Reaction vessel including reaction chamber slide sledge and for epitaxially depositing semiconductor material on base material
Patent Information
- Application Number
- JP2024156585
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2023-09-13
- Filing Date
- 2024-09-10
- Publication Date
- 2025-03-26
Smart Images
Figure 2025041560000001_ABST
Abstract
Description
[Technical field]
[0001] Described herein is a reactor for epitaxial deposition of semiconductor material on a substrate, or simply an "epitaxial reactor."
[0002] Specifically, the semiconductor material deposited is silicon carbide.
[0003] The substrate on which the deposition is carried out is also typically made of silicon carbide, although other materials cannot be excluded. [Background technology]
[0004] Reactors for the epitaxial deposition of silicon carbide have been known for some time.
[0005] For example, in 2002, the applicant filed two international patent applications relating to such a reactor, which were published as WO 2004 / 053187A1 and WO 2004 / 053188A1. The applicant then first filed an international patent application relating to a possible reaction chamber for such a reactor, which was published as WO 2015 / 092525A1, and then filed an international patent application relating to a possible process for such a reactor, which was published as WO 2022 / 053963A1.
[0006] The reactors according to WO 2004 / 053187 A1 and WO 2004 / 053188 A1 have an architecture including a reaction chamber extending along a longitudinal axis, an insulation also extending along the same longitudinal axis, and a tube made of quartz (or a similar material) also extending along the same longitudinal axis, the insulation laterally surrounding the chamber, and the tube laterally surrounding the insulation. The cross sections of the chamber, the insulation and the tube are substantially circular, elliptical or polygonal or rectangular in shape, typically, but not necessarily, the cross sections of these three elements are of the same shape. The chamber and the insulation typically consist of several parts joined together, e.g., fixed to each other.
[0007] One important aspect for any operating machine is its maintenance over time, so that it is not only fully operational and has excellent performance at all times, but also has the possibility to carry out relatively simple and therefore relatively cost-effective maintenance.
[0008] Typically, maintenance is of the periodic and / or predictive type.
[0009] This aspect is also very important for epitaxial reactors.
[0010] In this case, maintenance is particularly important for the reaction chamber and other components of the reactor, which are subject to contamination, in particular contamination resulting from mistargeted deposition of semiconductor material, and / or to wear, in particular deterioration of their surfaces as a result of repeated deposition processes. Summary of the Invention [Problem to be solved by the invention]
[0011] It is therefore desirable to facilitate the maintenance of reactors for epitaxial deposition of semiconductor materials on substrates in general, and reactors having the same or similar architecture as disclosed above in particular. [Means for solving the problem]
[0012] An embodiment of the reactor that is particularly suitable for maintenance comprises at least one reaction chamber extending along a longitudinal direction, a sledge adapted to support the reaction chamber or a portion of the reaction chamber, and a tube extending along the longitudinal direction and adapted to accommodate the reaction chamber and the sledge supporting the reaction chamber; the sledge adapted to slide along the longitudinal direction to extract / insert the reaction chamber from / into the tube when the reactor is in a non-operational state. The reactor is in a non-operational state when no deposition process is ongoing therein and when the reaction chamber is at a low temperature, i.e., at a temperature much lower than the process temperature, for example, at room temperature (below 30° C.) or at a temperature slightly above room temperature (below 50° C.).
[0013] BRIEF DESCRIPTION OF THE DRAWINGS Reactors that are particularly suited for maintenance will become more apparent from the following detailed description considered in conjunction with the accompanying drawings. [Brief description of the drawings]
[0014] [Figure 1] FIG. 1 shows a simplified schematic diagram of one embodiment of a reactor for epitaxial deposition of semiconductor material on a substrate. [Diagram 2] FIG. 2 shows a simplified schematic diagram of a first embodiment of a chamber assembly. [Figure 3A] FIG. 3 shows three different views of the chamber assembly of FIG. 2 in three different positions. [Figure 3B] FIG. 3 shows three different views of the chamber assembly of FIG. 2 in three different positions. [Figure 3C] FIG. 3 shows three different views of the chamber assembly of FIG. 2 in three different positions. [Figure 4] FIG. 4 shows a simplified schematic diagram of a second embodiment of a chamber assembly. [Figure 5A]FIG. 5 shows three different views of the chamber assembly of FIG. 4 in three different positions. [Figure 5B] FIG. 5 shows three different views of the chamber assembly of FIG. 4 in three different positions. [Figure 5C] FIG. 5 shows three different views of the chamber assembly of FIG. 4 in three different positions. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0015] As can be easily understood, there are various ways of practically making a reactor particularly suitable for maintenance, which are defined in their main advantageous aspects in the appended claims and are not limited by the following detailed description, nor by the accompanying drawings.
