Substrate processing equipment

Abstract

To provide substrate processing equipment in which flow volume of processing liquid can be more stabilized.SOLUTION: Substrate processing equipment 100 supplies processing liquid to a substrate W to process the substrate W. The substrate processing equipment 100 comprises piping 53, a flow meter 55, a flow regulating valve 54, and a flow control unit 113. The piping 53 causes the processing liquid to flow therein. The flow meter 55 measures the flow volume of the processing liquid flowing through the piping 53. The flow regulating valve 54 regulates the flow volume of the processing liquid flowing through the piping 53. The flow control unit 113 controls the opening degree of the flow regulating valve 54 on the basis of the measurement result from the flow meter 55 so that the flow volume value of the processing liquid becomes a target value. The flow regulating valve 54 has a stepping motor 543. The stepping motor 543 changes the opening of the flow regulating valve 54. The flow control unit 113 controls the opening of the flow regulating valve 54 by micro-stepping the stepping motor 543 on the basis of the measurement results obtained by the flow meter 55.SELECTED DRAWING: Figure 5

Description

[Technical Field]

[0001] The present invention relates to a substrate processing apparatus. [Background technology]

[0002] Substrate processing apparatuses that process substrates by supplying a processing liquid to the substrate are known. These types of substrate processing apparatuses are provided with piping through which the processing liquid flows. A motor needle valve is sometimes provided in the piping to adjust the flow rate of the processing liquid flowing through the piping (the amount of processing liquid flowing per unit time) (see, for example, Patent Document 1). [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Publication No. 2018-157042 Summary of the Invention [Problem to be solved by the invention]

[0004] A stepping motor is used as the actuator for the motor needle valve. The stepping motor of the motor needle valve is feedback-controlled so that the flow rate of the treatment liquid reaches a target value. However, the rotor of the stepping motor is prone to vibration during rotation. As a result, the flow rate of the treatment liquid is also prone to vibration. In other words, it is difficult to stabilize the flow rate of the treatment liquid.

[0005] The present invention has been made in view of the above-mentioned problems, and an object of the present invention is to provide a substrate processing apparatus that can more stabilize the flow rate of a processing liquid. [Means for solving the problem]

[0006] According to one aspect of the present invention, a substrate processing apparatus is an apparatus that processes a substrate by supplying a processing liquid to the substrate. The substrate processing apparatus includes a pipe, a flow meter, a flow rate adjustment valve, and a flow rate control unit. The pipe circulates the processing liquid. The flow meter measures the flow rate of the processing liquid flowing through the pipe. The flow rate adjustment valve adjusts the flow rate of the processing liquid flowing through the pipe. The flow rate control unit controls the aperture of the flow rate adjustment valve based on the measurement result of the flow meter so that the flow rate value of the processing liquid becomes a target value. The flow rate adjustment valve has a stepping motor. The stepping motor changes the aperture of the flow rate adjustment valve. The flow rate control unit drives the stepping motor in microsteps based on the measurement result of the flow meter to control the aperture of the flow rate adjustment valve.

[0007] In one embodiment, the flow rate control unit can selectively switch the drive method of the stepping motor between the microstep drive and the full-step drive, and the flow rate control unit drives the stepping motor in the microstep drive or the full-step drive according to a setting value that sets the drive method of the stepping motor.

[0008] In one embodiment, there are a plurality of the pipes, a plurality of the flow meters, and a plurality of the flow control valves. The flow control unit is capable of selectively switching the drive mode of the stepping motor included in each of the plurality of the flow control valves individually between the microstep drive and the full-step drive. The flow control unit drives each of the stepping motors in the microstep drive or the full-step drive according to the setting value that sets the drive mode of each of the stepping motors.

[0009] In one embodiment, the target value for the flow rate control valve that drives the stepping motor in the microsteps indicates a value smaller than a minimum flow rate value when the stepping motor is driven in full steps, the minimum flow rate value indicating the minimum flow rate of the treatment liquid when the stepping motor is driven in full steps within a range of a predetermined quality level related to the flow rate of the treatment liquid.

[0010] In one embodiment, the processing liquid includes a first processing liquid and a second processing liquid having a viscosity greater than that of the first processing liquid. The piping includes a first piping and a second piping. The first piping allows the first processing liquid to flow. The second piping allows the second processing liquid to flow. The flow meter includes a first flow meter and a second flow meter. The first flow meter measures the flow rate of the first processing liquid flowing through the first piping. The second flow meter measures the flow rate of the second processing liquid flowing through the second piping. The flow rate adjustment valve includes a first flow rate adjustment valve and a second flow rate adjustment valve. The first flow rate adjustment valve adjusts the flow rate of the first processing liquid flowing through the first piping. The second flow rate adjustment valve adjusts the flow rate of the second processing liquid flowing through the second piping. The first flow rate adjustment valve has a first stepping motor. The first stepping motor changes the aperture of the first flow rate adjustment valve. The second flow rate adjustment valve has a second stepping motor. The second stepping motor changes the opening degree of the second flow rate adjustment valve. The flow rate control unit drives the first stepping motor in microsteps and drives the second stepping motor in full steps.

[0011] In one embodiment, the substrate processing apparatus further includes a first detector and a second detector. The first detector generates a first measurement signal indicating a measured value of a flow rate of the first processing liquid based on a measurement result of the first flow meter. The second detector generates a second measurement signal indicating a measured value of a flow rate of the second processing liquid based on a measurement result of the second flow meter. The time constant of the first measurement signal and the time constant of the second measurement signal each indicate values ​​adjusted so that the opening and closing speed of the first flow rate adjustment valve matches or approximately matches the opening and closing speed of the second flow rate adjustment valve.

[0012] In one embodiment, the processing liquid includes a first processing liquid and a second processing liquid different from the first processing liquid. The piping includes a first piping and a second piping. The first piping allows the first processing liquid to flow. The second piping allows the second processing liquid to flow. The flow meter includes a first flow meter and a second flow meter. The first flow meter measures the flow rate of the first processing liquid flowing through the first piping. The second flow meter measures the flow rate of the second processing liquid flowing through the second piping. The flow rate adjustment valve includes a first flow rate adjustment valve and a second flow rate adjustment valve. The first flow rate adjustment valve adjusts the flow rate of the first processing liquid flowing through the first piping. The second flow rate adjustment valve adjusts the flow rate of the second processing liquid flowing through the second piping. The first flow rate adjustment valve has a first stepping motor. The first stepping motor changes the aperture of the first flow rate adjustment valve. The second flow rate adjustment valve has a second stepping motor. The second stepping motor changes the opening degree of the second flow rate adjustment valve. The flow rate control unit drives the first stepping motor in microsteps based on the measurement result of the first flow meter so that the flow rate value of the first treatment liquid becomes a first target value. The flow rate control unit drives the second stepping motor in full steps based on the measurement result of the second flow meter so that the flow rate value of the second treatment liquid becomes a second target value that is greater than the first target value.

[0013] In one embodiment, the substrate processing apparatus further includes a first detector and a second detector. The first detector generates a first measurement signal indicating a measured value of a flow rate of the first processing liquid based on a measurement result of the first flow meter. The second detector generates a second measurement signal indicating a measured value of a flow rate of the second processing liquid based on a measurement result of the second flow meter. The time constant of the first measurement signal and the time constant of the second measurement signal each indicate values ​​adjusted so that the opening and closing speed of the first flow rate adjustment valve matches or approximately matches the opening and closing speed of the second flow rate adjustment valve.

[0014] In one embodiment, the substrate processing apparatus further includes a substrate holding unit and a discharge unit. The substrate holding unit holds the substrate horizontally. The discharge unit discharges a mixed liquid obtained by mixing the first processing liquid and the second processing liquid toward the substrate held by the substrate holding unit. In the mixed liquid, the mixing ratio of the first processing liquid is smaller than the mixing ratio of the second processing liquid.

[0015] In one embodiment, the substrate processing apparatus further includes a mixer and a connection pipe. The mixer mixes the first processing liquid and the second processing liquid. The connection pipe supplies the mixed liquid from the mixer to the discharge unit. The first pipe distributes the first processing liquid to the mixer. The second pipe distributes the second processing liquid to the mixer. [Effects of the Invention]

[0016] According to the substrate processing apparatus of the present invention, the flow rate of the processing liquid can be made more stable. [Brief explanation of the drawings]

[0017] [Figure 1] 1 is a schematic view of a substrate processing apparatus according to a first embodiment of the present invention. [Figure 2] 1 is a block diagram showing a part of the configuration of a substrate processing apparatus according to a first embodiment of the present invention. [Figure 3] 1 is a diagram schematically illustrating a part of the configuration of a substrate processing apparatus according to a first embodiment of the present invention. [Figure 4] FIG. 2 is a cross-sectional view showing an example of the configuration of a flow rate adjusting valve. [Figure 5] FIG. 4 is another block diagram showing a part of the configuration of the substrate processing apparatus according to the first embodiment of the present invention. [Figure 6] FIG. 4 is a diagram showing an example of the stability of the flow rate adjusted by the first flow rate adjustment valve. [Figure 7] FIG. 10 is a diagram showing an example of the stability of the flow rate adjusted by the second flow rate adjustment valve. [Figure 8] 1(a) and 1(b) are diagrams schematically showing measurement signals output from a detector. [Figure 9] 10(a) and 10(b) are diagrams schematically showing changes in the flow rate of the treatment liquid flowing through the upstream pipe. [Figure 10] FIG. 10 is a diagram schematically illustrating a part of the configuration of a substrate processing apparatus according to a second embodiment of the present invention. [Figure 11] FIG. 10 is a diagram schematically illustrating a part of the configuration of a substrate processing apparatus according to a third embodiment of the present invention. DETAILED DESCRIPTION OF THE INVENTION

[0018] Hereinafter, an embodiment of the substrate processing apparatus of the present invention will be described with reference to the drawings (FIGS. 1 to 11). However, the present invention is not limited to the following embodiment, and can be implemented in various aspects without departing from the gist of the present invention. Note that where explanations are redundant, they may be omitted as appropriate. Furthermore, in the drawings, the same or equivalent parts are designated by the same reference numerals, and explanations thereof will not be repeated.

