Display device
By integrating the light guide plate and light emission and light receiving elements in the display device, the detection and conversion of visible and infrared light is achieved, and the problem of difficulty in realizing light detection and biometric authentication of existing equipment is solved, and the multifunctionality and health status management of the equipment is realized.
Patent Information
- Application Number
- JP2025010481
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2019-04-12
- Filing Date
- 2025-01-24
- Publication Date
- 2025-04-15
- Estimated Expiration
- Not applicable · inactive patent
AI Technical Summary
It is difficult for existing display devices to implement integrated light detection functions and biometric authentication functions, and it is difficult to efficiently manage the health status of users.
Using a display device including the first and second light emitting elements and light receiving elements, the detection and conversion of visible light and infrared light is realized through the cooperation of the light emitting elements and light receiving elements on the light guide plate and the light guide plate, supporting fingerprint and vascular biometric authentication, and obtaining user health information through analysis of the light signal.
The integration of the light detection function and biometric authentication function of the display device is realized, which improves the versatility and user experience of the device, and can efficiently manage the health status of users.
Smart Images

Figure 2025063300000001_ABST
Abstract
Description
[Technical field]
[0001] One aspect of the present invention relates to a display device. One aspect of the present invention relates to a display device having an authentication function. One aspect of the present invention relates to a touch panel. One aspect of the present invention relates to a system including a display device. do.
[0002] Note that one embodiment of the present invention is not limited to the above technical fields. The technical field of one embodiment of the present invention is a semiconductor device, a display device, a light-emitting device, a power storage device, a storage device, and a , electronic devices, lighting devices, input devices (e.g., touch sensors, etc.), input / output devices (e.g., touch panel, their driving method, or their manufacturing method. The term "semiconductor device" refers to any device that can function by utilizing semiconductor characteristics. [Background technology]
[0003] In recent years, display devices are expected to be used in a variety of applications. For example, the use of large display devices Applications include home television equipment (also called television or television receivers), Digital Signage, PID (Public Identification Number) In addition, mobile information terminals (PDAs) As a result, the development of smartphones and tablet devices equipped with touch panels is underway. .
[0004] As a display device, for example, a light-emitting device having a light-emitting element has been developed. Utilizing the luminescence (electroluminescence, hereafter referred to as EL) phenomenon The light-emitting element (also referred to as EL element) used is easy to make thin and lightweight, and has high speed response to input signals. and can be driven by a low-voltage DC power supply. For example, Patent Document 1 describes a flexible light-emitting device to which an organic EL element is applied. An optical device is disclosed. [Prior art documents] [Patent documents]
[0005] [Patent Document 1] JP 2014-197522 A Summary of the Invention [Problem to be solved by the invention]
[0006] An object of one embodiment of the present invention is to provide a display device having a light detection function. Another object of the present invention is to provide a display device having a biometric authentication function, such as fingerprint authentication. Alternatively, a display device that has both a touch panel function and a biometric authentication function may be provided. Another object of the present invention is to provide a highly convenient display device. Another object of the present invention is to provide a multi-function display device. It is an object of the present invention to provide a display device having a structure.
[0007] Another aspect of the present invention provides a display device having a function of acquiring a health condition of a user. Another object of the present invention is to provide a display device capable of managing the health of a user. One of our goals is to provide
[0008] The description of these problems does not preclude the existence of other problems. It is not necessary for one embodiment to solve all of these problems. The subject matter can be extracted from descriptions in the specification, drawings, claims, etc. [Means for solving the problem]
[0009] One aspect of the present invention is a liquid crystal display comprising a first substrate, a light guide plate, a first light emitting element, and a second light emitting element, The display device has a light receiving element. The first substrate and the light guide plate are provided opposite to each other. The first light emitting element and the light receiving element are provided between the first substrate and the light guide plate. The optical element has a function of emitting a first light through the light guide plate. The light receiving element receives the first light and converts it into electricity. The sensor has a function of converting the first light into an optical signal, and a function of receiving the second light and converting it into an electrical signal. In addition, the first light includes visible light, and the second light includes infrared light.
[0010] Another aspect of the present invention is a liquid crystal display device including a first substrate, a second substrate, a light guide plate, and a first light emitting element. The display device has a first substrate, a second light emitting element, and a light receiving element. The first light emitting element and the light receiving element are disposed opposite each other with the second substrate interposed therebetween. The first light emitting element is disposed between the first substrate and the second substrate. The first light emitting element emits a first light through the light guide plate. The second light emitting element has a function of emitting a second light to a side surface of the light guide plate. The light receiving element has the functions of receiving the first light and converting it into an electrical signal, and receiving the second light. The first light includes visible light, and the second light includes red light. The second substrate is resistant to light in the wavelength range of 800 nm to 1000 nm. The refractive index is lower than that of the light guide plate.
[0011] Another aspect of the present invention is a liquid crystal display device comprising: a first substrate; a resin layer; a light guide plate; and a first light emitting element. The display device has a first substrate, a second light emitting element, and a light receiving element. The first light emitting element and the light receiving element are disposed opposite each other with a resin layer interposed therebetween. The first light emitting element is provided between the resin layer and the light guide plate. The second light emitting element has a function of emitting a second light to a side surface of the light guide plate. The light receiving element has two functions: receiving the first light and converting it into an electrical signal, and receiving the second light and converting it into an electrical signal. The first light includes visible light, and the second light includes infrared light. The resin layer is provided in contact with the light guide plate and has a function of bonding the first substrate and the light guide plate, In addition, the refractive index for light in the wavelength range of 800 nm to 1000 nm is lower than that of the light guide plate. .
[0012] In the above, it is preferable that the conductive layer transmits visible light. The conductive layer is provided in contact with the light guide plate and is resistant to light in the wavelength range of 800 nm to 1000 nm. It is preferable that the refractive index of the conductive layer is higher than that of the light guide plate. It is preferable that the electrode function as a touch sensor.
[0013] In the above, the first light emitting element includes a first pixel electrode, a light emitting layer, and a first electrode. The light receiving element preferably includes a second pixel electrode, an active layer, and a second electrode. In this case, the light-emitting layer and the active layer preferably contain different organic compounds. It is preferable that the first pixel electrode and the second pixel electrode are provided on the same surface. It is preferable that
[0014] Alternatively, in the above, the first light-emitting element includes a first pixel electrode, a light-emitting layer, and a common electrode. The light receiving element preferably has a second pixel electrode, an active layer, and a common electrode. In this case, it is preferable that the light-emitting layer and the active layer contain different organic compounds. It is preferable that the first pixel electrode and the second pixel electrode are provided on the same surface, The common electrode has a portion overlapping the first pixel electrode via the light-emitting layer, and a portion overlapping the second pixel electrode via the active layer. It is preferable that the insulating layer has a portion overlapping with the electrode.
[0015] Alternatively, in the above, the first light-emitting element includes a first pixel electrode, a common layer, a light-emitting layer, and a common It is preferable that the light receiving element has a second pixel electrode, a common layer, an active layer, In this case, the light-emitting layer and the active layer are preferably formed of different layers. It is preferable that the first pixel electrode and the second pixel electrode contain an organic compound. It is preferable that the common layer is provided on the first pixel electrode and the light-emitting layer. It is preferable that the second pixel electrode has a portion overlapping the first pixel electrode and the active layer. The conducting electrode is disposed in a portion overlapping the first pixel electrode via the common layer and the light-emitting layer, and in a portion overlapping the common layer and the active layer. It is preferable that the second pixel electrode has a portion overlapping the first pixel electrode with an intervening gap therebetween.
[0016] Alternatively, in the above, the first light-emitting element includes a first pixel electrode, a light-emitting layer, and a first electrode. The light receiving element preferably includes a second pixel electrode, an active layer, and a second electrode. In this case, the first pixel electrode and the second pixel electrode are preferably disposed on different surfaces. It is preferable that the light-emitting layer contains an organic compound and the active layer is formed on the silicon substrate. It is preferred that the compound contains .
[0017] Further, one aspect of the present invention is a display device including any one of the above display devices, a calculation unit, and a storage unit. The display device displays a first biometric information including a fingerprint or vein information of a user. The function of acquiring information and the user's oxygen saturation information, blood glucose information or triglyceride concentration and a function of acquiring second biological information including information of the first learning model. The calculation unit has a function of storing the first learning model and the second learning model. A function for performing authentication based on biometric information, a second learning model, and a function for performing authentication based on the second biometric information. and a function of performing anomaly detection based on the detected anomaly. Effect of the Invention
[0018] According to one embodiment of the present invention, a display device having a light detection function can be provided. It is possible to provide a display device having a function of biometric authentication, such as a touch panel. It is possible to provide a display device that has both a function for performing a face recognition function and a function for performing biometric authentication. A display device having a novel configuration can be provided. Alternatively, a multi-function display device can be provided. It is possible to provide a display device having the above structure.
[0019] According to another aspect of the present invention, a display device having a function of acquiring a user's health condition is provided. Alternatively, a display device capable of managing the user's health can be provided.
[0020] The description of these effects does not preclude the existence of other effects. An embodiment does not necessarily have to have all of these effects. can be extracted from descriptions in the specification, drawings, claims, etc. [Brief description of the drawings]
[0021] [Figure 1] Figures 1A, 1B, 1D, 1F to 1H are diagrams showing examples of the configuration of a display device, and Figures 1C and 1E are diagrams showing examples of images. [Diagram 2] 2A to 2C are diagrams showing configuration examples of a display device. [Diagram 3] 3A to 3D are diagrams showing configuration examples of a display device. [Figure 4] 4A to 4C are diagrams showing configuration examples of a display device. [Diagram 5] 5A to 5C are diagrams showing configuration examples of a display device. [Figure 6] 6A and 6B are diagrams showing a configuration example of a display device. [Figure 7] 7A to 7C are diagrams showing configuration examples of a display device. [Figure 8] FIG. 8 is a diagram illustrating an example of the configuration of a display device. [Figure 9] FIG. 9 is a diagram illustrating a configuration example of a display device. [Figure 10] 10A and 10B are diagrams showing a configuration example of a display device. [Figure 11] 11A and 11B are diagrams showing a configuration example of a display device. [Figure 12] FIG. 12 is a diagram showing a configuration example of a display device. [Figure 13] FIG. 13 is a diagram illustrating an example of the configuration of an electronic device. [Figure 14] 14A and 14B are diagrams illustrating configuration examples of electronic devices. [Figure 15] 15A and 15B are diagrams illustrating configuration examples of electronic devices. [Figure 16] 16A and 16B are diagrams illustrating configuration examples of electronic devices. [Figure 17] FIG. 17 is a diagram illustrating an example of a system configuration. [Figure 18]FIG. 18 is a flow chart illustrating how the system operates. [Figure 19] 19A and 19B are diagrams showing configuration examples of pixel circuits. [Figure 20] 20A and 20B are diagrams showing configuration examples of electronic devices. [Figure 21] 21A to 21D are diagrams showing configuration examples of electronic devices. [Figure 22] 22A to 22F are diagrams showing configuration examples of electronic devices. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0022] Hereinafter, the embodiments will be described with reference to the drawings. The present invention may be embodied in various different forms without departing from its spirit and scope. It will be readily understood by those skilled in the art that various modifications and changes may be made to the embodiments and details of the present invention. However, the present invention should not be construed as being limited to the description of the following embodiments.
[0023] In the configuration of the invention described below, the same parts or parts having similar functions are The same reference numerals are used in common between different drawings, and the repeated explanations are omitted. When referring to a function, the same hatch pattern may be used and no particular symbol may be added.
[0024] In each figure described in this specification, the size, layer thickness, or area of each component may differ from that shown in the drawings. The figures may be exaggerated for clarity and are not necessarily limited to scale. I can't.
[0025] In this specification, ordinal numbers such as "first" and "second" are used to avoid confusion of components. The numbers are added for the purpose of convenience and are not intended to be limiting.
[0026] In this specification, a display panel, which is one aspect of a display device, displays (outputs) images on a display surface. Therefore, the display panel is one aspect of an output device.
[0027] In the present specification, the substrate of the display panel is provided with, for example, an FPC (Flexible Printed Circuit). inted Circuit) or TCP (Tape Carrier Packa ge) or COG (Chip On Gauge) connectors attached to the board. Display module is a device that has ICs mounted using a method such as display glass. It may be called a display panel, a display unit, or simply a display panel.
[0028] In this specification and the like, a touch panel, which is one aspect of a display device, is a device for displaying images, etc. on a display surface. The function of displaying information and detecting when a detected object such as a finger or stylus touches, presses, or approaches the display surface. The touch panel also functions as a touch sensor that detects the touch of the touch panel. A card is one form of input / output device.
[0029] The touch panel is, for example, a display panel (or display device) with a touch sensor, A touch panel can also be called a display panel (or display device) with touch function. A display panel and a touch sensor panel may be used. It may also be configured to have a touch sensor function inside or on the surface.
[0030] In addition, in this specification, a touch panel substrate on which a connector or IC is mounted is referred to as a touch panel. It may be called a touch panel module, a display module, or simply a touch panel. be.
[0031] (Embodiment 1) In this embodiment, a structure example of a display device according to one embodiment of the present invention will be described.
[0032] A display device according to one embodiment of the present invention includes a display element that emits visible light and a light receiving element that receives infrared light. The display element has a light-emitting element (first light-emitting element (light-emitting device)). The light receiving element is preferably a photoelectric conversion element. I wish.
[0033] The display device includes a substrate (also called a first substrate) and a light guide plate. The light receiving element is disposed between the first substrate and the light guide plate. The light emitting element has a light emitting element (also called a second light emitting element) that emits infrared light.
[0034] The visible light emitted from the display element is emitted to the outside through the light guide plate. By having a plurality of such display elements arranged in a trix shape, an image can be displayed. .
[0035] Infrared light incident on the side of the light guide plate is diffused while repeatedly undergoing total reflection inside the light guide plate. When an object touches the surface of the light guide plate (the surface opposite to the first substrate), the light guide plate and the object Infrared light is scattered at the interface between the body and the object, and some of the scattered light is incident on the light receiving element. When infrared light is received, it can be converted into an electrical signal according to its intensity and output. The device has a plurality of light receiving elements arranged in a matrix, and can detect the presence of an object touching the light guide plate. It is possible to detect position information and the shape of an object. The display panel can function as a sensor panel, a touch sensor panel, etc.
[0036] In addition, infrared light, which is invisible to the user, is used as the light that is diffused inside the light guide plate. By doing so, the image pickup or sensor by the light receiving element can be performed without deteriorating the visibility of the displayed image. Sensing can be performed.
[0037] The light emitted by the second light-emitting element preferably includes infrared light, and more preferably near-infrared light. In particular, near infrared light having one or more peaks in the wavelength range of 700 nm or more and 2500 nm or less is preferred. In particular, one or more wavelengths in the range of 750 nm to 1000 nm can be used. By using light with a peak, the range of materials that can be used for the active layer of the light receiving element is expanded. This is preferable.
[0038] When the fingertip touches the light guide plate of the display device, the shape of the fingerprint can be captured. When a finger touches the light guide plate, infrared light is scattered at the raised areas of the fingerprint that touch the light guide plate. Therefore, the intensity of the infrared light incident on the light receiving element that overlaps with the raised portion of the fingerprint is large. Therefore, the intensity of the infrared light incident on the light receiving element overlapping the recess is reduced. The device having the display device according to one embodiment of the present invention can capture the fingerprint. Fingerprint authentication, a type of biometric authentication, can be performed by using an image of a fingerprint.