[0016] It is specified that the technical features presented below in relation to certain embodiments are not considered to be closely related to each other and therefore cannot be considered to be mutually coupled.
[0017] FIG. 1 shows, by way of non-limiting example, the architecture of an embodiment of a reactor 1000 for epitaxial deposition of a semiconductor material, in particular and advantageously silicon carbide, onto a substrate, in particular and advantageously onto silicon carbide.
[0018] The reactor 1000 comprises a chamber assembly 200, a set of components upstream of the assembly 200 (see, e.g., reference numbers 300, 400, and 500 in the figures), and a set of components downstream of the assembly 200 (see, e.g., reference number 600 in the figures); the terms "upstream" and "downstream" refer to positions in terms of gas flow within the reactor relative to the chamber assembly 200. The upstream and downstream assemblies are described below.
[0019] The chamber assembly 200 is part of the reactor 1000 where epitaxial deposition on a substrate takes place, specifically, inside the chamber 200 there is a "reaction and deposition zone". Process gases enter the assembly 200 from the assembly upstream (see arrow F1), specifically, the process gases enter the "reaction and deposition zone". Exhaust gases exit the assembly 200 towards the assembly downstream (see arrow F2), specifically, the exhaust gases leave the "reaction and deposition zone". Generally, as is known, both the process gases and the exhaust gases contain a carrier gas, for example, hydrogen or helium or argon, or a mixture of two or more of these substances.
[0020] 1 does not show the details of the assembly 200, emphasizing only its axis X and its longitudinal extension L. The axis X may be a substantial axis of symmetry of the assembly 200. The direction L is not only an extension of the longitudinal extension, but also the direction by which the gas flow is substantially conducted through the assembly.
[0021] Two embodiments of the assembly 200 (slightly different) are shown in FIGS. 2 and 4, respectively, and are designated by the reference numerals 200' and 200'', respectively.
[0022] It should be noted that the architecture of the reactor 1000 is also suitable for chamber assemblies other than the assembly 200' of FIG. 2 and the assembly 200'' of FIG.
[0023] It should also be noted that the embodiment of assembly 200 shown in FIGS. 2 and 4 may be inserted into reactors other than that shown in FIG.
[0024] The reactor 1000 comprises a reaction chamber, a sledge, a tube, and typically also insulation; these three or four components are part of the chamber assembly 200.
[0025] Specifically, with reference to FIGS. 2 and 4, the assembly 200′ / 200″ includes: a reaction chamber 210 extending along a longitudinal axis L; a sledge 220 adapted to support the reaction chamber 210 (either directly, as shown in FIG. 2, or indirectly, as shown in FIG. 4); a tube 230 extending along a longitudinal axis L and adapted to accommodate at least the reaction chamber 210 and the sledge 220.
[0026] The sledge 220 is adapted to slide along the longitudinal direction L to extract / insert at least the reaction chamber 210 from / into the tube 230 when the reactor is in an inoperative state, particularly when it is in an inoperative state for maintenance operations.
[0027] 4 shows insulation 240 extending along the longitudinal axis L and disposed about the reaction chamber 210 to surround and insulate the reaction chamber 210. The insulation 240 encases, i.e. completely, i.e. both radially and axially, the chamber 210.
[0028] It should be noted that Figure 2 does not show insulation. If the maximum temperature reached by the reaction chamber during the process is low, i.e., the temperature can be tolerated by the sledge supporting the reaction chamber, insulation can be omitted. Alternatively, the insulation can be small, i.e., located only between the reaction chamber and the sledge supporting the reaction chamber.
[0029] The embodiment of Figure 4 differs essentially from that of Figure 2 in that the sledge 210 is also adapted to support the encasing insulation 240. Thus, as the sledge slides, not only the entire reaction chamber 210 but also the entire encasing insulation 240 is withdrawn / inserted into the tube 230.
[0030] 3A shows the assembly 200' (of FIG. 2) in a first state in which the chamber 210 is completely inside the tube 230. The sledge 220 is also completely inside the tube 230.
