by the observation system. [Figure 9] FIG. 9 is a diagram showing an example of an observation target observed by the observation system. [Figure 10] FIG. 10 is a diagram showing an example of an observation target observed by the observation system. [Figure 11] FIG. 11 is a diagram showing an example of an observation target observed by the observation system. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0008] Hereinafter, an embodiment of the present disclosure will be described with reference to the drawings. The scale and aspect ratios in the drawings attached to this specification are changed and exaggerated from those of the actual objects for ease of illustration and understanding.

[0009] In this specification, the term "sheet surface" refers to a surface that coincides with the planar direction of a target sheet-like member when the target sheet-like member is viewed overall and globally.

[0010] Terms used in this specification that specify shapes and geometric conditions and their degrees, such as "parallel," "orthogonal," and "same," as well as values ​​of lengths and angles, are not limited to their strict meanings and are interpreted to include a range within which similar functions can be expected.

[0011] FIG. 1 shows a manufacturing apparatus for manufacturing a product as an example to which the observation system is applied. The product can be various manufactured products. In the example shown in FIG. 1, the manufacturing apparatus 1 has a front-end process section 3, an observation system 10, and a back-end process section 5. The front-end process section 3 manufactures an article that will become a product in the back-end process section 5. The article manufactured by the front-end process section 3 is transported to the observation system 10. The observation system 10 observes the article as an observation target 7 using an observation method described below. The observation system 10 functions, for example, as an inspection system that inspects whether the article is a non-defective product. The article observed by the observation system 10 is transported to the back-end process section 5. The back-end process section 5 processes the article according to the observation result of the observation system 10. For example, the back-end process section 5 processes the article that the observation system 10 judges to be a non-defective product into a product, and discards the article that the observation system 10 judges to be a defective product.

[0012] Fig. 2 shows a schematic diagram of an observation system 10. The observation system 10 observes the surface shape of an observation target 7. As shown in Fig. 2, the observation system 10 has an imaging device 11, a control device 13, a display device 15, and an observation device 20. The observation device 20 has an optical system 30 having an objective lens 31, a lens barrel 40, a first illumination device 60, and a second illumination device 70.

[0013] The imaging device 11 captures an image of the observation target 7 observed by the observation device 20. The captured image is sent to the control device 13. The imaging device 11 is attached to the lens barrel 40 of the observation device 20. The imaging device 11 is, for example, a camera. The imaging device 11 may capture a video instead of capturing an image.

[0014] The control device 13 is connected to the imaging device 11, the display device 15, the first lighting device 60, and the second lighting device 70. The control device 13 controls the imaging device 11, the display device 15, the first lighting device 60, and the second lighting device 70.

[0015] The control device 13 controls the imaging device 11 to capture an image. The control device 13 causes the display device 15 to display the image captured by the imaging device 11.

[0016] The control device 13 controls the ratio between the intensity of the light irradiated by the first lighting device 60 and the intensity of the light irradiated by the second lighting device 70 so that the unevenness of the brightness acquired for each pixel of the imaging device 11 is reduced. As a specific example, 256 levels of brightness are determined, and a distribution of the brightness of each pixel of the imaging device 11 and the number of pixels having the brightness is formed. The ratio between the intensity of the light irradiated by the first lighting device 60 and the intensity of the light irradiated by the second lighting device 70 is controlled so that the half-width of the brightness that is the most frequent value in the distribution is reduced. Alternatively, the ratio between the intensity of the light irradiated by the first lighting device 60 and the intensity of the light irradiated by the second lighting device 70 is controlled so that the number of pixels having the brightness that is the most frequent value in the distribution is increased. Alternatively, the ratio between the intensity of the light irradiated by the first lighting device 60 and the intensity of the light irradiated by the second lighting device 70 is controlled so that the standard deviation of the brightness that is the most frequent value in the distribution is reduced. Alternatively, the ratio between the intensity of the light irradiated by the first lighting device 60 and the intensity of the light irradiated by the second lighting device 70 is controlled so as to reduce the value obtained by dividing the standard deviation of the brightness that is the most frequent value in the distribution by the average brightness of the distribution, in other words, the coefficient of variation. The ratio between the intensity of the light irradiated by the first lighting device 60 and the intensity of the light irradiated by the second lighting device 70 may be controlled by other methods so as to reduce unevenness in the brightness acquired for each pixel of the imaging device 11.

