Profile display device, laser device, and electronic device manufacturing method

Abstract

To solve the problem that optical axis adjustment takes time in the comparative example in which data of the beam profile is read into spreadsheet software.SOLUTION: A profile display device includes an interface configured to receive a beam profile of laser light, a processor configured to generate a shifted outline by shifting a position of an outline of the beam profile in accordance with deviation of a light intensity distribution in the beam profile, and a display configured to display the beam profile and the shifted outline.SELECTED DRAWING: Figure 3

Description

Technical Field

[0001] The present disclosure relates to a profile display device, a laser device, and a method for manufacturing an electronic device.

Background Art

[0002] In recent years, in semiconductor exposure apparatuses, as semiconductor integrated circuits have been miniaturized and highly integrated, improvement in resolution has been demanded. For this reason, the wavelength of light emitted from an exposure light source has been shortened. For example, as a gas laser device for exposure, a KrF excimer laser device that outputs laser light having a wavelength of about 248 nm and an ArF excimer laser device that outputs laser light having a wavelength of about 193 nm are used.

[0003] The spectral linewidth of the spontaneous emission light of a KrF excimer laser device and an ArF excimer laser device is as wide as 350 to 400 pm. Therefore, when a projection lens is configured with a material that transmits ultraviolet light such as KrF and ArF laser light, chromatic aberration may occur. As a result, the resolution may decrease. Therefore, it is necessary to narrow the spectral linewidth of the laser light output from the gas laser device to such an extent that chromatic aberration can be ignored. For this reason, a narrowbanding module (Line Narrowing Module: LNM) including a narrowbanding element (etalon, grating, etc.) may be provided in the laser resonator of the gas laser device to narrow the spectral linewidth. A gas laser device whose spectral linewidth is narrowed is called a narrowbanded gas laser device.

Prior Art Documents

Patent Documents

[0004]

Patent Document 1

[0005] A profile display device according to one aspect of the present disclosure includes an interface that receives a beam profile of laser light, a processor that generates a shifted outline by shifting the position of the outline of the beam profile according to the bias of the light intensity distribution in the beam profile, and a display that displays the beam profile and the shifted outline.

[0006] A laser device according to one aspect of the present disclosure includes a laser oscillator that outputs laser light, a beam profiler that acquires a beam profile of the laser light, a processor that generates a shifted outline by shifting the position of the outline of the beam profile according to the bias of the light intensity distribution in the beam profile, and a display that displays the beam profile and the shifted outline.

[0007] A method for manufacturing an electronic device according to one aspect of the present disclosure includes generating laser light by a laser device including a laser oscillator that outputs laser light, a beam profiler that acquires a beam profile of the laser light, a processor that generates a shifted outline by shifting the position of the outline of the beam profile according to the bias of the light intensity distribution in the beam profile, and a display that displays the beam profile and the shifted outline, outputting the laser light to an exposure device, and exposing the laser light onto a photosensitive substrate in the exposure device to manufacture an electronic device.

Brief Description of the Drawings

[0008] Some embodiments of the present disclosure will be described below by way of example only with reference to the accompanying drawings.

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[0009] <Content> 1. Comparative Example 1.1 Configuration of Exposure Apparatus 200 1.2 Operation of Exposure Apparatus 200 1.3 Configuration of Laser Device 100 1.4 Operation of Laser Device 100 1.5 Problems of Comparative Example 2. Profile Display Device 34 for Displaying Shifted Outline 51 2.1 Overview 2.2 Calculation of Centroid, Center, and Outline 50 2.3 Calculation of Shifted Outline 51 2.4 Display of Beam Profile and Shifted Outline 51 2.5 Function 3. Others

[0010] Hereinafter, embodiments of the present disclosure will be described in detail with reference to the drawings. The embodiments described below are examples of the present disclosure and do not limit the content of the present disclosure. Also, not all of the configurations and operations described in the embodiments are essential as the configurations and operations of the present disclosure. Note that the same reference numerals are assigned to the same components, and redundant descriptions are omitted.

[0011] 1. Comparative Example FIG. 1 shows the configuration of an exposure system in a comparative example. The comparative example of the present disclosure is a form recognized by the applicant as being known only to the applicant and is not a known example recognized by the applicant.

[0012] The exposure system includes a laser device 100 and an exposure device 200. The laser device 100 is configured to output laser light B2 toward the exposure device 200.

[0013] 1.1 Configuration of Exposure Device 200 The exposure device 200 includes an illumination optical system 201 and a projection optical system 202. The illumination optical system 201 illuminates a reticle pattern (not shown) of a reticle disposed on a reticle stage RT with the laser light B2 incident from the laser device 100. The projection optical system 202 reduces and projects the laser light B2 that has passed through the reticle and forms an image on a workpiece (not shown) disposed on a workpiece table WT. The workpiece is a photosensitive substrate such as a semiconductor wafer coated with a resist film.

