Liquid supply device and liquid supply method

Abstract

To provide a liquid supply device and a liquid supply method which can suppress remaining of liquid in a pipeline and a flow channel.SOLUTION: A liquid supply device 1 includes: a first pipeline 11 having a first end 13 provided so as to be opened on the lower side of a liquid level in a storage part 10 storing liquid, and a second end 14 connected to a first connection port 4 of a flow channel 3 as a supply object 2; a second pipeline 21 having a first end 23 provided so as to be opened on the upper side of the liquid level in the storage part, and a second end 24 connected to a second connection port 5 of the flow channel; a transfer direction switching part 20 which is provide on one of the first pipeline and the second pipeline, and enables switching in the transfer direction of fluid transferred by a pump; and a control part 31 for performing switching control on the transfer direction switching part, and allowing the transfer direction switching part to execute a supply step of supplying the liquid toward the flow channel through the first pipeline, and a recovery step of supplying air toward the flow channel through the second pipeline, and recovering the liquid.SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present disclosure relates to a liquid supply device and a liquid supply method for supplying a liquid to a supply target.

Background Art

[0002] Conventionally, devices for supplying a liquid for cleaning, polishing (chemical polishing), etc. to flow paths provided in various objects have been known. For example, Patent Document 1 below discloses a cleaning device including a cleaning water supply pipe connected to the most upstream part of a production line for beverages or the like with a sanitary pump interposed therebetween, and a discharge path connected to the most downstream part of the production line. Branch pipes are respectively connected to the cleaning water supply pipe of this cleaning device to a rinse cleaning water storage tank and an alkaline cleaning water storage tank, and an alkaline cleaning water storage tank is connected to the discharge path via a recovery branch pipe. In this cleaning device, the sanitary pump is driven, and electromagnetic on-off valves provided in the branch pipes and the recovery branch pipe are controlled to open, and rinse cleaning and alkaline cleaning are performed.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0004] However, in the cleaning device described in Patent Document 1 above, after rinse cleaning and alkaline cleaning are performed, there is a concern that rinse cleaning water and alkaline cleaning water remain in the pipeline, resulting in a decrease in cleaning water or a change in concentration due to mixing.

[0005] The present disclosure has been made in view of the above circumstances, and an object thereof is to provide a liquid supply device and a liquid supply method capable of suppressing the remaining of a liquid in a pipeline or a flow path.

Means for Solving the Problem

[0006] In order to achieve the above object, Configuration 1 of the liquid supply device according to the present disclosure includes a first pipe having a first end provided to open below the liquid level in a storage section for storing a liquid and a second end connected to a first connection port of a flow path to be supplied, a second pipe having a first end provided to open above the liquid level in the storage section and a second end connected to a second connection port of the flow path, a transfer direction switching section provided in one of the first pipe and the second pipe and capable of switching the transfer direction of a fluid transferred by a pump, a control section that switches and controls the transfer direction switching section and executes a supply step of supplying the liquid toward the flow path through the first pipe and a recovery step of supplying air toward the flow path through the second pipe to recover the liquid.

[0007] It is disclosed by the description of the following embodiments that the liquid supply device according to the present disclosure may have the following dependent configurations. <Configuration 2> In Configuration 1, a plurality of the storage sections for storing liquids respectively, a first pipe switching section that selectively switches and communicates each branch pipe of the first pipe having a first end provided to open below the liquid level in each storage section and a branched first end side into a plurality and a second end side, and a second pipe switching section that selectively switches and communicates each branch pipe of the second pipe having a first end provided to open above the liquid level in each storage section and a branched first end side into a plurality and a second end side may be provided. In this Configuration 2, the control section may switch and control the first pipe switching section, the second pipe switching section, and the transfer direction switching section and execute the recovery step of recovering the liquid in each storage section after the supply step of supplying the liquid in each storage section. <Configuration 3> In Configuration 1 or Configuration 2, a heating section for heating the liquid passing through the first pipe may be provided on the outer peripheral side of the first pipe. <Configuration 4> In any one of Configurations 1 to 3, a first bypass passage that connects an intermediate portion of the first pipe and an intermediate portion of the second pipe, a second bypass passage that connects a first end side portion of the second pipe at a position where the first bypass passage is connected and a second end side portion of the first pipe at a position where the first bypass passage is connected, a first bypass switching portion that switches the first end side of the first pipe between a state of communicating with the second end of the first pipe and a state of communicating with the second end of the second pipe via the first bypass passage, and a second bypass switching portion that switches the first end side of the second pipe between a state of communicating with the second end of the second pipe and a state of communicating with the second end of the first pipe via the second bypass passage may be provided. <Configuration 5> In any one of Configurations 1 to 4, a heating portion that heats the supply target may be provided.

[0008] To achieve the above object, a liquid supply method according to the present disclosure provides a pipe line for supplying the liquid in the storage portion toward the flow path of the supply target, passing through the flow path, and returning it to the storage portion, and after supplying the liquid to the flow path through the pipe line, air is supplied to the pipe line and the flow path to recover the liquid.

Advantages of the Invention

[0009] The liquid supply device and the liquid supply method according to the present disclosure are configured as described above, so that the remaining liquid in the pipe line and the flow path can be suppressed.

Brief Description of the Drawings

[0010]

Figure 1

Figure 2

Figure 3

Figure 4

Figure 5

Figure 6

Embodiment for Carrying out the Invention

[0011] Hereinafter, embodiments of the present disclosure will be described with reference to the drawings. In some of the figures, some of the detailed reference numerals attached to other figures are omitted. In FIGS. 1, 3 to 6, pipelines (pipes) and the like that are paths through which fluids such as liquids pass are schematically shown by solid lines and broken lines. In the schematic time chart in FIG. 2, the ON / OFF operations and opening / closing operations of each device are schematically shown.

[0012] FIGS. 1 to 6 schematically show an example of a liquid supply device according to this embodiment that executes an example of a liquid supply method according to this embodiment and an example of a basic operation executed using the same. As shown in FIGS. 1, 3(a), and 3(b), the liquid supply method according to this embodiment supplies the liquid in the storage unit 10 (10C) toward the flow path 3 of the supply target 2, provides pipelines (11, 21) so that the liquid passes through the flow path 3 and is returned to the storage unit 10 (10C), and after supplying the liquid to the flow path 3 through the pipelines (11, 21), air is supplied to the pipelines (11, 21) and the flow path 3 to recover the liquid. With such a configuration, the liquid remaining in the pipelines (11, 21) and the flow path 3 is returned to the storage unit 10 (10C), so that the remaining liquid in the pipelines (11, 21) and the flow path 3 can be suppressed. Thereby, a decrease in the liquid in the storage unit 10 (10C) can be suppressed. The device for executing this liquid supply method is not limited to the liquid supply device 1 according to this embodiment. As an example, the liquid supply device 1 may have the following configuration.