[0017] The observation device 20 may have an autofocus function (not shown), and the control device 13 may control the autofocus function so that the image captured by the imaging device 11 is in focus.

[0018] The display device 15 is controlled by the control device 13 and displays the image captured by the imaging device 11. The display device 15 may be any display such as a liquid crystal display or an organic EL display.

[0019] The control of the imaging device 11, the display device 15, the first lighting device 60, and the second lighting device 70 by the control device 13 is preferably automatic, but may be manual. For example, an observer observes an image of the observation target 7 captured by the imaging device 11 and displayed on the display device 15. Based on the image, the observer manually operates and controls the control device 13 so that the unevenness in brightness of the image acquired for each pixel of the imaging device 11 is reduced. The observer may manually control the ratio between the intensity of the light irradiated by the first lighting device 60 and the intensity of the light irradiated by the second lighting device 70.

[0020] The observer may observe with the naked eye the observation target 7 magnified by the observation device 20, instead of the image of the observation target 7 captured by the imaging device 11. The observer can observe the observation target 7 magnified with the naked eye from the location where the imaging device 11 is attached by the observation device 20. While observing the observation target 7 with the naked eye, the observer may manually control the intensity of the light irradiated by the first illumination device 60 and the intensity of the light irradiated by the second illumination device 70 so that unevenness in the observed brightness is reduced.

[0021] The observation device 20 observes the observation target 7 under magnification. The observation device 20 is, for example, a microscope. By magnifying with the observation device 20, the surface shape of the observation target 7 can be observed. With the observation device 20, for example, the surface shape of scratches formed on the observation target 7, foreign matter attached to the observation target 7, the processed shape applied to the observation target 7, etc. can be observed under magnification. In the manufacturing apparatus 1, the observation device 20 is used, for example, as a detection device that detects scratches and foreign matter on the observation target 7, or as a measurement device that measures the dimensions of the processed shape of the observation target 7.

[0022] The optical system 30 magnifies light from a part of the observation target 7. In the example shown in FIG. 2, the optical system 30 has an objective lens 31. The objective lens 31 is located closest to the observation target 7 in the optical system 30. Not limited to the example shown in the figure, the optical system 30 may have other lenses such as an eyepiece lens. The optical system 30 may have optical members other than lenses. The magnification of the optical system 30 is preferably 2.5 times or more. The magnification of the optical system 30 can be calculated from the arrangement of the lenses in the optical system 30 and the focal length of the lenses. The focal length of the lenses can be measured by the nodal slide method using an MB-8 manufactured by Pearl Optical Co., Ltd.

[0023] The lens barrel 40 prevents external light from entering the optical system 30. The lens barrel 40 has a cylindrical shape. The optical system 30 is formed inside the lens barrel 40. An objective lens 31 is disposed at one end of the lens barrel 40. An imaging device 11 is disposed at the other end of the lens barrel 40.

[0024] The first illumination device 60 irradiates the observation target 7 with light from the optical axis direction LA of the objective lens 31. The first illumination device 60 is a coaxial illumination device. The first illumination device 60 is disposed in accordance with the optical system 30 and the lens barrel 40.

[0025] FIG. 3 shows a schematic diagram of the first illumination device 60. In the example shown in FIG. 3, the first illumination device 60 has a first light source 61 and a half mirror 65. The first light source 61 irradiates light in a direction perpendicular to the optical axis direction LA so that the light is incident on the half mirror 65 at an incident angle of 45°. The intensity of the light irradiated by the first light source 61 is controlled by the control device 13. The half mirror 65 reflects a part of the incident light and transmits the other part. The half mirror 65 is disposed at an inclination of 45° with respect to the optical axis direction LA. The half mirror 65 reflects a part of the light from the first light source 61 and directs it in the optical axis direction LA of the objective lens 31. In the example shown in FIG. 3, the half mirror 65 is disposed inside the lens barrel 40 and inside the optical system 30. The half mirror 65 transmits a part of the light from the observation target 7.