[0031] 3B shows the assembly 200' (of FIG. 2) in a second state in which the chamber 210 is partially inside and partially outside the tube 230. The sledge 220 is also partially inside and partially outside the tube 230.
[0032] 3C shows the assembly 200'' (of FIG. 2) in a third state in which the chamber 210 is completely outside the tube 230. The sledge 220 is almost completely outside the tube 230.
[0033] 5A shows the assembly 200'' (of FIG. 4) in a first state in which the chamber 210 and insulation 240 are completely inside the tube 230. The sledge 220 is also completely inside the tube 230.
[0034] 5B shows the assembly 200″ (of FIG. 4) in a second state in which the chamber 210 and insulation 240 are partially inside and partially outside the tube 230. The sledge 220 is also partially inside and partially outside the tube 230.
[0035] 5C shows the assembly 200' (of FIG. 4) in a third condition in which the chamber 210 and insulation 240 are completely outside the tube 230. The sledge 220 is almost completely outside the tube 230.
[0036] When the chamber 210 and possibly the insulation 240 are outside, particularly completely outside, the tube 230, they can be subjected to inspection and maintenance. For example, they can be first opened and then closed again. For example, one or more parts can be replaced or cleaned or repaired.
[0037] The sledge can be adapted to support the entire chamber or only a portion of the chamber, in this second case the sledge can be adapted to extract / insert such portion of the chamber out of / into the tube.
[0038] The sledge can be adapted to support the entire insulation or only a portion of the insulation, in this second case the sledge can be adapted to pull / insert such portion of the insulation out of / into the pipe.
[0039] The cross-section of the reaction chamber can have a substantially circular or elliptical or polygonal or rectangular outer shape.
[0040] The cross-section of the insulation may have an external and / or external shape that is substantially circular or elliptical or polygonal or rectangular.
[0041] The cross-section of the tube may have a substantially circular or elliptical or polygonal or rectangular internal and / or external shape.
[0042] The above shapes can be the same or different. Typically, the outer shape of the reaction chamber corresponds to the inner shape of the insulation. Typically, the outer shape of the insulation corresponds to the inner shape of the tube.
[0043] Advantageously, the sledge is cradle-shaped, i.e. it comprises a portion adapted to receive a portion of the reaction chamber and / or a portion of the thermal insulation. Such portions may include the lower wall and, advantageously, a front wall (e.g. a flat sheet) at a first longitudinal end zone of the lower wall and / or a rear wall (e.g. a flat sheet) at a second longitudinal end zone of the lower wall. The cross section of the lower wall may be in the shape of an arc of a circle, or an arc of an ellipse, or a broken line.
[0044] The reaction chamber is typically made of (compacted) graphite so that it is heated by electrical induction. It typically consists of several parts bonded together, e.g. fastened to each other.
[0045] Insulation is typically made of graphite (porous or fibrous). It typically consists of several pieces bonded together, e.g., fastened to one another.
[0046] It may be generally stated that the tube is typically made of quartz.
[0047] According to some embodiments (the most typical ones), the tube consists of only a single tubular element made of quartz.
[0048] According to another embodiment, the tube can be made up of two tubular elements, one made of quartz (external) and one made of graphite (porous or fibrous) (internal). The two tubular elements can be constrained to each other.
[0049] For sliding the sledge back and forth, there are essentially three possible cases: A) the sledge is fully resting (particularly both in its first end zone and in its second end zone), B) the sledge is fully suspended (particularly both in its first end zone and in its second end zone), C) the sledge is resting in its first end zone (particularly the rear zone) and suspended in its second end zone (particularly the rear zone). The terms "rear" and "forward" refer to the gas flow in the reactor, and when flowing, the gas first contacts the "front" of the chamber and then the "rear" of the chamber.
[0050] Typically, the cradle rests on the inside wall of the tube.
[0051] The embodiments of figures 2 and 4 correspond to case C, specifically the case where the sledge is placed in its rear zone (on the left in all figures 1 to 5) and suspended in its front end zone (on the right in all figures 1 to 5). In particular, the rear zone is close to the zone of the chamber where the gas exits and the front zone is close to the zone where the gas enters.