[0019] In the substrate processing apparatus according to the present invention, the "substrate" to be processed can be a semiconductor wafer, a glass substrate for a photomask, a glass substrate for a liquid crystal display, a glass substrate for a plasma display, a substrate for an FED (Field Emission Display), a substrate for an optical disk, a substrate for a magnetic disk, or a substrate for a magneto-optical disk. The following description of an embodiment of the present invention will be primarily focused on a case where a disk-shaped semiconductor wafer is the substrate to be processed. However, the substrate processing apparatus according to the present invention can be similarly applied to various substrates other than the semiconductor wafers described above. Furthermore, the shape of the substrate is not limited to a disk shape, and the substrate processing apparatus according to the present invention can be applied to substrates of various shapes.

[0020] [Embodiment 1] First, a substrate processing apparatus 100 according to the present embodiment will be described with reference to Figures 1 and 2. Figure 1 is a schematic diagram of the substrate processing apparatus 100 according to the present embodiment. More specifically, Figure 1 is a schematic plan view of the substrate processing apparatus 100 according to the present embodiment. Figure 2 is a block diagram showing a part of the configuration of the substrate processing apparatus 100 according to the present embodiment. The substrate processing apparatus 100 processes the substrates W by supplying a processing liquid to the substrates W. More specifically, the substrate processing apparatus 100 is a single-wafer processing apparatus that processes the substrates W one by one.

[0021] As shown in FIG. 1, the substrate processing apparatus 100 includes a plurality of substrate processing units 2, a fluid cabinet 101, a plurality of fluid boxes 102, a plurality of load ports LP, an indexer robot IR, a center robot CR, and a control device 110.

[0022] A cassette CA is placed on each load port LP. The cassette CA accommodates one or more stacked substrates W. The cassette CA may be, for example, a FOUP (Front Opening Unified Pod), a SMIF (Standard Mechanical Interface) pod, or an OC (Open Cassette).

[0023] The indexer robot IR transports substrates W between the cassette CA and the center robot CR. The center robot CR transports substrates W between the indexer robot IR and the substrate processing unit 2. Note that a placement stage (path) on which the substrate W is temporarily placed may be provided between the indexer robot IR and the center robot CR, and the device may be configured so that the substrate W is transferred indirectly between the indexer robot IR and the center robot CR via the placement stage.

[0024] The substrate processing units 2 form a plurality of towers TW (four towers TW in FIG. 1). The towers TW are arranged to surround the center robot CR in a plan view. Each tower TW includes a plurality of substrate processing units 2 (three substrate processing units 2 in FIG. 1) stacked one above the other.

[0025] The fluid cabinet 101 contains a fluid. The fluid includes a processing liquid. Each fluid box 102 corresponds to one of the multiple towers TW. The processing liquid in the fluid cabinet 101 is supplied to all substrate processing units 2 included in the corresponding tower TW via one of the fluid boxes 102.

[0026] The processing liquid in the fluid cabinet 101 is not particularly limited. For example, the processing liquid in the fluid cabinet 101 may include hydrogen peroxide (H2O2), ammonia water (NH4OH), hydrochloric acid (HCl), and pure water. The pure water is used as a solvent for the chemical liquid supplied to the substrate W. The pure water may be deionized water (DIW). More specifically, the pure water may be ultrapure water. The pure water may also be used as a rinse liquid. However, the rinse liquid is not limited to pure water. The rinse liquid may be, for example, carbonated water, electrolytic ionized water, hydrogen water, ozone water, ammonia water, or hydrochloric acid at a diluted concentration (for example, about 0.001 wt % to about 0.01 wt %).

[0027] Each of the substrate processing units 2 processes the substrate W by supplying a processing liquid to the upper surface of the substrate W. Specifically, the substrate processing unit 2 processes the substrate W by supplying a chemical liquid and a rinse liquid to the upper surface of the substrate W. The chemical liquid supplied to the substrate W includes, for example, an ammonia-hydrogen peroxide solution mixture (SC1) and a hydrochloric acid-hydrogen peroxide solution mixture (SC2).

[0028] The control device 110 controls the operation of each part of the substrate processing apparatus 100. For example, the control device 110 controls the load port LP, the indexer robot IR, the center robot CR, and the substrate processing unit 2 (see FIG. 2). Specifically, the control device 110 includes a control unit 111 and a storage unit 112.

[0029] The control unit 111 controls the operation of each unit of the substrate processing apparatus 100 based on various information stored in the storage unit 112. The control unit 111 has, for example, a processor. The control unit 111 may have a CPU (Central Processing Unit) or an MPU (Micro Processing Unit) as the processor. Alternatively, the control unit 111 may have a general-purpose computing device or a dedicated computing device.

[0030] The storage unit 112 stores various information for controlling the operation of the substrate processing apparatus 100. For example, the storage unit 112 stores data and computer programs. The data includes various recipe data. The recipe data includes, for example, a process recipe. The process recipe is data that defines the procedure for substrate processing. Specifically, the process recipe defines the execution order of a series of processes included in the substrate processing, the content of each process, and the conditions (parameter setting values) for each process.

[0031] The storage unit 112 includes a main storage device. The main storage device includes, for example, a semiconductor memory. The storage unit 112 may further include an auxiliary storage device. The auxiliary storage device includes, for example, at least one of a semiconductor memory and a hard disk drive. The storage unit 112 may also include removable media.

[0032] Next, the substrate processing apparatus 100 of this embodiment will be described with reference to Figures 2 and 3. Figure 3 is a diagram schematically showing a part of the configuration of the substrate processing apparatus 100 of this embodiment.

[0033] 3, the substrate processing unit 2 includes a processing chamber 2a, a substrate holding unit 3, a substrate rotating unit 4, a discharge nozzle 5a, a nozzle moving unit 7, and a liquid receiving unit 8. The substrate processing apparatus 100 further includes a liquid supply unit 50a.

[0034] The processing chamber 2a has a generally box-like shape. The processing chamber 2a accommodates the substrate W, the substrate holder 3, the substrate rotation unit 4, the discharge nozzle 5a, the nozzle movement unit 7, the liquid receiving unit 8, and part of the liquid supply unit 50a. The substrate W is loaded into the processing chamber 2a and processed in the processing chamber 2a. In other words, the substrate processing is carried out in the processing chamber 2a. The processing chamber 2a is, for example, a chamber.

[0035] The substrate holder 3 holds the substrate W horizontally in the processing chamber 2a. The substrate holder 3 is controlled by a control unit 111 (see FIG. 2). Specifically, the substrate holder 3 may have a spin base 31 and a plurality of chuck members 32.

[0036] The spin base 31 is substantially disk-shaped and supports a plurality of chuck members 32 in a horizontal position. The plurality of chuck members 32 are arranged on the periphery of the spin base 31. The plurality of chuck members 32 clamp the periphery of the substrate W. The plurality of chuck members 32 hold the substrate W in a horizontal position. The operation of the plurality of chuck members 32 is controlled by the control unit 111.

[0037] The substrate rotator 4 rotates the substrate W integrally with the substrate holder 3. More specifically, the substrate rotator 4 rotates the substrate holder 3, which holds the substrate W, around a first rotation axis AX1 that extends vertically. The substrate rotator 4 is controlled by the controller 111 (see FIG. 2).

[0038] Specifically, the first axis of rotation AX1 passes through the center of the spin base 31. The multiple chuck members 32 are arranged so that the center of the substrate W faces the center of the spin base 31. Therefore, the substrate W rotates around the center of the substrate W.

[0039] As shown in FIG. 3, the substrate rotation unit 4 may have a drive unit 41 and a shaft 42. The shaft 42 is coupled to the center of the spin base 31 and extends downward from the spin base 31. The drive unit 41 generates a drive force that rotates the substrate W integrally with the substrate holder 3. More specifically, the drive unit 41 rotates the shaft 42 about a first rotation axis AX1. As a result, the spin base 31 rotates. The rotation of the drive unit 41 is controlled by the control unit 111. The drive unit 41 includes, for example, an electric motor.

[0040] The discharge nozzle 5a discharges the processing liquid toward the upper surface of the substrate W held by the substrate holder 3. As a result, the processing liquid is supplied from the discharge nozzle 5a to the upper surface of the substrate W. The discharge nozzle 5a is a so-called "vertical nozzle." The discharge nozzle 5a is an example of a "discharge unit."

[0041] In this embodiment, the discharge nozzle 5a selectively discharges one of SC1 and SC2. SC1 is a mixture of ammonia water, hydrogen peroxide water, and water (pure water). When the discharge nozzle 5a discharges SC1, the ammonia water and hydrogen peroxide water are supplied to the upper surface of the substrate W. SC2 is a mixture of hydrochloric acid, hydrogen peroxide water, and water (pure water). When the discharge nozzle 5a discharges SC2, the hydrogen peroxide water and hydrochloric acid are supplied to the upper surface of the substrate W. SC1 and SC2 are examples of a mixture of a first processing liquid and a second processing liquid.