[0039] The display device can also capture images of blood vessels, particularly veins, in fingers and hands. Light with a wavelength of 760 nm or near this wavelength is not absorbed by reduced hemoglobin in the veins, so it can be seen on the palm or The location of veins is detected by capturing light reflected from a finger or other object with a light-receiving element and forming an image. The device having the display device according to one embodiment of the present invention can utilize the captured image of veins. This allows for vein authentication, a type of biometric authentication.
[0040] In addition, a device having a display device according to one embodiment of the present invention can perform fingerprint authentication and vein authentication simultaneously. This allows for a higher level of security without increasing the number of parts. High level biometric authentication can be performed.
[0041] In particular, it is preferable that the light receiving element is an element capable of receiving not only infrared light but also visible light. In this way, when the first light emitting element is made to emit light, the reflected light reflected by the user's finger is received. By receiving light with a photoelectric element, the shape of the fingerprint can be imaged. This allows both fingerprint and vein authentication to be performed simultaneously. It is possible to perform this on a single display device. The above steps may be performed at different times, or simultaneously. By capturing an image simultaneously, an image containing both fingerprint shape information and vein shape information can be obtained. This makes it possible to obtain image data, enabling more accurate biometric authentication.
[0042] In addition, the display device of one embodiment of the present invention has a function of detecting a health condition of a user. For example, the reflectance and the reflectance for visible light and infrared light may be changed according to the change in the oxygen saturation in the blood. By utilizing the change in oxygen saturation and transmittance, the time modulation of the oxygen saturation can be obtained. It is also possible to measure the glucose concentration in the dermis and the neutral fat concentration in the blood. The concentration and the like can also be measured using infrared light or visible light. The device has a function to obtain information that is an indicator of a user's health condition. It can be used as a healthcare device.
[0043] In addition, a second substrate may be provided between the first substrate and the light guide plate. The substrate may be a sealing substrate for sealing the light emitting element, a protective film, or the like. In addition, a resin layer for bonding the first substrate and the light guide plate may be provided between them. In this case, the resin layer has a refractive index for the infrared light emitted by the second light emitting element that is equal to or larger than that of the light guide plate. By using a material with a lower resistance than the light guide plate, the infrared light that diffuses through the light guide plate is transmitted to the resin layer side, and the light receiving element It is possible to suppress the radiation from being incident on the
[0044] In addition, a conductive layer that transmits visible light may be provided in contact with the light guide plate. The conductive layer is made of a material having a higher refractive index for the infrared light emitted by the second light emitting element than the light guide plate. By using the light guide plate, the infrared light can be diffused into the conductive layer. The conductive layer provided in contact with the substrate can be used as, for example, an electrostatic shielding film. The conductive layer can also function as an electrode for a capacitive touch sensor, for example. In addition, the conductive layer can be used as an electrode or wiring for various sensors and functional elements. do.
[0045] When a light-emitting element is used as a display element, an OLED (Organic Lithium Ion Display) is used. ght Emitting Diode) and QLED(Quantum-dot Lig) It is preferable to use an EL element such as a luminescent emitting diode (ELD). The luminescent materials that the child possesses include fluorescent materials (fluorescent materials) and phosphorescent materials (phosphorescent Materials that exhibit thermally activated delayed fluorescence (Thermally Activated Delayed Fluorescence ivated delayed fluorescence (TADF) materials), mineralization Compounds (quantum dot materials, etc.) are also included as light-emitting elements. It is also possible to use LEDs such as Light Emitting Diodes.
[0046] As the light receiving element, for example, a pn type or pin type photodiode can be used. The light receiving element acts as a photoelectric conversion element that detects the light incident on the light receiving element and generates an electric charge. The amount of charge generated by a photoelectric conversion element is determined according to the amount of incident light. As the light receiving element, it is preferable to use an organic photodiode having a layer containing an organic compound. Organic photodiodes are easy to make thin, lightweight, and large in area, and are also easy to fabricate. Since there is a high degree of freedom in shape and design, it can be applied to a variety of display devices.
[0047] The light-emitting element may have a laminated structure including a light-emitting layer between a pair of electrodes. The light receiving element may have a laminated structure including an active layer between a pair of electrodes. The active layer can be made of a semiconductor material, for example, an inorganic semiconductor material such as silicon. can be used.
[0048] It is also preferable to use an organic compound for the active layer of the light receiving element. It is preferable that the pixel electrode and one of the electrodes of the light receiving element (also called a pixel electrode) are provided on the same surface. Furthermore, the other electrodes of the light emitting element and the light receiving element are formed by a single continuous conductive layer ( It is more preferable that the light emitting element and the light receiving element have a common electrode. It is more preferable that the light emitting element and the light receiving element have a common layer. The manufacturing process for manufacturing the element can be simplified, the manufacturing cost can be reduced, and the manufacturing process can be simplified. The retention can be improved.
[0049] A more specific example will be described below with reference to the drawings.
[0050] [Display device configuration example 1] [Configuration example] 1A is a schematic diagram of a display device 50. The display device 50 includes a substrate 51, a substrate 52, and a light guide Plate 59, light receiving element 53, light emitting element 54, light emitting element 57R, light emitting element 57G, light emitting element 57 B, functional layer 55, etc.
[0051] The light emitting element 57R, the light emitting element 57G, the light emitting element 57B, and the light receiving element 53 are connected to the substrate 51. It is provided between the substrates 52.
[0052] The light emitting element 57R, the light emitting element 57G, and the light emitting element 57B are red (R), green (G ) or blue (B) light.
[0053] The display device 50 has a plurality of pixels arranged in a matrix. The pixel has the above sub-pixels. Each sub-pixel has one light-emitting element. For example, the pixel has A configuration with three sub-pixels (three colors of R, G, and B, or yellow (Y), cyan (C), and magenta (M), or a four-subpixel configuration (R, G, B, white (W ) or R, G, B, Y). The light receiving element 53 may be provided in all pixels, or may be provided in only some pixels. Furthermore, one pixel may have a plurality of light receiving elements 53.
[0054] The light guide plate 59 is provided on the substrate 52. The light guide plate 59 is a light guide plate for guiding visible light and infrared light. It is preferable to use a material that has high light transmittance for light with a wavelength of 600 nm. and the transmittance for light with a wavelength of 800 nm is 80% or more, preferably 85% or more, More preferably, the material is 90% or more, and even more preferably, 95% or more and 100% or less. Fees can be used.
[0055] In addition, the light guide plate 59 is made of a material having a high refractive index with respect to the light emitted by the light emitting element 54. For example, the refractive index for light having a wavelength of 800 nm is preferably 1.2 or more and 2.5 or less. Preferably, a material having a refractive index of 1.3 or more and 2.0 or less, more preferably 1.4 or more and 1.8 or less, is used. It is possible.
[0056] The light guide plate 59 and the substrate 52 are provided in contact with each other, or are bonded together with a resin layer or the like. In this case, the substrate 52 or the resin layer in contact with the light guide plate 59 is preferably at least In the portion in contact with the light guide plate 59, the It is preferable that the refractive index of the light guide plate 59 be lower than that of the light guide plate 59 .
[0057] The light emitting element 54 is provided near the side surface of the light guide plate 59. The light emitting element 54 can emit infrared light IR from the side. As the light emitting element 54, a light emitting element capable of emitting infrared light can be used. EL elements such as OLED and QLED, or LEDs can be used. Light-emitting element 54 may be provided along the side surface of the light guide plate 59.
[0058] 1A shows a state where a finger 60 touches the surface of a light guide plate 59. Inside of the light guide plate 59 A part of the infrared light IR that diffuses the light is reflected or scattered at the contact portion between the light guide plate 59 and the finger 60. Then, a part of the scattered light IR(r) of the infrared light IR is incident on the light receiving element 53. Therefore, it is possible to detect that the finger 60 has come into contact with the light guide plate 59. 0 can function as a touch panel.
[0059] The functional layer 55 includes a circuit for driving the light emitting element 57R, the light emitting element 57G, and the light emitting element 57B, and The functional layer 55 includes a switch, a transistor, and a circuit for driving the light receiving element 53. Capacitance, wiring, etc. are provided. In addition, when the light receiving element 53 is driven by a passive matrix method, a switch or a transistor is used. A configuration without a resistor may also be used.
[0060] The display device 50 may have a function of detecting a fingerprint of a finger 60. 1 is a schematic enlarged view of a contact portion when a finger 60 is in contact with a plate 59. FIG. 1B shows light emitting elements 57 and light receiving elements 53 arranged alternately.
[0061] A fingerprint is formed on a finger 60 by recesses and protrusions. The protrusions of the pattern come into contact with the light guide plate 59, and scattered light IR(r) is generated at the contact surface between them.
[0062] As shown in FIG. 1B, the scattered light IR(r) scattered at the contact surface between the finger 60 and the light guide plate 59 is The intensity distribution of the scattered light IR(r) is approximately perpendicular to the contact surface. The strength is strongest in the direction of the beam, and the strength decreases as the angle increases in the diagonal direction. Therefore, the light receiving element 5 located directly under the contact surface (overlapping the contact surface) The intensity of the light received by the sensor 3 is the highest. Also, the scattered light IR(r) with a given scattering angle As shown in FIG. 1B, light with an angle of 0.1 mm or more is guided to the other surface of the light guide plate 59 (the surface opposite to the contact surface). , and does not transmit to the light receiving element 53 side.
[0063] The light receiving elements 53 are arranged at intervals smaller than the distance between two convex portions of a fingerprint. By making the distance smaller than the distance between adjacent concave and convex parts, a clear fingerprint image can be obtained. The distance between the ridges and valleys of a human fingerprint is approximately 200 μm. The arrangement interval of the light receiving elements 53 is 400 μm or less, preferably 200 μm or less, and more preferably is 150 μm or less, more preferably 100 μm or less, and even more preferably 50 μm or less. The thickness is set to 1 μm or more, preferably 10 μm or more, and more preferably 20 μm or more.
[0064] In addition, at the contact surface between the finger 60 and the light guide plate 59, not only scattering but also reflection of the infrared light IR occurs. The reflection angle of the reflected light changes depending on the incident angle of the infrared light IR, so the scattered light IR However, the intensity distribution may differ from that shown in FIG. is sufficiently small compared to the arrangement interval of the light receiving elements 53, the scattered light IR(r) and the reflected light The difference in the intensity distribution between the two is negligibly small, so it has almost no effect on the clarity of the captured image. It can be said that it has no effect.
[0065] An example of a fingerprint image captured by the display device 50 is shown in FIG. 1C. In the figure, the outline of the finger 60 is shown by a dashed line, and the outline of the contact part 61 is shown by a dashed line. In this case, a fingerprint 62 with high contrast is captured by changing the amount of light incident on the light receiving element 53. It can be imagined.
[0066] The display device 50 can also function as a touch panel or a pen tablet. In FIG. 1D, the tip of the stylus 65 is in contact with the light guide plate 59, and the light is moved in the direction of the dashed arrow. It shows how it slides.
[0067] As shown in FIG. 1D, light is scattered at the contact surface between the tip of the stylus 65 and the light guide plate 59. When light IR(r) is incident on the light receiving element 53 located at the portion overlapping with the scattering surface, The position of the tip of the tyrus 65 can be detected with high accuracy.
[0068] FIG. 1E shows an example of a trajectory 66 of a stylus 65 detected by the display device 50. The display device 50 is capable of detecting the position of a detection object such as a stylus 65 with high positional accuracy. In drawing applications, it is also possible to perform high-definition drawing.
[0069] 1F to 1H show an example of a pixel 30 that can be used in the display device 50. In FIG.
[0070] The pixels 30 shown in FIG. 1F and FIG. 1G each function as a subpixel for display. A red (R) pixel 31R, a green (G) pixel 31G, a blue (B) pixel 31B, and a light receiving pixel The pixel 31R, the pixel 31G, and the pixel 31B each function as a pixel. The pixel 32 includes one or more of the light emitting elements 57R, 57G, and 57B. The sensor 50 has one or more light receiving elements 53 .
[0071] FIG. 1F shows an example in which three sub-pixels and a pixel 32 are arranged in a 2×2 matrix. FIG. 1G shows an example in which three sub-pixels and a pixel 32 are arranged in a horizontal row.
[0072] The pixel 30 shown in FIG. 1H is an example having a white (W) pixel 31W. The pixel 31W has It has one or more white light-emitting elements. Here, four sub-pixels are arranged in a horizontal row, and Pixels 32 are arranged in the pixel area 31.
[0073] The pixel configuration is not limited to the above, and various arrangement methods can be adopted.
[0074] [Application example] In the following, an example of capturing images of both the user's fingerprint and blood vessels will be described. The device has two modes: one for capturing fingerprint images using visible light, and one for capturing blood vessel images using infrared light. The fingerprint and blood vessels are captured in a single image using both visible and infrared light. Mode and can be executed.
[0075] FIG. 2A shows how a fingerprint image is captured using visible light. The element 54 is not emitting light, and the light-emitting element 57G is emitting light. Green light emitted by the light-emitting element 57G G is irradiated onto the surface of the finger 60, and a part of it is reflected or scattered. Then, the scattered light G( A part of the light (r) enters the light receiving element 53. The light receiving elements 53 are arranged in a matrix. Therefore, by mapping the intensity of the scattered light G(r) detected by each light receiving element 53, , an image of the fingerprint of finger 60 can be acquired.
[0076] Figure 2B shows how blood vessels are imaged using infrared light. The element 57R, the light emitting element 57G, and the light emitting element 57B are not caused to emit light, and the light emitting element 54 is caused to emit light. A part of the infrared light IR that diffuses inside the light guide plate 59 reaches the contact area between the light guide plate 59 and the finger 60. Then, a part of the infrared light IR is transmitted from the infrared ray IR to the inside of the finger 60. The light is reflected or scattered by the blood vessels 67 , and the reflected light IR(r) enters the light receiving element 53 . By mapping the intensity of the incident light IR(r) in the same manner as above, an image of the blood vessel 67 is obtained. You can get it.
[0077] FIG. 2C shows the simultaneous imaging using visible light and infrared light. The scattered light G(r) and the scattered light IR(r) are incident on the light receiving element 53. The intensities of the two scattered lights acquired by the optical element 53 are not distinguished from each other, and the mapping is performed in the same manner as above. By doing so, it is possible to obtain an image that reflects both the shape of the fingerprint and the shape of the blood vessels. do.
[0078] Here, the blood vessel 67 includes veins and arteries. By doing so, the image can be used for vein authentication.
[0079] In addition, the arteries (arterioles) inside the finger 60 are stimulated by infrared light in response to fluctuations in blood oxygen saturation. The reflectance of the blood to visible light changes. This change is acquired over time. By acquiring the time modulation of the oxygen saturation, it is possible to acquire information on the pulse wave. The user's heart rate can be measured by infrared light (IR). Although an example of acquiring pulse wave information has been shown, measurement can also be performed using visible light.
[0080] In addition, information that can be obtained by imaging the inside of the finger 60 and the blood vessels 67 includes the oxygen concentration in the blood, In addition to saturation, there are also blood triglyceride levels and blood or dermal glucose levels. From the glucose concentration, blood sugar levels can be estimated. Such information can be used to It is an indicator of health status, so by measuring it at least once a day, you can get an idea of your daily health status. The device having the display device according to one embodiment of the present invention can be used for fingerprint recognition. When performing authentication or vein authentication, biometric information can be acquired at the same time, making it possible to identify the user. This allows you to manage your health unconsciously without being bothered.
