Recovery system, cell culture system and recovery method

Abstract

To provide a recovery system, a cell culture system, and a recovery method capable of automatically recovering a workpiece while suppressing internal contamination.SOLUTION: A recovery system includes: a wall that extends horizontally, divides a clean space from an external space that is located below the clean space and has a negative pressure relative to the clean space and has an exhaust port that penetrates in the vertical direction; and a recovery device that is provided in the external space below the wall and recovers workpieces that can contain culture medium from the clean space. The recovery device includes: an elevator that has a pedestal on which the workpieces can be placed and that can be moved vertically from the exhaust port to a predetermined height in the external space; and a shelf that is arranged alongside the elevator in the first horizontal direction and can store the workpieces that are on the pedestal. The pedestal is arranged so that it can be positioned within the exhaust port with a predetermined gap from the exhaust port.SELECTED DRAWING: Figure 2

Description

Technical Field

[0001] The present disclosure relates to a recovery system, a cell culture system, and a recovery method.

Background Art

[0002] Patent Document 1 discloses a biomanufacturing apparatus for cell culture.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0004] Works that have completed a series of cell culture processes or works with insufficient culture performance are recovered and discarded. In automating the recovery operation, it was necessary to avoid liquid movement between works due to liquid splashing and internal contamination of the cell culture automation device.

[0005] The present disclosure has been made to solve the above problems, and an object thereof is to provide a recovery system and a cell culture system that can automatically recover works while suppressing internal contamination.

Means for Solving the Problems

[0006] In order to solve the above problems, the recovery system according to the present disclosure extends horizontally, partitions a clean space and an external space located below the clean space and having a negative pressure with respect to the clean space, and has a wall in which a discharge port penetrating in the vertical direction is formed, and a recovery device provided in the external space below the wall for recovering a work capable of accommodating a culture solution from the clean space. The recovery device includes an elevator having a pedestal on which the work can be placed and which can move vertically from the discharge port to a predetermined height in the external space, and a shelf arranged side by side with the elevator in a first horizontal direction and capable of accommodating the work on the pedestal. The pedestal is provided so as to be arranged in the discharge port with a predetermined gap from the discharge port.

[0007] The cell culture system according to the present disclosure includes the above-described recovery system, and includes a clean bench that forms the clean space inside and performs a dispensing operation on the work in the clean space, and an incubator that forms a culture area for performing a culture operation on the work.

[0008] The recovery method according to the present disclosure is a recovery method using a recovery system that extends horizontally, partitions a clean space and an external space located below the clean space and having a negative pressure with respect to the clean space, and has a wall in which a discharge port penetrating in the vertical direction is formed, and a recovery device provided in the external space below the wall for recovering a work capable of accommodating a culture solution from the clean space. The recovery device includes an elevator having a pedestal on which the work can be placed and which can move vertically from the discharge port to a predetermined height in the external space, and a shelf arranged side by side with the elevator in a first horizontal direction and capable of accommodating the work on the pedestal. The pedestal is provided so as to be arranged in the discharge port with a predetermined gap from the discharge port. The method includes a preparation step of arranging the pedestal in the discharge port with a predetermined gap from the discharge port and placing the work on the pedestal, a lowering step of lowering the pedestal from the discharge port and opposing the shelf and the pedestal in the first horizontal direction, and a storage step of storing the work on the pedestal opposed to the shelf in the shelf.

Advantages of the Invention

[0009] According to the recovery system, cell culture system, and recovery method of the present disclosure, it is possible to automatically recover the workpiece while suppressing internal contamination.

Brief Description of the Drawings

[0010]

Figure 1

Figure 2

Figure 3

Figure 4

Figure 5

Figure 6

Figure 7

Figure 8

Modes for Carrying Out the Invention

[0011] Hereinafter, embodiments of the present disclosure will be described in detail with reference to the drawings. The cell culture system 100 of the present embodiment shown in FIG. 1 is a system that performs cell culture, analysis of cells after culture, etc., using the workpiece unit 1 (see FIG. 2) as a processing unit, and these processes are performed, for example, unmanned and automatically.

[0012] As shown in FIGS. 2 and 3, the work unit 1 includes a work 2 capable of accommodating a culture solution and a work tray 3 on which the work 2 is placed. For example, a flask 2a is used as the work 2. When the work 2 is a flask 2a, a plurality (for example, two in this embodiment) of flasks 2a are placed on one work tray 3. One work unit 1 is formed by the two flasks 2a and the work tray 3. The flask 2a contains a culture solution including cells and a medium to which nutrients necessary for cell growth are added. As another work 2b, for example, a well plate or the like is used (see FIG. 3).

[0013] <Cell culture system> As shown in FIG. 1, the cell culture system 100 includes a first stocker 110, a second stocker 120, an incubator 130, a clean bench 140, and a pass box 150.

[0014] <First stocker> The first stocker 110 is a facility for storing a plurality of work units 1. The area inside the first stocker 110 is the first storage area R1.

[0015] <Second stocker> The second stocker 120 is provided adjacent to the first stocker 110. The second stocker 120 is provided with facilities such as a pedestal on which the work unit 1 can be placed and a refrigerated freezer capable of storing a culture solution. The area inside the second stocker 120 is the second storage area R2.

[0016] <Incubator> The incubator 130 is a facility for growing cells in a culture solution. The incubator 130 forms a culture area R3 inside for performing a culture operation on the work 2. The atmosphere in the culture area R3 is controlled to a temperature, humidity, and carbon dioxide concentration suitable for cell culture.

[0017] <Clean bench> The clean bench 140 is equipment for performing various liquid operations and treatments on the work unit 1. The clean bench 140 forms a clean space S1 inside, and forms a liquid operation area R4 inside the clean space S1 for performing dispensing operations and the like on the work 2 (see Fig. 2). The liquid operation area R4 is a space in a highly clean and aseptic state (bio clean room). In the liquid operation area R4, air circulates as a downflow (downward airflow).