[0013] As shown in Fig. 1, the liquid supply device 1 is provided with a first end portion 13 so as to open on the lower side of the liquid level in the storage portion 10 that stores the liquid, and a first pipe line 11 having a second end portion 14 connected to the first connection port 4 of the flow path 3 of the supply target 2. The liquid supply device 1 is provided with a second pipe line 21 having a first end portion 23 so as to open on the upper side of the liquid level in the storage portion 10, and a second end portion 24 connected to the second connection port 5 of the flow path 3. The liquid supply device 1 is provided in one of the first pipe line 11 and the second pipe line 21, and has a transfer direction switching portion (20) that enables switching of the transfer direction of the fluid transferred by the pump 20, and a control portion 31 that performs switching control of the transfer direction switching portion (20) and executes a supply process of supplying the liquid toward the flow path 3 via the first pipe line 11 and a recovery process of supplying air toward the flow path 3 via the second pipe line 21 to recover the liquid. With such a configuration, in the supply process, the liquid stored in the storage portion 10 is supplied to the flow path 3 of the supply target 2 via the first pipe line 11 and returned to the storage portion 10 via the second pipe line 21. On the other hand, in the recovery process, air is supplied to the flow path 3 via the second pipe line 21, whereby the liquid remaining in the second pipe line 21, the flow path 3, and the first pipe line 11 is replaced with air and returned to the storage portion 10, so that the remaining liquid in each of the pipe lines 11, 21 and the flow path 3 can be suppressed.

[0014] In this embodiment, the liquid supply device 1 includes, as a storage unit 10, a plurality of storage units 10A, 10B, and 10C that store liquids respectively. The liquid supply device 1 is provided such that the first ends 13A, 13B, and 13C thereof open below the liquid levels in the respective storage units 10A, 10B, and 10C, and a first pipeline switching unit 15 that selectively switches and communicates each branch pipeline 12A, 12B, and 12C of the first pipeline 11 with a branched first end 13 side and the second end 14 side, and the first ends 23A, 23B, and 23C thereof are provided to open above the liquid levels in the respective storage units 10A, 10B, and 10C, and a second pipeline switching unit 25 that selectively switches and communicates each branch pipeline 22A, 22B, and 22C of the second pipeline 21 with a branched first end 23 side and the second end 24 side. The control unit 31 performs switching control on the first pipeline switching unit 15, the second pipeline switching unit 25, and the transfer direction switching unit (20), and executes a recovery process of recovering the liquids in the respective storage units 10A, 10B, and 10C after a supply process of supplying the liquids in the respective storage units 10A, 10B, and 10C.

[0015] With the above configuration, after supplying the liquids in the respective storage units 10A, 10B, and 10C to the flow path 3 of the supply target 2, the liquids can be recovered, so that a decrease in the liquids in the respective storage units 10A, 10B, and 10C can be suppressed. In addition, since the residue in each pipeline 11, 21 and the flow path 3 of the liquid supplied immediately before can be suppressed, when supplying the next liquid, a change in the concentration of the liquid can be suppressed. Further, thereby, even when a chemical reaction occurs if the liquids mix with each other in each pipeline 11, 21 and the flow path 3 depending on the types of liquids stored in the respective storage units 10A, 10B, and 10C, the residue of the liquid can be suppressed, so that the occurrence of such a chemical reaction can also be suppressed. Specifically, in this embodiment, the liquid supply device 1 constitutes a polishing device that supplies a chemical polishing liquid to the flow path 3 of a mold as the supply target 2 and chemically polishes the inner peripheral surface of the flow path 3. Although details will be described later, the liquid supply device 1 includes a first storage section 10A that stores the chemical polishing liquid, a second storage section 10B that stores a cleaning / neutralizing liquid, and a third storage section 10C that stores a rinsing liquid, and is configured to switch these and supply them to the flow path 3 of the supply target 2. Hereinafter, when such distinction is not necessary, it will be described as the storage section 10.

[0016] As the supply target 2 as described above, a molding die installed in various molding machines such as an injection molding machine may be used. In this case, the flow path 3 may be a medium flow path through which a temperature control medium circulated and supplied by a mold temperature control device that adjusts the temperature of the mold constituting the supply target 2 passes. That is, the supply target 2 may be configured such that the supply path of the mold temperature control device is connected to the first connection port 4 that becomes the upstream end of the flow path 3, and the return path of the mold temperature control device is connected to the second connection port 5 that becomes the downstream end of the flow path 3. Further, such a supply target 2 may be formed by a metal 3D printer (three-dimensional shaping). In the case of such a supply target 2, it is possible to make the flow path 3 into a complicated shape such as following the cavity (core) shape, but it is necessary to smooth the inner peripheral surface of the flow path 3. The liquid supply device 1 may be configured to supply a chemical polishing liquid to this flow path 3 in order to smooth the inner peripheral surface of the flow path 3 of such a supply target 2. The supply target 2 is not limited to such a mold, and may be an object in which other flow paths 3 that require chemical polishing are formed. The liquid supply device 1 may constitute a polishing device that supplies a liquid containing an abrasive instead of the chemical polishing liquid to polish the flow path 3, or may constitute a cleaning device that supplies a cleaning liquid to the flow path 3 of the supply target 2 to be cleaned and cleans the flow path 3.

[0017] In this embodiment, the liquid supply device 1 includes a heating container 6 that houses the supply target 2 and heats the supply target 2 as a heating section that heats the supply target 2. With such a configuration, the supply target 2 can be heated, and when the liquid is heated, a temperature drop of the supplied liquid can be suppressed. The heating container 6 is a bottomed container that opens upward so as to be able to accommodate the supply target 2, and has a bottom portion and a side wall portion. A first connection path that connects the first connection port 4 of the flow path 3 of the supply target 2 and the second end portion 14 of the first pipe line 11, and a second connection path that connects the second connection port 5 of the flow path 3 and the second end portion 24 of the second pipe line 21 may be provided so as to penetrate the side wall portion of the heating container 6. That is, the second end portions 14 and 24 of the first pipe line 11 and the second pipe line 21 may be connected to the first connection port 4 and the second connection port 5 of the flow path 3 via the first connection path and the second connection path. Instead of connecting the first pipe line 11 and the second pipe line 21 to the first connection port 4 and the second connection port 5 of the flow path 3 via the side wall portion of the heating container 6, it may be inserted through the upper opening of the heating container 6 and connected to the first connection port 4 and the second connection port 5 of the flow path 3, or the like.

[0018] A lid for opening and closing the upper opening of the heating container 6 may be provided on the heating container 6. The lid, the bottom portion, and the side wall portion of the heating container 6 may be formed of a heat-insulating material, or may be covered with an appropriate heat-insulating material. The heating container 6 is configured to heat the supply target 2 with a heating medium in the heating container 6. In the illustrated example, an example is shown in which a circulation path 7 for circulating and supplying a liquid heated by a heating unit 9 that heats a liquid as a heating medium is connected to the heating container 6. The liquid constituting the heating medium is not limited to water, and may be a liquid such as an oil-based or alcohol-based liquid. At an appropriate position such as the upper end portion of the side wall portion of the heating container 6, a discharge port (for overflowing) for discharging the liquid, a discharge path, or the like may be provided. Further, the heating container 6 is provided with a replenishment level gauge for detecting the replenishment level of the liquid, a lower limit level gauge for detecting an abnormal (lower limit) level, and the like. The replenishment level gauge may be configured to detect a level substantially the same as the upper end of the supply target 2 in the heating container 6 or a level above the upper end so that the entire supply target 2 in the heating container 6 is immersed in the liquid. At an appropriate position such as the bottom of the heating container 6, a drain (drain valve) for discharging the liquid in the heating container 6 is provided.