[0026] The second illumination device 70 irradiates the observation target 7 with light from a plurality of directions inclined with respect to the optical axis LA of the objective lens 31. It is preferable that the second illumination device 70 can irradiate the observation target 7 with light from all directions inclined with respect to the optical axis LA of the objective lens 31. The direction inclined with respect to the optical axis LA of the objective lens 31 means that the angle with respect to the optical axis LA of the objective lens 31 is equal to or greater than 3° and less than 90°, and preferably equal to or greater than 5° and less than 85°. The second illumination device 70 is a diffusion illumination device.

[0027] The second illumination device 70 is disposed between the objective lens 31 and the observation target 7. The length between the objective lens 31 and the observation target 7 is 40 mm or less. The length between the second illumination device 70 and the observation target 7 is 20 mm or less. The length between the second illumination device 70 and the observation target 7 is adjustable. The second illumination device 70 can be disposed at a position closer to the observation target 7 than the objective lens 31. The second illumination device 70 has a shape of a part of a sphere, a part of an elliptical sphere, or a closed paraboloid. The thickness of the second illumination device 70, in other words, the length of the second illumination device 70 between the objective lens 31 and the observation target 7, is, for example, 5 mm or more and 15 mm or less.

[0028] FIG. 4 shows a schematic diagram of the second illumination device 70. In the example shown in FIG. 4, the second illumination device 70 has a plurality of second light sources 71 and a reflecting section 75. The second light source 71 irradiates light to the reflecting section 75. The reflecting section 75 reflects the light from the second light source 71 and directs it toward the observation object 7. The reflecting section 75 has a curved shape. The curved shape is, for example, a part of a sphere, a part of an elliptical sphere, or a part of a paraboloid. The observation object 7 can be observed by the observation device 20 through the opening. The intensity of the light irradiated by each second light source 71 can be independently adjusted by the control device 13.

[0029] By controlling the intensity of light emitted by each second light source 71, it is possible to adjust the angle of light that the second illumination device 70 irradiates onto the observation object 7. By irradiating light onto the reflecting portion 75 from only some of the second light sources 71, the second illumination device 70 can irradiate light onto the observation object 7 from only some of the directions inclined with respect to the optical axis LA of the objective lens 31.

[0030] The second illumination device 70 further has a transmitting portion 77 so that light from the first illumination device 60 can transmit through the second illumination device 70. The transmitting portion 77 is provided at a position facing the objective lens 31 of the reflecting portion 75, and extends in the optical axis direction LA of the objective lens 31. The transmitting portion 77 may be an opening penetrating the reflecting portion 75, or may be formed by filling the opening with a transparent resin or the like.

[0031] Not limited to the illustrated example, the second illumination device 70 may irradiate the observation object 7 with light from a plurality of directions inclined with respect to the optical axis LA of the objective lens 31 by any method. The second illumination device 70 may irradiate the observation object 7 with light from a plurality of directions inclined with respect to the optical axis LA of the objective lens 31 by, for example, transmitting light from a light source through a prism.

[0032] By the control device 13 controlling the intensity of light emitted by the first light source 61 and the intensity of light emitted by the second light source 71, the ratio between the intensity of light emitted by the first lighting device 60 and the intensity of light emitted by the second lighting device 70 can be adjusted.

[0033] The observation target 7 is, for example, a web-like or sheet-like workpiece. The observation target 7 is arranged so that the sheet surface is perpendicular to the optical axis direction LA of the objective lens 31. The observation target 7 may be observed while being transported.

[0034] The observation object 7 is observed by the observation device 20 by reflecting the light irradiated from the first illumination device 60 and the second illumination device 70 in the optical axis direction LA of the objective lens 31. It is preferable that the visible light reflectance of the observation object 7 is high. It is preferable that the visible light reflectance of the observation object 7 is 20% or more. The visible light reflectance can be determined as the average of the reflectance for each wavelength by measuring the reflectance for each wavelength using a spectrophotometer (Konica Minolta "CM-3700A"). A D65 light source is used as the light source during the measurement.