[0014] 1.2 Operation of Exposure Device 200 The exposure device 200 synchronously moves the reticle stage RT and the workpiece table WT in opposite directions parallel to each other. As a result, the workpiece is exposed with the laser light B2 reflecting the reticle pattern. Through such an exposure process, the reticle pattern is transferred onto the semiconductor wafer. Thereafter, an electronic device can be manufactured through a plurality of processes.

[0015] 1.3 Configuration of Laser Device 100 FIG. 2 shows the configuration of the laser device 100 according to the comparative example. The laser device 100 includes a laser oscillator 1, a beam profiler 32, and a profile display device 34. The laser oscillator 1 includes a master oscillator MO, a beam steering unit 40, and a power oscillator PO.

[0016] The master oscillator MO includes a laser chamber 10, a pair of discharge electrodes 11a and 11b, a narrowbanding module 14, an output coupling mirror 15, slits 16a and 16b, and a pulse power supply (not shown).

[0017] The narrowbanding module 14 and the output coupling mirror 15 constitute a laser resonator. The laser chamber 10 is disposed on the optical path of the laser resonator. Windows 10a and 10b are provided at both ends of the laser chamber 10. The discharge electrodes 11a and 11b are disposed inside the laser chamber 10. A pulse power supply is connected to the discharge electrode 11a. The laser chamber 10 is filled with a laser gas containing, for example, argon gas or krypton gas as a rare gas, fluorine gas as a halogen gas, neon gas as a buffer gas, and the like.

[0018] The narrowbanding module 14 includes a prism 14b and a grating 14c. The prism 14b is disposed on the optical path of the light emitted from the window 10a. The grating 14c is disposed on the optical path of the light transmitted through the prism 14b. The posture of the narrowbanding module 14 can be changed by an optical axis adjustment mechanism 14a.

[0019] The output coupling mirror 15 is a partial reflection mirror and is disposed on the optical path of the light emitted from the window 10b. The posture of the output coupling mirror 15 can be changed by an optical axis adjustment mechanism 15a.

[0020] The beam steering unit 40 includes highly reflective mirrors 41 and 42. The highly reflective mirrors 41 and 42 are arranged in the optical path of the laser beam B1 output from the master oscillator MO. The highly reflective mirrors 41 and 42 can have their postures changed by the optical axis adjustment mechanisms 41a and 42a, respectively.

[0021] The power oscillator PO is arranged in the optical path of the laser beam B1 that has passed through the beam steering unit 40. The power oscillator PO includes a laser chamber 20, a pair of discharge electrodes 21a and 21b, a rear mirror 24, an output coupling mirror 25, slits 26a and 26b, and a pulse power supply (not shown).

[0022] Each of the rear mirror 24 and the output coupling mirror 25 is a partial reflection mirror. The rear mirror 24 and the output coupling mirror 25 can have their postures changed by the optical axis adjustment mechanisms 24a and 25a, respectively. The reflectivity of the rear mirror 24 is set higher than that of the output coupling mirror 25. The rear mirror 24 and the output coupling mirror 25 constitute a laser resonator. The laser chamber 20 is arranged in the optical path of the laser resonator. Windows 20a and 20b are provided at both ends of the laser chamber 20.

[0023] Regarding other points, the above-described components of the power oscillator PO are the same as the corresponding components of the master oscillator MO.

[0024] The discharge directions between the discharge electrodes 11a and 11b and between the discharge electrodes 21a and 21b are the V direction or the -V direction. The output direction of the laser beam B1 from the output coupling mirror 15 is the -Z direction, and the output direction of the laser beam B2 from the output coupling mirror 25 is the Z direction. The V direction and the Z direction are perpendicular to each other, and the directions perpendicular to both of them are the H direction and the -H direction. Since the V-direction interval between the discharge electrodes 11a and 11b and between the discharge electrodes 21a and 21b is longer than the H-direction width of the discharge electrodes 11a and 11b and the discharge electrodes 21a and 21b, the shape of the beam cross-section of the laser beam B2 is a rectangle that is longer in the V direction than in the H direction.

[0025] Each of the optical axis adjustment mechanisms 14a, 15a, 24a, 25a, 41a, and 42a includes, for example, a first adjustment axis (not shown) that rotates about an axis parallel to the V direction and a second adjustment axis (not shown) that rotates about an axis parallel to the H direction. The first and second adjustment axes are manually adjusted by first and second screws (not shown), respectively. Alternatively, the first and second adjustment axes may be adjusted by first and second actuators (not shown), respectively. Each of the narrowbanding modules 14, rear mirrors 24, output coupling mirrors 15 and 25, and high reflection mirrors 41 and 42 corresponds to an optical element in the present disclosure. Each of the optical axis adjustment mechanisms 14a, 15a, 24a, 25a, 41a, and 42a can operate in parallel with the output of the laser beams B1 and B2.