[0019] A circulation pump 8 for circulating the heating medium is provided in the circulation path 7. Further, a bypass path through which the liquid passes when circulating the liquid without passing through the heating container 6 is provided in the circulation path 7. The heating unit 9 includes a plurality (two in the illustrated example) of tank-shaped containers for storing liquid into which a heater as a heating source is inserted. A thermostat for preventing overheating to stop the heater may be provided in the containers of the heating unit 9. An appropriate drain pan may be provided on the lower side of the containers of the heating unit 9. The heating unit 9 is controlled by the control unit 31 based on the detected temperature of a temperature sensor provided at an appropriate location so that the temperature of the liquid in the heating container 6 becomes a preset target temperature (for example, about 60 degrees to 95 degrees). The illustrated example shows an example in which temperature sensors are provided in each of the circulation paths 7 on the downstream side of the heating container 6 and the pump 8.

[0020] In FIG. 2, the ON / OFF operation of the heating unit 9 is not shown, but a preheating step of preheating the supply target 2 (the liquid in the heating container 6) may be performed so that the temperature of the supply target 2 becomes a preset target temperature before performing various liquid supply steps described later. Further, instead of the mode in which the heating unit 9 is provided outside the heating container 6, a configuration may be adopted in which a heater constituting the heating unit is inserted into the liquid in the heating container 6, or a configuration in which a heater is attached or embedded to the bottom or side peripheral wall of the heating container 6 may be adopted. The mode of the heating unit for heating the supply target 2 is not limited to the mode of heating by the heated liquid as described above, and a mode of supplying steam or gas into the heating container 6 for heating may be adopted, or a mode of heating by heat transfer by bringing an appropriate heat transfer body into contact with the outer peripheral surface of the supply target 2 may be adopted. Further, a configuration in which such a heating unit for heating the supply target 2 is not provided may be adopted.

[0021] The first storage section 10A, the second storage section 10B, and the third storage section 10C that constitute the storage section 10 are in the form of containers capable of storing liquid. These first storage section 10A, second storage section 10B, and third storage section 10C may have a bottom and a side peripheral wall section, and may be shaped to open upward, or may be configured to have a top wall, a lid, or the like that seals the upper side. These first storage section 10A, second storage section 10B, and third storage section 10C may be provided in an appropriate leak prevention pan. These first storage section 10A, second storage section 10B, and third storage section 10C may have the same capacity as each other, or may have different capacities. The capacity of these first storage section 10A, second storage section 10B, and third storage section 10C, the type and concentration of the chemical solution stored therein, etc. may be set to appropriate values according to the material of the supply target 2 to be chemically polished, the inner diameter and length of its flow path 3, etc. Also, at appropriate locations such as the bottom of these first storage section 10A, second storage section 10B, and third storage section 10C, a drain (drain valve) or the like for discharging the liquid in each storage section 10A, 10B, 10C may be provided. An appropriate level gauge or the like for detecting a decrease in the liquid level of these first storage section 10A, second storage section 10B, and third storage section 10C may be provided. Also, a supply path or the like for supplying (refilling) liquid to these first storage section 10A, second storage section 10B, and third storage section 10C may be connected.

[0022] The chemical polishing liquid stored in the first storage section 10A may be a liquid that dissolves and smoothens the metal surface (inner peripheral surface of the flow path 3), for example, a strongly acidic liquid of the hydrogen peroxide type containing hydrogen peroxide, or other liquids. The cleaning / neutralizing liquid stored in the second storage section 10B may be a liquid that cleans the inner peripheral surface of the flow path 3 as a pretreatment for chemical polishing and neutralizes it as a post-treatment for chemical polishing. For example, it may be a strongly alkaline liquid of the sodium hydroxide type containing sodium hydroxide, or other liquids. The chemical solutions (chemical polishing liquid and cleaning / neutralizing liquid) stored in these first storage section 10A and second storage section 10B may be adjusted in concentration to an appropriate concentration. Also, a concentration meter or the like for detecting the concentration of the chemical solution may be provided in the first storage section 10A and the second storage section 10B. The rinsing liquid stored in the third storage section 10C may be water (clean water). The liquids stored in the respective storage sections 10A, 10B, and 10C are not limited to the liquids as described above, and various other liquids may be used. Further, instead of storing different liquids in the respective storage sections 10A, 10B, and 10C, the same type of liquid may be stored in a plurality of storage sections. Further, the number of storage sections 10 is not limited to three, and may be two, four or more, or even one.

[0023] The first pipeline 11 includes a branch pipeline 12 that branches into a plurality of branches on the side of the first end portion 13 thereof. In the present embodiment, as the plurality of branch pipelines 12, a first branch pipeline 12A that communicates with the first storage section 10A, a second branch pipeline 12B that communicates with the second storage section 10B, and a third branch pipeline 12C that communicates with the third storage section 10C are included. In the illustrated example, the first end portions 13A, 13B, and 13C of the first branch pipeline 12A, the second branch pipeline 12B, and the third branch pipeline 12C are provided such that the side portions on the sides of the first end portions 13A, 13B, and 13C hang down in the respective storage sections 10A, 10B, and 10C so that the first end portions 13A, 13B, and 13C are positioned below the liquid level, but the present invention is not limited to such an example. For example, the first end portions 13A, 13B, and 13C of the first branch pipeline 12A, the second branch pipeline 12B, and the third branch pipeline 12C may be provided so as to open on the inner surface of the bottom or the side peripheral wall portion of the respective storage sections 10A, 10B, and 10C, or may be connected to an appropriate connection path that opens below the liquid level of the respective storage sections 10A, 10B, and 10C.

[0024] The first pipeline switching unit 15 is configured by liquid delivery valves (15A, 15B, 15C) that are provided in each of the branch pipelines 12A, 12B, 12C in the illustrated example and allow or block the passage of liquid (fluid). A first liquid delivery valve 15A is provided in the first branch pipeline 12A, a second liquid delivery valve 15B is provided in the second branch pipeline 12B, and a third liquid delivery valve 15C is provided in the third branch pipeline 12C. These first liquid delivery valve 15A, second liquid delivery valve 15B, and third liquid delivery valve 15C may be electromagnetic valves or the like that are controlled to open and close by a control unit 31 described later. The first pipeline switching unit 15 is not limited to valves that open and close each of the branch pipelines 12A, 12B, 12C, and may be configured by an appropriate multi-way switching valve or the like.