[0081] In the above, the light emitting element 57G that emits green light is used as the light source of visible light. However, the light emitting element 57R or the light emitting element 57B may be used. Alternatively, three light emitting elements may be used. Alternatively, two or more of the light emitting elements may be used. Alternatively, a plurality of light emitting elements each emitting infrared light of a different wavelength may be used. Alternatively, a light emitting element that emits infrared light of a continuous wavelength may be used. The light source used to acquire information should be selected based on the application and emit light of an appropriate wavelength. It can be used.
[0082] [Display device configuration example 2] An example of the configuration of a display device that is partially different from the above will be described below.
[0083] [Configuration Example 2-1] A display device 50a shown in FIG. 3A is different from the display device 50 described above in that a resin substrate 52 is used instead of the substrate 52. The main difference is the inclusion of layer 71 .
[0084] The resin layer 71 can be made of a material that is transparent to visible light. The layer 71 may have a function of bonding the substrate 51 and the light guide plate 59 together.
[0085] The resin layer 71 is provided in contact with the light guide plate 59. The portion in contact with the light plate 59 has a refractive index for light in the wavelength range of 800 nm to 1000 nm. It is preferable that the refractive index is lower than that of the light guide plate 59. As a result, as shown in FIG. The infrared light IR can be totally reflected at the interface between the plate 59 and the resin layer 71 .
[0086] [Configuration Example 2-2] The display device 50b shown in FIG. 3B differs from the display device 50a mainly in that it has a conductive layer 72. They are different.
[0087] The conductive layer 72 is provided in contact with the light guide plate 59. 9 and the resin layer 71.
[0088] By applying a predetermined potential to the conductive layer 72, it can function as an electrostatic shielding film. The conductive layer 72 prevents electrical noise input from the outside through the light guide plate 59 from being reflected by the display device. This can advantageously prevent the electric current from reaching the circuits of the device 50b.
[0089] The conductive layer 72 can also function as an electrode for a sensor element such as a touch sensor. In particular, it is preferable to use it as an electrode for a capacitive touch sensor.
[0090] The conductive layer 72 can be made of a conductive material that transmits visible light. A conductive material that transmits infrared light IR emitted by the light emitting element 54 can be preferably used. .
[0091] The conductive layer 72 is 800 mm thicker than the light guide plate 59 at least in the portion in contact with the light guide plate 59 . It is preferable to use a conductive material having a high refractive index for light in the wavelength range of 1000 nm to 1000 nm. As a result, as shown in FIG. 3B, the infrared light IR is guided not only through the light guide plate 59 but also through the conductive layer 7. The conductive layer 72 may be configured to diffuse into the resin layer 71 as well. Since the refractive index of the light in the wavelength range is high, the infrared light IR is guided between the conductive layer 72 and the resin layer 71. Total reflection can be achieved at the interface.
[0092] Although an example having the resin layer 71 is shown here, a configuration having the substrate 52 may also be used. .
[0093] [Configuration Example 2-3] In the display device 50c shown in FIG. 3C, the light emitting element 57R and the light receiving element 53 are arranged on different surfaces. The display device 50c includes a substrate 51a, a substrate 51b, a functional layer 55a, functional layer 55b, etc.
[0094] The functional layer 55a is a layer having a circuit for driving the light emitting element 57R and the like, and is provided on the substrate 51a. The functional layer 55b is a layer having a circuit for driving the light receiving element 53. The substrate 51a and the substrate 51b are fixed to each other by an adhesive layer or the like (not shown). It is preferable that the above-mentioned range is set.
[0095] In this case, an inorganic semiconductor material such as silicon is used for the active layer of the light receiving element 53. In this case, the active layer can be made of single crystal silicon, polycrystalline silicon, or Crystalline silicon or amorphous silicon can be selected and used. Here, an example is shown in which the functional layer 55b and the light receiving element 53 are laminated on the substrate 51b. In the case where a semiconductor substrate is used for the substrate 51b, the substrate 51b is a functional layer 55b and a light receiving element 5 It may also be part of 3.
[0096] [Configuration Example 2-4] In the display device 50d shown in FIG. 3D, the light emitting element 57R and the light receiving element 53 are arranged on the functional layer 55. The main difference from the above-mentioned configuration example is that the electrodes are sandwiched between the electrodes.
[0097] The active layer of the light receiving element 53 is made of an inorganic semiconductor material such as silicon. In addition, when a semiconductor substrate is used as the substrate 51, the substrate 51 can be used as the light receiving element 5. It may form a part of the active layer of 3 or the like.
[0098] In the display device 50c and the display device 50d, a resin layer 71 is provided instead of the substrate 52. Alternatively, the conductive layer 72 may be provided.
[0099] [Example of light guide plate configuration] A light guide plate that can be used in a display device according to one embodiment of the present invention is provided in a display portion of an electronic device, for example. The light guide plate can also function as a part of the housing that functions as a display surface or a touch surface. It also functions as a protective member for protecting the light emitting element, the light receiving element, the functional layer, etc. Glass, a flexible film, or the like can be used as the light guide plate.
[0100] 4A shows a configuration example of a display device 50e. The display device 50e has a light guide plate 5 4A shows an example having a flat light guide plate 59a.
[0101] The light guide plate 59a has a light emitting element 54 arranged along one end thereof for emitting infrared light IR. In addition, a reflective layer 58 is provided on the side of the light guide plate 59a opposite to the side on which the light emitting element 54 is provided. The reflective layer 58 has a function of reflecting infrared light IR. This makes it possible to uniform the intensity distribution of the infrared light IR diffusing within the light guide plate 59a. Cut.
[0102] FIG. 4B shows an example of the configuration of a display device 50f having a light guide plate 59b with curved ends. do.
[0103] The light guide plate 59b is provided with the light emitting element 54 along one end thereof, similar to the light guide plate 59a. A reflective layer 58 is provided along the other end of the light guide plate 59b. is spreading.
[0104] Both ends of the light guide plate 59b are curved, and the light emitting element 54 and the reflective layer 58 are provided along the ends. By configuring the display device 50f in such a manner, a non-display area surrounding a display unit in an electronic device to which the display device 50f is applied This is preferable because it allows the area of the frame (also called the picture frame) to be reduced.
[0105] Here, at the curved portion of the light guide plate 59b, a part of the infrared light IR is not totally reflected and is emitted to the outside. This may result in a decrease in the intensity of the infrared light IR that diffuses within the light guide plate 59b. However, by making the light guide plate 59b sufficiently thin, total reflection of the infrared light IR occurs. For example, the thickness of the light guide plate 59b can be set to 2 mm or less, preferably 1 mm or less. m or less, more preferably 0.8 mm or less, and even more preferably 0.7 mm or less. 0 μm or more, preferably 30 μm or more, and more preferably 50 μm or more, This makes it possible to suppress a decrease in the intensity of the infrared light IR inside the plate 59b.
[0106] In FIG. 4C, the substrate 51 and the like are curved and provided along the light guide plate 59c that is partially curved. 1 shows an example of the configuration of a display device 50g.
[0107] The substrate 51 can be made of a flexible material. If the radius is sufficiently large, an inorganic insulating substrate such as a glass substrate can be used as the substrate 51. Moreover, it is preferable to use a material containing an organic resin for the substrate 51.
[0108] FIG. 4C shows an example in which the substrate 51 and the light guide plate 59c are bonded to each other with a resin layer 71. In this way, when the substrate 51 is arranged along the curved surface of the light guide plate 59c, If the resin layer 71 is used for bonding without providing the light guide plate 52, the bonding time between the substrate 51 and the light guide plate 59c will be In addition, the light receiving element 53 and the light guide plate 59c can be easily connected. The distance can be reduced, improving the accuracy of position detection and enabling clearer imaging. This creates a synergistic effect.
[0109] FIG. 4C illustrates an example in which the light guide plate 59c has a curved portion and a flat portion. However, the shape may be entirely curved without having any flat portions.
[0110] The above is a description of the configuration example of the light guide plate.
[0111] [Display device configuration example 3] A more specific example of the display device according to one embodiment of the present invention will be described below.
[0112] [Configuration Example 3-1] FIG. 5A shows a schematic cross-sectional view of the display device 10A.
[0113] The display device 10A includes a light receiving element 110 and a light emitting element 190. The light receiving element 110 includes: The pixel electrode 111, the common layer 112, the active layer 113, the common layer 114, and the common electrode 115 are included. The light emitting element 190 includes a pixel electrode 191, a common layer 112, a light emitting layer 193, and a common layer 114. , and a common electrode 115.
[0114] Pixel electrode 111, pixel electrode 191, common layer 112, active layer 113, light-emitting layer 193, common The layer 114 and the common electrode 115 may each have a single-layer structure or a laminated structure. This is also fine.
[0115] The pixel electrode 111 and the pixel electrode 191 are located on the insulating layer 214. The pixel electrode 191 can be formed using the same material and in the same process.
[0116] The common layer 112 is located on the pixel electrode 111 and the pixel electrode 191. , which is a layer commonly used by the light receiving element 110 and the light emitting element 190.
[0117] The active layer 113 overlaps with the pixel electrode 111 via the common layer 112. The active layer 113 overlaps with the pixel electrode 191 via the common layer 112. and the light-emitting layer 193 has a second organic compound different from the first organic compound.
[0118] Common layer 114 is located on common layer 112 , on active layer 113 , and on light emitting layer 193 . The common layer 114 is a layer that is used in common by the light receiving element 110 and the light emitting element 190 .
[0119] The common electrode 115 is connected to the pixel electrode via the common layer 112, the active layer 113, and the common layer 114. The common electrode 115 has a portion overlapping with the electrode 111. The common electrode 115 is connected to the common layer 112 and the light-emitting layer 193. , and has a portion overlapping with the pixel electrode 191 via the common layer 114. The common electrode 115 , which is a layer commonly used by the light receiving element 110 and the light emitting element 190.
[0120] In the display device of the present embodiment, an organic compound is used for the active layer 113 of the light receiving element 110. The light receiving element 110 has layers other than the active layer 113 in common with the light emitting element 190 (EL element). Therefore, in the process of manufacturing the light emitting device 190, the active layer 113 is formed. By simply adding a process, the light receiving element 110 can be formed in parallel with the formation of the light emitting element 190. In addition, the light emitting element 190 and the light receiving element 110 can be formed on the same substrate. Therefore, the light receiving element 110 can be built into the display device without significantly increasing the number of manufacturing steps. It is possible.
[0121] In the display device 10A, the active layer 113 of the light receiving element 110 and the light emitting layer 19 of the light emitting element 190 are 3 and 4, the light receiving element 110 and the light emitting element 190 have the same configuration except that they are separately manufactured. However, the configuration of the light receiving element 110 and the light emitting element 190 is not limited to this. In addition to the active layer 113 and the light-emitting layer 193, the light-emitting element 10 and the light-emitting element 190 also have layers that are made separately. (See display devices 10D, 10E, and 10F described later.) It is preferable that the light emitting element 190 has one or more layers that are used in common (common layers). This allows the light receiving element 110 to be built into the display device without significantly increasing the number of manufacturing steps. can be done.
[0122] The display device 10A includes a pair of substrates (substrate 151 and substrate 152) and a light receiving element 110, The light emitting element 190, a transistor 41, and a transistor 42 are included.
[0123] The display device 10A also has a light guide plate 121 on the outer side of the substrate 152. At the end of 21, a light emitting element 122 that emits infrared light is disposed.
[0124] In the light receiving element 110, the pixel electrodes 111 and the common electrode 115 are disposed The common layer 112, the active layer 113, and the common layer 114 are called organic layers (layers containing an organic compound). It is preferable that the pixel electrode 111 has a function of reflecting visible light and infrared light. The edge of the pixel electrode 111 is covered by a partition wall 216. It has the function of transmitting light and infrared light.
[0125] The light receiving element 110 has a function of detecting light. It is a photoelectric conversion element that receives the light 22 incident from the plate 121 and converts it into an electrical signal.
[0126] A light-shielding layer BM is provided on the surface of the substrate 152 facing the substrate 151. The light-shielding layer BM has openings at positions overlapping the optical element 110 and the light-emitting element 190. By providing this, the range in which the light receiving element 110 detects light can be controlled.
[0127] The light-shielding layer BM can be made of a material that blocks light emitted from the light-emitting element. It is preferable that M absorbs visible light and infrared light. The light-shielding layer BM is, for example, a metal material. Blackening is done by using materials such as pigments (carbon black, etc.) or resin materials containing dyes. The light-shielding layer BM is a red color filter, a green color filter, and a The color filter may have a laminated structure of a white filter and a blue color filter.
[0128] Here, the light receiving element 110 detects the light scattered on the surface of the light guide plate 121. However, The light emitted from the light emitting element 190 is reflected within the display device 10A and is received without passing through the light guide plate 121 or the like. In some cases, the light may be incident on the optical element 110. The light shielding layer BM suppresses the influence of such stray light. For example, if the light-shielding layer BM is not provided, the light-emitting element 190 will not emit light. The reflected light 23a is reflected by the substrate 152, and the reflected light 23b is incident on the light receiving element 110. By providing the light-shielding layer BM, the reflected light 23b is prevented from entering the light receiving element 110. This reduces noise and increases the sensitivity of the sensor using the light receiving element 110. It is possible.
[0129] In the light-emitting element 190, the pixel electrode 191 and the common electrode 115 are disposed between the pixel electrode 191 and the common electrode 115. The common layer 112, the light-emitting layer 193, and the common layer 114 may be referred to as an EL layer. The pixel electrode 191 preferably has a function of reflecting visible light and infrared light. The end portions are covered by partition walls 216. The pixel electrodes 111 and 191 are connected by partition walls 21 The common electrode 115 is transparent to visible light and infrared light. It has the function of
[0130] The light emitting element 190 has a function of emitting visible light. By applying a voltage between the element electrode 191 and the common electrode 115, light 21 is directed to the substrate 152 side. It is an electroluminescent element that emits light.
[0131] The light-emitting layer 193 is preferably formed so as not to overlap the light-receiving region of the light-receiving element 110. This can prevent the light emitting layer 193 from absorbing the light 22, and the light receiving element 110 The amount of light emitted can be increased.
[0132] The pixel electrode 111 is connected to the transistor 41 through an opening provided in the insulating layer 214. The end of the pixel electrode 111 is electrically connected to the source or drain of the pixel electrode 111. So it is covered.
[0133] The pixel electrode 191 is connected to the transistor 42 through an opening provided in the insulating layer 214. The end of the pixel electrode 191 is electrically connected to the source or drain of the pixel electrode 191. The transistor 42 has a function of controlling the driving of the light-emitting element 190. do.
[0134] The transistors 41 and 42 are formed on the upper surface of the same layer (substrate 151 in FIG. 5A). It is adjacent to.
[0135] At least a part of the circuit electrically connected to the light receiving element 110 is electrically connected to the light emitting element 190. It is preferable that the circuit is formed of the same material and in the same process as the circuit to which it is electrically connected. This allows the display device to be thinner than when the two circuits are formed separately. In addition, the manufacturing process can be simplified.
[0136] The light receiving element 110 and the light emitting element 190 are each covered with a protective layer 195. In FIG. 5A, a protective layer 195 is provided on and in contact with the common electrode 115. By providing the protective layer 195, impurities such as water are prevented from entering the light receiving element 110 and the light emitting element 190. This can suppress contamination and improve the reliability of the light receiving element 110 and the light emitting element 190. In addition, the protective layer 195 and the substrate 152 are bonded together by the adhesive layer 142 .