[0026] A slit 36 and a beam splitter 31 are arranged in the optical path of the laser beam B2 output from the power oscillator PO. A beam profiler 32 is arranged in the optical path of the laser beam B2 that passes through the slit 36 and is reflected by the beam splitter 31. The beam profiler 32 includes, for example, a transfer optical system (not shown) and an image sensor.

[0027] The profile display device 34 includes a processor 30 and a display 33. The processor 30 is a processing device that includes an interface I / F that receives data of the beam profile output from the beam profiler 32, a memory 301 that stores a control program, and a CPU (central processing unit) 302 that executes the control program. The processor 30 is specially configured or programmed to execute various processes included in the present disclosure. The display 33 may be, for example, a liquid crystal display, an LED display, or a projector that projects an image onto a screen.

[0028] 1.4 Operation of the laser device 100 When the pulse power source included in the master oscillator MO generates a high-voltage pulse and this high-voltage pulse is applied to the discharge electrode 11a, a discharge occurs inside the laser chamber 10. Due to the energy of this discharge, the laser medium inside the laser chamber 10 is excited and transitions to a high-energy level. When the excited laser medium then transitions to a low-energy level, it emits light with a wavelength corresponding to the energy level difference. The light generated inside the laser chamber 10 exits the laser chamber 10 through the windows 10a and 10b.

[0029] The light emitted from the window 10a of the laser chamber 10 has its beam width expanded by the prism 14b and then enters the grating 14c. The light incident on the grating 14c from the prism 14b is reflected by the plurality of grooves of the grating 14c and diffracted in a direction corresponding to the wavelength of the light. The prism 14b reduces the beam width of the diffracted light from the grating 14c and returns the light to the laser chamber 10 through the window 10a.

[0030] The output coupling mirror 15 transmits and outputs a part of the light emitted from the window 10b of the laser chamber 10, and reflects the other part and returns it to the inside of the laser chamber 10 through the window 10b.

[0031] In this way, the light emitted from the laser chamber 10 travels back and forth between the narrowbanding module 14 and the output coupling mirror 15 and is amplified each time it passes through the discharge space inside the laser chamber 10. This light is narrowbanded each time it is reflected by the narrowbanding module 14. The slits 16a and 16b block the ends of the beam cross-section with poor beam quality. In this way, the laser-oscillated and narrowbanded light is output as laser light B1 from the output coupling mirror 15.

[0032] The beam steering unit 40 guides the laser light B1 output from the master oscillator MO to the power oscillator PO so that the laser light B1 enters the laser chamber 20 through the rear mirror 24.

[0033] The pulse power source included in the power oscillator PO generates a high-voltage pulse, and this high-voltage pulse is applied to the discharge electrode 21a. The operation timing of the pulse power sources included in each of the master oscillator MO and the power oscillator PO is set so that the timing at which the laser beam B1 output from the master oscillator MO enters the inside of the laser chamber 20 is synchronized with the timing at which discharge occurs inside the laser chamber 20.

[0034] The laser beam B1 reciprocates between the rear mirror 24 and the output coupling mirror 25 and is amplified each time it passes through the discharge space inside the laser chamber 20. The slits 26a and 26b block the light of the end portions of the beam cross-section with poor beam quality. The amplified laser beam B2 is output from the output coupling mirror 25.

[0035] The slit 36 blocks the light of the end portions of the beam cross-section of the laser beam B2 with poor beam quality. The beam splitter 31 transmits a part of the laser beam B2 with a high transmittance and reflects the other part to make it enter the beam profiler 32. The beam profiler 32 acquires the beam profile of the laser beam B2 and outputs the data of the beam profile to the processor 30. The processor 30 causes the image of the beam profile to be displayed on the display 33. Also, by reading the data of the beam profile into spreadsheet software, the difference between the position of the center and the position of the centroid of the beam cross-section can be calculated.

[0036] The maintenance personnel of the laser device 100 perform adjustments on the optical axis adjustment mechanisms 14a, 15a, 24a, 25a, 41a, 42a, etc. as much as possible based on the image of the beam profile, and then make a final determination of the completion of the adjustment by checking the difference between the position of the center and the position of the centroid of the beam cross-section calculated by the spreadsheet software. If the difference between the position of the center and the position of the centroid of the beam cross-section is not within the specified range, adjustments are made again.

[0037] 1.5 Problems of the Comparative Example In the comparative example, adjustments of the optical axis adjustment mechanisms 14a, 15a, 24a, 25a, 41a, 42a, etc. are made based on the image of the beam profile. However, there is a limit to visual adjustment, and ultimately, it is necessary to confirm the calculation result by spreadsheet software. To confirm by spreadsheet software, it is necessary to load the beam profile data into the spreadsheet software, which takes time for adjustment.

[0038] 2. Profile display device 34 that displays the shifted outer contour line 51 2.1 Overview FIG. 3 is a flowchart showing the operation of the profile display device 34 according to the embodiment. The configurations of the laser device 100 and the profile display device 34 in the embodiment are the same as those in the comparative example. The processor 30 included in the profile display device 34 performs the following processes to display the beam profile on the display 33.