[0052] In the embodiment of Figures 2 and 4, the sledge 220 comprises at least one pad 222 that rests directly on the inner surface of the tube 230 and that is advantageously adapted to slide on this inner surface, for example by quartz-on-quartz contact. Advantageously, the pad 222 is located in a first end zone of the sledge 220, in particular in its rear end zone. In Figures 3C and 5C, the sledge 220 is almost completely outside the tube 230, but the pad 222 remains resting on it and therefore inside it.
[0053] In the embodiment of Figures 2 and 4 (and as highlighted by these figures), the sledge 220 is suspended in a second end zone of the sledge 220, specifically in its front zone.
[0054] According to the embodiment of figures 2 and 4, the sledge also remains inside the tube during normal operation of the reactor, and in particular during the epitaxial deposition process. This solution is advantageous, since it makes the reactor simpler from a constructional point of view. Obviously, in this case the sledge must be made of a material that is resistant to high temperatures, in particular the process temperatures.
[0055] The method of obtaining the suspension of the sledge with everything resting thereon is described below.
[0056] Also explained below is how to move the sledge when it is fully loaded.
[0057] The reactor 1000 of the embodiment of FIG. 1 also comprises a moving assembly 250 (also visible in FIGS. 2 and 4, but not in FIGS. 3 and 5) located substantially outside the tube 230. The sledge 220 is restrained to the assembly 250. Such restraint can allow the assembly 250 to push and pull, and thus move, at least the sledge 210 supporting the reaction chamber 210. Such restraint can allow the assembly 250 to keep the sledge 210 suspended. Such restraint can allow both; in particular, that the assembly 250 comprises an arm 252 (also visible in FIGS. 2 and 4, but not in FIGS. 3 and 5) configured to restrain and support the sledge 220 at its front end zone; alternatively, but less advantageously, the sledge can be provided with an arm adapted to be fixed to the moving assembly.
[0058] 1, the assembly 250 typically comprises a plate made of a metal material of a rather large size and that can be arranged transversely to the axis X of the chamber 210, is movable and the assembly 250 is always outside the tube 230 in any state of the reactor 1000, whereas the arm 252 can be partially inside the tube 230 restrained to the sledge 220. The plate can be considered as the body of the assembly 250.
[0059] As expected and shown diagrammatically in Figure 1 by arrows F1 and F2, process gases enter the chamber assembly 200 (on the right in Figure 1), specifically the reaction chamber 210 (specifically its "reaction and deposition zone"), and exhaust gases exit the assembly 200 (on the left in Figure 1), specifically the reaction chamber 210 (specifically its "reaction and deposition zone"). It cannot be excluded that other fluids, gases, and / or liquids can enter and / or exit the chamber assembly 200 for other purposes, e.g., cooling.
[0060] Important, advantageous, but not strictly necessary, components of an epitaxial reactor upstream of the chamber assembly will now be described with the non-limiting aid of FIG.
[0061] The reactor 1000 also comprises an external track 300 on the outside (typically completely outside) of the tube 230. The movement assembly 250 comprises skids 254 adapted to slide, typically back and forth, along the track 300. The skids 254 are typically fixed to the body of the assembly 250, specifically fixed to a plate. The skids 254 are advantageously associated with a motor, specifically an electric motor, so that the movement of the assembly 250 is motorized and can be precisely controlled.
[0062] The body of the assembly is constrained to the sledge so that when the body moves it either pushes or pulls the sledge depending on the direction of movement and therefore moves at least the reaction chamber.
[0063] Advantageously, the function of the assembly 250 is not limited to the movement of the reaction chamber: in particular, the assembly 250 can comprise at least a connection 256 for connection with ducts for the process gases, in particular the precursor gases and the carrier gas.
[0064] The reactor 1000 may also include a guide assembly 400 adapted to convey process gases to the reaction chamber 210. The guide assembly 400 may be fluidly coupled to the connection 256 of the assembly 250.
[0065] 1, assembly 400 is fixed to the body of assembly 250 and therefore moves integrally therewith. Advantageously, a spring (or several springs) can be provided which compresses when assembly 400 moving towards the tube reaches an end stop and reduces the compressive force as the assembly moves away from the tube.
[0066] 1, it is noted that process gas advantageously flows into assembly 400 transverse to longitudinal direction L and advantageously flows out of assembly 400 parallel to longitudinal direction L. In this manner, i.e., the "L" shaped configuration can be used to reduce the longitudinal size of assembly 400.