[0137] As shown in FIG. 6A, a protective layer is provided on the light receiving element 110 and the light emitting element 190. In FIG. 6A, the common electrode 115 and the substrate 152 are bonded by the adhesive layer 142. It is pasted together.
[0138] Also, as shown in FIG. 6B, a configuration without the light-shielding layer BM may be used. Since the light receiving area of the optical element 110 can be increased, the sensitivity of the sensor can be further increased.
[0139] [Configuration Example 3-2] FIG. 5B shows a cross-sectional view of the display device 10B. Description of configurations similar to those of the display device described above may be omitted.
[0140] The display device 10B shown in FIG. 5B has a lens 149 in addition to the configuration of the display device 10A. .
[0141] The lens 149 is provided at a position overlapping the light receiving element 110. In the display device 10B, The lens 149 is provided in contact with the substrate 152. Reference numeral 49 denotes a convex lens having a convex surface on the substrate 151 side. A convex lens may be disposed in the area overlapping with the light receiving element 110.
[0142] When both the light-shielding layer BM and the lens 149 are formed on the same surface of the substrate 152, the order of formation is as follows: In FIG. 5B, an example in which the lens 149 is formed first is shown, but the light-shielding layer BM may be formed first. In Fig. 5B, the edge of the lens 149 is covered by a light shielding layer BM.
[0143] The display device 10B is configured such that light 22 is incident on the light receiving element 110 via a lens 149. When the lens 149 is provided, the light receiving element 110 is more transparent than when the lens 149 is not provided. The imaging range can be narrowed, and overlapping of the imaging range with that of the adjacent light receiving element 110 is suppressed. This allows a clear image to be captured with little blurring. When the imaging range is the same, the imaging range is larger when the lens 149 is included than when the lens 149 is not included. The size of the pinhole (corresponding to the size of the opening of the BM that overlaps with the light receiving element 110 in FIG. 5B) Therefore, by having the lens 149, the light receiving element 1 The amount of light entering the lens 10 can be increased.
[0144] The method for forming the lenses used in the display device of the present embodiment is to form a lens on a substrate or a light receiving element. A lens such as a microlens may be formed directly on the substrate, or a microlens prepared separately may be formed on the substrate. A lens array, such as a lens array, may be laminated to the substrate.
[0145] [Configuration Example 3-3] 5C is a schematic cross-sectional view of the display device 10C. The display device 10C includes a substrate 151, a substrate 152, and the partition wall 216 is not included, and the substrate 153, the substrate 154, the adhesive layer 155, the insulating layer 21 2 and a partition wall 217.
[0146] The substrate 153 and the insulating layer 212 are bonded together by an adhesive layer 155. and protective layer 195 are attached to each other by adhesive layer 142 .
[0147] The display device 10C includes an insulating layer 212, a transistor 41, and a transistor The resistor 42, the light receiving element 110, the light emitting element 190, etc. are transposed onto the substrate 153. The substrate 153 and the substrate 154 each have flexibility. This is preferable. The flexibility of the display device 10C can be improved. For example, the substrate 1 It is preferable that the material for 53 and the substrate 154 be resin.
[0148] The substrates 153 and 154 are made of polyethylene terephthalate (PET). ), polyester resins such as polyethylene naphthalate (PEN), polyacrylonitrile Resin, acrylic resin, polyimide resin, polymethyl methacrylate resin, polycarbonate Polyethersulfone (PC) resin, polyethersulfone (PES) resin, polyamide resin (nylon, amide, etc.), polysiloxane resin, cycloolefin resin, polystyrene resin, polyamide Imide resin, polyurethane resin, polyvinyl chloride resin, polyvinylidene chloride resin, poly Propylene resin, polytetrafluoroethylene (PTFE) resin, ABS resin, cellulose One or both of the substrate 153 and the substrate 154 may be made of a material such as a nanofiber. Alternatively, glass having a sufficient thickness to provide flexibility may be used.
[0149] A film having high optical isotropy may be used for the substrate of the display device of this embodiment mode. As a film with high optical isotropy, triacetyl cellulose (TAC, cellulose acetate) is used. (also called triacetate) film, cycloolefin polymer (COP) film, cycloolefin polymer (COP) film, Examples of the film include olefin copolymer (COC) film and acrylic film.
[0150] The partition 217 preferably absorbs light emitted by the light emitting element. For example, a black matrix can be formed using a resin material containing a pigment or a dye. In addition, by using a brown resist material, the partition wall 217 can be formed of a colored insulating layer. It is possible.
[0151] The light 23c emitted by the light emitting element 190 is reflected by the substrate 154 and the partition wall 217. 3d may enter the light receiving element 110. Also, light 23c may pass through the partition wall 217 and The reflected light is reflected by a transistor or wiring, etc., and enters the light receiving element 110. The light 23c is absorbed by the partition wall 217, and the reflected light 23d is reflected by the light receiving element 110. This can reduce noise and improve the sensor performance using the light receiving element 110. This can increase the sensitivity of the sensor.
[0152] It is preferable that the partition 217 absorbs at least the wavelength of light detected by the light receiving element 110. For example, when the light receiving element 110 detects red light emitted by the light emitting element 190, It is preferable that the partition 217 absorbs at least red light. With this color filter, the red light 23c can be absorbed and the reflected light 23d can be received. This can prevent light from entering the optical element 110.
[0153] [Configuration Example 3-4] In the above, an example in which the light emitting element and the light receiving element have two common layers has been shown, but this is not limited thereto. In the following, an example in which the common layer has a different configuration will be described.
[0154] FIG. 7A shows a schematic cross-sectional view of a display device 10D. The display device 10D has a common layer 114. The display device 10 differs from the display device 10A in that it has a buffer layer 184 and a buffer layer 194. The buffer layer 184 and the buffer layer 194 may each have a single-layer structure or a multilayer structure. It may be of the same structure.
[0155] In the display device 10D, the light receiving element 110 includes a pixel electrode 111, a common layer 112, an active layer 113, a buffer layer 184, and a common electrode 115. The light emitting element 190 includes a pixel electrode 191, a common layer 112, a light emitting layer 193, a buffer layer 19 4, and a common electrode 115.
[0156] In the display device 10D, a buffer layer 184 between the common electrode 115 and the active layer 113 and a An example of separately forming the buffer layer 194 between the electrode 115 and the light-emitting layer 193 will be described. The layer 184 and the buffer layer 194 may be, for example, either an electron injection layer or an electron transport layer. Or both.
[0157] FIG. 7B is a schematic cross-sectional view of the display device 10E. The display device 10E has a common layer 112. The display device 10 differs from the display device 10A in that it includes a buffer layer 182 and a buffer layer 192. The buffer layer 182 and the buffer layer 192 may each have a single-layer structure or a multilayer structure. It may be of the same structure.
[0158] In the display device 10E, the light receiving element 110 includes a pixel electrode 111, a buffer layer 182, an active layer 183, and a The display device 10E includes a conductive layer 113, a common layer 114, and a common electrode 115. The light emitting element 190 includes a pixel electrode 191, a buffer layer 192, a light emitting layer 193, and a common layer 11. 4, and a common electrode 115.
[0159] In the display device 10E, a buffer layer 182 between the pixel electrode 111 and the active layer 113 and a An example of separately forming a buffer layer 192 between a base electrode 191 and a light-emitting layer 193 will be described. The layer 182 and the buffer layer 192 may be, for example, a hole injection layer or a hole transport layer. Or both.
[0160] 7C is a schematic cross-sectional view of a display device 10F. The display device 10F includes a common layer 112 and The buffer layer 182, the buffer layer 184, the buffer layer 192, and It differs from the display device 10A in that it has a buffer layer 194.
[0161] In the display device 10F, the light receiving element 110 includes a pixel electrode 111, a buffer layer 182, an active layer 183, and a The display device 10F also includes a conductive layer 113, a buffer layer 184, and a common electrode 115. In the light emitting element 190, a pixel electrode 191, a buffer layer 192, a light emitting layer 193, a buffer The insulating layer 194 and the common electrode 115 .
[0162] In the manufacture of the light receiving element 110 and the light emitting element 190, the active layer 113 and the light emitting layer 193 are formed. Not only can it be separated, but other layers can also be created.
[0163] In the display device 10F, the light receiving element 110 and the light emitting element 190 form a pair of electrodes (pixel electrode 1 11 or between the pixel electrode 191 and the common electrode 115. The light receiving element 110 and the light emitting element 190 of the device 10F are provided with a pixel electrode 1 on an insulating layer 214. The pixel electrode 111 and the pixel electrode 191 are formed of the same material and in the same process. The photoresist layer 182, the active layer 113, and the buffer layer 184 are disposed on the pixel electrode 191. After forming the light-emitting layer 192, the light-emitting layer 193, and the buffer layer 194, the buffer layer 1 The common electrode 115 is formed so as to cover the insulating layer 84 and the buffer layer 194, etc.
[0164] The laminated structure of the buffer layer 182, the active layer 113, and the buffer layer 184 and the buffer The order of forming the laminated structure of the light emitting layer 192, the light emitting layer 193, and the buffer layer 194 is not particularly limited. For example, after the buffer layer 182, the active layer 113, and the buffer layer 184 are formed, A buffer layer 192, a light-emitting layer 193, and a buffer layer 194 may be fabricated. Prior to deposition of the GaN layer 182, the active layer 113, and the buffer layer 184, a buffer layer 192 is formed. , a light-emitting layer 193, and a buffer layer 194 may be fabricated. Alternatively, the buffer layer 192, the active layer 113, the light emitting layer 193, etc. may be formed alternately in this order.
[0165] [Display device configuration example 4] A more specific example of a structure of the display device of one embodiment of the present invention will be described below.
[0166] [Configuration Example 4-1] FIG. 8 shows a perspective view of the display device 100A.
[0167] The display device 100A has a configuration in which a substrate 151 and a substrate 152 are bonded together. The light guide plate 121 is provided on the substrate 152. In FIG. Shown by dashed lines.
[0168] The display device 100A includes a display unit 162, a circuit 164, wiring 165, and the like. In FIG. An example in which an IC (integrated circuit) 173 and an FPC 172 are mounted on a display device 100A is shown. Therefore, the configuration shown in FIG. 8 includes the display device 100A, the IC 173, and the FPC 17. It can also be said to be a display module having 2.
[0169] The circuit 164 can be a scanning line driver circuit.
[0170] The wiring 165 has a function of supplying signals and power to the display portion 162 and the circuit 164 . The signal and power are input from the outside via FPC172 or from IC173. The signal is input to wiring 165.
[0171] In Figure 8, the COG (Chip On Glass) method or the COF (Chip On The example shows an IC 173 provided on a substrate 151 by a method such as a film method. For example, an IC having a scanning line driver circuit and a signal line driver circuit can be applied to 173. The display device 100A and the display module may be configured without an IC. C may be mounted on the FPC 172 by a COF method or the like.
[0172] FIG. 9 shows a part of the area including the FPC 172 and the circuit 16 of the display device 100A shown in FIG. 4, a part of the area including the display unit 162, and a part of the area including the end portion. 1 shows an example of a cross section of each of the cut surfaces.
[0173] The display device 100A shown in FIG. 9 includes a transistor 201 between a substrate 151 and a substrate 152. , a transistor 205, a transistor 206, a light emitting element 190, a light receiving element 110, etc. Further, a light guide plate 121 is provided on the substrate 152. An optical element 122 is provided.
[0174] The substrate 152 and the insulating layer 214 are bonded to each other via an adhesive layer 142. A solid sealing structure or a hollow sealing structure can be used to seal the light receiving element 110. In the example, the space 143 surrounded by the substrate 152, the adhesive layer 142, and the insulating layer 214 is filled with an inert gas. The adhesive layer 1 is filled with nitrogen or argon, and a hollow sealing structure is applied. 42 may be provided overlapping the light emitting element 190. 2, and the space 143 surrounded by the insulating layer 214 is filled with a resin different from that of the adhesive layer 142. Good too.
[0175] The light emitting element 190 is made up of a pixel electrode 191, a common layer 112, and a light emitting layer 193 from the insulating layer 214 side. The pixel electrode 19 has a laminated structure in which the pixel electrode 19 is laminated in this order. 1 is connected to a conductive layer 22 of a transistor 206 through an opening in an insulating layer 214. The transistor 206 has a function of controlling the driving of the light emitting element 190. The edge of the pixel electrode 191 is covered with a partition wall 216. It includes a material that reflects visible light and infrared light, and the common electrode 115 is transparent to visible light and infrared light. Including materials.
[0176] The light receiving element 110 is made up of a pixel electrode 111, a common layer 112, an active layer 113, and a common layer 114. The pixel electrode 11 has a laminated structure in which the pixel electrode 11 is laminated in this order. 1 is connected to a conductive layer 22 of a transistor 205 through an opening provided in an insulating layer 214. The end of the pixel electrode 111 is covered with a partition wall 216. The pixel electrode 111 includes a material that reflects visible light and infrared light, and the common electrode 115 includes a material that reflects visible light and infrared light. It includes materials that transmit light and infrared light.
[0177] The light emitted by the light emitting element 190 is emitted toward the substrate 152. The light is incident on the substrate 152 through the space 143. The substrate 152 is irradiated with visible light and infrared light. It is preferable to use a material that is highly transparent to light.
[0178] The pixel electrode 111 and the pixel electrode 191 can be manufactured using the same material and the same process. The common layer 112, the common layer 114, and the common electrode 115 are connected to the light receiving element 110 and the light emitting element 110. The light receiving element 110 and the light emitting element 190 are both formed of an active layer 113 and a light emitting layer. The structure of the layer 193 is different, but the structure can be the same. The light receiving element 110 can be built into the display device 100A without significantly increasing the amount of work required. .
[0179] A light-shielding layer BM is provided on the surface of the substrate 152 facing the substrate 151. The light-shielding layer BM has openings at positions overlapping the optical element 110 and the light-emitting element 190. By providing the shield, the range in which the light receiving element 110 detects light can be controlled. By providing the optical layer BM, light from the light emitting element 190 is directly incident on the light receiving element 110. Therefore, a sensor with low noise and high sensitivity can be realized.
[0180] The transistor 201, the transistor 205, and the transistor 206 are all substrate These transistors are formed on the same substrate 151 using the same materials and processes. It can be made.
[0181] On the substrate 151, an insulating layer 211, an insulating layer 213, an insulating layer 215, and an insulating layer 214 are formed. The insulating layer 211 is provided in this order. A part of the insulating layer 211 serves as a gate insulating layer for each transistor. A part of the insulating layer 213 functions as a gate insulating layer for each transistor. An insulating layer 215 is provided over the transistor. The gate insulating layer is provided to cover the gate electrodes and functions as a planarization layer. The number of insulating layers covering the transistor is not limited, and each may be a single layer or two or more layers. .
[0182] At least one of the insulating layers covering the transistors is designed to prevent impurities such as water and hydrogen from diffusing. It is preferable to use a material that can function as a barrier layer. This structure effectively prevents impurities from diffusing into the transistor from the outside. This can effectively suppress the noise and improve the reliability of the display device.