[0039] In S100, the processor 30 receives the beam profile of the laser beam B2 from the beam profiler 32. The reception of the beam profile is performed via the interface I / F.

[0040] In S200, the processor 30 calculates the centroid and center of the beam profile and generates the outer contour line 50 of the beam profile. The difference between the centroid and the center of the beam profile is an example of the bias of the light intensity distribution. The process of S200 and an example of the outer contour line 50 will be described with reference to FIGS. 4 to 8.

[0041] In S300, the processor 30 generates a shifted outer contour line 51 by shifting the position of the outer contour line 50 of the beam profile according to the bias of the light intensity distribution in the beam profile. The process of S300 and an example of the shifted outer contour line 51 will be described with reference to FIGS. 9 and 10.

[0042] In S400, the processor 30 starts displaying the beam profile received in S100 and the shifted outline 51 generated in S300. An example of the processing in S400 will be described with reference to FIGS. 11 and 12.

[0043] In S500, the processor 30 determines whether to end the display of the beam profile and the shifted outline 51. For example, if the maintenance staff gives an instruction to end the display, it is determined that the display will end. If the display is to be ended (S500: YES), the processor 30 ends the processing of this flowchart.

[0044] If the display is not to be ended (S500: NO), the processor 30 returns the processing to S100. As a result, when the display is not ended, a new shifted outline 51 (S300) is generated at regular intervals based on the newly received beam profile (S100), and the display of the beam profile and the shifted outline 51 is updated each time a new shifted outline 51 is generated (S400). Thus, if the beam profile changes due to the operation of the optical axis adjustment mechanisms 14a, 15a, 24a, 25a, 41a, and 42a, etc., the display of the beam profile and the shifted outline 51 is updated in real time.

[0045] 2.2 Calculation of the center of gravity, center, and outline 50 FIG. 4 is a flowchart showing an example of a process of calculating the center of gravity and center of a beam profile and generating the outline 50 of the beam profile. The process shown in FIG. 4 corresponds to the subroutine of S200 shown in FIG. 3.

[0046] In S201, the processor 30 calculates the position (Gx, Gy) of the center of gravity of the beam profile.

[0047] FIG. 5 shows an example of a beam profile and its center of gravity. The beam profile is represented by a two-dimensional light intensity distribution in the beam cross section. The horizontal direction in FIG. 5 is defined as the X direction, and the vertical direction is defined as the Y direction, and the X coordinate and the Y coordinate are defined. The X direction in the beam profile corresponds to the V direction in the beam cross section of the laser beam B2, and the Y direction in the beam profile corresponds to the H direction in the beam cross section of the laser beam B2. The minimum value of the X coordinate is 0, the maximum value is Xmax, the minimum value of the Y coordinate is 0, and the maximum value is Ymax. If the light intensity at the point (X, Y) is I(X, Y), the position (Gx, Gy) of the center of gravity of the beam profile can be calculated by the following formula. Gx = Σ(I(X, Y) × X) / Σ(I(X, Y)) Gy = Σ(I(X, Y) × Y) / Σ(I(X, Y))

[0048] Here, Σ(A) is a value obtained by adding A for all combinations from the minimum value to the maximum value of the X coordinate and the Y coordinate.

[0049] Referring to FIG. 4 again, in S202, the processor 30 generates an outline 50 of the beam profile. An example of the process of generating the outline 50 will be described below with reference to FIGS. 6 to 8.

[0050] FIG. 6 is a graph showing an example of the distribution of the light intensity I(Gy) along a straight line in the X direction passing through the position (Gx, Gy) of the center of gravity in FIG. 5. The horizontal axis in FIG. 6 indicates the X coordinate, and the vertical axis indicates the light intensity I(Gy) at the position Y = Gy. Let the maximum value of the light intensity I(Gy) be I(Gy)max, and a value obtained by multiplying I(Gy)max by a coefficient greater than 0 and less than 1, for example, 1 / e 2 be the threshold value I(Gy)th. As X is increased from the minimum value 0, when the value of the light intensity I(Gy) first reaches the threshold value I(Gy)th, the value of X is taken as X1. Also, as X is decreased from the maximum value Xmax, when the value of the light intensity I(Gy) first reaches the threshold value I(Gy)th, the value of X is taken as X2. X1 and X2 are not limited to being integers, and a fractional number may be obtained by interpolation calculation. The X direction corresponds to the first direction in the present disclosure.

[0051] FIG. 7 is a graph showing an example of the distribution of the light intensity I(Gx) along a straight line in the Y direction passing through the position (Gx, Gy) of the center of gravity in FIG. 5. By interchanging X and Y in the method described with reference to FIG. 6, Y1 and Y2 are obtained. The Y direction corresponds to the second direction in the present disclosure.