[0018] Inside the clean bench 140, various equipment such as, for example, a dispensing device, a filtering device, a sealing device, a waste liquid draining device, and a recovery system 10 described later are provided. Outside the clean bench 140, a medium supply device capable of supplying a medium to the dispensing device, a cell analysis device capable of analyzing the culture solution dispensed by the dispensing device, and the like are provided.

[0019] Here, the clean bench 140 is arranged adjacent to the first stocker 110 and the second stocker 120. Inside the first stocker 110, a first stocker door 110a is provided that separates the first storage area R1 and the liquid operation area R4. When the first stocker door 110a is in the open state, the first storage area R1 and the liquid operation area R4 are in a communicating state, and the work unit 1 can move back and forth between these areas. When the first stocker door 110a is in the closed state, the first storage area R1 and the liquid operation area R4 are in a non-communicating state, and these areas are isolated.

[0020] Inside the second stocker 120, a second stocker door 120a is provided that separates the second storage area R2 and the liquid operation area R4. When the second stocker door 120a is in the open state, the second storage area R2 and the liquid operation area R4 are in a communicating state, and the work unit 1 can move back and forth between these areas. When the first stocker door 110a is in the closed state, the first storage area R1 and the liquid operation area R4 are in a non-communicating state, and these areas are isolated.

[0021] <Pass box> The pass box 150 is provided between the incubator 130 and the clean bench 140 so as to be in contact with them. The pass box 150 has a first pass door 150a and a second pass door 150b. When the first pass door 150a is opened, the culture area R3 and the area inside the pass box 150 are in communication. When the second pass door 150b is opened, the liquid operation area R4 and the area inside the pass box 150 are in communication. Therefore, by the opening and closing operations of these first pass door 150a and second pass door 150b, the culture area R3 and the liquid operation area R4 can be switched between a state where they are isolated and a state where the work unit 1 can move back and forth between these areas. Note that the first pass door 150a and the second pass door 150b are not open simultaneously. Thus, the culture area R3 and the liquid operation area R4 do not communicate with each other, and the atmospheric state of each area is maintained.

[0022] <Positive pressure maintenance device> A positive pressure maintenance device 4 is provided in each of the rooms of the first stocker 110, the second stocker 120, the incubator 130, and the clean bench 140. The positive pressure maintenance device 4 is, for example, a HEPA filter (High Efficiency Particulate Air Filter), which removes dust, powder, etc. from the sucked outside air and introduces clean air into the room. By introducing clean air, the air pressure in the room becomes higher than the air pressure outside. In this way, each of the rooms of the first stocker 110, the second stocker 120, the incubator 130, and the clean bench 140 is maintained at a positive pressure by the positive pressure maintenance device 4. In this embodiment, among each room, the air pressure of the first stocker 110 is maintained at the highest pressure (positive pressure).

[0023] <Conveying device> In each of the first storage area R1, the second storage area R2, the culture area R3, and the liquid operation area R4, for example, a transport robot capable of moving horizontally is provided as a transport device. Thereby, the work unit 1 can be moved in each area. By coordinating the opening and closing of each door and the operation of the transport robot, the work unit 1 can move back and forth in each area.

[0024] <Detailed Structure of Clean Bench> Next, the detailed structure of the clean bench 140 will be described. The clean bench 140 is maintained at a positive pressure by the above-described positive pressure maintaining device 4 (HEPA filter), and is a clean space S1 with less dust. The clean bench 140 is provided with a recovery system 10 for recovering the unnecessary work 2.

[0025] <Recovery System> As shown in FIGS. 2 to 4, the recovery system 10 includes the above-described positive pressure maintaining device 4, a wall 11, and a recovery device 20. Hereinafter, one direction in the horizontal direction orthogonal to the vertical direction Dv is defined as the "horizontal first direction Dh1", and the direction in the horizontal direction that intersects the horizontal first direction Dh1 is defined as the "horizontal second direction Dh2". In the present embodiment, the horizontal first direction Dh1 and the horizontal second direction Dh2 are orthogonal to each other.

[0026] <Wall> The wall 11 is a part of the bottom wall of the clean bench 140 and extends in the horizontal direction. The wall 11 partitions the above-described clean space S1 and an external space S2 located below the clean space S1. The clean space S1 is maintained at a positive pressure by the positive pressure maintaining device 4. As a result, the external space S2 below the wall 11 has a negative pressure with respect to the clean space S1 above the wall 11. An outlet 12 that penetrates the wall 11 in the vertical direction Dv is formed in the wall 11. The work tray 3 in which the unnecessary work 2 in the clean bench 140 is stored is discharged from the clean space S1 to the external space S2 through this outlet 12. The outlet 12 is formed in a rectangular shape extending in the horizontal second direction Dh2 when viewed from above.

[0027] <Recovery device> The recovery device 20 recovers the work unit 1 from the clean space S1. The recovery device 20 is provided in the external space S2 below the wall 11. The recovery device 20 is provided at a position separated from the first stocker 110, the second stocker 120, and the incubator 130 in the clean bench 140. The recovery device 20 includes an elevator 30, a shelf 40, and a control device 50. The elevator 30 and the shelf 40 are arranged to face each other in the horizontal first direction Dh1. Hereinafter, the direction from the elevator 30 to the shelf 40 in the horizontal first direction Dh1 will be described as the front, and the direction from the shelf 40 to the elevator 30 in the horizontal first direction Dh1 will be described as the rear.

[0028] <Elevator> The elevator 30 is disposed below the discharge port 12. The elevator 30 includes a pedestal 31, a moving mechanism 32, and a first tilting mechanism 34.