[0042] The liquid supply unit 50a supplies the processing liquid to the discharge nozzle 5a. When the liquid supply unit 50a supplies the processing liquid to the discharge nozzle 5a, the processing liquid is discharged from the discharge nozzle 5a toward the upper surface of the substrate W. The liquid supply unit 50a is controlled by the control unit 111 (see FIG. 2).

[0043] In this embodiment, the liquid supply unit 50a selectively supplies one of SC1 and SC2 to the discharge nozzle 5a. When the liquid supply unit 50a supplies SC1 to the discharge nozzle 5a, SC1 is discharged from the discharge nozzle 5a toward the upper surface of the substrate W. When the liquid supply unit 50a supplies SC2 to the discharge nozzle 5a, SC2 is discharged from the discharge nozzle 5a toward the upper surface of the substrate W.

[0044] The nozzle moving unit 7 moves the discharge nozzle 5a between a processing position and a standby position. The nozzle moving unit 7 is controlled by the control unit 111 (see FIG. 2). The processing position is a position facing the substrate W held by the substrate holding unit 3. In this embodiment, the processing position is a position facing the center of the substrate W. The standby position is a position outside the liquid receiving unit 8 in a plan view.

[0045] Specifically, the nozzle moving unit 7 moves the discharge nozzle 5a in the vertical and horizontal directions. Specifically, the nozzle moving unit 7 has a nozzle arm 71, a nozzle base 72, and a nozzle moving mechanism 73.

[0046] The nozzle base 72 extends vertically. The nozzle arm 71 is connected to the nozzle base 72. The nozzle arm 71 extends horizontally from the nozzle base 72. The nozzle arm 71 supports the discharge nozzle 5a. For example, the discharge nozzle 5a is fixed to the tip of the nozzle arm 71.

[0047] The nozzle movement mechanism 73 moves the nozzle arm 71 in the vertical and horizontal directions. As a result, the discharge nozzle 5a moves in the vertical and horizontal directions. Specifically, the nozzle movement mechanism 73 has a rotation mechanism and an elevation mechanism. The rotation mechanism rotates the nozzle base 72 in both forward and reverse directions around a second rotation axis AX2 extending in the vertical direction. As a result, the discharge nozzle 5a moves along the horizontal plane. The elevation mechanism raises and lowers the nozzle base 72 in the vertical direction. As a result, the discharge nozzle 5a moves in the vertical direction. The operation of the rotation mechanism and the elevation mechanism is controlled by the control unit 111. The rotation mechanism may have, for example, a servo motor and a reducer. The elevation mechanism may have, for example, a ball screw and an electric motor that can rotate forward and backward.

[0048] The liquid receiving portion 8 surrounds the substrate W held by the substrate holding portion 3, and receives the processing liquid discharged from the substrate W. In this embodiment, the liquid receiving portion 8 receives SC1 and SC2 discharged from the substrate W.

[0049] Specifically, the liquid receiving unit 8 has a guard portion 81 and a cup portion 82. The guard portion 81 is approximately cylindrical. The guard portion 81 surrounds the substrate W held by the substrate holding unit 3 and receives the processing liquid discharged from the substrate W. The cup portion 82 forms an annular groove with an open top at the bottom of the liquid receiving unit 8. The processing liquid received by the guard portion 81 is collected in the groove of the cup portion 82.

[0050] Next, the substrate processing apparatus 100 of this embodiment will be further described with reference to Figures 2 and 3. As shown in Figure 3, the liquid supply unit 50a has a multiple valve 6, a connection pipe 52, a plurality of upstream pipes 53, a plurality of flow rate adjustment valves 54, and a plurality of flow meters 55. The multiple valve 6, a portion of the connection pipe 52, the plurality of upstream pipes 53, the plurality of flow rate adjustment valves 54, and the plurality of flow meters 55 are housed in the fluid box 102 described with reference to Figure 1. The remaining portion of the connection pipe 52 is housed in the processing chamber 2a.

[0051] The multi-port valve 6 produces a mixed solution. In this embodiment, the multi-port valve 6 selectively produces one of SC1 and SC1. Specifically, the multi-port valve 6 produces SC1 by mixing ammonia water, hydrogen peroxide, and water (pure water). The multi-port valve 6 also produces SC2 by mixing hydrochloric acid, hydrogen peroxide, and water (pure water). The operation of the multi-port valve 6 is controlled by the control unit 111 (see FIG. 2).

[0052] Specifically, the multiple valve 6 has a mixer 61, a downstream on-off valve 62, and a plurality of upstream on-off valves 63. In this embodiment, the plurality of upstream on-off valves 63 include four upstream on-off valves 63a to 63d.

[0053] The downstream on-off valve 62 is provided in the connecting pipe 52. Each of the upstream on-off valves 63 is provided in a corresponding one of the upstream pipes 53. In this embodiment, the upstream pipes 53 include four upstream pipes 53a to 53d. The upstream on-off valves 63a to 63d are provided in the upstream pipes 53a to 53d, respectively.

[0054] Each of the multiple upstream pipes 53 is a tubular member through which a processing liquid flows. One end of each of the multiple upstream pipes 53 is connected to the mixer 61. Each of the multiple upstream pipes 53 flows a processing liquid to the mixer 61. In this embodiment, the upstream pipe 53a flows hydrogen peroxide solution to the mixer 61. The upstream pipe 53b flows ammonia water to the mixer 61. The upstream pipe 53c flows hydrochloric acid to the mixer 61. The upstream pipe 53d flows pure water (DIW in this case) to the mixer 61. The upstream pipes 53a to 53c are examples of "first pipes." The upstream pipe 53d is an example of "second pipe." The hydrogen peroxide solution, ammonia water, and hydrochloric acid are examples of "first processing liquid." The pure water is an example of "second processing liquid."

[0055] Each of the upstream on-off valves 63 controls the start and stop of the flow of the treatment liquid through the corresponding upstream pipe 53. More specifically, each of the upstream on-off valves 63 can be opened and closed. When an upstream on-off valve 63 is in the open state, the treatment liquid flows through the corresponding upstream pipe 53 and is supplied to the mixer 61. When an upstream on-off valve 63 is in the closed state, the flow of the treatment liquid through the corresponding upstream pipe 53 is stopped and the supply of the treatment liquid to the mixer 61 is stopped.

[0056] The opening and closing operations of the upstream on-off valves 63 are controlled by the control unit 111. The actuators of the upstream on-off valves 63 are, for example, pneumatic actuators or electric actuators.

[0057] In this embodiment, when supplying SC1 to the substrate W, the control unit 111 opens the upstream on-off valves 63a, 63b, and 63d and closes the upstream on-off valve 63c. As a result, hydrogen peroxide solution, ammonia water, and pure water are supplied to the mixer 61. The mixer 61 has an internal flow path, and the hydrogen peroxide solution, ammonia water, and pure water are mixed in the flow path inside the mixer 61 to generate SC1. Furthermore, when supplying SC2 to the substrate W, the control unit 111 opens the upstream on-off valves 63a, 63c, and 63d and closes the upstream on-off valve 63b. As a result, hydrogen peroxide solution, hydrochloric acid, and pure water are supplied to the mixer 61. Then, the hydrogen peroxide solution, hydrochloric acid, and pure water are mixed in the flow path inside the mixer 61 to generate SC2. In this manner, the mixer 61 mixes at least two types of processing liquid to generate a mixed liquid.

[0058] The connection pipe 52 is a tubular member through which the treatment liquid flows. One end of the connection pipe 52 is connected to the mixer 61. The other end of the connection pipe 52 is connected to the discharge nozzle 5a. The connection pipe 52 flows the treatment liquid to the discharge nozzle 5a. As a result, the treatment liquid is supplied to the discharge nozzle 5a. In this embodiment, the connection pipe 52 selectively supplies one of SC1 and SC2 to the discharge nozzle 5a. More specifically, SC1 generated in the mixer 61 flows through the connection pipe 52 and is supplied to the discharge nozzle 5a. Furthermore, SC2 generated in the mixer 61 flows through the connection pipe 52 and is supplied to the discharge nozzle 5a.

[0059] The downstream-side on-off valve 62 controls the start and stop of the flow of the treatment liquid through the connection pipe 52. More specifically, the downstream-side on-off valve 62 can be opened and closed. When the downstream-side on-off valve 62 is in an open state, the treatment liquid flows through the connection pipe 52 and is supplied to the discharge nozzle 5a. When the downstream-side on-off valve 62 is in a closed state, the flow of the treatment liquid through the connection pipe 52 is stopped, and the supply of the treatment liquid to the discharge nozzle 5a is stopped.

[0060] The opening and closing operation of the downstream side on-off valve 62 is controlled by the control unit 111. The actuator of the downstream side on-off valve 62 is, for example, a pneumatic actuator or an electric actuator.

[0061] In this embodiment, the control unit 111 opens the downstream on-off valve 62 when SC1 is being generated in the mixer 61. As a result, SC1 flows through the connection pipe 52 and is supplied to the discharge nozzle 5a. Furthermore, the control unit 111 opens the downstream on-off valve 62 when SC2 is being generated in the mixer 61. As a result, SC2 is supplied to the discharge nozzle 5a.