[0052] FIG. 8 shows an example of the outline 50 defined by X1, X2, Y1, and Y2 obtained in FIGS. 6 and 7. The shape of the outline 50 may be rectangular. The outline 50 is generated so as to surround the portions having a light intensity of threshold I(Gy)th or more and a light intensity of threshold I(Gx)th or more in the beam profile.

[0053] The present disclosure is not limited to this, and the outline 50 may be generated by performing edge detection in an image showing the beam profile. For example, by differentiating the distribution of the light intensity I(X, Y) in the X direction and the Y direction respectively, the positions where the absolute value of the luminance gradient is equal to or greater than the threshold can be detected as edges. When the slits 16a, 16b, 26a, 26b, and 36 are used, a clear edge can be expected. Thus, when obtaining the outline 50 without using the position (Gx, Gy) of the center of gravity, S201 in FIG. 4 may be after S202 or S203.

[0054] In S203, the processor 30 calculates the position (Cx, Cy) of the center of the outline 50. After S203, the processor 30 ends the processing of this flowchart and returns to the processing shown in FIG. 3.

[0055] As shown in FIG. 8, if the outline 50 is rotationally symmetric, the center of the figure defined by the outline 50 may be obtained as the center of the outline 50. For example, from X1, X2, Y1, and Y2 obtained in FIGS. 6 and 7, the position (Cx, Cy) of the center is calculated by the following formula. Cx = (X1 + X2) / 2 Cy = (Y1 + Y2) / 2

[0056] The center of the outer contour 50 may be determined by obtaining the centroid of the figure defined by the outer contour 50 as the center of the outer contour 50. This makes it possible to determine the center of the outer contour 50 even when the outer contour 50 is not rotationally symmetric.

[0057] 2.3 Calculation of the shifted outer contour 51 FIG. 9 is a flowchart showing an example of a process for generating the shifted outer contour 51. The process shown in FIG. 9 corresponds to the subroutine of S300 shown in FIG. 3.

[0058] In S301, the processor 30 calculates the shift of the centroid position (Gx, Gy) with respect to the center position (Cx, Cy) of the beam profile. For example, the X - direction component of the shift is Gx - Cx, and the Y - direction component of the shift is Gy - Cy.

[0059] In S302, the processor 30 generates the shifted outer contour 51 by moving the outer contour 50 according to the shift. After S302, the processor 30 ends the process of this flowchart and returns to the process shown in FIG. 3.

[0060] FIG. 10 shows the shifted outer contour 51 generated by shifting the position of the outer contour 50 according to the shift of the centroid with respect to the center of the beam profile. The shifted outer contour 51 is shifted by Gx - Cx in the X direction and Gy - Cy in the Y direction with respect to the outer contour 50.

[0061] 2.4 Display of the beam profile and the shifted outer contour 51 FIG. 11 is a flowchart showing an example of a process for starting the display of the beam profile and the shifted outer contour 51. The process shown in FIG. 11 corresponds to the subroutine of S400 shown in FIG. 3.

[0062] In S401, the processor 30 determines whether the deviation of the center of gravity from the center is within the allowable range. For example, it determines whether the deviation is less than or equal to a threshold value. If the deviation is not within the allowable range (S401: NO), the processor 30 proceeds to S402. If the deviation is within the allowable range (S401: YES), the processor 30 proceeds to S403.

[0063] In S402, the processor 30 starts the display by generating an image signal including the beam profile and the shifted outline 51 and transmitting it to the display 33.

[0064] FIG. 12 shows an example of the display of the beam profile and the shifted outline 51. By superimposing and displaying the shifted outline 51 on the image showing the beam profile, the deviation of the center of gravity of the beam profile from the center of the beam profile can be shown. In FIG. 12, by further displaying the outline 50 of the beam profile, the deviation of the center of gravity from the center is shown more clearly. However, in some cases where the slits 16a, 16b, 26a, 26b, and 36 are used, the deviation of the center of gravity from the center can be sufficiently shown without displaying the outline 50.

[0065] When both the outline 50 and the shifted outline 51 are displayed, it is desirable to display the outline 50 and the shifted outline 51 in different display formats. Different display formats may be, for example, different thicknesses, different colors, different line types such as solid lines, broken lines, dash-dot lines, wavy lines, or different intervals of the cutting positions of the broken lines. Also, it is desirable that the outline 50 and the shifted outline 51 have the same shape, the same size, and the same orientation. When the shifted outline 51, or both the outline 50 and the shifted outline 51, are rectangles with the X direction as the long side direction, this long side direction corresponds to the V direction.

[0066] Referring again to FIG. 11, in S403, in addition to the beam profile and the shifted outline 51, the processor 30 generates an image signal including information indicating that the deviation of the center of gravity with respect to the center is within the allowable range, and transmits it to the display 33. The information indicating that the deviation is within the allowable range may be indicated by characters such as "Optical axis adjustment OK", or may be indicated by an operation such as blinking or color change of the shifted outline 51. Also, in conjunction with the display by the display 33, a voice such as "Optical axis adjustment is completed" may be output from a speaker (not shown). After S402 or S403, the processor 30 ends the processing of this flowchart and returns to the processing shown in FIG. 3.