[0035] The observation target 7 may have a fine uneven portion such as a pattern. FIGS. 5 and 6 show cross-sectional views of the observation target 7. As shown in FIGS. 5 and 6, the observation target 7 has a flat portion 7a and an uneven portion 7b. The flat portion 7a is arranged so as to be perpendicular to the optical axis direction LA of the objective lens 31. The uneven portion 7b has the same depth and height. The depth and height of the uneven portion 7b refer to the maximum length of the uneven portion 7b from the flat portion 7a adjacent to the uneven portion 7b in a direction perpendicular to the sheet surface of the observation target 7. The surface roughness of the observation target 7 due to the uneven portion 7b is preferably 0.2 to 2.0. The surface roughness refers to the arithmetic mean roughness in JIS B 0601:1982. The surface roughness can be measured using a stylus-type surface roughness measuring instrument (for example, Surfcorder "ET4000L" manufactured by Kosaka Laboratory). The measurement conditions are a cutoff wavelength of 0.8 mm, a cutoff type of phase compensation, a measurement speed of 0.1 mm / sec, a reference length of 0.8 mm, and an evaluation length (measurement length) of 4 mm.

[0036] The observation target 7 may be resin, paper, or the like, but preferably contains a metal. The metal contained in the observation target 7 forms the surface of the observation target 7. The observation target 7 containing a metal may have an uneven portion 7b due to a pattern.

[0037] The following describes a method for observing the observation target 7 using the observation system 10 and the observation device 20. The observation method includes an observation step, an imaging step, an adjustment step, and a second observation step.

[0038] The first illumination device 60 irradiates the observation target 7 with light from the optical axis direction LA of the objective lens 31. In FIG. 5, the light irradiated from the optical axis direction LA of the objective lens 31 is reflected by the observation target 7 with an arrow. Since the light is specularly reflected by the flat portion 7a of the observation target 7, the light irradiated from the optical axis direction LA of the objective lens 31 is reflected by the flat portion 7a in the optical axis direction LA of the objective lens 31 as shown in FIG. 5. Since the light is diffusely reflected by the uneven portion 7b of the observation target 7, the light irradiated from the optical axis direction LA of the objective lens 31 is hardly reflected by the uneven portion 7b in the optical axis direction LA of the objective lens 31 as shown in FIG. The light irradiated from the optical axis direction LA of the objective lens 31 to the observation target 7 is reflected by the flat portion 7a of the observation target 7 in the optical axis direction LA of the objective lens 31 more than by the uneven portion 7b.

[0039] The second illumination device 70 irradiates the observation target 7 with light from a plurality of directions inclined with respect to the optical axis direction LA of the objective lens 31. In FIG. 6, the light irradiated from a plurality of directions inclined with respect to the optical axis direction LA of the objective lens 31 is reflected by the observation target 7 with arrows. Since the flat portion 7a of the observation target 7 regularly reflects light, as shown in FIG. 6, the light irradiated from a plurality of directions inclined with respect to the optical axis direction LA of the objective lens 31 is hardly reflected in the optical axis direction LA of the objective lens 31 by the flat portion 7a. Since the uneven portion 7b of the observation target 7 diffusely reflects light, as shown in FIG. 6, the light irradiated from a plurality of directions inclined with respect to the optical axis direction LA of the objective lens 31 can be reflected in the optical axis direction LA of the objective lens 31 by the uneven portion 7b. The light irradiated from a plurality of directions inclined with respect to the optical axis direction LA of the objective lens 31 is reflected in the optical axis direction LA of the objective lens 31 by the uneven portion 7b of the observation target 7 more than by the flat portion 7a. Light irradiated from a plurality of directions inclined with respect to the optical axis direction LA of the objective lens 31 is likely to be reflected in the same manner on the observation target 7 by the concave-convex portions 7b having the same depth and height.

[0040] By irradiating the observation target 7 with light from the optical axis direction LA of the objective lens 31 and from a plurality of directions inclined with respect to the optical axis direction LA of the objective lens 31, the influence of the flat portion 7a and the uneven portion 7b of the observation target 7 can be reduced, and the light can be reflected by the observation target 7. The observation device 20 allows the light reflected in the optical axis direction LA of the objective lens 31 to be observed. In the observation step, the observation target 7 is observed via the optical system 30 having the objective lens 31 in a state in which the observation target 7 is irradiated with light from the optical axis direction LA of the objective lens 31 and from a plurality of directions inclined with respect to the optical axis direction LA of the objective lens 31.

[0041] In the imaging step, an image of the observation target 7 observed in the observation step is captured by the imaging device 11. The captured image of the observation target 7 is sent to the control device 13.