[0025] The second pipeline 21 includes a branch pipeline 22 that branches into a plurality of branches on the side of its first end 23. In the present embodiment, as the plurality of branch pipelines 22, it includes a first branch pipeline 22A that communicates with the first storage unit 10A, a second branch pipeline 22B that communicates with the second storage unit 10B, and a third branch pipeline 22C that communicates with the third storage unit 10C. In the illustrated example, these first branch pipeline 22A, second branch pipeline 22B, and third branch pipeline 22C are shown as examples where the respective first end portions 23A, 23B, 23C are provided so as to hang down within the respective storage units 10A, 10B, 10C such that the respective first end portions 23A, 23B, 23C are located above the liquid level, but it is not limited to such an example. For example, the respective first end portions 23A, 23B, 23C of the first branch pipeline 22A, second branch pipeline 22B, and third branch pipeline 22C may be provided so as to open on the inner surface of the side peripheral wall portion, top wall, lid body, etc. of the respective storage units 10A, 10B, 10C, or may be connected to an appropriate connection path that opens above the liquid level of the respective storage units 10A, 10B, 10C.

[0026] In the illustrated example, the second pipeline switching unit 25 is provided in each of the branch pipelines 22A, 22B, and 22C and is constituted by liquid (fluid) return valves (25A, 25B, 25C) that allow or block the passage of liquid. A first return valve 25A is provided in the first branch pipeline 22A, a second return valve 25B is provided in the second branch pipeline 22B, and a third return valve 25C is provided in the third branch pipeline 22C. These first return valve 25A, second return valve 25B, and third return valve 25C may be electromagnetic valves or the like that are controlled to open and close by a control unit 31 described later. The second pipeline switching unit 25 is not limited to valves that open and close each of the branch pipelines 22A, 22B, and 22C and may be constituted by an appropriate multi-way switching valve or the like.

[0027] The liquid supply device 1 includes a first bypass passage 16 that connects an intermediate portion of the first pipeline 11 and an intermediate portion of the second pipeline 21, and a second bypass passage 26 that connects a portion on the first end 23 side of the second pipeline 21 where the first bypass passage 16 is connected and a portion on the second end 14 side of the first pipeline 11 where the first bypass passage 16 is connected. The liquid supply device 1 has a first bypass switching unit (17, 18) that switches the first end 13 side of the first pipeline 11 between a state of communicating with the second end 14 of the first pipeline 11 and a state of communicating with the second end 24 of the second pipeline 21 via the first bypass passage 16, and a second bypass switching unit (27, 28) that switches the first end 23 side of the second pipeline 21 between a state of communicating with the second end 24 of the second pipeline 21 and a state of communicating with the second end 14 of the first pipeline 11 via the second bypass passage 26.

[0028] With the above configuration, if the first end 13 side of the first pipeline 11 is communicated with the second end 14 of the first pipeline 11, and the first end 23 side of the second pipeline 21 is communicated with the second end 24 of the second pipeline 21, the liquid supplied from the storage part 10 flows in from the first connection port 4 and passes through the flow path 3 of the supply target 2 so as to flow out from the second connection port 5. On the other hand, if the first end 13 side of the first pipeline 11 is communicated with the second end 24 of the second pipeline 21 via the first bypass path 16, and the first end 23 side of the second pipeline 21 is communicated with the second end 14 of the first pipeline 11 via the second bypass path 26, the liquid supplied from the storage part 10 flows in from the second connection port 5 and passes through the flow path 3 of the supply target 2 so as to flow out from the first connection port 4. That is, the passing direction of the liquid passing through the flow path 3 of the supply target 2 can be switched. Thereby, even when the chemical polishing efficiency by the liquid decreases as it goes toward the downstream side in the passing direction of the flow path 3, the inner surface of the flow path 3 of the supply target 2 can be effectively chemically polished by switching the passing direction.

[0029] One end of the first bypass path 16 is connected to an intermediate part of the first pipeline 11, and the other end is connected to an intermediate part of the second pipeline 21. One end of the second bypass path 26 is connected to the first end 23 side of the second pipeline 21 at a position where the first bypass path 16 is connected, and the other end is connected to the second end 14 side of the first pipeline 11 at a position where the first bypass path 16 is connected. The first pipeline 11 including each branch pipeline 12, the first bypass path 16, the second pipeline 21 including each branch pipeline 22, and the second bypass path 26 may be appropriately configured according to the type and temperature of the liquid supplied to the flow path 3 of the supply target 2, and may be a fluororesin-based tube such as Teflon (registered trademark) having acid resistance, alkali resistance, chemical resistance, heat resistance, etc., or may be composed of various other tubes, etc.

[0030] The first bypass switching unit (17, 18) is provided in the first pipeline 11 and the first bypass path 16 in the illustrated example, and is constituted by liquid supply valves (17, 18) that allow or block the passage of liquid (fluid). The main liquid supply valve 17 is provided so as to be located between the portion where the first bypass path 16 is connected in the first pipeline 11 and the portion where the second bypass path 26 is connected, and the bypass liquid supply valve 18 is provided in the first bypass path 16. The second bypass switching unit (27, 28) is provided in the second pipeline 21 and the second bypass path 26 in the illustrated example, and is constituted by return liquid valves (27, 28) that allow or block the passage of liquid (fluid), similar to the above. The main return liquid valve 27 is provided so as to be located between the portion where the second bypass path 26 is connected in the second pipeline 21 and the portion where the first bypass path 16 is connected, and the bypass return liquid valve 28 is provided in the second bypass path 26. The main liquid supply valve 17, the bypass liquid supply valve 18, the main return liquid valve 27, and the bypass return liquid valve 28 may be electromagnetic valves or the like that are controlled to open and close by a control unit 31 described later. The first bypass switching unit (17, 18) and the second bypass switching unit (27, 28) are not limited to valves that open and close each pipeline 11, 16, 21, 26, and may be constituted by appropriate multi-way switching valves or the like.

[0031] A heating unit 19 for heating the liquid passing through the first pipeline 11 is provided on the outer peripheral side of the first pipeline 11. With such a configuration, the heated liquid can be supplied to the flow path 3 of the supply target 2, and it is suitable as a device for supplying a chemical polishing liquid such as an acidic chemical solution to chemically polish the inner peripheral surface of the flow path 3 of the supply target 2 that requires heating of the liquid. Further, even when the liquid is a strong acid or strong alkaline liquid, the heating unit 19 does not come into contact with the liquid, so damage to the heating unit 19 can be suppressed. Further, for example, compared with a configuration in which a heating unit for heating the liquid in the storage unit 10 is provided, the liquid can be heated efficiently. In particular, compared with a configuration in which heating units for heating the liquids in a plurality of storage units are provided, the liquid can be heated efficiently.

[0032] The heating unit 19 is provided at a position on the first end portion 13 side rather than the portion where the first bypass path 16 in the first pipeline 11 is connected, and on the second end portion 14 side rather than the branching portion where the plurality of branch pipelines 12 of the first pipeline 11 branch. That is, the heating unit 19 is provided so as to be located between the portion where the first bypass path 16 in the first pipeline 11 is connected and the branching portion where the plurality of branch pipelines 12 branch. The heating unit 19 may be provided so as to be wound around the outer peripheral side of the first pipeline 11. The heating unit 19 may be, for example, a PTC (Positive Temperature Coefficient) heater. With such a configuration, heating can be performed to reach the target temperature without requiring a temperature sensor or the like. The heating unit 19 may be configured to heat the liquid passing through the first pipeline 11 to a temperature of, for example, about 60 degrees to 95 degrees.