[0067] 1, connector 256 is configured roughly like an upside-down "U," which, among other things, makes the "L" shaped configuration of assembly 400 simpler to install.
[0068] 1, the reactor 1000 advantageously also comprises a flexible chain 510 housing at least a flexible duct 520 for the process gas therein. The flexible duct 520 is fluidly connected to the connection 256 of the assembly 250.
[0069] The flexible chain 510 is adapted to flex against the sliding of the skids 254 such that the fluid connection between the duct 520 and the connection 256 is maintained regardless of the position of the assembly 250 .
[0070] The fluid connection between the reaction chamber 210 and the guide assembly 400 can consist of one or more pieces (not shown in FIG. 1 ) of various materials. The assembly 400 can include a portion further from the reaction chamber 210, which can be called the “liner”, and a portion closer to the reaction chamber 210, which can be called the “transition piece”; the further portion is typically made of quartz; the closer portion can be made of bare graphite or coated graphite (e.g., coated with silicon carbide) or silicon carbide; the “transition piece” functions to avoid “thermal breaks” between the chamber and the “liner” and to avoid (or at least limit) off-target deposition on the “liner”.
[0071] In the zone in which the assembly 440 is located, one or more heat shields are also advantageously located (not shown in FIG. 1).
[0072] Important, advantageous, but not strictly necessary, components of the epitaxial reactor downstream of the chamber assembly will now be described with the non-limiting aid of FIG.
[0073] All of these components correspond to exhaust assembly 600 as shown in Figure 1, but are additional components to those shown in Figure 1. Furthermore, it should be apparent that Figure 1 is a schematic drawing, and thus the relative dimensions, both vertical and horizontal, are not critical.
[0074] Such an assembly has the main function of exhausting exhaust gases leaving the reaction chamber 210 of the chamber assembly 200, specifically from the "reaction and deposition zone". Advantageously, a second function of such an assembly is to allow the loading into the reaction chamber 210 of substrates still waiting to undergo epitaxial deposition, and the unloading from the reaction chamber 210 of substrates that have already been subjected to epitaxial deposition.
[0075] The discharge assembly 600 includes an outlet drum 620 fluidly connected to the outlet of the reaction chamber 210. For example, the drum 620 can have a cross-section that is substantially circular, elliptical, polygonal, or rectangular in shape.
[0076] Advantageously, the outlet drum 620 is configured such that exhaust gases enter the drum axially or substantially axially (see black arrow F3 in FIG. 1 ) and exit the drum radially or substantially radially (see black arrow F4 in FIG. 1 ). In the embodiment of FIG. 1 , the exit of the exhaust gases is from a first side of the outlet drum, specifically the underside (see black arrow F4 in FIG. 1 ), where for example the underside means a portion of the downwardly facing side, e.g. between 60° and 90°, if the cross section of the drum is circular (i.e. the drum is cylindrical).
[0077] The longitudinal dimension of the reactor is therefore reduced. Furthermore, the movement of the substrate (for loading and unloading) is therefore facilitated. Finally, as will be better explained below, the maintenance of the discharge zone of the reactor is therefore facilitated. Thus, there are three advantageous reasons for configuring the exit drum as diagrammed in FIG. 1.
[0078] The fluid connection between the reaction chamber 210 and the outlet drum 620 can be obtained thanks to a connection assembly 610 that guides the exhaust gases. It can be formed by one or more pieces of different materials. In the assembly 610, for example, there can be a so-called "protective ring" (or two or more connected to the assembly) that has the purpose of thermally distancing and isolating the chamber from the drum; for example, this makes it possible to avoid (or at least limit) thermal damage to any gaskets (such as "O-rings") of the drum; the "protective ring" can consist of a tubular element made of bare or coated graphite (for example coated with silicon carbide) or silicon carbide. In addition to such a "protective ring", there can also be a tubular element made of quartz, for example.
[0079] Advantageously, the exit drum 620 is configured such that a substrate can be moved across it from a first side 621 to a second side 622 for loading the substrate into the reaction chamber (see the open arrow pointing to the right in FIG. 1 ), or from the second side 622 to the first side 621 for unloading the substrate from the reaction chamber (see the open arrow pointing to the left in FIG. 1 ). FIG. 1 diagrammatically shows a so-called "gate valve" 625 adapted to open to allow passage of a substrate and close to seal the exit drum 620; the gate valve 625 is on a side 621 of the drum 620 opposite a side 622 at which the drum communicates with the assembly 200, and in particular with the reaction chamber 210.