[0183] The insulating layers 211, 213, and 215 are each made of an inorganic insulating film. As the inorganic insulating film, for example, a silicon nitride film or a silicon oxynitride film is preferable. film, silicon oxide film, silicon nitride oxide film, aluminum oxide film, aluminum nitride film, etc. Also, a hafnium oxide film, an yttrium oxide film, a zirconium oxide film, etc. can be used. tantalum oxide film, magnesium oxide film, lanthanum oxide film, oxide A cerium film, a neodymium oxide film, or the like may be used. In addition, two or more of the above insulating films may be laminated. It may also be used.
[0184] Here, organic insulating films often have lower barrier properties than inorganic insulating films. It is preferable that the organic insulating film has an opening near the end of the display device 100A. It is possible to suppress the diffusion of impurities from the end portion of the display device 100A through the organic insulating film. Alternatively, the end of the organic insulating film may be positioned inside the end of the display device 100A. In this case, the organic insulating film is formed on the edge of the display device 100A so that the organic insulating film is not exposed at the edge of the display device 100A. good.
[0185] An organic insulating film is suitable for the insulating layer 214 that functions as a planarizing layer. Materials that can be used include acrylic resin, polyimide resin, epoxy resin, polyamide resin, etc. amide resin, polyimide amide resin, siloxane resin, benzocyclobutene resin, pheno Examples of the resin include polyvinyl chloride resins and precursors of these resins.
[0186] In the region 228 shown in FIG. 9, an opening is formed in the insulating layer 214. Even when an organic insulating film is used for the layer 214, the display unit 1 can be exposed from the outside through the insulating layer 214. Therefore, the reliability of the display device 100A can be improved. It can be done.
[0187] The transistors 201, 205, and 206 have gates A conductive layer 221 that functions as a gate insulating layer, an insulating layer 211 that functions as a source and drain The conductive layers 222a and 222b, which function as the semiconductor layer 231, and the gate insulating layer The insulating layer 213 functions as a gate, and the conductive layer 223 functions as a gate. In the figure, the same hatching pattern is applied to multiple layers obtained by processing the same conductive film. The insulating layer 211 is located between the conductive layer 221 and the semiconductor layer 231. The insulating layer 213 is It is located between the conductive layer 223 and the semiconductor layer 231 .
[0188] The structure of a transistor included in the display device of this embodiment is not particularly limited. Using transistors such as linear type, staggered type, and inverse staggered type In addition, the transistor structure can be either a top gate type or a bottom gate type. Alternatively, gates may be provided above and below the semiconductor layer in which the channel is formed. This is also fine.
[0189] The transistors 201, 205, and 206 have channels. The structure in which the semiconductor layer is sandwiched between two gates is applied. and driving the transistors by supplying the same signal to them. A potential is applied to one of the two gates to control the threshold voltage, and a potential is applied to the other to drive the other. By applying a potential to the transistor, the threshold voltage of the transistor may be controlled.
[0190] The crystallinity of the semiconductor material used in the transistor is not particularly limited. Single crystal semiconductor or semiconductor with crystallinity other than single crystal (microcrystalline semiconductor, polycrystalline semiconductor A single crystal semiconductor or a semiconductor having a crystal region in part may be used. It is preferable to use a crystalline semiconductor since this can suppress deterioration of transistor characteristics.
[0191] The semiconductor layer of the transistor preferably contains a metal oxide (also called an oxide semiconductor). Alternatively, the semiconductor layer of the transistor may include silicon. For this purpose, amorphous silicon, crystalline silicon (low-temperature polysilicon, single crystal silicon, etc.) etc.)
[0192] The semiconductor layer may be, for example, a combination of indium and M (where M is gallium, aluminum, silicon, Boron, yttrium, tin, copper, vanadium, beryllium, titanium, iron, nickel, germanium Rumanium, zirconium, molybdenum, lanthanum, cerium, neodymium, hafnium, one or more selected from tantalum, tungsten, and magnesium), zinc, In particular, M is aluminum, gallium, yttrium, and It is preferable that the metal oxide is one or more metals selected from tin.
[0193] In particular, indium (In), gallium (Ga), and zinc (Zn) are used as the semiconductor layer. It is preferable to use an oxide containing IGZO (also referred to as IGZO).
[0194] When the semiconductor layer is an In-M-Zn oxide, the In-M-Zn oxide is deposited. The sputtering target preferably has an atomic ratio of In to M of 1 or more. The atomic ratio of the metal elements in such a sputtering target is In:M:Zn. =1:1:1, In:M:Zn=1:1:1.2, In:M:Zn=2:1:3, In: M:Zn=3:1:2, In:M:Zn=4:2:3, In:M:Zn=4:2:4.1 , In:M:Zn=5:1:6, In:M:Zn=5:1:7, In:M:Zn=5:1 :8, In:M:Zn=6:1:6, In:M:Zn=5:2:5, etc.
[0195] When a sputtering target containing a polycrystalline oxide is used, This is preferable because it is easy to form a semiconductor layer having crystallinity. The atomic ratio is the plus or minus of the atomic ratio of the metal elements contained in the sputtering target. For example, the composition of the sputtering target used for the semiconductor layer is In the case of In:Ga:Zn=4:2:4.1 [atomic ratio], the composition of the semiconductor layer formed is The atomic ratio may be close to In:Ga:Zn=4:2:3.
[0196] In addition, when the atomic ratio is described as In:Ga:Zn=4:2:3 or in the vicinity, When Ga is 4, this includes the case where Ga is 1 or more and 3 or less, and Zn is 2 or more and 4 or less. In addition, when describing that the atomic ratio is In:Ga:Zn=5:1:6 or close to that, When n is 5, Ga is greater than 0.1 and is equal to or less than 2, and Zn is equal to or greater than 5 and is equal to or less than 7. Also, the atomic ratio is In:Ga:Zn=1:1:1 or in the vicinity. When mounting, when In is 1, Ga is greater than 0.1 and less than 2, and Zn is 0. Includes cases greater than 1 and less than or equal to 2.
[0197] The transistors in the circuit 164 and the transistors in the display portion 162 have the same structure. The circuit 164 may have a plurality of transistors, or may have a different structure. The structures may all be the same, or there may be two or more types. The structures of the multiple transistors may all be the same, or there may be two or more types.
[0198] A connection portion 204 is provided in an area of the substrate 151 where the substrate 152 does not overlap. In the connection portion 204, the wiring 165 is electrically connected to the FPC 172 via the conductive layer 166 and the connection layer 242. The upper surface of the connection portion 204 is made of the same conductive film as the pixel electrode 191. The conductive layer 166 thus obtained is exposed. Electrical connection can be made via the connection layer 242 .
[0199] Various optical members are disposed between the substrate 152 and the light guide plate 121 or on the outside of the light guide plate 121. The optical members include a polarizing plate, a retardation plate, and a light diffusion layer (such as a diffusion film). , an anti-reflection layer, a light collecting film, etc. Also, on the outside of the substrate 152, Antistatic film to suppress adhesion, water-repellent film to prevent dirt from adhering, and scratch prevention film to prevent scratches caused by use. A hard coat film, an impact absorbing layer, etc. may be disposed in contact with the light guide plate 121. When a member with high light diffusion properties is arranged, the infrared light diffusing inside the light guide plate 121 is also diffused at the interface between the members. Therefore, it is preferable to sandwich a member with low light diffusion properties between them.
[0200] The substrates 151 and 152 are made of glass, quartz, ceramic, sapphire, Resin or the like can be used. The substrate 151 and the substrate 152 are made of a flexible material. This can increase the flexibility of the display device.
[0201] The adhesive layers 142 and 155 may be formed of a photo-curable adhesive such as an ultraviolet-curable adhesive, or a reactive-curable adhesive. Various types of curing adhesives such as adhesives, thermosetting adhesives, and anaerobic adhesives can be used. These adhesives include epoxy resins, acrylic resins, silicone resins, and phenolic resins. , polyimide resin, imide resin, PVC (polyvinyl chloride) resin, PVB (polyvinyl Examples of the resin include ethylene vinyl acetate (EVA) resin. A material with low moisture permeability such as epoxy resin is preferable. A two-part mixed resin may also be used. Alternatively, an adhesive sheet or the like may be used.
[0202] The connection layer 242 is an anisotropic conductive film (ACF). Inductive Film), Anisotropic Conductive Paste (ACP) Conductive Paste) can be used.
[0203] The light emitting element 190 may be a top emission type, a bottom emission type, a dual emission type, or a The electrode on the light extraction side uses a conductive film that transmits visible light. It is preferable to use a conductive film that reflects visible light for the electrode on the side from which light is not extracted.
[0204] The light-emitting element 190 has at least a light-emitting layer 193. As the layer other than the above, a material having a high hole injection property, a material having a high hole transport property, a hole blocking material, A material with high electron transport properties, a material with high electron injection properties, or a bipolar material (electron transport properties and For example, the common layer 112 may further include a layer containing a material having a high hole transporting property. It is preferable that the layer has one or both of a hole injection layer and a hole transport layer. For example, 114 preferably has one or both of an electron transport layer and an electron injection layer.
[0205] The common layer 112, the light-emitting layer 193, and the common layer 114 are made of a low molecular weight compound and a high molecular weight compound. The common layer 112 and the light-emitting layer may be made of any of the above-mentioned materials, and may contain inorganic compounds. The layers constituting the common layer 114 and the layer 193 are formed by deposition (including vacuum deposition), transfer, The insulating layer can be formed by a method such as a copying method, a printing method, an ink-jet method, or a coating method.
[0206] The light-emitting layer 193 may contain an inorganic compound such as quantum dots as a light-emitting material.
[0207] The active layer 113 of the light receiving element 110 includes a semiconductor such as silicon. and organic semiconductors containing organic compounds. Here, an example is shown in which an organic semiconductor is used as the semiconductor of the conductive layer. By using an organic semiconductor, The light emitting layer 193 of the light emitting element 190 and the active layer 113 of the light receiving element 110 are formed by the same method (for example, For example, the film can be formed by a vacuum deposition method, which is preferable since the manufacturing equipment can be shared.
[0208] The active layer 113 is made of an n-type semiconductor material such as fullerene (e.g., C 60 , C 70 The active layer 11 may be made of an organic semiconductor material having an electron-accepting property, such as ... a fluorine-containing compound or a derivative thereof. The p-type semiconductor material of 3 is copper(II) phthalocyanine (Copper(II ) phthalocyanine;CuPc) and tetraphenyldibenzoperfuranthe Tetraphenyldibenzoperiflanthene (DBP), Electron donor of lead phthalocyanine (ZnPc) Examples of suitable organic semiconductor materials include:
[0209] For example, the active layer 113 is preferably formed by co-evaporating an n-type semiconductor and a p-type semiconductor. It is.
[0210] In addition to the gates, sources and drains of transistors, various wiring and Materials that can be used for conductive layers such as electrodes include aluminum, titanium, chromium, Nickel, copper, yttrium, zirconium, molybdenum, silver, tantalum, and tungsten Examples of the materials include metals such as zinc and alloys that contain the metals as the main components. The film containing the compound may be used as a single layer or as a laminate structure.
[0211] Examples of the light-transmitting conductive material include indium oxide, indium tin oxide, and indium tin oxide. Conductive oxides such as gallium zinc oxide, zinc oxide, zinc oxide containing gallium, or graphite Alternatively, gold, silver, platinum, magnesium, nickel, tungsten, Metallic materials such as zinc, chromium, molybdenum, iron, cobalt, copper, palladium, and titanium Alternatively, a nitride of the metal material (e.g. For example, titanium nitride) may be used. Note that metal materials, alloy materials (or their nitrides) In the case of using a material such as a fluoride, it is preferable to make it thin enough to have light transmission. A laminated film of a material can be used as the conductive layer. For example, a silver-magnesium alloy and an insulator can be used. It is preferable to use a laminated film of dilute tin oxide or the like, since the electrical conductivity can be increased. These include conductive layers such as various wirings and electrodes that constitute the display device, and conductive layers of the display element. The conductive layer may also be used as a pixel electrode or a common electrode.
[0212] Examples of insulating materials that can be used for each insulating layer include acrylic resin, epoxy resin, and the like. Resins such as oils, silicon oxide, silicon oxynitride, silicon nitride oxide, silicon nitride, acid Examples of suitable insulating materials include inorganic insulating materials such as aluminum oxide.
[0213] [Configuration Example 4-2] FIG. 10A shows a cross-sectional view of a display device 100B. The display device 100B includes a lens 149 and The main difference from the display device 100A is that the display device 100A has a protective layer 195.
[0214] By providing a protective layer 195 that covers the light receiving element 110 and the light emitting element 190, The diffusion of impurities such as water into the light receiving element 110 and the light emitting element 190 is suppressed. The reliability of the optical element 190 can be improved.
[0215] In a region 228 near the end of the display device 100B, the insulating layer 214 is opened to form an insulating layer. It is preferable that the edge layer 215 and the protective layer 195 are in contact with each other. It is preferable that the inorganic insulating film of the protective layer 195 and the inorganic insulating film of the protective layer 195 are in contact with each other. This makes it possible to suppress the diffusion of impurities from the outside into the display section 162 via the organic insulating film. This makes it possible to improve the reliability of the display device 100B.
[0216] FIG. 10B shows an example in which the protective layer 195 has a three-layer structure. 5 is an inorganic insulating layer 195a on the common electrode 115 and an organic insulating layer 195a on the inorganic insulating layer 195a. 95b and an inorganic insulating layer 195c on the organic insulating layer 195b.
[0217] The end of the inorganic insulating layer 195a and the end of the inorganic insulating layer 195c are aligned with the end of the organic insulating layer 195b. The inorganic insulating layer 195a extends outward from the insulating layer 214 and contacts each other. The insulating layer 215 (inorganic insulating layer) comes into contact with the insulating layer 215 through the opening of the insulating layer 215 (organic insulating layer). The border layer 215 and the protective layer 195 can surround the light receiving element 110 and the light emitting element 190. Therefore, the reliability of the light receiving element 110 and the light emitting element 190 can be improved.
[0218] In this manner, the protective layer 195 may have a laminated structure of an organic insulating film and an inorganic insulating film. In this case, it is preferable that the end of the inorganic insulating film extends outward beyond the end of the organic insulating film. .
[0219] A lens 149 is provided on the surface of the substrate 152 facing the substrate 151. The lens 149 is The light receiving area of the light receiving element 110 overlaps with the lens 149, and In addition, it is preferable that the light receiving element 110 does not overlap with the light emitting layer 193. This can increase the sensitivity and accuracy of the sensor.
[0220] The lens 149 preferably has a refractive index for infrared light of 1.3 or more and 2.5 or less. The lens 149 may be formed using at least one of an inorganic material and an organic material. For example, a material containing resin can be used for the lens 149. In addition, oxides and sulfurs can be used. The lens 149 may be made of a material containing at least one of the following:
[0221] Specifically, resins containing chlorine, bromine, or iodine, resins containing heavy metal atoms, resins containing aromatic rings, Resins containing sulfur, resins containing sulfur, etc. can be used for the lens 149. A material containing nanoparticles of a material having a higher refractive index than the resin can be used for the lens 149. Titanium oxide or zirconium oxide, for example, can be used for the nanoparticles.
[0222] Also, cerium oxide, hafnium oxide, lanthanum oxide, magnesium oxide, niobium oxide , tantalum oxide, titanium oxide, yttrium oxide, zinc oxide, indium and tin containing oxide The lens 149 may be made of a material such as an oxide containing indium, gallium, and zinc, or an oxide containing indium, gallium, and zinc. Alternatively, zinc sulfide or the like can be used for the lens 149.