[0062] Each of the plurality of flow rate control valves 54 is disposed in a corresponding one of the plurality of upstream pipes 53. Each of the flow rate control valves 54 adjusts the flow rate (amount of processing liquid flowing per unit time) of the processing liquid flowing through the corresponding upstream pipe 53. More specifically, the flow rate control valves 54 are capable of adjusting their opening. The flow rate of the processing liquid is adjusted by adjusting the opening of the flow rate control valve 54. Specifically, as will be described later with reference to FIG. 4, each of the flow rate control valves 54 has a stepping motor 543. The opening of the flow rate control valve 54 changes when the stepping motor 543 is driven.

[0063] In this embodiment, the multiple flow rate adjustment valves 54 include three first flow rate adjustment valves 54a to 54c and one second flow rate adjustment valve 54d. The second flow rate adjustment valve 54d has a wider adjustable flow rate range than the first flow rate adjustment valves 54a to 54c. For example, when the stepping motor 543 (see FIG. 4) of the second flow rate adjustment valve 54d is driven in full steps, the adjustable flow rate range by the second flow rate adjustment valve 54d is 400 mL / min or more and 2000 mL / min or less. When the stepping motor 543 (see FIG. 4) of the first flow rate adjustment valves 54a to 54c is driven in full steps, the adjustable flow rate range by the first flow rate adjustment valves 54a to 54c is 50 mL / min or more and 500 mL / min or less.

[0064] The first flow rate control valves 54a to 54c are respectively provided in the upstream pipes 53c to 53c. The first flow rate control valve 54a adjusts the flow rate of the hydrogen peroxide solution flowing through the upstream pipe 53a. The first flow rate control valve 54b adjusts the flow rate of the ammonia solution flowing through the upstream pipe 53b. The first flow rate control valve 54c adjusts the flow rate of the hydrochloric acid flowing through the upstream pipe 53c. The second flow rate control valve 54d is provided in the upstream pipe 53d. The second flow rate control valve 54d adjusts the flow rate of the pure water flowing through the upstream pipe 53d.

[0065] Specifically, the first flow rate adjustment valves 54a, 54b and the second flow rate adjustment valve 54d adjust the flow rates of the hydrogen peroxide solution, the ammonia solution, and the pure water so that the volumetric mixing ratio of SC1 is 1 (28 wt% to 30 wt%) ammonia solution, 1 (30 wt%) hydrogen peroxide solution, and 5 pure water.Furthermore, the first flow rate adjustment valves 54a, 54c and the second flow rate adjustment valve 54d adjust the flow rates of the hydrochloric acid, the hydrogen peroxide solution, and the pure water so that the volumetric mixing ratio of SC2 is 1 (36 wt%) hydrochloric acid, 1 (30 wt%) hydrogen peroxide solution, and 5 pure water.

[0066] Therefore, in SC1 (mixed liquid), the mixing ratio of hydrogen peroxide water (first treatment liquid) is smaller than the mixing ratio of pure water (second treatment liquid). Also, the mixing ratio of ammonia water (first treatment liquid) is smaller than the mixing ratio of pure water (second treatment liquid). In SC2 (mixed liquid), the mixing ratio of hydrogen peroxide water (first treatment liquid) is smaller than the mixing ratio of pure water (second treatment liquid). Also, the mixing ratio of hydrochloric acid (first treatment liquid) is smaller than the mixing ratio of pure water (second treatment liquid).

[0067] In this embodiment, as will be described later with reference to FIG. 6, the first flow rate adjustment valves 54a-54c can adjust the flow rate to a value lower than the minimum flow rate within the range of flow rates that can be adjusted when the stepping motors 543 (see FIG. 4) of the first flow rate adjustment valves 54a-54c are driven in full steps. For example, the first flow rate adjustment valves 54a-54c can adjust the flow rate to a range of less than 50 mL / min. Therefore, the first flow rate adjustment valves 54a, 54b and the second flow rate adjustment valve 54d can further reduce the mixing ratio of ammonia water (first treatment liquid) and hydrogen peroxide water (first treatment liquid) when generating SC1, for example. In other words, the first flow rate adjustment valves 54a, 54b and the second flow rate adjustment valve 54d can dilute the concentration of SC1. For example, the first flow rate adjustment valves 54a, 54b and the second flow rate adjustment valve 54d may adjust the flow rates of the hydrogen peroxide solution, the ammonia solution, and the pure water so that the ammonia solution is 3 wt% or less, the hydrogen peroxide solution is 3 wt% or less, and the pure water is 94 wt% or more.

[0068] Each of the plurality of flow meters 55 is installed in a corresponding one of the plurality of upstream pipes 53. Each of the plurality of flow meters 55 measures the flow rate of the treatment liquid flowing through the corresponding upstream pipe 53. The configuration of the flow meters 55 is not particularly limited. For example, the flow meters 55 may be ultrasonic flow meters. The measurement results of each of the plurality of flow meters 55 are used to control (feedback control) the flow rate adjustment valves 54 installed in the corresponding upstream pipes 53.

[0069] In this embodiment, the multiple flow meters 55 include flow meters 55a to 55d. The flow meters 55a to 55d are respectively installed in the upstream pipes 53a to 53d. The flow meter 55a measures the flow rate of the hydrogen peroxide solution flowing through the upstream pipe 53a. The flow meter 55b measures the flow rate of the ammonia solution flowing through the upstream pipe 53b. The flow meter 55c measures the flow rate of the hydrochloric acid flowing through the upstream pipe 53c. The flow meter 55d measures the flow rate of the pure water flowing through the upstream pipe 53d. The measurement results of the flow meters 55a to 55c are used to control (feedback control) the first flow adjustment valves 54a to 54c, respectively. The measurement result of the flow meter 55d is used to control (feedback control) the second flow adjustment valve 54d. The flow meters 55a to 55c are an example of a "first flow meter," and the flow meter 55d is an example of a "second flow meter."

[0070] Here, an example of the configuration of the flow rate adjustment valve 54 will be described with reference to FIG. 4. FIG. 4 is a cross-sectional view showing an example of the configuration of the flow rate adjustment valve 54. As shown in FIG. 4, the flow rate adjustment valve 54 has a stepping motor 543. The stepping motor 543 changes the opening degree of the flow rate adjustment valve 54. Specifically, the flow rate adjustment valve 54 may have a case 541, a body 542, the stepping motor 543, a connecting member 544, a needle 545, and a diaphragm 546. The flow rate adjustment valve 54 shown in FIG. 4 is a motor needle valve.

[0071] The body 542 has an inlet 542a, an outlet 542b, and a flow path 542c. The flow path 542c is formed inside the body 542. The inlet 542a and the outlet 542b each connect the outside of the body 542 with the flow path 542c inside the body 542. The treatment liquid flows from the inlet 542a into the flow path 542c inside the body 542, and circulates inside the body 542 (flow path 542c). The treatment liquid circulating through the flow path 542c flows out to the outside of the body 542 via the outlet 542b.

[0072] The stepping motor 543 is housed in a case 541. A connecting member 544 penetrates the case 541 and connects a shaft 5431 of the stepping motor 543 to a needle 545. The needle 545 protrudes from the connecting member 544 into the flow path 542c. When the stepping motor 543 rotates, the connecting member 544 and the needle 545 move along the direction in which the shaft 5431 extends. When the needle 545 moves, the amount by which the needle 545 protrudes into the flow path 542c (protrusion amount) changes. In other words, the volume occupied by the needle 545 in the flow path 542c changes. Therefore, when the needle 545 moves, the opening of the flow path 542c changes, and the flow rate of the treatment liquid flowing through the flow path 542c is adjusted. As a result, the flow rate of the treatment liquid flowing through the upstream pipe 53 (see FIG. 3) is adjusted.

[0073] The diaphragm 546 is disposed in the flow path 542c. More specifically, the diaphragm 546 is connected to the needle 545 and a wall surface that constitutes the flow path 542c. The diaphragm 546 is a film-like member that prevents the processing liquid from entering the drive part of the flow rate adjustment valve 54.

[0074] Next, the substrate processing apparatus 100 of this embodiment will be described with reference to Fig. 5. Fig. 5 is another block diagram showing a part of the configuration of the substrate processing apparatus 100 of this embodiment. As shown in Figs. 1, 2 and 5, the substrate processing apparatus 100 further includes a flow rate control unit 113.

[0075] The flow rate control unit 113 controls the plurality of flow rate adjustment valves 54 based on the measurement results of the plurality of flow meters 55 so that the flow rate value of each treatment liquid flowing through each of the plurality of upstream pipes 53 (see FIG. 3) becomes the corresponding target value. The target values ​​for the flow rate of each treatment liquid flowing through each of the plurality of upstream pipes 53 (see FIG. 3) are set in advance in the flow rate control unit 113 by the control unit 111.

[0076] For example, the flow rate control unit 113 controls the first flow rate adjustment valve 54a based on the measurement results of the flow meter 55a so that the flow rate of the hydrogen peroxide solution flowing through the upstream pipe 53a (see FIG. 3) becomes a predetermined target value for the flow rate of the hydrogen peroxide solution. The other flow rate adjustment valves 54 (first flow rate adjustment valves 54b, 54c and second flow rate adjustment valve 54d) are also controlled by the flow rate control unit 113 in the same manner as the first flow rate adjustment valve 54a. Here, the predetermined target value for the flow rate of the pure water is greater than the respective target values ​​predetermined for the flow rates of the hydrogen peroxide solution, the ammonia water, and the hydrochloric acid. The respective target values ​​predetermined for the flow rates of the hydrogen peroxide solution, the ammonia water, and the hydrochloric acid are an example of a "first target value." The predetermined target value for the flow rate of the pure water is an example of a "second target value."