[0067] 2.5 Function (1) According to the embodiment, the profile display device 34 includes an interface I / F that receives the beam profile of the laser beam B2, and a processor 30 that generates a shifted outline 51 by shifting the position of the outline 50 of the beam profile according to the deviation of the light intensity distribution in the beam profile, and a display 33 that displays the beam profile and the shifted outline 51.

[0068] In order to indicate the deviation of the light intensity distribution in the beam profile, even if a single point of the center of gravity of the beam profile is displayed, it may be too small to be visible. Also, the center of gravity of the beam profile may be near the peak of the intensity or in a low-intensity region between two peaks, so when displayed together with the beam profile, the contrast may be low and the display of the center of gravity may be difficult to see. According to the embodiment, by displaying the shifted outline 51, the deviation of the light intensity distribution can be visually displayed more clearly than by displaying a single point of the center of gravity. In many cases, the vicinity of the outline 50 of the beam profile has a low intensity, and at least a part of the shifted outline 51 is shifted outside the beam regardless of the direction in which the outline 50 is shifted within the image. Therefore, for example, if the shifted outline 51 is displayed in a light color, a display with high contrast and easy to see can be obtained.

[0069] (2) According to the embodiment, the processor 30 generates the shifted outline 51 at regular intervals based on the beam profile newly received by the interface I / F. The display 33 updates the display of the beam profile and the shifted outline 51 each time the processor 30 generates the shifted outline 51.

[0070] According to this, since the beam profile and the shifted outline 51 are updated, it is possible to read how the shift has changed by the movement of the image.

[0071] (3) According to the embodiment, the shape of the outline 50 is rectangular.

[0072] According to this, the outline 50 can be generated by simple calculation. Further, when the rectangular outline 50 is displayed together with the rectangular shifted outline 51, the direction and amount of the shift can be clearly displayed.

[0073] (4) According to the embodiment, the processor 30 generates the outline 50 so as to surround the portion having a light intensity equal to or higher than the threshold values I(Gy)th and I(Gx)th in the beam profile.

[0074] According to this, the outline 50 can be generated by simple calculation.

[0075] (5) According to the embodiment, the processor 30 may generate the outline 50 by performing edge detection on the beam profile.

[0076] According to this, an outline 50 faithful to the shape of the beam profile can be generated.

[0077] (6) According to the embodiment, the processor 30 generates the shifted outline 51 by shifting the position of the outline 50 according to the shift of the center of gravity of the beam profile with respect to the center of the outline 50.

[0078] According to this, by performing display according to the deviation of the center of gravity with respect to the center, it is possible to obtain guidelines on in which direction and to what extent the optical axis adjustment should be performed in order to eliminate the deviation between the center and the center of gravity.

[0079] (7) According to the embodiment, the center of the outer contour 50 is the center of gravity of the figure defined by the outer contour 50.

[0080] According to this, even when the outer contour 50 has a complex shape that is not rotationally symmetric, the deviation between the center and the center of gravity can be clearly defined and displayed.

[0081] (8) According to the embodiment, when the light intensity at the point (X, Y) in the beam profile is I(X, Y), the processor 30 calculates the position (Gx, Gy) of the center of gravity by the following formula. Gx = Σ(I(X, Y) × X) / Σ(I(X, Y)) Gy = Σ(I(X, Y) × Y) / Σ(I(X, Y))

[0082] According to this, the position (Gx, Gy) of the center of gravity can be accurately obtained from the two-dimensional distribution of the light intensity I(X, Y).

[0083] (9) According to the embodiment, the processor 30 calculates the position Cx of the center in the X direction from the distribution of the light intensity I(Gy) along the straight line in the X direction passing through the position (Gx, Gy) of the center of gravity, and calculates the position Cy of the center in the Y direction from the distribution of the light intensity I(Gx) along the straight line in the Y direction passing through the position (Gx, Gy) of the center of gravity and intersecting the X direction.

[0084] According to this, by using the light intensity distribution along the straight line passing through the position (Gx, Gy) of the center of gravity, the position (Cx, Cy) of the center can be obtained by simple calculation.

[0085] (10) According to the embodiment, the processor 30 determines whether the bias of the light intensity distribution is within the allowable range, and the display 33 displays information indicating whether the bias of the light intensity distribution is within the allowable range according to the determination by the processor 30.

[0086] When the deviation between the center and the center of gravity is eliminated by adjusting the optical axis, the shifted outer contour line 51 may overlap with the original outer contour line 50 and become less visible. However, according to the embodiment, by displaying information indicating whether the deviation of the light intensity distribution is within the allowable range, it is possible to know that the deviation has been eliminated.