[0042] The control device 13 adjusts the ratio between the intensity of light irradiated from the optical axis direction LA of the objective lens 31 to the observation target 7 and the intensity of light irradiated from a plurality of directions inclined with respect to the optical axis direction LA of the objective lens 31 so that the unevenness of the brightness observed in the observation process is reduced. In particular, the control device 13 controls the first illumination device 60 and the second illumination device 70 based on the image of the observation target 7. By controlling the first illumination device 60 and the second illumination device 70, the ratio between the intensity of light irradiated from the optical axis direction LA of the objective lens 31 to the intensity of light irradiated from a plurality of directions inclined with respect to the optical axis direction LA of the objective lens 31 is adjusted so that the unevenness of the brightness of the image acquired for each pixel of the imaging device 11 is reduced. By adjusting this ratio, it is possible to reflect light of approximately uniform intensity over the entire observation target 7 even if the observation target 7 has a flat portion 7a and an uneven portion 7b. In the adjustment process, the ratio between the intensity of light irradiated onto the observation object 7 from the optical axis direction LA of the objective lens 31 and the intensity of light irradiated from a plurality of directions inclined with respect to the optical axis direction LA of the objective lens 31 is adjusted so as to reduce unevenness in brightness of the observed image.

[0043] It is preferable that the control of the first lighting device 60 and the second lighting device 70 by the control device 13 is automatic. It is preferable that the adjustment process is automatically controlled.

[0044] In the second observation step, the observation target 7 is observed again in a state in which the ratio of the intensities of the irradiated lights has been adjusted in the adjustment step.

[0045] If necessary, the imaging step, the adjustment step, and the further observation step are repeated again. By repeating the steps, the ratio between the intensity of the light irradiated from the optical axis direction LA of the objective lens 31 to the observation target 7 and the intensity of the light irradiated from a plurality of directions inclined with respect to the optical axis direction LA of the objective lens 31 can be adjusted so that unevenness in the observed brightness is minimized. The observation target 7 is observed in this adjusted state.

[0046] A manufacturing process using the manufacturing apparatus 1 having the observation system 10 includes a manufacturing process for manufacturing an article, and an observation process for observing the article as an observation target by the observation method described above.

[0047] As an example, Figs. 7 to 11 show images of the observation target 7 observed while adjusting the ratio between the intensity of light irradiated from the optical axis direction LA of the objective lens 31 to the intensity of light irradiated from a plurality of directions inclined with respect to the optical axis direction LA of the objective lens 31. Figs. 7 to 11 show images of the same observation target 7. Fig. 7 shows an image of the observation target 7 irradiated with light only from the optical axis direction LA of the objective lens 31. Fig. 8 shows an image of the observation target 7 observed in a state where the ratio between the intensity of light irradiated from the optical axis direction LA of the objective lens 31 to the intensity of light irradiated from a plurality of directions inclined with respect to the optical axis direction LA of the objective lens 31 is adjusted to 7:3. Fig. 9 shows an image of the observation target 7 observed in a state where the ratio between the intensity of light irradiated from the optical axis direction LA of the objective lens 31 to the intensity of light irradiated from a plurality of directions inclined with respect to the optical axis direction LA of the objective lens 31 is adjusted to 5:5. FIG. 10 is an image of the observation target 7 observed in a state where the ratio between the intensity of the light irradiated from the optical axis direction LA of the objective lens 31 to the intensity of the light irradiated from a plurality of directions inclined with respect to the optical axis direction LA of the objective lens 31 is adjusted to 6:4. FIG. 11 is an image of the observation target 7 irradiated with light only from a plurality of directions inclined with respect to the optical axis direction LA of the objective lens 31. As can be understood from FIG. 7 to FIG. 11, the unevenness of the observed brightness is also changed by changing the ratio between the intensity of the light irradiated from the optical axis direction LA of the objective lens 31 to the intensity of the light irradiated from a plurality of directions inclined with respect to the optical axis direction LA of the objective lens 31. In the example shown in FIG. 7 to FIG. 11, the unevenness of the observed brightness is smallest in a state where the ratio between the intensity of the light irradiated from the optical axis direction LA of the objective lens 31 to the intensity of the light irradiated from a plurality of directions inclined with respect to the optical axis direction LA of the objective lens 31 is adjusted to 6:4.