[0223] In the display device 100B, the protective layer 195 and the substrate 152 are attached to each other by the adhesive layer 142. The adhesive layer 142 is laminated on the light receiving element 110 and the light emitting element 190. The display device 100B has a solid sealing structure.
[0224] [Configuration Example 4-3] FIG. 11A shows a cross-sectional view of the display device 100C. The display device 100C has a transistor The display device 100A is different from the display device 100B mainly in that it has a different structure and does not have a light-shielding layer BM and a lens 149. They are different.
[0225] The display device 100C includes a transistor 208, a transistor 209, and a and transistor 210.
[0226] The transistors 208, 209, and 210 have gates A conductive layer 221 that functions as a gate insulating layer, an insulating layer 211 that functions as a gate insulating layer, a channel forming region 2 31i and a semiconductor layer having a pair of low resistance regions 231n, A conductive layer 222a connected to one of the pair of low resistance regions 231n, and a conductive layer 222 connected to the other of the pair of low resistance regions 231n. b, an insulating layer 225 functioning as a gate insulating layer, a conductive layer 223 functioning as a gate, The insulating layer 211 is formed between the conductive layer 221 and the channel 223. The insulating layer 225 is located between the conductive layer 223 and the channel forming region 231i. It is located between area 231i.
[0227] The conductive layer 222a and the conductive layer 222b are provided on the insulating layer 225 and the insulating layer 215, respectively. The conductive layer 222a and the conductive layer 222b are connected to the low resistance region 231n through the opening. Of 2b, one functions as a source and the other functions as a drain.
[0228] The pixel electrode 191 of the light emitting element 190 is connected to one of the transistors 208 via the conductive layer 222b. It is electrically connected to the other of the pair of low resistance regions 231n.
[0229] The pixel electrode 111 of the light receiving element 110 is connected to one of the transistors 209 via the conductive layer 222b. It is electrically connected to the other of the pair of low resistance regions 231n.
[0230] FIG. 11A shows an example in which an insulating layer 225 covers the top and side surfaces of the semiconductor layer. In FIG. 11B, the insulating layer 225 overlaps with the channel formation region 231i of the semiconductor layer 231. 2 shows an example of a transistor 202 that does not overlap with the low resistance region 231n. Layer 223 is used as a mask to process insulating layer 225, producing the structure shown in FIG. 11B. In FIG. 11B, an insulating layer 215 is provided over the insulating layer 225 and the conductive layer 223. The conductive layer 222a and the conductive layer 222b are each exposed to a low resistance Further, an insulating layer 218 may be provided to cover the transistor. stomach.
[0231] [Configuration Example 4-4] FIG. 12 shows a cross-sectional view of a display device 100D. The display device 100D has a different substrate configuration. The main difference between the display device 100 and the display device 100C is that.
[0232] The display device 100D does not have the substrate 151 and the substrate 152, but has the substrates 153, 154, It has an adhesive layer 155 and an insulating layer 212 .
[0233] The substrate 153 and the insulating layer 212 are bonded together by an adhesive layer 155. and protective layer 195 are attached to each other by adhesive layer 142 .
[0234] The display device 100D includes an insulating layer 212, a transistor 208, and a transistor 209 formed on a fabrication substrate. The transistor 209, the light receiving element 110, the light emitting element 190, etc. are transferred onto the substrate 153. The substrate 153 and the substrate 154 are each flexible. This makes it possible to improve the flexibility of the display device 100D.
[0235] The insulating layer 212 can be used for the insulating layers 211, 213, and 215. Alternatively, the insulating layer 212 may be made of a combination of an organic insulating film and an inorganic insulating film. In this case, the film on the transistor 209 side is an inorganic insulating film. It is preferable that
[0236] The above is a description of the configuration example of the display device.
[0237] The display device of this embodiment has a light receiving element and a light emitting element in a display portion, and the display portion displays an image. This allows the display unit to be connected to the outside or the display. Compared to a case where a sensor is provided outside the device, the electronic device can be made smaller and lighter. In addition, by combining with a sensor provided outside the display unit or the display device, more It is also possible to realize electronic devices having the following functions.
[0238] The light receiving element has at least one layer other than the active layer that is the same as the light emitting element (EL element). Furthermore, the light receiving element can be made up of all layers other than the active layer as a light emitting element (EL element). For example, in the process of manufacturing a light-emitting device, the active layer may be formed. By simply adding a process, it is possible to form a light emitting element and a light receiving element on the same substrate. In addition, the light receiving element and the light emitting element have pixel electrodes and common electrodes made of the same material and the same thickness. In addition, a circuit electrically connected to the light receiving element and a light emitting element can be formed in a single process. The display device can be manufactured by using the same material and the same process to electrically connect the display device and the circuit. The manufacturing process can be simplified. In this way, a light receiving element can be built in without complicated processes. A highly convenient display device can be manufactured.
[0239] [Examples of electronic device configurations] The display device of one embodiment of the present invention can acquire various types of bioinformation using infrared light and visible light. Such biometric information can be used for both personal authentication and healthcare purposes. It can be used for those who want to
[0240] Among the biometric information that can be acquired using the display device of one embodiment of the present invention, Representative examples of biometric information that can be used include fingerprints, palm prints, veins, and irises. These biometric information can be obtained using infrared light or visible light. The color information is preferably obtained by infrared light.
[0241] In addition, among the bioinformation that can be acquired using the display device of one embodiment of the present invention, Biometric information that can be used for Scare purposes includes pulse wave, blood glucose level, oxygen saturation, neutral Fat concentration, etc.
[0242] Furthermore, the electronic device in which the display device is mounted may be provided with a means for acquiring other biological information. For example, in addition to biometric information such as electrocardiogram, blood pressure, and body temperature, facial expression, complexion, and pupil In addition, the number of steps, exercise intensity, elevation change, and diet (intake) Information on calories, nutrients, etc. is also important for health care. By using the above, it is possible to manage your health in a comprehensive manner, and not only for daily health management but also for injuries and illnesses. This can also lead to early detection.
[0243] For example, blood pressure is determined by the difference in timing between the electrocardiogram and the pulse wave (the length of the pulse wave propagation time). When blood pressure is high, the pulse wave propagation time is short, and conversely, when blood pressure is low, the pulse The wave propagation time becomes longer. In addition, the relationship between the heart rate and blood pressure calculated from the electrocardiogram and pulse wave shows that It can also estimate the user's physical condition. For example, if both your heart rate and blood pressure are high, it can indicate an emergency. Conversely, if both the heart rate and blood pressure are low, it can be assumed that the patient is in a relaxed state. In addition, if the patient continues to have low blood pressure and a high heart rate, may have heart disease, etc.
[0244] The user can use the biometric information measured by electronic devices and the information estimated based on the biometric information. Since you can check your physical condition at any time, your health consciousness will improve. As a result, you will be able to avoid overeating and drinking. Review your daily habits, such as taking care of your health and exercising appropriately. This may also be an opportunity to seek medical attention if necessary.
[0245] [Configuration Example 1] FIG. 13 shows a schematic diagram of an electronic device 80. The electronic device 80 is a tablet terminal. The electronic device 80 includes at least a housing 82 and a display unit 81. The display device according to one embodiment of the present invention is applied to the display unit 81.
[0246] The electronic device 80 is configured such that a user holds a hand 60a over or touches a display unit 81. This makes it possible to perform personal authentication and obtain biometric information of the user.
[0247] When the user places his / her hand 60a on the display unit 81, the electronic device 80 recognizes the shape of the hand. Then, the acquisition of biometric information suitable for each area corresponding to each part of the hand 60a can be performed. For example, in an area 85a corresponding to the fingertip of a hand 60a, a fingerprint shape and a vein shape are In addition, in the area 85b corresponding to the pad of the finger, an image of the vein shape can be captured. In the region 85c corresponding to the palm, the palm It is possible to perform imaging of the fingerprint, the vein, the arteriole, the dermis, etc. Palm print and vein images can be used for personal authentication. Biometric information can be obtained from the image.
[0248] In addition, when acquiring biometric information, an image of a hand shape is displayed on the display unit 81. The user may be prompted to place the hand 60a according to the shape of the hand 60a. The recognition accuracy can be improved.
[0249] In this way, every time personal authentication is performed to start up the electronic device 80, the user It is possible to acquire biometric information continuously without the user being aware of it. Since biometric information can be accumulated, continuous health management can be performed. There is no need for users to run application software for health management each time. This is preferable because there is no risk of interruption in the acquisition and updating of biometric information.
[0250] [Configuration Example 2] FIG. 14A shows a schematic diagram of an electronic device 80a. The electronic device 80a is the same as the electronic device In addition to 80 , it has a pair of electrodes 83 , a camera 84 , and a microphone 86 .
[0251] The pair of electrodes 83 are provided in a part of the housing 82, sandwiching the display unit 81 therebetween. The electrodes 83 function as electrodes for obtaining an electrocardiogram. The user holds the pair of electrodes 83 with both hands. As shown in FIG 14A, a pair of electrodes By arranging 83 in the longitudinal direction of the housing 82, when using the electronic device 80a with a landscape screen, Therefore, an electrocardiogram can be acquired without the user being aware of it.
[0252] The camera 84 can capture an image of the user's face, etc. It is possible to obtain biometric information such as facial expressions, pupils, irises, and complexion.
[0253] The microphone 86 can capture the user's voice. It is possible to obtain voiceprint information that can be used for identification. By monitoring the changes in the quality of the voice, it can also be used for health management.
[0254] FIG. 14B shows an example of the electronic device 80a in use. The electrocardiogram information 88a and the heart rate information 88b obtained by the electrode 83 are inferred from various biological information. A character image 88c showing the user's specified health condition information is displayed. .
[0255] [Configuration Example 3] FIG. 15A shows an electronic device 80b in which a display unit 81 can be folded into three parts. The electronic device 80b has a display unit 81 extending from the housing 82a to the housing 82b and the housing 82c. The display unit 81 is a flexible display device.
[0256] The housing 82a and the housing 82b are connected by a connecting portion 89a. The electronic device 80b is connected to the body 82c by a connecting portion 89b. It can be transformed into an open state and a state in which the display unit 81 is folded in three.
[0257] As shown in FIG. 15A, a pair of electrodes 83 is connected to a user when the electronic device 80b is deformed. This allows the electronic device 80b to be opened and closed with ease. It is possible to obtain vital signs (such as an electrocardiogram) without the wearer even realizing it.
[0258] FIG. 15B shows an electronic device 80c in which a display unit 81 can be folded in two. The electronic device 80c includes a housing 82d and a housing 82e connected by a connecting portion 89c. A display unit 81 is provided.
[0259] Here, an example is shown in which the display unit 81 is folded inward. It may be configured to be folded outward.
[0260] 16A and 16B show a wristwatch-type electronic device 80d. The display unit 81, the housing 82, the pair of bands 87, the sensor 77, the bezel 75, and the button 7 It has 6th place.
[0261] The above-mentioned display device can be applied to the display unit 81. By touching the display unit 81 with a fingertip, a fingerprint The display unit 81 can also function as a touch panel. Cut.
[0262] The sensor 77 is provided on the side of the housing 82 opposite to the side on which the display unit 81 is provided. The sensor 77 is located at the part that touches the arm. The sensor 77 may be a contact sensor or an optical sensor. Contact sensors can be used to obtain vital signs such as heartbeat and body temperature. The optical sensor can detect blood vessels, the dermis, etc., using infrared or visible light. Biometric information can be obtained from
[0263] Inside the housing 82, various sensors such as an acceleration sensor, a magnetic sensor, and an ultraviolet ray sensor are installed. These sensors can be used to record the user's posture, activity, and environment. You can get boundary information.
[0264] [System configuration example] According to one aspect of the present invention, various types of biometric information can be obtained periodically and continuously. This biometric information can be used for personal authentication and health management.
[0265] For example, biometric information that can be obtained using visible light and infrared light includes fingerprints, palm prints, static These include pulse shape, pulse wave, respiratory rate, pulse rate, oxygen saturation, blood sugar level, and triglyceride concentration. In addition, facial expressions, complexion, pupils, and voiceprints are also included. This is preferable because it allows a comprehensive assessment of the user's health condition.
[0266] Each of the measured vital signs is individually determined to be normal or abnormal. Based on the results of these multiple judgments, the user's health condition can be judged. Or, the user's condition can be judged for each of the multiple biological information measured ( For example, the pulse rate can be judged as high, low, or normal based on the value of the pulse rate. Based on the measurement result, the health status of the user may be determined. The reasoning behind the results is clear, making it easy to suggest improvements to users. There is Litt.
[0267] On the other hand, feature values are extracted from all the measured biometric information, and the user's According to such a method, not only individual biometric information but also multiple biometric information may be used to determine the health status of the individual. Since it is easy to make a judgment based on the correlation between the number of biometric information, the detection accuracy can be improved. do.
[0268] As a classifier or discriminator for determining the user's health condition from various biometric information, It is preferable to use a machine learning model trained by machine learning. There are three main types of machine learning: supervised machine learning, unsupervised machine learning, and outlier detection.
[0269] Supervised machine learning includes K-nearest neighbors, naive Bayes classifiers, decision trees, and Support Vector Machines (SVM), Random Forests, and Neural Networks. In particular, by using a neural network, it is possible to learn at the feature extraction stage. Since it is possible to extract features from multiple pieces of information, it is suitable for supervised machine learning. In order to do this, labeled information is required. A trained model may be used, or the biometric information may be input by the user at the time of acquisition. The learning model is trained using information such as health status and other factors as labels, and is updated periodically. It is also possible to estimate the user's health condition based on facial expressions, voiceprints, activity levels, and other information. The information may be used as labels to perform learning, and the learning model may be updated as needed.
[0270] Principal component analysis (PCA) is a method for extracting features used in unsupervised machine learning. incipal component analysis) and non-negative matrix factorization (NM F: Non-negative Matrix Factorization) are listed. In addition, k-means clustering and DBSCAN (Den City-Based Spatial Clustering of Applica tions with Noise).
[0271] To judge the multiple biological information acquired, a supervised machine learning model and an unsupervised machine learning model are used. In this case, the classification is performed using an unsupervised machine learning model. The labels for each classification may be the same as those used in other supervised machine learning models. .
[0272] Outlier detection is performed by detecting characteristics of acquired biometric data or one or more pieces of biometric data. Detect whether the feature is an outlier outside the normal range. When this occurs, it is estimated that there is a high possibility that the user's health condition is out of the normal range.
[0273] Models for detecting outliers include the k-nearest neighbor method and LOF (Local Outlier Detector). Factor), One class SVM, Mahalanobis distance, etc. For detection, it is effective to use multi-dimensional data that combines various information. For example, The user's state (standing, sitting, or moving) when taking biometric data This is particularly effective when there is a strong correlation between the acquired biometric information and the By detecting outliers based on this information, it is possible to make judgments that take into account the user's condition. This prevents false positives. In addition, biometric information is automatically updated according to the user's condition. If the information changes over time (e.g. pulse rate, respiratory rate, etc.), a sliding window method is used. Dynamic Time Warping (DTW) method, singular spin Also, if the biological information changes periodically, the LS TM (Long Short Term Memory) and other predictive models The disconnection may be detected.
[0274] An example of the configuration of a system according to one embodiment of the present invention and an example of the operation of the system will be described below with reference to the drawings. This will be described with reference to the following.
[0275] FIG. 17 shows a block diagram of a system 90 including a display device according to one embodiment of the present invention. The system 90 includes a calculation unit 91, a storage unit 92, an input unit 93, an output unit 94, and a bus line. The system 90 includes various electronic devices having a display unit, such as the electronic device 80 described above. It can be applied to child devices.