[0087] (11) According to the embodiment, the display 33 further displays the outer contour line 50.

[0088] According to this, even when the outer shape of the beam profile is not clear, by displaying the outer contour line 50, the deviation of the shifted outer contour line 51 can be clearly recognized.

[0089] (12) According to the embodiment, the display 33 displays the outer contour line 50 and the shifted outer contour line 51 in different display forms.

[0090] According to this, among the outer contour line 50 and the shifted outer contour line 51, which one is the shifted outer contour line 51 becomes clear, so that the direction of the deviation of the center of gravity can be clearly recognized.

[0091] (13) According to the embodiment, the outer contour line 50 and the shifted outer contour line 51 have the same shape and the same size.

[0092] According to this, by making both the shape and the size the same, the deviation of the positions of the center and the center of gravity can be clearly displayed.

[0093] (14) According to the embodiment, the laser device 100 includes a laser oscillator 1 that outputs a laser beam B2, a beam profiler 32 that acquires the beam profile of the laser beam B2, a processor 30 that generates a shifted outer contour line 51 by shifting the position of the outer contour line 50 of the beam profile according to the deviation of the light intensity distribution in the beam profile, and a display 33 that displays the beam profile and the shifted outer contour line 51.

[0094] According to this, by displaying the shifted outer contour line 51, the deviation of the light intensity distribution can be visually and clearly displayed more than displaying a single point of the center of gravity. In many cases, the vicinity of the outer contour line 50 of the beam profile has a low intensity, and since at least a part of the shifted outer contour line 51 shifts outside the beam in any direction in which the outer contour line 50 is shifted in the image, for example, if the shifted outer contour line 51 is displayed in a light color, a display with high contrast and easy to view can be obtained.

[0095] (15) According to the embodiment, the laser device 100 further includes a slit 36 disposed in the optical path of the laser beam B2 output from the laser oscillator 1.

[0096] According to this, since the outer shape of the beam profile becomes clear, even when the outer contour line 50 is not displayed, the positional relationship between the outer contour line 50 and the shifted outer contour line 51 can be easily grasped.

[0097] (16) According to the embodiment, the laser device 100 further includes optical axis adjustment mechanisms 14a, 15a, 24a, 25a, 41a, and 42a configured to be able to adjust the postures of the optical elements included in the laser oscillator 1. The display 33 updates the display of the shifted outer contour line 51 when the optical axis adjustment mechanisms 14a, 15a, 24a, 25a, 41a, and 42a are operated and the beam profile changes.

[0098] According to this, since the shifted outer contour line 51 is updated when the optical axis adjustment mechanisms 14a, 15a, 24a, 25a, 41a, and 42a are operated, it is possible to know how the operation of the optical axis adjustment mechanisms 14a, 15a, 24a, 25a, 41a, and 42a affects the change in the beam profile, and the optical axis adjustment can be performed efficiently.

[0099] (17) According to the embodiment, the laser oscillator 1 includes laser chambers 10 and 20 that contain laser gas, discharge electrodes 11a and 11b disposed in the laser chamber 10, and discharge electrodes 21a and 21b disposed in the laser chamber 20. The shape of the outer contour line 50 is rectangular, and the X direction, which is the direction of the long side of the rectangle, corresponds to the V direction, which is the direction of discharge by the discharge electrodes 11a, 11b, 21a, and 21b.

[0100] According to this, the direction of displacement of the shifted outer contour line 51 can be recognized based on the X direction, which is the direction of the long side of the outer contour line 50, and the optical axis adjustment can be performed based on the V direction, which is the direction of discharge. Therefore, by making the X direction and the V direction correspond to each other, it may become easier to match the outer contour line 50 and the shifted outer contour line 51 by optical axis adjustment.

[0101] (18) According to the embodiment, the optical axis adjustment mechanisms 14a, 15a, 24a, 25a, 41a, and 42a can adjust the posture of the optical element in parallel with the output of a plurality of pulses of the laser light B2 by the laser oscillator 1.

[0102] According to this, since the optical axis can be adjusted while outputting the laser light B2, the beam profile after adjusting the optical axis can be quickly obtained.

[0103] (19) According to the embodiment, the processor 30 determines whether the bias of the light intensity distribution is within the allowable range, and the display 33 displays information indicating whether the bias of the light intensity distribution is within the allowable range according to the determination by the processor 30.

[0104] According to this, as a result of operating the optical axis adjustment mechanisms 14a, 15a, 24a, 25a, 41a, and 42a, when the bias of the light intensity distribution is within the allowable range, it is possible to know that the adjustment of the optical axis is completed.

[0105] In other respects, the embodiment is the same as the comparative example.

[0106] 3. Others The above description is intended as an illustration only and not a limitation. Thus, it will be apparent to those skilled in the art that changes may be made to the embodiments of the present disclosure without departing from the scope of the claims. It will also be apparent to those skilled in the art that embodiments of the present disclosure may be used in combination.