[0048] Among the ratios between the intensity of light irradiated onto the observation target 7 from the optical axis direction LA of the objective lens 31 and the intensity of light irradiated from a plurality of directions inclined with respect to the optical axis direction LA of the objective lens 31, the ratio that minimizes the unevenness of the observed brightness varies depending on the observation target 7. The ratio can vary depending on, for example, the visible light reflectance and surface roughness of the observation target 7.

[0049] Conventional observation devices such as microscopes only have a coaxial illumination device as an illumination device. By irradiating the observation target with light using the coaxial illumination device, the surface of the observation target can be clearly observed due to the difference in reflectance at each position on the observation target. If the observation target has uneven parts due to a pattern or the like, the light reflected by the observation target becomes non-uniform due to the influence of the uneven parts. Even when observing the observation target, the uneven parts are observed to be conspicuous. For example, even if the surface shape of the observation target is different from the uneven parts due to scratches, foreign matter, processing, etc., the surface shape is observed to blend in with the uneven parts. It is difficult to distinguish the uneven parts from the surface shape of the observation target using conventional observation devices.

[0050] The observation device 20 of this embodiment has a first illumination device 60 that irradiates light onto the observation target 7 from the optical axis direction LA of the objective lens 31, and a second illumination device 70 that irradiates light onto the observation target 7 from a plurality of directions inclined with respect to the optical axis direction LA of the objective lens 31. By irradiating light onto the observation target 7 from the first illumination device 60 and the second illumination device 70, the influence of the flat portion 7a and the uneven portion 7b of the observation target 7 can be reduced, and the light can be reflected by the observation target 7. Even if the observation target 7 has the uneven portion 7b, the light reflected by the observation target 7 can be made closer to uniform. Since the uneven portion 7b having the same depth and height is reflected in the same manner by the observation target 7, scratches, foreign matter, surface shapes due to processing shapes, etc. having a different depth and height from the uneven portion 7b are conspicuously observed. While making the flat portion 7a and the uneven portion 7b inconspicuous, scratches, foreign matter, surface shapes due to processing shapes, etc. of the observation target 7 can be made conspicuous and easily observed. In other words, the flat portion 7a and the uneven portion 7b of the observation target 7 are made difficult to observe, and the surface shape other than the flat portion 7a and the uneven portion 7b is made easy to observe. Even if the observation target 7 has a pattern or the like, it is easy to detect the presence of scratches or foreign matter and to measure the dimensions of the processed shape.

[0051] By making the flat portion 7a and the uneven portion 7b less noticeable, it is possible to easily process and analyze the image of the observed object 7 without information on the flat portion 7a and the uneven portion 7b of the observed object 7. This makes it easy to detect the presence of scratches, foreign matter, etc. on the observed object 7 and to easily measure the dimensions due to the processed shape.

[0052] In the observation device 20, the magnification of the optical system 30 is 2.5 times or more. When an observation device 20 with a sufficiently high magnification is used, the uneven portion 7b of the observation target 7 is prominently observed. The observation device 20 with a sufficiently high magnification has a particularly prominent effect of making the surface shape of the observation target 7 due to scratches, foreign matter, processed shape, etc. prominent while making the flat portion 7a and the uneven portion 7b less prominent.

[0053] The ratio between the intensity of the light irradiated by the first lighting device 60 and the intensity of the light irradiated by the second lighting device 70 is adjustable. The control device 13 can control the ratio between the intensity of the light irradiated by the first lighting device 60 and the intensity of the light irradiated by the second lighting device 70. The unevenness in the brightness of the observation target 7 observed by the observation device 20 can be reduced. In other words, the light reflected by the observation target 7 can be made closer to uniform. The effects of the flat portion 7a and the uneven portion 7b of the observation target 7 can be reduced. While making the flat portion 7a and the uneven portion 7b of the observation target 7 less noticeable, scratches, foreign matter, surface shapes due to processing shapes, etc. of the observation target 7 are made more noticeable, making it easier to observe.