[0029] <Pedestal> The pedestal 31 is formed in a rectangular plate shape extending in the horizontal second direction Dh2. A plurality of work units 1 are arranged side by side in the horizontal second direction Dh2 on the pedestal 31 and can be placed thereon. The pedestal 31 is installed so as to be movable in the vertical direction Dv from the discharge port 12 to a predetermined height in the external space S2. The pedestal 31 of the present embodiment is formed in the same shape as the discharge port 12 when viewed from above. The pedestal 31 is disposed in the discharge port 12 with a predetermined gap S3 from the discharge port 12, and closes most of the discharge port 12. Further, a stopper 36 protruding upward is provided at the rear end of the pedestal 31. The stopper 36 prevents the work unit 1 from falling backward. The stopper 36 suppresses the work unit 1 placed on the pedestal 31 from falling backward.

[0030] <Moving mechanism> The moving mechanism 32 moves the pedestal 31 in the vertical direction Dv. The moving mechanism 32 includes a guide 32a and an actuator 33.

[0031] The guide 32a extends in the vertical direction Dv. The guide 32a is provided so as to be located on the rear end side within the discharge port 12 when viewed from above. The upper end of the guide 32a is located within the discharge port 12. Fixed brackets 35 are provided at the upper and lower ends of the guide 32a. The fixed brackets 35 are provided so as to protrude rearward from the guide 32a. The fixed bracket 35 at the upper end of the guide 32a fixes the guide 32a to the wall 11. The fixed bracket 35 at the lower end of the guide 32a fixes the guide 32a to the bottom wall 5 which is located below the recovery device 20. This bottom wall 5 is arranged to float upward from the floor surface and is supported by legs 6 extending upward from the floor surface. The actuator 33 moves vertically along the guide 32a. An integral body of the pedestal 31 and a first tilting mechanism 34 described later is attached to the actuator 33.

[0032] <First Tilting Mechanism> The first tilting mechanism 34 changes the first tilt angle θ1 of the pedestal 31 with respect to the horizontal first direction Dh1. The first tilting mechanism 34 moves vertically in the direction Dv along the guide 32a together with the pedestal 31 by the power of the actuator 33. As shown in FIG. 5, the first tilting mechanism 34 has a support bracket 37 and a cylinder 38.

[0033] The support bracket 37 is provided so as to protrude forward from the actuator 33. The upper end of the support bracket 37 extends in the horizontal first direction Dh1. The pedestal 31 is placed on the support bracket 37. The support bracket 37 is installed so as to be movable vertically in the direction Dv along the guide 32a together with the pedestal 31 by the power of the actuator 33. Further, the front end portion of the pedestal 31 is attached to the front end portion of the support bracket 37 via the attachment piece 31a. The pedestal 31 is installed so as to be rotatable about a first rotation axis O1 extending in the horizontal second direction Dh2 through this attachment piece 31a.

[0034] The cylinder 38 is attached to the support bracket 37 and is located below the pedestal 31. The cylinder 38 extends in the vertical direction Dv and is inclined so as to be located rearward as it goes upward. The tip of the cylinder 38 is connected to the rear end of the pedestal 31. The cylinder 38 expands and contracts in the vertical direction Dv. When the cylinder 38 expands and contracts, the pedestal 31 rotates around the first rotation axis O1, and the pedestal 31 inclines with respect to the horizontal first axis. In this way, the first inclination mechanism 34 can adjust the first inclination angle θ1 of the pedestal 31 with respect to the horizontal first direction Dh1 by expanding and contracting the cylinder 38. In FIG. 5, the case where the pedestal 31 inclines such that the cylinder 38 extends and the rear end of the pedestal 31 is located upward is illustrated. However, the pedestal 31 may incline such that the cylinder 38 contracts and the front end of the pedestal 31 is located downward.

[0035] <Shelf> As shown in FIGS. 2 to 4, the shelf 40 is placed on the bottom wall 5 and is arranged side by side with the elevator 30 in the horizontal first direction Dh1. The shelf 40 is located forward with respect to the discharge port 12. The shelf 40 is capable of storing the work unit 1 on the pedestal 31. The shelf 40 includes a casing 41, a mounting plate 42, a second inclination mechanism 43, and a roller mat 44.

[0036] <Casing> The casing 41 includes a bottom plate 41a and a partition plate 41b. The bottom plate 41a is arranged to extend horizontally on the bottom wall 5. The bottom plate 41a is formed in a rectangular shape having one side in the horizontal first direction Dh1 when viewed from the vertical direction Dv. The partition plate 41b is provided on the upper surface of the bottom plate 41a and extends in the vertical direction Dv and the horizontal first direction Dh1. A plurality of partition plates 41b are provided at intervals in the horizontal second direction Dh2. Each partition plate 41b is formed in a rectangular shape having one side in the horizontal first direction Dh1 when viewed from the horizontal second direction Dh2.

[0037] <Mounting plate> The mounting plate 42 is formed in a rectangular plate shape extending in the horizontal first direction Dh1. The work unit 1 is mounted on the mounting plate 42. A plurality of mounting plates 42 are arranged at intervals in the vertical direction Dv between adjacent partition plates 41b. That is, a plurality of mounting plates 42 are provided side by side in a plurality of vertical directions Dv and the horizontal second direction Dh2. Each mounting plate 42 extends in the horizontal first direction Dh1 to an extent that can mount a plurality of workpieces 2. A storage chamber 46 is formed by these plurality of mounting plates 42 and the casing 41. The storage chamber 46 extends in the horizontal first direction Dh1 and is capable of storing a plurality of work units 1. The plurality of storage chambers 46 are formed in a grid pattern when viewed from the horizontal first direction Dh1.