[0077] In this embodiment, when processing the substrate W in SC1, the control unit 111 transmits an output command to the flow rate control unit 113 to output the processing liquid from the first flow rate adjustment valves 54a, 54b and the second flow rate adjustment valve 54d. As a result, the flow rate control unit 113 controls the first flow rate adjustment valves 54a, 54b and the second flow rate adjustment valve 54d based on the measurement results of the flow meters 55a, 55b and 55d.

[0078] Similarly, when processing the substrate W with SC2, the control unit 111 transmits an output command to the flow rate control unit 113 to output the processing liquid from the first flow rate control valves 54a, 54c and the second flow rate control valve 54d. As a result, the flow rate control unit 113 controls the first flow rate control valves 54a, 54c and the second flow rate control valve 54d based on the measurement results of the flow meters 55a, 55c and 55d.

[0079] Specifically, the first flow rate adjustment valves 54a to 54c have stepping motors 543a to 543c, respectively. The second flow rate adjustment valve 54d has a stepping motor 543d. The stepping motor 543a changes the opening degree of the first flow rate adjustment valve 54a. The other stepping motors 543 (stepping motors 543b to 543d) operate in the same manner.

[0080] Based on the measurement results of flowmeter 55a, flow rate control unit 113 drives stepping motor 543a in microsteps to control the aperture of first flow rate adjustment valve 54a. Similarly, based on the measurement results of flowmeters 55b and 55c, flow rate control unit 113 drives stepping motors 543b and 543c in microsteps to control the aperture of first flow rate adjustment valves 54b and 54c. More specifically, based on the measurement results of flowmeter 55a, flow rate control unit 113 drives stepping motor 543a in microsteps so that the flow rate of the hydrogen peroxide solution becomes a preset target value for the flow rate of the hydrogen peroxide solution. Flow rate control unit 113 controls stepping motors 543b and 543b in the same way as stepping motor 543a.

[0081] The flow rate control unit 113 controls the opening degree of the second flow rate adjustment valve 54d by driving the stepping motor 543d full steps based on the measurement result of the flow meter 55d. Specifically, the flow rate control unit 113 drives the stepping motor 543d full steps based on the measurement result of the flow meter 55d so that the flow rate value of the pure water becomes a target value set in advance for the flow rate of the pure water.

[0082] Microstep driving refers to a driving method that rotates the stepping motor 543 at a step angle smaller than the step angle of full-step driving. The step angle refers to the rotation angle (step angle) that the stepping motor 543 rotates per pulse. Hereinafter, the step angle of full-step driving may be referred to as the "basic step angle."

[0083] When driving the stepping motor 543 in microsteps, the flow control unit 113 adjusts the ratio of currents flowing through each phase (excitation coil of each phase) of the stepping motor 543 to rotate the stepping motor 543 at a step angle obtained by dividing the basic step angle by N (N is a positive integer). For example, if the stepping motor 543 is a two-phase motor, the basic step angle is 1.8°. When driving the stepping motor 543 in microsteps, the flow control unit 113 may rotate the stepping motor 543 at a step angle (0.45°) obtained by dividing the basic step angle by four, for example.

[0084] In this embodiment, the flow control unit 113 can selectively switch the drive method of each stepping motor 543 between microstep drive and full-step drive. Specifically, setting values ​​for each stepping motor 543 are stored in the storage unit 112. The control unit 111 reads the setting values ​​for each stepping motor 543 from the storage unit 112 and sets the setting values ​​for each stepping motor 543 in the flow control unit 113. Here, the setting values ​​for each stepping motor 543 are values ​​that determine whether each stepping motor 543 is to be driven in microstep drive or full-step drive. In other words, each setting value indicates the drive method of the corresponding stepping motor 543. The flow control unit 113 drives each stepping motor 543 in microstep drive or full-step drive by referring to each setting value.

[0085] Specifically, the set values ​​for the stepping motors 543a to 543c (first flow rate adjustment valves 54a to 54c) indicate microstep drive. The set value for the stepping motor 543d (second flow rate adjustment valve 54d) indicates full-step drive. Therefore, the flow rate control unit 113 drives the stepping motors 543a to 543c in microsteps. Furthermore, the flow rate control unit 113 drives the stepping motor 543d in full steps.

[0086] In this embodiment, the flow rate control unit 113 performs feedback control of each stepping motor 543 based on the measurement result of the corresponding flow meter 55, thereby adjusting the opening of each flow rate adjustment valve 54. More specifically, the flow rate control unit 113 performs PID control.

[0087] Specifically, as shown in FIG. 5, the flow rate control unit 113 may include detectors 131a to 131d and controllers 132a to 132d. The control unit 111 sets target values ​​and set values ​​for the controllers 132a to 132d. The control unit 111 also sends output commands to the controllers 132a to 132d. In this embodiment, the set values ​​are set according to the target values. More specifically, when the target value for the flow rate of the treatment liquid exceeds a certain threshold, the set value is set to a value indicating full-step driving. When the target value for the flow rate of the treatment liquid does not exceed a certain threshold, the set value is set to a value indicating micro-step driving.

[0088] The detectors 131a to 131d measure (detect) the flow rate of the processing liquid based on the measurement results of the flow meters 55a to 55d, respectively. Then, the detectors 131a to 131d generate measurement signals, respectively. The measurement signals indicate the measured values ​​of the flow rates of the processing liquid. The detectors 131a to 131d output the measurement signals to the controllers 132a to 132d, respectively. More specifically, the detectors 131a to 131d measure (detect) the flow rate of the processing liquid according to a predetermined sampling period. Therefore, the detectors 131a to 131d output the measurement signals to the controllers 132a to 132d according to the predetermined sampling period, respectively. The detectors 131a to 131c are an example of a "first detector," and the detector 131d is an example of a "second detector." Moreover, the measurement signals generated by the detectors 131a to 131c are an example of a "first measurement signal," and the measurement signal generated by the detector 131d is an example of a "second measurement signal."

[0089] Note that the flow meter 55a and the detector 131a may form a flow sensor. Similarly, each of the flow meters 55b to 55d and each of the detectors 131b to 131d may form a flow sensor.

[0090] The controllers 132a to 132d drive the stepping motors 543a to 543d, respectively, to control the opening degrees of the first flow rate adjustment valves 54a to 54c and the second flow rate adjustment valve 54d. Specifically, the controllers 132a to 132d each include an arithmetic circuit and a driver circuit. The arithmetic circuit performs PID control according to a predetermined sampling period. The driver circuit generates a drive current for driving the stepping motor 543.

[0091] Specifically, the controller 132a performs PID control on the measurement signal based on the measurement signal input from the detector 131a (flow rate sensor) and a preset target value. Then, the controller 132a generates a drive current (pulse signal) for driving the stepping motor 543a based on the PID-controlled measurement signal, and inputs the drive current to the stepping motor 543a.

[0092] Stepping motor 543a rotates based on the drive current, which moves needle 545 (see FIG. 4), adjusting the opening of first flow rate adjustment valve 54a so that the flow rate of the hydrogen peroxide solution measured by detector 131a (flow rate sensor) reaches a target value.

[0093] The controllers 132b to 132d control the stepping motors 543b to 543d, respectively, in the same manner as the controller 132a.

[0094] Next, with reference to Fig. 6, the stability of the flow rates adjusted by the first flow rate adjustment valves 54a to 54c will be described using the first flow rate adjustment valve 54a as an example. Fig. 6 is a diagram showing an example of the stability of the flow rate adjusted by the first flow rate adjustment valve 54a. In Fig. 6, the horizontal axis represents the flow rate. The vertical axis represents the stability of each flow rate shown on the horizontal axis. The stability represents a value correlating with the standard deviation between the target values ​​(flow rates shown on the horizontal axis) and the flow rate after the flow rate control unit 113 controls the first flow rate adjustment valve 54a based on the target values ​​(each flow rate shown on the horizontal axis).

[0095] The graph of stability ST1 shown in Fig. 6 shows the stability when the stepping motor 543a of the first flow rate adjustment valve 54a is driven in microsteps. The graph of stability ST2 shown in Fig. 6 shows the stability when the stepping motor 543a of the first flow rate adjustment valve 54a is driven in full steps.

[0096] As shown in Figure 6, the stability ST2 is below the first level when the flow rate (target value) is in the range of 50 mL / min to 500 mL / min, and exceeds the first level when the flow rate (target value) is 25 mL / min. The first level is, for example, 2%. Below the first level is an example of a "predetermined quality level range for the flow rate of the treatment liquid."

[0097] Therefore, when the stepping motor 543a of the first flow rate adjustment valve 54a is driven in full steps, the range of flow rate that can be adjusted by the first flow rate adjustment valve 54a is 50 mL / min or more and 500 mL / min or less. Therefore, the minimum flow rate value when the stepping motor 543a is driven in full steps is 50 mL / min. Here, the minimum flow rate value of 50 mL / min indicates the minimum flow rate within a predetermined quality level range (below the first level) among the flow rates of the processing liquid when the stepping motor 543a is driven in full steps. Hereinafter, the minimum flow rate value when the stepping motor 543a is driven in full steps may be referred to as the "first reference minimum flow rate value."

[0098] As shown in FIG. 6, the stability ST1 is equal to or less than the first level when the flow rate (target value) is in the range of 25 mL / min to 500 mL / min. Therefore, compared to full-step driving, microstep driving can broaden the range of flow rates adjustable by the first flow rate adjustment valve 54a toward lower flow rates. As a result, when driving the stepping motor 543a in microstep driving, the target value of the flow rate adjusted by the first flow rate adjustment valve 54a can be set to a value smaller than the first reference minimum flow rate. Similarly to the first flow rate adjustment valve 54a, the first flow rate adjustment valves 54b and 54c can also be set to a value smaller than the first reference minimum flow rate. Therefore, according to this embodiment, a low-concentration SC1 can be produced using the multiple valve 6 (see FIG. 3).