[0054] The second illumination device 70 is disposed between the objective lens 31 and the observation target 7. Since the second illumination device 70 is closer to the observation target 7 than the objective lens 31, the second illumination device 70 can irradiate the observation target 7 with light from a direction greatly inclined with respect to the optical axis direction LA of the objective lens 31. By irradiating light in this manner, even if the observation target 7 has an uneven portion 7b, it is possible to increase the amount of light reflected in the optical axis direction LA of the objective lens 31 by the uneven portion 7b. The flat portion 7a and the uneven portion 7b are made less noticeable, making it possible to easily observe the surface shape of the observation target 7.

[0055] The length between the second illumination device 70 and the observation target 7 is 20 mm or less. Since the second illumination device 70 is sufficiently close to the observation target 7, the second illumination device 70 can irradiate the observation target 7 with light from a direction that is more inclined with respect to the optical axis direction LA of the objective lens 31. By irradiating light in this manner, even if the observation target 7 has an uneven portion 7b, more light can be reflected in the optical axis direction LA of the objective lens 31 by the uneven portion 7b. By making the flat portion 7a and the uneven portion 7b less noticeable, the surface shape of the observation target 7 can be more easily observed.

[0056] The length between the second illumination device 70 and the observation target 7 is adjustable. By adjusting the length between the second illumination device 70 and the observation target 7, the angle of the light irradiated by the second illumination device 70 to the observation target 7 is adjusted. Since the length between the second illumination device 70 and the observation target 7 is short, the angle of the light irradiated by the second illumination device 70 to the observation target 7 can be significantly changed by changing the length between the second illumination device 70 and the observation target 7. Even if the observation target 7 has an uneven portion 7b, the light reflected in the optical axis direction LA of the objective lens 31 at the uneven portion 7b can be adjusted. The flat portion 7a and the uneven portion 7b can be made less noticeable, and the surface shape of the observation target 7 can be adjusted to be more easily observed.

[0057] The angle of light that the second illumination device 70 irradiates onto the observation target 7 is adjustable. Even if the observation target 7 has an uneven portion 7b, the light reflected by the uneven portion 7b in the optical axis direction LA of the objective lens 31 can be adjusted. This can be adjusted to make the flat portion 7a and the uneven portion 7b less noticeable, making it easier to observe the surface shape of the observation target 7.

[0058] The visible light reflectance of the observation target 7 is 20% or more. Since the visible light reflectance of the observation target 7 is sufficiently high, the light reflected by the observation target 7 can be easily observed. The observation target 7 can be observed brightly.

[0059] The surface roughness of the observation target 7 is 0.2 or more and 2.0 or less. Since the surface roughness of the observation target 7 is sufficiently high, the light irradiated from the first illumination device 60 is less likely to be reflected in the optical axis direction LA of the objective lens 31 at the uneven portion 7b of the observation target 7, and the light irradiated from the second illumination device 70 is more likely to be reflected in the optical axis direction LA of the objective lens 31 at the uneven portion 7b of the observation target 7. Since the surface roughness of the observation target 7 is sufficiently high, the influence of the flat portion 7a and the uneven portion 7b of the observation target 7 can be further reduced by irradiating the observation target 7 with light from the first illumination device 60 and the second illumination device 70. By making the flat portion 7a and the uneven portion 7b less noticeable, the effect of easily observing the surface shape of the observation target 7 can be more significantly achieved. Since the surface roughness of the observation target 7 is not too large, the uneven portion 7b of the observation target 7 is not too little reflected in the optical axis direction LA of the objective lens 31, and the light irradiated from the second illumination device 70 is not too much reflected in the optical axis direction LA of the objective lens 31 by the uneven portion 7b of the observation target 7. By irradiating the observation target 7 with light from the first illumination device 60 and the second illumination device 70, the flat portion 7a and the uneven portion 7b can be appropriately made inconspicuous. The surface shape of the observation target 7 due to scratches, foreign matter, processed shape, etc. can be easily observed by making them stand out.

[0060] The observation target 7 includes a metal. The observation target 7 including a metal can have a high visible light reflectance. The observation target 7 including a metal is likely to specularly reflect light. Since the observation target 7 including a metal is likely to have uneven parts 7b due to a pattern on the surface, when the observation target 7 including a metal is observed using the observation device 20, the effect of making the surface shape of the observation target 7 due to scratches, foreign matter, processed shapes, etc. stand out while making the flat parts 7a and uneven parts 7b less noticeable is particularly prominent.