[0038] Further, a stopper 42a protruding upward is provided at the front end portion of the mounting plate 42. The stopper 42a suppresses the work unit 1 mounted on the mounting plate 42 from falling forward.

[0039] <Second tilting mechanism> As shown in FIG. 5, the second tilting mechanism 43 changes the second tilting angle θ2 of the mounting plate 42 with respect to the horizontal first direction Dh1. The second tilting angle θ2 is preferably smaller than the first tilting angle θ1. The second tilting mechanism 43 has a motor 43a. The motor 43a is provided at the rear end portion of each mounting plate 42. The motor 43a rotates the mounting plate 42 around a second rotation axis O2 extending in the horizontal second direction Dh2 through the motor 43a. Thereby, the second tilting angle θ2 of the mounting plate 42 with respect to the horizontal first direction Dh1 is adjusted to an appropriate angle.

[0040] <Roller mat> The roller mat 44 is provided on the upper surface of the mounting plate 42. The roller mat 44 has a plurality of rollers 45 arranged in the horizontal first direction Dh1. The rollers 45 are rotatably provided around a roller axis O3 extending in the horizontal second direction Dh2 orthogonal to the horizontal first direction Dh1.

[0041] <Control device> The control device 50 controls the driving of various devices such as the moving mechanism 32, the first tilting mechanism 34, and the second tilting mechanism 43. For example, the control device 50 controls the first tilting mechanism 34 and the second tilting mechanism 43 according to the size and weight of the work unit 1.

[0042] As shown in FIG. 6, the control device 50 has functional parts including a lifting part 51, a first tilting part 52, and a second tilting part 53. The lifting part 51 drives the actuator 33 to raise and lower the pedestal 31. The first tilting part 52 expands and contracts the cylinder 38 to tilt the pedestal 31. The second tilting part 53 drives the motor 43a to tilt the mounting plate 42.

[0043] <Method for recovering the work unit> Subsequently, the method for recovering the work unit 1 will be described with reference to the flow in FIG. 6. The recovery method of this embodiment includes a preparation step S11, a lowering step S12, and a storage step S13.

[0044] In the preparation step S11, the lifting part 51 operates the actuator 33 and arranges the pedestal 31 with a predetermined gap S3 left from the discharge port 12. The pedestal 31 installed in the discharge port 12 closes the discharge port 12. At this time, the upper surface of the pedestal 31 extends in the horizontal direction and is flush with the upper surface of the wall 11. The work unit 1 that has become unnecessary after performing various liquid operations such as dispensing and analysis operations in the clean bench 140 is transported to the recovery system 10 by the transport device. The transport device places the work unit 1 scheduled for disposal on the pedestal 31. A plurality of work units 1 are placed on the pedestal 31.

[0045] At this time, a predetermined gap S3 is left between the pedestal 31 and the discharge port 12. Further, the external space S2 below the wall 11 is under negative pressure with respect to the clean space S1 above the wall 11. For this reason, the air in the clean space S1 is discharged from the gap S3 between the pedestal 31 and the discharge port 12 to the lower external space S2. Due to the downflow (descending air current) generated in this way, dust and the like in the clean space S1 are discharged from the gap S3 between the pedestal 31 and the discharge port 12. Thereby, even if, for example, the culture solution in the workpiece 2 leaks due to vibration, the leaked culture solution is discharged from the gap S3 between the pedestal 31 and the discharge port 12 to the external space S2.

[0046] After the preparation step S11, a descending step S12 is performed. In the descending step S12, the elevating part 51 drives the actuator 33 to lower the pedestal 31 from the discharge port 12. At this time, the pedestal 31 moves downward from the discharge port 12, and the discharge port 12 is completely opened. Thereby, the downflow (descending air current) through the discharge port 12 from the clean space S1 to the external space S2 becomes larger. This downflow suppresses the intrusion of dust and the like from the external space S2 into the upper clean space S1.

[0047] When the pedestal 31 descends and the vibration transmitted to the workpiece unit 1 is large, the cylinder 38 may be contracted to tilt the pedestal 31 so that the rear end portion of the pedestal 31 is positioned below the front end portion of the pedestal 31. Thereby, it is suppressed that the workpiece unit 1 drops toward the shelf 40 due to vibration.

[0048] The pedestal 31 descends to a position facing the shelf 40 in the horizontal first direction Dh1. More specifically, the pedestal 31 descends to the height of the mounting plate 42 for the purpose of mounting the workpiece unit 1. Thereby, the upper surface of the pedestal 31 is near the upper surface of the target mounting plate 42 and is positioned above the upper surface of the mounting plate 42. In the present embodiment, the upper surface of the pedestal 31 is positioned above the upper surface of the roller mat 44. At this time, the vertical separation distance Dv between the upper surface of the pedestal 31 and the upper surface of the mounting plate 42 is equal to or less than the thickness of the pedestal 31.

[0049] After the descending step S12, a storage step S13 is performed. In the storage step S13, the work unit 1 on the pedestal 31 facing the shelf 40 in the horizontal first direction Dh1 is stored in the shelf 40. The storage step S13 is specifically performed according to the following procedure.

[0050] In the storage step S13, the first inclined portion 52 extends the cylinder 38, and the pedestal 31 is inclined so that the front end portion of the pedestal 31 is positioned below the rear end portion of the pedestal 31. Then, the work unit 1 moves from the pedestal 31 onto the mounting plate 42 (accurately, on the roller mat 44) by its own weight. At this time, the mounting plate 42 is inclined so that the front end portion of the mounting plate 42 is positioned below the rear end portion of the mounting plate 42. For this reason, the work unit 1 that has moved onto the mounting plate 42 also moves forward on the mounting plate 42 by its own weight. In this embodiment, since the roller mat 44 is installed on the mounting plate 42, the rollers 45 rotate and the work unit 1 slides down smoothly. At this time, the first inclined portion 52 controls the cylinder 38 to adjust the first inclination angle θ1 of the pedestal 31 with respect to the horizontal first direction Dh1, and the second inclined portion 53 controls the motor 43a to adjust the second inclination angle θ2 of the mounting plate 42 with respect to the horizontal first direction Dh1. The second inclination angle θ2 of the mounting plate 42 with respect to the horizontal first direction Dh1 is adjusted to be smaller than the first inclination angle θ1 of the pedestal 31 with respect to the horizontal first direction Dh1.