[0033] The heating unit 19 is not limited to a PTC heater, and other heaters may also be used. Also, depending on the type of liquid passing through the first pipeline 11, instead of the mode of providing the heating unit 19 on the outer peripheral side of the first pipeline 11, a configuration in which a heater is provided inside the first pipeline 11 may be adopted. Further, instead of or in addition to the configuration of providing the heating unit 19 for heating the liquid passing through the first pipeline 11, a configuration of providing a heating unit for heating the liquid in the storage portion 10 may be adopted. In this case, the heater constituting the heating unit may be provided inside or outside the storage portion 10. Furthermore, a configuration in which such a heating unit 19 for heating the liquid is not provided may also be adopted.

[0034] The transfer direction switching unit (20) is constituted by a pump 20 provided in the first pipeline 11. In the illustrated example, the pump 20 is provided so as to be located between the branching portion where the plurality of branch pipelines 12 in the first pipeline 11 branch and the heating unit 19. This pump 20 is switchable between a supply direction (forward direction) for transferring fluid (liquid) from the first end 13 of the first pipeline 11 to the first end 23 of the second pipeline 21, and a recovery direction (reverse direction) for transferring fluid (liquid, air) from the first end 23 of the second pipeline 21 to the first end 13 of the first pipeline 11. As such a pump 20, a rotary pump (tube pump) may be used in which a plurality of pressing parts such as rollers are provided at intervals in the circumferential direction on a rotating body rotated by a driving part such as a motor, and a tube for transferring fluid by being crushed by the pressing part is provided on the outer peripheral side of this rotating body. With such a configuration, quantitative and continuous transfer becomes possible, and since the fluid does not come into contact with the pump casing or the movable parts of the pump, fouling and the like can be suppressed.

[0035] If the driving part (rotating body) of this pump 20 is rotated in the forward direction (forward rotation), the fluid can be transferred in the above supply direction. That is, with the forward rotation of the rotating body, the portion crushed by the pressing part in the tube is displaced from the first end 13 side to the second end 14 side of the first pipeline 11, and thereby, the fluid (liquid) is transferred from the first end 13 of the first pipeline 11 to the first end 23 of the second pipeline 21. On the other hand, if the driving part (rotating body) of the pump 20 is rotated in the reverse direction (reverse rotation), the fluid can be transferred in the above recovery direction. That is, with the reverse rotation of the rotating body, the portion crushed by the pressing part in the tube is displaced from the second end 14 side to the first end 13 side of the first pipeline 11, and thereby, the fluid (liquid, air) is transferred from the first end 23 of the second pipeline 21 to the first end 13 of the first pipeline 11. Note that instead of the mode in which the pump 20 is provided in the first pipeline 11, it may be configured to be provided in the second pipeline 21.

[0036] As the tube provided in this pump 20, various tubes having acid resistance, alkali resistance, chemical resistance, heat resistance, etc. as described above may be used, or a tube with good abrasion resistance may also be used. For example, the tube of the pump 20 may be a Pharmed (registered trademark) tube. The pump 20 that enables switching of the fluid transfer direction is not limited to the rotary pump as described above, and various other pumps may be used. Also, it is not limited to the mode in which the pump itself constitutes the transfer direction switching unit. For example, a bypass path, a switching unit, etc. that constitute the transfer direction switching unit may be provided on the suction side and the discharge side of the pump to enable switching of the fluid transfer direction between the above supply direction and the above recovery direction. That is, instead of the configuration in which the transfer direction of the fluid passing through the pump 20 itself is switched, the transfer direction of the fluid passing through the pump 20 itself may not be switched, and the pipeline connected to its suction side and discharge side may be switched to switch the fluid transfer direction. In this case, instead of the rotary pump as described above, a pump for both gas and liquid may be provided. The transfer direction switching unit is not limited to the configuration as described above, and may have various other configurations.

[0037] The liquid supply device 1 is provided in at least one of the first pipeline 11 and the second pipeline 21, and includes a flow meter 29 that detects the flow rate of the passing fluid. With such a configuration, when the pump 20 is a rotary pump as described above, it is possible to change and control the rotational speed of the rotating body so as to achieve a preset target flow rate based on the detected value of the flow meter 29. In this case, considering the pulsation by the pump 20, the rotational speed of the rotating body may be changed and controlled so that the moving average value calculated based on the detected value of the flow meter 29 becomes the target flow rate. Also, when the detected value of the flow meter 29 is an abnormal value, it is possible to operate an appropriate notification unit to notify the abnormality. Since the rotational speed of the rotating body and the flow rate are in a substantially proportional relationship, if there is a deviation greater than a preset value between the flow rate calculated based on the rotational speed of the pump 20 and the detected value of the flow meter 29, it may be determined as abnormal. For example, if deterioration such as passing through the tube of the pump 20 has occurred, the resistance decreases, so the rotational speed increases, while the tube becomes difficult to recover, so the flow rate tends to decrease. By providing the flow meter 29 as described above, such deterioration of the tube can be detected (estimated).

[0038] This flow meter 29 is provided in the second pipeline 21. That is, it is provided in a pipeline that is relatively far from the pump 20. With such a configuration, the influence caused by the pulsation of the pump 20 can be reduced. In the illustrated example, the flow meter 29 is provided so as to be located between the branch portion where a plurality of branch pipelines 22 in the second pipeline 21 branch and the portion where the second bypass path 26 is connected. Instead of or in addition to the mode of providing the flow meter 29 in the second pipeline 21, it may be configured to be provided in the first pipeline 11. Furthermore, it may be configured not to provide such a flow meter 29.

[0039] The control unit 31 is provided in an appropriate control panel 30 installed at an appropriate location of the liquid supply device 1 or at a location separated from the liquid supply device 1. The control unit 31 includes a control circuit such as a CPU (Central Processing Unit) and executes basic operations and the like described later. This control unit 31 is connected to each part of the liquid supply device 1 including the circulation pump 8 and the heating unit 9 of the heating container 6 described above, the heating unit 19 and the pump 20 of the first pipeline 11, the flow meter 29, the first pipeline switching unit 15 (15A, 15B, 15C), the second pipeline switching unit 25 (25A, 25B, 25C), the first bypass switching unit (17, 18), the second bypass switching unit (27, 28), etc. via signal lines and the like. The circulation pump 8 and the heating unit 9 of the heating container 6, the heating unit 19 and the pump 20 of the first pipeline 11, the first pipeline switching unit 15 (15A, 15B, 15C), the second pipeline switching unit 25 (25A, 25B, 25C), the first bypass switching unit (17, 18), the second bypass switching unit (27, 28), etc. are controlled to be started (ON) / stopped (OFF) and opened / closed by the control unit 31. The control panel 30 is provided with a display operation unit 33 for making various settings, inputs, and displays. The control panel 30 stores various programs such as setting conditions and input values set and input by the operation of the display operation unit 33, control programs for executing basic operations and the like described later, various preset operation conditions, various data tables, etc., and is provided with a storage unit 32 composed of various memories such as ROM and RAM.