[0061] The observation device 20 of the present embodiment is an observation device for observing an observation target 7, and includes an optical system 30 having an objective lens 31 facing the observation target 7, a first illumination device 60 for irradiating the observation target 7 with light from the optical axis direction LA of the objective lens 31, and a second illumination device 70 for irradiating the observation target 7 with light from a plurality of directions inclined with respect to the optical axis direction LA of the objective lens 31. According to the observation device 20 of the present embodiment, by irradiating the observation target 7 with light from the first illumination device 60 and the second illumination device 70, the influence of the flat portion 7a and the uneven portion 7b of the observation target 7 can be reduced, and the light can be reflected by the observation target 7. A surface shape due to scratches, foreign matter, processed shape, etc. having a depth or height different from the uneven portion 7b is conspicuously observed. Even if the observation target 7 has the uneven portion 7b, the surface shape due to scratches, foreign matter, processed shape, etc. of the observation target 7 can be easily observed.

[0062] Without being limited to the above-described embodiment, the observation system 10 and the observation device 20 may be used as an inspection device or a measurement device independent of the manufacturing device 1. [Explanation of symbols]

[0063] 1 Manufacturing equipment 3 Front-end processing section 5 Post-processing department 7. Observation Object 7a Flat area 7b Uneven part 10 Observation System 11 Imaging device 13 Control device 15 Display device 20 Observation Equipment 30 Optical system 31 Objective Lens 40 Telescope tube 60 First lighting device 61 1st light source 65 Half Mirror 70 Second lighting device 71 Second light source 75 Reflector LA Optical axis

Claims

1. An observation device for observing an observation target, comprising: an optical system having an objective lens facing the object to be observed; a first illumination device that irradiates the observation object with light from an optical axis direction of the objective lens; a second illumination device that irradiates the object to be observed with light from a plurality of directions inclined with respect to the optical axis direction of the objective lens.

2. 2. The observation device according to claim 1, wherein the magnification of the optical system is 2.5 times or more.

3. 2. The observation device according to claim 1, wherein a ratio between an intensity of light emitted by the first illumination device and an intensity of light emitted by the second illumination device is adjustable.

4. The observation device according to claim 1 , wherein the second illumination device is disposed between the objective lens and the observation target.

5. The observation device according to claim 4 , wherein the length between the second illumination device and the observation target is 20 mm or less.

6. The observation device according to claim 4 , wherein a length between the second illumination device and the observation target is adjustable.

7. The observation device according to claim 1 , wherein an angle of the light that the second illumination device irradiates onto the observation target is adjustable.

8. The observation device according to claim 1 , wherein the visible light reflectance of the observation target is 20% or more.

9. The observation device according to claim 1 , wherein the surface roughness of the object to be observed is not less than 0.2 and not more than 2.

0.

10. The observation device according to claim 1 , wherein the observation target includes a metal.

11. The observation device according to claim 1 ; an imaging device that captures an image observed by the observation device.

12. The observation system according to claim 11, further comprising a control device that controls the ratio between the intensity of light emitted by the first lighting device and the intensity of light emitted by the second lighting device so as to reduce unevenness in brightness acquired for each pixel of the imaging device.

13. A manufacturing apparatus comprising the observation device according to claim 1.

14. An observation method comprising an observation step of irradiating an observation object with light from an optical axis direction of an objective lens and observing the observation object through an optical system having the objective lens while irradiating the observation object with light from a plurality of directions tilted with respect to the optical axis direction of the objective lens.

15. an adjustment step of adjusting a ratio between an intensity of light irradiated onto the observation target from an optical axis direction of the objective lens and an intensity of light irradiated onto the observation target from a plurality of directions inclined with respect to the optical axis direction of the objective lens so as to reduce unevenness in observed brightness; The observation method according to claim 14 , further comprising a second observation step of observing the observation target again through the optical system.

16. The observation method according to claim 15 , wherein the adjusting step is automatically controlled.

17. The observation method according to claim 14 , further comprising an imaging step of capturing an image observed by the observation method.

18. A manufacturing process for producing an article; A manufacturing method comprising: an observation step of observing the article as an observation target by the observation method according to claim 14.

Images