[0099] Next, the stability of the flow rate adjusted by the second flow rate adjustment valve 54d will be described with reference to Fig. 7. Fig. 7 is a diagram showing an example of the stability of the flow rate adjusted by the second flow rate adjustment valve 54d. In Fig. 7, the horizontal axis represents the flow rate. The vertical axis represents the stability of each flow rate shown on the horizontal axis. The stability represents a value correlated to the standard deviation between the target values ​​(flow rates shown on the horizontal axis) and the flow rate after the flow rate control unit 113 controls the second flow rate adjustment valve 54d based on the target values ​​(flow rates shown on the horizontal axis).

[0100] The graph of stability ST3 shown in Fig. 7 shows the stability when the stepping motor 543d of the second flow rate adjustment valve 54d is driven in microsteps. The graph of stability ST4 shown in Fig. 7 shows the stability when the stepping motor 543d of the second flow rate adjustment valve 54d is driven in full steps.

[0101] As shown in FIG. 7, stability ST4 is below the first level when the flow rate (target value) is in the range of 400 mL / min to 2000 mL / min, and exceeds the first level when the flow rate (target value) is 300 mL / min.

[0102] Therefore, when the stepping motor 543d of the second flow rate adjustment valve 54d is driven in full steps, the range of flow rate that can be adjusted by the second flow rate adjustment valve 54d is 400 mL / min or more and 2000 mL / min or less. Therefore, the minimum flow rate value when the stepping motor 543d is driven in full steps is 400 mL / min. Here, the minimum flow rate value of 400 mL / min indicates the minimum flow rate within a predetermined quality level range (below the first level) among the flow rates of the processing liquid when the stepping motor 543d is driven in full steps. Hereinafter, the minimum flow rate value when the stepping motor 543d is driven in full steps may be referred to as the "second reference minimum flow rate value."

[0103] As shown in Figure 7, stability ST3 is below the first level when the flow rate (target value) is in the range of 300 mL / min to 2000 mL / min. Therefore, compared to full-step driving, microstep driving can widen the range of flow rates that can be adjusted by the second flow rate adjustment valve 54d toward lower flow rates. As a result, when driving the stepping motor 543d in microstep driving, the target value of the flow rate adjusted by the second flow rate adjustment valve 54d can be set to a value smaller than the second reference minimum flow rate value.

[0104] Furthermore, as shown in FIG. 7, the stability ST3 is equal to or lower than the second level when the flow rate (target value) is in the range of 300 mL / min to 2000 mL / min. The second level is higher than the first level. The second level is, for example, 1%. Therefore, according to this embodiment, the stability of the flow rate of the treatment liquid can be improved by driving the stepping motor 543d in microsteps.

[0105] As shown in Figure 7, when the second level is applied as the flow rate stability level, the range in which the flow rate can be adjusted using full-step drive is 750 mL / min to 2000 mL / min. Therefore, the second reference minimum flow rate value is 750 mL / min. In contrast, the range in which the flow rate can be adjusted using micro-step drive includes the range below 750 mL / min.

[0106] Next, with reference to Figures 8(a), 8(b), 9(a) and 9(b), the opening and closing speeds of the first flow rate adjustment valves 54a to 54c and the second flow rate adjustment valve 54d will be explained using the first flow rate adjustment valve 54a and the second flow rate adjustment valve 54d as examples.

[0107] Fig. 8(a) is a diagram schematically showing a measurement signal output from the detector 131a (flow rate sensor) described with reference to Fig. 6. Fig. 8(b) is a diagram schematically showing a measurement signal output from the detector 131d (flow rate sensor) described with reference to Fig. 6. Fig. 9(a) is a diagram schematically showing a change in the flow rate of the treatment liquid (hydrogen peroxide solution) flowing through the upstream pipe 53a described with reference to Fig. 3. Fig. 9(b) is a diagram schematically showing a change in the flow rate of the treatment liquid (pure water) flowing through the upstream pipe 53d described with reference to Fig. 3.

[0108] Hereinafter, the measurement signal output from detector 131a (flow rate sensor) may be referred to as a "first measurement signal MS1," and the measurement signal output from detector 131d (flow rate sensor) may be referred to as a "second measurement signal MS2." Furthermore, the flow rate of the processing liquid flowing through the upstream pipe 53a may be referred to as a "first flow rate FL1," and the flow rate of the processing liquid flowing through the upstream pipe 53d may be referred to as a "second flow rate FL2." Furthermore, the target value for the first flow rate FL1 may be referred to as a "first target flow rate TF1," and the target value for the second flow rate FL2 may be referred to as a "second target flow rate TF2."

[0109] In Figures 8(a) and 8(b), the horizontal axis represents time and the vertical axis represents signal strength, and in Figures 9(a) and 9(b), the horizontal axis represents time and the vertical axis represents flow rate.

[0110] In this embodiment, a time constant TC1 is preset in the detector 131a described with reference to Fig. 6. A time constant TC2 is preset in the detector 131d described with reference to Fig. 6. As shown in Figs. 8(a) and 8(b), the time constant TC1 set for the first measurement signal MS1 and the time constant TC2 set for the second measurement signal MS2 have different time lengths. In the example shown in Figs. 8(a) and 8(b), the time constants TC1 and TC2 represent the time lengths from when the measurement signal starts to rise until the signal strength reaches 65%.

[0111] Specifically, the values ​​of the time constants TC1 and TC2 are adjusted so that the opening and closing speed of the first flow rate adjustment valve 54a and the opening and closing speed of the second flow rate adjustment valve 54d match or substantially match. As a result, as shown in Figures 9(a) and 9(b), even if the first target flow rate TF1 and the second target flow rate TF2 are different values, the length of time (time t21 to time t22) until the first flow rate FL1 reaches the first target flow rate TF1 matches or substantially matches the length of time (time t21 to time t22) until the second flow rate FL2 reaches the second target flow rate TF2.

[0112] Similarly, the opening and closing speeds of the other first flow rate adjustment valves 54b and 54c can be made to match or approximately match the opening and closing speed of the second flow rate adjustment valve 54d by adjusting the respective values ​​of the time constants set in the detectors 131b and 131c. Therefore, the mixing ratio of the hydrogen peroxide solution, ammonia water, and pure water in SC1 is less likely to vary. Similarly, the mixing ratio of the hydrogen peroxide solution, hydrochloric acid, and pure water in SC2 is less likely to vary. In other words, the mixing ratio of the multiple types of processing liquids mixed in the mixer 61 (see FIG. 3) is less likely to vary.

[0113] The first embodiment of the present invention has been described above with reference to FIGS. 1 to 9(b). According to the first embodiment, the flow rate of the treatment liquid can be further stabilized. Furthermore, according to the first embodiment, the stepping motor 543 is driven in microsteps, thereby improving the control resolution for the flow rate. Therefore, the accuracy of flow rate adjustment can be improved.

[0114] Furthermore, according to the first embodiment, a low-concentration mixed liquid (chemical liquid) can be produced in the multiple valve 6 (mixer 61). Therefore, there is no need to provide a tank for producing the mixed liquid (chemical liquid) inside the fluid cabinet 101, which makes it possible to reduce the size of the fluid cabinet 101 and the number of parts, for example.

[0115] Furthermore, according to the first embodiment, it is possible to switch between microstep driving and full-step driving for each stepping motor 543. Therefore, it is possible to apply microstep driving only to processing liquid supply lines that require microstep driving among the processing liquid supply lines included in the substrate processing apparatus 100. Furthermore, according to the first embodiment, it is possible to expand the adjustable low flow rate range, thereby expanding the range of chemical liquid concentration adjustment.

[0116] Furthermore, by driving the stepping motor 543 in microsteps, it is possible to reduce vibrations of the stepping motor 543. Also, by driving the stepping motor 543 in microsteps, it is possible to drive the stepping motor 543 by passing a current of a lower current value through the excitation coil included in the stepping motor 543. Therefore, it is possible to reduce the amount of heat generated in the stepping motor 543.

[0117] [Embodiment 2] Next, a second embodiment of the present invention will be described with reference to Fig. 10. However, differences from the first embodiment will be described, and a description of the same aspects as in the first embodiment will be omitted. The second embodiment differs from the first embodiment in that two or more types of treatment liquids are mixed in the discharge nozzle 5b to generate a mixed liquid in the discharge nozzle 5b.

[0118] Fig. 10 is a diagram schematically illustrating a portion of the configuration of a substrate processing apparatus 100 according to embodiment 2. As shown in Fig. 10, the substrate processing unit 2 according to embodiment 2 includes a discharge nozzle 5b instead of the discharge nozzle 5a. Furthermore, the substrate processing apparatus 100 according to embodiment 2 includes a liquid supply unit 50b instead of the liquid supply unit 50a.

[0119] The liquid supply unit 50b supplies sulfuric acid and hydrogen peroxide solution to the discharge nozzle 5b. The sulfuric acid and hydrogen peroxide solution are mixed in the discharge nozzle 5b. As a result, SPM (Sulfuric Acid Hydrogen Peroxide Mixture) is generated in the discharge nozzle 5b. The SPM is discharged from the tip of the discharge nozzle 5b toward the upper surface of the substrate W. The SPM is a mixture (sulfuric acid hydrogen peroxide solution) of sulfuric acid and hydrogen peroxide solution.