[0040] In the liquid supply device 1 configured as described above, each part is controlled by the control unit 31, and as shown in FIGS. 2 to 6, the following basic operations and the like may be executed. In FIG. 2, an example is shown in which no stop time is provided between the normal rotation and the reverse rotation of the pump 20, but a configuration with a slight stop time may also be used. Further, in FIG. 2, an example is shown in which the activation (ON) of each device and the opening of each valve at the start of the process are performed simultaneously, and the opening and closing of each valve when shifting to the next process are also performed simultaneously, but an appropriate delay time or the like may be provided. Further, in FIGS. 3 to 6, the pipelines during fluid (liquid, air) transfer are shown by solid lines, and the pipelines not in transfer are shown by broken lines for convenience.

[0041] First, the supply target 2 to be chemically polished is placed in the heating container 6, the first pipeline 11 is communicatively connected to the first connection port 4, and the second pipeline 21 is communicatively connected to the second connection port 5. Although omitted in FIG. 2, the circulation pump 8 and the heating unit 9 are activated, and the heating medium is circulated and supplied to the heating container 6 to heat the supply target 2 to a predetermined temperature. If the supply target 2 is heated, as shown in FIG. 2, a temperature-rising step of preheating the heating part 19 of the first pipeline 11 is executed. This temperature-rising step is carried out together with a supply step of supplying a liquid (rinsing liquid) toward the flow path 3. In this temperature-rising step, the heating part 19 is activated (turned ON), the pump 20 is activated (turned ON) to be in the forward rotation state, the third liquid supply valve 15C, the third liquid return valve 25C, the main liquid supply valve 17, and the main liquid return valve 27 are opened, and the other valves 15A, 15B, 25A, 25B, 18, 28 are closed. As a result, as shown in FIG. 3(a), the liquid (rinsing liquid) in the third storage part 10C is sucked from the first end part 13C of the third branch pipeline 12C, transferred toward the flow path 3 through the first pipeline 11 including the third branch pipeline 12C, passes through the flow path 3, and is returned to the third storage part 10C through the second pipeline 21 and its third branch pipeline 22C. Also, thereby, the heating part 19 is heated up, and the first pipeline 11 and the second pipeline 21 are also heated up. This temperature-rising step may be executed until a preset predetermined time elapses so that the heating part 19 etc. can be heated up, or may be executed until exceeding a preset target temperature or a predetermined flow rate (integrated flow rate). Also, the heating part 19 may be in the activated (turned ON) state until the entire chemical polishing step of the flow path 3 is completed.

[0042] Next, as shown in FIG. 2, a recovery step of recovering the liquid (rinse liquid) is performed. That is, the pump 20 is reversed without changing the opening and closing states of the respective valves. As a result, as shown in FIG. 3(b), air is sucked in from the first end portion 23C of the third branch pipe line 22C, transferred toward the flow path 3 through the second pipe line 21 including the third branch pipe line 22C, passes through the flow path 3, and is transferred to the third storage portion 10C through the first pipe line 11 and its third branch pipe line 12C. By transferring the air in this way, the liquid (rinse liquid) remaining in the second pipe line 21, the flow path 3, and the first pipe line 11 is replaced with air and returned, that is, recovered, to the third storage portion 10C. This recovery step may be performed until a preset predetermined time elapses so that the entire amount of the liquid (rinse liquid) remaining in the second pipe line 21, the flow path 3, and the first pipe line 11 can be recovered, or may be performed until a preset predetermined flow rate (integrated flow rate) is exceeded. Further, an appropriate detection unit capable of detecting the recovery of substantially the entire amount of the liquid (rinse liquid) remaining in the second pipe line 21, the flow path 3, and the first pipe line 11 may be provided, and if this detection unit detects the recovery, the recovery step may be terminated. Such a detection unit may be a detection unit that detects the mass or liquid level of the storage portion 10 (each storage portion 10A, 10B, 10C), a detection unit that detects the air passing through the first end portion 13 (each first end portion 13A, 13B, 13C) of the first pipe line 11 or the air discharged from the first end portion 13, or various other detection units. Further, the rotation speed of the pump 20 during the execution of the recovery step may be made different from the rotation speed of the pump 20 during the execution of the supply step. For example, it may be made larger than the rotation speed of the pump 20 during the execution of the supply step.

[0043] Then, as shown in FIG. 2, a cleaning process for preliminarily cleaning the flow path 3 is executed. This cleaning process constitutes a supply process of supplying a liquid (cleaning / neutralizing liquid) toward the flow path 3. In this cleaning process, the pump 20 is set to the normal rotation state, the third liquid supply valve 15C and the third liquid return valve 25C are closed, and the second liquid supply valve 15B and the second liquid return valve 25B are opened. As a result, as shown in FIG. 4(a), the liquid (cleaning / neutralizing liquid) in the second storage section 10B is sucked from the first end 13B of the second branch pipe 12B, transferred through the first pipe 11 including the second branch pipe 12B toward the flow path 3, passes through the flow path 3, and is returned to the second storage section 10B through the second pipe 21 and its second branch pipe 22B. This cleaning process may be executed until a preset predetermined time elapses according to the inner diameter, length, etc. of each of the pipes 11, 21 and the flow path 3 so that the flow path 3 can be cleaned, or may be executed until a preset predetermined flow rate (integrated flow rate) is exceeded.

[0044] Next, as shown in FIG. 2, a recovery process for recovering the liquid (cleaning / neutralizing liquid) is executed. That is, without changing the open / closed states of the respective valves, the pump 20 is reversed. As a result, as shown in FIG. 4(b), air is sucked from the first end 23B of the second branch pipe 22B, transferred through the second pipe 21 including the second branch pipe 22B toward the flow path 3, passes through the flow path 3, and is transferred to the second storage section 10B through the first pipe 11 and its second branch pipe 12B. By transferring the air in this way, the liquid (cleaning / neutralizing liquid) remaining in the second pipe 21, the flow path 3, and the first pipe 11 is replaced with air and returned, that is, recovered, to the second storage section 10B in substantially the same manner as described above. This recovery process may be executed until a preset predetermined time elapses, or until a preset predetermined flow rate (integrated flow rate) is exceeded, as described above. Further, if the detection unit as described above detects the recovery, the process may be terminated.

[0045] Then, as shown in FIG. 2, a rinsing step is performed that constitutes a supply step of supplying a liquid (rinsing liquid) toward the flow path 3. In this rinsing step, the pump 20 is set to the forward rotation state, the second liquid supply valve 15B and the second liquid return valve 25B are closed, and the third liquid supply valve 15C and the third liquid return valve 25C are opened. Thereby, similar to the above-described temperature-raising step, as shown in FIG. 3(a), the liquid (rinsing liquid) in the third storage unit 10C is transferred toward the flow path 3 through the first pipeline 11, passes through the flow path 3, and is returned to the third storage unit 10C through the second pipeline 21. This rinsing step is performed until a predetermined time set in advance elapses or until a predetermined flow rate (integrated flow rate) set in advance is exceeded, according to the inner diameter and length of each of the pipelines 11, 21 and the flow path 3 so that the rinsing liquid remaining on the inner peripheral surfaces of the pipelines 11, 21 and the flow path 3 can be rinsed. Next, as shown in FIGS. 2 and 3(b), in the same manner as described above, a recovery step of recovering a liquid (rinsing liquid) is performed.