[0051] When the work unit 1 moves to the front end portion of the mounting plate 42, it hits the stopper 42a and stops. In this way, the plurality of work units 1 are sequentially stored from the inner part on the stopper 42a side of the storage chamber 46. With the above procedure, the work unit 1 is stored in all the storage chambers 46. These work units 1 are recovered, for example, by the manual work of an operator. Through the above procedure, the recovery of the unnecessary work unit 1 is completed.

[0052] <Function and effect> In this embodiment, the recovery system 10 includes a wall 11 and a recovery device 20. The wall 11 extends in the horizontal direction and partitions a clean space S1 and an external space S2 that is located below the clean space S1 and has a negative pressure with respect to the clean space S1. An outlet 12 penetrating in the vertical direction Dv is formed in the wall 11. The recovery device 20 is provided in the external space S2 below the wall 11, and recovers the work unit 1 on which the work unit 1 capable of accommodating the culture solution is installed from the clean space S1. The recovery device 20 includes an elevator 30 and a shelf 40. The elevator 30 has a pedestal 31 on which the work unit 1 can be placed and which can move in the vertical direction Dv from the outlet 12 to a predetermined height in the external space S2. The shelf 40 is arranged side by side with the elevator 30 in the horizontal first direction Dh1 and is capable of storing the work unit 1 on the pedestal 31. The pedestal 31 is provided so as to be arranged in the outlet 12 with a predetermined gap S3 left from the outlet 12.

[0053] Place the pedestal 31 of the elevator 30 in the outlet 12, and place the work unit 1 in the clean space S1 on the pedestal 31. Then, lower the pedestal 31 to store the work unit 1 in the shelf 40. Thereby, the unnecessary work unit 1 in the clean space S1 can be automatically recovered. Further, the pedestal 31 is arranged in the outlet 12 with a predetermined gap S3 left from the outlet 12, and closes the outlet 12. Furthermore, the external space S2 has a negative pressure with respect to the clean space S1. For this reason, even if the culture solution accidentally spills from the work 2 in the clean space S1, the spilled culture solution is sucked from the gap S3 between the pedestal 31 and the outlet 12 into the external space S2. Also, even if the pedestal 31 on which the work unit 1 is placed is lowered to store the work unit 1 in the shelf 40, since the external space S2 has a negative pressure with respect to the clean space S1, the air flow from the clean space S1 to the external space S2 increases at the outlet 12, and the intrusion of foreign matter from the external space S2 into the clean space S1 is suppressed. Therefore, according to this embodiment, internal contamination of the clean space S1 can be suppressed.

[0054] The elevator 30 further includes a first tilting mechanism 34 that can change the first tilting angle θ1 of the pedestal 31 with respect to the horizontal first direction Dh1.

[0055] Accordingly, when moving the work unit 1 from the pedestal 31 to the shelf 40, the work unit 1 can be moved in the horizontal first direction Dh1 by its own weight simply by tilting the pedestal 31. At this time, by adjusting the first tilting angle θ1 of the pedestal 31 with respect to the horizontal first direction Dh1 to an appropriate angle, it is possible to reduce the vibration during the movement of the work unit 1 and suppress the liquid splash of the work unit 1. Therefore, it is possible to further suppress the internal contamination of the clean space S1.

[0056] The shelf 40 includes a placement plate 42 that extends in the horizontal first direction Dh1 and on which the work unit 1 is placed, and a second tilting mechanism 43 that can change the second tilting angle θ2 of the placement plate 42 with respect to the horizontal first direction Dh1.

[0057] Accordingly, when moving the work unit 1 on the pedestal 31 onto the placement plate 42 of the shelf 40, the work unit 1 can be moved in the horizontal first direction Dh1 by its own weight simply by tilting the storage plate, and the work unit 1 can be moved to the back of the shelf 40. At this time, by adjusting the second tilting angle θ2 of the placement plate 42 with respect to the horizontal first direction Dh1 to an appropriate angle, it is possible to reduce the vibration during the movement of the work unit 1 and suppress the liquid splash of the work unit 1. Therefore, it is possible to further suppress the internal contamination of the clean space S1.

[0058] The shelf 40 has a plurality of placement plates 42, and each placement plate 42 extends in the horizontal first direction Dh1 to such an extent that a plurality of work units 1 can be placed.

[0059] Accordingly, a plurality of work units 1 can be stored on the shelf 40. Therefore, after the plurality of work units 1 are stored in the shelf 40 up to the storage limit, these plurality of work units 1 can be taken out of the shelf 40 together. Therefore, the recovery efficiency of the work unit 1 can be improved.

[0060] The shelf 40 is further provided with a roller mat 44 provided on the upper surface of the mounting plate 42 and having a plurality of rollers 45 arranged in the horizontal first direction Dh1. The rollers 45 are rotatably provided around a roller axis O3 extending in a horizontal second direction Dh2 orthogonal to the horizontal first direction Dh1.

[0061] Thus, when the mounting plate 42 is tilted with the work unit 1 placed on the mounting plate 42, the roller 45 unit rotates due to the weight of the work unit 1. Thereby, while suppressing the second tilt angle θ2 of the mounting plate 42 with respect to the horizontal first direction Dh1 to the minimum source, the work unit 1 can be smoothly moved in the horizontal first direction Dh1 by the rotation of the roller 45 unit.