[0080] It should be noted that the substrates are typically carried on substrate holders, and therefore both the exit drum 620, specifically its gate valve 625, and the connection assembly 610 are advantageously dimensioned to allow passage of the substrate holder and associated handling devices.
[0081] Advantageously, the outlet drum 620 has at least one hatch on the side of the drum opposite the radial outlet of the gas, which allows access to the interior of the drum and replacement of internal reactor parts located in the discharge zone of the reactor. In the embodiment of FIG. 1, the second side of the outlet drum may be located, in particular on the upper side, and for example, if the cross section of the drum is circular (i.e., the drum is cylindrical), the "upper side" may mean a portion of the side facing upwards, for example 60° to 90°.
[0082] It should be noted that the descriptions provided with respect to the upstream components of the chamber assembly and the descriptions provided with respect to the downstream components of the chamber assembly are not strictly related to each other, or even to the descriptions provided with respect to the chamber assemblies of Figures 2 and 4. [Explanation of symbols]
[0083] 200, 200' / 200'' Assembly 210 Reaction Chamber 220 Sledge 222 Pad 230 tube 240 Insulation 250 Moving Assembly 252 Arm 254 Sliding material 256 connections 300 orbits 400 Guide Assembly 510 Flexible Chain 520 Flexible Duct 600 Discharge Assembly 620 Exit drum
Claims
1. 1. A reactor for epitaxial deposition of semiconductor material onto a substrate, comprising: A reaction chamber (210) extending along a longitudinal axis (L); a sledge (220) adapted to support the reaction chamber (210) or a portion of the reaction chamber; a tube (230) extending along the longitudinal direction (L) and adapted to receive the reaction chamber (210) and the sledge (220) supporting the reaction chamber (210); The sledge (220) is adapted to slide along the longitudinal direction (L) so that the reaction chamber (210) can be extracted / inserted into the tube (230) when the reactor is in an inoperative state.
2. the reactor also comprises insulation (240) extending along the longitudinal axis (L) and disposed around the reaction chamber (210); the sledge (220) is adapted to support the insulation (240) or a portion of the insulation; 2. The reactor of claim 1.
3. the sledge (220) is placed on the inner surface of the tube (230) and in particular comprises at least one pad (222) adapted to slide over said inner surface, 2. The reactor of claim 1.
4. The pad (222) is located in a first end zone of the sledge (220), The reactor of claim 3.
5. the reactor also includes a transfer assembly (250) positioned outside the tube (230); the sledge (220) is constrained to the moving assembly (250); and the translation assembly (250) is adapted to pull and push the sledge (210) that supports at least the reaction chamber (210); 2. The reactor of claim 1.
6. the moving assembly (250) comprises an arm (252) configured to restrain and support the sledge (220) at a second end zone of the sledge (220); The reactor of claim 5.
7. the reactor also comprises a raceway (300) external to the tube (230); the moving assembly (250) includes skids (254); and The skid (254) is adapted to slide along the track (300). The reactor of claim 5.
8. the transfer assembly (250) comprises at least a connection (256) for a process gas duct; The reactor of claim 7.
9. the reactor also comprises a guide assembly (400) for supplying process gas to the reaction chamber (210); the guide assembly (400) is fluidly coupled to the connection portion (256) of the translation assembly (250); 9. The reactor of claim 8.
10. the reactor also comprises a flexible chain (510) containing therein at least a flexible duct (520) for a process gas, the flexible duct (520) is fluidly connected to the connection (256) of the moving assembly (250); 9. The reactor of claim 8.
11. the flexible chain (510) is adapted to bend in relation to the sliding of the skids (254); The reactor of claim 10.
12. the reactor also comprises an exhaust assembly (600) for exhausting exhaust gases; the discharge assembly (600) comprising an outlet drum (620) fluidly connected to an outlet of the reaction chamber (210); and the discharge assembly (600) is configured such that a substrate may traverse the exit drum (620) from a first side to a second side or from the second side to the first side; The reactor according to any one of claims 1 to 11.
13. the outlet drum (620) is configured such that exhaust gas enters the outlet drum in an axial direction and exits the outlet drum in an axial direction.
13. The reactor of claim 12.