[0046] Then, as shown in FIG. 2, as a polishing step of chemically polishing the flow path 3, a first polishing step and a second polishing step are performed, which constitute a supply step of supplying a liquid (chemical polishing liquid) toward the flow path 3. In the first polishing step, the pump 20 is set to the forward rotation state, the third liquid supply valve 15C and the third liquid return valve 25C are closed, and the first liquid supply valve 15A and the first liquid return valve 25A are opened. Thereby, as shown in FIG. 5(a), the liquid (chemical polishing liquid) in the first storage unit 10A is sucked from the first end portion 13A of the first branch pipeline 12A, transferred toward the flow path 3 through the first pipeline 11 including the first branch pipeline 12A, passes through the flow path 3, and is returned to the first storage unit 10A through the second pipeline 21 and its first branch pipeline 22A. This first polishing step may be performed until a predetermined time set in advance elapses or until a predetermined flow rate (integrated flow rate) set in advance is exceeded, according to the inner diameter and length of each of the pipelines 11, 21 and the flow path 3 so that the inner peripheral surface of the flow path 3 can be polished by the second polishing step described later.

[0047] Subsequent to the above-described first polishing step, as shown in FIG. 2, a second polishing step is performed. In this second polishing step, the pump 20 is set to the forward rotation state, the main liquid supply valve 17 and the main liquid return valve 27 are closed, and the bypass liquid supply valve 18 and the bypass liquid return valve 28 are opened. As a result, as shown in FIG. 5(b), the liquid (chemical polishing liquid) in the first storage section 10A is sucked from the first end portion 13A of the first branch pipe 12A, and flows through the first pipe 11 on the first end portion 13A side including the first branch pipe 12A, the first bypass path 16 connected thereto, and the second end portion 24 side of the second pipe 21 to which this is connected, and is transferred toward the flow path 3. Further, the liquid (chemical polishing liquid) transferred to the flow path 3 passes through the flow path 3, and is returned to the first storage section 10A through the second end portion 14 side of the first pipe 11, the second bypass path 26 connected thereto, and the second pipe 21 on the first end portion 23A side including the first branch pipe 22A connected thereto. That is, in this second polishing step, the liquid (chemical polishing liquid) passes in a direction opposite to the passing direction of the flow path 3 in other supply steps including the above-described first polishing step.

[0048] The second polishing step may be performed until a preset predetermined time elapses according to the inner diameter, length, etc. of each of the pipes 11, 21 and the flow path 3 so that the inner peripheral surface of the flow path 3 can be polished by the first polishing step described above, or may be performed until a preset predetermined flow rate (integrated flow rate) is exceeded. Further, the first polishing step and the second polishing step may be set such that their processing times or integrated flow rates are approximately the same. Next, as shown in FIG. 2, a recovery process for recovering the liquid (chemical polishing liquid) is performed. In the illustrated example, after performing the first chemical polishing liquid recovery process with the opening and closing states of each valve being the same as those in the first polishing process, the second chemical polishing liquid recovery process is performed with the opening and closing states of each valve being the same as those in the second polishing process. That is, in the first chemical polishing liquid recovery process, the bypass liquid supply valve 18 and the bypass liquid return valve 28 are closed, the main liquid supply valve 17 and the main liquid return valve 27 are opened, and the pump 20 is reversed. As a result, as shown in FIG. 6(a), air is sucked in from the first end portion 23A of the first branch pipe line 22A, transferred toward the flow path 3 through the second pipe line 21 including the first branch pipe line 22A, passes through the flow path 3, and is transferred to the first storage portion 10A through the first pipe line 11 and its first branch pipe line 12A. By transferring air in this way, the liquid (chemical polishing liquid) remaining in the second pipe line 21, the flow path 3, and the first pipe line 11 is replaced with air and returned, that is, recovered, to the first storage portion 10A in substantially the same manner as described above.

[0049] In the second chemical polishing liquid recovery process that is executed following the first chemical polishing liquid recovery process, the pump 20 is put into a reverse state, the main liquid supply valve 17 and the main liquid return valve 27 are closed, and the bypass liquid supply valve 18 and the bypass liquid return valve 28 are opened. As a result, as shown in FIG. 6(b), air is sucked in from the first end portion 23A of the first branch pipeline 22A, and is transferred toward the flow path 3 through the second pipeline 21 on the first end portion 23A side including the first branch pipeline 22A, the second bypass path 26 connected thereto, and the first pipeline 11 on the second end portion 14 side to which this is connected. Further, the air transferred to the flow path 3 passes through the flow path 3, and is transferred to the first storage portion 10A through the second end portion 24 side of the second pipeline 21, the first bypass path 16 connected thereto, and the first pipeline 11 on the first end portion 13A side to which this is connected and its first branch pipeline 12A. By transferring the air in this manner, similarly to the above, the liquid (chemical polishing liquid) remaining in each of the bypass paths 16 and 26 is replaced with air and returned, that is, recovered, to the first storage portion 10A. These recovery processes may be executed until a preset predetermined time elapses or until a preset predetermined flow rate (integrated flow rate) is exceeded, as in the above, and may also be terminated if a detection unit as described above detects the recovery. Note that, instead of an aspect in which the first chemical polishing liquid recovery process is executed with the open / closed states of the respective valves being the same as those in the first polishing process after the second polishing process, an aspect may be adopted in which the second chemical polishing liquid recovery process is executed with the open / closed states of the respective valves being the same as those in the second polishing process, and then the first chemical polishing liquid recovery process is executed with the open / closed states of the respective valves being the same as those in the first polishing process.

[0050] Then, as shown in FIG. 2, the same rinsing process as described above is executed. In this rinsing process, the pump 20 is set to the forward rotation state, the first liquid feed valve 15A, the first liquid return valve 25A, the bypass liquid feed valve 18, and the bypass liquid return valve 28 are closed, and the third liquid feed valve 15C, the third liquid return valve 25C, the main liquid feed valve 17, and the main liquid return valve 27 are opened. As a result, as shown in FIG. 3(a), similar to the above-described rinsing process, the liquid (rinsing liquid) is transferred through each pipeline 11, 21 and the flow path 3. This rinsing process is generally the same as the above, and depending on the inner diameter and length of each pipeline 11, 21 and the flow path 3, etc., so that the chemical polishing liquid remaining on the inner peripheral surface of each pipeline 11, 21 and the flow path 3 can be rinsed, it may be executed until a predetermined time set in advance elapses, or until a predetermined flow rate (integrated flow rate) set in advance is exceeded. Next, as shown in FIGS. 2 and 3(b), in the same manner as described above, a recovery process for recovering the liquid (rinsing liquid) is executed.