[0062] In the lowering step S12, the pedestal 31 is lowered so that the upper surface of the pedestal 31 is disposed in the vicinity of the upper surface of the mounting plate 42 and above the upper surface of the mounting plate 42. In the storage step S13, the pedestal 31 is inclined so as to be positioned downward as it approaches the mounting plate 42 in the horizontal first direction Dh1, and the mounting plate 42 is inclined so as to be positioned downward as it moves away from the pedestal 31 in the horizontal first direction Dh1.

[0063] In the present embodiment, the work unit 1 on the pedestal 31 can be smoothly moved onto the mounting plate 42 by its own weight with a simple operation of only tilting the pedestal 31 and the mounting plate 42. Therefore, it is possible to stably recover the work unit 1 while suppressing liquid splashing.

[0064] In the storage step S13, the pedestal 31 and the mounting plate 42 are inclined so that the first tilt angle θ1 is larger than the second tilt angle θ2.

[0065] In the present embodiment, the movement of the work unit 1 from the pedestal 31 to the mounting plate 42 can be performed more smoothly. Therefore, when recovering the work unit 1, liquid splashing can be further suppressed.

[0066] <Hardware Configuration> The control device 50 of the above-described embodiments and modified examples is implemented in the computer 1100 shown in FIG. 8. FIG. 14 is a schematic block diagram showing the configuration of the computer according to each embodiment. The computer 1100 includes a processor 1110, a main memory 1120, a storage 1130, and an interface 1140.

[0067] Then, the operations of the respective functional units of the control device 50 are stored in the storage 1130 in the form of a program. The processor 1110 reads the program from the storage 1130, expands it in the main memory 1120, and executes the above processing according to the program. Also, the processor 1110 secures a storage area in the main memory 1120 according to the program.

[0068] The program may be for realizing a part of the functions to be exhibited by the computer 1100. For example, the program may exhibit functions by combination with other programs already stored in the storage 1130 or by combination with other programs implemented in other devices. Also, in addition to or instead of the above configuration, the computer 1100 may include a custom LSI (Large Scale Integrated Circuit) such as a PLD (Programmable Logic Device). Examples of PLDs include PAL (Programmable Array Logic), GAL (Generic Array Logic), CPLD (Complex Programmable Logic Device), and FPGA (Field Programmable Gate Array). In this case, part or all of the functions realized by the processor 1110 may be realized by the integrated circuit.

[0069] Examples of the storage 1130 include a magnetic disk, a magneto-optical disk, a semiconductor memory, and the like. The storage 1130 may be an internal medium directly connected to the bus of the computer 1100, or may be an external medium connected to the computer 1100 via the interface 1140 or a communication line. Further, when this program is distributed to the computer 1100 via a communication line, the computer 1100 that has received the distribution may expand the program in the main memory 1120 and execute the above processing. The storage 1130 may be a non-transitory tangible storage medium.

[0070] Further, the program may be for realizing a part of the functions described above. Furthermore, the program may be a so-called difference file (difference program) that realizes the functions described above in combination with other programs already stored in the storage 1130.

[0071] <Other Embodiments> As described above, the embodiments of the present disclosure have been described in detail with reference to the drawings. However, the specific configuration is not limited to this embodiment, and design changes and the like within the scope not departing from the gist of the present disclosure are also included.

[0072] In the above-described embodiment, the case where the work unit 1 is used as a processing unit has been described. However, the work 2 may not be accommodated in the work tray 3, and the work 2 may be processed as a processing unit.

[0073] In the above-described embodiment, the pedestal 31 is formed long in the horizontal second direction Dh2, and a plurality of work units 1 are placed on the pedestal 31. However, the present invention is not limited to this. The pedestal 31 may be designed to be shorter in the horizontal second direction Dh2 than in this embodiment and to have a width approximately equal to that of one work unit 1 in order to individually move the work unit 1 in the vertical direction Dv. In this case, for example, a plurality of guides 32a are provided at intervals in the horizontal second direction Dh2. And an actuator 33 and a support bracket 37 are provided one by one for each guide 32a.

[0074] <Supplementary Note> The recovery system 10, cell culture system 100, and recovery method described in each embodiment are understood as follows, for example.

[0075] (1) The recovery system 10 according to the first aspect extends in the horizontal direction and partitions a clean space S1 and an external space S2 located below the clean space S1 and having a negative pressure with respect to the clean space S1. A wall 11 is formed with a discharge port 12 penetrating in the vertical direction Dv. A recovery device 20 is provided in the external space S2 below the wall 11 for recovering the workpiece 2 capable of accommodating the culture solution from the clean space S1. The recovery device 20 includes an elevator 30 having a pedestal 31 on which the workpiece 2 can be placed and which is movable in the vertical direction Dv from the discharge port 12 to a predetermined height in the external space S2, and a shelf 40 arranged side by side with the elevator 30 in the horizontal first direction Dh1 and capable of accommodating the workpiece 2 on the pedestal 31. The pedestal 31 is provided so as to be arranged in the discharge port 12 with a predetermined gap S3 left from the discharge port 12.

[0076] Place the pedestal 31 of the elevator 30 in the discharge port 12 and place the workpiece 2 in the clean space S1 on the pedestal 31. Then, lower the pedestal 31 to store the workpiece 2 in the shelf 40. Thereby, the unnecessary workpiece 2 in the clean space S1 can be automatically recovered. Also, the pedestal 31 is arranged in the discharge port 12 with a predetermined gap S3 left from the discharge port 12 to block the discharge port 12. Further, the external space S2 has a negative pressure with respect to the clean space S1. Therefore, even if the culture solution spills out of the workpiece 2 unintentionally in the clean space S1, the spilled culture solution is sucked into the external space S2 from the gap S3 between the pedestal 31 and the discharge port 12. Also, even if the pedestal 31 on which the workpiece 2 is placed is lowered to store the workpiece 2 in the shelf 40, since the external space S2 has a negative pressure with respect to the clean space S1, the air flow from the clean space S1 to the external space S2 increases at the discharge port 12, and the intrusion of foreign matter from the external space S2 into the clean space S1 is suppressed. Therefore, according to this aspect, internal contamination of the clean space S1 can be suppressed.