[0276] The calculation unit 91 is connected to a storage unit 92, an input unit 93, an output unit 94, etc. via a bus line 95. It has the function of connecting these devices and controlling them comprehensively.
[0277] The storage unit 92 has a function of storing data, programs, etc. 2. Learning model for fingerprint authentication 92a, learning model for vein authentication 92b, and anomaly detection Learning model for knowledge 92c, and the biometric information of users acquired in the past and recorded abnormalities Local data 92d including general information is stored.
[0278] The input unit 93 has a function of acquiring various biological information. In this embodiment, the input unit 93 includes a light sensor 93a, a camera 9 3b, a microphone 93c, and an electrocardiogram monitor 93d. For this purpose, a sensor using a light receiving element provided in the display device can be applied. The sensor 93d is a pair of electrodes for measuring an electrocardiogram, a voltage between the electrodes, or and a measuring instrument for measuring the value of the current flowing through the
[0279] The output unit 94 has a function of providing information to the user. As an example, a display 94a, a speaker 94b, and a vibration device 94c are shown. For example, when the health condition is determined to be abnormal, the output unit 94 notifies the user. This can be used to issue an alert to
[0280] A display device according to one embodiment of the present invention includes a light-receiving element that functions as a light sensor and a display portion. Since the light emitting element is included, the optical sensor 93 of the input unit 93 shown in FIG. a of the system 94, and the display 94a of the output unit 94. 0 is realized by a configuration having the display device, a calculation unit 91, and a storage unit 92. can be done.
[0281] For example, the display device has a function for acquiring biometric information such as a user's fingerprint or vein, The calculation unit 91 calculates the learning model 92a or the learning model 92b stored in the memory unit 92 and the Based on the biometric information, fingerprint authentication or vein authentication can be performed.
[0282] In addition, the display device can display other vital information of the user (oxygen saturation, blood glucose level, triglyceride concentration, etc.) ), and the calculation unit 91 has a function of acquiring a learning model 92c stored in the storage unit 92, Anomaly detection can be performed based on the biological information.
[0283] An example of how the system of one embodiment of the present invention operates is described below. 18 is a flowchart showing a method of operating the system. The process includes steps S0 to S9.
[0284] In step S0, an operation is started. For example, the power of an electronic device is turned on. When it detects that the display is touched or that the electronic device's position has changed, The operation begins.
[0285] In step S1, it is determined whether authentication is required. If the system is in a logged-in state, it is determined that authentication is not required, and the process proceeds to step S4. On the other hand, if the user is in a logged-off state, it is determined that authentication is necessary, and the process proceeds to step S2. Migrate.
[0286] In step S2, authentication information is acquired. For example, the user's fingerprint, palm print, vein pattern, etc. The apparatus captures an image of the subject, and obtains biometric information from the captured image.
[0287] In step S3, it is determined whether authentication has been performed correctly. For example, a fingerprint or palm print is used. Or the vein information is compared with the user's information registered in advance to see if there is a match. In addition, the judgment is made based on machine learning such as the learning model 92a and the learning model 92b. This can be done using a model, or pattern matching without using a machine learning model. If the authentication is successful, the system login is After the authentication is performed, the process proceeds to step S4. If the authentication is not performed correctly, the system The logged-off state is maintained, and the process returns to step S1.
[0288] In step S4, biological information is acquired to be used for determining the health condition. The biometric information can be acquired by each component of the input unit 93. Examples of information include fingerprints, palm prints, vein patterns, pulse waves, respiratory rate, oxygen saturation, blood sugar levels, and It is preferable to obtain one or more pieces of information from the following: fat concentration, facial expression, complexion, pupils, voiceprint, body temperature, etc. I wish.
[0289] In step S5, abnormality detection is performed using the acquired biological information. This can be performed using the learning model 92c for the above-mentioned anomaly detection.
[0290] In step S6, it is determined whether the result of the abnormality detection is abnormal or not. If it is determined that there is no abnormality, the process proceeds to step S7. If so, the process proceeds to step S8.
[0291] In step S7, the acquired biometric data or its processed data (feature amount, etc.) etc.) are labeled as not being abnormal and stored in the memory unit 92 as learning data. This adds to the local data 92d that is generated for each user. This allows for the construction of a system that can improve the accuracy of anomaly detection.
[0292] In step S8, an operation is performed to alert the user of the abnormality. For example, the components of the output unit 94 can be used to provide a user with visual, auditory, tactile, olfactory, and other information. As a more specific example, the display 94a displays images or Displaying text, notifying the user as audio information using the speaker 94b, vibration The device 94c is used to perform an action such as vibrating an electronic device. It is preferable to execute one or more simultaneously, as this makes it easier for users to become aware of the situation.
[0293] In step S9, an abnormality is detected in the acquired biometric data or the processed data. The label is added to the local data 92d stored in the storage unit 92. .
[0294] After step S9, the process may proceed to step S4 as shown in FIG.
[0295] In this way, the system according to one aspect of the present invention performs operations related to health management of the user. This can be combined with the authentication operation of the system. There is no need to run application software for management, and the electronic device can be started up or When logging in, you can manage your health without even thinking about it, so you can manage your health regularly and continuously. This will enable more efficient health management.
[0296] The above is a description of an example of the configuration and operation of the system according to one aspect of the present invention.
[0297] [About metal oxides] Metal oxides that can be used for the semiconductor layer will be described below.
[0298] In this specification, metal oxides containing nitrogen are also referred to as metal oxides. Metal oxides containing nitrogen are also called metal oxynitrides (MEs). For example, zinc oxynitride (ZnON) A nitrogen-containing metal oxide such as the above may be used for the semiconductor layer.
[0299] In this specification, CAAC (c-axis aligned crystal l), and CAC (Cloud-Aligned Composite) CAAC represents an example of a crystal structure, and CAC represents an example of a function or material configuration. .
[0300] For example, the semiconductor layer uses CAC (Cloud-Aligned Composite) OS (Oxide Semiconductor) can be used.
[0301] CAC-OS or CAC-metal oxide is a material that has a conductive function in some parts. The material has a function of insulating in part and a function of semiconductor in the whole material. Note that CAC-OS or CAC-metal oxide is used as the semiconductor of a transistor. When used in a dielectric layer, the conductive function is to allow the electrons (or holes) that serve as carriers to flow. The insulating function is to prevent the flow of electrons, which act as carriers. The function of switching (On / Off) is achieved by making the function of the sensor and the sensor's sensitivity work in a complementary manner. This function is added to CAC-OS or CAC-metal oxide. In the case of CAC-OS or CAC-metal oxide, By separating the functions, the functionality of both can be maximized.
[0302] In addition, CAC-OS or CAC-metal oxide is a conductive region and an insulating region. The conductive region has the above-mentioned conductive function, and the insulating region has the above-mentioned insulating function. In addition, the conductive region and the insulating region in the material are formed by nanoparticle layers. The conductive and insulating regions may be separated by a gap in the material. In addition, the conductive regions are observed as connected clouds with blurred edges. This may be the case.
[0303] In addition, in the CAC-OS or CAC-metal oxide, a conductive region and The insulating regions are each 0.5 nm to 10 nm, preferably 0.5 nm to 3 nm. They may be dispersed in the material at sizes of less than one millimeter.
[0304] In addition, CAC-OS or CAC-metal oxide has different band gaps For example, CAC-OS or CAC-metal ox The ide consists of a wide gap component due to the insulating region and a conductive region. In this configuration, when the carrier flows, In addition, carriers mainly flow in the narrow gap component. The component with a gap acts complementary to the component with a wide gap to produce a narrow gap. Carriers also flow to the wide gap component in conjunction with the component with a large gap. CAC-OS or CAC-metal oxide is used as the channel formation region of the transistor. When used in a transistor, it has a high current driving force in the on-state, i.e., a large on-current. , and high field effect mobility can be obtained.
[0305] That is, CAC-OS or CAC-metal oxide is a matrix composite. matrix composite, or metal matrix composite It can also be called a composite matrix.
[0306] Oxide semiconductors (metal oxides) are classified into single-crystal oxide semiconductors and other non-single-crystal oxide semiconductors. As a non-single crystal oxide semiconductor, for example, CAAC-OS (c- axis aligned crystalline oxide semiconductor ctor), polycrystalline oxide semiconductor, nc-OS (nanocrystalline ox ide semiconductor), pseudo amorphous oxide semiconductor (a-like OS : amorphous-like oxide semiconductor), and non and amorphous oxide semiconductors.
[0307] CAAC-OS has a c-axis orientation and multiple nanocrystals are connected in the ab-plane direction. The nanocrystals are connected together to form a distorted crystal structure. In a region, a lattice arrangement is formed between a region having a uniform lattice arrangement and another region having a uniform lattice arrangement. This refers to the point where the direction of the
[0308] Nanocrystals are basically hexagonal, but are not limited to regular hexagons and may have non-regular hexagonal shapes. In addition, the distortion may have lattice arrangements such as pentagons and heptagons. In CAAC-OS, clear grain boundaries are not observed even in the vicinity of the strain. It is difficult to confirm the presence of the lattice distortion. This is because the CAAC-OS has a lattice structure in the ab-plane direction. The oxygen atoms are not densely packed, and the bond distance between atoms is shortened by the substitution of metal elements. This is because distortion can be tolerated by changing the frequency band.
[0309] In addition, the CAAC-OS has a layer containing indium and oxygen (hereinafter, referred to as an In layer) and an element A layered crystal structure in which layers containing M, zinc, and oxygen (hereinafter, (M,Zn) layers) are stacked. (also called layered structure). Indium and element M can be substituted for each other. When the element M in the (M,Zn) layer is replaced with indium, the (In,M,Zn) layer Also, when the indium in the In layer is replaced with element M, (In,M) It can also be expressed as a layer.
[0310] CAAC-OS is a highly crystalline metal oxide. Since it is difficult to confirm the grain boundaries, the decrease in electron mobility caused by the grain boundaries is unlikely to occur. In addition, the crystallinity of metal oxides is reduced by the incorporation of impurities and the generation of defects. Therefore, CAAC-OS is designed to prevent impurities and defects (oxygen vacancies (V O :oxygen v It can also be said to be a metal oxide with low acancy. Metal oxides with CAAC-OS have stable physical properties. The metal oxides used are heat resistant and highly reliable.
[0311] nc-OS is a material that is used in microscopic regions (e.g., regions between 1 nm and 10 nm, especially regions between 1 nm and The atomic arrangement has periodicity in the region of 3 nm or less. There is no regularity in the crystal orientation between the crystals. Therefore, no orientation is observed throughout the film. Therefore, depending on the analysis method, nc-OS may be classified as a-like OS or amorphous oxide semiconductor. Sometimes it is indistinguishable from the body.
[0312] In addition, indium oxide, which is a type of metal oxide containing indium, gallium, and zinc, In the case of IGZO, the nanocrystals mentioned above make it stable. In particular, IGZO tends to have difficulty growing crystals in the air, Small crystals (e.g., crystals of a few mm or cm) are more difficult to measure than large crystals (here, crystals of a few mm or cm). , the nanocrystals mentioned above) may be structurally more stable.
[0313] The a-like OS is a metal oxide semiconductor that has a structure between the nc-OS and the amorphous oxide semiconductor. The a-like OS has voids or low density regions. The ke-OS has lower crystallinity than the nc-OS and CAAC-OS.
[0314] Oxide semiconductors (metal oxides) have a variety of structures, each with different properties. The oxide semiconductor of one embodiment of the present invention can be an amorphous oxide semiconductor, a polycrystalline oxide semiconductor, an a-li The ke-OS, nc-OS, and CAAC-OS may have two or more kinds.
[0315] The metal oxide film functioning as the semiconductor layer is heated with either an inert gas or an oxygen gas, or The metal oxide film can be formed by using both of the oxygen flow rate and the oxygen flow rate. There is no particular limitation on the ratio (oxygen partial pressure). However, in order to obtain a transistor with high field effect mobility, In this case, the flow rate ratio of oxygen (oxygen partial pressure) during the formation of the metal oxide film is 0% or more. 30% or less is preferable, 5% or more and 30% or less is more preferable, and 7% or more and 15% or less is even more preferable. Preferred.
[0316] The metal oxide preferably has an energy gap of 2 eV or more, and more preferably has an energy gap of 2.5 eV or less. More preferably, the electron energy is 3 eV or more, and even more preferably, the electron energy is 3 eV or more. The off-state current of a transistor is reduced by using a metal oxide with a wide energy gap. It is possible.
[0317] The substrate temperature during the deposition of the metal oxide film is preferably 350°C or less, and is preferably from room temperature to 200°C or less. More preferably, the temperature is from room temperature to 130° C., and even more preferably. The temperature is preferably room temperature, since the productivity can be increased.
[0318] The metal oxide film can be formed by sputtering. The LD method, the PECVD method, the thermal CVD method, the ALD method, the vacuum deposition method, etc. may also be used.
[0319] This concludes the explanation of metal oxides.
[0320] This embodiment may be combined, at least in part, with other embodiments described in this specification. It can be implemented in combination.
[0321] (Embodiment 2) In this embodiment, a display device of one embodiment of the present invention will be described with reference to FIGS.
[0322] A display device according to one embodiment of the present invention has a first pixel circuit having a light-receiving element and a light-emitting element. and a second pixel circuit. The first pixel circuit and the second pixel circuit each include a matrix. The plates are arranged in a square pattern.
[0323] FIG. 19A shows an example of a first pixel circuit having a light receiving element, and FIG. 19B shows an example of a first pixel circuit having a light emitting element. 2 shows an example of a second pixel circuit having a
[0324] The pixel circuit PIX1 shown in FIG. 19A includes a light receiving element PD, a transistor M1, a transistor The transistor M2, the transistor M3, the transistor M4, and the capacitance element C1. An example in which a photodiode is used as the optical element PD is shown.
[0325] The cathode of the light receiving element PD is electrically connected to the wiring V1, and the anode of the transistor M1 The gate of the transistor M1 is electrically connected to either the source or drain of the TX, and the other of the source and drain is one electrode of the capacitance element C1. The source or drain of the transistor M2 is electrically connected to the gate of the transistor M3. The transistor M2 has a gate electrically connected to the wiring RES and a source or drain The other of the drains is electrically connected to the wiring V2. One of the sources or drains is electrically connected to the wiring V3, and the other of the source or drain is connected to the transistor M4. The gate of the transistor M4 is electrically connected to either the source or drain of the The other of the source and drain is electrically connected to the wiring OUT1. .
[0326] A constant potential is supplied to the wiring V1, the wiring V2, and the wiring V3. When driving the transistor with a reverse bias, a potential lower than the potential of the wiring V1 is supplied to the wiring V2. The transistor M2 is controlled by a signal supplied to the wiring RES. A function that resets the potential of the node connected to the gate of M3 to the potential supplied to wiring V2. The transistor M1 is controlled by a signal supplied to the wiring TX, and the light receiving element P It has the function of controlling the timing at which the potential of the above node changes depending on the current flowing through D. The transistor M3 functions as an amplifying transistor that outputs an output according to the potential of the node. The transistor M4 is controlled by a signal supplied to the line SE, and A selection transistor that connects the output according to the potential to the wiring OUT1 and reads it out with an external circuit. It functions as:
[0327] The pixel circuit PIX2 shown in FIG. 19B includes a light-emitting element EL, a transistor M5, a transistor Here, the light-emitting element EL includes: This shows an example using a light-emitting diode. In particular, an organic EL element is used as the light-emitting element EL. It is preferable that
[0328] The transistor M5 has a gate electrically connected to the wiring VG and a source or drain The other of the source and drain is electrically connected to one of the capacitor elements C2. The source of the transistor M6 is electrically connected to the gate of the transistor M7. One of the drain and the anode of the light-emitting element EL is electrically connected to the wiring V4, and the other of the drain and the anode of the light-emitting element EL is electrically connected to the wiring V5. and electrically connected to either the source or the drain of the transistor M7. 7, the gate is electrically connected to the wiring MS, and the other of the source and drain is connected to the wiring OUT2 The cathode of the light-emitting element EL is electrically connected to a wiring V5.