[0107] The terms used throughout this specification and the claims should be construed as "non-limiting" terms unless otherwise specified. For example, terms such as "comprising," "having," "including," and "containing" should be construed as not excluding the presence of elements other than those described. Also, the modifier "one" should be construed to mean "at least one" or "one or more." Also, the term "at least one of A, B, and C" should be construed to mean "A," "B," "C," "A + B," "A + C," "B + C," or "A + B + C." Furthermore, it should be construed to include combinations with elements other than "A," "B," and "C."

Claims

1. An interface for receiving a beam profile of a laser beam, a processor that generates a shifted outline by shifting the position of the outline of the beam profile according to the bias of the light intensity distribution in the beam profile, a display that displays the beam profile and the shifted outline, A profile display device comprising:

2. The profile display device according to claim 1, wherein the processor generates the shifted outline at regular intervals based on the beam profile newly received by the interface, and the display updates the display of the beam profile and the shifted outline each time the processor generates the shifted outline. Profile display device.

3. The profile display device according to claim 1, wherein the shape of the outline is rectangular. Profile display device.

4. The profile display device according to claim 1, wherein the processor generates the outline so as to surround a portion having a light intensity equal to or higher than a threshold value in the beam profile. Profile display device.

5. The profile display device according to claim 1, wherein the processor generates the outline by performing edge detection on the beam profile. Profile display device.

6. The profile display device according to claim 1, wherein the processor generates the shifted outline by shifting the position of the outline according to the shift of the center of gravity of the beam profile with respect to the center of the outline. Profile display device.

7. The profile display device according to claim 6, wherein the center is the center of gravity of the figure defined by the outline. Profile display device.

8. The profile display device according to claim 6, wherein when the light intensity of a point (X, Y) in the beam profile is I(X, Y), the processor calculates the position (Gx, Gy) of the center of gravity by the following formula: Profile display device. Gx = Σ(I(X, Y) × X) / Σ(I(X, Y)) Gy = Σ(I(X, Y) × Y) / Σ(I(X, Y))

9. The profile display device according to claim 8, wherein the processor Calculate the position Cx of the center in the first direction from the distribution of the light intensity I(Gy) along a straight line in the first direction passing through the position (Gx, Gy) of the center of gravity. Calculate the position Cy of the center in the second direction from the distribution of the light intensity I(Gx) along a straight line in the second direction passing through the position (Gx, Gy) of the center of gravity and intersecting the first direction. Profile display device.

10. The profile display device according to claim 1, The processor determines whether the bias of the light intensity distribution is within an allowable range. The display displays information indicating whether the bias of the light intensity distribution is within an allowable range according to the determination by the processor. Profile display device.

11. The profile display device according to claim 1, The display further displays the outer contour line. Profile display device.

12. The profile display device according to claim 11, The display displays the outer contour line and the shifted outer contour line in different display formats. Profile display device.

13. The profile display device according to claim 11, The outer contour line and the shifted outer contour line have the same shape and the same size. Profile display device.

14. A laser oscillator that outputs laser light, A beam profiler that acquires the beam profile of the laser light, A processor that generates a shifted outer contour line by shifting the position of the outer contour line of the beam profile according to the bias of the light intensity distribution in the beam profile, A display that displays the beam profile and the shifted outer contour line, Laser device comprising.

15. The laser device according to claim 14, A slit disposed in the optical path of the laser light output from the laser oscillator Laser device further comprising.

16. The laser device according to claim 14, An optical axis adjustment mechanism configured to be able to adjust the posture of the optical element included in the laser oscillator Further comprising, When the beam profile changes when the optical axis adjustment mechanism is operated, the display updates the display of the shifted outer contour line. Laser device.

17. The laser device according to claim 16, The laser oscillator includes a laser chamber that houses a laser gas and a pair of discharge electrodes disposed in the laser chamber. The shape of the outer contour line is rectangular, and the direction of the long side of the rectangle corresponds to the direction of discharge by the discharge electrode. Laser device.

18. The laser device according to claim 16, The optical axis adjustment mechanism can adjust the posture of the optical element in parallel with the output of a plurality of pulses of the laser light by the laser oscillator. Laser device.

19. The laser device according to claim 16, The processor determines whether or not the deviation of the light intensity distribution is within an allowable range. The display displays information indicating whether or not the deviation of the light intensity distribution is within an allowable range according to the determination by the processor. Laser device.

20. A method for manufacturing an electronic device, A laser oscillator that outputs laser light, A beam profiler that acquires the beam profile of the laser light, A processor that generates a shifted outer contour line by shifting the position of the outer contour line of the beam profile according to the deviation of the light intensity distribution in the beam profile, A display that displays the beam profile and the shifted outer contour line, generating the laser light by a laser device including the above, outputting the laser light to an exposure device, exposing the laser light on a photosensitive substrate in the exposure device to manufacture the electronic device A method for manufacturing an electronic device including this.

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