[0051] Then, as shown in FIGS. 2 and 4(a), in the same manner as the above-described cleaning process, a supply process for supplying the liquid (cleaning / neutralizing liquid) toward the flow path 3 is configured, and a neutralization process for neutralizing the flow path 3 is executed. This neutralization process may be executed until a predetermined time set in advance elapses, depending on the inner diameter and length of each pipeline 11, 21 and the flow path 3, etc., so that the flow path 3 can be neutralized, or until a predetermined flow rate (integrated flow rate) set in advance is exceeded. Next, as shown in FIGS. 2 and 4(b), in the same manner as described above, a recovery process for recovering the liquid (cleaning / neutralizing liquid) is executed. Then, as shown in FIGS. 2 and 3(a), in the same manner as described above, a rinsing process is executed. This rinsing process is generally the same as the above, and depending on the inner diameter and length of each pipeline 11, 21 and the flow path 3, etc., so that the cleaning / neutralizing liquid remaining on the inner peripheral surface of each pipeline 11, 21 and the flow path 3 can be rinsed, it may be executed until a predetermined time set in advance elapses, or until a predetermined flow rate (integrated flow rate) set in advance is exceeded. Also, this rinsing process may be executed until the liquid (rinsing liquid) returned to the third storage section 10C becomes transparent to a certain degree. Next, as shown in FIGS. 2 and 3(b), in the same manner as described above, a recovery process for recovering the liquid (rinsing liquid) is executed.

[0052] After the entire chemical polishing process of the above-described series of channels 3 is completed, check the inner peripheral surface, inner diameter, etc. of the channel 3. If there is insufficient polishing, the series of chemical polishing processes may be performed again in substantially the same manner as above. In this case, the processing time (or integrated flow rate) in the above-described polishing processes (the first polishing process and the second polishing process) may be made shorter (or less) than the previous time. Also, the above-described basic operation is an example, and it is possible to execute appropriate modified operations. For example, in the above example, after collecting the chemical polishing liquid, the bypass liquid supply valve 18 and the bypass liquid return valve 28 are closed, the main liquid supply valve 17 and the main liquid return valve 27 are opened, and an example of performing the rinsing process and the neutralization process is shown. In addition to this, the rinsing process and the neutralization process on the side of the first bypass path 16 and the second bypass path 26 may be performed. Also, in the above example, an example of performing the rinsing process after the cleaning process, the polishing process, and the neutralization process is shown. However, it may be an aspect not to perform the rinsing process after at least one of these cleaning process, polishing process, and neutralization process. Also, in the above example, an example of providing each bypass path 16, 26 and each bypass switching part (17, 18, 27, 28) is shown so that the passing direction of the liquid passing through the channel 3 can be switched. However, a configuration without providing these may also be used. That is, in this case, the second polishing process and the second chemical polishing liquid recovery process become unnecessary.

[0053] Regarding the specific configurations of the respective components included in the liquid supply device 1 according to the above-described embodiment and the liquid supply method according to the above-described embodiment that is executed using the liquid supply device 1, they are not limited to the above-described configurations, and various other modifications are possible. The liquid supply method according to the present embodiment may be executed using another device instead of the above-described liquid supply device 1. In the above example, an example is shown in which a transfer direction switching unit that enables switching of the transfer direction of the fluid transferred by the pump is provided to switch the transfer direction of the fluid passing through each pipeline and execute a liquid supply step and a liquid recovery step. However, the present invention is not limited to such an example. The liquid supply method according to the present embodiment may be executed using, for example, a device provided with a displacement mechanism or the like that relatively vertically displaces the first end portion 13 side of the first pipeline 11 with respect to the liquid level of the storage portion 10. In this case, after executing the liquid supply step, without switching the transfer direction of the fluid passing through each pipeline, a recovery step may be configured to relatively move the first end portion 13 of the first pipeline 11 to be above the liquid level so as to suck in air and recover the liquid. In this case, the above-described rotary pump may be used, or a gas-liquid dual-purpose pump may also be used. The liquid supply method according to the present embodiment can be executed using various other devices.

Explanation of Reference Numerals

[0054] 1 Liquid supply device 6 Heating container (heating unit) 10 Storage portion 11 First pipeline (pipeline) 12 Branch pipeline 13 First end 14 Second end 15 First pipeline switching unit 16 First bypass path 17 Main liquid feed valve (first bypass switching unit) 18 Bypass liquid feed valve (first bypass switching unit) 19 Heating unit 20 Pump (transfer direction switching unit) 21 Second pipeline (pipeline) 22 Branch pipeline 23 First end 24 Second end 25 Second pipeline switching section 26 Second bypass path 27 Main return valve (second bypass switching section) 28 Bypass return valve (second bypass switching section) 31 Control section 2 Supply target 3 Flow path 4 First connection port 5 Second connection port

Claims

1. a first pipeline having a first end provided to open below the liquid level in a storage section for storing a liquid, and a second end connected to a first connection port of a flow path to be supplied; a second pipeline having a first end provided to open above the liquid level in the storage section, and a second end connected to a second connection port of the flow path; a transfer direction switching section provided in one of the first pipeline and the second pipeline, capable of switching the transfer direction of a fluid transferred by a pump; a control section that switches and controls the transfer direction switching section, and executes a supply process of supplying the liquid toward the flow path through the first pipeline, and a recovery process of supplying air toward the flow path through the second pipeline to recover the liquid; A liquid supply device characterized by comprising the above.

2. In Claim 1, a plurality of the storage sections for storing liquids respectively; a first pipeline switching section that selectively switches and communicates each branched pipeline and the second end side of the first pipeline, the first end side of which is branched into a plurality and provided to open below the liquid level in each storage section; and a second pipeline switching section that selectively switches and communicates each branched pipeline and the second end side of the second pipeline, the first end side of which is branched into a plurality and provided to open above the liquid level in each storage section; The control section switches and controls the first pipeline switching section, the second pipeline switching section, and the transfer direction switching section, and executes the recovery process of recovering the liquid in each storage section after the supply process of supplying the liquid in each storage section. A liquid supply device characterized by this.

3. In Claim 1 or 2, A liquid supply device characterized in that a heating section for heating the liquid passing through the first pipeline is provided on the outer peripheral side of the first pipeline.

4. In Claim 1 or 2, A first bypass passage connecting an intermediate portion of the first pipeline and an intermediate portion of the second pipeline, a second bypass passage connecting a first end side portion of the second pipeline at a portion where the first bypass passage is connected and a second end side portion of the first pipeline at a portion where the first bypass passage is connected, a first bypass switching portion for switching the first end side of the first pipeline between a state of communicating with the second end of the first pipeline and a state of communicating with the second end of the second pipeline via the first bypass passage, and a second bypass switching portion for switching the first end side of the second pipeline between a state of communicating with the second end of the second pipeline and a state of communicating with the second end of the first pipeline via the second bypass passage. A liquid supply device characterized by comprising.

5. In claim 1 or 2, A liquid supply device characterized by comprising a heating portion for heating the supply target.

6. A liquid supply method, comprising providing a pipeline so as to supply the liquid in the storage portion toward the flow path of the supply target, passing the liquid through the flow path and returning it to the storage portion, supplying air to the pipeline and the flow path after supplying the liquid to the flow path via the pipeline, and recovering the liquid.

Images