[0120] The liquid supply unit 50b has a liquid supply pipe 56a, a liquid supply pipe 56b, two liquid on-off valves 57a and 57b, a first flow rate adjustment valve 54e, a second flow rate adjustment valve 54f, and two flow meters 55e and 55f.

[0121] The liquid supply pipes 56a and 56b are tubular components through which the processing liquid flows. The liquid supply pipe 56a flows hydrogen peroxide solution to the discharge nozzle 5b. The liquid supply pipe 56b flows sulfuric acid to the discharge nozzle 5b. Sulfuric acid is a processing liquid with a higher viscosity than hydrogen peroxide solution. The hydrogen peroxide solution is an example of a "first processing liquid," and the sulfuric acid is an example of a "second processing liquid having a higher viscosity than the first processing liquid." Furthermore, the liquid supply pipe 56a is an example of a "first pipe," and the liquid supply pipe 56b is an example of a "second pipe."

[0122] The liquid on-off valves 57a and 57b are openable and closable. The opening and closing operations of the liquid on-off valves 57a and 57b are controlled by the control unit 111 (not shown), similarly to the downstream on-off valve 62 and the upstream on-off valve 63 described in the first embodiment.

[0123] The liquid on-off valve 57a is provided in the liquid supply pipe 56a. The liquid on-off valve 57b is provided in the liquid supply pipe 56b. The control unit 111 opens the liquid on-off valves 57a and 57b when discharging SPM from the discharge nozzle 5b.

[0124] Flow meter 55e is installed in liquid supply pipe 56a and measures the flow rate of the hydrogen peroxide solution flowing through liquid supply pipe 56a. Flow meter 55e is an example of a "first flow meter."

[0125] Flow meter 55f is installed in liquid supply pipe 56b, and measures the flow rate of sulfuric acid flowing through liquid supply pipe 56b. Flow meter 55f is an example of a "second flow meter."

[0126] The first flow rate adjustment valve 54e is provided in the liquid supply pipe 56a. The second flow rate adjustment valve 54f is provided in the liquid supply pipe 56b. The opening degrees of the first flow rate adjustment valve 54e and the second flow rate adjustment valve 54f are adjustable. The opening degrees of the first flow rate adjustment valve 54e and the second flow rate adjustment valve 54f are controlled by the flow rate control unit 113.

[0127] Specifically, the first flow rate adjustment valve 54e and the second flow rate adjustment valve 54f each have a stepping motor 543 (see FIG. 4). The flow rate control unit 113 controls the stepping motor 543 of the first flow rate adjustment valve 54e based on the measurement result of the flow meter 55e to adjust the aperture of the first flow rate adjustment valve 54e. As a result, the flow rate of the hydrogen peroxide solution flowing through the liquid supply pipe 56a is adjusted. The stepping motor 543 of the first flow rate adjustment valve 54e is an example of a "first stepping motor." Furthermore, the flow rate control unit 113 controls the stepping motor 543 of the second flow rate adjustment valve 54f based on the measurement result of the flow meter 55f to adjust the aperture of the second flow rate adjustment valve 54f. As a result, the flow rate of the sulfuric acid flowing through the liquid supply pipe 56b is adjusted. The stepping motor 543 of the second flow rate adjustment valve 54f is an example of a "second stepping motor."

[0128] In the second embodiment, the flow rate control unit 113 drives the stepping motor 543 of the first flow rate adjustment valve 54e in microsteps, and drives the stepping motor 543 of the second flow rate adjustment valve 54f in full steps.

[0129] The second embodiment of the present invention has been described above with reference to FIG. 10. According to the second embodiment, as with the first embodiment, the flow rate of the treatment liquid can be more stabilized. Furthermore, hydrogen peroxide has a lower viscosity than sulfuric acid. The flow rate of a low-viscosity treatment liquid is more difficult to stabilize than a high-viscosity treatment liquid. In contrast, according to the second embodiment, the flow rate of the hydrogen peroxide, which has a lower viscosity than sulfuric acid, is controlled by microstep driving, thereby stabilizing the flow rate of the hydrogen peroxide. In other words, the flow rate of the low-viscosity treatment liquid can be more stabilized.

[0130] [Embodiment 3] Next, a third embodiment of the present invention will be described with reference to Fig. 11. However, differences from the first and second embodiments will be described, and a description of the same aspects as the first and second embodiments will be omitted. The third embodiment differs from the first and second embodiments in that two or more types of processing liquids are mixed in a pipe to generate a mixed liquid in the pipe.

[0131] Fig. 11 is a diagram schematically illustrating a portion of the configuration of a substrate processing apparatus 100 according to embodiment 3. As shown in Fig. 11, the substrate processing unit 2 according to embodiment 3 includes a discharge nozzle 5c instead of the discharge nozzles 5a and 5b. The substrate processing apparatus 100 according to embodiment 3 also includes a liquid supply unit 50c instead of the liquid supply units 50a and 50b.

[0132] The liquid supply unit 50c supplies SPM to the discharge nozzle 5c. The SPM is discharged toward the upper surface of the substrate W from the tip of the discharge nozzle 5c.

[0133] The liquid supply unit 50c has a liquid supply pipe 58a, a liquid supply pipe 58b, three liquid on-off valves 59a to 59c, a first flow rate adjustment valve 54e, a second flow rate adjustment valve 54f, and two flow meters 55e and 55f.

[0134] The liquid supply pipes 58a and 58b are tubular members through which the processing liquid flows. One end of the liquid supply pipe 58a is connected to the liquid supply pipe 58b. The liquid supply pipe 58a flows the hydrogen peroxide solution to the liquid supply pipe 58b.

[0135] One end of liquid supply pipe 58b is connected to discharge nozzle 5c. Liquid supply pipe 58b circulates sulfuric acid up to a connection point P between liquid supply pipe 58a and liquid supply pipe 58b. As a result, the hydrogen peroxide solution flowing from connection point P into liquid supply pipe 58b and the sulfuric acid flowing through liquid supply pipe 58b are mixed in liquid supply pipe 58b, and SPM is generated in liquid supply pipe 58b. The SPM flows through liquid supply pipe 58b and is supplied to discharge nozzle 5c. As a result, SPM is discharged from discharge nozzle 5c.

[0136] The liquid on-off valves 59a to 59c are openable and closable. The opening and closing operations of the liquid on-off valves 59a to 59c are controlled by the control unit 111 (not shown), similarly to the downstream on-off valve 62 and the upstream on-off valve 63 described in the first embodiment.

[0137] The liquid on-off valve 59a is provided in the liquid supply pipe 58a. The liquid on-off valve 59b is provided in the liquid supply pipe 58b upstream of the connection point P. The liquid on-off valve 59c is provided in the liquid supply pipe 58b downstream of the connection point P. The control unit 111 opens the liquid on-off valves 59a, 59b, and 59c when discharging SPM from the discharge nozzle 5c.

[0138] In the third embodiment, flow meter 55e is installed in liquid supply pipe 58a, and flow meter 55f is installed in liquid supply pipe 58b. Flow meter 55e measures the flow rate of the hydrogen peroxide solution flowing through liquid supply pipe 58a. Flow meter 55f measures the flow rate of the sulfuric acid flowing through liquid supply pipe 58b.

[0139] Furthermore, in the third embodiment, the first flow rate adjustment valve 54e is provided in the liquid supply pipe 58a, and the second flow rate adjustment valve 54f is provided in the liquid supply pipe 58b. The flow rate control unit 113 controls the stepping motor 543 of the first flow rate adjustment valve 54e based on the measurement result of the flow meter 55e to adjust the aperture of the first flow rate adjustment valve 54e. As a result, the flow rate of the hydrogen peroxide solution flowing through the liquid supply pipe 58a is adjusted. Similarly, the flow rate control unit 113 controls the stepping motor 543 of the second flow rate adjustment valve 54f based on the measurement result of the flow meter 55f to adjust the aperture of the second flow rate adjustment valve 54f. As a result, the flow rate of the sulfuric acid flowing through the liquid supply pipe 58b is adjusted.

[0140] The third embodiment of the present invention has been described above with reference to Fig. 11. According to the third embodiment, the flow rate of the treatment liquid can be made more stable, as in the first and second embodiments. Furthermore, as in the second embodiment, the flow rate of the low-viscosity treatment liquid can be made more stable.

[0141] The embodiments of the present invention have been described above with reference to the drawings (FIGS. 1 to 11). However, the present invention is not limited to the above embodiments and can be embodied in various forms without departing from the spirit of the present invention. Furthermore, the components disclosed in the above embodiments can be modified as appropriate. For example, some of the components shown in one embodiment may be added to the components of another embodiment, or some of the components shown in one embodiment may be deleted from the embodiment.

[0142] The drawings mainly show each component in a schematic manner to facilitate understanding of the invention, and the thickness, length, number, spacing, etc. of each component shown in the drawings may differ from the actual ones due to the convenience of creating the drawings. Furthermore, the configuration of each component shown in the above embodiment is merely an example and is not particularly limited, and it goes without saying that various modifications are possible within a range that does not substantially deviate from the effects of the present invention.

[0143] For example, the mixed liquid is not limited to SC1, SC2, and SPM. The mixed liquid may be a liquid in which two or more types of processing liquids are mixed. For example, the mixed liquid may contain dilute hydrofluoric acid (DHF), hydrofluoric nitric acid (a mixed liquid of hydrofluoric acid and nitric acid (HNO3)), HFEG (a mixed liquid of hydrofluoric acid and ethylene glycol), or hydrochloric acid at a dilute concentration (for example, about 0.001% by weight to about 0.01% by weight).