[0077] (2) The recovery system 10 of the second aspect is the recovery system 10 of (1), and the elevator 30 may further include a first tilting mechanism 34 capable of changing a first tilting angle θ1 of the pedestal 31 with respect to the horizontal first direction Dh1.

[0078] Thereby, when moving the workpiece 2 from the pedestal 31 to the shelf 40, the workpiece 2 can be moved in the horizontal first direction Dh1 by its own weight only by tilting the pedestal 31. At this time, by adjusting the first tilting angle θ1 of the pedestal 31 with respect to the horizontal first direction Dh1 to an appropriate angle, it is possible to reduce the vibration during the movement of the workpiece 2 and suppress the liquid splash of the workpiece 2.

[0079] (3) The recovery system 10 of the third aspect is the recovery system 10 of (1) or (2), and the shelf 40 may include a placement plate 42 extending in the horizontal first direction Dh1 on which the workpiece 2 is placed, and a second tilting mechanism 43 capable of changing a second tilting angle θ2 of the placement plate 42 with respect to the horizontal first direction Dh1.

[0080] Thereby, the workpiece 2 on the pedestal 31 can be moved onto the placement plate 42 of the shelf 40, and the workpiece 2 can be moved in the horizontal first direction Dh1 by its own weight only by tilting the storage plate, and the workpiece 2 can be moved to the back of the shelf 40. At this time, by adjusting the second tilting angle θ2 of the placement plate 42 with respect to the horizontal first direction Dh1 to an appropriate angle, it is possible to reduce the vibration during the movement of the workpiece 2 and suppress the liquid splash of the workpiece 2.

[0081] (4) The recovery system 10 of the fourth aspect is the recovery system 10 of (3), and the shelf 40 may include a plurality of the placement plates 42, and each placement plate 42 may extend in the horizontal first direction Dh1 to an extent that can place a plurality of workpieces 2.

[0082] Thereby, a plurality of workpieces 2 can be stored in the shelf 40.

[0083] (5) The recovery system 10 of the fifth aspect is the recovery system 10 of (3) or (4), wherein the shelf 40 is provided on the upper surface of the placement plate 42 and further has a roller mat 44 having a plurality of rollers 45 arranged in the horizontal first direction Dh1, and the rollers 45 may be rotatably provided about a roller axis O3 extending in a horizontal second direction Dh2 orthogonal to the horizontal first direction Dh1.

[0084] Accordingly, when the placement plate 42 is tilted with the work 2 placed on the placement plate 42, the rollers 45 rotate due to the weight of the work 2. Thereby, the work 2 can be smoothly moved in the horizontal first direction Dh1 by the rotation of the rollers 45 while suppressing the second tilt angle θ2 of the placement plate 42 with respect to the horizontal first direction Dh1 to a minimum source.

[0085] (6) The cell culture system 100 of the sixth aspect includes the recovery system 10 of any one of (1) to (5), forms a clean space S1 therein, and includes a clean bench 140 that performs a dispensing operation on the work 2 within the clean space S1, and an incubator 130 that forms a culture area R3 for performing a culture operation on the work 2.

[0086] (7) The recovery method of the seventh aspect extends horizontally and partitions a clean space S1 and an external space S2 located below the clean space S1 and having a negative pressure with respect to the clean space S1. A wall 11 is formed with a discharge port 12 penetrating in the vertical direction Dv. A recovery device 20 is provided in the external space S2 below the wall 11 and is configured to recover a work 2 capable of accommodating a culture solution from the clean space S1. The recovery device 20 includes an elevator 30 having a pedestal 31 on which the work 2 can be placed and which is movable in the vertical direction Dv from the discharge port 12 to a predetermined height in the external space S2, and a shelf 40 arranged side by side with the elevator 30 in the horizontal first direction Dh1 and capable of accommodating the work 2 on the pedestal 31. The pedestal 31 is provided so as to be arranged in the discharge port 12 with a predetermined gap S3 left from the discharge port 12. A recovery method using a recovery system 10, comprising: a preparation step S11 of arranging the pedestal 31 in the discharge port 12 with a predetermined gap S3 left from the discharge port 12 and placing the work 2 on the pedestal 31; a lowering step S12 of lowering the pedestal 31 from the discharge port 12 and opposing the shelf 40 and the pedestal 31 in the horizontal first direction Dh1; and a storage step S13 of storing the work 2 on the pedestal 31 opposed to the shelf 40 in the horizontal first direction Dh1 in the shelf 40.

[0087] (8) The recovery method of the eighth aspect is the recovery method of (7), wherein the elevator 30 further includes a first tilting mechanism 34 capable of changing a first tilting angle θ1 of the pedestal 31 with respect to the horizontal first direction Dh1, and the shelf 40 includes a mounting plate 42 extending in the horizontal first direction Dh1 on which the workpiece 2 is placed, and a second tilting mechanism 43 capable of changing a second tilting angle θ2 of the mounting plate 42 with respect to the horizontal first direction Dh1. In the lowering step S12, the pedestal 31 is lowered so that the upper surface of the pedestal 31 is disposed near the upper surface of the mounting plate 42 and above the upper surface of the mounting plate 42. In the storage step S13, the pedestal 31 may be tilted so as to be positioned downward as it approaches the mounting plate 42 in the horizontal first direction Dh1, and the mounting plate 42 may be tilted so as to be positioned downward as it separates from the pedestal 31 in the horizontal first direction Dh1.