[0329] A constant potential is supplied to the wiring V4 and the wiring V5. The transistor M can be set to a high potential and the cathode side can be set to a lower potential than the anode side. 5 is controlled by a signal supplied to the wiring VG to control the selection state of the pixel circuit PIX2. The transistor M6 also functions as a select transistor for selecting the It functions as a driving transistor that controls the current flowing through the light-emitting element EL according to the potential applied to the When the transistor M5 is in a conductive state, the potential supplied to the wiring VS is The potential is supplied to the gate, and the luminance of the light emitted from the light-emitting element EL can be controlled according to the potential. The transistor M7 is controlled by a signal supplied to the wiring MS, and together with the transistor M6, the light emitting The potential between the element EL and the transistor EL is output to the outside via a wiring OUT2.
[0330] In the display device of this embodiment, an image is displayed by making the light emitting element emit light in a pulsed manner. By shortening the driving time of the light emitting element, the power consumption of the display device can be reduced, and In particular, organic EL elements have excellent frequency characteristics, The frequency can be, for example, 1 kHz or more and 100 MHz or less.
[0331] Here, the pixel circuit PIX1 includes a transistor M1, a transistor M2, A transistor M3 and a transistor M4, and a transistor M5 of the pixel circuit PIX2, The transistors M6 and M7 each have a semiconductor layer in which a channel is formed. It is preferable to use a transistor including a metal oxide (oxide semiconductor) for the semiconductor device.
[0332] Using metal oxides that have a wider band gap than silicon and a lower carrier density The transistor can realize an extremely small off-state current. The off-state current causes the charge stored in the capacitor connected in series with the transistor to be discharged for a long period of time. Therefore, it is possible to hold the capacitance in series with the capacitance element C1 or the capacitance element C2. The transistors M1, M2, and M5 connected to the It is preferable to use a transistor in which a semiconductor is applied. Similarly, by using a transistor including an oxide semiconductor, the manufacturing cost of the It is possible.
[0333] In addition, the transistors M1 to M7 are made of a semiconductor having a channel formed therein. In particular, transistors using single crystal silicon or polycrystalline silicon can be used. By using highly crystalline silicon such as silicon nitride, it is possible to achieve high field effect mobility. This is preferable because it enables faster operation.
[0334] In addition, an oxide semiconductor is used for at least one of the transistors M1 to M7. In addition, a transistor using silicon is used. Good too.
[0335] In addition, in FIG. 19A and FIG. 19B, the transistor is an n-channel transistor. However, a p-channel transistor can also be used.
[0336] The transistors included in the pixel circuit PIX1 and the transistors included in the pixel circuit PIX2 are It is preferable that they are formed side by side on the same substrate. The transistors of the pixel circuit PIX1 and the transistors of the pixel circuit PIX2 are mixed in one area and periodically It is preferable to adopt a configuration in which the electrodes are arranged in an array.
[0337] In addition, a transistor and a capacitance element are provided at a position overlapping with the light receiving element PD or the light emitting element EL. It is preferable to provide one or more layers having one or both of these. This allows the effective occupation area of the path to be reduced, and a high-definition light receiving section or display section can be realized.
[0338] This embodiment may be combined, at least in part, with other embodiments described in this specification. It can be implemented in combination.
[0339] (Embodiment 3) In this embodiment, electronic devices according to one embodiment of the present invention will be described with reference to FIGS. do.
[0340] The electronic devices of this embodiment include the display device of one embodiment of the present invention. The display device of one embodiment of the present invention can be applied to the display portion. The device has a light detection function, so it can perform biometric authentication on the display or by touch. This allows the detection of touch or near-touch, improving the functionality and convenience of electronic devices. can be increased.
[0341] Examples of electronic devices include television sets, desktop or notebook computers, etc. Personal computers, computer monitors, digital signage, pachinko machines In addition to electronic devices with relatively large screens such as large game consoles, digital cameras, Digital video cameras, digital photo frames, mobile phones, portable game consoles, portable information Examples of the device include terminals, audio playback devices, etc.
[0342] The electronic device of this embodiment is a sensor (force, displacement, position, velocity, acceleration, angular velocity, rotation speed, ,distance, light, liquid, magnetic, temperature, chemical, sound, time, hardness, electric field, current, voltage, power, (including the ability to measure radiation, flow rate, humidity, gradient, vibration, odor, or infrared rays) It is okay to do so.
[0343] The electronic device of the present embodiment can have various functions. For example, Still images, videos, text images, etc.) on the display, touch panel function, calendar Functions such as displaying date, time, etc., and running various software (programs) function, wireless communication function, and function to read out programs or data recorded on a recording medium. They may have the following abilities:
[0344] The electronic device 6500 shown in FIG. 20A is a portable information device that can be used as a smartphone. It is a news terminal.
[0345] The electronic device 6500 includes a housing 6501, a display unit 6502, a power button 6503, and a button 6 504, a speaker 6505, a microphone 6506, a camera 6507, and a light source 6508. The display unit 6502 has a touch panel function.
[0346] The display device of one embodiment of the present invention can be applied to the display portion 6502.
[0347] FIG. 20B is a schematic cross-sectional view including the end of the housing 6501 on the microphone 6506 side.
[0348] A light-transmitting protective member 6510 is provided on the display surface side of the housing 6501. In the space surrounded by the protective member 6510, a display panel 6511, an optical member 6512, and a The touch sensor panel 6513, the printed circuit board 6517, the battery 6518, etc. are arranged. do.
[0349] The protective member 6510 includes a display panel 6511, an optical member 6512, and a touch sensor panel. The panel 6513 is secured in place by an adhesive layer (not shown).
[0350] In the area outside the display portion 6502, a part of the display panel 6511 is folded back. The folded part is connected to the FPC6515. IC6516 is mounted on the FPC6515. is connected to the terminal.
[0351] The flexible display of one embodiment of the present invention can be applied to the display panel 6511. This allows for extremely lightweight electronic devices. Because it is extremely thin, it is possible to mount a large-capacity battery (6518) while keeping the thickness of the electronic device to a minimum. Also, a part of the display panel 6511 can be folded back and an FPC 6515 can be attached to the back of the pixel area. By providing a connection portion with the above, an electronic device with a narrow frame can be realized.
[0352] An example of a television device is shown in FIG. 21A. A television device 7100 includes a housing 710 A display unit 7000 is built into the housing 710. This shows a configuration that supports 1.
[0353] The display device of one embodiment of the present invention can be applied to the display portion 7000.
[0354] The television device 7100 shown in FIG. 21A is operated by an operation switch provided on the housing 7101. This can be done by a separate remote control 7111 or the display unit 7000. The television may be provided with a touch sensor, and the television may be turned on or off by touching the display unit 7000 with a finger or the like. The remote control 7111 may operate the device 7100. The device may have a display unit that displays information output from the remote control unit 7111. Channel and volume control can be performed using the touch panel or operation keys. The image displayed on the display unit 7000 can be manipulated.
[0355] The television device 7100 includes a receiver and a modem. The receiver can receive general television broadcasts. It can also receive TV broadcasts by wire or by modem. By connecting to a wireless communication network, one-way (sender to receiver) or It is also possible to communicate information in both directions (between sender and receiver, or between receivers). be.
[0356] FIG. 21B shows an example of a notebook personal computer. The computer 7200 includes a housing 7211, a keyboard 7212, and a pointing device 72 13, an external connection port 7214, etc. The display unit 7000 is incorporated in the housing 7211. It is being done.
[0357] The display device of one embodiment of the present invention can be applied to the display portion 7000.
[0358] 21C and 21D show an example of digital signage.
[0359] The digital signage 7300 shown in FIG. 21C includes a housing 7301, a display unit 7000, and It also has a speaker 7303, etc. In addition, it has an LED lamp, an operation key (power switch, It can have a variety of devices, including operation switches, connection terminals, sensors, microphones, etc. .
[0360] FIG. 21D shows digital signage 7400 attached to a cylindrical pole 7401. The digital signage 7400 has a display unit 7000 provided along the curved surface of a pillar 7401. Yes.
[0361] 21C and 21D, the display device of one embodiment of the present invention is applied to the display portion 7000. It is possible.
[0362] The larger the display unit 7000, the more information can be displayed at one time. The wider the display unit 7000 is, the more easily it will catch people's attention, and the more effective it will be for advertising, for example. can.
[0363] By applying a touch panel to the display unit 7000, images or videos can be displayed on the display unit 7000. It is preferable because it not only displays the route information but also allows users to operate it intuitively. When used for purposes such as providing information such as road safety or traffic information, This can further improve usability.
[0364] Also, as shown in FIG. 21C and FIG. 21D, a digital signage 7300 or a digital The Tal Signage 7400 is a display that displays information on smartphones and other information terminals carried by users. It is also preferable that the information terminal 7411 and the like can be linked by wireless communication. The advertisement information displayed on the display unit 7000 is input to the information terminal 7311 or the information terminal 7411. The information can be displayed on the screen of the information terminal 7311 or the information terminal 7411. By operating the buttons, the display on the display unit 7000 can be switched.
[0365] In addition, the Digital Signage 7300 or Digital Signage 7400 can be equipped with an information terminal. A game is played using the screen of the information terminal 7311 or the information terminal 7411 as the operation means (controller). This allows an unspecified number of users to participate in the game at the same time and have fun. You can enjoy it.
[0366] The electronic device shown in FIG. 22A to FIG. 22F includes a housing 9000, a display unit 9001, a speaker 9002, and a 003, operation keys 9005 (including a power switch or an operation switch), connection terminals 90 06, Sensor 9007 (force, displacement, position, speed, acceleration, angular velocity, rotation speed, distance, light, liquid , magnetic, temperature, chemical, sound, time, hardness, electric field, current, voltage, power, radiation, flow rate, (including functions for measuring humidity, gradient, vibration, odor or infrared rays), microphone 9 008, etc.
[0367] The electronic devices shown in FIG. 22A to FIG. 22F have various functions. For example, Still images, videos, text images, etc.) on the display, touch panel function, calendar Functions that display date, time, etc., and can be used by various software (programs) Functions for controlling processing, wireless communication functions, and programs or data recorded on recording media The functions of the electronic device are not limited to these. The electronic device may have multiple display units. Also, a camera or the like can be installed in the electronic device to take still images or videos and store them on a recording medium (external or It has the functions of storing the captured images on a memory card (built into the camera) and displaying the captured images on the display unit. Good too.
[0368] The electronic device shown in FIGS. 22A to 22F will be described in detail below.
[0369] FIG. 22A is a perspective view showing a mobile information terminal 9101. The mobile information terminal 9101 is, for example, For example, the portable information terminal 9101 can be used as a smartphone. A connector 9003, a connection terminal 9006, a sensor 9007, etc. may be provided. The 9101 can display text and image information on multiple sides. In addition, information 9051 indicated by a dashed rectangle is It may also be displayed on another surface of the display unit 9001. An example of the information 9051 is an electronic mail. Notifications of incoming e-mails, SNS, phone calls, etc.; subject of e-mails and SNS, sender name, date and time , time, remaining battery power, antenna reception strength, etc. Or, information 9051 is displayed An icon 9050 or the like may be displayed at the position where the icon is displayed.
[0370] FIG. 22B is a perspective view showing a mobile information terminal 9102. The mobile information terminal 9102 has a display. The display unit 9001 has a function of displaying information on three or more surfaces. The example shows how the user can see the information 9053 and the information 9054 on different sides. When the mobile information terminal 9102 is stored in the breast pocket of the clothes, Users can also check the information 9053 displayed in a position that can be observed from above. The display can be checked without taking the mobile information terminal 9102 out of a pocket, and for example, a telephone call can be made. You can decide whether to accept it or not.
[0371] FIG. 22C is a perspective view showing a wristwatch-type mobile information terminal 9200. The display unit 9001 can be used as a smart watch, for example. The display surface is curved, and display can be performed along the curved display surface. The portable information terminal 9200 communicates with, for example, a wireless headset. The mobile information terminal 9200 can also be used for hands-free conversation. 006, it is possible to transmit data to and from other information terminals and to charge the device. The charging operation may be performed by wireless power supply.
[0372] 22D, 22E, and 22F are oblique views showing a foldable mobile information terminal 9201. 22D shows the mobile information terminal 9201 in an unfolded state, and FIG. FIG. 22E is a perspective view of a state in the middle of changing from one of FIG. 22D to the other of FIG. 22F. The portable information terminal 9201 is highly portable when folded and is portable when unfolded. The seamless, wide display area provides excellent visibility of the display. The display unit 9001 is supported by three housings 9000 connected by hinges 9055. For example, the display unit 9001 can be bent with a radius of curvature of 0.1 mm to 150 mm. can be done.
[0373] This embodiment may be combined, at least in part, with other embodiments described in this specification. It can be implemented in combination. [Explanation of symbols]
[0374] 10A~10F: Display device 21, 22, 23a, 23c: Light 23b, 23d: Reflected light 30, 31B, 31G, 31R, 31W, 32: Pixels 41, 42: Transistors 5 0, 50a to 50g: display device 51, 51a, 51b, 52: substrate 53: light receiving element 54: Light-emitting element 55, 55a, 55b: Functional layer 57, 57B, 57G, 57R: Light-emitting element Element 58: Reflective layer 59, 59a to 59c: Light guide plate 60: Finger 60a: Hand 61: Contact Touch 62: Fingerprint 63: Imaging area 65: Stylus 66: Trajectory 67: Blood vessels 71 : Resin layer 72: Conductive layer 75: Bezel 76: Button 77: Sensor 80, 80a~ 80d: Electronic device 81: Display unit 82, 82a to 82e: Housing 83: Electrode 84: Mela 85a-85c: Area 86: Microphone 87: Band 88a, 88b: Information 8 8c: Character image 89a-89c: Connection section 90: System 91: Calculation section 9 2: Memory unit 92a to 92c: Learning model 92d: Local data 93: Input unit 9 3a: Optical sensor 93b: Camera 93c: Microphone 93d: ECG monitor 94: Output section 94a: Display 94b: Speaker 94c: Vibration device 95: Bus line
Claims
[Claim 1] A light emitting device comprising: a first substrate; a light guide plate; a first light emitting element; a second light emitting element; and a light receiving element; The first substrate and the light guide plate are provided opposite to each other, the first light emitting element and the light receiving element are provided between the first substrate and the light guide plate, the first light emitting element has a function of emitting a first light through the light guide plate, the second light emitting element has a function of emitting a second light to a side surface of the light guide plate, the light receiving element has a function of receiving the first light and converting it into an electrical signal, and a function of receiving the second light and converting it into an electrical signal; the first light includes visible light; The display device, wherein the second light includes infrared light.
Citation Information
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