[0144] 1 to 11, the flow rate control unit 113 drives the first flow rate adjustment valves 54a to 54c and 54e in microsteps and drives the second flow rate adjustment valves 54d and 54f in full steps. However, the flow rate control unit 113 may also drive the second flow rate adjustment valves 54d and 54f in microsteps. For example, when pure water is supplied to the upstream pipe 53d (pipe through which pure water flows) from a factory in which the substrate processing apparatus 100 is installed, the flow rate adjustment valve 54 (second flow rate adjustment valve 54d) provided in the upstream pipe 53d may be driven in microsteps. Furthermore, when pure water is supplied to the upstream pipe 53d (pipe through which pure water flows) from the fluid cabinet 101, the flow rate adjustment valve 54 (second flow rate adjustment valve 54d) provided in the upstream pipe 53d may be driven in full steps.

[0145] Furthermore, in the embodiment described with reference to FIGS. 1 to 11, the set value was determined according to the target value (target flow rate) of the flow rate of the treatment liquid, but the set value does not have to be determined according to the target value (target flow rate) of the flow rate of the treatment liquid. The set value may be determined according to the purpose. For example, the set value may be determined according to the viscosity of the treatment liquid. Specifically, full-step driving may be set for treatment liquid whose viscosity exceeds a certain threshold, and micro-step driving may be set for treatment liquid whose viscosity does not exceed the certain threshold. By determining whether to drive the stepping motor 543 in micro-steps or full-steps according to the viscosity of the treatment liquid, it is possible to more appropriately adjust the flow rate of the treatment liquid regardless of the viscosity of the treatment liquid.

[0146] Furthermore, in the embodiment described with reference to Figures 1 to 11, the values ​​of the time constants set in the detectors 131a to 131d are adjusted to make the opening and closing speeds of the multiple flow rate adjustment valves 54 match or approximately match, but the PID control parameters set in the controllers 132a to 132d may be adjusted to make the opening and closing speeds of the multiple flow rate adjustment valves 54 match or approximately match.

[0147] 1 to 11, the substrate holding unit 3 is a clamping type chuck that brings multiple chuck members 32 into contact with the peripheral edge surface of the substrate W, but the method of holding the substrate W is not particularly limited as long as it can hold the substrate W horizontally. For example, the substrate holding unit 3 may be a vacuum type chuck or a Bernoulli type chuck. [Industrial Applicability]

[0148] The present invention is useful in an apparatus for processing a substrate. [Explanation of symbols]

[0149] 3: Board holding part 5a: Discharge nozzle 5b: Discharge nozzle 5c: Discharge nozzle 52: Connection piping 53: Upstream piping 53a: Upstream piping 53b: Upstream piping 53c: Upstream piping 53d: Upstream piping 54: Flow control valve 54a: First flow control valve 54b: First flow control valve 54c: First flow control valve 54d: Second flow control valve 54e: First flow control valve 54f: Second flow control valve 55:Flow meter 55a:Flow meter 55b:Flow meter 55c:Flow meter 55d:Flow meter 55e:Flowmeter 55f:Flow meter 56a:Liquid supply piping 56b:Liquid supply piping 58a:Liquid supply piping 58b:Liquid supply piping 61: Mixer 100: Substrate processing apparatus 113: Flow control section 131a: Detector 131b: Detector 131c: Detector 131d: Detector 132a: Controller 132b: Controller 132c: Controller 132d: Controller 543: Stepping motor 543a: Stepping motor 543b: Stepping motor 543c: Stepping motor 543d: Stepping motor FL1: 1st flow rate FL2: 2nd flow rate MS1: First measurement signal MS2: Second measurement signal TC1: Time constant TC2: Time constant TF1: 1st target flow rate TF2: 2nd target flow rate W: Substrate

Claims

1. A substrate processing apparatus that supplies a processing liquid to a substrate to process the substrate, a pipe for circulating the treatment liquid; a flow meter that measures the flow rate of the treatment liquid flowing through the pipe; a flow rate adjusting valve for adjusting the flow rate of the treatment liquid flowing through the piping; a flow rate control unit that controls the opening of the flow rate adjustment valve based on the measurement result of the flow meter so that the flow rate value of the processing liquid becomes a target value; Equipped with the flow rate adjusting valve has a stepping motor that changes the opening degree of the flow rate adjusting valve, The flow rate control unit controls the opening of the flow rate adjustment valve by driving the stepping motor in microsteps based on the measurement result of the flow meter.

2. the flow rate control unit is capable of selectively switching the drive method of the stepping motor between the microstep drive and full-step drive, 2 . The substrate processing apparatus according to claim 1 , wherein the flow rate control unit drives the stepping motor in one of the microstep drive and the full step drive in accordance with a set value that sets a drive method for the stepping motor.

3. the number of the pipes, the number of the flow meters, and the number of the flow rate adjustment valves are each plural; the flow rate control unit is capable of selectively switching the drive method of the stepping motor included in each of the plurality of flow rate adjustment valves individually to one of the microstep drive and the full step drive, 3 . The substrate processing apparatus according to claim 2 , wherein the flow rate control unit drives each of the stepping motors in the microstep drive or the full step drive in accordance with the set value that sets a drive method for each of the stepping motors.

4. the target value for the flow rate adjustment valve that drives the stepping motor in the microsteps indicates a value that is smaller than a minimum flow rate value when the stepping motor is driven in full steps, 4. The substrate processing apparatus according to claim 1, wherein the minimum flow rate value indicates the minimum flow rate of the processing liquid within a range of a predetermined quality level for the flow rate of the processing liquid when the stepping motor is driven at the full step.

5. the treatment liquid includes a first treatment liquid and a second treatment liquid having a viscosity greater than that of the first treatment liquid, the piping includes a first piping through which the first treatment liquid flows and a second piping through which the second treatment liquid flows; the flow meters include a first flow meter that measures a flow rate of the first treatment liquid flowing through the first pipe, and a second flow meter that measures a flow rate of the second treatment liquid flowing through the second pipe, the flow rate adjustment valve includes a first flow rate adjustment valve that adjusts a flow rate of the first processing liquid flowing through the first pipe, and a second flow rate adjustment valve that adjusts a flow rate of the second processing liquid flowing through the second pipe, the first flow rate adjustment valve has a first stepping motor that changes the opening degree of the first flow rate adjustment valve, the second flow rate adjustment valve has a second stepping motor that changes the opening degree of the second flow rate adjustment valve, The flow rate control unit driving the first stepping motor in microsteps; The substrate processing apparatus according to claim 1 , wherein the second stepping motor is driven in full steps.

6. a first detector that generates a first measurement signal that indicates a measurement value of the flow rate of the first processing liquid based on a measurement result of the first flow meter; a second detector that generates a second measurement signal that indicates a measurement value of the flow rate of the second processing liquid based on a measurement result of the second flow meter; Further provided with 6. The substrate processing apparatus of claim 5, wherein the time constant of the first measurement signal and the time constant of the second measurement signal each indicate values ​​adjusted so that the opening and closing speed of the first flow rate control valve matches or approximately matches the opening and closing speed of the second flow rate control valve.

7. the treatment liquid includes a first treatment liquid and a second treatment liquid different from the first treatment liquid, the piping includes a first piping through which the first treatment liquid flows and a second piping through which the second treatment liquid flows; the flow meters include a first flow meter that measures a flow rate of the first treatment liquid flowing through the first pipe, and a second flow meter that measures a flow rate of the second treatment liquid flowing through the second pipe, the flow rate adjustment valve includes a first flow rate adjustment valve that adjusts a flow rate of the first processing liquid flowing through the first pipe, and a second flow rate adjustment valve that adjusts a flow rate of the second processing liquid flowing through the second pipe, the first flow rate adjustment valve has a first stepping motor that changes the opening degree of the first flow rate adjustment valve, the second flow rate adjustment valve has a second stepping motor that changes the opening degree of the second flow rate adjustment valve, The flow rate control unit driving the first stepping motor in microsteps based on the measurement result of the first flow meter so that the flow rate value of the first processing liquid becomes a first target value; 4. A substrate processing apparatus according to claim 1, wherein the second stepping motor is driven in full steps based on the measurement results of the second flow meter so that the flow rate value of the second processing liquid becomes a second target value that is greater than the first target value.

8. a first detector that generates a first measurement signal that indicates a measurement value of the flow rate of the first processing liquid based on a measurement result of the first flow meter; a second detector that generates a second measurement signal that indicates a measurement value of the flow rate of the second processing liquid based on a measurement result of the second flow meter; Further provided with 8. The substrate processing apparatus of claim 7, wherein the time constant of the first measurement signal and the time constant of the second measurement signal each indicate values ​​adjusted so that the opening and closing speed of the first flow rate control valve matches or approximately matches the opening and closing speed of the second flow rate control valve.

9. a substrate holder that holds the substrate horizontally; a discharge unit that discharges a mixed liquid obtained by mixing the first processing liquid and the second processing liquid toward the substrate held by the substrate holding unit; Further provided with The substrate processing apparatus according to claim 7 , wherein a mixing ratio of the first processing liquid in the mixed liquid is smaller than a mixing ratio of the second processing liquid.

10. a mixer that mixes the first treatment liquid and the second treatment liquid; a connection pipe for supplying the mixed liquid from the mixer to a discharge portion; Further provided with the first pipe allows the first processing liquid to flow to the mixer; The substrate processing apparatus according to claim 9 , wherein the second pipe allows the second processing liquid to flow to the mixer.

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