[0088] In this aspect, by a simple operation of only tilting the pedestal 31 and the mounting plate 42, the workpiece 2 on the pedestal 31 can be smoothly moved onto the mounting plate 42 by the self-weight of the workpiece 2.

[0089] (9) The recovery method of the ninth aspect is the recovery method of (8), wherein in the storage step S13, the pedestal 31 and the mounting plate 42 may be tilted so that the first tilting angle θ1 is larger than the second tilting angle θ2.

[0090] In this aspect, the movement of the workpiece 2 from the pedestal 31 to the mounting plate 42 can be performed more smoothly.

Explanation of Reference Numerals

[0091] 1 Workpiece unit 2 Workpiece 2a Flask 2b Other workpieces 3 Workpiece tray 4 Positive pressure maintaining device 5 Bottom wall 6 Legs 10 Recovery system 11 Wall 12 discharge ports 20 recovery device 30 elevator 31 pedestal 31a mounting piece 32 moving mechanism 32a guide 33 actuator 34 first tilting mechanism 35 fixed bracket 36 stopper 37 support bracket 38 cylinder 40 shelf 41 casing 41a bottom plate 41b partition plate 42 placing plate 42a stopper 43 second tilting mechanism 43a motor 44 roller mat 45 roller 46 storage room 50 control device 51 lifting part 52 first tilting part 53 second tilting part 100 cell culture system 110 first stocker 110a first stocker door 120 second stocker 120a second stocker door 130 incubator 140 clean bench 150 pass box 150a first pass door 150b second pass door 1100 computer 1110 processor 1120 main memory 1130 storage 1140 interface Dv vertical direction Dh1 horizontal first direction Dh2 horizontal second direction O1 First rotation axis line O2 Second rotation axis line O3 Roller axis line R1 First storage area R2 Second storage area R3 Cultivation area R4 Liquid operation area S1 Clean space S2 External space S3 Gap S11 Preparation step S12 Descent step S13 Storage step θ1 First inclination angle θ2 Second inclination angle

Claims

1. A wall that extends horizontally, partitions a clean space and an external space that is located below the clean space and has a negative pressure with respect to the clean space, and has a discharge port that penetrates in the vertical direction; A recovery device that is provided in the external space below the wall and recovers a work that can contain a culture solution from the clean space; Comprising: The recovery device An elevator having a pedestal on which the work can be placed and that can move vertically from the discharge port to a predetermined height in the external space; A shelf that is arranged side by side with the elevator in a first horizontal direction and can store the work on the pedestal; Comprising: The pedestal is provided so as to be able to be arranged in the discharge port with a predetermined gap from the discharge port, a recovery system.

2. The recovery system according to claim 1, wherein the elevator further has a first inclination mechanism capable of changing a first inclination angle of the pedestal with respect to the first horizontal direction.

3. The shelf has a placement plate that extends in the first horizontal direction and on which the work is placed; The recovery system according to claim 1 or 2, further comprising a second inclination mechanism capable of changing a second inclination angle of the placement plate with respect to the first horizontal direction.

4. The shelf has a plurality of the placement plates; The recovery system according to claim 3, wherein each of the placement plates extends in the first horizontal direction to such an extent that a plurality of works can be placed.

5. The shelf further has a roller mat provided on an upper surface of the placement plate and having a plurality of rollers arranged in the first horizontal direction; The recovery system according to claim 3, wherein the rollers are rotatably provided around a roller axis extending in a second horizontal direction orthogonal to the first horizontal direction.

6. A clean bench that includes the recovery system according to claim 1 or 2, forms the clean space inside, and performs a dispensing operation on the work in the clean space; An incubator that forms a culture area for performing a culture operation on the work; A cell culture system comprising:

7. A wall that extends horizontally, partitions a clean space and an external space that is located below the clean space and has a negative pressure with respect to the clean space, and has a discharge port that penetrates in the vertical direction; A recovery device that is provided in the external space below the wall and recovers a work that can contain a culture solution from the clean space; Comprising: The recovery device An elevator having a pedestal on which the workpiece can be placed and which can move vertically from the discharge port to a predetermined height in the external space, A shelf arranged side by side with the elevator in a horizontal first direction and capable of storing the workpiece on the pedestal, Comprising, The pedestal is provided so as to be arranged in the discharge port with a predetermined gap from the discharge port, and is a recovery method using a recovery system, A preparation step of arranging the pedestal in the discharge port with a predetermined gap from the discharge port and placing the workpiece on the pedestal, A lowering step of lowering the pedestal from the discharge port and opposing the shelf and the pedestal in the horizontal first direction, A storage step of storing the workpiece on the pedestal opposed to the shelf in the horizontal first direction in the shelf, A recovery method including.

8. The elevator further has a first inclination mechanism capable of changing a first inclination angle of the pedestal with respect to the horizontal first direction, The shelf is, A placement plate extending in the horizontal first direction on which the workpiece is placed, A second inclination mechanism capable of changing a second inclination angle of the placement plate with respect to the horizontal first direction, Having, In the lowering step, the pedestal is lowered so that the upper surface of the pedestal is in the vicinity of the upper surface of the placement plate and above the upper surface of the placement plate, In the storage step, the pedestal is inclined so as to be positioned downward as it approaches the placement plate in the horizontal first direction, and the placement plate is inclined so as to be positioned downward as it separates from the pedestal in the horizontal first direction, The recovery method according to claim 7.

9. In the storage step, the pedestal and the placement plate are inclined so that the first inclination angle is larger than the second inclination angle, The recovery method according to claim 8.

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